JPH04256581A - Composite grinding wheel - Google Patents

Composite grinding wheel

Info

Publication number
JPH04256581A
JPH04256581A JP3953891A JP3953891A JPH04256581A JP H04256581 A JPH04256581 A JP H04256581A JP 3953891 A JP3953891 A JP 3953891A JP 3953891 A JP3953891 A JP 3953891A JP H04256581 A JPH04256581 A JP H04256581A
Authority
JP
Japan
Prior art keywords
resin
polishing
synthetic
grindstone
synthetic resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3953891A
Other languages
Japanese (ja)
Other versions
JP2694705B2 (en
Inventor
Kan Sato
佐藤 敢
Masaru Nakamura
勝 中村
Yoji Tomita
富田 洋司
Takeshi Yamazaki
武 山崎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kanebo Ltd
Original Assignee
Kanebo Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=12555830&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=JPH04256581(A) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Kanebo Ltd filed Critical Kanebo Ltd
Priority to JP3039538A priority Critical patent/JP2694705B2/en
Publication of JPH04256581A publication Critical patent/JPH04256581A/en
Application granted granted Critical
Publication of JP2694705B2 publication Critical patent/JP2694705B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Landscapes

  • Polishing Bodies And Polishing Tools (AREA)

Abstract

PURPOSE:To obtain a composite grinding wheel which can polish a disk base with the alloy composed of a high purity aluminum and magnesium as the raw material in a high accuracy, also whose polishing force is continued longer. CONSTITUTION:It is a structure having a continuous fine pore with abrasive grain particles are combined by a synthetic resin. The synthetic resin is composed of a polyvinyl acetal resin and the body hardening a thermal hardening resin. The rate (VA/VR) of the volume (VA) of the abrasive grain particle to the volume (VR) of the synthetic resin is 0.6-1.3. The porocity is 70-85%. The swelling rate is <=2.0%.

Description

【発明の詳細な説明】[Detailed description of the invention]

【0001】0001

【産業上の利用分野】本発明は、例えばコンピュータ用
外部記憶装置に用いるアルミニウム合金製ディスク原盤
(以下、「アルミディスク」と略称する)等、比較的軟
質の金属の平面を精密研磨するための合成砥石に関する
[Industrial Application Field] The present invention is useful for precision polishing flat surfaces of relatively soft metals, such as aluminum alloy disk masters (hereinafter referred to as "aluminum disks") used in external storage devices for computers. Regarding synthetic whetstones.

【0002】0002

【従来の技術】コンピュータの外部記憶装置として、リ
ジッドディスクドライブがあり、その記憶媒体としては
、平坦かつ平滑な非磁性体基盤上に磁性体微粒子を被着
したメモリーディスクが通常使用されている。かかるメ
モリーディスクに使用される円盤状をした基盤は、その
表面を、傷や凹凸、起伏等の欠点のない、全体の平坦度
の極めてすぐれた、鏡面状態にまで精密に仕上げる必要
がある。
2. Description of the Related Art Rigid disk drives are used as external storage devices for computers, and their storage media are usually memory disks in which fine magnetic particles are adhered to a flat and smooth non-magnetic substrate. The surface of the disc-shaped base used in such memory disks must be precisely finished to a mirror-like state with extremely high overall flatness and no defects such as scratches, unevenness, or undulations.

【0003】従来、メモリーディスクに使用される基盤
としては、アルミ合金製のものが一般に用いられ、その
標準材は、純度99%程度のアルミニウムを約96%と
マグネシウムを約4%との合金よりなるものであった。
[0003] Conventionally, the substrate used for memory disks is generally made of aluminum alloy, and the standard material is an alloy of about 96% aluminum with a purity of about 99% and about 4% magnesium. It was something like that.

【0004】最近になり、外部記憶装置の小型化、大容
量化に伴ない、合金原料としてのアルミニウムの純度を
より高くするのが有効であることが見出され、アルミニ
ウムの純度が99.9%、好ましくは99.99%とい
った高純度のものと、マグネシウムとの合金製の基盤(
以下、「高純材アルミ基盤」という)が用いられるよう
になった。
Recently, with the miniaturization and increase in capacity of external storage devices, it has been found that it is effective to increase the purity of aluminum as an alloy raw material, and the purity of aluminum has been increased to 99.9. %, preferably 99.99%, and a substrate made of an alloy of magnesium (
(hereinafter referred to as "high-purity aluminum base") has come to be used.

【0005】上述の如き基盤の表面仕上げ加工に供する
砥石としては、連続微細気孔を具え、砥粒粒子をポリビ
ニルアセタール系樹脂と熱硬化性樹脂によって結合し、
かつ表面硬度(H)と砥粒番手(G)とが特定の式を満
足する関係にある研磨用砥石(特開昭61−18277
4号公報、特開昭61−192480号公報)が知られ
ている。
[0005] A grindstone used for surface finishing processing of a substrate as described above is provided with continuous fine pores, and abrasive grain particles are bonded with a polyvinyl acetal resin and a thermosetting resin.
A polishing whetstone in which the surface hardness (H) and the abrasive grain count (G) satisfy a specific formula
No. 4, Japanese Patent Application Laid-open No. 192480/1983) are known.

【0006】上記公知砥石は、標準材による基盤の表面
を精密に仕上げるには好ましいものであった。しかしな
がら、高純材基盤は標準材基盤に比べ、軟質かつ粘性の
高い物性であって、従来の砥石を用いて研磨した場合、
研磨速度が低く、砥石表面の目づまりが発生しやすいた
め、研磨効率、生産性が極めて低いものとなる。高純材
基盤を高精度で効率よく研磨しうる合成砥石は、未だ満
足すべきものが提案されていないのが現状である。
[0006] The above-mentioned known grindstone is preferable for precisely finishing the surface of a base made of standard material. However, the high-purity material base has physical properties that are softer and more viscous than the standard material base, and when polished using a conventional whetstone,
Since the polishing speed is low and clogging of the grindstone surface is likely to occur, polishing efficiency and productivity are extremely low. At present, no satisfactory synthetic whetstone has yet been proposed that can efficiently polish high-purity substrates with high precision.

【0007】[0007]

【発明が解決しようとする課題】本発明者等は、上述の
事情に鑑み鋭意研究した結果、高純材基盤を効率よく精
密研磨する砥石に必要とされる要件を見出し、本発明を
完成したものであって、本発明の目的は、高純材基盤に
対し、平坦性,平滑性に優れた精密表面加工ができ、か
つ高い研磨速度と研磨力の持続性の良好な研磨をし得る
合成砥石を提供するにある。
[Problems to be Solved by the Invention] As a result of intensive research in view of the above-mentioned circumstances, the present inventors have discovered the requirements necessary for a grindstone for efficiently and precisely polishing a high-purity material base, and have completed the present invention. Therefore, an object of the present invention is to provide a synthetic whetstone that can perform precision surface processing with excellent flatness and smoothness on a high-purity material base, and can perform polishing with a high polishing rate and good sustainability of polishing power. It is in.

【0008】[0008]

【課題を解決するための手段】本発明の目的は、砥粒粒
子を合成樹脂にて結合した連続微細気孔を有する三次元
網状組織を具えた構造体であって、前記合成樹脂がポリ
ビニルアセタール系樹脂と熱硬化性樹脂の硬化体よりな
り、前記砥粒粒子の占める体積(VA )と前記合成樹
脂の占める体積(VR )との比(VA /VR )が
0.6〜1.3で、その気孔率が70〜85%で、かつ
乾燥時と湿潤時との寸法変化が2.0%以下であること
を特徴とする合成砥石によって達成される。
[Means for Solving the Problems] An object of the present invention is to provide a structure having a three-dimensional network structure having continuous fine pores in which abrasive particles are bonded with a synthetic resin, the synthetic resin being polyvinyl acetal-based. It is made of a cured body of resin and thermosetting resin, and the ratio (VA/VR) of the volume occupied by the abrasive particles (VA) to the volume occupied by the synthetic resin (VR) is 0.6 to 1.3, This is achieved by a synthetic whetstone characterized by a porosity of 70 to 85% and a dimensional change between dry and wet states of 2.0% or less.

【0009】本発明の合成砥石は、連続微細気孔を具え
た三次元網状組織をなす構造体である。その平均気孔径
は200μm以下、好ましくは100μm以下、更に好
ましくは25μm以下で、均一性のよいものが好適であ
る。気孔径が大き過ぎるものは、構造部の方が疎となり
過ぎて、研磨作業に際し、その部分に極圧がかかり、研
磨面に不規則模様や局部的条痕が発生する。
The synthetic grindstone of the present invention has a three-dimensional network structure with continuous fine pores. The average pore diameter is preferably 200 μm or less, preferably 100 μm or less, and more preferably 25 μm or less, and is preferably highly uniform. If the pore size is too large, the structure will be too sparse, and extreme pressure will be applied to that part during polishing, resulting in irregular patterns or localized streaks on the polished surface.

【0010】本発明に用いられる砥粒粒子としては、例
えば炭化珪素、熔融アミルナ、エメリー、ガーネット、
ダイヤモンド、窒化ケイ素、酸化クロム、酸化セリウム
等の微細粒子をあげることが出来るが、就中炭化珪素が
本発明の目的に対し好適である。また砥粒粒子の大きさ
は、番手が1000番以上、好ましくは1500番以上
の高番手品である。ここで砥粒の番手とは、JIS規格
R6001に記載された粒度に分級されたものであって
、平均粒径に対して規格内の分散を有するものである。
[0010] Examples of the abrasive particles used in the present invention include silicon carbide, fused alumina, emery, garnet,
Fine particles such as diamond, silicon nitride, chromium oxide, and cerium oxide can be used, but silicon carbide is particularly suitable for the purpose of the present invention. In addition, the size of the abrasive particles is a high-count product with a count of 1000 or more, preferably 1500 or more. Here, the abrasive grain count is one that is classified according to the particle size described in JIS standard R6001, and has a dispersion within the standard with respect to the average particle size.

【0011】上記砥粒粒子を結合する合成樹脂としては
、ポリビニルアセタール(以下、「PVAt」と略記す
る)系樹脂のほかに、熱硬化性樹脂の硬化体が併用され
る。PVAt系樹脂は、微細砥粒を保持する力にすぐれ
、砥粒粒子が合成砥石から簡単に脱落したり、散失した
りするのを効果的に防止する性質がある。また、熱硬化
性樹脂は、合成砥石の必要とする硬さ、脆さ及び寸法安
定性を付与するものである。
As the synthetic resin for bonding the abrasive particles, a cured thermosetting resin is used in combination with a polyvinyl acetal (hereinafter abbreviated as "PVAt") resin. PVAt-based resin has excellent ability to hold fine abrasive grains, and has the property of effectively preventing abrasive grain particles from easily falling off or scattering from a synthetic whetstone. Additionally, the thermosetting resin provides the hardness, brittleness, and dimensional stability that the synthetic grindstone requires.

【0012】上記熱硬化性樹脂としては、例えばメラミ
ン系樹脂、ウレタン系樹脂、フェノール系樹脂、エポキ
シ系樹脂、尿素系樹脂等を挙げることができ、これらを
単独または2種以上を併用してもよい。本発明において
はメラミン系樹脂とフェノール系樹脂を併用したものが
好適である。熱硬化性樹脂の種類と量は、合成砥石に求
められる硬度、脆さ及び寸法安定性に応じ適宜選定すれ
ばよい。
Examples of the thermosetting resin include melamine resin, urethane resin, phenol resin, epoxy resin, urea resin, etc. These may be used alone or in combination of two or more. good. In the present invention, a combination of a melamine resin and a phenol resin is preferred. The type and amount of the thermosetting resin may be appropriately selected depending on the hardness, brittleness, and dimensional stability required of the synthetic grindstone.

【0013】本発明において、前記砥粒粒子と前記合成
樹脂との混合割合は、それぞれの占める体積をVA 、
VR としたとき、その体積比VA /VR (以下、
「分散密度」という)は、0.6〜1.3であり、好ま
しくは0.6〜1.2である。従来実用されているアル
ミディスク用合成砥石の分散密度が、0.6よりも小さ
い、通常0.5以下であることを考えれば極めて大きい
値といえる。即ち、本発明者等は、高純材基盤の表面を
高精度に仕上げるには、砥粒粒子と合成樹脂との割合に
下限と上限があり、本発明の範囲内においてはじめて可
能となることを見出したものである。
In the present invention, the mixing ratio of the abrasive particles and the synthetic resin is such that the volume occupied by each is VA,
VR, the volume ratio VA/VR (hereinafter,
(referred to as "dispersion density") is 0.6 to 1.3, preferably 0.6 to 1.2. Considering that the dispersion density of synthetic grindstones for aluminum discs that have been used in the past is smaller than 0.6, usually 0.5 or less, this can be said to be an extremely large value. That is, the present inventors have discovered that in order to finish the surface of a high-purity material base with high precision, there is a lower limit and an upper limit to the ratio of abrasive grain particles and synthetic resin, and that this is only possible within the scope of the present invention. It is something.

【0014】上記分散密度が0.6未満の場合は、高純
材基盤に対し充分な研磨速度が得られず、効率のよい研
磨ができない。しかも、結合材である合成樹脂により、
表面が不必要に摩擦されるために、被研磨体の表面が異
常光沢を有し、更に平坦度等の形状精度も低下する。一
方、分散密度が1.3より大きい場合は、表面が粗く仕
上り、必要とされる精度の表面に仕上げることができな
い。
If the dispersion density is less than 0.6, a sufficient polishing rate cannot be obtained for the high-purity substrate, and efficient polishing cannot be achieved. Moreover, due to the synthetic resin that is the binding material,
Since the surface is rubbed unnecessarily, the surface of the object to be polished has abnormal gloss, and furthermore, shape accuracy such as flatness is reduced. On the other hand, if the dispersion density is greater than 1.3, the surface will be rough and cannot be finished with the required precision.

【0015】本発明の合成砥石は、連続気孔を有する多
孔質構造であり、連続気孔とすることで、研磨に伴う熱
を速やかに放散し、蓄熱を防ぐことができる。更に、気
孔は研磨に用いる研磨液を保持すると共に、研磨作用面
から脱落した砥粒、研磨屑細片等を一時的に把持し、作
用面に悪影響を与えることを防止するという極めて重要
な役割がある。
The synthetic grindstone of the present invention has a porous structure with continuous pores, and by having continuous pores, the heat accompanying polishing can be quickly dissipated and heat accumulation can be prevented. Furthermore, the pores play the extremely important role of holding the polishing liquid used for polishing and temporarily holding abrasive grains, polishing debris, etc. that have fallen off from the polishing surface, and preventing them from having a negative impact on the polishing surface. There is.

【0016】上述の如き作用を十分に行い、かつ高精度
の表面研磨を達成するには、その気孔率を70〜85容
量%とする必要がある。気孔率が70容量%より小さい
場合には、脱落した砥粒や研磨屑等の把持容量が十分で
なく、目づまりの進行がはやく、高精度で連続研磨でき
るバッチ数が低下する。このため、研磨面の更新(ドレ
ッシング)作業の頻度が増大し、生産性が著しく低下す
る。
[0016] In order to sufficiently perform the above-mentioned effects and to achieve highly accurate surface polishing, the porosity must be 70 to 85% by volume. When the porosity is less than 70% by volume, the gripping capacity for dropped abrasive grains, polishing debris, etc. is insufficient, clogging progresses rapidly, and the number of batches that can be continuously polished with high precision decreases. As a result, the frequency of updating (dressing) the polishing surface increases, resulting in a significant decrease in productivity.

【0017】一方、気孔率が85%より大きい場合は、
合成砥石としての機械的強度が不足し、砥石自体の磨耗
が著しく、砥石作用面の形状が狂い易くなり、本発明の
目的が達成できない。
On the other hand, if the porosity is greater than 85%,
The mechanical strength of the synthetic whetstone is insufficient, the abrasion of the whetstone itself is significant, and the shape of the working surface of the whetstone tends to be distorted, making it impossible to achieve the object of the present invention.

【0018】本発明の合成砥石は、乾燥時と湿潤時との
寸法変化、所謂膨潤率が2.0%以下である。ここで言
う膨潤率(Ds)とは、乾燥時の寸法(Td)に対する
湿潤時の寸法(Tw)を測定し、式 Ds=(Tw−Td)/Td×100 で求められる値である。
The synthetic grindstone of the present invention has a dimensional change between dry and wet conditions, so-called swelling ratio, of 2.0% or less. The swelling ratio (Ds) referred to here is a value obtained by measuring the wet dimension (Tw) with respect to the dry dimension (Td) and using the formula Ds=(Tw-Td)/Td×100.

【0019】上記膨潤率が2.0%より大きい場合には
、砥粒に対する結合力、即ち抱合力が高過ぎて、切刃の
研磨力を喪失してからも脱落せず、合成砥石構造内に留
まることになる。その結果、合成砥石は砥石としての十
分な研磨力を失ない、研磨速度が低下するのみならず、
研磨面に異常な光沢を与え、更に砥石の目づまり現象も
促進することとなる。
If the swelling ratio is greater than 2.0%, the bonding force to the abrasive grains, that is, the binding force, is so high that even after the cutting blade loses its abrasive power, it will not fall off, and the structure of the synthetic whetstone will not fall off. will remain. As a result, the synthetic whetstone not only loses its sufficient abrasive power as a whetstone and the polishing speed decreases, but also
This imparts an abnormal gloss to the polished surface and also promotes clogging of the grindstone.

【0020】通常、PVAt系樹脂を結合剤とした合成
砥石は、膨潤率の極めて大きいものである。また、PV
At系樹脂に熱硬化性樹脂を併用した膨潤率の低いもの
も知られているが、熱硬化性樹脂を併用する理由は、主
として砥石に必要な硬さと脆さを賦与することにあった
。このため、かかる合成砥石を製造するに際し、膨潤率
は従来ほとんど考慮されておらず、一般に膨潤率は2%
より大きいものであった。
[0020] Usually, a synthetic grindstone using a PVAt resin as a binder has an extremely high swelling rate. Also, PV
Although it is known that a thermosetting resin is used in combination with an At-based resin and has a low swelling rate, the reason for using a thermosetting resin in combination is mainly to impart the necessary hardness and brittleness to the grindstone. For this reason, when manufacturing such synthetic whetstones, the swelling rate has not been considered in the past, and the swelling rate is generally 2%.
It was bigger.

【0021】即ち、本発明においては、熱硬化性樹脂の
種類と量は、膨潤率を2.0%以下となるように選定す
ることが極めて肝要である。
That is, in the present invention, it is extremely important to select the type and amount of the thermosetting resin so that the swelling ratio is 2.0% or less.

【0022】本発明にかかる砥石は例えば次の如き方法
にて製造される。
The grindstone according to the present invention is manufactured, for example, by the following method.

【0023】即ち、平均重合度300〜2000の完全
ケン化または部分ケン化のポリビニルアルコールあるい
はその変性体の一種又は二種以上を温水に溶解して水溶
液となし、それに熱硬化性樹脂のプレポリマーあるいは
前駆体の水溶液、非水溶性水溶液、エマルジョンまたは
その粉末を所定量加え、更に必要に応じてその触媒を加
えた後、均一に攪拌し、更に所定量の砥粒粒子と架橋剤
としてのアルデヒド類、触媒としての酸類、及び気孔生
成剤としての澱粉類等を加え、均一粘稠スラリーを調製
し、これを所望の型枠に注型する。
That is, completely saponified or partially saponified polyvinyl alcohol having an average degree of polymerization of 300 to 2000 or one or more modified products thereof is dissolved in warm water to form an aqueous solution, and a prepolymer of thermosetting resin is added to the aqueous solution. Alternatively, after adding a predetermined amount of a precursor aqueous solution, non-aqueous aqueous solution, emulsion or powder thereof, and further adding the catalyst as necessary, stir uniformly, and then add a predetermined amount of abrasive particles and an aldehyde as a crosslinking agent. A homogeneous viscous slurry is prepared by adding esters, acids as a catalyst, starch as a pore forming agent, etc., and this is poured into a desired mold.

【0024】上述の方法において、砥粒粒子の配合量は
、砥粒の比重を考慮し、合成樹脂との混合割合が本発明
の範囲内となるよう適宜選定すればよい。また気孔形成
材の配合量は、得られる合成砥石の気孔率が70〜85
容量%となるよう適宜選定すればよい。
In the above method, the amount of abrasive grains to be blended may be appropriately selected in consideration of the specific gravity of the abrasive grains so that the mixing ratio with the synthetic resin falls within the range of the present invention. In addition, the amount of the pore-forming material is such that the porosity of the resulting synthetic whetstone is between 70 and 85.
It may be appropriately selected so that the capacity is %.

【0025】然る後、40〜100℃の温度にて均一昼
夜反応固化を行った後取出し、水洗して気孔形成材およ
び未反応のアルデヒド類、酸類を除去して中間体を得る
。得られた中間体は形態的には砥石の形をしているが、
樹脂の硬化反応はまだ進んでおらず、物性的には不十分
である。
[0025] Thereafter, the mixture is uniformly solidified day and night at a temperature of 40 to 100°C, and then taken out and washed with water to remove the pore-forming material and unreacted aldehydes and acids to obtain an intermediate. The resulting intermediate has the shape of a grindstone, but
The curing reaction of the resin has not yet progressed, and the physical properties are insufficient.

【0026】次に、この中間体を乾燥した後、樹脂を硬
化させるため、熱処理(キュアリング)を行う。熱処理
条件は、使用した熱硬化性樹脂の種類及び量によって適
宜設定すればよいが、一般的には100〜180℃で約
30時間程度施すことで、硬化反応はほぼ達成される。
Next, after drying this intermediate, heat treatment (curing) is performed to harden the resin. The heat treatment conditions may be appropriately set depending on the type and amount of the thermosetting resin used, but generally the curing reaction is almost achieved by performing the heat treatment at 100 to 180°C for about 30 hours.

【0027】樹脂が硬化することにより、砥石として必
要な硬さ、脆さ及び寸法安定性が付与され、本発明の合
成砥石が得られる。
[0027] By curing the resin, the hardness, brittleness and dimensional stability necessary for a grindstone are imparted, and the synthetic grindstone of the present invention can be obtained.

【0028】上述の製造方法において、熱硬化性樹脂は
前述の如く反応原液の調製時に混合しても良いが、中間
体を得た後に、その前駆体の水溶液を中間体に含浸せし
め、これをキュアリングしても良い。また、2種以上の
熱硬化性樹脂を併用する場合は、一方の樹脂を反応原液
中に加え、他方の樹脂を後含浸で施与してもよく、特に
限定されるものではない。特に、メラミン系樹脂を用い
る場合には、中間体に含浸せしめる方法が好適である。
In the above production method, the thermosetting resin may be mixed at the time of preparing the reaction stock solution as described above, but after obtaining the intermediate, the intermediate is impregnated with an aqueous solution of its precursor, and this is You can also cure it. Furthermore, when two or more types of thermosetting resins are used together, one resin may be added to the reaction stock solution and the other resin may be applied by post-impregnation, and there is no particular limitation. In particular, when using a melamine resin, a method of impregnating it into an intermediate is suitable.

【0029】前述の如くして得られた砥石は所望の形状
に成形された後、例えば両面ラッピング式研磨機等、極
めて精密な装置に装着して用いられる。
After the grindstone obtained as described above is formed into a desired shape, it is used by being attached to extremely precise equipment, such as a double-sided lapping type grinder.

【0030】[0030]

【実施例】以下、実施例により本発明を詳述する。なお
、その前に本実施例において使用した研磨装置、測定機
器、被研磨体等は次の通りである。
[Examples] The present invention will be explained in detail with reference to Examples below. Before that, the polishing apparatus, measuring equipment, object to be polished, etc. used in this example are as follows.

【0031】 ○研磨装置………スピードファム社製両面研磨機(型式
3FDL−16B−4SSG−4D)○表面粗さ計……
東京精密製表面粗さ計(型式サーフコム553A) ○結合度測定機…東京工機製 大越式砥石結合度試験機 ○硬度計…………ロックウェル硬度計(松沢精機製)
○ Polishing device......Double-sided polishing machine manufactured by Speed FAM (Model 3FDL-16B-4SSG-4D) ○ Surface roughness meter...
Surface roughness meter made by Tokyo Seimitsu (model Surfcom 553A) ○ Bond degree measuring machine…Okoshi type grindstone bond degree tester made by Tokyo Koki ○Hardness meter……Rockwell hardness meter (manufactured by Matsuzawa Seiki)


0032】○被研磨材………JIS規格A5586に記
載の純度99.9%以上の高純度アルミニウム96%と
マグネシウム4%からなるアルミニウム合金製環状板(
神戸製鋼所製)。
[
○ Material to be polished: An annular plate made of aluminum alloy consisting of 96% high-purity aluminum and 4% magnesium with a purity of 99.9% or higher as described in JIS standard A5586 (
(manufactured by Kobe Steel).

【0033】また、研磨条件及び測定条件は下記の通り
である。
The polishing conditions and measurement conditions are as follows.

【0034】<研磨条件> ○圧力、研磨時間……50g/cm2 にて0.5分研
磨の後100g/cm2 にて3分研磨 ○上部定盤回転数……23.6r.p.m.(左回り)
○下部定盤回転数……60.0r.p.m.(右回り)
○キャリアー回転数…自転    4.8rpm(左回
り)公転  19.3rpm(右回り) ○研磨液………………ベルクーラント#3001(鐘紡
製)1%水溶液 ○研磨液供給量………5l/分
<Polishing conditions> ○Pressure, polishing time...Polishing for 0.5 minutes at 50g/cm2, then polishing for 3 minutes at 100g/cm2○Rotation speed of upper surface plate...23.6r. p. m. (counterclockwise)
○Lower surface plate rotation speed...60.0r. p. m. (turn right)
○Carrier rotation speed...Rotation: 4.8 rpm (counterclockwise) Revolution: 19.3 rpm (clockwise) ○Polishing liquid: Bell coolant #3001 (manufactured by Kanebo) 1% aqueous solution ○Amount of polishing liquid supplied: 5 liters / minute

【0035】<表面精度測定条件>   ○Ra、Rmax・カットオフ値…0.8mm以上
                  ・測定長………
…2.5mm  ○WCM          ・カッ
トオフ値…0.8mm以下             
     ・測定位置………円周の半径方向に内周端よ
り外周端まで。 なお、ここでいうRa,Rmax,WCMについては、
次式で表わされるパラメータである。Ra…中心線平均
粗さ
<Surface accuracy measurement conditions> ○Ra, Rmax, cutoff value...0.8mm or more -Measurement length...
…2.5mm ○WCM ・Cutoff value…0.8mm or less
・Measurement position: from the inner edge to the outer edge in the radial direction of the circumference. Regarding Ra, Rmax, and WCM here,
This is a parameter expressed by the following equation. Ra...Center line average roughness

【数1】 f(x)は粗さ曲線を示す。 Rmax…最大粗さ Rmax=Pmax−Vmax Pmax:粗さ曲線における最大山高さVmin:粗さ
曲線における最大谷深さWCM…ろ波最大うねり WCM=W1 −W2  W1 :ろ波うねり曲線における最大山高さW2 :ろ
波うねり曲線における最大谷深さ
[Equation 1] f(x) represents the roughness curve. Rmax...Maximum roughness Rmax=Pmax-Vmax Pmax: Maximum peak height in the roughness curve Vmin: Maximum valley depth in the roughness curve WCM...Maximum filter wave WCM=W1 - W2 W1: Maximum peak height in the filter wave curve W2: Maximum valley depth in filter wave curve

【0036】<表面硬
度測定条件> ロックウェルスーパーフィシャル15−Yスケール使用
荷重  1.5kg 測定子  1/2インチ鋼球
<Surface hardness measurement conditions> Rockwell Superficial 15-Y scale Working load: 1.5 kg Measuring point: 1/2 inch steel ball

【0037】<結合度測定条件>荷重7kgを用い、J
IS  R−6240法に準拠した方法で測定した。
<Coupling degree measurement conditions> Using a load of 7 kg, J
It was measured by a method based on IS R-6240 method.

【0038】(実施例1〜5、比較例1〜6)砥粒とし
て、炭化珪素粉末の1500番(平均粒径7.2〜8.
6μm)及び3000番(平均粒径3.5〜4.5μm
)のものを選定した。
(Examples 1-5, Comparative Examples 1-6) As the abrasive grains, silicon carbide powder No. 1500 (average particle size 7.2-8.
6 μm) and No. 3000 (average particle size 3.5 to 4.5 μm)
) were selected.

【0039】重合度500及び1700の部分ケン化ポ
リビニルアルコールを水溶液となし、これに気孔形成材
としてのコーンスターチ、架橋剤としてのホルムアルデ
ヒド水溶液、メラミン樹脂SM−700(昭和高分子(
株)製)の水溶液及びフェノール樹脂PR−961A(
住友ベークライト(株)製)を所定量加えた後、前述の
砥粒を所定量混合し、更に触媒としての塩酸を加えて攪
拌混合し、均一なスラリー状液を調製した。
Partially saponified polyvinyl alcohol with a degree of polymerization of 500 and 1700 is made into an aqueous solution, cornstarch is used as a pore-forming material, a formaldehyde aqueous solution is used as a crosslinking agent, and melamine resin SM-700 (Showa Kobunshi Co., Ltd.) is added to the solution.
Co., Ltd.) aqueous solution and phenolic resin PR-961A (
After adding a predetermined amount of Sumitomo Bakelite (manufactured by Sumitomo Bakelite Co., Ltd.), a predetermined amount of the above-mentioned abrasive grains were mixed, and hydrochloric acid as a catalyst was further added and mixed with stirring to prepare a uniform slurry liquid.

【0040】このスラリー液を所定の型枠に注型し、6
0℃にて1昼夜反応固化せしめた。しかる後、型枠より
反応生成物を取り出し、水洗いしてコーンスターチ及び
未反応のホルムアルデヒドと塩酸等を除却したのち乾燥
して、合成砥石の中間体を得た。これを155℃の温度
にて約9時間熱処理したのち、所定形状に成形して合成
砥石とした。
[0040] This slurry liquid was poured into a predetermined mold, and 6
The mixture was reacted and solidified at 0°C for one day and night. Thereafter, the reaction product was taken out from the mold, washed with water to remove cornstarch, unreacted formaldehyde, hydrochloric acid, etc., and dried to obtain an intermediate for a synthetic grindstone. This was heat-treated at a temperature of 155° C. for about 9 hours, and then molded into a predetermined shape to obtain a synthetic whetstone.

【0041】得られた合成砥石を研磨装置に取り付け、
被研磨材として前記高純材アルミ基盤を所定条件にて研
磨した。所定時間研磨した後、被研磨材の表面形状を検
査した。
[0041] The obtained synthetic whetstone was attached to a polishing device,
As a material to be polished, the high-purity aluminum substrate was polished under predetermined conditions. After polishing for a predetermined period of time, the surface shape of the material to be polished was inspected.

【0042】また、砥石面の目詰まり状態等確認の為、
砥石面のドレッシング作業なしで、10バッチ連続して
研磨し、その時の砥面の状態および研磨の状態を検査し
た。
[0042] Also, to check the clogging condition of the grinding wheel surface,
Ten batches of grinding were performed continuously without dressing the grinding wheel surface, and the condition of the grinding surface and the polishing condition at that time were inspected.

【0043】得られた合成砥石の組成及び物性、並びに
研磨試験の結果は実施例が表1〜表4、比較例が表5〜
表8の通りであった。
The composition and physical properties of the obtained synthetic whetstones as well as the results of the polishing tests are shown in Tables 1 to 4 for Examples and Tables 5 to 4 for Comparative Examples.
It was as shown in Table 8.

【0044】[0044]

【表1】[Table 1]

【0045】[0045]

【表2】[Table 2]

【0046】[0046]

【表3】[Table 3]

【0047】[0047]

【表4】[Table 4]

【0048】[0048]

【表5】[Table 5]

【0049】[0049]

【表6】[Table 6]

【0050】[0050]

【表7】[Table 7]

【0051】[0051]

【表8】[Table 8]

【0052】表1〜表4より明らかな如く、本発明の合
成砥石は、難研削性の材料である高純材アルミ基盤に対
しても優れた表面研磨加工ができ、かつ研磨速度が高く
、研磨力の持続性も良好であった。
As is clear from Tables 1 to 4, the synthetic grindstone of the present invention can perform excellent surface polishing even on a high-purity aluminum base, which is a difficult-to-grind material, has a high polishing speed, and has a high polishing power. The durability was also good.

【0053】一方、砥粒粒子と合成樹脂との体積比(V
A /VR)が0.6より小さい合成砥石(比較例1)
は研磨速度が小さく、かつ砥石の目詰まりがし易いもの
であった。また体積比(VA /VR )が1.3より
大きいもの(比較例2)は、砥石の磨耗が大きく、耐久
性に欠けていた。
On the other hand, the volume ratio (V
Synthetic whetstone with A/VR) smaller than 0.6 (Comparative Example 1)
The polishing speed was low and the grindstone was easily clogged. In addition, in the case where the volume ratio (VA /VR ) was larger than 1.3 (Comparative Example 2), the grinding wheel was heavily worn and lacked durability.

【0054】また、膨潤率が2.0%より大きい合成砥
石(比較例3,6)は、研磨速度が小さく、かつ表面精
度、特にろ波最大うねり(WCM)が大きくなった。
[0054] In addition, the synthetic grindstones (Comparative Examples 3 and 6) with a swelling ratio of more than 2.0% had a low polishing rate and a high surface accuracy, especially the maximum filter waviness (WCM).

【0055】更に、気孔率が70容量%より小さい合成
砥石(比較例4)は、研磨面に異常な条痕が発生しやす
く、砥石の目詰まりが極めて早く起った。気孔率が85
容量%より大きいもの(比較例5)は、表面精度、特に
ろ波最大うねり(WCM)が極めて大きく、かつ砥石の
磨耗も早く耐久性に欠けるものであった。
Furthermore, the synthetic grindstone with a porosity of less than 70% by volume (Comparative Example 4) was more likely to produce abnormal streaks on the polished surface, and the grindstone became clogged very quickly. Porosity is 85
In the case where the grinding wheel was larger than the volume percentage (Comparative Example 5), the surface precision, particularly the maximum filter wave (WCM), was extremely large, and the grinding wheel wore quickly and lacked durability.

【0056】[0056]

【発明の効果】本発明の合成砥石は、アルミディスクに
対し、表面精度に優れた研磨を効率よく行うことができ
る。また目詰まりをしにくく研磨力の持続性が良好であ
り、従来品に比べ砥石の表面更新(ドレッシング)回数
を低減することができ、作業効率が向上するとともに安
定した品質の研磨が可能であり、製品の歩留りも格段に
向上する。
[Effects of the Invention] The synthetic grindstone of the present invention can efficiently polish an aluminum disk with excellent surface precision. In addition, it is resistant to clogging and maintains abrasive power well, reducing the number of times the grindstone surface needs to be resurfaced (dressed) compared to conventional products, improving work efficiency and making it possible to polish with stable quality. , the product yield will also be significantly improved.

【0057】本発明の合成砥石は、特に極めて難研削材
とされている高純度アルミニウムとマグネシウムからな
る合金を素材とした高純材アルミ基盤に対してその効果
を発揮するものであり、従来品に見られない高精度かつ
持続性に優れた表面研磨加工ができる。
The synthetic whetstone of the present invention is particularly effective on a high-purity aluminum base made of an alloy of high-purity aluminum and magnesium, which is considered to be an extremely difficult material to grind, and is superior to conventional products. It is possible to perform surface polishing with high precision and excellent durability.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】  砥粒粒子を合成樹脂にて結合した連続
微細気孔を有する三次元網状組織を具えた構造体であっ
て、前記合成樹脂がポリビニルアセタール系樹脂と熱硬
化性樹脂の硬化体よりなり、前記砥粒粒子の占める体積
(VA )と前記合成樹脂の占める体積(VR )との
比(VA /VR )が0.6〜1.3で、その気孔率
が70〜85%で、かつ乾燥時と湿潤時との寸法変化が
2.0%以下であることを特徴とする合成砥石。
1. A structure having a three-dimensional network structure having continuous fine pores in which abrasive particles are bonded with a synthetic resin, wherein the synthetic resin is made of a cured product of a polyvinyl acetal resin and a thermosetting resin. The ratio (VA/VR) of the volume occupied by the abrasive particles (VA) to the volume occupied by the synthetic resin (VR) is 0.6 to 1.3, and the porosity is 70 to 85%, A synthetic whetstone, characterized in that the dimensional change between dry and wet conditions is 2.0% or less.
JP3039538A 1991-02-08 1991-02-08 Synthetic grindstone for high-purity aluminum substrate polishing Expired - Fee Related JP2694705B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3039538A JP2694705B2 (en) 1991-02-08 1991-02-08 Synthetic grindstone for high-purity aluminum substrate polishing

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3039538A JP2694705B2 (en) 1991-02-08 1991-02-08 Synthetic grindstone for high-purity aluminum substrate polishing

Publications (2)

Publication Number Publication Date
JPH04256581A true JPH04256581A (en) 1992-09-11
JP2694705B2 JP2694705B2 (en) 1997-12-24

Family

ID=12555830

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3039538A Expired - Fee Related JP2694705B2 (en) 1991-02-08 1991-02-08 Synthetic grindstone for high-purity aluminum substrate polishing

Country Status (1)

Country Link
JP (1) JP2694705B2 (en)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06312375A (en) * 1993-04-28 1994-11-08 Noritake Dia Kk Manufacture of resin bond wheel having vent hole structure and grinding method using the same
WO2001085394A1 (en) * 2000-05-10 2001-11-15 Noritake Co., Limited Porous phenol resin grindstone and method for its preparation
US6328644B1 (en) 1999-04-09 2001-12-11 Tosoh Corporation Molded abrasive product and polishing wheel using it
US6575824B2 (en) 2000-06-01 2003-06-10 Tosoh Corporation Abrasive molding and abrasive disc provided with same
US6817934B2 (en) 2000-07-03 2004-11-16 Tosoh Corporation Abrasive molding and abrasive disc provided with same
JP2008137126A (en) * 2006-12-04 2008-06-19 Kurenooton Kk Resinoid grinding wheel
JP2013173223A (en) * 2008-06-23 2013-09-05 Saint-Gobain Abrasives Inc High porosity superabrasive resin product, and method of manufacture
US9138866B2 (en) 2009-10-27 2015-09-22 Saint-Gobain Abrasives, Inc. Resin bonded abrasive
US9266220B2 (en) 2011-12-30 2016-02-23 Saint-Gobain Abrasives, Inc. Abrasive articles and method of forming same

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH029587A (en) * 1988-06-29 1990-01-12 Kobe Steel Ltd Grinder element for grinding aluminum material
JPH02185374A (en) * 1989-01-13 1990-07-19 Kanebo Ltd Synthetic grindstone

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH029587A (en) * 1988-06-29 1990-01-12 Kobe Steel Ltd Grinder element for grinding aluminum material
JPH02185374A (en) * 1989-01-13 1990-07-19 Kanebo Ltd Synthetic grindstone

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06312375A (en) * 1993-04-28 1994-11-08 Noritake Dia Kk Manufacture of resin bond wheel having vent hole structure and grinding method using the same
US6328644B1 (en) 1999-04-09 2001-12-11 Tosoh Corporation Molded abrasive product and polishing wheel using it
WO2001085394A1 (en) * 2000-05-10 2001-11-15 Noritake Co., Limited Porous phenol resin grindstone and method for its preparation
US6575824B2 (en) 2000-06-01 2003-06-10 Tosoh Corporation Abrasive molding and abrasive disc provided with same
US6817934B2 (en) 2000-07-03 2004-11-16 Tosoh Corporation Abrasive molding and abrasive disc provided with same
KR100740558B1 (en) * 2000-07-03 2007-07-18 도소 가부시키가이샤 Molded body for polishing and surface plate for polishing using it
JP2008137126A (en) * 2006-12-04 2008-06-19 Kurenooton Kk Resinoid grinding wheel
JP2013173223A (en) * 2008-06-23 2013-09-05 Saint-Gobain Abrasives Inc High porosity superabrasive resin product, and method of manufacture
JP2016196084A (en) * 2008-06-23 2016-11-24 サンーゴバン アブレイシブズ,インコーポレイティド High-porosity superabrasive resin product and manufacturing method
US9138866B2 (en) 2009-10-27 2015-09-22 Saint-Gobain Abrasives, Inc. Resin bonded abrasive
US9266220B2 (en) 2011-12-30 2016-02-23 Saint-Gobain Abrasives, Inc. Abrasive articles and method of forming same

Also Published As

Publication number Publication date
JP2694705B2 (en) 1997-12-24

Similar Documents

Publication Publication Date Title
JPS61192480A (en) Synthetic grinding stone for soft metal
CN100402237C (en) Abrasive tools for grinding electronic components
JP4854269B2 (en) Resinoid grinding wheel manufacturing method
WO2002022310A1 (en) Ultra abrasive grain wheel for mirror finish
JP2694705B2 (en) Synthetic grindstone for high-purity aluminum substrate polishing
JP2002355763A (en) Synthetic grinding wheel
JP7264663B2 (en) Whetstone and method for manufacturing whetstone
JPH0671708B2 (en) Semiconductor wafer-Whetstone for polishing
JP2001300856A (en) Super abrasive grain tool
JP2593829B2 (en) Synthetic whetstone
JPH05188B2 (en)
JP3040441B2 (en) Precision polishing method for ceramics
JPS61209880A (en) Precise polishing of hard metal surface
JPH0360970A (en) Polishing surface plate
JPS62251078A (en) Grinding material
JP2555000B2 (en) Polishing method for hard and brittle materials
JPH02185374A (en) Synthetic grindstone
JP2684607B2 (en) Synthetic whetstone
JPH02185373A (en) Synthetic grindstone
JP2004261942A (en) Polishing grinding wheel
JP2520474B2 (en) Porous grindstone for magnetic disk substrate
JPS62246474A (en) Manufacture of super abrasive grain grindstone for mirror-like surface finishing
JPS61197164A (en) Synthetic grindstone and its production method
JPH0360978A (en) Diamond grinding stone and manufacture thereof
JP2001198800A (en) Method for machining plate glass surface

Legal Events

Date Code Title Description
R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20080912

Year of fee payment: 11

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20080912

Year of fee payment: 11

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20090912

Year of fee payment: 12

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20090912

Year of fee payment: 12

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20100912

Year of fee payment: 13

LAPS Cancellation because of no payment of annual fees