JPH04252235A - High molecular composition and production thereof - Google Patents
High molecular composition and production thereofInfo
- Publication number
- JPH04252235A JPH04252235A JP3008321A JP832191A JPH04252235A JP H04252235 A JPH04252235 A JP H04252235A JP 3008321 A JP3008321 A JP 3008321A JP 832191 A JP832191 A JP 832191A JP H04252235 A JPH04252235 A JP H04252235A
- Authority
- JP
- Japan
- Prior art keywords
- film
- polymer composition
- polymer
- substrate
- chemically adsorbed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000203 mixture Substances 0.000 title claims abstract description 42
- 238000004519 manufacturing process Methods 0.000 title claims description 9
- 229920000642 polymer Polymers 0.000 claims description 56
- 239000000758 substrate Substances 0.000 claims description 43
- 239000004094 surface-active agent Substances 0.000 claims description 24
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical compound Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 claims description 22
- 239000005046 Chlorosilane Substances 0.000 claims description 19
- 125000000217 alkyl group Chemical group 0.000 claims description 18
- 239000002904 solvent Substances 0.000 claims description 9
- 239000000463 material Substances 0.000 claims description 8
- 229920005989 resin Polymers 0.000 claims description 7
- 239000011347 resin Substances 0.000 claims description 7
- 229910052731 fluorine Inorganic materials 0.000 claims description 5
- 230000003647 oxidation Effects 0.000 claims description 5
- 238000007254 oxidation reaction Methods 0.000 claims description 5
- 239000011356 non-aqueous organic solvent Substances 0.000 claims description 4
- 230000001590 oxidative effect Effects 0.000 claims description 4
- FDNAPBUWERUEDA-UHFFFAOYSA-N silicon tetrachloride Chemical compound Cl[Si](Cl)(Cl)Cl FDNAPBUWERUEDA-UHFFFAOYSA-N 0.000 claims description 4
- 239000011737 fluorine Substances 0.000 claims description 3
- 229920001187 thermosetting polymer Polymers 0.000 claims description 3
- 239000004215 Carbon black (E152) Substances 0.000 claims description 2
- 229930195733 hydrocarbon Natural products 0.000 claims description 2
- 229920005992 thermoplastic resin Polymers 0.000 claims description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims 2
- JBTWLSYIZRCDFO-UHFFFAOYSA-N ethyl methyl carbonate Chemical compound CCOC(=O)OC JBTWLSYIZRCDFO-UHFFFAOYSA-N 0.000 claims 1
- 125000001153 fluoro group Chemical group F* 0.000 claims 1
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 15
- 238000000034 method Methods 0.000 abstract description 7
- 239000005871 repellent Substances 0.000 abstract description 4
- 238000005406 washing Methods 0.000 abstract description 3
- 230000002940 repellent Effects 0.000 abstract 1
- 229920000515 polycarbonate Polymers 0.000 description 13
- 239000004417 polycarbonate Substances 0.000 description 13
- 239000003921 oil Substances 0.000 description 12
- 238000000576 coating method Methods 0.000 description 11
- 239000011248 coating agent Substances 0.000 description 10
- 238000002474 experimental method Methods 0.000 description 10
- 230000000052 comparative effect Effects 0.000 description 8
- -1 polypropylene Polymers 0.000 description 7
- 239000000126 substance Substances 0.000 description 7
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 6
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 5
- 150000002430 hydrocarbons Chemical group 0.000 description 5
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 4
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 4
- 238000010894 electron beam technology Methods 0.000 description 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 4
- 239000001301 oxygen Substances 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- KMUONIBRACKNSN-UHFFFAOYSA-N potassium dichromate Chemical compound [K+].[K+].[O-][Cr](=O)(=O)O[Cr]([O-])(=O)=O KMUONIBRACKNSN-UHFFFAOYSA-N 0.000 description 4
- 238000001179 sorption measurement Methods 0.000 description 4
- JNEGECSXOURYNI-UHFFFAOYSA-N trichloro(1,1,2,2,3,3,4,4,5,5,6,6,7,7,10,10,10-heptadecafluorodecyl)silane Chemical compound FC(F)(F)CCC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)[Si](Cl)(Cl)Cl JNEGECSXOURYNI-UHFFFAOYSA-N 0.000 description 4
- COAUHYBSXMIJDK-UHFFFAOYSA-N 3,3-dichloro-1,1,1,2,2-pentafluoropropane Chemical compound FC(F)(F)C(F)(F)C(Cl)Cl COAUHYBSXMIJDK-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 230000003373 anti-fouling effect Effects 0.000 description 3
- 239000012298 atmosphere Substances 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 239000004744 fabric Substances 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- AVXLXFZNRNUCRP-UHFFFAOYSA-N trichloro(1,1,2,2,3,3,4,4,5,5,6,6,7,7,8,8,8-heptadecafluorooctyl)silane Chemical group FC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)[Si](Cl)(Cl)Cl AVXLXFZNRNUCRP-UHFFFAOYSA-N 0.000 description 3
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 description 3
- 239000005052 trichlorosilane Substances 0.000 description 3
- DURPTKYDGMDSBL-UHFFFAOYSA-N 1-butoxybutane Chemical compound CCCCOCCCC DURPTKYDGMDSBL-UHFFFAOYSA-N 0.000 description 2
- 229920000178 Acrylic resin Polymers 0.000 description 2
- 239000004925 Acrylic resin Substances 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- 229920000459 Nitrile rubber Polymers 0.000 description 2
- 239000006087 Silane Coupling Agent Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 238000009825 accumulation Methods 0.000 description 2
- 229920000122 acrylonitrile butadiene styrene Polymers 0.000 description 2
- 239000003125 aqueous solvent Substances 0.000 description 2
- MTAZNLWOLGHBHU-UHFFFAOYSA-N butadiene-styrene rubber Chemical compound C=CC=C.C=CC1=CC=CC=C1 MTAZNLWOLGHBHU-UHFFFAOYSA-N 0.000 description 2
- 229920005549 butyl rubber Polymers 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- MHDVGSVTJDSBDK-UHFFFAOYSA-N dibenzyl ether Chemical compound C=1C=CC=CC=1COCC1=CC=CC=C1 MHDVGSVTJDSBDK-UHFFFAOYSA-N 0.000 description 2
- DOIRQSBPFJWKBE-UHFFFAOYSA-N dibutyl phthalate Chemical compound CCCCOC(=O)C1=CC=CC=C1C(=O)OCCCC DOIRQSBPFJWKBE-UHFFFAOYSA-N 0.000 description 2
- RCJVRSBWZCNNQT-UHFFFAOYSA-N dichloridooxygen Chemical compound ClOCl RCJVRSBWZCNNQT-UHFFFAOYSA-N 0.000 description 2
- MROCJMGDEKINLD-UHFFFAOYSA-N dichlorosilane Chemical class Cl[SiH2]Cl MROCJMGDEKINLD-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- 239000000945 filler Substances 0.000 description 2
- 229920002313 fluoropolymer Polymers 0.000 description 2
- 229920001002 functional polymer Polymers 0.000 description 2
- DCAYPVUWAIABOU-UHFFFAOYSA-N hexadecane Chemical compound CCCCCCCCCCCCCCCC DCAYPVUWAIABOU-UHFFFAOYSA-N 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 238000007654 immersion Methods 0.000 description 2
- 239000010410 layer Substances 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- 239000004014 plasticizer Substances 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 2
- 239000004810 polytetrafluoroethylene Substances 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 239000000725 suspension Substances 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
- KKYDYRWEUFJLER-UHFFFAOYSA-N 1,1,2,2,3,3,4,4,5,5,6,6,7,7,10,10,10-heptadecafluorodecyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)CCC(F)(F)F KKYDYRWEUFJLER-UHFFFAOYSA-N 0.000 description 1
- DHKHKXVYLBGOIT-UHFFFAOYSA-N 1,1-Diethoxyethane Chemical compound CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 description 1
- FRCHKSNAZZFGCA-UHFFFAOYSA-N 1,1-dichloro-1-fluoroethane Chemical compound CC(F)(Cl)Cl FRCHKSNAZZFGCA-UHFFFAOYSA-N 0.000 description 1
- OHMHBGPWCHTMQE-UHFFFAOYSA-N 2,2-dichloro-1,1,1-trifluoroethane Chemical compound FC(F)(F)C(Cl)Cl OHMHBGPWCHTMQE-UHFFFAOYSA-N 0.000 description 1
- JMMZCWZIJXAGKW-UHFFFAOYSA-N 2-methylpent-2-ene Chemical compound CCC=C(C)C JMMZCWZIJXAGKW-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 229920001875 Ebonite Polymers 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- RRHGJUQNOFWUDK-UHFFFAOYSA-N Isoprene Chemical compound CC(=C)C=C RRHGJUQNOFWUDK-UHFFFAOYSA-N 0.000 description 1
- 240000008415 Lactuca sativa Species 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 1
- 229910003818 SiH2Cl2 Inorganic materials 0.000 description 1
- 229910003822 SiHCl3 Inorganic materials 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- 229920001807 Urea-formaldehyde Polymers 0.000 description 1
- 229920006311 Urethane elastomer Polymers 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- 239000011354 acetal resin Substances 0.000 description 1
- KXKVLQRXCPHEJC-UHFFFAOYSA-N acetic acid trimethyl ester Natural products COC(C)=O KXKVLQRXCPHEJC-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 239000002099 adlayer Substances 0.000 description 1
- 229920000180 alkyd Polymers 0.000 description 1
- 229940072049 amyl acetate Drugs 0.000 description 1
- PGMYKACGEOXYJE-UHFFFAOYSA-N anhydrous amyl acetate Natural products CCCCCOC(C)=O PGMYKACGEOXYJE-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- SLLGVCUQYRMELA-UHFFFAOYSA-N chlorosilicon Chemical compound Cl[Si] SLLGVCUQYRMELA-UHFFFAOYSA-N 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 238000003851 corona treatment Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 1
- 239000003759 ester based solvent Substances 0.000 description 1
- 239000004210 ether based solvent Substances 0.000 description 1
- 229940093499 ethyl acetate Drugs 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 239000005338 frosted glass Substances 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- UKACHOXRXFQJFN-UHFFFAOYSA-N heptafluoropropane Chemical compound FC(F)C(F)(F)C(F)(F)F UKACHOXRXFQJFN-UHFFFAOYSA-N 0.000 description 1
- MNWFXJYAOYHMED-UHFFFAOYSA-M heptanoate Chemical compound CCCCCCC([O-])=O MNWFXJYAOYHMED-UHFFFAOYSA-M 0.000 description 1
- JMMWKPVZQRWMSS-UHFFFAOYSA-N isopropanol acetate Natural products CC(C)OC(C)=O JMMWKPVZQRWMSS-UHFFFAOYSA-N 0.000 description 1
- 229940011051 isopropyl acetate Drugs 0.000 description 1
- GWYFCOCPABKNJV-UHFFFAOYSA-N isovaleric acid Chemical compound CC(C)CC(O)=O GWYFCOCPABKNJV-UHFFFAOYSA-N 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- MSSNHSVIGIHOJA-UHFFFAOYSA-N pentafluoropropane Chemical compound FC(F)CC(F)(F)F MSSNHSVIGIHOJA-UHFFFAOYSA-N 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 238000009832 plasma treatment Methods 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920001084 poly(chloroprene) Polymers 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 239000004431 polycarbonate resin Substances 0.000 description 1
- 229920013716 polyethylene resin Polymers 0.000 description 1
- 229920000307 polymer substrate Polymers 0.000 description 1
- 229920006324 polyoxymethylene Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 239000012462 polypropylene substrate Substances 0.000 description 1
- 229920005990 polystyrene resin Polymers 0.000 description 1
- 229920005749 polyurethane resin Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 235000012045 salad Nutrition 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229920002379 silicone rubber Polymers 0.000 description 1
- 239000004945 silicone rubber Substances 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- AKIOHULKHAVIMI-UHFFFAOYSA-N trichloro(1,1,2,2,3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,11,11,12,12,12-pentacosafluorododecyl)silane Chemical group FC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)[Si](Cl)(Cl)Cl AKIOHULKHAVIMI-UHFFFAOYSA-N 0.000 description 1
- JJCHJVKOPMFQDP-UHFFFAOYSA-N trichloro(nonadec-18-enyl)silane Chemical compound Cl[Si](Cl)(Cl)CCCCCCCCCCCCCCCCCC=C JJCHJVKOPMFQDP-UHFFFAOYSA-N 0.000 description 1
- PPDADIYYMSXQJK-UHFFFAOYSA-N trichlorosilicon Chemical compound Cl[Si](Cl)Cl PPDADIYYMSXQJK-UHFFFAOYSA-N 0.000 description 1
- 229910021642 ultra pure water Inorganic materials 0.000 description 1
- 239000012498 ultrapure water Substances 0.000 description 1
- 229920006305 unsaturated polyester Polymers 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
Abstract
Description
【0001】0001
【産業上の利用分野】 本発明は表面改質した高分子
組成物およびその製造方法に関する。TECHNICAL FIELD The present invention relates to a surface-modified polymer composition and a method for producing the same.
【0002】0002
【従来の技術】高分子の表面を改質する方法としては、
例えば撥水性・撥油性を付与するために例えば含フッ素
シランカップリング剤等をコーティングする方法、潤滑
性を付与するためにはワックスをコーティングする方法
、親水性を付与するためにはポリビニルアルコールをコ
ーティングする方法、防汚性を付与するためにフロロカ
ーボン系ポリマーの懸濁液をコーティングする方法など
コーティング方法が一般によく知られている。[Prior Art] As a method for modifying the surface of polymers,
For example, coating with a fluorine-containing silane coupling agent to impart water and oil repellency, coating with wax to impart lubricity, and coating with polyvinyl alcohol to impart hydrophilicity. Coating methods are generally well known, such as a method of coating a fluorocarbon polymer suspension to impart antifouling properties.
【0003】0003
【発明が解決しようとする課題】しかしながら従来の方
法で得られるコーティング膜は、高分子を含む基体との
結合力が弱く、布で表面を拭いたり、水での洗浄を繰り
返すと、コーティング膜が基体から剥離して表面処理効
果がなくなってしまうという課題があった。また、従来
のコーティング膜は分子がランダムな方向を向いている
ため、コーティング膜にピンホールが多く、十分な特性
が発揮されないという課題があった。また例えば透明性
が強く要求される透明プラスチック光学材料等には、フ
ロロカーボン系ポリマーのコーティング膜では透明性に
欠如するため使用できないという課題があった。[Problems to be Solved by the Invention] However, the coating film obtained by the conventional method has a weak bonding force with the substrate containing polymers, and if the surface is repeatedly wiped with a cloth or washed with water, the coating film will deteriorate. There was a problem that the surface treatment effect would be lost due to peeling off from the substrate. In addition, because the molecules of conventional coating films are oriented in random directions, there are many pinholes in the coating film, resulting in insufficient properties. Furthermore, for example, there is a problem that a coating film of a fluorocarbon polymer cannot be used for transparent plastic optical materials, etc., which are strongly required to have transparency, because of a lack of transparency.
【0004】本発明は、従来の欠点に鑑みなされたもの
で、例えば繰り返し洗浄に対する耐久性が優れ、高特性
の撥水・撥油・防汚性高分子組成物、もしくは超親水性
高分子組成物等の高機能性高分子組成物を提供すること
を第1の目的としている。本発明の第2の目的は、この
ような高機能性を有した高分子組成物の簡単な製造方法
を提供することである。The present invention was made in view of the conventional drawbacks, and includes, for example, a water-repellent, oil-repellent, and stain-resistant polymer composition, or a superhydrophilic polymer composition, which has excellent durability against repeated washing and has high properties. The first objective is to provide highly functional polymer compositions such as products. A second object of the present invention is to provide a simple method for producing such a highly functional polymer composition.
【0005】[0005]
【課題を解決するための手段】第1の目的を達成するた
めに、本発明は高分子を含む基体表面上に、シロキサン
結合を有する化学吸着膜を形成した高分子組成物を提供
する。また、第2の目的を達成するために、高分子を含
む基体表面を酸化処理した後、非水系の有機溶媒にこの
基体を浸漬して、表面にクロロシラン系界面活性剤を化
学吸着させ、シロキサン結合を有する化学吸着膜を形成
して高分子組成物を製造する。Means for Solving the Problems In order to achieve the first object, the present invention provides a polymer composition in which a chemically adsorbed film having siloxane bonds is formed on the surface of a substrate containing a polymer. In addition, in order to achieve the second objective, after oxidizing the surface of the substrate containing the polymer, this substrate is immersed in a non-aqueous organic solvent to chemically adsorb the chlorosilane surfactant on the surface, and the siloxane A chemically adsorbed film having bonds is formed to produce a polymer composition.
【0006】[0006]
【作用】本発明の高分子組成物では、高分子を含む基体
表面に化学吸着膜がシロキサン結合を介して化学結合し
て形成されている。そのため、表面を例えば繰り返し洗
浄しても、化学吸着膜は高分子を含む基体表面から剥離
せず、化学吸着膜に設けられた例えば撥水・撥油・防汚
性、もしくは超親水性等の機能が保持される。[Operation] In the polymer composition of the present invention, a chemically adsorbed film is formed on the surface of a substrate containing a polymer by chemical bonding via siloxane bonds. Therefore, even if the surface is repeatedly washed, for example, the chemical adsorption film will not peel off from the substrate surface containing polymers, and the chemical adsorption film will not peel off from the substrate surface containing polymers. Functionality is preserved.
【0007】本発明の高分子組成物の製造方法では、高
分子を含む基体表面を酸化処理して例えば水酸基等の親
水性基を形成した後、この基体表面にクロロシラン系界
面活性剤を化学吸着させ、シロキサン結合を有する化学
吸着膜を形成するので、繰り返し単位として例えば水酸
基等の親水性の活性水素を持たない高分子であっても、
化学吸着膜を容易に形成することができる。また、高分
子を含む基体をクロロシラン系界面活性剤を含有する非
水系溶媒に浸漬するだけで、自動的に最密充填された化
学吸着膜が形成できる。その結果、形成された化学吸着
膜は、クロロシラン系界面活性剤の機能に応じて例えば
高特性の撥水・撥油・防汚性、又は超親水性の機能を発
揮する。In the method for producing a polymer composition of the present invention, the surface of a substrate containing a polymer is oxidized to form a hydrophilic group such as a hydroxyl group, and then a chlorosilane surfactant is chemically adsorbed onto the surface of the substrate. As a chemically adsorbed film having siloxane bonds is formed, even if the polymer does not have a hydrophilic active hydrogen such as a hydroxyl group as a repeating unit,
A chemisorption film can be easily formed. Moreover, a chemically adsorbed film with close packing can be automatically formed by simply immersing a substrate containing a polymer in a nonaqueous solvent containing a chlorosilane surfactant. As a result, the chemically adsorbed film formed exhibits, for example, high water repellency, oil repellency, antifouling properties, or superhydrophilic properties depending on the function of the chlorosilane surfactant.
【0008】[0008]
【実施例】本発明は高分子組成物の一実施例は図1に示
すように、高分子を含む基体1の表面にシロキサン結合
2を介して、化学吸着膜3を形成したものである。[Embodiment] As shown in FIG. 1, an embodiment of the polymer composition of the present invention is one in which a chemically adsorbed film 3 is formed on the surface of a substrate 1 containing a polymer via siloxane bonds 2.
【0009】本発明に供される基体の高分子材料として
は、例えばポリカーボネート樹脂、アクリル樹脂、塩化
ビニル樹脂、ポリスチレン樹脂、ポリエチレン樹脂、ポ
リプロピレン樹脂、ポリアミド樹脂,アクリルブタジエ
ンスチレン共重合体(ABS)樹脂、アセタール樹脂、
メチルペンテン樹脂等の熱可塑性樹脂、例えばエポキシ
樹脂、尿素樹脂、メラミン樹脂、フェノール樹脂、アル
キド樹脂、ウレタン樹脂、不飽和ポリエステル硬化樹脂
、エボナイト等の熱硬化性樹脂、もしくは例えばブタジ
エンースチレンゴム、ブチルゴム、ニトリルゴム、クロ
ロプレンゴム、ウレタンゴム、シリコーンゴム等のゴム
が挙げられ、一般の汎用プラスティック材料の何れでも
よい。また、上記のような高分子材料に例えば二酸化珪
素、炭酸カルシウム、酸化チタン等の所謂充填剤が混入
されていてもよく、フタル酸ジブチル等の所謂可塑剤が
混入されていてもよく、さらに染料又は顔料で染着して
いてもよく、高分子材料を含有する基体に適応される。[0009] Examples of the polymeric material of the substrate used in the present invention include polycarbonate resin, acrylic resin, vinyl chloride resin, polystyrene resin, polyethylene resin, polypropylene resin, polyamide resin, and acrylic butadiene styrene copolymer (ABS) resin. , acetal resin,
Thermoplastic resins such as methylpentene resins, such as epoxy resins, urea resins, melamine resins, phenolic resins, alkyd resins, urethane resins, unsaturated polyester cured resins, thermosetting resins such as ebonite, or thermosetting resins such as butadiene-styrene rubber, butyl rubber , nitrile rubber, chloroprene rubber, urethane rubber, silicone rubber, etc., and any general-purpose plastic material may be used. In addition, the above-mentioned polymeric materials may be mixed with so-called fillers such as silicon dioxide, calcium carbonate, and titanium oxide, and may also be mixed with so-called plasticizers such as dibutyl phthalate. Alternatively, it may be dyed with a pigment and is applied to a substrate containing a polymeric material.
【0010】本発明の高分子組成物に撥水撥油で防汚も
しくは滑性を付与する場合には、化学吸着膜を構成する
材料としてはフッ化アルキル基を有するクロロシラン系
界面活性剤が用いられる。また、本発明の高分子組成物
に超親水性を付与する場合には、末端ビニル基を持つア
ルキル基を有するクロロシラン系界面活性剤を用い化学
吸着膜形成後、例えば酸素雰囲気中で例えば電子線、X
線、γ線、紫外線等の放射線照射により末端を水酸基に
変えるか、あるいはテトラクロロシランを用い化学吸着
膜を形成した後、水と反応させクロロシリル結合をシラ
ノール結合に変える。[0010] When imparting water and oil repellency, stain resistance or slipperiness to the polymer composition of the present invention, a chlorosilane surfactant having a fluorinated alkyl group is used as the material constituting the chemisorption film. It will be done. In addition, when imparting superhydrophilicity to the polymer composition of the present invention, a chlorosilane surfactant having an alkyl group with a terminal vinyl group is used to form a chemically adsorbed film, and then, for example, an electron beam is applied to the polymer composition in an oxygen atmosphere. ,X
The terminals are changed into hydroxyl groups by irradiation with radiation such as rays, gamma rays, and ultraviolet rays, or after a chemically adsorbed film is formed using tetrachlorosilane, the chlorosilyl bonds are converted into silanol bonds by reacting with water.
【0011】フッ化アルキル基を有するクロロシラン系
界面活性剤としては、例えばCF3(CF2)7(CH
2)2SiCl3,CF3CH2O(CH2)15Si
Cl3,CF3(CH2)2Si(CH3)2(CH2
)15SiCl3,F(CF2)4(CH2)2Si(
CH3)2(CH2)9SiCl3,F(CF2)8(
CH2)2Si(CH3)2(CH2)9SiCl3,
CF3COO(CH2)15SiCl3,CF3(CF
2)5(CH2)2SiCl3等のようなトリクロロシ
ラン系界面活性剤を始め、例えばCF3(CF2)7(
CH2)2SiCln(CH3)3−n,CF3(CF
2)7(CH2)2SiCln(C2H5)3−n,C
F3CH2O(CH2)15SiCln(CH3)3−
n,CF3CH2O(CH2)15SiCln(C2H
5)3−n,CF3(CH2)2Si(CH3)2(C
H2)15SiCln(CH3)3−n,F(CF2)
4(CH2)2Si(CH3)2(CH2)9SiCl
n(C2H5)3−n,F(CF2)8(CH2)2S
i(CH3)2(CH2)9SiCln(CH3)3−
n,CF3COO(CH2)15SiCln(CH3)
3−n,CF3(CF2)5(CH2)2SiCln(
CH3)3−n(但し式中のnは何れも1又は2)等の
ような低級アルキル基置換のモノクロロシラン系あるい
はジクロロシラン系界面活性剤が挙げられる。これらの
中でも特にトリクロロシラン系界面活性剤の親水性基と
結合したクロロシリル結合以外のクロロシリル結合が、
隣合うクロロシラン基とシロキサン結合で分子間結合を
形成するため、より強固な化学吸着膜となり好ましい。
また、CF3(CF2)nCH2CH2SiCl3(但
し式中のnは整数であり、3〜25程度が最も扱いやす
い)が、溶剤溶解性、化学吸着性と溌水溌油性又は防汚
性等の機能性との釣合が取れているため好ましい。さら
にまた、アルキル鎖又はフッ化アルキル鎖部分にC=C
やC≡C基を組み込んで置けば、化学吸着膜形成後5メ
ガラド程度の電子線照射で架橋できるのでさらに化学吸
着膜自体の硬度を向上させることも可能である。Examples of the chlorosilane surfactant having a fluorinated alkyl group include CF3(CF2)7(CH
2) 2SiCl3, CF3CH2O(CH2)15Si
Cl3, CF3(CH2)2Si(CH3)2(CH2
)15SiCl3,F(CF2)4(CH2)2Si(
CH3)2(CH2)9SiCl3,F(CF2)8(
CH2)2Si(CH3)2(CH2)9SiCl3,
CF3COO(CH2)15SiCl3,CF3(CF
2) Trichlorosilane surfactants such as 5(CH2)2SiCl3, etc., as well as CF3(CF2)7(
CH2)2SiCln(CH3)3-n,CF3(CF
2) 7(CH2)2SiCln(C2H5)3-n,C
F3CH2O(CH2)15SiCln(CH3)3-
n, CF3CH2O(CH2)15SiCln(C2H
5) 3-n, CF3(CH2)2Si(CH3)2(C
H2) 15SiCln(CH3)3-n,F(CF2)
4(CH2)2Si(CH3)2(CH2)9SiCl
n(C2H5)3-n, F(CF2)8(CH2)2S
i(CH3)2(CH2)9SiCln(CH3)3-
n, CF3COO(CH2)15SiCln(CH3)
3-n, CF3(CF2)5(CH2)2SiCln(
Examples include lower alkyl group-substituted monochlorosilane or dichlorosilane surfactants such as CH3)3-n (where n in the formula is either 1 or 2). Among these, chlorosilyl bonds other than those bonded to the hydrophilic group of the trichlorosilane surfactant are particularly
Since intermolecular bonds are formed between adjacent chlorosilane groups and siloxane bonds, it becomes a stronger chemically adsorbed film, which is preferable. In addition, CF3(CF2)nCH2CH2SiCl3 (where n in the formula is an integer, and 3 to 25 is easiest to handle) has properties such as solvent solubility, chemisorption, water repellency, oil repellency, and stain resistance. This is preferable because it is well balanced. Furthermore, C=C in the alkyl chain or fluorinated alkyl chain portion
If C≡C groups are incorporated, it is possible to further improve the hardness of the chemisorption film itself since it can be crosslinked by electron beam irradiation of about 5 megarads after formation of the chemisorption film.
【0012】アルキル基を有するクロロシラン系界面活
性剤としては、例えば、CH3(CH2)18SiCl
3,CH3(CH2)15SiCl3,CH3(CH2
)10SiCl3,CH3(CH2)25SiCl3等
のようなトリクロルシラン系界面活性剤を始め、例えば
CH3(CH2)18SiCln(CH3)3−n,C
H3(CH2)18SiCln(C2H5)3−n,C
H3(CH2)15SiCln(CH3)3−n,CH
3(CH2)10SiCln(CH3)3−n,CH3
(CH2)25SiCln(C2H5)3−n等のよう
な低級アルキル基置換のモノクロルシラン系あるいはジ
クロルシラン系界面活性剤が挙げられる。この中でもC
H3(CH2)nSiCl3(但し式中のnは整数であ
り、3〜25程度が最も扱いやすい)が、溶剤溶解性の
点で好ましい。また、例えばCH2=CH(CH2)n
SiCl3(但し式中のnは整数であり、3〜25程度
が最も扱いやすい)等のように、クロロシラン系界面活
性剤のアルキル基の末端にビニル基を有していてもよい
。このような炭化水素基を含むクロロシラン系界面活性
剤は、前述したように例えば酸素雰囲気中で例えば電子
線、X線、γ線、紫外線等の放射線照射により末端を水
酸基に変えることができ、高分子組成物を親水性化する
ことができる。本発明に供されるクロロシラン系界面活
性剤は、上述に例示したように直鎖状だけではなく、フ
ッ化アルキル基又は炭化水素基が分岐した形状でも、又
は末端の珪素にフッ化アルキル基もしくは炭化水素基が
置換した形状(即ちR、R1、R2、R3をフッ化アル
キル基又は炭化水素基として一般式R2SiCl2、R
3SiCl、R1R2SiCl2もしくはR1R2R3
SiCl等)であってもよいが、吸着密度を高めるため
には一般には直鎖状が好ましい。さらに、例えば、Si
Cl4、SiHCl3、SiH2Cl2、Cl−(Si
Cl2O)n−SiCl3(但し式中nは自然数)、S
iClm(CH3)4−m、SiClm(C2H5)4
−m(但し式中mは1〜3の整数)、HSiCll(C
H3)3−l、HSiCll(C2H5)3−l(但し
式中lは1又は2)等のようなクロロシリル結合を複数
個含む物質を化学吸着させた後水と反応すると、表面の
クロロシリル結合が親水性のシラノール結合に変わり、
高分子組成物が親水性となる。なお、このクロロシリル
基を複数個含む物質の中でも、テトラクロロシラン(S
iCl4)は反応性が高く分子量も小さいためより高密
度にシラノール結合を付与できるため好ましい。このよ
うにして親水性化すると、高分子を含む基体の酸化処理
よりも親水性をより高くすることができる。このように
超親水性にした高分子組成物はそのままだけでも使用で
きるが、この上に例えばフッ化アルキル基を含むクロロ
シラン系界面活性剤を化学吸着でき、このようにして得
た化学吸着膜はより高密度化されるため、溌水性、溌油
性及び防汚性等の機能がより高められる。As the chlorosilane surfactant having an alkyl group, for example, CH3(CH2)18SiCl
3,CH3(CH2)15SiCl3,CH3(CH2
)10SiCl3, CH3(CH2)25SiCl3, etc., as well as trichlorosilane surfactants such as CH3(CH2)18SiCln(CH3)3-n,C
H3(CH2)18SiCln(C2H5)3-n,C
H3(CH2)15SiCln(CH3)3-n,CH
3(CH2)10SiCln(CH3)3-n,CH3
Examples include lower alkyl group-substituted monochlorosilane or dichlorosilane surfactants such as (CH2)25SiCln(C2H5)3-n. Among these, C
H3(CH2)nSiCl3 (where n in the formula is an integer, and about 3 to 25 is easiest to handle) is preferred from the viewpoint of solvent solubility. Also, for example, CH2=CH(CH2)n
The alkyl group of the chlorosilane surfactant may have a vinyl group at the end, such as SiCl3 (where n in the formula is an integer, and is easiest to handle from about 3 to 25). As mentioned above, the terminals of chlorosilane surfactants containing hydrocarbon groups can be changed into hydroxyl groups by irradiation with electron beams, X-rays, γ-rays, ultraviolet rays, etc. in an oxygen atmosphere, and Molecular compositions can be rendered hydrophilic. The chlorosilane surfactant used in the present invention is not only linear as exemplified above, but also has a branched form with a fluorinated alkyl group or a hydrocarbon group, or a fluorinated alkyl group or a hydrocarbon group on the terminal silicon. A form in which a hydrocarbon group is substituted (i.e., a form with the general formula R2SiCl2, R
3SiCl, R1R2SiCl2 or R1R2R3
SiCl, etc.) may be used, but in order to increase the adsorption density, a straight chain is generally preferred. Furthermore, for example, Si
Cl4, SiHCl3, SiH2Cl2, Cl-(Si
Cl2O) n-SiCl3 (where n is a natural number in the formula), S
iClm(CH3)4-m, SiClm(C2H5)4
-m (where m is an integer from 1 to 3), HSiCll (C
When a substance containing multiple chlorosilyl bonds such as H3)3-l, HSiCl(C2H5)3-l (where l is 1 or 2 in the formula) is chemically adsorbed and then reacted with water, the chlorosilyl bonds on the surface are Converts into a hydrophilic silanol bond,
The polymer composition becomes hydrophilic. Among the substances containing multiple chlorosilyl groups, tetrachlorosilane (S
iCl4) is preferable because it has high reactivity and a small molecular weight, so it can provide silanol bonds with higher density. By making the substrate hydrophilic in this way, the hydrophilicity can be made higher than by oxidation treatment of a substrate containing a polymer. Although the polymer composition made superhydrophilic in this way can be used as it is, for example, a chlorosilane surfactant containing a fluorinated alkyl group can be chemically adsorbed onto it, and the chemically adsorbed film obtained in this way can be Since the density is higher, functions such as water repellency, oil repellency, and stain resistance are further enhanced.
【0013】本発明の高分子組成物の製造方法は、高分
子を含む基体表面を酸化処理して親水性にする工程と、
酸化処理した表面を非水系の有機溶媒に浸漬して、この
表面にクロロシラン系界面活性剤を化学吸着させ、シロ
キサン結合を有する化学吸着膜を形成する工程を含む。The method for producing a polymer composition of the present invention includes the steps of oxidizing the surface of a substrate containing a polymer to make it hydrophilic;
The method includes a step of immersing the oxidized surface in a non-aqueous organic solvent to chemically adsorb a chlorosilane surfactant onto the surface to form a chemically adsorbed film having siloxane bonds.
【0014】高分子を含む基体を酸化処理する方法とし
ては、例えば酸素プラズマ処理、コロナ処理、もしくは
濃硫酸と重クロム酸カリウムの混合溶液に浸漬する方法
(クロム混酸液処理)等通常の手法が適用される。[0014] As a method for oxidizing a substrate containing a polymer, conventional methods such as oxygen plasma treatment, corona treatment, or immersion in a mixed solution of concentrated sulfuric acid and potassium dichromate (chromium mixed acid solution treatment) are available. Applicable.
【0015】本発明の高分子組成物の製造方法に用いる
非水系溶媒は、化学吸着膜を形成する基体に含まれる高
分子を溶解せず、かつクロロシラン系界面活性剤と反応
する活性水素を持たない有機溶媒であればよい。その例
として例えば1,1−ジクロロ,1−フルオロエタン、
1,1−ジクロロ,2、2、2−トリフルオロエタン、
1,1−ジクロロ,2,2,3,3,3−ペンタフルオ
ロプロパン、1,3−ジクロロ,1,1,2,2,3−
ヘプタフルオロプロパン等のフッ素系溶媒、例えばヘキ
サン、オクタン、ヘキサデカン、シクロヘキサン等の炭
化水素系溶媒、例えばジブチルエーテル、ジベンジルエ
ーテル等のエーテル系溶媒、例えば酢酸メチル、酢酸エ
チル、酢酸イソプロピル、酢酸アミル等エステル系溶媒
の何れかが好ましい。[0015] The non-aqueous solvent used in the method for producing the polymer composition of the present invention does not dissolve the polymer contained in the substrate forming the chemisorption film and has active hydrogen that reacts with the chlorosilane surfactant. Any organic solvent may be used. Examples include 1,1-dichloro,1-fluoroethane,
1,1-dichloro,2,2,2-trifluoroethane,
1,1-dichloro,2,2,3,3,3-pentafluoropropane, 1,3-dichloro,1,1,2,2,3-
Fluorine solvents such as heptafluoropropane; hydrocarbon solvents such as hexane, octane, hexadecane, and cyclohexane; ether solvents such as dibutyl ether and dibenzyl ether; methyl acetate, ethyl acetate, isopropyl acetate, amyl acetate, etc. Any of the ester solvents is preferred.
【0016】また、本発明の高分子組成物表面に形成さ
れる化学吸着膜は、単分子化学吸着膜一層だけでも充分
に機能が発揮される。単分子化学吸着膜を一層だけ形成
するには、クロロシラン系界面活性剤又はクロロシリル
基を複数個含む物質を化学吸着した後、水分に接触させ
ないで非水系の溶剤で洗浄するだけでよく、特別な工程
を要しなく簡便に行える。また、化学吸着膜は単分子膜
が累積していても良いこと勿論である。このように、化
学吸着膜が単分子膜を形成すると、付与された機能性を
示す基が配向し、密度も向上するためより高機能を発揮
できる。Further, the chemically adsorbed film formed on the surface of the polymer composition of the present invention can sufficiently exhibit its function even with only one layer of monomolecular chemically adsorbed film. To form only one layer of monomolecular chemisorption film, all that is required is to chemically adsorb a chlorosilane surfactant or a substance containing multiple chlorosilyl groups and then wash it with a non-aqueous solvent without contacting it with water. It can be easily performed without requiring any steps. Furthermore, it goes without saying that the chemically adsorbed film may be an accumulation of monomolecular films. In this way, when the chemically adsorbed film forms a monomolecular film, the groups exhibiting the imparted functionality are oriented, and the density is also improved, so that higher functionality can be exhibited.
【0017】次に具体的実施例を用いて本発明を説明す
る。実施例1
高分子を含む基体として縦横各5cmで厚み0.3cm
のポリカーボネート基板を用い、UVドライ・ストリッ
パー(UV−1、サムコインターナショナル製)中で酸
素流量1l/minの条件で酸素プラズマ処理を10分
間施して表面を酸化処理した後、フッ化アルキル基を含
むクロロシラン系界面活性剤としてヘプタデカフルオロ
デシルトリクロロシランを用い、濃度10−2mol/
lのシクロヘキサン溶液に窒素雰囲気下室温で60分間
浸漬し、引き続いて未反応のヘプタデカフルオロデシル
トリクロロシランをシクロヘキサンで洗浄して、しかる
後純水で洗浄し、フッ化アルキル基を含むシロキサン結
合を介した化学吸着単分子膜をポリカーボネート基板表
面に形成した。Next, the present invention will be explained using specific examples. Example 1 A substrate containing a polymer, 5 cm in length and width and 0.3 cm in thickness.
Using a polycarbonate substrate of Heptadecafluorodecyltrichlorosilane was used as the chlorosilane surfactant, and the concentration was 10-2 mol/
1 of cyclohexane solution for 60 minutes at room temperature under a nitrogen atmosphere, and subsequently, unreacted heptadecafluorodecyltrichlorosilane was washed with cyclohexane, and then washed with pure water to remove the siloxane bond containing the fluorinated alkyl group. A chemically adsorbed monolayer was formed on the surface of a polycarbonate substrate.
【0018】実施例2
実施例1のポリカーボネート基板をアクリル樹脂基板に
、ヘプタデカフルオロデシルトリクロロシランをトリデ
カフルオロオクチルトリクロルシランに、シクロヘキサ
ンを1,1−ジクロロ,2,2,3,3,3−ペンタフ
ルオロプロパンに変えて、実施例1と同様に実験をした
。Example 2 The polycarbonate substrate of Example 1 was replaced with an acrylic resin substrate, heptadecafluorodecyltrichlorosilane was replaced with tridecafluorooctyltrichlorosilane, and cyclohexane was replaced with 1,1-dichloro,2,2,3,3,3. - An experiment was carried out in the same manner as in Example 1 except that pentafluoropropane was used.
【0019】実施例3
実施例1のポリカーボネート基板をポリプロピレン基板
に、ヘプタデカフルオロオクチルトリクロロシランをパ
ーフルオロドデシルトリクロルシランに変えて、実施例
1と同様の実験をした。Example 3 An experiment similar to Example 1 was conducted except that the polycarbonate substrate in Example 1 was replaced with a polypropylene substrate, and heptadecafluorooctyltrichlorosilane was replaced with perfluorododecyltrichlorosilane.
【0020】実施例4
実施例1のポリカーボネート基板をABS樹脂基板に変
えて、実施例1と同様の実験をした。Example 4 The same experiment as in Example 1 was conducted except that the polycarbonate substrate in Example 1 was replaced with an ABS resin substrate.
【0021】実施例5
実施例1のポリカーボネート基板をエポキシ樹脂基板に
、シクロヘキサンをジブチルエーテルに変えて、実施例
1と同様の実験をした。Example 5 An experiment similar to Example 1 was conducted except that the polycarbonate substrate in Example 1 was replaced with an epoxy resin substrate and cyclohexane was replaced with dibutyl ether.
【0022】実施例6
実施例1のポリカーボネート基板をポリウレタン樹脂基
板に、シクロヘキサンを酢酸エチルに変えて、実施例1
と同様の実験をした。Example 6 Example 1 was prepared by changing the polycarbonate substrate of Example 1 to a polyurethane resin substrate and replacing cyclohexane with ethyl acetate.
conducted a similar experiment.
【0023】実施例7
実施例1のポリカーボネート基板をブタジエン−スチレ
ンゴム基板に、シクロヘキサンを1,1−ジクロロ,2
,2,3,3,3−ペンタフルオロプロパンに変えて、
実施例1と同様に実験をした。Example 7 The polycarbonate substrate of Example 1 was replaced with a butadiene-styrene rubber substrate, and cyclohexane was replaced with 1,1-dichloro,2
,2,3,3,3-pentafluoropropane,
An experiment was conducted in the same manner as in Example 1.
【0024】実施例8
実施例1のポリカーボネート基板をブチルゴム基板に、
シクロヘキサンを1,1−ジクロロ,2,2,3,3,
3−ペンタフルオロプロパンに変えて、実施例1と同様
に実験をした。Example 8 The polycarbonate substrate of Example 1 was replaced with a butyl rubber substrate.
Cyclohexane is 1,1-dichloro, 2,2,3,3,
An experiment was carried out in the same manner as in Example 1 except that 3-pentafluoropropane was used.
【0025】実施例9
実施例1のポリカーボネート基板をニトリルゴム基板に
、シクロヘキサンを1,1−ジクロロ,2,2,3,3
,3−ペンタフルオロプロパンに変えて、実施例1と同
様に実験をした。Example 9 The polycarbonate substrate of Example 1 was replaced with a nitrile rubber substrate, and cyclohexane was replaced with 1,1-dichloro,2,2,3,3
, 3-pentafluoropropane was used, and an experiment was carried out in the same manner as in Example 1.
【0026】実施例10
実施例1のヘプタデカフルオロオクチルトリクロロシラ
ンを18−ノナデセニルトリクロルシランに変え、化学
吸着単分子膜形成後、酸素雰囲気下で300keV、0
.02Mrads−1の電子線を1分間照射した。Example 10 The heptadecafluorooctyltrichlorosilane of Example 1 was changed to 18-nonadecenyltrichlorosilane, and after forming a chemically adsorbed monomolecular film, it was heated at 300 keV and 0 in an oxygen atmosphere.
.. 02 Mrads-1 electron beam was irradiated for 1 minute.
【0027】実施例11
実施例1のヘプタデカフルオロオクチルトリクロロシラ
ンをテトラクロロシランに変え、実施例1と同様に実験
をした。Example 11 An experiment was conducted in the same manner as in Example 1 except that heptadecafluorooctyltrichlorosilane in Example 1 was replaced with tetrachlorosilane.
【0028】実施例12
実施例1において、酸化処理する方法を10wt%の重
クロム酸カリを含有する濃硫酸に5分浸漬する方法に変
えて、実施例1と同様に実験をした。Example 12 An experiment was carried out in the same manner as in Example 1, except that the oxidation treatment method was changed to a method of immersion in concentrated sulfuric acid containing 10 wt % potassium dichromate for 5 minutes.
【0029】比較例1
ポリカーボネート基板の表面にシランカップリング剤(
ヘプタデカフルオロデシルトリメトキシシラン)の2w
t%メタノール溶液をスピンコートした後、120℃で
1時間乾燥した。Comparative Example 1 A silane coupling agent (
2w of heptadecafluorodecyltrimethoxysilane)
After spin-coating a t% methanol solution, it was dried at 120° C. for 1 hour.
【0030】比較例2
実施例1のポリカーボネート基板を酸化処理せずに、ヘ
プタデカフルオロデシルトリクロロシランの化学吸着単
分子膜を形成した。Comparative Example 2 A chemically adsorbed monomolecular film of heptadecafluorodecyltrichlorosilane was formed on the polycarbonate substrate of Example 1 without oxidation treatment.
【0031】比較例3
実施例1のポリカーボネート基板の表面にポリテトラフ
ルオロエチレンの懸濁液をスプレーコートし、120℃
で1時間加熱乾燥した。Comparative Example 3 A suspension of polytetrafluoroethylene was spray-coated on the surface of the polycarbonate substrate of Example 1, and then heated at 120°C.
It was heated and dried for 1 hour.
【0032】実施例1〜12および比較例1〜2の試料
の超純水および油(日清サラダ油)に対する接触角を調
べた。接触角の測定は化学吸着膜あるいはコーティング
膜を形成した直後と、および水でぬらした布で表面を1
0000回摩擦した後とで行った。その結果を表1に示
す。The contact angles of the samples of Examples 1 to 12 and Comparative Examples 1 to 2 with respect to ultrapure water and oil (Nissin Salad Oil) were investigated. The contact angle was measured immediately after forming the chemisorbed film or coating film, and once on the surface with a cloth moistened with water.
The test was performed after 0,000 times of rubbing. The results are shown in Table 1.
【0033】[0033]
【表1】[Table 1]
【0034】(表1)から明らかなように、本発明の高
分子組成物では表面を水を含んだ布で繰り返し擦って洗
浄した後でも、撥水・撥油性あるいは親水性を保持して
いたが、比較例1では撥水・撥油性がなくなっていた。
また、高分子組成物の表面を酸化処理しなかった比較例
2の試料では、シロキサン結合を有する化学吸着膜を形
成することができなかった。[0034] As is clear from Table 1, the polymer composition of the present invention retained its water- and oil-repellency or hydrophilicity even after the surface was washed by repeatedly rubbing it with a water-containing cloth. However, in Comparative Example 1, water and oil repellency were lost. Furthermore, in the sample of Comparative Example 2 in which the surface of the polymer composition was not subjected to oxidation treatment, a chemisorption film having siloxane bonds could not be formed.
【0035】本発明の高分子組成物で、表面にフッ化ア
ルキル基を含有する化学吸着単分子膜を形成したものは
防汚性が優れていた。摩擦試験後、実施例1の試料をサ
ラダ油に浸漬し、ティッシュペーパーで拭き取ると、油
分がきれいにふきとれたが、比較例の1の試料では、テ
ィッシュペーパーで数回拭き取った後でも、表面に油膜
ができべとついていた。The polymer composition of the present invention in which a chemically adsorbed monomolecular film containing a fluorinated alkyl group was formed on the surface had excellent antifouling properties. After the friction test, the sample of Example 1 was dipped in salad oil and wiped with tissue paper, and the oil was wiped off cleanly, but in the sample of Comparative Example 1, even after wiping it with tissue paper several times, an oil film remained on the surface. It was sticky.
【0036】本発明の高分子組成物では、光学材料とし
ても利用できる。実施例1のポリカーボネート基板の可
視光に対する透過率は92%で、化学吸着単分子膜を形
成する前と変化なかったが、比較例3のポリテトラフル
オロエチレンをコーティングした試料では、透過率が5
0%以下に低下しかつ、すり硝子のように透明度が悪く
なっていた。The polymer composition of the present invention can also be used as an optical material. The visible light transmittance of the polycarbonate substrate of Example 1 was 92%, which was unchanged from before forming the chemically adsorbed monomolecular film, but in the sample coated with polytetrafluoroethylene of Comparative Example 3, the transmittance was 92%.
The transparency decreased to 0% or less, and the transparency became poor like that of frosted glass.
【0037】なお、上記実施例で述べた化学吸着膜は何
れも単分子膜一層だけの場合であるが、化学吸着単分子
膜を累積した高分子組成物でも、未反応のクロロシラン
系界面活性剤を洗浄せずに形成した化学吸着膜でも、そ
の機能は何等変わるところがなかった。さらに、上記実
施例では何れも高分子を含む基体として高分子単独基板
を用いた例を示したが、例えば充填剤、可塑剤又は着色
剤等を含有した高分子であっても、高分子組成物に付与
された機能には何等変化がなかった。Note that the chemically adsorbed films described in the above examples are cases where only a single layer of monomolecular film is used, but even if the polymer composition has an accumulation of chemically adsorbed monomolecular films, unreacted chlorosilane surfactant Even when the chemically adsorbed film was formed without washing, there was no change in its functionality. Furthermore, in each of the above examples, an example was shown in which a single polymer substrate was used as a substrate containing a polymer, but even if the polymer contains a filler, a plasticizer, a coloring agent, etc., the polymer composition There was no change in the function given to the object.
【0038】[0038]
【発明の効果】以上のように本発明の高分子組成物は、
表面にシロキサン結合を有する化学吸着膜が設けられて
いるので、従来のものに比べて、繰り返し洗浄に対する
耐久性が優れ、化学吸着膜がフッ化アルキル基を含む場
合には高特性の撥水・撥油・防汚性をしめす。[Effects of the Invention] As described above, the polymer composition of the present invention has
Since a chemisorption film with siloxane bonds is provided on the surface, it has superior durability against repeated cleaning compared to conventional products, and when the chemisorption film contains fluorinated alkyl groups, it has high water repellency and Shows oil and dirt repellency.
【0039】また、本発明の高分子組成物の製造方法で
は、高分子組成物の表面をあらかじめ酸化処理すること
により、簡単に前記高分子組成物表面にクロロシラン系
界面活性剤を化学吸着させ、シロキサン結合を有する化
学吸着膜を形成することができる。このように本発明は
工業的価値の大なるものである。Further, in the method for producing a polymer composition of the present invention, the surface of the polymer composition is oxidized in advance to easily chemically adsorb the chlorosilane surfactant onto the surface of the polymer composition. A chemisorption film having siloxane bonds can be formed. As described above, the present invention has great industrial value.
【図1】本発明の高分子組成物の一実施例の断面図FIG. 1: Cross-sectional view of an example of the polymer composition of the present invention.
1 高分子を含む基体 2 シロキサン結合 3 化学吸着膜 1 Substrate containing polymer 2 Siloxane bond 3. Chemical adsorption membrane
Claims (7)
結合を有する化学吸着膜が設けられたことを特徴とする
高分子組成物。1. A polymer composition characterized in that a chemisorption film having a siloxane bond is provided on the surface of a substrate containing a polymer.
くはアルキル基を含有することを特徴とする、請求項1
記載の高分子組成物。[Claim 2] Claim 1, wherein the chemisorption film contains a fluorinated alkyl group or an alkyl group.
The polymeric composition described.
徴とする、請求項1もしくは2何れかに記載の高分子組
成物。3. The polymer composition according to claim 1, wherein the chemically adsorbed film is a monomolecular film.
脂もしくはゴムの何れかである請求項1記載の高分子組
成物。4. The polymer composition according to claim 1, wherein the polymer is a thermoplastic resin, a thermosetting resin, or a rubber.
酸化工程と、非水系有機溶媒に前記高分子組成物を浸漬
して、前記高分子組成物表面にクロロシラン系界面活性
剤を化学吸着させ、シロキサン結合を有する化学吸着膜
を形成する工程とを有することを特徴とする高分子組成
物の製造方法。5. An oxidation step of oxidizing the surface of a base material containing a polymer, and immersing the polymer composition in a non-aqueous organic solvent to chemically adsorb a chlorosilane surfactant onto the surface of the polymer composition. and forming a chemically adsorbed film having siloxane bonds.
炭化水素系溶媒、エーテル系溶媒、エステル系溶媒の何
れかであることを特徴とする、請求項6記載の高分子組
成物の製造方法。[Claim 6] The non-aqueous organic solvent is a fluorine-containing solvent,
7. The method for producing a polymer composition according to claim 6, wherein the solvent is a hydrocarbon solvent, an ether solvent, or an ester solvent.
ら形成されるを特徴とする請求項6記載の高分子組成物
の製造方法。7. The method for producing a polymer composition according to claim 6, wherein the chemisorption film is formed from tetrachlorosilane.
Priority Applications (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3008321A JPH0791402B2 (en) | 1991-01-28 | 1991-01-28 | Method for producing polymer composition |
CA 2054094 CA2054094C (en) | 1990-10-25 | 1991-10-23 | Chemically adsorbed monomolecular lamination film |
DE1991622212 DE69122212T2 (en) | 1990-10-25 | 1991-10-23 | Monomolecular film laminated by chemical adsorption and process for its production |
EP19910118094 EP0484746B1 (en) | 1990-10-25 | 1991-10-23 | Chemically adsorbed monomolecular lamination film and method of manufacturing the same |
KR1019910018799A KR950004153B1 (en) | 1990-10-25 | 1991-10-25 | Chemically adsorbed monomolecular lamination film and method of manufacturing the same |
US08/037,727 US5380585A (en) | 1990-10-25 | 1993-03-26 | Chemically adsorbed monomolecular lamination film |
US08/316,105 US5466486A (en) | 1990-10-25 | 1994-09-30 | Chemically adsorbed monomolecular lamination film |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3008321A JPH0791402B2 (en) | 1991-01-28 | 1991-01-28 | Method for producing polymer composition |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH04252235A true JPH04252235A (en) | 1992-09-08 |
JPH0791402B2 JPH0791402B2 (en) | 1995-10-04 |
Family
ID=11689901
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3008321A Expired - Lifetime JPH0791402B2 (en) | 1990-10-25 | 1991-01-28 | Method for producing polymer composition |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0791402B2 (en) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06264051A (en) * | 1993-03-15 | 1994-09-20 | Matsushita Electric Ind Co Ltd | Film for preventing ice and snow accretion and its production |
JP2006109556A (en) * | 2004-10-01 | 2006-04-20 | Matsushita Electric Ind Co Ltd | Method of manufacturing insulation film and dynamo-electric machine and enclosed compressor using same |
JP2010241984A (en) * | 2009-04-07 | 2010-10-28 | Kyushu Univ | Method for treatment of cyclic olefin-based resin and molded product |
WO2014010219A1 (en) * | 2012-07-10 | 2014-01-16 | 日本曹達株式会社 | Thin-film laminate having self-assembled monolayer |
JPWO2016006212A1 (en) * | 2014-07-11 | 2017-05-25 | 日本曹達株式会社 | Laminate |
WO2018159641A1 (en) * | 2017-03-02 | 2018-09-07 | Agc株式会社 | Production method for fluorine-containing silane compound, and fluorine-containing silane compound |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6040254A (en) * | 1983-08-16 | 1985-03-02 | 旭硝子株式会社 | Water-repellent oil-repellent film |
JPH02248480A (en) * | 1989-03-22 | 1990-10-04 | Asahi Glass Co Ltd | Transparent substrate material with water-repellent and antistaining properties, and structure equipped therewith |
-
1991
- 1991-01-28 JP JP3008321A patent/JPH0791402B2/en not_active Expired - Lifetime
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6040254A (en) * | 1983-08-16 | 1985-03-02 | 旭硝子株式会社 | Water-repellent oil-repellent film |
JPH02248480A (en) * | 1989-03-22 | 1990-10-04 | Asahi Glass Co Ltd | Transparent substrate material with water-repellent and antistaining properties, and structure equipped therewith |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06264051A (en) * | 1993-03-15 | 1994-09-20 | Matsushita Electric Ind Co Ltd | Film for preventing ice and snow accretion and its production |
JP2006109556A (en) * | 2004-10-01 | 2006-04-20 | Matsushita Electric Ind Co Ltd | Method of manufacturing insulation film and dynamo-electric machine and enclosed compressor using same |
JP2010241984A (en) * | 2009-04-07 | 2010-10-28 | Kyushu Univ | Method for treatment of cyclic olefin-based resin and molded product |
WO2014010219A1 (en) * | 2012-07-10 | 2014-01-16 | 日本曹達株式会社 | Thin-film laminate having self-assembled monolayer |
JP5870190B2 (en) * | 2012-07-10 | 2016-02-24 | 日本曹達株式会社 | Thin film laminate with self-assembled film |
JPWO2016006212A1 (en) * | 2014-07-11 | 2017-05-25 | 日本曹達株式会社 | Laminate |
WO2018159641A1 (en) * | 2017-03-02 | 2018-09-07 | Agc株式会社 | Production method for fluorine-containing silane compound, and fluorine-containing silane compound |
JPWO2018159641A1 (en) * | 2017-03-02 | 2019-12-19 | Agc株式会社 | Method for producing fluorine-containing silane compound and fluorine-containing silane compound |
Also Published As
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---|---|
JPH0791402B2 (en) | 1995-10-04 |
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