JP2506234B2 - Method for manufacturing translucent substrate - Google Patents

Method for manufacturing translucent substrate

Info

Publication number
JP2506234B2
JP2506234B2 JP2405755A JP40575590A JP2506234B2 JP 2506234 B2 JP2506234 B2 JP 2506234B2 JP 2405755 A JP2405755 A JP 2405755A JP 40575590 A JP40575590 A JP 40575590A JP 2506234 B2 JP2506234 B2 JP 2506234B2
Authority
JP
Japan
Prior art keywords
group
translucent substrate
sicl
substrate
hydrophilic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP2405755A
Other languages
Japanese (ja)
Other versions
JPH04221630A (en
Inventor
小川  一文
規央 美濃
眞守 曽我
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Corp
Panasonic Holdings Corp
Original Assignee
Panasonic Corp
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Panasonic Corp, Matsushita Electric Industrial Co Ltd filed Critical Panasonic Corp
Priority to JP2405755A priority Critical patent/JP2506234B2/en
Priority to DE69129145T priority patent/DE69129145T2/en
Priority to EP91122017A priority patent/EP0492545B1/en
Priority to CA002058341A priority patent/CA2058341C/en
Priority to KR1019910024106A priority patent/KR970002941B1/en
Publication of JPH04221630A publication Critical patent/JPH04221630A/en
Priority to US08/431,578 priority patent/US5580605A/en
Priority claimed from US08/431,578 external-priority patent/US5580605A/en
Priority claimed from JP7229102A external-priority patent/JP2690876B2/en
Application granted granted Critical
Publication of JP2506234B2 publication Critical patent/JP2506234B2/en
Priority to US09/570,264 priority patent/US6521334B1/en
Priority to US09/804,854 priority patent/US6503567B2/en
Priority to US10/085,248 priority patent/US20020094375A1/en
Priority to US10/126,835 priority patent/US20020127331A1/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00Nanotechnology for materials or surface science, e.g. nanocomposites

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • Composite Materials (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Laminated Bodies (AREA)

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、透光性基体に関し、さ
らに詳しくは、乗り物のもしくは建物等の窓、乗り物の
、光学レンズ、眼鏡用レンズ等のように撥水撥油防汚
効果が要求される透光性基体に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a translucent substrate, and more particularly, to a window of a vehicle or a building, a vehicle.
The present invention relates to a light-transmitting substrate such as a window , an optical lens, and a lens for spectacles which requires a water-repellent, oil-repellent and antifouling effect.

【0002】[0002]

【従来の技術】従来、例えばガラス等の透光性基体の汚
れを防止するためには、表面をできるだけ滑らかにする
方法、表面に例えば弗素系被膜等の保護膜を塗布する方
法等が提案されている。また、透光性基体表面の曇を防
止するには、親水性のポリマーをコートする方法もしく
は透光性基体中あるいは透光性基体表面にヒーターを設
置する方法等が用いられている。
2. Description of the Related Art Conventionally, in order to prevent contamination of a light-transmitting substrate such as glass, a method of making the surface as smooth as possible, a method of coating a protective film such as a fluorine-based film on the surface, and the like have been proposed. ing. Further, in order to prevent the surface of the light-transmitting substrate from being fogged, a method of coating a hydrophilic polymer, a method of installing a heater in the light-transmitting substrate or on the surface of the light-transmitting substrate, and the like are used.

【0003】[0003]

【発明が解決しようとする課題】透光性基体の汚れが水
滴に起因する場合には、例えばヒーター設置により曇止
め効果は働く。しかしヒーターの電源が必要であり、又
埋没もしくは表面に設置されたヒーターが透光性基体の
透明度を妨げるという課題があった。また、例えば親水
性のポリマー等を塗布する手法は比較的簡便であるが、
効果は一時的であり、透光性基体表面を擦ると簡単に親
水性ポリマーが剥がれてしまう課題があった。
When the light-transmissive substrate is contaminated by water droplets, a heater is installed to provide an anti-fog effect. However, there is a problem that a power source for the heater is required, and that the heater buried or installed on the surface hinders the transparency of the translucent substrate. Also, for example, the method of applying a hydrophilic polymer or the like is relatively simple,
The effect is temporary, and there is a problem that the hydrophilic polymer is easily peeled off by rubbing the surface of the transparent substrate.

【0004】汚れの原因が水滴以外の場合には、これら
の手法はほぼ無意味であり、透光性基体の表面に弗素系
被膜の保護膜を塗布する方法が提案されているが、透光
性基体と弗素系保護膜との密着性が弱く簡単に剥がれ、
又弗素系保護膜自体の不透明性で透光性基体が曇るとい
う課題があり、他の保護膜材料では透明性及び密着性は
向上するが、汚れ成分を簡単に拭い取れないという課題
があった。従って、透光性基体の表面をできるだけ滑ら
かにする方法が実用的であるが、滑らかにするには限界
があり、結局積極的に汚れ防止や撥水撥油性処理を施し
た透光性基体はないという課題があった。
When the cause of contamination is other than water droplets, these methods are almost meaningless, and a method of applying a fluorine-based protective film on the surface of a light-transmitting substrate has been proposed. The adhesiveness between the flexible substrate and the fluorine-based protective film is weak and peels easily,
Further, there is a problem that the transparent substrate is clouded due to the opacity of the fluorine-based protective film itself, and other protective film materials have improved transparency and adhesiveness, but there is a problem that stain components cannot be easily wiped off. . Therefore, it is practical to make the surface of the light-transmitting substrate as smooth as possible, but there is a limit to smoothing the surface, and as a result, a light-transmitting substrate that has been actively subjected to stain prevention and water / oil repellency treatment There was a problem that there was not.

【0005】本発明の目的は、汚れが付着しないか、た
とえ付着しても簡単に除去されるような撥水性と防汚効
果の高い透光性基体を提供することにある。
An object of the present invention is to provide a light-transmissive substrate having high water repellency and high antifouling effect, in which dirt does not adhere, or even if dirt adheres, it is easily removed.

【0006】[0006]

【課題を解決するための手段】上記課題を解決するため
本発明の第1番目の透光性基体の製造方法は、表面に親
水性基を含むかまたは親水性基を含むように処理した透
光性成形体基体(透光性基体)の少なくとも一方の面
に、一端に反応性シリル基を有し、他端にフッ化炭素
を有するシラン系界面活性剤を溶かした非水系有機溶媒
溶液を接触させ、前記透光性基体の親水性基と前記シラ
ン系界面活性剤の反応性シリル基との間で脱塩酸反応さ
せることにより、フッ化炭素基を有し、かつ撥水撥油性
化学吸着単分子膜を前記透光性基体表面に形成するこ
とを特徴とする。
In order to solve the above-mentioned problems, the first method for producing a light-transmitting substrate according to the present invention has a surface- friendly method.
Water-permeable or treated to contain hydrophilic groups
A non-aqueous organic solvent in which a silane-based surfactant having a reactive silyl group at one end and a fluorocarbon group at the other end is dissolved on at least one surface of a light-molded body (translucent substrate).
Bring the solution into contact with the hydrophilic group of the translucent substrate and the sila.
Dehydrochlorination reaction with the reactive silyl group of the surfactant
Has a fluorocarbon group and is water and oil repellent
Characterized by the chemisorption monomolecular film shape formed on the light-transparent substrate table surface.

【0007】次に本発明の第2番目の透光性基体の製造
方法は、表面に親水性基を含むかまたは親水性基を含む
ように処理した透光性基体の少なくとも一方の面に、ク
ロロシリル基を含む内層膜用物質を混合した非水系溶媒
溶液を接触させ、次いで前記透光性基体上の未反応のク
ロロシリル基を含む物質を非水系有機溶媒を用い洗浄除
去し、次いで水分と反応させ前記透光性基体上にシラノ
ール基を含む物質よりなる内層膜用単分子膜を形成し、
その後、一端に反応性シリル基を有し他端にフッ化炭素
基を含むシラン系界面活性剤を溶かした非水系有機溶媒
溶液を接触させて、前記シラノール基を含む単分子膜上
フッ化炭素基を有し、かつ撥水撥油性の化学吸着単分
子吸着膜を累積することを特徴とする。
Next, the production of the second transparent substrate of the present invention
The method includes hydrophilic groups on the surface or includes hydrophilic groups
Non-aqueous solvent in which a substance for an inner layer film containing a chlorosilyl group is mixed on at least one surface of a translucent substrate treated in this way
After contacting the solution , the substance containing the unreacted chlorosilyl group on the translucent substrate is removed by washing with a non-aqueous organic solvent, and then reacted with water to react with the substance containing the silanol group on the translucent substrate. To form a monolayer film for inner layer
Then, a non-aqueous organic solvent in which a silane-based surfactant having a reactive silyl group at one end and a fluorocarbon group at the other end is dissolved.
It is characterized in that a solution is brought into contact to accumulate a water- and oil-repellent chemisorption monomolecular adsorption film having a fluorocarbon group on the silanol group-containing monomolecular film.

【0008】前記第2番目の方法においては、シラノー
ル形成と化学吸着単分子膜累積との間に、透光性基体の
一方の面を水溶性被膜でコートすることが好ましい。
た前記第1〜2番目の方法においては、反応性シリル基
が、クロロシリル基であることが好ましい。 また前記第
1〜2番目の方法においては、シラン系界面活性剤が、
CF 3 −(CF 2 n −(R) m −SiCl p
3-p (nは0または整数、mは0または1、Rは炭素数
1以上のメチレン基、含ビニレン基の炭素数1以上のメ
チレン基、含エチニレン基の炭素数1以上のメチレン
基、含シリコン原子の炭素数1以上のメチレン基または
含酸素原子の炭素数1以上のメチレン基の何れか、Xは
水素原子、低級アルキル基または低級アルコキシ基、p
は0〜2の整数)であることが好ましい。 また前記第2
番目の方法においては、内層膜用のクロロシリル基を含
む物質が、SiCl 4 、SiHCl 3 、SiH 2
2 、Cl−(SiCl 2 O) n −SiCl 3 (nは整
数)の何れかであることが好ましい。 また前記第1〜2
番目の方法においては、透光性基体が、樹脂製であるこ
とが好ましい。 また前記第1〜2番目の方法において
は、透光性基体表面をあらかじめ酸素又は窒素雰囲気中
で電子線照射またはイオンビーム照射処理することによ
り、親水性基を付与しておくことが好ましい。 また前記
第1〜2番目の方法においては、親水性基が、水酸基、
カルボニル基及びアミノ基から選ばれる活性水素を有す
る基であることが好ましい。 また前記第1〜2番目の方
法においては、透光性基体の表面にシラン系界面活性剤
を溶かした非水系有機溶媒を接触させた後、未反応物を
洗浄除去することが好ましい。
[0008]In the second method, silanol
Between the formation of the chemisorption film and the accumulation of the chemisorption monolayer.
It is preferable to coat one surface with a water-soluble coating. Ma
In the first to second methods, the reactive silyl group
Is preferably a chlorosilyl group. Also the above
In the first to second methods, the silane-based surfactant is
CF 3 − (CF 2 ) n -(R) m -SiCl p X
3-p (N is 0 or an integer, m is 0 or 1, R is the number of carbon atoms
1 or more methylene group, vinylene-containing group having 1 or more carbon atoms
Methylene having 1 or more carbon atoms, such as a tylene group or an ethynylene group.
Group, methylene group having 1 or more carbon atoms of silicon-containing atom, or
Any of the methylene groups having 1 or more carbon atoms of the oxygen-containing atom, X is
Hydrogen atom, lower alkyl group or lower alkoxy group, p
Is preferably an integer of 0 to 2). The second
In the second method, a chlorosilyl group for the inner layer film is included.
The substance is SiCl Four , SiHCl 3 , SiH 2 C
l 2 , Cl- (SiCl 2 O) n -SiCl 3 (N is an integer
It is preferably any of Also, the first and second
In the second method, the translucent substrate is made of resin.
Is preferred. In the first to second methods,
Is the surface of the translucent substrate in an oxygen or nitrogen atmosphere in advance.
By electron beam irradiation or ion beam irradiation
Therefore, it is preferable to add a hydrophilic group. Also the above
In the first to second methods, the hydrophilic group is a hydroxyl group,
Has active hydrogen selected from carbonyl and amino groups
Group is preferred. Also, the first to second
Method, a silane-based surfactant is applied to the surface of the translucent substrate.
After contacting the non-aqueous organic solvent in which the
It is preferable to remove by washing.

【0009】[0009]

【作用】前記した本発明の第1〜2番目の製造方法によ
れば、基体表面に形成された化学吸着単分子膜、ナノ
メータレベルの膜厚できわめて薄いため、基体本来の透
光性を損なうことがない。また、本発明の第1〜2番目
の製造方法によって得られる化学吸着単分子膜は撥水性
を有するため、表面の防汚効果を高めることが可能であ
る。さらに、透光性基体の一方の面に撥水性基を有する
化学吸着単分子膜を形成し、透光性基体の他方の面に親
水性基を含む化学吸着単分子膜を形成すると、一方の面
は撥水防汚効果と他方の面には防曇効果を有した透光性
基体が提供できる。
According to the above-mentioned first and second manufacturing methods of the present invention.
In this case, the chemisorption monomolecular film formed on the surface of the substrate is extremely thin at a nanometer level, so that the original translucency of the substrate is not impaired. The first to second aspects of the present invention
Since the chemisorption monomolecular film obtained by the method of 1. has water repellency, it is possible to enhance the antifouling effect on the surface. Further, when a chemisorption monomolecular film having a water-repellent group is formed on one surface of the translucent substrate and a chemisorption monomolecular film containing a hydrophilic group is formed on the other surface of the translucent substrate, It is possible to provide a light-transmitting substrate having a water-repellent antifouling effect on one side and an antifogging effect on the other side.

【0010】[0010]

【実施例】一般の透光性基体材料には、ガラスもしくは
プラスックが供される。基体材料がガラスであると表
面に例えば水酸基のような親水性基を含み、また基体材
料がプラスック材料でも簡単に酸化処理を行うことで
表面を親水性にすることができる。そこで、一端に反応
シリル基を有する炭素鎖を含む分子を溶解した非水系
有機溶媒に接触させると、表面の親水性基の活性水素と
反応性シリル基とが脱塩化水素反応し、含珪素化学結合
を介して単分子膜を形成する。このような反応を化学吸
着反応と言い、このようにして得た単分子膜を化学吸着
単分子膜と言う。化学吸着単分子膜は基体表面と強固な
化学結合を介しているため、透光性基体の表面を削り取
らない限り一般には剥離しない程度の付着強度を有す
る。この分子の他端に撥水性基を含有させると、この撥
水性が汚れ防止効果が発揮できる。
The EXAMPLES General of the translucent substrate material, glass or <br/> plastisol click is subjected. Substrate material comprises a hydrophilic group such as hydroxyl group to a the surface of the glass, also the substrate material can be a surface hydrophilic by performing simple oxidation treatment in plastisol click material. Therefore, when Ru is contacted in a non-aqueous organic solvent by dissolving a molecule comprising a carbon chain having a reactive silyl group at one end, with the active hydrogen of the hydrophilic groups on the surface and the reactive silyl group is dehydrochlorination, including A monolayer is formed via silicon chemical bonds. Such reaction is called the chemisorption reaction, thus the monomolecular film obtained by chemisorption intends monomolecular film and words. Since the chemisorption monomolecular film has a strong chemical bond with the surface of the substrate, the chemisorption monolayer generally has an adhesive strength that does not cause peeling unless the surface of the translucent substrate is scraped off. When a water-repellent group is contained at the other end of this molecule, the water-repellent property can exert an antifouling effect .

【0011】本発明の透光性基体材料には前記したよう
に、例えばアクリル樹脂、ポリカーボネイト樹脂等のプ
ラスチックが好ましく供される。本発明の透光性基体表
面には親水性基が露出している必要があり、親水性基と
しては水酸基、カルボニル基、アミノ基等の活性水素を
有する基があげられる。透光性基体材料表面に親水性基
が少ない場合には、例えば酸素又は窒素雰囲気中での電
子線照射、イオンビーム照射等通常の手法で親水性化し
て供される。
The translucent substrate material of the present invention is as described above.
To, for example, an acrylic resin, a plastic such as polycarbonate resin Ru is preferably provided. It is necessary that a hydrophilic group is exposed on the surface of the transparent substrate of the present invention, and examples of the hydrophilic group include groups having active hydrogen such as a hydroxyl group, a carbonyl group and an amino group. When there are few hydrophilic groups on the surface of the light-transmitting substrate material, the material is rendered hydrophilic by a usual method such as electron beam irradiation in an oxygen or nitrogen atmosphere, ion beam irradiation, or the like.

【0012】本発明に供される化学吸着単分子膜の構成
分子としては、一端にクロロシリル(−SiCln
3-n )基又はアルコキシシリル(−Si(OA)n
3-n )基を含有し、他端に炭化水素基又は弗素置換した
炭素を含有するシラン系界面活性剤が挙げられる。但し
式中のnは1〜3の整数であり、Xは水素、低級アルキ
ル基又は低級アルコキシ基を表わし、Aは低級アルキル
基を表わす。上記シラン系界面活性剤の内クロルシラン
系界面活性剤は、室温下で化学吸着反応を行え確実に化
学吸着単分子膜が形成できるため好ましい。クロルシラ
ン系界面活性剤の内でもトリクロルシリル基(即ち式中
のnが3)であると、吸着分子間でもシロキサン結合を
介するため好ましい。また、本発明に供されるシラン系
界面活性剤は、吸着分子密度を向上させるには直鎖状が
好ましい。具体的にはCH3 −(R)m −SiCln
3-n 、CF3 −(CF2 p −(R)m −SiCln
3-n で表わされるクロルシラン系界面活性剤が好まし
い。但し式中pは0または整数、mは0または1、Rは
炭素数1以上のメチレン基、含ビニレン基の炭素数1以
上のメチレン基、含エチニレン基の炭素数1以上のメチ
レン基、含シリコン原子の炭素数1以上のメチレン基ま
たは含酸素原子の炭素数1以上のメチレン基の何れか、
Xは水素原子、低級アルキル基または低級アルコキシ
基、nは0〜2の整数である。更に具体的には下記の化
合物等が挙げられる。 (1) CH3 (CH2 9 SiCl3 (2) CH3 (CH2 15SiCl3 (3) CH3 CH2 O(CH2 15SiCl3 (4) CH3 (CH2 2 Si(CH3 2 (CH2 15SiCl3 (5) CF3 (CF2 7 (CH2 2 SiCl3 (6) CF3 CH2 O(CH2 15SiCl3 (7) CF3 (CH2 2 Si(CH3 2 (CH2 15SiCl3 (8) F(CF2 4 (CH2 2 Si(CH3 2 (CH2 9 SiCl3 (9) CF3 COO(CH2 15SiCl3 (10) CF3 (CF2 5 (CH2 2 SiCl3 また、上記式中のR基がビニレン基またはエチニレン基
を含有すると、触媒、光又は高エネルギー線照射等で不
飽和結合を重合させることにより、分子間に結合が生じ
より強固な単分子膜となるため好ましい。なお、撥水性
基として含フッ化炭素を用いると撥水効果が大きく又撥
油効果も発揮できるため特に好ましい。
[0012] as a molecular chemisorption monomolecular film is subjected to the present invention, one end Kuroroshi Lil (-SiCl n X
3-n) groups, or alkoxysilane Lil (-Si (OA) n X
Examples thereof include a silane-based surfactant containing a 3-n ) group and a hydrocarbon group or a fluorine-substituted carbon at the other end. However, n in the formula is an integer of 1 to 3, X represents hydrogen, a lower alkyl group or a lower alkoxy group, and A represents a lower alkyl group. Of the above-mentioned silane-based surfactants, chlorosilane-based surfactants are preferable because they can perform a chemisorption reaction at room temperature and can reliably form a chemisorption monomolecular film. When trichloro silyl group Among the chlorosilane-based surface active agent (n ie in the formula 3) is preferable because through siloxane bonds even between the adsorbed molecules. The silane-based surfactant used in the present invention is preferably linear in order to improve the density of adsorbed molecules. Specifically CH 3 - (R) m -SiCl n X
3-n, CF 3 - ( CF 2) p - (R) m -SiCl n X
Chlorosilane-based surfactants represented by 3-n are preferred. However, in the formula, p is 0 or an integer, m is 0 or 1, R is a methylene group having 1 or more carbon atoms, a methylene group having 1 or more carbon atoms in a vinylene-containing group, a methylene group having 1 or more carbon atoms in an ethynylene-containing group, Either a methylene group having 1 or more carbon atoms of a silicon atom or a methylene group having 1 or more carbon atoms of an oxygen-containing atom,
X is a hydrogen atom, a lower alkyl group or a lower alkoxy group, and n is an integer of 0-2. In addition of the following specifically
Examples include compound. (1) CH 3 (CH 2 ) 9 SiCl 3 (2) CH 3 (CH 2 ) 15 SiCl 3 (3) CH 3 CH 2 O (CH 2 ) 15 SiCl 3 (4) CH 3 (CH 2 ) 2 Si (CH 3) 2 (CH 2 ) 15 SiCl 3 (5) CF 3 (CF 2) 7 (CH 2) 2 SiCl 3 (6) CF 3 CH 2 O (CH 2) 15 SiCl 3 (7) CF 3 ( CH 2) 2 Si (CH 3 ) 2 (CH 2) 15 SiCl 3 (8) F (CF 2) 4 (CH 2) 2 Si (CH 3) 2 (CH 2) 9 SiCl 3 (9) CF 3 COO (CH 2 ) 15 SiCl 3 (10) CF 3 (CF 2 ) 5 (CH 2 ) 2 SiCl 3 Further , when the R group in the above formula contains a vinylene group or an ethynylene group, irradiation with a catalyst, light or high energy rays is possible. By polymerizing unsaturated bonds with, etc., bonds between the molecules occur and a stronger monolayer is formed. Preferred. In addition, it is particularly preferable to use fluorocarbon as the water-repellent group because the water-repellent effect is large and the oil-repellent effect can be exhibited.

【0013】本発明の透光性基体の製造方法としては、
予め成形加工した透光性基体が一般的に供される。な
お、特に本発明の透光性基体にクロロシラン系界面活性
剤を用いる場合には、化学吸着単分子膜を形成した後化
学吸着単分子膜を水分に接触させずに洗浄する必要があ
り、この洗浄工程を経なければ未反応のクロロシラン系
界面活性剤が水分と反応し白濁する。
The method of manufacturing the translucent substrate of the present invention includes:
A preformed, transparent substrate is generally provided. In particular, when a chlorosilane-based surfactant is used for the translucent substrate of the present invention, it is necessary to wash the chemisorption monolayer after contacting with water after forming the chemisorption monolayer.
If this washing step is not performed, the unreacted chlorosilane-based surfactant reacts with water and becomes cloudy.

【0014】また、特に本発明でクロロシラン系界面活
性剤を使用する場合には、界面活性剤と水分との反応性
が高いため、非水系の有機溶剤に溶解させる必要があ
り、このような溶剤としては例えばn−ヘキサデカン、
トルエン、キシレン、ジシクロヘキシル、四塩化炭素、
クロロホルム等が単独又は複数種混合して用いられる。
クロルシラン系以外のシラン系界面活性剤の場合には、
これ以外に例えばメチルアルコールやエチルアルコール
等も適用できる。さらに、本発明の化学吸着単分子膜
は、透光性基体の一方の面にクロロシリル基を含む物質
を接触させ、その後未反応のクロロシリル基を含む物質
を洗浄し、水と反応させ透光性基体表面にシラノール
を有した単分子膜を形成させ、しかる後フッ化炭素を含
有するシラン系界面活性剤を化学吸着させる方法を採用
すると、表面に露出した親水性基が少ない基体の場合で
も、撥水性基を含むシラン系界面活性剤を高密度に化学
吸着することができるため好ましい。このクロロシリル
基を有する内層膜用物質としては、例えばSiCl4
SiHCl3、SiH2Cl2、Cl−(SiCl2O)n
−SiCl3、H k (R13-k Si(R2nSiCl
m(R33-m等が挙げられ、一般にはCl−Si結合数
が多い方がシラン系界面活性剤を高密度に化学吸着でき
るため好ましい。但し式中nは整数、及びmは1〜3
の整数、R1及びR3は低級アルキル基、R2は炭素数1
以上のメチレン基である。特に、クロロシリル基を含む
物質としてSiCl4を用いれば、分子が小さく水酸基
化に対する活性も大きいので、基体表面を均一に親水化
する効果が大きく好ましい。さらに、本発明の透光性基
体は、一方に面だけを撥水性基を含有する化学吸着単分
子膜を形成し、他面は親水性基を有する化学吸着単分子
膜を形成し、透光性基体の両面で異なる性質を呈する基
体も提供できる。この手法としては例えば、クロロシラ
ン基を含む物質を透光性基体の両面に化学吸着し、クロ
ロシラン基を含む単分子膜を形成し、この単分子膜を水
洗等の手法でシラノール基を表面に析出させ、親水性単
分子膜で残しておきたい面に例えばポリビニルアルコー
ルもしくはプルラン等の水溶性高分子材料の水溶液を塗
布しておき、しかる後撥水性基を含む化学吸着単分子膜
を形成し、その後水溶性高分子材料を水洗除去する手法
等がある。なお、本発明の化学吸着単分子膜は、一層の
単分子膜でもよく又単分子累積膜でもよいが、単分子累
積膜の場合には累積層間でも化学結合していることが要
求される。
Further, particularly when the chlorosilane-based surfactant is used in the present invention, it is necessary to dissolve it in a non-aqueous organic solvent because the reactivity of the surfactant with water is high, and such a solvent is used. Are, for example, n-hexadecane,
Toluene, xylene, dicyclohexyl, carbon tetrachloride,
Chloroform or the like may be used alone or as a mixture of two or more kinds.
In the case of silane type surfactants other than chlorosilane type,
Other than this, for example, methyl alcohol, ethyl alcohol, etc. can be applied. Furthermore, the chemisorption monomolecular film of the present invention is such that one surface of the translucent substrate is contacted with a substance containing a chlorosilyl group, and then a substance containing an unreacted chlorosilyl group is washed and reacted with water to transmit the translucent substance. If a method is used in which a monomolecular film having a silanol group is formed on the surface of the substrate and then a silane-based surfactant containing fluorocarbon is chemically adsorbed, even if the substrate has few hydrophilic groups exposed on the surface. A silane-based surfactant containing a water-repellent group can be chemically adsorbed at high density, which is preferable. Examples of the substance for the inner layer film having a chlorosilyl group include SiCl 4 ,
SiHCl 3 , SiH 2 Cl 2 , Cl- (SiCl 2 O) n
-SiCl 3, H k (R 1 ) 3- k Si (R 2) n SiCl
m (R 3 ) 3-m and the like are preferable, and in general, it is preferable that the number of Cl—Si bonds is large because the silane-based surfactant can be chemically adsorbed at a high density. However, in the formula, n is an integer, and k and m are 1 to 3.
Is an integer, R 1 and R 3 are lower alkyl groups, R 2 is a carbon number 1
The above is a methylene group. In particular, when SiCl 4 is used as a substance containing a chlorosilyl group, since the molecule is small and the activity for hydroxylation is large, the effect of uniformly hydrophilizing the substrate surface is large and preferable. Further, the light-transmitting substrate of the present invention has a chemisorption monomolecular film containing a water-repellent group on only one surface, and a chemisorption monomolecular film having a hydrophilic group on the other surface. Substrates that exhibit different properties on both sides of the compliant substrate can also be provided. As this method, for example, a substance containing a chlorosilane group is chemically adsorbed on both surfaces of a transparent substrate to form a monomolecular film containing a chlorosilane group, and the silanol group is deposited on the surface by a method such as washing with water. Then, an aqueous solution of a water-soluble polymer material such as polyvinyl alcohol or pullulan is applied to the surface to be left as a hydrophilic monomolecular film, and then a chemisorption monomolecular film containing a water-repellent group is formed, Then, there is a method of removing the water-soluble polymer material by washing with water. The chemisorption monomolecular film of the present invention may be a monolayer film of a single layer or a monomolecular cumulative film, but in the case of a monomolecular cumulative film, it is required that chemical bonds are also formed in the cumulative layers.

【0015】以下に本発明に関する透光性基体材料とし
てガラスを挙げ、代表例として自動車のフロントガラス
を取り上げ順に説明する。
Glass will be cited below as a light-transmitting substrate material relating to the present invention, and a windshield of an automobile will be taken up as a typical example and explained in order.

【0016】[0016]

【実施例1】まず、加工の終了したフロントガラスを有
機溶媒で洗浄した後、フッ化炭素基及びクロロシリル
を含む物質としてCF3(CH27(CH22SiCl3
を用い、非水系の溶媒である80重量%n−ヘキサデカ
ン、12重量%四塩化炭素、8重量%クロロホルムの混
合溶剤に10重量%の濃度で溶かした溶液を調整し、フ
ロントガラスを2時間程度浸漬した。フロントガラス表
面には自然酸化膜が形成されており、その酸化膜表面の
水酸基が多数含まれているので、フッ化炭素基及びクロ
シリル基を含む物質の−SiCl基の塩素と、水酸基
とが脱塩酸反応しフロントガラス表面全面に亘り(化
1)に示す結合が生成された。
Example 1 First, after cleaning the finished windshield working in an organic solvent, CF 3 (CH 2) 7 (CH 2) 2 SiCl 3 as a material containing a fluorocarbon group and a chlorosilyl group
To prepare a solution prepared by dissolving 10 wt % of a non-aqueous solvent in a mixed solvent of 80 wt % n-hexadecane, 12 wt % carbon tetrachloride and 8 wt % chloroform, and the windshield for about 2 hours. Soaked. The front glass surface is formed with a natural oxide film, the hydroxyl group of the oxide film surface contains many, chlorine -SiCl group material containing a fluorocarbon group and a black <br/> b silyl group Then, the hydroxyl group was dehydrochlorinated and the bond shown in Chemical formula 1 was formed over the entire surface of the windshield .

【0017】[0017]

【化1】 すなわち、フッ素を含む単分子膜2が透光性基体の表面
と化学結合した状態で、図1に示したようにフロントガ
ラス1表面にシロキサン結合を介して化学吸着単分子膜
2が一層形成された。この化学吸着単分子膜2の膜厚
は、分子構造から約15オングストローム(1.5n
m)である。なお、単分子膜はきわめて強固に化学結合
しているので、全く剥離することがなかった。
Embedded image That is, in the state where the monomolecular film 2 containing fluorine is chemically bonded to the surface of the translucent substrate , the chemical adsorption monomolecular film 2 is further formed on the surface of the windshield 1 through the siloxane bond as shown in FIG. It was The thickness of the chemisorption monomolecular film 2 is about 15 angstroms (1.5 n
m) . Since the monomolecular film was chemically bonded very strongly, it never peeled off.

【0018】このフロントガラスを用い実使用を試みた
が、処理しないものに比べ汚物の付着を大幅に低減で
き、また例え付着した場合にもブラシ等でこする程度で
簡単に除去できた。また、このとき、フロントガラス1
表面に傷は全く付かなかった。また、油脂分汚れでも除
去は水洗のみで可能であった。
An attempt was made to actually use this windshield, but it was possible to significantly reduce the adhesion of dirt compared to the untreated one, and even if it adhered, it could be easily removed by rubbing with a brush or the like. At this time, the windshield 1
The surface was not scratched at all. Further, even oil and fat stains could be removed only by washing with water.

【0019】なお、透光性基体の材質が、アクリル樹脂
やポリカーボネート樹脂等のプラスチックの場合には、
表面を例えば300W、10分程度プラズマ処理して表
面を酸化し親水性とすること、および吸着液をフレオン
溶剤に換えることで同様の技術を用いることが可能であ
った。
When the material of the translucent substrate is plastic such as acrylic resin or polycarbonate resin,
It was possible to use the same technique by subjecting the surface to plasma treatment for, eg, 300 W for 10 minutes to oxidize the surface to make it hydrophilic and to replace the adsorbent with a Freon solvent.

【0020】[0020]

【実施例2】親水性ではあるが水酸基を含む割合が少な
い例えば表面を架橋性プラスチックで架橋処理したフロ
ントガラスなどの場合、クロロシリル基を含む物質とし
てSiCl4 を、非水系溶媒のクロロホルム溶媒に1重
量パーセント溶解した溶液に30分間程度浸漬すると、
図2に示したようにフロントガラス11表面には親水性
の水酸基(OH基)12が多少とも存在するので表面で
脱塩酸反応が生じ、トリクロロシリル基を含む物質のク
ロロシラン単分子膜が形成された。このようにトリクロ
ロシリル基を含む物質としてSiCl4 を用いれば、フ
ロントガラス11表面に少量の親水性の−OH基12し
か存在していなくとも、フロントガラス11表面で脱塩
酸反応が生じ(化2)のように分子が−SiO−結合を
介して表面に固定される。
Example 2 In the case of a windshield whose surface is crosslinked with a crosslinkable plastic , which is hydrophilic but has a small proportion of hydroxyl groups, SiCl 4 is used as a substance containing a chlorosilyl group in a chloroform solvent which is a non-aqueous solvent. When immersed in a solution of weight percent dissolved for about 30 minutes,
As shown in FIG. 2, since there are some hydrophilic hydroxyl groups (OH groups) 12 on the surface of the windshield 11, a dehydrochlorination reaction occurs on the surface and a chlorosilane monomolecular film of a substance containing a trichlorosilyl group is formed. It was Thus, when SiCl 4 is used as the substance containing a trichlorosilyl group, a dehydrochlorination reaction occurs on the surface of the windshield 11 even if only a small amount of hydrophilic —OH groups 12 are present on the surface of the windshield 11. ), The molecule is fixed to the surface via the -SiO- bond.

【0021】[0021]

【化2】 なお、このとき一般には未反応のSiCl4 もクロロシ
ラン単分子膜上に存在するため、その後、クロロホルム
の非水系の溶媒で洗浄して、さらに水で洗浄すると、フ
ロントガラス11表面の水酸基と未反応のSiCl4
子は除去され、図3に示したようにフロントガラス11
表面に(化3)等のシロキサン単分子膜13が得られ
る。
Embedded image At this time, since unreacted SiCl 4 is also generally present on the chlorosilane monomolecular film, if it is subsequently washed with a nonaqueous solvent of chloroform and further washed with water, it does not react with the hydroxyl groups on the surface of the windshield 11. SiCl 4 molecules of the windshield 11 are removed as shown in FIG.
A siloxane monomolecular film 13 of (Chemical Formula 3) or the like is obtained on the surface.

【0022】[0022]

【化3】 なお、このときできた単分子膜13は、フロントガラス
11表面と−SiO−の化学結合を介して完全に結合さ
れているので剥がれることが全く無い。また、得られた
シロキサン単分子膜13は、表面にSiOH結合を数多
く持つ。当初の水酸基の3倍程度の数が生成される。
次に、実施例1で述べた溶液に、この表面にシロキサン
単分子膜13の形成されたフロントガラス11を1時間
程度浸漬すると、シロキサン単分子膜13表面に(化
4)の結合が生成され、図4に示したようにフッ素を含
む化学吸着単分子膜14が、下層のシロキサン単分子膜
13と化学結合した状態で鏡表面全面に亘り約15オン
グストローム(1.5nm)の膜厚で形成できた。
Embedded image Since the monomolecular film 13 formed at this time is completely bonded to the surface of the windshield 11 through the chemical bond of —SiO—, it is never peeled off. Further, the obtained siloxane monomolecular film 13 has many SiOH bonds on the surface. About three times as many as the initial hydroxyl groups are generated.
Next, the windshield 11 having the siloxane monomolecular film 13 formed on the surface thereof is dipped in the solution described in Example 1 for about 1 hour to form a bond of Chemical formula 4 on the surface of the siloxane monomolecular film 13. As shown in FIG. 4, the chemical adsorption monomolecular film 14 containing fluorine is in a state of being chemically bonded to the siloxane monomolecular film 13 of the lower layer, and is about 15 ON over the entire mirror surface.
The film could be formed with a film thickness of gstrom (1.5 nm) .

【0024】[0024]

【化4】 なお、単分子膜は剥離試験を行なっても全く剥離するこ
とがなかった。
Embedded image The monomolecular film was not peeled at all even after the peeling test.

【0025】また、本実施例のフロントガラスを用いて
実使用を試みたが、表面の弗素の撥水性の効果で水滴の
付着は全くなく、ワックス成分等の流れを想定してワッ
クスを含んだアセトンを吹き付けたが、やはり表面に化
学吸着した単分子膜中の弗素の撥油性の効果で油は弾か
れ曇ることはなく、また汚れも簡単に拭い取れた。
In addition, an attempt was made to use the windshield of this embodiment for practical use. However, due to the water repellency of fluorine on the surface, no water droplets adhered at all, and wax was included assuming the flow of wax components. Acetone was sprayed, but the oil was repelled by the effect of the oil repellency of the monomolecular film chemically adsorbed on the surface and was not clouded, and dirt could be easily wiped off.

【0026】なお、フッ化炭素基及びクロロシラン基を
含む物質を混ぜた非水系の溶媒を用い、単分子膜を化学
吸着する際、防曇効果を付与するため親水性のままで残
したい面に耐有機溶媒性の親水性被膜(マスク材料)
してポリビニルアルコール水溶液を塗布形成しておき、
吸着終了後前記親水性被膜(マスク材料)を水洗除去し
て、図5に示したような一方の表面が撥水撥油防汚性単
分子膜14で、他面が親水性の水酸基を有するシロキサ
ン系単分子膜13のフロントガラスが得られた。このガ
ラスで防曇効果を確かめたが、親水性のままで残したガ
ラス面は、全く曇ることがなかった。
When a monomolecular film is chemically adsorbed by using a non-aqueous solvent mixed with a substance containing a fluorocarbon group and a chlorosilane group, the surface to be left hydrophilic as an antifogging effect is given. polyvinyl alcohol aqueous solution can contact with the coating formed as organic solvent resistance of the hydrophilic coating (mask material),
After completion of the adsorption, the hydrophilic film (mask material) is washed away with water, and one surface as shown in FIG. 5 is a water- and oil-repellent antifouling monomolecular film 14 and the other surface has a hydrophilic hydroxyl group. Siloxa
The windshield of the monomolecular film 13 was obtained. The anti-fogging effect was confirmed with this glass, but the glass surface that remained hydrophilic did not fog at all.

【0027】また、実施例1では単分子膜一層の場合、
実施例2ではシロキサン単分子膜一層の後弗素を含むシ
ラン系界面活性剤層を一層累積した場合を示したが、本
発明の化学吸着単分子膜は一層に限らず多層に累積して
もその効果は変化するものではない。
In Example 1, in the case of a monolayer,
In Example 2, a case was shown in which a silane-based surfactant layer containing fluorine was accumulated after one layer of the siloxane monolayer, but the chemisorption monolayer of the present invention is not limited to one layer, but may be accumulated in multiple layers. The effect does not change.

【0028】さらにまた、上記実施例では、含フッ化炭
素クロルシラン系界面活性剤としてCF3 (CF2 7
(CH2 2 SiCl3 を用いたが、CF3 −(C
2 p−(R)m −SiCln 3-n で表わされるク
ロルシラン系界面活性剤のRの部分に例えばビニレン基
(−CH=CH−)やエチニレン基(炭素−炭素の3重
結合)を付加したり組み込んでけば、単分子膜形成後
5メガラド程度の電子線照射で架橋できるので、さらに
単分子膜の硬度を向上させることも可能である。
Furthermore, in the above embodiment, CF 3 (CF 2 ) 7 is used as the fluorocarbon chlorosilane type surfactant.
(CH 2) was used 2 SiCl 3, CF 3 - ( C
F 2 ) p — (R) m —SiCl n X 3-n has a R portion of the chlorosilane-based surfactant, for example, a vinylene group (—CH═CH—) or an ethynylene group ( carbon-carbon triplet).
Incorporating or adding binding) Contact fluff, since it crosslinking by electron beam irradiation of about 5 Mrads after monolayer formation, it is possible to further improve the hardness of the monomolecular film.

【0029】なお、フッ化炭素系界面活性剤として上記
のもの以外にも (1) CF3CH2O(CH215SiCl3 (2) CF3(CH22Si(CH32(CH2 15SiCl3 (3) F(CF24(CH22Si(CH32(CH29SiCl3 (4) CF3COO(CH215SiCl3 (5) CF3(CF25(CH22SiCl3 等のトリクロルシラン系界面活性剤を始め、例えば (6) CF3CH2O(CH215Si(CH32Cl (7) CF3(CH22Si(CH32(CH215Si(CH32Cl (8) CF3CH2O(CH215Si(CH3)Cl2 (9) CF3COO(CH215Si(CH32Cl 等のクロルシラン系界面活性剤が利用できた。また (10) CF3(CF27(CH22Si(OCH33 (11) CF3CH2O(CH215Si(OCH33 等のアルコキシシラン系界面活性剤も、界面活性剤溶液
を加熱することにより同様の効果が得られた。また (12) CH3(CH29SiCl3 (13) CH3(CH215SiCl3 (14) CH3CH2O(CH215SiCl3 (15) CH3(CH22Si(CH32(CH215SiCl3 等の炭化水素基を有するクロルシラン系界面活性剤で
も、同様に室温で化学吸着単分子膜が形成され、撥水性
と防汚性の効果が現れた。
Besides the above-mentioned fluorocarbon surfactants, (1) CF 3 CH 2 O (CH 2 ) 15 SiCl 3 (2) CF 3 (CH 2 ) 2 Si (CH 3 ) 2 (CH 2) 15 SiCl 3 ( 3) F (CF 2) 4 (CH 2) 2 Si (CH 3) 2 (CH 2) 9 SiCl 3 (4) CF 3 COO (CH 2) 15 SiCl 3 (5) Starting with trichlorosilane-based surfactants such as CF 3 (CF 2 ) 5 (CH 2 ) 2 SiCl 3 , for example, (6) CF 3 CH 2 O (CH 2 ) 15 Si (CH 3 ) 2 Cl (7) CF 3 (CH 2) 2 Si ( CH 3) 2 (CH 2) 15 Si (CH 3) 2 Cl (8) CF 3 CH 2 O (CH 2) 15 Si (CH 3) Cl 2 (9) CF 3 COO Chlorsilane-based surfactants such as (CH 2 ) 15 Si (CH 3 ) 2 Cl were available. Also, alkoxysilane-based surfactants such as (10) CF 3 (CF 2 ) 7 (CH 2 ) 2 Si (OCH 3 ) 3 (11) CF 3 CH 2 O (CH 2 ) 15 Si (OCH 3 ) 3 The same effect was obtained by heating the surfactant solution. Further, (12) CH 3 (CH 2 ) 9 SiCl 3 (13) CH 3 (CH 2 ) 15 SiCl 3 (14) CH 3 CH 2 O (CH 2 ) 15 SiCl 3 (15) CH 3 (CH 2 ) 2 With a chlorosilane-based surfactant having a hydrocarbon group such as Si (CH 3 ) 2 (CH 2 ) 15 SiCl 3 as well, a chemisorption monomolecular film is formed at room temperature, and the effect of water repellency and antifouling property appears. It was

【0030】[0030]

【発明の効果】以上説明した通り本発明によれば、きわ
めて薄いナノメータレベルの膜厚の単分子膜を透光性基
表面に形成するため、透光性基体本来の光沢を損なう
ことがない。また、この膜にフッ化炭素基を導入してお
くと撥水撥油性にも優れており、表面の防汚効果を高め
ることが可能となる。従って、きわめて防汚効果の高い
高性能透光性基体を効率良く合理的に提供することがで
きる。さらに内面を親水化しておくことにより防曇性
効果も得られた。
As described above , according to the present invention, a monomolecular film having an extremely thin nanometer level film is formed into a translucent group.
Since it is formed on the body surface, the original luster of the transparent substrate is not impaired. In addition, when a fluorocarbon group is introduced into this film, it is also excellent in water and oil repellency, and the antifouling effect on the surface can be enhanced. Therefore, it is possible to efficiently and rationally provide a high-performance translucent substrate having an extremely high antifouling effect. Antifogging effect was also obtained by keeping further turned into a hydrophilic inner surface.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の透光性基体の一実施例であるフロント
ガラスを分子レベルまで拡大した断面概念図
FIG. 1 is a conceptual cross-sectional view in which a windshield, which is an example of a translucent substrate of the present invention, is enlarged to a molecular level.

【図2】本発明の透光性基体の他の実施例であるフロン
トガラスの表面を分子レベルまで拡大した断面工程概念
FIG. 2 is a sectional process conceptual diagram in which the surface of a windshield which is another embodiment of the translucent substrate of the present invention is enlarged to a molecular level.

【図3】本発明の透光性基体の他の実施例であるフロン
トガラスの表面を分子レベルまで拡大した断面工程概念
FIG. 3 is a sectional process conceptual diagram in which the surface of a windshield that is another embodiment of the translucent substrate of the present invention is enlarged to the molecular level.

【図4】本発明の透光性基体の他の実施例であるフロン
トガラスの表面を分子レベルまで拡大した断面工程概念
FIG. 4 is a sectional process conceptual diagram in which the surface of a windshield which is another embodiment of the translucent substrate of the present invention is enlarged to a molecular level.

【図5】本発明の透光性基体の他の実施例であるフロン
トガラスの表面を分子レベルまで拡大した断面工程概念
FIG. 5 is a conceptual diagram of a cross-sectional process in which the surface of a windshield that is another embodiment of the translucent substrate of the present invention is enlarged to the molecular level.

【符号の説明】[Explanation of symbols]

1 フロントガラス 2 化学吸着単分子膜 11 フロントガラス 12 水酸基 13 シロキサン単分子膜 14 化学吸着単分子膜 1 Windshield 2 Chemisorption monolayer 11 Windshield 12 Hydroxyl group 13 Siloxane monolayer 14 Chemisorption monolayer

───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 昭55−9652(JP,A) 「1990年(平成2年)春季第37回応用 物理学関係連合講演会予稿集第3分冊」 応用物理学会(1990年3月28日)第1048 頁 ─────────────────────────────────────────────────── ─── Continuation of the front page (56) References JP-A-55-9652 (JP, A) “The 3rd volume of the 37th Applied Physics Joint Lecture Proceedings of the Spring 1990 (Heisei 2)” Applied Physics Academic Society (March 28, 1990) Page 1048

Claims (10)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 表面に親水性基を含むかまたは親水性基
を含むように処理した透光性成形体基体(以下透光性基
体)の少なくとも一方の面に、一端に反応性シリル基を
有し、他端にフッ化炭素基を有するシラン系界面活性剤
を溶かした非水系有機溶媒溶液を接触させ、前記透光性
基体の親水性基と前記シラン系界面活性剤の反応性シリ
ル基との間で脱塩酸反応させることにより、フッ化炭素
基を有し、かつ撥水撥油性の化学吸着単分子膜を前記透
光性基体表面に形成することを特徴とする透光性基体の
製造方法。
1. A surface containing a hydrophilic group or having a hydrophilic group
A transparent molded body substrate (hereinafter referred to as a transparent group) treated to contain
(2) a non-aqueous organic solvent solution containing a silane-based surfactant having a reactive silyl group at one end and a fluorocarbon group at the other end is contacted with at least one surface of
Reactive silicone between the hydrophilic group of the substrate and the silane-based surfactant
Fluorocarbon by dehydrochlorination reaction with
Method for producing a light-transmitting substrate, characterized in that has a group, and to form formed chemically adsorbed monomolecular film of water and oil repellency to the light-transmitting substrate table surface.
【請求項2】 表面に親水性基を含むかまたは親水性基
を含むように処理した透光性基体の少なくとも一方の面
に、クロロシリル基を含む内層膜用物質を混合した非水
系溶媒溶液を接触させ、次いで前記透光性基体上の未反
応のクロロシリル基を含む物質を非水系有機溶媒を用い
洗浄除去し、次いで水分と反応させ前記透光性基体上に
シラノール基を含む物質よりなる内層膜用単分子膜を形
成し、その後、一端に反応性シリル基を有し他端にフッ
化炭素基を含むシラン系界面活性剤を溶かした非水系有
機溶媒溶液を接触させて、前記シラノール基を含む単分
子膜上にフッ化炭素基を有し、かつ撥水撥油性の化学吸
着単分子吸着膜を累積することを特徴とする透光性基体
の製造方法。
2. A surface containing a hydrophilic group or having a hydrophilic group
At least one surface of the translucent substrate treated so as to contain a non-aqueous solvent solution in which a substance for an inner layer film containing a chlorosilyl group is mixed , and then the unreacted chlorosilyl group on the translucent substrate is removed. The substance containing is removed by washing with a non-aqueous organic solvent, and then reacted with water to form a monolayer film for the inner layer film made of the substance containing a silanol group on the translucent substrate, and then a reactive silyl group is formed at one end. Has a hook at the other end
A water- and oil-repellent chemisorption monolayer having a fluorocarbon group on the silanol group-containing monomolecular film is brought into contact with a non-aqueous organic solvent solution in which a silane-based surfactant containing a fluorinated carbon group is contacted. A method of manufacturing a light-transmissive substrate, characterized by accumulating a molecular adsorption film.
【請求項3】 シラノール成と化学吸着単分子膜累
の間に、透光性基体の一方の面を水溶性被膜でコート
する請求項2に記載の透光性基体の製造方法。
3. A silanol type forming a chemically adsorbed monomolecular film cumulative
In between, coat one side of translucent substrate with water-soluble coating
The method for producing a translucent substrate according to claim 2 .
【請求項4】 反応性シリル基が、クロロシリル基であ
る請求項1または2に記載の透光性基体の製造方法。
Wherein the reactive silyl group, method for producing a translucent substrate according to claim 1 or 2 is chloro silyl group.
【請求項5】 シラン系界面活性剤が、CF3 −(CF
2 n −(R)m −SiClp 3-p (nは0または整
数、mは0または1、Rは炭素数1以上のメチレン基、
含ビニレン基の炭素数1以上のメチレン基、含エチニレ
ン基の炭素数1以上のメチレン基、含シリコン原子の炭
素数1以上のメチレン基または含酸素原子の炭素数1以
上のメチレン基の何れか、Xは水素原子、低級アルキル
基または低級アルコキシ基、pは0〜2の整数)である
請求項1または2に記載の透光性基体の製造方法。
5. The silane-based surfactant is CF 3- (CF
2 ) n- (R) m -SiCl p X 3-p (n is 0 or an integer, m is 0 or 1, R is a methylene group having 1 or more carbon atoms,
Any of a methylene group having 1 or more carbon atoms of a vinylene group, a methylene group having 1 or more carbon atoms of an ethynylene group, a methylene group having 1 or more carbon atoms of a silicon atom or a methylene group having 1 or more carbon atoms of an oxygen atom. , X is a hydrogen atom, a lower alkyl group or a lower alkoxy group, and p is an integer of 0 to 2).
【請求項6】 内層膜用のクロロシリル基を含む物質
が、SiCl4 、SiHCl3 、SiH2 Cl2 、Cl
−(SiCl2 O)n −SiCl3 (nは整数)の何れ
かである請求項2に記載の透光性基体の製造方法。
6. The substance containing a chlorosilyl group for the inner layer film is SiCl 4 , SiHCl 3 , SiH 2 Cl 2 or Cl.
The method for producing a light-transmitting substrate according to claim 2, wherein the method is any one of-(SiCl 2 O) n -SiCl 3 (n is an integer).
【請求項7】 透光性基体が、樹脂製である請求項1ま
たは2に記載の透光性基体の製造方法。
7. The translucent substrate is made of resin.
3. The method for producing a translucent substrate according to item 2.
【請求項8】 透光性基体表面をあらかじめ酸素又は窒
素雰囲気中で電子線照射またはイオンビーム照射処理す
ることにより、親水性基を付与しておく請求項1または
2に記載の透光性基体の製造方法。
8. The surface of the translucent substrate is preliminarily oxygenated or nitrogenated.
Electron beam irradiation or ion beam irradiation treatment in an elementary atmosphere
The hydrophilic group is provided by the above-mentioned method, or
2. The method for producing a translucent substrate according to 2.
【請求項9】 親水性基が、水酸基、カルボニル基及び
アミノ基から選ばれる活性水素を有する基である請求項
8に記載の透光性基体の製造方法。
9. The hydrophilic group comprises a hydroxyl group, a carbonyl group and
A group having active hydrogen selected from amino groups.
8. The method for producing a transparent substrate according to item 8.
【請求項10】 透光性基体の表面にシラン系界面活性
剤を溶かした非水系有機溶媒を接触させた後、未反応物
を洗浄除去する請求項1または2に記載の透光性基体の
製造方法。
10. A silane-based surface active agent on the surface of a transparent substrate.
After contact with a non-aqueous organic solvent in which the agent is dissolved, unreacted substances
Of the translucent substrate according to claim 1 or 2, which is washed and removed.
Production method.
JP2405755A 1990-12-25 1990-12-25 Method for manufacturing translucent substrate Expired - Lifetime JP2506234B2 (en)

Priority Applications (10)

Application Number Priority Date Filing Date Title
JP2405755A JP2506234B2 (en) 1990-12-25 1990-12-25 Method for manufacturing translucent substrate
DE69129145T DE69129145T2 (en) 1990-12-25 1991-12-20 Transparent substrate with applied monomolecular film and process for its production
EP91122017A EP0492545B1 (en) 1990-12-25 1991-12-20 Transparent substrate with monomolecular film thereon and method of manufacturing the same
CA002058341A CA2058341C (en) 1990-12-25 1991-12-23 Transparent substrate and method of manufacturing the same
KR1019910024106A KR970002941B1 (en) 1990-12-25 1991-12-24 Transparent substrate and method of manufacturing the same
US08/431,578 US5580605A (en) 1990-12-25 1995-05-01 Transparent substrate and method of manufacturing the same
US09/570,264 US6521334B1 (en) 1990-12-25 2000-05-12 Transparent substrate and method of manufacturing the same
US09/804,854 US6503567B2 (en) 1990-12-25 2001-03-13 Transparent substrate and method of manufacturing the same
US10/085,248 US20020094375A1 (en) 1990-12-25 2002-02-26 Transparent substrate and method of manufacturing the same
US10/126,835 US20020127331A1 (en) 1990-12-25 2002-04-19 Transparent substrate and method of manufacturing the same

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2405755A JP2506234B2 (en) 1990-12-25 1990-12-25 Method for manufacturing translucent substrate
US08/431,578 US5580605A (en) 1990-12-25 1995-05-01 Transparent substrate and method of manufacturing the same
JP7229102A JP2690876B2 (en) 1995-05-01 1995-09-06 Translucent substrate

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP7229102A Division JP2690876B2 (en) 1990-12-25 1995-09-06 Translucent substrate

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JPH04221630A JPH04221630A (en) 1992-08-12
JP2506234B2 true JP2506234B2 (en) 1996-06-12

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