JPH04251948A - Manufacture of semiconductor - Google Patents
Manufacture of semiconductorInfo
- Publication number
- JPH04251948A JPH04251948A JP3000771A JP77191A JPH04251948A JP H04251948 A JPH04251948 A JP H04251948A JP 3000771 A JP3000771 A JP 3000771A JP 77191 A JP77191 A JP 77191A JP H04251948 A JPH04251948 A JP H04251948A
- Authority
- JP
- Japan
- Prior art keywords
- wire
- capillary tool
- bonding
- clamper
- wiring
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract description 36
- 238000004519 manufacturing process Methods 0.000 title claims description 6
- 238000000034 method Methods 0.000 claims abstract description 33
- 239000000758 substrate Substances 0.000 claims description 30
- 238000002788 crimping Methods 0.000 claims description 15
- 238000005520 cutting process Methods 0.000 claims description 3
- 238000010586 diagram Methods 0.000 description 12
- 238000005452 bending Methods 0.000 description 7
- 238000005219 brazing Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000002604 ultrasonography Methods 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000004590 computer program Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000005304 joining Methods 0.000 description 1
- 230000013011 mating Effects 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/74—Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies
- H01L24/78—Apparatus for connecting with wire connectors
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- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L2224/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
- H01L2224/321—Disposition
- H01L2224/32151—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/32221—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/32225—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
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- H01L2224/42—Wire connectors; Manufacturing methods related thereto
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- H01L2224/4805—Shape
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- H01L2224/48091—Arched
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- H01L2224/48227—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
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- H01L2224/48465—Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a ball bond the other connecting portion not on the bonding area being a wedge bond, i.e. ball-to-wedge, regular stitch
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- H01L2224/7825—Means for applying energy, e.g. heating means
- H01L2224/783—Means for applying energy, e.g. heating means by means of pressure
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Landscapes
- Engineering & Computer Science (AREA)
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Abstract
Description
【0001】0001
【産業上の利用分野】本発明は半導体チップとこれを搭
載する基板パッケージ(以下基板という)をワイヤボン
ディングすることにより半導体装置を製造する方法に関
するものである。半導体チップの小型化及び高集積化に
伴い、ワイヤーの本数が増えかつワイヤーの間隔が狭く
なっており、さらに装置全体を小型化するためにワイヤ
ーの占める空間を少なくすることが必要である。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of manufacturing a semiconductor device by wire bonding a semiconductor chip and a substrate package (hereinafter referred to as a substrate) on which the semiconductor chip is mounted. As semiconductor chips become smaller and more highly integrated, the number of wires increases and the distance between the wires becomes narrower. Furthermore, in order to miniaturize the entire device, it is necessary to reduce the space occupied by the wires.
【0002】0002
【従来の技術】従来、半導体装置のワイヤーボンディン
グ法としてボールボンディングとウェッジボンディング
がある。2. Description of the Related Art Conventionally, there are ball bonding and wedge bonding as wire bonding methods for semiconductor devices.
【0003】前者を図10および11に示す。図中1は
基板、2はろう材、3は半導体チップ、4はワイヤー、
5は半導体チップとの接続部に付着されたバンプ、6は
キャピラリー、7はクランパーである。The former is shown in FIGS. 10 and 11. In the figure, 1 is a substrate, 2 is a brazing material, 3 is a semiconductor chip, 4 is a wire,
5 is a bump attached to the connection portion with the semiconductor chip, 6 is a capillary, and 7 is a clamper.
【0004】ボールボンディング法では、キャピラリー
ツール6の中央を貫通する貫通孔6aよりAu線などの
ワイヤー4を通し、ワイヤー先端を加熱軟化させてボー
ル8を形成し、キャピラリーツール6によりボール8を
半導体チップ3上に圧着する。圧着により形成されたバ
ンプ5は高さが約90ミクロン程度ある。ボールの圧着
後はキャピラリーツール6を配線方向に基板1との接続
位置まで移動させ、キャピラリーツール6を下降させ、
これによりワイヤーと基板1を圧着し、その後キャピラ
リーツール6を停止させたままで、ワイヤー4をクラン
パー7で挟んで引張ることによりワイヤー4を切断する
。In the ball bonding method, a wire 4 such as an Au wire is passed through a through hole 6a passing through the center of a capillary tool 6, the tip of the wire is heated and softened to form a ball 8, and the ball 8 is bonded to a semiconductor by the capillary tool 6. Press onto chip 3. The bump 5 formed by pressure bonding has a height of about 90 microns. After crimping the ball, move the capillary tool 6 in the wiring direction to the connection position with the substrate 1, lower the capillary tool 6,
As a result, the wire and the substrate 1 are crimped, and then, while the capillary tool 6 is stopped, the wire 4 is held between the clampers 7 and pulled, thereby cutting the wire 4.
【0005】ボールボンディング法では、ワイヤー4は
バンプ5からほぼ垂直方向に伸びているため、360°
どの方向にでもワイヤー4を引き出し配線することが可
能であるが、ボールが大きくまた、配線高さが高いため
に半導体装置を小型化できない欠点がある。[0005] In the ball bonding method, since the wire 4 extends almost vertically from the bump 5, it has a 360°
Although the wires 4 can be drawn out and wired in any direction, the ball is large and the wiring height is high, so there is a drawback that the semiconductor device cannot be miniaturized.
【0006】後者のウェッジボンディング法を図12に
示す。The latter wedge bonding method is shown in FIG.
【0007】ウェッジボンディング法は、図12の(a
)に示すウェッジツール11の側面テーパ部11aの脇
をワイヤー4を導びくか((b)参照)、あるいはウェ
ッジツール11の貫通孔を通して導き、ワイヤー4を基
板1または半導体チップ3の接続部で熱圧着または超音
波と熱による圧着する。ワイヤー4は横方向に伸びた状
態で圧着される。The wedge bonding method is shown in FIG.
), the wire 4 is guided along the side of the side tapered part 11a of the wedge tool 11 (see (b)), or it is guided through the through hole of the wedge tool 11, and the wire 4 is connected to the connection part of the substrate 1 or the semiconductor chip 3. Thermocompression bonding or ultrasonic and heat crimping. The wire 4 is crimped while being stretched laterally.
【0008】ウェッジボンディング法では、ワイヤー4
はほぼ水平方向に伸びているため、伸びている方向(図
12の実線矢印の方向)しかワイヤー4を引き出すこと
が出来ず、反対方向に配線するときは被処理部品を回転
させた上でワイヤーを引き出す必要がある。すなわちウ
ェッジボンディングには一定方向で高速配線ができると
いう配線の方向性がある。しかし、ウェッジボンディン
グ法では、ワイヤー4が水平方向に圧着されているため
配線高さHB が低くできる利点がある。In the wedge bonding method, the wire 4
Since the wire 4 extends almost horizontally, the wire 4 can only be pulled out in the direction in which it extends (in the direction of the solid arrow in Fig. 12).When wiring in the opposite direction, rotate the part to be processed and then pull out the wire 4. need to be brought out. In other words, wedge bonding has a wiring directionality that allows high-speed wiring to be performed in a fixed direction. However, the wedge bonding method has the advantage that the wire height HB can be reduced because the wire 4 is crimped in a horizontal direction.
【0009】[0009]
【発明が解決しようとする課題】従ってボンダーとして
は、一般ローコスト品にはボールボンディングが適用さ
れ、又、ボンディング部の面積が少ない製品等にはボン
ディングスピードを犠牲にし、ボンディング装置の複雑
化を忍んでもウェッジボンディングが用いられている。[Problems to be Solved by the Invention] Therefore, as a bonder, ball bonding is applied for general low-cost products, and for products with a small bonding area, bonding speed is sacrificed and the complexity of the bonding equipment is not required. However, wedge bonding is still used.
【0010】つまり、方向性のないウェッジボンディン
グ法が実現できると、配線高さを低くしかつ高速配線が
可能になると言える。この内で配線高さの低下は、ボー
ルボンダーの構造を工夫し、図13に示すように、ワイ
ヤー4が中央を通るキャピラリーツール6を用いボール
を作らず、ワイヤー4にボール成形用ツールを当てるこ
とによりキャピラリーツール先端より90°方向に曲げ
、この状態でワイヤーと相手材を圧着すれば(図の(a
)参照)実現可能である。しかし配線方向は曲げ方向と
反対側(図13の(c)参照)しか実現できず、曲げ方
向側に配線すると(図13の(b)参照)、ワイヤー4
にクラック4aが入るかあるいはワイヤー4が基板1か
ら外れ、配線が困難になる。In other words, it can be said that if a wedge bonding method without directionality can be realized, the wiring height can be reduced and high-speed wiring can be performed. Among these, the reduction in wiring height was achieved by devising the structure of the ball bonder, as shown in Figure 13, by applying a ball forming tool to the wire 4 instead of using a capillary tool 6 through which the wire 4 passes through the center to form a ball. Therefore, if you bend the capillary tool 90 degrees from the tip and crimp the wire and the mating material in this state ((a)
)) is possible. However, the wiring direction can only be realized on the side opposite to the bending direction (see FIG. 13(c)), and if the wiring is placed on the bending direction side (see FIG. 13(b)), the wire 4
Cracks 4a may appear in the substrate 1, or the wires 4 may come off the substrate 1, making wiring difficult.
【0011】このような問題を招かないためには、図1
3の(a)のような曲げと配線を避けるために、(b)
のキャピラリーツール上昇移動(x)のとき平面運動と
しては図13の(d)のように弧を描かせ、ワイヤー4
が小さい曲率半径で曲がるのを防ぐ等の曲げ方向のコン
トロールを行わなければならず、これは手動機では実現
するが、自動機では不可能であった。[0011] In order to avoid such problems, it is necessary to
To avoid bending and wiring as in 3.(a), (b)
When the capillary tool moves upward (x), the planar motion draws an arc as shown in FIG. 13(d), and the wire 4
It was necessary to control the bending direction, such as preventing bending with a small radius of curvature, which could be achieved with manual machines, but was not possible with automatic machines.
【0012】本発明は、配線高さを低くしかつ方向性の
ないワイヤボンディング法であって、特に、自動ボンデ
ィング機に可能な動作の中でワイヤーの曲げを行うこと
により自動化を容易にしたボンディング方法を提供する
ことを目的とする。The present invention is a wire bonding method that reduces the wiring height and has no directionality, and in particular, a bonding method that can be easily automated by bending the wire in an operation that is possible with an automatic bonding machine. The purpose is to provide a method.
【0013】[0013]
【課題を解決するための手段】本発明によれば、ワイヤ
ーの先端をキャピラリーツールから通過させるとともに
キャピラリーツールを降下させ、ワイヤー先端をパッケ
ージ基板または半導体チップの一方に当て、続いてワイ
ヤーを配線方向に移動させながらキャピラリーツールを
更に降下させ、ワイヤーが圧着される前に配線方向への
前記移動を中止し、キャピラリーツールを降下させて、
ワイヤーとパッケージ基板または半導体チップの前記一
方への圧着を完了し、続いてキャピラリーツールを配線
の方向へ移動しながら、所定の高さまで上昇し次いで下
降し、パッケージ基板または半導体チップの他方にワイ
ヤーをキャピラリーツールを用いて圧着し、キャピラリ
ーツールが上昇しワイヤーを切断する工程により半導体
装置を製造する。According to the present invention, the tip of the wire is passed through a capillary tool, the capillary tool is lowered, the tip of the wire is applied to one of the package substrate or the semiconductor chip, and then the wire is moved in the wiring direction. further lowering the capillary tool while moving the wire, stopping the movement in the wiring direction before the wire is crimped, and lowering the capillary tool,
After completing the crimping of the wire and the package substrate or the semiconductor chip, the capillary tool is moved in the direction of the wiring, rising to a predetermined height and then lowering, and crimping the wire to the other of the package substrate or the semiconductor chip. A semiconductor device is manufactured through the process of crimping using a capillary tool and lifting the capillary tool to cut the wire.
【0014】[0014]
【作用】本発明によれば、まず、ワイヤーの先端をキャ
ピラリーツールから通過させるとともに、キャピラリー
ツールを降下させ、ワイヤー先端をパッケージ基板また
は半導体チップの一方に当てる。この段階では、配線高
さを高くする原因になるワイヤー先端でのボールの形成
を行わない。また、ワイヤーを基板等と接触させる際に
所定の位置でワイヤーを曲げることができるように、ク
ランパーでワイヤーを保持している。According to the present invention, first, the tip of the wire is passed through the capillary tool, the capillary tool is lowered, and the tip of the wire is brought into contact with either the package substrate or the semiconductor chip. At this stage, no ball is formed at the tip of the wire, which would increase the height of the wire. Further, the wire is held by a clamper so that the wire can be bent at a predetermined position when bringing the wire into contact with a substrate or the like.
【0015】続いてワイヤーを配線方向に移動させなが
らキャピラリーツールを更に降下させ、ワイヤーが圧着
される前に配線方向への移動を中止し、ワイヤーをクラ
ンパーから開放する。この段階では、ワイヤーはまだ圧
着されていない。したがって、ワイヤーは基板等と冶金
的にも機械的にも接合していないので、ワイヤーは36
0度方向転換できることを利用してワイヤーを所望の配
線方向に移動させる。すなわち、本発明においては配線
すべき基板の外部配線と半導体チップのパッドの位置を
自動ボンディング機に記憶させておくと、移動方向と移
動距離は自動的に決定される。Next, the capillary tool is further lowered while moving the wire in the wiring direction, and before the wire is crimped, the capillary tool stops moving in the wiring direction and releases the wire from the clamper. At this stage, the wire is not yet crimped. Therefore, since the wire is not metallurgically or mechanically bonded to the substrate etc., the wire is
The wire can be moved in the desired wiring direction by taking advantage of the fact that the direction can be changed by 0 degrees. That is, in the present invention, if the positions of the external wiring of the substrate to be wired and the pads of the semiconductor chip are stored in the automatic bonding machine, the moving direction and moving distance are automatically determined.
【0016】配線の始まりの位置を決めるためにはキャ
ピラリーツールを降下させながらこれらを配線方向に移
動させる。すると、ワイヤーは先端が最初に基板等と当
たった位置に留まりながら、配線方向に引出される。In order to determine the starting position of the wiring, the capillary tools are moved in the wiring direction while being lowered. Then, the wire is pulled out in the wiring direction while remaining at the position where the tip first contacted the substrate or the like.
【0017】キャピラリーツールが下降するとともにワ
イヤーと基板等との機械的あるいは冶金的接合が進行す
る。その接合完了前に配線方向の移動を中止することに
よって接合部に剪断応力が加わることを防止し、垂直方
向のみの圧力で接合を完了し、接合を健全にする。圧着
の時にはワイヤーをクランパーから開放しキャピラリー
ツールを降下させることによって、ワイヤーに不要の応
力が加わらないようにする必要がある。ワイヤーと基板
のメタライズ配線との圧着は2回以上行うことができる
。As the capillary tool descends, mechanical or metallurgical bonding between the wire and the substrate progresses. By stopping the movement in the wiring direction before the bond is completed, shear stress is prevented from being applied to the bond, and the bond is completed with pressure only in the vertical direction, making the bond sound. During crimping, it is necessary to release the wire from the clamper and lower the capillary tool to avoid applying unnecessary stress to the wire. The wire and the metallized wiring on the substrate can be crimped two or more times.
【0018】引き続いてキャピラリーツールとクランパ
ー全体を配線の方向へ移動しながら、所定の高さまで上
昇し次いで下降し、パッケージ基板または半導体チップ
の他方にワイヤーをキャピラリーツールを用いて圧着し
、その後クランパーを閉じ、キャピラリーツールが上昇
しワイヤーを切断することによりワイヤーボンディング
を行う。この段階は通常のウェッジボンディング加工と
同じ操作であり、低い配線高さを実現することができる
。Subsequently, the capillary tool and the clamper are moved in the direction of the wiring, raised to a predetermined height and then lowered, the wire is crimped to the other side of the package substrate or the semiconductor chip using the capillary tool, and then the clamper is moved. When closed, the capillary tool rises and cuts the wire to perform wire bonding. This step is the same operation as normal wedge bonding processing, and can achieve a low wiring height.
【0019】以上の加工操作は完全に自動化することが
できる。The above processing operations can be completely automated.
【0020】請求項2の方法は請求項1とはワイヤーの
切断方法が異なり、パッケージ基板または半導体チップ
の前記他方にワイヤーをキャピラリーツールを用いて圧
着した後キャピラリーツールを所定量上昇させ、その後
キャピラリーツールの上方に設けられたクランパーを閉
じ、キャピラリーツールとクランパーの全体を上昇させ
、ワイヤーを切断する。この方法ではキャピラリーツー
ルと半導体チップなどの接触時間を調節することによっ
て、キャピラリーツールから半導体チップに加えられる
熱量を調整することができる。The method according to claim 2 is different from the method according to claim 1 in that the wire is crimped onto the other side of the package substrate or the semiconductor chip using a capillary tool, and then the capillary tool is raised by a predetermined amount. Close the clamper provided above the tool, raise the entire capillary tool and clamper, and cut the wire. In this method, the amount of heat applied from the capillary tool to the semiconductor chip can be adjusted by adjusting the contact time between the capillary tool and the semiconductor chip.
【0021】請求項3の方法は請求項1記載の方法と、
ワイヤーの先端が基板などと当たる際のクランプ方法が
異なり、その直前にクランプを開放し、続いてワイヤー
を配線方向に移動させなるなどの一連の加工を行う点は
請求項1の方法と同じである。基板等とワイヤーを接合
する際にはクランプによるワイヤーの保持は必ずしも必
要がなく、かえって不必要な引張応力がクランパーとワ
イヤー先端の間に加わり、キャピラリーツールからの熱
がワイヤー先端に加わるとワイヤーがこれら応力と伝熱
により永久変形することもあるから、冶金的圧着が進行
する時にはクランプをしないことが好ましいこともある
。The method according to claim 3 comprises the method according to claim 1, and
The method of claim 1 is the same as the method of claim 1 in that the method of clamping when the tip of the wire comes into contact with the board is different, and a series of processing is performed, such as releasing the clamp immediately before that and then moving the wire in the wiring direction. be. When joining a wire to a substrate, etc., it is not always necessary to hold the wire with a clamp; instead, unnecessary tensile stress is added between the clamper and the wire tip, and if heat from the capillary tool is applied to the wire tip, the wire may break. Since these stresses and heat transfer may cause permanent deformation, it may be preferable not to clamp while metallurgical crimping is proceeding.
【0022】請求項4は通常のボールボンダーを用い、
以上のような動作をさせるコンピュータプログラムを作
るものである。この場合キャピラリーツールよりワイヤ
ーを繰り出す量はツール先端の側面にて圧着できる長さ
とし、ボールを作るための加熱は省略し、キャピラリー
ツール上部に設けたクランパーにてワイヤーがもどらな
い程度押さえながら、配線しようとする方向に移動させ
ながら、降下させ、ワイヤー先端が基板へ当ってもなお
移動と降下を続ける。ワイヤー先端は必ず配線方向と反
対側に曲がり圧着される。圧着後または圧着直前にクラ
ンパーをはなし、キャピラリーツールを上昇させ、必要
長さ移動し、再度降下し圧着し配線を終了する。終了後
クランパを閉じ、上昇し、ワイヤーを圧着部より切断す
る。クランパーのみ一定量降下し、キャピラリーよりワ
イヤーを繰り出す。[0022] In claim 4, a normal ball bonder is used,
This involves creating a computer program that performs the operations described above. In this case, the amount of wire fed out from the capillary tool should be long enough to be crimped on the side of the tip of the tool, omit heating to make a ball, and use the clamper installed on the top of the capillary tool to hold down the wire just enough to prevent it from returning when wiring. While moving in the desired direction, it is lowered, and even if the tip of the wire touches the substrate, it continues to move and descend. The tip of the wire must be bent and crimped in the opposite direction to the wiring direction. After crimping or just before crimping, release the clamper, raise the capillary tool, move it the required length, and lower it again to crimp and finish the wiring. After finishing, close the clamper, go up, and cut the wire from the crimped part. Only the clamper descends a certain amount and the wire is fed out from the capillary.
【0023】[0023]
【実施例】以下、図1〜9を参照し、本発明の実施例を
説明する。Embodiments Hereinafter, embodiments of the present invention will be described with reference to FIGS. 1 to 9.
【0024】基板1(セラミックパッケージ)のAuメ
ッキされたインナーリードとチップ3上の電極を配線す
る場合繰り出したAuワイヤー4の長さL1 は通常1
mmである。この長さL1 は長めの方が曲げが容易な
ため、第1回ボンディング(曲げは)インナーリード側
とした(図1、2参照)。キャピラリーツール6とクラ
ンパー7の間隔は特に加工操作に影響はなく通常10m
mである。When wiring the Au-plated inner leads of the substrate 1 (ceramic package) and the electrodes on the chip 3, the length L1 of the Au wire 4 drawn out is usually 1
It is mm. Since it is easier to bend this length L1 if it is longer, the first bonding (bending) was done on the inner lead side (see FIGS. 1 and 2). The distance between the capillary tool 6 and the clamper 7 does not particularly affect processing operations and is usually 10 m.
It is m.
【0025】繰り出し部の接合を良くするため、図9に
示すように2回圧着をし、チップ上へ配線する。この場
合1回目の圧着後キャピラリーツール6を約100ミク
ロン上昇させかつ約数100ミクロン配線方向に移動さ
せ再び下降させ圧着を行う。In order to improve the bonding of the extended portion, it is crimped twice as shown in FIG. 9, and then wired onto the chip. In this case, after the first crimping, the capillary tool 6 is raised by about 100 microns, moved by about several 100 microns in the wiring direction, and lowered again to perform crimping.
【0026】図3に示す、ボンディングは熱圧着のみ(
約300℃)でも超音波併用でも、又超音波のみでもA
uワイヤーを同様に接合可能である。また、1本のワイ
ヤーを配線する以上の操作の全体は約0.18秒で完了
する。As shown in FIG. 3, bonding is performed only by thermocompression bonding (
(approximately 300℃), combined with ultrasound, or only ultrasound
U-wires can be spliced similarly. Moreover, the entire operation beyond wiring one wire is completed in about 0.18 seconds.
【0027】図4では、ワイヤー4の高さはチップ3の
エッジの極近傍位置まで下げながら、キャピラリーツー
ル6をクランパー7とともに移動させる。実際はショー
ト防止のためチップに対し規定の間隔(数ミクロン)を
とる必要はある。それにしても、ボールボンディングの
場合、ワイヤー径(d)に対しボールの径は3dはある
ため高さはそれ以上高くなっていることを考えると、本
発明では配線高さは非常に低くなる。In FIG. 4, the capillary tool 6 is moved together with the clamper 7 while lowering the height of the wire 4 to a position very close to the edge of the chip 3. In reality, it is necessary to provide a specified distance (several microns) between the chips to prevent short circuits. However, in the case of ball bonding, the diameter of the ball is 3d relative to the wire diameter (d), so considering that the height is higher than that, the wiring height is extremely low in the present invention.
【0028】図5でワイヤー4を半導体チップ3と圧着
する。圧着幅は、ボールの場合3d以上は必要となるが
、本発明では2d以下でも実用レベルの強度は得られた
。In FIG. 5, the wire 4 is crimped onto the semiconductor chip 3. In the case of a ball, a crimp width of 3 d or more is required, but in the present invention, a practical level of strength was obtained even with a crimping width of 2 d or less.
【0029】図8に示す電磁石17によりクランパーバ
ー16を吸引してクランパーヘッド15の間にワイヤー
4を挟み付け、図6に示すようにクランパー7を引き上
げワイヤー4の切断を行う。図8の18はバネである。The clamper bar 16 is attracted by the electromagnet 17 shown in FIG. 8 to sandwich the wire 4 between the clamper heads 15, and the clamper 7 is pulled up to cut the wire 4 as shown in FIG. 18 in FIG. 8 is a spring.
【0030】先に半導体チップ3へのボンディングを行
い、続いて基板1へのボンディングを行っても良い。[0030] Bonding to the semiconductor chip 3 may be performed first, and then bonding to the substrate 1 may be performed.
【0031】[0031]
【発明の効果】従来ウェッジ法しか使用できなかった品
種に対し、本発明によれば回転機構の要らない高速ボン
ダーが使用できる。[Effects of the Invention] According to the present invention, a high-speed bonder that does not require a rotating mechanism can be used for products for which conventionally only the wedge method could be used.
【0032】ウェッジはワイヤーの位置合わせが重要で
あり、ボンダー機構が複雑になっていたが、本発明では
キャピラリーツールを使用することにより複雑化を避け
た。[0032] With wedges, wire positioning is important and the bonder mechanism is complicated, but in the present invention, this complexity is avoided by using a capillary tool.
【0033】本発明によれば、ワイヤー高さが低くなり
半導体装置が小型薄型化が可能であり、また高周波特性
の面でも有利である。According to the present invention, the wire height can be reduced, making it possible to make the semiconductor device smaller and thinner, and it is also advantageous in terms of high frequency characteristics.
【図1】本発明の実施例におけるワイヤー繰り出しを説
明する図面である。FIG. 1 is a diagram illustrating wire feeding in an embodiment of the present invention.
【図2】本発明の実施例におけるワイヤーのクランプと
キャピラリーツールの下方移動を説明する図面である。FIG. 2 is a diagram illustrating the downward movement of a wire clamp and a capillary tool in an embodiment of the present invention.
【図3】本発明の実施例におけるワイヤーと基板との圧
着を説明する図面である。FIG. 3 is a diagram illustrating crimping between a wire and a substrate in an embodiment of the present invention.
【図4】本発明の実施例におけるキャピラリーツールの
配線方向への移動を説明する図面である。FIG. 4 is a diagram illustrating movement of the capillary tool in the wiring direction in the embodiment of the present invention.
【図5】本発明の実施例におけるワイヤーと半導体チッ
プとの圧着を説明する図面である。FIG. 5 is a diagram illustrating crimping of a wire and a semiconductor chip in an embodiment of the present invention.
【図6】本発明の実施例におけるワイヤーの切断を説明
する図面である。FIG. 6 is a diagram illustrating cutting of a wire in an embodiment of the present invention.
【図7】本発明の実施例におけるクランパーとキャピラ
リーツールの動作のタイムチャートを説明する図面であ
る。FIG. 7 is a diagram illustrating a time chart of operations of a clamper and a capillary tool in an embodiment of the present invention.
【図8】クランパーの構造を説明する図面である。FIG. 8 is a diagram illustrating the structure of a clamper.
【図9】2回圧着をしたワイヤーの平面図である。FIG. 9 is a plan view of a wire that has been crimped twice.
【図10】ボールボンディング法の説明図である。FIG. 10 is an explanatory diagram of a ball bonding method.
【図11】キャピラリーツールとワイヤーの説明図であ
る。FIG. 11 is an explanatory diagram of a capillary tool and wire.
【図12】ウェッジボンディング法の説明図である。FIG. 12 is an explanatory diagram of a wedge bonding method.
【図13】キャピラリーツールを用いワイヤーを90度
曲げて行う比較例に係るワイヤボンディング法の説明図
である。FIG. 13 is an explanatory diagram of a wire bonding method according to a comparative example in which a wire is bent by 90 degrees using a capillary tool.
1 基板(パッケージ基板) 2 ろう材 3 半導体チップ 4 ワイヤー 6 キャピラリーツール 7 クランパー 11 ウェッジツール 1 Board (package board) 2 Brazing filler metal 3 Semiconductor chip 4 Wire 6 Capillary tool 7 Clamper 11 Wedge tool
Claims (4)
から通過させるとともに、キャピラリーツールを降下さ
せ、ワイヤー先端をパッケージ基板または半導体チップ
の一方に当て、続いてワイヤーを配線方向に移動させな
がらキャピラリーツールを更に降下させ、ワイヤーが圧
着される前に配線方向への前記移動を中止し、キャピラ
リーツールを降下させて、ワイヤーとパッケージ基板ま
たは半導体チップの前記一方への圧着を完了し、続いて
キャピラリーツールを配線の方向へ移動しながら、所定
の高さまで上昇し次いで下降し、パッケージ基板または
半導体チップの他方にワイヤーをキャピラリーツールを
用いて圧着し、キャピラリーツールが上昇しワイヤーを
切断する工程を有することを特徴とする半導体装置の製
造方法。Claim 1: Passing the tip of the wire through the capillary tool, lowering the capillary tool, and applying the tip of the wire to one of the package substrate or the semiconductor chip, and then lowering the capillary tool further while moving the wire in the wiring direction. the movement in the wiring direction before the wire is crimped, the capillary tool is lowered to complete the crimping of the wire to the package substrate or the semiconductor chip, and then the capillary tool is moved to the wiring direction. While moving in the direction, the capillary tool rises to a predetermined height and then falls, crimps the wire to the other side of the package substrate or the semiconductor chip using a capillary tool, and the capillary tool rises to cut the wire. A method for manufacturing a semiconductor device.
ージ基板または半導体チップの前記他方にワイヤーをキ
ャピラリーツールを用いて圧着した後、キャピラリーツ
ールを所定量上昇させ、その後キャピラリーツールの上
方に設けられたクンパーでワイヤーを保持し、キャピラ
リーツールとクランパーの全体を上昇させ、ワイヤーを
切断することを特徴とする半導体装置の製造方法。2. The method according to claim 1, after the wire is crimped to the other of the package substrate or the semiconductor chip using a capillary tool, the capillary tool is raised by a predetermined amount, and then a A method for manufacturing a semiconductor device, which comprises holding a wire with a clamper, raising the entire capillary tool and clamper, and cutting the wire.
ーの先端をキャピラリーツールから通過させるとともに
キャピラリーツールの上方に設けられたクランパーでワ
イヤーを保持したままキャピラリーツールとクランパー
全体を降下させ、ワイヤー先端がパッケージ基板または
半導体チップの一方に当たる直前にクランパーを開放し
、続いてワイヤーを配線方向に移動させながらキャピラ
リーツールを更に降下させ、以降ワイヤーの圧着を行う
半導体装置の製造方法。3. In the method according to claim 1, the tip of the wire is passed through the capillary tool, and the entire capillary tool and clamper are lowered while holding the wire with a clamper provided above the capillary tool, so that the tip of the wire is A method for manufacturing a semiconductor device in which a clamper is released just before it hits one of a package substrate or a semiconductor chip, the capillary tool is then further lowered while moving the wire in the wiring direction, and the wire is then crimped.
1から3のいずれか1項記載の方法を行う半導体装置の
製造方法。4. A method for manufacturing a semiconductor device, in which the method according to claim 1 is carried out using a common ball bonder.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3000771A JPH04251948A (en) | 1991-01-09 | 1991-01-09 | Manufacture of semiconductor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3000771A JPH04251948A (en) | 1991-01-09 | 1991-01-09 | Manufacture of semiconductor |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH04251948A true JPH04251948A (en) | 1992-09-08 |
Family
ID=11482963
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3000771A Withdrawn JPH04251948A (en) | 1991-01-09 | 1991-01-09 | Manufacture of semiconductor |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH04251948A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2015125671A1 (en) * | 2014-02-21 | 2015-08-27 | 株式会社新川 | Method for producing semiconductor device, and wire-bonding device |
-
1991
- 1991-01-09 JP JP3000771A patent/JPH04251948A/en not_active Withdrawn
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2015125671A1 (en) * | 2014-02-21 | 2015-08-27 | 株式会社新川 | Method for producing semiconductor device, and wire-bonding device |
TWI557821B (en) * | 2014-02-21 | 2016-11-11 | 新川股份有限公司 | Manufacturing method of semiconductor device and wire bonding device |
CN106233446A (en) * | 2014-02-21 | 2016-12-14 | 株式会社新川 | The manufacture method of semiconductor device and throwing device |
JPWO2015125671A1 (en) * | 2014-02-21 | 2017-03-30 | 株式会社新川 | Semiconductor device manufacturing method and wire bonding apparatus |
US9922952B2 (en) | 2014-02-21 | 2018-03-20 | Shinkawa Ltd. | Method for producing semiconductor device, and wire-bonding apparatus |
CN106233446B (en) * | 2014-02-21 | 2019-01-01 | 株式会社新川 | The manufacturing method and throwing device of semiconductor device |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
A300 | Application deemed to be withdrawn because no request for examination was validly filed |
Free format text: JAPANESE INTERMEDIATE CODE: A300 Effective date: 19980514 |