JPH0424639Y2 - - Google Patents

Info

Publication number

JPH0424639Y2

JPH0424639Y2 JP2678587U JP2678587U JPH0424639Y2 JP H0424639 Y2 JPH0424639 Y2 JP H0424639Y2 JP 2678587 U JP2678587 U JP 2678587U JP 2678587 U JP2678587 U JP 2678587U JP H0424639 Y2 JPH0424639 Y2 JP H0424639Y2

Authority

JP

Japan

Prior art keywords

thin film

back electrode

insulating layer

insulating

panel

Prior art date

1987-02-24

Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)

Expired

Links

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• 239000010409 thin film Substances 0.000 claims description 51
• 239000000758 substrate Substances 0.000 claims description 15
• 230000008018 melting Effects 0.000 claims description 13
• 238000002844 melting Methods 0.000 claims description 13
• 239000007769 metal material Substances 0.000 claims description 10
• 239000000956 alloy Substances 0.000 claims description 6
• 229910045601 alloy Inorganic materials 0.000 claims description 6
• 239000010410 layer Substances 0.000 description 26
• 230000015556 catabolic process Effects 0.000 description 24
• 238000007740 vapor deposition Methods 0.000 description 11
• 239000011521 glass Substances 0.000 description 10
• 239000011159 matrix material Substances 0.000 description 9
• 238000000034 method Methods 0.000 description 9
• 239000010408 film Substances 0.000 description 8
• 239000002184 metal Substances 0.000 description 8
• 229910052751 metal Inorganic materials 0.000 description 8
• 239000011295 pitch Substances 0.000 description 5
• 229910018072 Al 2 O 3 Inorganic materials 0.000 description 4
• 238000001704 evaporation Methods 0.000 description 4
• 239000000463 material Substances 0.000 description 4
• 238000004544 sputter deposition Methods 0.000 description 4
• 230000000694 effects Effects 0.000 description 3
• 230000008020 evaporation Effects 0.000 description 3
• 238000004519 manufacturing process Methods 0.000 description 3
• 229920002120 photoresistant polymer Polymers 0.000 description 3
• 230000001681 protective effect Effects 0.000 description 3
• 229910052581 Si3N4 Inorganic materials 0.000 description 2
• 229910052787 antimony Inorganic materials 0.000 description 2
• 230000015572 biosynthetic process Effects 0.000 description 2
• 229910052797 bismuth Inorganic materials 0.000 description 2
• 229910052793 cadmium Inorganic materials 0.000 description 2
• 239000002131 composite material Substances 0.000 description 2
• 239000006059 cover glass Substances 0.000 description 2
• 239000000428 dust Substances 0.000 description 2
• 229910052738 indium Inorganic materials 0.000 description 2
• 229910052745 lead Inorganic materials 0.000 description 2
• 229910044991 metal oxide Inorganic materials 0.000 description 2
• 150000004706 metal oxides Chemical class 0.000 description 2
• 239000011241 protective layer Substances 0.000 description 2
• HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 2
• 238000009751 slip forming Methods 0.000 description 2
• 229910052716 thallium Inorganic materials 0.000 description 2
• 229910052718 tin Inorganic materials 0.000 description 2
• 229910052725 zinc Inorganic materials 0.000 description 2
• 229910004298 SiO 2 Inorganic materials 0.000 description 1
• 239000000853 adhesive Substances 0.000 description 1
• 230000001070 adhesive effect Effects 0.000 description 1
• 238000009792 diffusion process Methods 0.000 description 1
• 239000012530 fluid Substances 0.000 description 1
• 238000010030 laminating Methods 0.000 description 1
• 230000001902 propagating effect Effects 0.000 description 1
• 229920002545 silicone oil Polymers 0.000 description 1