JPH0423823B2 - - Google Patents

Info

Publication number
JPH0423823B2
JPH0423823B2 JP56143859A JP14385981A JPH0423823B2 JP H0423823 B2 JPH0423823 B2 JP H0423823B2 JP 56143859 A JP56143859 A JP 56143859A JP 14385981 A JP14385981 A JP 14385981A JP H0423823 B2 JPH0423823 B2 JP H0423823B2
Authority
JP
Japan
Prior art keywords
plasma processing
processing chamber
plasma
side wall
cleaning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP56143859A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5846639A (ja
Inventor
Tooru Ootsubo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP14385981A priority Critical patent/JPS5846639A/ja
Publication of JPS5846639A publication Critical patent/JPS5846639A/ja
Publication of JPH0423823B2 publication Critical patent/JPH0423823B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Drying Of Semiconductors (AREA)
JP14385981A 1981-09-14 1981-09-14 プラズマ処理装置 Granted JPS5846639A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14385981A JPS5846639A (ja) 1981-09-14 1981-09-14 プラズマ処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14385981A JPS5846639A (ja) 1981-09-14 1981-09-14 プラズマ処理装置

Publications (2)

Publication Number Publication Date
JPS5846639A JPS5846639A (ja) 1983-03-18
JPH0423823B2 true JPH0423823B2 (enrdf_load_stackoverflow) 1992-04-23

Family

ID=15348627

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14385981A Granted JPS5846639A (ja) 1981-09-14 1981-09-14 プラズマ処理装置

Country Status (1)

Country Link
JP (1) JPS5846639A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8877865B2 (en) 2009-03-30 2014-11-04 Kuraray Co., Ltd. Resin composition and multilayered structure

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6348832A (ja) * 1986-08-19 1988-03-01 Tokyo Electron Ltd Ｃｖｄ装置
JPS6376434A (ja) * 1986-09-19 1988-04-06 Hitachi Ltd プラズマ処理装置及びプラズマクリーニング方法
JPH0831442B2 (ja) * 1987-03-11 1996-03-27 株式会社日立製作所 プラズマ処理方法及び装置
US7393432B2 (en) * 2004-09-29 2008-07-01 Lam Research Corporation RF ground switch for plasma processing system

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55119175A (en) * 1979-03-07 1980-09-12 Toshiba Corp Reactive ion etching method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8877865B2 (en) 2009-03-30 2014-11-04 Kuraray Co., Ltd. Resin composition and multilayered structure

Also Published As

Publication number Publication date
JPS5846639A (ja) 1983-03-18

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