JPH0422291Y2 - - Google Patents
Info
- Publication number
- JPH0422291Y2 JPH0422291Y2 JP1984136072U JP13607284U JPH0422291Y2 JP H0422291 Y2 JPH0422291 Y2 JP H0422291Y2 JP 1984136072 U JP1984136072 U JP 1984136072U JP 13607284 U JP13607284 U JP 13607284U JP H0422291 Y2 JPH0422291 Y2 JP H0422291Y2
- Authority
- JP
- Japan
- Prior art keywords
- responsive
- electrode
- responsive membrane
- concentration
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000012528 membrane Substances 0.000 claims description 23
- 150000003839 salts Chemical class 0.000 claims description 13
- 239000000758 substrate Substances 0.000 claims description 11
- 150000002500 ions Chemical class 0.000 claims description 7
- 150000001450 anions Chemical class 0.000 claims description 4
- 150000001768 cations Chemical class 0.000 claims description 4
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 18
- 239000000460 chlorine Substances 0.000 description 14
- 239000011734 sodium Substances 0.000 description 14
- 239000007788 liquid Substances 0.000 description 9
- 238000005259 measurement Methods 0.000 description 9
- 239000011780 sodium chloride Substances 0.000 description 9
- 239000004020 conductor Substances 0.000 description 6
- WCUXLLCKKVVCTQ-UHFFFAOYSA-M Potassium chloride Chemical compound [Cl-].[K+] WCUXLLCKKVVCTQ-UHFFFAOYSA-M 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 239000003822 epoxy resin Substances 0.000 description 3
- 229920000647 polyepoxide Polymers 0.000 description 3
- 239000012488 sample solution Substances 0.000 description 3
- 229910001415 sodium ion Inorganic materials 0.000 description 3
- UXVMQQNJUSDDNG-UHFFFAOYSA-L Calcium chloride Chemical compound [Cl-].[Cl-].[Ca+2] UXVMQQNJUSDDNG-UHFFFAOYSA-L 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 2
- FKNQFGJONOIPTF-UHFFFAOYSA-N Sodium cation Chemical compound [Na+] FKNQFGJONOIPTF-UHFFFAOYSA-N 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 239000001103 potassium chloride Substances 0.000 description 2
- 235000011164 potassium chloride Nutrition 0.000 description 2
- 238000007639 printing Methods 0.000 description 2
- 238000007650 screen-printing Methods 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- FJSZDECKJYYBGE-UHFFFAOYSA-N bis(1,4,7,10-tetraoxacyclododec-2-ylmethyl) 2-dodecyl-2-methylpropanedioate Chemical class C1OCCOCCOCCOC1COC(=O)C(C)(CCCCCCCCCCCC)C(=O)OCC1COCCOCCOCCO1 FJSZDECKJYYBGE-UHFFFAOYSA-N 0.000 description 1
- 239000001110 calcium chloride Substances 0.000 description 1
- 229910001628 calcium chloride Inorganic materials 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- -1 chlorine ions Chemical class 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- XKBGEWXEAPTVCK-UHFFFAOYSA-M methyltrioctylammonium chloride Chemical compound [Cl-].CCCCCCCC[N+](C)(CCCCCCCC)CCCCCCCC XKBGEWXEAPTVCK-UHFFFAOYSA-M 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000010979 pH adjustment Methods 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 239000000523 sample Substances 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229940100890 silver compound Drugs 0.000 description 1
- 150000003379 silver compounds Chemical class 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)
- Manufacture Of Macromolecular Shaped Articles (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1984136072U JPH0422291Y2 (US20030204162A1-20031030-M00001.png) | 1984-09-06 | 1984-09-06 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1984136072U JPH0422291Y2 (US20030204162A1-20031030-M00001.png) | 1984-09-06 | 1984-09-06 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6150261U JPS6150261U (US20030204162A1-20031030-M00001.png) | 1986-04-04 |
JPH0422291Y2 true JPH0422291Y2 (US20030204162A1-20031030-M00001.png) | 1992-05-21 |
Family
ID=30694547
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1984136072U Expired JPH0422291Y2 (US20030204162A1-20031030-M00001.png) | 1984-09-06 | 1984-09-06 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0422291Y2 (US20030204162A1-20031030-M00001.png) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10288582B2 (en) * | 2016-01-12 | 2019-05-14 | Analog Devices Global | Integrated ion sensing apparatus and methods |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57106852A (en) * | 1980-12-23 | 1982-07-02 | Fuji Photo Film Co Ltd | Ion selective electrode, its preparation and accumulation plate of ion selective electrode |
JPS5810645A (ja) * | 1981-07-13 | 1983-01-21 | Fuji Photo Film Co Ltd | フイルム状イオン選択電極及びこれを用いるイオン濃度測定法 |
JPS5849248B2 (ja) * | 1980-07-16 | 1983-11-02 | 清 川上 | はしに彫刻模様を形成する方法 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5849248U (ja) * | 1981-09-30 | 1983-04-02 | 柳沢 三郎 | 被覆型電極 |
-
1984
- 1984-09-06 JP JP1984136072U patent/JPH0422291Y2/ja not_active Expired
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5849248B2 (ja) * | 1980-07-16 | 1983-11-02 | 清 川上 | はしに彫刻模様を形成する方法 |
JPS57106852A (en) * | 1980-12-23 | 1982-07-02 | Fuji Photo Film Co Ltd | Ion selective electrode, its preparation and accumulation plate of ion selective electrode |
JPS5810645A (ja) * | 1981-07-13 | 1983-01-21 | Fuji Photo Film Co Ltd | フイルム状イオン選択電極及びこれを用いるイオン濃度測定法 |
Also Published As
Publication number | Publication date |
---|---|
JPS6150261U (US20030204162A1-20031030-M00001.png) | 1986-04-04 |