JPH0420022U - - Google Patents
Info
- Publication number
- JPH0420022U JPH0420022U JP6086790U JP6086790U JPH0420022U JP H0420022 U JPH0420022 U JP H0420022U JP 6086790 U JP6086790 U JP 6086790U JP 6086790 U JP6086790 U JP 6086790U JP H0420022 U JPH0420022 U JP H0420022U
- Authority
- JP
- Japan
- Prior art keywords
- transparent electrode
- acid
- etching
- tank containing
- manufacturing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000005530 etching Methods 0.000 claims description 3
- 239000002253 acid Substances 0.000 claims 2
- 238000004519 manufacturing process Methods 0.000 claims 2
- 229910003437 indium oxide Inorganic materials 0.000 claims 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 claims 1
- 230000010355 oscillation Effects 0.000 claims 1
- 239000000758 substrate Substances 0.000 claims 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 claims 1
- 229910001887 tin oxide Inorganic materials 0.000 claims 1
- 238000005406 washing Methods 0.000 claims 1
Description
第１図は、本案明の一実施例の概略側面図であ
る。
１０……ローダー、２０……エツチング槽、３
０……超音波リンス槽、４０……水切り、５０…
…アンローダー、２１，３１……搬送装置、３２
……超音波発信源。
FIG. 1 is a schematic side view of an embodiment of the present invention. 10...Loader, 20...Etching tank, 3
0... Ultrasonic rinse tank, 40... Drainer, 50...
... Unloader, 21, 31 ... Conveyance device, 32
...Ultrasonic source.
Claims (1)
導電膜を全面形成した基板に対し、パターンエツ
チングを行う透明電極の製造装置において、少く
とも高濃度の酸のエツチング槽と、超音波発振源
を有する前記酸の８０〜０．０５％濃度の酸の超
音波リンス槽と、水洗槽が直接もしくは搬送装置
を介して上記の順に連設されて構成される透明電
極の製造装置。 In a transparent electrode manufacturing apparatus that performs pattern etching on a substrate on which a conductive film containing indium oxide and tin oxide as main components is formed, an etching tank containing at least a highly concentrated acid and an ultrasonic oscillation source are provided. An apparatus for manufacturing a transparent electrode, comprising an ultrasonic rinsing tank containing an acid having a concentration of 80 to 0.05%, and a washing tank, which are connected in the above order directly or via a conveying device.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6086790U JPH089711Y2 (en) | 1990-06-08 | 1990-06-08 | Transparent electrode manufacturing equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6086790U JPH089711Y2 (en) | 1990-06-08 | 1990-06-08 | Transparent electrode manufacturing equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0420022U true JPH0420022U (en) | 1992-02-19 |
| JPH089711Y2 JPH089711Y2 (en) | 1996-03-21 |
Family
ID=31588609
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6086790U Expired - Lifetime JPH089711Y2 (en) | 1990-06-08 | 1990-06-08 | Transparent electrode manufacturing equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH089711Y2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2015045449A1 (en) * | 2013-09-26 | 2015-04-02 | 豊田合成 株式会社 | Laminate and method for producing same |
-
1990
- 1990-06-08 JP JP6086790U patent/JPH089711Y2/en not_active Expired - Lifetime
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2015045449A1 (en) * | 2013-09-26 | 2015-04-02 | 豊田合成 株式会社 | Laminate and method for producing same |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH089711Y2 (en) | 1996-03-21 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |