JPH04187796A - Method for continuously treating one side of extremely thin metallic foil - Google Patents

Method for continuously treating one side of extremely thin metallic foil

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Publication number
JPH04187796A
JPH04187796A JP31628890A JP31628890A JPH04187796A JP H04187796 A JPH04187796 A JP H04187796A JP 31628890 A JP31628890 A JP 31628890A JP 31628890 A JP31628890 A JP 31628890A JP H04187796 A JPH04187796 A JP H04187796A
Authority
JP
Japan
Prior art keywords
rotating drum
drum
surface treatment
metal foil
ultra
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP31628890A
Other languages
Japanese (ja)
Inventor
Hideo Sugano
秀雄 菅野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Steel Corp
Original Assignee
Nippon Steel Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Steel Corp filed Critical Nippon Steel Corp
Priority to JP31628890A priority Critical patent/JPH04187796A/en
Publication of JPH04187796A publication Critical patent/JPH04187796A/en
Pending legal-status Critical Current

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Abstract

PURPOSE:To firmly attach a metallic foil to a rotary drum and to excellently treat one side of the foil by dipping the foil firmly attached to the drum in a surface treating soln. and freely tilting the drum to uniformize the tension of the foil. CONSTITUTION:An extremely thin metallic foil is continuously supplied through a guide roll, attached to a rotary drum and dipped in a surface treating soln., etc., and the side out of contact with the drum is selectively surface-treated. In this device for continuously treating one side, the drum 20 is supported by a support 10 through a bearing 9, and the supports 10 and 10 are supported by a shaft 12 on the oil 13 in a cylinder 11. A material to be treated is delivered to the drum 20. When the tension of the material becomes nonuniform, the drum 20 is freely tilted by the difference in compressive force in the cross direction of the drum 20 resulting from the nonuniformity. As a result, the compressive force is uniformized, the material is firmly held to the drum 20 to prevent the intrusion of the surface treating soln., and only the one side is excellently treated.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は、案内ロールを通り、極薄金属箔を連続供給し
て、回転ドラムを用いて、被処理材の片面に良好な表面
処理を行う片面連続表面処理方法に関するものである。
DETAILED DESCRIPTION OF THE INVENTION (Industrial Application Field) The present invention continuously supplies ultra-thin metal foil through guide rolls and uses a rotating drum to achieve a good surface treatment on one side of a material to be treated. The present invention relates to a single-sided continuous surface treatment method.

(従来の技術) 回転ドラム式片面連続表面処理装置は、回転するドラム
に被表面処理材を接触させて、目的とする表面処理液等
に浸漬し、回転ドラムに接触していない面のみを選択的
に表面処理を行うように構成されている。
(Prior art) A rotating drum type single-sided continuous surface treatment device brings the material to be surface treated into contact with a rotating drum, immerses it in the desired surface treatment liquid, etc., and selects only the surface that is not in contact with the rotating drum. It is configured to perform surface treatment on a regular basis.

従来型の回転ドラム式表面処理装置の略図を第8図、第
9図、第10図に示す。第8図は、極薄金属箔(被処理
材)2を給電ロール3を通り供給し、ゴムを外周に貼っ
た回転ドラム1に接触させて、電気めっきを行う表面処
理装置である。被処理材2への給電は、給電ロール3よ
り行う。図中4は陽極、5は処理液である。
Schematic diagrams of conventional rotary drum surface treatment apparatuses are shown in FIGS. 8, 9, and 10. FIG. 8 shows a surface treatment apparatus that performs electroplating by supplying an extremely thin metal foil (material to be treated) 2 through a power supply roll 3 and bringing it into contact with a rotating drum 1 whose outer periphery is coated with rubber. Power is supplied to the material to be processed 2 from a power supply roll 3. In the figure, 4 is an anode, and 5 is a processing liquid.

第9図は極薄金属箔(被処理材)2をガイドロ−ル6を
通り供給し、導電性の回転ドラム1に被処理材2を接触
させて、片面の電気めっきを行う表面処理装置である。
Figure 9 shows a surface treatment device that performs electroplating on one side by feeding an ultra-thin metal foil (material to be treated) 2 through guide rolls 6 and bringing the material to be treated 2 into contact with a conductive rotating drum 1. be.

被処理材2への給電は、回転ドラム1より行う、4は陽
極、5は処理液である。
Power is supplied to the material to be treated 2 from the rotating drum 1, 4 is an anode, and 5 is a treatment liquid.

第10図は極薄金属箔(被処理材)2をガイドロール6
を通り供給し、回転ドラム1に被処理材2を接触させて
片面の電気めっきを行う表面処理装置である。この装置
では回転ドラム1の幅方向中央部に通電リング7を設け
て、この通電リング7を挟んで両側にゴム8を設けてお
り、被処理材2への給電は通電リング7により行う。
Figure 10 shows the ultra-thin metal foil (material to be treated) 2 placed on the guide roll 6.
This is a surface treatment apparatus that performs single-sided electroplating by bringing the material 2 to be treated into contact with the rotating drum 1. In this device, a current-carrying ring 7 is provided at the center in the width direction of the rotating drum 1, and rubber 8 is provided on both sides of the current-carrying ring 7, and power is supplied to the material 2 to be processed by the current-carrying ring 7.

(発明が解決しようとする課題) 前記の如き回転ドラムを用いた表面処理装置は、いずれ
の場合も、被処理材2に与えられる張力によって発生す
る回転ドラムへの圧縮力により、被処理材を回転ドラム
に密着させて、片面に表面処理を施すように構成されて
いる。しかしながら、極薄金属箔の表面処理を行う場合
は、金属が薄くなると剛性が低下するため、搬送や処理
中に桔が延びたり、破断することがある。そのため、一
般に伸びや破断を防止すべく低張力で搬送や処理が行わ
れている。しかし、低張力下では箔が回転ドラムに与え
る圧縮力が弱くなる。また、箔が蛇行しやすくなり、被
処理材の張力によって与えられる回転ドラムの円周方向
および幅方向への圧縮力が不均一になり、被処理材が完
全に回転ドラムに密着せずに、回転ドラムと被処理材の
隙間に処理液が侵入し、このため電解時に電流が処理面
の裏面側にも流れ、裏面側にめっき金属が析出するよう
になる。そのため、箔の表面性状が著しく損われたり、
また製造工程が複雑になり、生産性に問題があった。
(Problem to be Solved by the Invention) In any case, the surface treatment apparatus using a rotating drum as described above treats the material to be treated by compressive force on the rotating drum generated by the tension applied to the material to be treated 2. It is configured to be brought into close contact with the rotating drum and to be surface treated on one side. However, when performing surface treatment on ultra-thin metal foil, the rigidity decreases as the metal becomes thinner, so the frame may stretch or break during transportation or processing. Therefore, transportation and processing are generally performed under low tension to prevent elongation and breakage. However, at low tensions the foil exerts less compressive force on the rotating drum. In addition, the foil tends to meander, and the compressive force applied by the tension of the material to be processed in the circumferential direction and width direction of the rotating drum becomes uneven, and the material to be processed does not come into complete contact with the rotating drum. The processing liquid enters the gap between the rotating drum and the material to be processed, and therefore, during electrolysis, current also flows to the back side of the processing surface, causing plating metal to be deposited on the back side. As a result, the surface quality of the foil may be significantly damaged,
In addition, the manufacturing process became complicated, causing problems in productivity.

本発明の目的は、このような問題点を排除しうる極薄金
属箔の片面連続表面処理方法を提供しようとするにある
An object of the present invention is to provide a method for continuous surface treatment on one side of ultra-thin metal foil that can eliminate such problems.

(411題を解決するための手段) 本発明の要旨とするところは下記のとおりである。(Means for solving 411 problems) The gist of the present invention is as follows.

(1)案内ロールを通り、極薄金属箔を連続供給し、回
転ドラムを用いて、被処理材の片面に表面処理を行う片
面連続表面処理装置において、被処理材の張力の不均一
によって発生する回転ドラムへの幅方向の圧縮力の差を
利用し、回転ドラムを自在に傾動させ、回転ドラムへの
圧縮力を均一化させることにより、被処理材を回転ドラ
ムに密着させて、片面のみに表面処理を施すことを特徴
とする極薄金属箔の片面連続表面処理方法。
(1) Occurs due to uneven tension on the treated material in a single-sided continuous surface treatment device that continuously supplies ultra-thin metal foil through a guide roll and uses a rotating drum to perform surface treatment on one side of the treated material. By making use of the difference in compressive force in the width direction to the rotating drum, the rotating drum can be tilted freely, and the compressive force to the rotating drum is evened out. By doing so, the material to be processed can be brought into close contact with the rotating drum, and only one side can be processed. A continuous surface treatment method for one side of ultra-thin metal foil, characterized by subjecting surface treatment to the surface of the ultra-thin metal foil.

(2)前項1記載の極薄金属箔の片面連続表面処理装置
において、自在に傾動可能な回転ドラムに対向して設置
するめっき電極を回転ドラムの傾動に連動させ、電極間
距離を一定に制御することを特徴とする前項1記載の極
薄金属箔の片面連続表面処理方法。
(2) In the single-sided continuous surface treatment device for ultra-thin metal foil described in item 1 above, the plating electrodes installed opposite the freely tiltable rotating drum are linked to the tilting of the rotating drum, and the distance between the electrodes is controlled to be constant. A single-sided continuous surface treatment method for ultra-thin metal foil according to item 1 above.

以下本発明を添付図面により詳細に説明する。The present invention will be explained in detail below with reference to the accompanying drawings.

第1図に本発明の実施に際して用いる回転ドラムの構成
図を示す0回転ドラム20の両端は軸受け9を介して支
持台10で回転できるように各々固定し、該支持台10
は油圧シリンダー11のシャフト12に各々固定する。
FIG. 1 shows a block diagram of a rotary drum used in carrying out the present invention. Both ends of a zero-rotation drum 20 are fixed so as to be rotatable on a support base 10 via bearings 9.
are fixed to the shaft 12 of the hydraulic cylinder 11, respectively.

さらに、各シリンダー11の端部は互いに、ロール圧縮
力を伝達する媒体である油13によって連結する。さら
に、めっき用電極15を回転ドラム20のシャフトに回
転ドラムが回転できるようにとりつける。このような構
造とすることによって、回転ドラムは自由に回転でき、
かつ被処理材に与えられる張力の不均一によって発生す
る回転ドラムへの幅方向の圧縮力の差によって、回転ド
ラムと電極間距離を一定に保ったまま上下に傾動するこ
とができる。即ち、被処理材2を回転ドラム20の下側
に接するように通過させることによって、金属箔の張力
の不均一により発生する幅方向の回転ドラム20への圧
縮力の差により、回転ドラムの端部に固定されたシリン
ダー11のシャフト12が媒体である油13を介して上
下に傾動して、幅方向の張力を均一化させる。支持台1
0を連動させる媒体は油に限定されるものではなく、金
属箔の張力によって与えられる回転ドラムへの圧縮力を
伝達する媒体であればよい、また、回転ドラムの材質も
例えば導電性材料、絶縁物、半導体等が用いられ、特に
限定する必要はなく、めっき電源の給電法によって決め
ることができる。さらに、ロールを傾動させる方法とし
ては、第2図に示すように、回転ドラム20の両端を軸
受け9を介して回転できる構造で支持台14に固定し、
めっき用電極15をとりつられる。支持台14の中央部
はさらにベアリング16を介して支持台17に固定され
る。支持台14の両端は、スプリング18を介して支持
台17により保持され、平衡状態になるようにとりつけ
である。このようにすることによって回転ドラム20は
自由に回転でき、かつロール端部にかかる荷重に対して
上下に傾動することができる。即ち、回転ドラム20の
下側に金属箔が接するように通過させることによって金
属箔の幅方向の張力の不均一により発生する圧縮力によ
って平衡状態になるように回転ドラム20の端部がベア
リング16を中心として上下に自在に傾動する。スプリ
ング18はなくてもよく、その場合は、回転ドラムに接
する金属箔の張力の不均一によって生じる圧縮力によっ
て平衡状態になる。このように回転ドラムの幅方向の張
力を均一化させることにより、被処理材を回転ドラムに
密着させることができ、隙間に処理液が侵入することが
なく、良好な片面表面処理を行い得る。また、回転ロー
ルと対向する電極間距離を一定に制御することによって
付着量の均一性を向上させることができる。
Furthermore, the ends of each cylinder 11 are connected to each other by oil 13, which is a medium for transmitting roll compression force. Furthermore, the plating electrode 15 is attached to the shaft of the rotating drum 20 so that the rotating drum can rotate. With this structure, the rotating drum can rotate freely,
Furthermore, due to the difference in compressive force in the width direction on the rotating drum caused by uneven tension applied to the material to be treated, it is possible to tilt the rotating drum up and down while keeping the distance between the rotating drum and the electrodes constant. That is, by passing the material 2 to be treated so as to touch the lower side of the rotating drum 20, the edge of the rotating drum is A shaft 12 of a cylinder 11 fixed to the shaft tilts up and down via oil 13, which is a medium, to equalize the tension in the width direction. Support stand 1
The medium for interlocking the zeros is not limited to oil, but may be any medium that transmits the compressive force given by the tension of the metal foil to the rotating drum.The material of the rotating drum may also be, for example, a conductive material or an insulating material. There is no need to specifically limit the power supply, and it can be determined depending on the power supply method of the plating power supply. Furthermore, as a method for tilting the roll, as shown in FIG.
The plating electrode 15 is taken. The center portion of the support base 14 is further fixed to a support base 17 via a bearing 16. Both ends of the support base 14 are held by the support base 17 via springs 18, and are mounted so as to be in a balanced state. By doing so, the rotating drum 20 can freely rotate and can tilt up and down with respect to the load applied to the end of the roll. That is, by passing the metal foil in contact with the lower side of the rotating drum 20, the end portion of the rotating drum 20 is placed in the bearing 16 so that the end portion of the rotating drum 20 is balanced by the compressive force generated by the non-uniform tension in the width direction of the metal foil. It can be tilted freely up and down around the center. The spring 18 may be omitted, in which case it is balanced by compressive forces caused by uneven tension in the metal foil against the rotating drum. By making the tension in the width direction of the rotating drum uniform in this way, the material to be treated can be brought into close contact with the rotating drum, and the processing liquid will not enter into the gap, making it possible to perform good one-sided surface treatment. Further, by controlling the distance between the electrodes facing the rotating roll to be constant, the uniformity of the amount of adhesion can be improved.

さらに、具体的に実施例を示し本発明の詳細な説明する
Furthermore, the present invention will be explained in detail by specifically showing examples.

(実施例1) 第8図に示す片面の表面処理装置において、給電ロール
3を通り、外周にゴムを貼った回転ドラム1の下側に、
被処理材2として厚み20μm、幅20C11のステン
レス鋼箔を接触、通過させ、通常用いられているワット
浴で、電流密度5 A/d■:の条件で付着量が1.5
μmになるような通板速度で200m片面Niめっきを
行った。被処理材2への給電は、給電ロール3より行っ
た。片面の表面処理法としての評価は、表裏面のNi付
着量測定によって評価した。そこで、2m毎に試料を採
取し、箔の長さ方向に20CI、幅方向に0.5cmの
短冊状に試料を切り出し、表裏の幅方向のNi付着量を
分析した。長さ方向に平均した幅方向の分析結果を第3
図に示す、第4図は、第8図に示す従来片面表面処理装
置において、回転ドラムとして外周にゴムを貼り、かつ
本発明に従った構造とした回転ドラム20に変換した装
置であり、この装置を用いて前述の従来法と同一条件で
片面Niめっきを施し、同一条件で試料を採取し、表裏
のNi付着量を分析した。表1に従来法および本発明方
法による表裏の平均Ni付着量を示す、また、幅方向の
分析結果を第5図に示す。
(Example 1) In the single-sided surface treatment apparatus shown in FIG.
A stainless steel foil with a thickness of 20 μm and a width of 20C11 was brought into contact with and passed through as the material to be treated 2, and the amount of adhesion was 1.5 at a current density of 5 A/d in a commonly used Watt bath.
One-sided Ni plating was carried out for 200 m at a threading speed of μm. Power was supplied to the material to be treated 2 from a power supply roll 3. The single-sided surface treatment method was evaluated by measuring the amount of Ni deposited on the front and back surfaces. Therefore, samples were taken every 2 m, and the samples were cut into strips of 20 CI in the length direction and 0.5 cm in the width direction of the foil, and the amount of Ni deposited on the front and back sides in the width direction was analyzed. The analysis results in the width direction averaged in the length direction are
4 shows a conventional single-sided surface treatment apparatus shown in FIG. 8, which has been converted into a rotating drum 20 with rubber applied to the outer periphery and structured according to the present invention. Single-sided Ni plating was performed using the apparatus under the same conditions as the conventional method described above, samples were taken under the same conditions, and the amount of Ni deposited on the front and back surfaces was analyzed. Table 1 shows the average amount of Ni deposited on the front and back surfaces according to the conventional method and the method of the present invention, and FIG. 5 shows the analysis results in the width direction.

表1 表裏のNi付着量の分析結果 表1、第3図、第5図から判るように、本発明によれば
、従来法に比べ、めっき面のNi付着量の均一性もよく
、裏面側のNi付着量を少なくすることが出来る。
Table 1 Results of analysis of the amount of Ni deposited on the front and back sides As can be seen from Table 1, FIGS. The amount of Ni attached can be reduced.

(実施例2) 第9図に示す従来法による片面の表面処理装置において
、案内ロール6を通り、導電性回転ドラム1の下側に、
被処理材2として、厚み20am、幅20C1mのステ
ンレス鋼箔を接触、通過させ、通常用いられている硫酸
銅浴で、電流密度5 A/dm”の条件で付着量が1.
5μmになるような通板速度で200m片面Cuめっき
を行った。被処理材への給電は、回転ドラム1より行っ
た0片面の表面処理法としての評価は、実施例1と同じ
付着量測定法で評価した0分析結果を第6図に示す。次
に、第4図に示す本発明に従った構造を持つ導電性の回
転ドラム22を配置した片面表面処理装置を用いて前記
従来法と同一条件で片面Cuめっきを施し、同一条件で
試料を採取し、表裏のCuめっき付着量を分析した0表
2にCuの平均付着量と色むらの発生状況を示す、さら
に、幅方向の分析結果を第7図に示す。
(Example 2) In the conventional single-sided surface treatment apparatus shown in FIG.
As the material to be treated 2, a stainless steel foil having a thickness of 20 am and a width of 20 C1 m was brought into contact with and passed through it, and the amount of adhesion was 1.5 cm at a current density of 5 A/dm in a commonly used copper sulfate bath.
One-sided Cu plating was performed for 200 m at a threading speed of 5 μm. Electric power was supplied to the material to be treated using the rotary drum 1.The evaluation as a single-sided surface treatment method was performed using the same adhesion measurement method as in Example 1.The analysis results are shown in FIG. Next, one-sided Cu plating was applied under the same conditions as in the conventional method using a single-sided surface treatment apparatus equipped with a conductive rotating drum 22 having a structure according to the present invention shown in FIG. Table 2 shows the average amount of Cu plating and the occurrence of color unevenness, and the analysis results in the width direction are shown in FIG. 7.

表2、第6図、第7図から判るように、本発明によれば
、Cu付着量の差による色むらも発生しなかった。また
、従来法に比べ、めっき面のCu付着量の均一性も良好
で、裏面側のCu付着量を少なくすることができた。
As can be seen from Table 2, FIG. 6, and FIG. 7, according to the present invention, color unevenness due to the difference in the amount of deposited Cu did not occur. Furthermore, compared to the conventional method, the uniformity of the amount of Cu deposited on the plated surface was also good, and the amount of Cu deposited on the back side could be reduced.

(発明の効果) 本発明によれば、被処理材を回転ドラムに密着させるこ
とができるので、良好な片面表面処理を行い得る。また
、回転ロールと対向する電極間距離を一定に制御するこ
とによって付着量の均一性を向上させることができ、そ
の効果は大きい。
(Effects of the Invention) According to the present invention, since the material to be treated can be brought into close contact with the rotating drum, a good single-sided surface treatment can be performed. Furthermore, by controlling the distance between the electrodes facing the rotating roll to be constant, the uniformity of the amount of adhesion can be improved, which is highly effective.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図、第2図、第4図は本発明の実施装置の回転ドラ
ムの構造を示す概略説明図である。 第3図、第5図は実施例1における従来法及び本発明法
の実施結果を示す図、第6図、第7図は実施例2におけ
る従来法及び本発明法の実施結果を示す図である。 第8図、第9図、第10図は従来の回転ドラム式片面表
面処理装置の説明図で、各図の(a)は正面図、各図の
(b)は回転ドラムの側面概要図である。 1・・・回転ドラム、2・・・被処理材、3・・・給電
ロール、4・・・電極、5・・・処理液、6・・・ガイ
ドロール、7・・・通電リング、8・・・ゴム、 9・・・軸受け、10・・・支持台、11・・・シリン
ダー、12・・・シリンダーのシャフト、13・・・油
、14・・・支持台、15・・・電極、16・・・ベア
リング、17・・・支持台、18・・・スプリング、1
9・・・ステンレス鋼箔、20・・・本発明による回転
ドラム、21・・・ステンレス鋼箔、22・・・本発明
による導電性回転ドラム。 特許出願人 新日本製鐵株式會社
FIG. 1, FIG. 2, and FIG. 4 are schematic explanatory diagrams showing the structure of a rotating drum of an apparatus for implementing the present invention. Figures 3 and 5 are diagrams showing the implementation results of the conventional method and the present invention method in Example 1, and Figures 6 and 7 are diagrams showing the implementation results of the conventional method and the present invention method in Example 2. be. Figures 8, 9, and 10 are explanatory diagrams of a conventional rotating drum type single-sided surface treatment device, with (a) in each figure being a front view, and (b) in each figure being a schematic side view of the rotating drum. be. DESCRIPTION OF SYMBOLS 1... Rotating drum, 2... Processing material, 3... Power supply roll, 4... Electrode, 5... Processing liquid, 6... Guide roll, 7... Current-carrying ring, 8 ... Rubber, 9 ... Bearing, 10 ... Support stand, 11 ... Cylinder, 12 ... Cylinder shaft, 13 ... Oil, 14 ... Support stand, 15 ... Electrode , 16... Bearing, 17... Support stand, 18... Spring, 1
9... Stainless steel foil, 20... Rotating drum according to the present invention, 21... Stainless steel foil, 22... Conductive rotating drum according to the present invention. Patent applicant Nippon Steel Corporation

Claims (2)

【特許請求の範囲】[Claims] (1)案内ロールを通り、極薄金属箔を連続供給し、回
転ドラムを用いて、被処理材の片面に表面処理を行う片
面連続表面処理装置において、被処理材の張力の不均一
によって発生する回転ドラムへの幅方向の圧縮力の差を
利用し、回転ドラムを自在に傾動させ、回転ドラムへの
圧縮力を均一化させることにより、被処理材を回転ドラ
ムに密着させて、片面のみに表面処理を施すことを特徴
とする極薄金属箔の片面連続表面処理方法。
(1) Occurs due to uneven tension on the treated material in a single-sided continuous surface treatment device that continuously supplies ultra-thin metal foil through a guide roll and uses a rotating drum to perform surface treatment on one side of the treated material. By making use of the difference in compressive force in the width direction to the rotating drum, the rotating drum can be tilted freely, and the compressive force to the rotating drum is evened out. By doing so, the material to be processed can be brought into close contact with the rotating drum, and only one side can be processed. A continuous surface treatment method for one side of ultra-thin metal foil, characterized by subjecting surface treatment to the surface of the ultra-thin metal foil.
(2)請求項1記載の極薄金属箔の片面連続表面処理装
置において、自在に傾動可能な回転ドラムに対向して設
置するめっき電極を回転ドラムの傾動に連動させ、電極
間距離を一定に制御することを特徴とする請求項1記載
の極薄金属箔の片面連続表面処理方法。
(2) In the single-sided continuous surface treatment apparatus for ultra-thin metal foil according to claim 1, the plating electrodes installed opposite to the freely tiltable rotating drum are linked to the tilting of the rotating drum, so that the distance between the electrodes is kept constant. 2. The method for continuous surface treatment on one side of ultra-thin metal foil according to claim 1, further comprising: controlling the surface of ultra-thin metal foil.
JP31628890A 1990-11-21 1990-11-21 Method for continuously treating one side of extremely thin metallic foil Pending JPH04187796A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP31628890A JPH04187796A (en) 1990-11-21 1990-11-21 Method for continuously treating one side of extremely thin metallic foil

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP31628890A JPH04187796A (en) 1990-11-21 1990-11-21 Method for continuously treating one side of extremely thin metallic foil

Publications (1)

Publication Number Publication Date
JPH04187796A true JPH04187796A (en) 1992-07-06

Family

ID=18075442

Family Applications (1)

Application Number Title Priority Date Filing Date
JP31628890A Pending JPH04187796A (en) 1990-11-21 1990-11-21 Method for continuously treating one side of extremely thin metallic foil

Country Status (1)

Country Link
JP (1) JPH04187796A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004035985A (en) * 2002-07-08 2004-02-05 Kawasaki Heavy Ind Ltd Apparatus for plating surface of metallic foil
CN104525711A (en) * 2015-01-09 2015-04-22 西华大学 Multi-station hydraulic and automatic foil-beating machine
CN113774370A (en) * 2021-09-01 2021-12-10 云南惠铜新材料科技有限公司 Electrolytic copper foil anti-oxidation treatment device and anti-oxidation process

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004035985A (en) * 2002-07-08 2004-02-05 Kawasaki Heavy Ind Ltd Apparatus for plating surface of metallic foil
CN104525711A (en) * 2015-01-09 2015-04-22 西华大学 Multi-station hydraulic and automatic foil-beating machine
CN113774370A (en) * 2021-09-01 2021-12-10 云南惠铜新材料科技有限公司 Electrolytic copper foil anti-oxidation treatment device and anti-oxidation process

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