JPH04171886A - Manufacture of electronic part having metallic foil circuit pattern and composite supporter having metallic foil circuit pattern used therein - Google Patents
Manufacture of electronic part having metallic foil circuit pattern and composite supporter having metallic foil circuit pattern used thereinInfo
- Publication number
- JPH04171886A JPH04171886A JP30037990A JP30037990A JPH04171886A JP H04171886 A JPH04171886 A JP H04171886A JP 30037990 A JP30037990 A JP 30037990A JP 30037990 A JP30037990 A JP 30037990A JP H04171886 A JPH04171886 A JP H04171886A
- Authority
- JP
- Japan
- Prior art keywords
- circuit pattern
- foil circuit
- photosensitive adhesive
- adhesive layer
- metal foil
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011888 foil Substances 0.000 title claims abstract description 54
- 239000002131 composite material Substances 0.000 title claims abstract description 35
- 238000004519 manufacturing process Methods 0.000 title claims description 12
- 239000012790 adhesive layer Substances 0.000 claims abstract description 39
- 239000002184 metal Substances 0.000 claims description 49
- 229910052751 metal Inorganic materials 0.000 claims description 49
- 238000000034 method Methods 0.000 claims description 12
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 abstract description 28
- 239000000853 adhesive Substances 0.000 abstract description 27
- 230000001070 adhesive effect Effects 0.000 abstract description 27
- 239000011889 copper foil Substances 0.000 abstract description 27
- 239000002313 adhesive film Substances 0.000 abstract description 14
- 239000007788 liquid Substances 0.000 abstract description 5
- 229910000859 α-Fe Inorganic materials 0.000 abstract description 5
- 238000012546 transfer Methods 0.000 abstract description 3
- 229920002120 photoresistant polymer Polymers 0.000 description 10
- 239000010410 layer Substances 0.000 description 9
- 239000000463 material Substances 0.000 description 8
- 239000002585 base Substances 0.000 description 7
- 238000005530 etching Methods 0.000 description 7
- -1 polyethylene terephthalate Polymers 0.000 description 6
- 239000000243 solution Substances 0.000 description 6
- 239000004820 Pressure-sensitive adhesive Substances 0.000 description 4
- 239000003999 initiator Substances 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- VVBLNCFGVYUYGU-UHFFFAOYSA-N 4,4'-Bis(dimethylamino)benzophenone Chemical compound C1=CC(N(C)C)=CC=C1C(=O)C1=CC=C(N(C)C)C=C1 VVBLNCFGVYUYGU-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- 125000005907 alkyl ester group Chemical group 0.000 description 2
- 229920005601 base polymer Polymers 0.000 description 2
- 239000011203 carbon fibre reinforced carbon Substances 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 229920001971 elastomer Polymers 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- 239000012467 final product Substances 0.000 description 2
- 230000001678 irradiating effect Effects 0.000 description 2
- 239000005060 rubber Substances 0.000 description 2
- BWZAUXRKSMJLMH-UHFFFAOYSA-N 1,1-diethoxyethylbenzene Chemical compound CCOC(C)(OCC)C1=CC=CC=C1 BWZAUXRKSMJLMH-UHFFFAOYSA-N 0.000 description 1
- MYWOJODOMFBVCB-UHFFFAOYSA-N 1,2,6-trimethylphenanthrene Chemical compound CC1=CC=C2C3=CC(C)=CC=C3C=CC2=C1C MYWOJODOMFBVCB-UHFFFAOYSA-N 0.000 description 1
- GJZFGDYLJLCGHT-UHFFFAOYSA-N 1,2-diethylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=C(CC)C(CC)=CC=C3SC2=C1 GJZFGDYLJLCGHT-UHFFFAOYSA-N 0.000 description 1
- UYEDESPZQLZMCL-UHFFFAOYSA-N 1,2-dimethylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=C(C)C(C)=CC=C3SC2=C1 UYEDESPZQLZMCL-UHFFFAOYSA-N 0.000 description 1
- YNSNJGRCQCDRDM-UHFFFAOYSA-N 1-chlorothioxanthen-9-one Chemical compound S1C2=CC=CC=C2C(=O)C2=C1C=CC=C2Cl YNSNJGRCQCDRDM-UHFFFAOYSA-N 0.000 description 1
- CTOHEPRICOKHIV-UHFFFAOYSA-N 1-dodecylthioxanthen-9-one Chemical compound S1C2=CC=CC=C2C(=O)C2=C1C=CC=C2CCCCCCCCCCCC CTOHEPRICOKHIV-UHFFFAOYSA-N 0.000 description 1
- WVRHNZGZWMKMNE-UHFFFAOYSA-N 2-hydroxy-1-[2-(2-methylpropyl)phenyl]-2-phenylethanone Chemical compound CC(C)CC1=CC=CC=C1C(=O)C(O)C1=CC=CC=C1 WVRHNZGZWMKMNE-UHFFFAOYSA-N 0.000 description 1
- NACPTFCBIGBTSJ-UHFFFAOYSA-N 2-hydroxy-2-phenyl-1-(2-propan-2-ylphenyl)ethanone Chemical compound CC(C)C1=CC=CC=C1C(=O)C(O)C1=CC=CC=C1 NACPTFCBIGBTSJ-UHFFFAOYSA-N 0.000 description 1
- DNHNBMQCHKKDNI-UHFFFAOYSA-N 2-phenylbutan-1-ol Chemical compound CCC(CO)C1=CC=CC=C1 DNHNBMQCHKKDNI-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- 244000043261 Hevea brasiliensis Species 0.000 description 1
- 229910021578 Iron(III) chloride Inorganic materials 0.000 description 1
- 229920002845 Poly(methacrylic acid) Polymers 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 229920002125 Sokalan® Polymers 0.000 description 1
- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 description 1
- HVVWZTWDBSEWIH-UHFFFAOYSA-N [2-(hydroxymethyl)-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(COC(=O)C=C)COC(=O)C=C HVVWZTWDBSEWIH-UHFFFAOYSA-N 0.000 description 1
- INXWLSDYDXPENO-UHFFFAOYSA-N [2-(hydroxymethyl)-3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(CO)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C INXWLSDYDXPENO-UHFFFAOYSA-N 0.000 description 1
- MPIAGWXWVAHQBB-UHFFFAOYSA-N [3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C MPIAGWXWVAHQBB-UHFFFAOYSA-N 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 239000003431 cross linking reagent Substances 0.000 description 1
- 229960003280 cupric chloride Drugs 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- RBTARNINKXHZNM-UHFFFAOYSA-K iron trichloride Chemical compound Cl[Fe](Cl)Cl RBTARNINKXHZNM-UHFFFAOYSA-K 0.000 description 1
- 239000012948 isocyanate Substances 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 150000007974 melamines Chemical class 0.000 description 1
- 238000003801 milling Methods 0.000 description 1
- 229920003052 natural elastomer Polymers 0.000 description 1
- 229920001194 natural rubber Polymers 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 239000004584 polyacrylic acid Substances 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 150000003384 small molecules Chemical class 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229920003051 synthetic elastomer Polymers 0.000 description 1
- 239000005061 synthetic rubber Substances 0.000 description 1
- 230000002747 voluntary effect Effects 0.000 description 1
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野]
本発明は、金属箔回路パターンのみを電子部品に転写す
る金属箔回路パターン付電子部品の製法およびそれに用
いる金属箔回路パターン付複合支持体に関するものであ
る。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a method for manufacturing electronic components with a metal foil circuit pattern, in which only the metal foil circuit pattern is transferred to an electronic component, and a composite support with a metal foil circuit pattern used therein. It is something.
電子機器は、年々、小形化および薄形化が進んでおり、
このような要求を満足させるため、電子機器に用いられ
る電子回路としてフレキシブル回路基板が多用されてい
る。上記フレキシブル回路基板は、通常、銅箔からなる
回路パターンの両面に絶縁フィルムを接着剤を介して貼
着することにより構成されている。このようなフレキシ
ブル回路基板は、薄形化という観点から、絶縁フィルム
と接着剤層の厚みを可能な限り薄くすることが望ましく
、銅箔からなる回路パターンのみによって構成するのが
最も厚みを薄(することができ理想的である。しかし、
フレキシブル回路基板の回路パターンのなかには、相互
に連結されていない回路パターンが存在する。したがっ
て、上記のように銅箔のみから回路パターンを構成する
場合には、基板に銅箔を貼着した状態でエツチングせず
、単に銅箔のみをエツチング加工するため、回路パター
ンを構成する各部分がばらばらになり、上記各部分相互
の正確な位置関係を保持することが困難となる。また、
回路パターンを構成する各部分を連結しておき、エツチ
ング加工後に必要に応じて切断することも考えられるが
、切断した時点でやはり回路パターンを構成する各部分
相互の位置関係が崩れ、適正な状態を保持することが困
難となり、短絡等が発生するという問題も生じる。また
、従来から、比較的厚みの厚い金属箔を直接エツチング
加工やケミカルミリング加工してブラウン管のシャドー
マスクや電気剃刀の刃を製造する方法が知られている。Electronic devices are becoming smaller and thinner year by year.
In order to satisfy such demands, flexible circuit boards are often used as electronic circuits used in electronic devices. The above-mentioned flexible circuit board is usually constructed by pasting insulating films on both sides of a circuit pattern made of copper foil via an adhesive. From the perspective of making such flexible circuit boards thinner, it is desirable to make the thickness of the insulating film and adhesive layer as thin as possible, and the thinnest ( can be ideal.However,
Among the circuit patterns of the flexible circuit board, there are circuit patterns that are not connected to each other. Therefore, when constructing a circuit pattern from only copper foil as described above, each part of the circuit pattern is etched without etching the copper foil attached to the board. The parts become disjointed, making it difficult to maintain accurate positional relationships among the parts. Also,
It may be possible to connect the parts that make up the circuit pattern and then cut them as needed after etching, but when they are cut, the mutual positional relationship between the parts that make up the circuit pattern will be disrupted, making it difficult to maintain the proper state. It becomes difficult to maintain the voltage, and problems such as short circuits occur. Furthermore, there has been conventionally known a method of directly etching or chemically milling relatively thick metal foil to produce shadow masks for cathode ray tubes and blades for electric razors.
しかし、フレキシブル回路基板に使用される金属箔は、
厚みが薄く、金属箔の強度が弱いため、上記方法を応用
することはできない。However, the metal foil used for flexible circuit boards is
Since the thickness is thin and the strength of the metal foil is weak, the above method cannot be applied.
一方、銅箔と貼着フィルムとを貼り合わせたものをエツ
チング加工する場合、通常用いられる粘着剤ではエツチ
ング液に対する耐薬品性に乏しく、エツチング液が粘着
剤と銅箔の間に浸入し、銅箔の表面が浸食されるという
問題が生じる。また、このような粘着剤は接着力が強す
ぎるため、粘着フィルムから回路パターンを剥離する際
に回路パターン同士の位置関係に狂いが生じるという問
題を有している。On the other hand, when etching a copper foil and adhesive film bonded together, the commonly used adhesives have poor chemical resistance to etching solutions, and the etching solution penetrates between the adhesive and the copper foil, causing the copper The problem arises that the surface of the foil is eroded. Furthermore, since such adhesives have too strong adhesive force, there is a problem in that when the circuit patterns are peeled off from the adhesive film, the positional relationship between the circuit patterns becomes distorted.
〔発明が解決しようとする課題]
このように、従来の方法では、回路パターンのみを電子
部品に転写して薄形化を図ることは困難であった。[Problems to be Solved by the Invention] As described above, with the conventional methods, it is difficult to transfer only a circuit pattern onto an electronic component to reduce its thickness.
本発明は、このような事情に鑑みなされたもので、薄い
金属箔回路パターンを電子部品に容易に転写することの
できる方法およびそれに用いる金属箔回路パターン付複
合支持体の提供をその目的とする。The present invention was made in view of the above circumstances, and aims to provide a method for easily transferring a thin metal foil circuit pattern to an electronic component, and a composite support with a metal foil circuit pattern used therein. .
上記の目的を達成するため、本発明は、光透過性支持体
の片面に感光性粘着剤層が形成された複合支持体を用い
、この複合支持体の感光性粘着剤層表面に金属箔回路パ
ターンを形成し、接着剤層を介して上記金属箔回路パタ
ーン面に電子部品を貼着した後、上記光透過性支持体面
側から光照射して上記感光性粘着剤層を硬化させて粘着
性を低下させ、その状態で上記光透過性支持体を上記感
光性粘着剤層ごと上記金属箔回路パターン面から剥離す
る金属箔回路パターン付電子部品の製法を第1の要旨と
し、光透過性支持体の片面に感光性粘着剤層が形成され
た複合支持体の感光性粘着剤層表面に金属箔回路パター
ンが形成されている金属箔回路パターン付複合支持体を
第2の要旨とする。In order to achieve the above object, the present invention uses a composite support in which a photosensitive adhesive layer is formed on one side of a light-transmitting support, and a metal foil circuit is formed on the surface of the photosensitive adhesive layer of this composite support. After forming a pattern and pasting electronic components on the metal foil circuit pattern surface via an adhesive layer, light is irradiated from the light-transmissive support side to harden the photosensitive adhesive layer to make it sticky. The first gist is a method for manufacturing an electronic component with a metal foil circuit pattern, in which the light-transparent support is peeled together with the photosensitive adhesive layer from the metal foil circuit pattern surface in that state, and the light-transparent support is peeled from the metal foil circuit pattern surface. The second gist is a composite support with a metal foil circuit pattern, in which a metal foil circuit pattern is formed on the surface of the photosensitive adhesive layer of the composite support, which has a photosensitive adhesive layer formed on one side of the composite support.
[作用〕
すなわち、本発明は、光透過性支持体と感光性粘着剤層
からなる複合支持体を用い、上記感光性粘着剤層表面に
金属箔回路パターンを形成する。[Function] That is, the present invention uses a composite support consisting of a light-transmitting support and a photosensitive adhesive layer, and forms a metal foil circuit pattern on the surface of the photosensitive adhesive layer.
そして、上記金属箔回路パターン表面に電子部品を貼着
した後、光照射して感光性粘着剤層の粘着性を低下させ
金属箔回路パターンから複合支持体を剥離するものであ
る。したがって、電子部品には金属箔回路パターンのみ
が転写形成される。After adhering the electronic component to the surface of the metal foil circuit pattern, the composite support is peeled off from the metal foil circuit pattern by irradiating it with light to reduce the tackiness of the photosensitive adhesive layer. Therefore, only the metal foil circuit pattern is transferred onto the electronic component.
つぎに、本発明の詳細な説明する。Next, the present invention will be explained in detail.
本発明の金属箔回路パターン付複合支持体は、光透過性
支持体の片面に感光性粘着剤層が形成された複合支持体
を用い、この感光性粘着剤層の表面に金属箔回路パター
ンを形成することにより得られる。The composite support with a metal foil circuit pattern of the present invention uses a composite support in which a photosensitive adhesive layer is formed on one side of a light-transmitting support, and a metal foil circuit pattern is formed on the surface of this photosensitive adhesive layer. Obtained by forming.
上記光透過性支持体としては、ポリエチレンテレフタレ
ート、ポリ塩化ビニル、ポリエチレン。Examples of the light-transmitting support include polyethylene terephthalate, polyvinyl chloride, and polyethylene.
ポリプロピレン等があげられる。このような光透過性支
持体の厚みは、通常15〜50μ■に設定するのが好適
である。Examples include polypropylene. The thickness of such a light-transmitting support is usually preferably set to 15 to 50 μm.
上記感光性粘着剤層は、従来公知のゴム系またはアクリ
ル系の感圧性接着剤に、分子中に少なくとも2個の光重
合性炭素−炭素二重結合を有する低分子量化合物(以下
「光重合性化合物」と略す)および光重合開始剤が配合
されてなる感光性粘着剤組成物を用いて形成される。The above-mentioned photosensitive adhesive layer is made of a conventionally known rubber-based or acrylic-based pressure-sensitive adhesive with a low molecular weight compound having at least two photopolymerizable carbon-carbon double bonds in the molecule (hereinafter referred to as "photopolymerizable"). It is formed using a photosensitive adhesive composition containing a photopolymerization initiator and a photopolymerization initiator.
上記感圧性接着剤としては、天然ゴム、各種の合成ゴム
等のゴム系ポリマー、またはポリアクリル酸アルキルエ
ステル、ポリメタクリル酸アルキルエステル等のアクリ
ル系ポリマーをベースポリマーとし、これに必要に応じ
てポリイソシアネート化合物、アルキルエーテル化メラ
ミン化合物等の架橋剤等が配合されたものがあげられる
。The above-mentioned pressure-sensitive adhesive uses a rubber-based polymer such as natural rubber or various synthetic rubbers, or an acrylic polymer such as polyacrylic acid alkyl ester or polymethacrylic acid alkyl ester as a base polymer, and if necessary, polyester is used as the base polymer. Examples include those containing crosslinking agents such as isocyanate compounds and alkyl etherified melamine compounds.
上記光重合性化合物としては、その分子量が1oooo
以下のものが好ましく、より好ましくは光照射による感
光性粘着剤層の三次元網状化が効率よくなされるように
、その分子量が5000以下でかつ分子中に光重合性炭
素−炭素二重結合を2〜6個有するものが用いられる。The photopolymerizable compound has a molecular weight of 1oooo
The following are preferred, and more preferably have a molecular weight of 5,000 or less and have a photopolymerizable carbon-carbon double bond in the molecule so that the photosensitive adhesive layer can be efficiently formed into a three-dimensional network by light irradiation. Those having 2 to 6 are used.
具体的には、トリメチロールプロパントリアクリレート
、テトラメチロールメタンテトラアクリレート、ペンタ
エリスリトールトリアクリレート、ペンタエリスリトー
ルテトラアクリレート、ジペンタエリスリトールモノヒ
ドロキシペンタアクリレート、ジペンタエリスリトール
へキサアクリレート等があげられ、単独でもしくは併せ
て用いられる。上記光重合性化合物の使用量は、上記感
圧性接着剤100重量部(以下「部」と略す)に対して
1〜100部の範囲に設定するのが好ましい。Specifically, trimethylolpropane triacrylate, tetramethylolmethanetetraacrylate, pentaerythritol triacrylate, pentaerythritol tetraacrylate, dipentaerythritol monohydroxypentaacrylate, dipentaerythritol hexaacrylate, etc. may be used alone or in combination. It is used as The amount of the photopolymerizable compound to be used is preferably set in the range of 1 to 100 parts per 100 parts by weight (hereinafter abbreviated as "parts") of the pressure-sensitive adhesive.
また上記光重合開始剤としては、例えばイソプロピルベ
ンゾインエーテル、イソブチルベンゾインエーテル、ベ
ンゾフェノン、ミヒラーケトン。Examples of the photopolymerization initiator include isopropyl benzoin ether, isobutyl benzoin ether, benzophenone, and Michler's ketone.
クロロチオキサントン、ドデシルチオキサントン、ジメ
チルチオキサントン、ジエチルチオキサントン、アセト
フェノンジエチルケタール、ベンジルジメチルケタール
、α−ヒドロキシメチルフェニルプロパン等があげられ
、単独でもしくは併せて用いられる。このような光重合
開始剤の使用量は、上記感圧性接着剤100部に対して
0.1〜5部の範囲に設定するのが好ましい。Examples include chlorothioxanthone, dodecylthioxanthone, dimethylthioxanthone, diethylthioxanthone, acetophenone diethyl ketal, benzyl dimethyl ketal, and α-hydroxymethylphenylpropane, which may be used alone or in combination. The amount of such a photopolymerization initiator used is preferably set in the range of 0.1 to 5 parts based on 100 parts of the pressure-sensitive adhesive.
上記感光性粘着剤層を形成する感光性粘着剤組成物は、
上記各成分を混合することにより得られる。The photosensitive adhesive composition forming the photosensitive adhesive layer is
It is obtained by mixing each of the above components.
そして、上記複合支持体は、例えば光透過性支持体表面
に上記感光性粘着剤組成物を塗布して感光性粘着剤層を
形成し、必要に応じて加熱することにより作製される。The composite support is produced, for example, by applying the photosensitive adhesive composition on the surface of a light-transmitting support to form a photosensitive adhesive layer, and heating as required.
このようにして形成される上記感光性粘着剤層の厚みは
、5〜25μmの範囲に設定するのが好ましい。The thickness of the photosensitive adhesive layer thus formed is preferably set in a range of 5 to 25 μm.
このようにして得られる複合支持体の感光性粘着側の表
面に金属箔回路パターンが形成される。A metal foil circuit pattern is formed on the surface of the photosensitive adhesive side of the composite support thus obtained.
この金属箔としては、特に限定するものではな〈従来公
知の各種のものがあげられるが、通常銅箔が用いられる
。The metal foil is not particularly limited, and may include various conventionally known metal foils, but copper foil is usually used.
本発明の金属箔回路パターン付複合支持体の製法につい
てより詳しく述べると、上記複合支持体は、例えばつぎ
のようにして作製される。すなわち、まず、第1図に示
すように、金属M1の片面にフォトレジスト層2を形成
する。つぎに、第2図に示すように、金属箔1の他面に
、光透過性支持体3の片面に感光性粘着剤層4が形成さ
れた複合支持体5を貼着する。そして、露光して現像処
理することにより上記フォトレジスト層2を回路パター
ンに形成する。ついで、金属箔1の露出部分をエツチン
グ処理し、フォトレジスト層2を剥離する。これら一連
の工程により、第4図に示すように、金属箔回路パター
ン1aの形成された金属箔回路パターン付複合支持体が
作製される。To describe in more detail the method for manufacturing the metal foil circuit patterned composite support of the present invention, the composite support is manufactured, for example, as follows. That is, first, as shown in FIG. 1, a photoresist layer 2 is formed on one side of the metal M1. Next, as shown in FIG. 2, a composite support 5 in which a photosensitive adhesive layer 4 is formed on one side of a light-transmitting support 3 is attached to the other side of the metal foil 1. Then, by exposing and developing, the photoresist layer 2 is formed into a circuit pattern. Then, the exposed portion of the metal foil 1 is etched and the photoresist layer 2 is peeled off. Through these series of steps, as shown in FIG. 4, a composite support with a metal foil circuit pattern on which a metal foil circuit pattern 1a is formed is produced.
つきに、本発明を実施例にもとづいて詳しく説明する。The present invention will now be described in detail based on examples.
第1図〜第7図は本発明の銅箔回路パターン付電子部品
の一実施例のコイル用回路の製造工程を示している。す
なわち、まず、第1図に示すように、銅箔1の片面に感
光性の液状フォトレジストを塗布してフォトレジスト層
2を形成する。つぎに、第2図に示すように、銅箔1の
他面に、光透過性支持体3の片面に感光性粘着側4が形
成された複合支持体である感光性粘着フィルム5(例え
ば日東電工社製、UE−30H)をロールラミネーター
を用いて貼着する。このときのラミネート温度は60〜
80°C,ラミネート速度は0.5〜1m/分に設定す
るのが好ましい、そして、上記フォトレジスト層20表
面に、形成しようとする回路パターンを形成したフォト
マスク(図示せず)を密着させて露光する。露光した後
は、適宜の現像液を用いて現像処理を行い、第3図に示
すように、フォトレジスト層2を回路パターンに形成す
る。ついで、塩化第二鉄液または塩化第二銅液等、通常
プリント基板の加工に用いられる酸性のエツチング液を
用いて銅箔1の露出部分をエツチング処理する。つづい
て、フォトレジスト層2を剥離液を用いて剥離する。上
記剥離液としては、通常、アルカリ溶液が用いられるが
、上記感光性粘着フィルム5の感光性粘着剤4は耐アル
カリ性が低いため、アセトン、メチルエチルケトン等の
有機溶剤が用いられる。これら一連の工程により、第4
図に示すように、感光性粘着フィルム5の表面に銅箔回
路パターンlaが形成される。そして、第5図に示すよ
うに、スクリーン印刷等により銅箔回路パターンla表
面に電子部品固定用エポキシ系等の液状接着剤6を塗布
し、この接着剤6を介して、第6図に示すように、フェ
ライトヘッド7に銅箔回路パターンIaを圧着する。こ
の圧着の際に、上記接着剤6が押圧され、図示のように
、銅箔回路パターン1a表面に万遍なく拡がる、つぎに
、接着剤6を硬化させた後、感光性粘着フィルム5に、
光透過性支持体3側から紫外線を照射して、感光性粘着
剤4を硬化させ粘着性を低下させる。この場合の感光性
粘着剤4の粘着力は、初期粘着力が1000g/cmで
あったところを150 g/cmまで低下させるのが好
ましい。この紫外線照射によって上記感光性粘着剤4の
銅箔回路パターンIaに対する粘着性が低下するため、
感光性粘着フィルム5を銅箔回路パターン1aから容易
に剥離することができ、第7図に示すように、銅箔回路
パターンlaのみが残存貼着されたコイル用回路が製造
される。1 to 7 show the manufacturing process of a coil circuit according to an embodiment of the electronic component with a copper foil circuit pattern of the present invention. That is, first, as shown in FIG. 1, a photoresist layer 2 is formed by coating one side of a copper foil 1 with a photosensitive liquid photoresist. Next, as shown in FIG. 2, on the other side of the copper foil 1, a photosensitive adhesive film 5 (for example, Nitto UE-30H (manufactured by Denkosha) is pasted using a roll laminator. The laminating temperature at this time is 60~
It is preferable to set the lamination speed at 80° C. to 0.5 to 1 m/min. Then, a photomask (not shown) on which a circuit pattern to be formed is formed is brought into close contact with the surface of the photoresist layer 20. and expose. After exposure, a development process is performed using an appropriate developer to form the photoresist layer 2 into a circuit pattern as shown in FIG. Next, the exposed portion of the copper foil 1 is etched using an acidic etching solution commonly used for processing printed circuit boards, such as ferric chloride solution or cupric chloride solution. Subsequently, the photoresist layer 2 is peeled off using a stripping solution. As the stripping liquid, an alkaline solution is usually used, but since the photosensitive adhesive 4 of the photosensitive adhesive film 5 has low alkali resistance, an organic solvent such as acetone or methyl ethyl ketone is used. Through these series of steps, the fourth
As shown in the figure, a copper foil circuit pattern la is formed on the surface of the photosensitive adhesive film 5. Then, as shown in FIG. 5, a liquid adhesive 6 such as epoxy for fixing electronic components is applied to the surface of the copper foil circuit pattern la by screen printing or the like, and through this adhesive 6, as shown in FIG. The copper foil circuit pattern Ia is crimped onto the ferrite head 7 as shown in FIG. During this pressure bonding, the adhesive 6 is pressed and spreads evenly over the surface of the copper foil circuit pattern 1a as shown in the figure.Next, after the adhesive 6 is cured, it is applied to the photosensitive adhesive film 5.
Ultraviolet rays are irradiated from the side of the light-transmitting support 3 to harden the photosensitive adhesive 4 and reduce its tackiness. In this case, the adhesive force of the photosensitive adhesive 4 is preferably reduced from an initial adhesive force of 1000 g/cm to 150 g/cm. Because this ultraviolet irradiation reduces the adhesiveness of the photosensitive adhesive 4 to the copper foil circuit pattern Ia,
The photosensitive adhesive film 5 can be easily peeled off from the copper foil circuit pattern 1a, and as shown in FIG. 7, a coil circuit with only the copper foil circuit pattern 1a remaining and attached is manufactured.
上記感光性粘着フィルム5に照射する紫外線としては、
波長が365na+、エネルギーが460a+J/dの
ものが好ましい。The ultraviolet light irradiated to the photosensitive adhesive film 5 is as follows:
It is preferable that the wavelength is 365 na+ and the energy is 460 a+J/d.
また、フェライトヘッド7に銅箔回路パターンlaを貼
着する際、上記のように銅箔回路パターンla表面に接
着剤6を塗布するのではなく、フェライトヘッド7表面
側に接着剤6を塗布してもよい。さらに、上記接着剤6
は、液状に限るものではなく、フィルム状のものを用い
てもよい。Furthermore, when attaching the copper foil circuit pattern la to the ferrite head 7, instead of applying the adhesive 6 to the surface of the copper foil circuit pattern la as described above, the adhesive 6 is applied to the surface side of the ferrite head 7. You can. Furthermore, the adhesive 6
is not limited to a liquid form, and a film form may also be used.
なお、上記コイル用回路は、例えばテープキャリア方式
により連続的に製造することができる。Note that the above-mentioned coil circuit can be manufactured continuously by, for example, a tape carrier method.
すなわち、銅箔1の片面に感光性粘着フィルム5が貼着
され、銅箔1の他面にフォトレジスト層2が形成された
幅500−の長尺のテープ状基材を準備する。この長尺
の基材を、第8図に示すように、最終製品のサイズに合
わせてスリット加工する。このスリット幅は、つぎの工
程で、基材8の両側縁にスプロケットホールを打ち抜く
ため、最終製品サイズよりもlO〜15閣幅程度大幅程
度定する。そして、このようにスリット加工された各長
尺の基材8に連続的に各工程に移行できるように、第9
図に示すように、基材8の両端縁にスプロケットホール
9を打ち抜く、そして、スプロケットホール9が打ち抜
かれた基材8aを連続的に移行させるテープキャリア装
置にセットしこの装置を作動させ、連続露光装置により
基材8に所定の回路パターンを形成する。上記連続露光
装置による露光は、通常、間接方式により行われる。That is, a long tape-like base material having a width of 500 mm is prepared, in which the photosensitive adhesive film 5 is adhered to one side of the copper foil 1 and the photoresist layer 2 is formed on the other side of the copper foil 1. This long base material is slit to match the size of the final product, as shown in FIG. The width of this slit is determined to be approximately 10 to 15 mm wider than the final product size, since sprocket holes are punched out on both sides of the base material 8 in the next step. Then, so that each long base material 8 that has been slit in this way can be transferred to each step continuously, a ninth
As shown in the figure, sprocket holes 9 are punched out on both edges of the base material 8, and the base material 8a with the sprocket holes 9 punched out is set in a tape carrier device that continuously transfers the tape carrier device, and this device is operated to continuously A predetermined circuit pattern is formed on the base material 8 using an exposure device. Exposure by the continuous exposure device described above is usually performed by an indirect method.
そして、上記露光工程後は、上記製造工程と同様の工程
をテープキャリア装置によって行うことにより連続的に
コイル用回路を製造することができる。After the exposure step, the coil circuit can be continuously manufactured by performing the same steps as the manufacturing step using the tape carrier device.
以上のように、本発明は、光透過性支持体と感光性粘着
剤層からなる複合支持体を用い、上記感光性粘着剤層表
面に金属箔回路パターンを形成する。そして、上記金属
箔回路パターン表面に電子部品を貼着した後、光照射し
て感光性粘着剤層の粘着性を低下させ金属箔回路パター
ンから複合支持体を剥離するものである。このため、電
子部品には金属箔回路パターンのみを転写形成すること
ができる。したがって、電子部品の薄形化の実現が可能
となる。As described above, the present invention uses a composite support consisting of a light-transmitting support and a photosensitive adhesive layer, and forms a metal foil circuit pattern on the surface of the photosensitive adhesive layer. After adhering the electronic component to the surface of the metal foil circuit pattern, the composite support is peeled off from the metal foil circuit pattern by irradiating it with light to reduce the tackiness of the photosensitive adhesive layer. Therefore, only the metal foil circuit pattern can be transferred and formed on the electronic component. Therefore, it is possible to make electronic components thinner.
第1図、第2図、第3図、第4図、第5図、第6図およ
び第7図は本発明の一実施例の製造工程を示す説明図、
第8図および第9図は本発明の実施例の製造工程を連続
的に行う際に用いられるテープ状基材の説明図である。
1a・・・銅箔回路パターン 2・・・フォトレジスト
層 3・−・光透過性支持体 4・・・感光性粘着側
5・・・感光性粘着フィルム 6・・・接着剤 7・・
・フェライトヘッド
特許出願人 日東電工株式会社
代理人 弁理士 西 藤 征 彦
11piI図
1!;2図
裾4図
拓5図
第6図
第7図
第8図
$9図
手続補正書(自発)
1.事件の表示
平成2年特許願第300379号
用いる金属箔回路パターン付複合支持体3、補正をする
者
代表者 鎌 居 五 朗
6、補正の内容
(1)明細書の特許請求の範囲の記載を別紙のとおり訂
正する。
7、添付書類の目録
(1)別紙(補正後の特許請求の範囲の全文を記載した
書面) 1 通〔別 紙〕
2、特許請求の範囲
(リ 光透過性支持体の片面に感光性粘着剤層が形成さ
れた複合支持体を用い、この複合支持体の感光性粘着剤
層表面に金属箔回路パターンを形成し、接着剤層を介し
て上記金属箔回路パターン面に電子部品を貼着した後、
上記光透過性支持体面倒から光照射して上記感光性粘着
剤層を硬化させて粘着性を低下させ、その状態で上記光
透過性支持体を上記感光性粘着剤層ごと上記金属箔回路
パターン面から剥離することを特徴とする金属箔回路パ
ターン付電子部品の製法。
(2) 複合支持体がテープ状に形成され、テープの
移動に従って上記各工程が順次連続的に行われる請求項
m記載の金属箔回路パターン付電子部品の製法。
(3)光透過性支持体の片面に感光性粘着剤層が形成さ
れた複合支持体の感光性粘着剤層表面に金属箔回路パタ
ーンが形成されていることを特徴とする金属箔回路パタ
ーン付複合支持体。FIG. 1, FIG. 2, FIG. 3, FIG. 4, FIG. 5, FIG. 6, and FIG. 7 are explanatory diagrams showing the manufacturing process of an embodiment of the present invention;
FIG. 8 and FIG. 9 are explanatory diagrams of a tape-shaped base material used when continuously carrying out the manufacturing process of the embodiment of the present invention. 1a...Copper foil circuit pattern 2...Photoresist layer 3...Light-transparent support 4...Photosensitive adhesive side
5... Photosensitive adhesive film 6... Adhesive 7...
・Ferrite head patent applicant: Nitto Denko Co., Ltd. agent, patent attorney Yukihiko Nishifuji 11piI Figure 1! ; 2 figures, 4 figures, 5 figures, 6 figures, 7 figures, 8 figures, $9, procedural amendments (voluntary) 1. Description of the case Composite support with metal foil circuit pattern using Patent Application No. 300379 of 1990 3, Representative of the person making the amendment: Goro Kamai 6, Contents of the amendment (1) Statement of claims in the specification Correct as shown in the attached sheet. 7. List of attached documents (1) Attachment (document containing the entire text of the amended claims) 1 copy [Attachment] 2. Claims (Re: Photosensitive adhesive on one side of the light-transmitting support) Using a composite support on which an adhesive layer is formed, a metal foil circuit pattern is formed on the surface of the photosensitive adhesive layer of this composite support, and electronic components are attached to the metal foil circuit pattern surface via the adhesive layer. After that,
The light-transmitting support is irradiated with light to cure the photosensitive adhesive layer and reduce its adhesiveness, and in this state, the light-transmitting support is attached to the metal foil circuit pattern together with the photosensitive adhesive layer. A method for manufacturing an electronic component with a metal foil circuit pattern, which is characterized by peeling from a surface. (2) The method for manufacturing an electronic component with a metal foil circuit pattern according to claim m, wherein the composite support is formed into a tape shape, and each of the above steps is performed sequentially and continuously as the tape moves. (3) With a metal foil circuit pattern, characterized in that a metal foil circuit pattern is formed on the surface of the photosensitive adhesive layer of a composite support in which a photosensitive adhesive layer is formed on one side of a light-transmitting support. Composite support.
Claims (3)
れた複合支持体を用い、この複合支持体の感光性粘着剤
層表面に金属箔回路パターンを形成し、接着剤層を介し
て上記金属箔回路パターン面に電子部品を貼着した後、
上記光透過性支持体面側から光照射して上記感光性粘着
剤層を硬化させて粘着性を低下させ、その状態で上記光
透過性支持体を上記感光性粘着剤層ごと上記金属箔回路
パターン面から剥離することを特徴とする金属箔回路パ
ターン付電子部品の製法。(1) Using a composite support in which a photosensitive adhesive layer is formed on one side of a light-transmitting support, a metal foil circuit pattern is formed on the surface of the photosensitive adhesive layer of this composite support, and the adhesive layer is formed on the surface of the composite support. After pasting electronic components on the above metal foil circuit pattern surface through
Light is irradiated from the surface side of the light-transmitting support to cure the photosensitive adhesive layer and reduce its adhesiveness, and in this state, the light-transmitting support is attached to the metal foil circuit pattern together with the photosensitive adhesive layer. A method for manufacturing an electronic component with a metal foil circuit pattern, which is characterized by peeling from a surface.
に従つて上記各工程が順次連続的に行われる請求項(2
)記載の金属箔回路パターン付電子部品の製法。(2) Claim (2) wherein the composite support is formed into a tape shape, and each of the above steps is performed sequentially and continuously as the tape moves.
) A method for producing electronic components with metal foil circuit patterns.
れた複合支持体の感光性粘着剤層表面に金属箔回路パタ
ーンが形成されていることを特徴とする金属箔回路パタ
ーン付複合支持体。(3) With a metal foil circuit pattern, characterized in that a metal foil circuit pattern is formed on the surface of the photosensitive adhesive layer of a composite support in which a photosensitive adhesive layer is formed on one side of a light-transmitting support. Composite support.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP30037990A JPH04171886A (en) | 1990-11-05 | 1990-11-05 | Manufacture of electronic part having metallic foil circuit pattern and composite supporter having metallic foil circuit pattern used therein |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP30037990A JPH04171886A (en) | 1990-11-05 | 1990-11-05 | Manufacture of electronic part having metallic foil circuit pattern and composite supporter having metallic foil circuit pattern used therein |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH04171886A true JPH04171886A (en) | 1992-06-19 |
Family
ID=17884077
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP30037990A Pending JPH04171886A (en) | 1990-11-05 | 1990-11-05 | Manufacture of electronic part having metallic foil circuit pattern and composite supporter having metallic foil circuit pattern used therein |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH04171886A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06310832A (en) * | 1993-04-22 | 1994-11-04 | Asahi Chem Ind Co Ltd | Manufacture of printed-wiring board |
JP2011108969A (en) * | 2009-11-20 | 2011-06-02 | Hitachi Cable Ltd | Method of manufacturing solar cell module and wiring board for solar cell |
CN110050314A (en) * | 2016-12-07 | 2019-07-23 | 日东电工株式会社 | The manufacturing method of module |
-
1990
- 1990-11-05 JP JP30037990A patent/JPH04171886A/en active Pending
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06310832A (en) * | 1993-04-22 | 1994-11-04 | Asahi Chem Ind Co Ltd | Manufacture of printed-wiring board |
JP2011108969A (en) * | 2009-11-20 | 2011-06-02 | Hitachi Cable Ltd | Method of manufacturing solar cell module and wiring board for solar cell |
CN102097531A (en) * | 2009-11-20 | 2011-06-15 | 日立电线株式会社 | Method for fabricating a solar battery module and a wiring substrate for a solar battery |
CN110050314A (en) * | 2016-12-07 | 2019-07-23 | 日东电工株式会社 | The manufacturing method of module |
EP3553800A4 (en) * | 2016-12-07 | 2020-05-06 | Nitto Denko Corporation | Method for producing module |
US11387040B2 (en) | 2016-12-07 | 2022-07-12 | Nitto Denko Corporation | Producing method of module |
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