JPS59143151A - Stripping development method - Google Patents

Stripping development method

Info

Publication number
JPS59143151A
JPS59143151A JP1944883A JP1944883A JPS59143151A JP S59143151 A JPS59143151 A JP S59143151A JP 1944883 A JP1944883 A JP 1944883A JP 1944883 A JP1944883 A JP 1944883A JP S59143151 A JPS59143151 A JP S59143151A
Authority
JP
Japan
Prior art keywords
substrate
image forming
adhesive tape
support
peeling
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1944883A
Other languages
Japanese (ja)
Inventor
Takashi Yamamura
隆 山村
Okimichi Kaneko
金子 興道
Shunichi Hayashi
俊一 林
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nitto Denko Corp
Original Assignee
Nitto Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nitto Electric Industrial Co Ltd filed Critical Nitto Electric Industrial Co Ltd
Priority to JP1944883A priority Critical patent/JPS59143151A/en
Publication of JPS59143151A publication Critical patent/JPS59143151A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/34Imagewise removal by selective transfer, e.g. peeling away
    • G03F7/343Lamination or delamination methods or apparatus for photolitographic photosensitive material

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Silver Salt Photography Or Processing Solution Therefor (AREA)

Abstract

PURPOSE:To facilitate continuous stripping of a support or the like from a substrate after the end of exposure and to obtain a sharp image by applying an adhesive tape having a releasable rear face at the corners of the substrate in advance before applying an image forming material on the substrate. CONSTITUTION:An image forming material formed by applying a photopolymerizable compsn. layer to a transparent support is adhered to the surface of an image forming substrate 1, then exposed, and the support and the unexposed parts of the photopolymerizable compsn. layer is stripped from the substrate. In this stripping development method, before the image forming material is applied to the substrate 1, adhesive tapes S1-S4, S9 each having a rear face releasable from said photopolymerizable compsn. layer are applied to the 2 or more sides of the substrate 1 and the corners including their intersections. As the adhesive tape, an adhesive tape having a rear face coated with a silicone resin, laminated with a PE film, etc. are usable.

Description

【発明の詳細な説明】 この発明は印刷回路等の製造の用に供される剥離現像方
法に関するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a peeling and developing method used for manufacturing printed circuits and the like.

印刷回路の製造等のために、画像形成用基板の表面に透
明支持体とこの支持体上に波線された光重合性組成物層
とからなる画像形成材料の上記光重合性組成物層側を粘
着し、この光重合性組成物層を画像状に露光して硬化領
域を形成し、さらに必要に応じて上記画像形成材料を加
熱した後、上記支持体および上記光重合性組成物層の未
露光部分を基板から剥離して該基板上に画像状のレジス
トを形成する画像形成手段がすでに案出されている。
For the production of printed circuits, etc., the above-mentioned photopolymerizable composition layer side of an image-forming material consisting of a transparent support and a photopolymerizable composition layer formed with wavy lines on the support is placed on the surface of an image-forming substrate. The photopolymerizable composition layer is imagewise exposed to light to form a cured area, and if necessary, the image forming material is heated. Imaging means have already been devised for peeling exposed portions from a substrate to form an image-like resist on the substrate.

この画像形成手段は、上記画像形成材料における光重合
性組成物層が未露光の状態では透明支持体に対する接着
力が強いが、露光されると基板に対する接着力が強くな
るとともに透明支持体に対する接着力が低下することを
利用したものである。
In this image forming means, the photopolymerizable composition layer in the image forming material has a strong adhesive force to the transparent support in an unexposed state, but when exposed to light, the adhesive force to the substrate increases and the adhesive force to the transparent support increases. This takes advantage of the fact that power decreases.

ところが、この光重合性組成物層は未露光の状態でも基
板に対してかなりの接着力を持つため画像形成後の剥離
方法には種々の工夫がなされている。
However, since this photopolymerizable composition layer has considerable adhesion to the substrate even in an unexposed state, various methods have been devised for peeling it off after image formation.

例えば、露光終了後における基板上の透明支持体の一端
に該基板より突出するテープ状の剥離端片を接着したの
ち、ニップロールや吸引ロール等の剥離手段に上記剥離
端片を挾み込ませて上記支持体および光重合性組成物層
の未露光部分を巻き」二けることによって剥離する方法
がある。しかるに、この剥離方法によれば、露光後に別
途剥離端片を設けなければならず、工程数の増加を強い
られることになるはかりか、機械的に上記剥離端片を確
実に挾持させるのが難しく剥離をし損じるといった欠点
かあった。
For example, after the end of exposure, a tape-shaped peelable end piece protruding from the substrate is adhered to one end of the transparent support on the substrate, and then the peelable end piece is sandwiched between a peeling means such as a nip roll or a suction roll. There is a method of peeling off by rolling the unexposed portions of the support and the photopolymerizable composition layer. However, according to this peeling method, it is necessary to separately provide a peeling end piece after exposure, which increases the number of steps, and it is difficult to reliably hold the peelable end piece mechanically. There were some drawbacks such as failure to peel it off.

また、他の剥離方法でも経済性、確実性の面で問題かあ
り満足できるものではなかった。
Further, other peeling methods have been unsatisfactory due to problems in terms of economy and reliability.

そこでこの発明者らは、露光終了後に透明支持体上に剥
離端片等を設けることなく基板から支持体等を経済的で
容易かつ連続的に剥離てき鮮明な画像を得ることかでき
る剥離現像方法を提供することを目的としてこの発明を
なすに至った。
Therefore, the present inventors have developed a peeling development method that allows economical, easy, and continuous peeling of the support from the substrate without providing a peelable end piece on the transparent support after the completion of exposure to obtain a clear image. This invention was made with the aim of providing the following.

すなわち、この発明は、画像形成用基板の表面に、光重
合性組成物層が透明支持体上に被着された画像形成材料
を貼着して露光した後、上記支持体および」二記光重合
性組成物層の未露光部分を上記基板から剥離する剥離現
像方法において、上記画像形成材料を上記基板に貼着す
る前にあらかじめ上記基板の少なくとも2辺とこれらの
交点を含む一角に、背面が上記光重合性組成物層に対し
て離型性を有する粘着テープを貼り付けることを特徴と
する剥離現像方法に係るものである。
That is, this invention provides an image forming material in which a photopolymerizable composition layer is adhered to a transparent support on the surface of an image forming substrate, and then exposed to light. In a peel development method in which an unexposed portion of the polymerizable composition layer is peeled off from the substrate, before the image-forming material is attached to the substrate, a back surface is coated on a corner including at least two sides of the substrate and the intersection thereof. The present invention relates to a peeling development method characterized in that an adhesive tape having releasability is attached to the photopolymerizable composition layer.

この発明においては、上記のようにあらかじめ画像形成
用基板の少なくとも2辺とこれらの交点を含む一角に背
面か光重合性組成物層に対して離型性を有する粘着テー
プを貼り付けておくことによって、露光後にこの基板か
ら支持体等を剥離する際には、この粘着テープの背面に
対する光重合性組成物層の接着力か低いためこの部分が
極めて容易にはかれ、これかきっかけきなって残りの基
板」二の支持体等も容易に剥離することができる。
In this invention, as described above, an adhesive tape having releasability for the photopolymerizable composition layer is pasted in advance on at least two sides of the image forming substrate and one corner including the intersection of these sides on the back side or the photopolymerizable composition layer. Therefore, when peeling the support etc. from this substrate after exposure, the adhesive strength of the photopolymerizable composition layer to the back side of this adhesive tape is low, so this part peels off very easily, and this may cause the adhesive tape to peel off easily. The remaining supports such as the second substrate can also be easily peeled off.

この発明における背面が光重合性組成物層に対して離型
性を有する粘着テープとしては、背面にシリコーン樹脂
を塗布したもの、ポリエチレンフィルムをラミネートし
たものなどがある。
In the present invention, adhesive tapes whose back surface has releasability to the photopolymerizable composition layer include those whose back surface is coated with a silicone resin and those whose back surface is laminated with a polyethylene film.

このような粘着テープは基板の2辺とその交点を含む一
角に、例えは第1図に示す31〜S4のように貼り付け
られることが必要で、第2図に示す55〜S8のように
基板の2辺とその交点を含まない場合には剥離は容易で
はない。また、この粘着テープを第3図に示すS9よう
に基板の周縁に貼り付けてもよい。
Such adhesive tape needs to be attached to a corner including two sides of the board and the intersection thereof, for example, as shown in numbers 31 to S4 shown in Figure 1, and as shown in numbers 55 to S8 shown in Figure 2. If the two sides of the substrate and their intersections are not included, peeling is not easy. Alternatively, this adhesive tape may be attached to the periphery of the substrate as shown in S9 in FIG. 3.

基板上に上記のように粘着テープを設けておくと、露光
後に支持体および光重合性組成物層の未露光部分を剥離
するには、上記粘着テープを設けた部分の支持体表面上
に通常の剥離用に使用する粘着テープを圧着して巻き−
Lけ操作するか、あるいは粘着ロールを圧着して該ロー
ルを回転させて支持体等を上記基板より剥離するととも
に、ニップロールによりその剥離された支持体等を巻き
」−げながら剥離現像を行う。
If an adhesive tape is provided on the substrate as described above, in order to peel off the support and the unexposed portion of the photopolymerizable composition layer after exposure, it is usually necessary to apply adhesive tape on the surface of the support in the area where the adhesive tape is provided. Press and wrap adhesive tape used for peeling.
The support and the like are peeled off from the substrate by either pressing an adhesive roll or rotating the roll, and peeling development is performed while rolling the peeled support and the like with a nip roll.

上記の方法により、露光後の基板から支持体等を剥離さ
せる際に基板の1枚ごとに剥離端片を形成することなく
、粘着テープなどの在来の手段により上記支持体等を容
易に剥離できることになる。
By the above method, when the support etc. are peeled off from the substrate after exposure, the support etc. can be easily peeled off by conventional means such as adhesive tape without forming a peeled edge piece for each substrate. It will be possible.

さらに、連続した粘着テープを用意することにより、連
続して剥離現像を行うことができる。また、このような
連続した粘着テープも非常に安価なものを使用すること
ができ経済性にも優れたものとなる。さらにこの方法に
よれば、剥離現像の信頼性も向上させることができる。
Furthermore, by preparing a continuous adhesive tape, peeling development can be performed continuously. Moreover, such a continuous adhesive tape can also be used at a very low cost, making it highly economical. Furthermore, according to this method, the reliability of peel development can also be improved.

次にこの発明の実施例を記載する。Next, examples of this invention will be described.

実施例1 第1図に示すように、300rrvnX300馴の画像
形成用基板1の一角に、背面にポリエチレンをラミネー
ト後シリコン処理した5 rrtn X 5 rrvn
のクラフト粘着テープSt(!712、日東電気工業社
製)を貼着し、次′にこの基板1上に剥離現像タイプド
ライフィルムレジスト(ネオドロック・タイプT10東
電気工業社製)を貼り付けて露光腰画像を形成したのち
、上記ドライフィルムレジストの表面にクラフト粘着テ
ープ(前出)を1点鎖線2で示したように圧着してこの
テープを巻き上げていくと上記ドライフィルムレジスト
の支持体および未露光の光重合性組成物層が容易にはが
れて基板1上に良好な画像を得ることができた。
Example 1 As shown in FIG. 1, one corner of an image forming substrate 1 of size 300 rrvn x 300 was laminated with polyethylene on the back side and then treated with silicon.
A craft adhesive tape St (!712, manufactured by Nitto Electric Industries, Ltd.) was pasted, and then a peelable development type dry film resist (Neodorock type T10, manufactured by Tokyo Electric Industries, Ltd.) was pasted on this substrate 1 and exposed. After forming a waist image, a craft adhesive tape (mentioned above) is pressed onto the surface of the dry film resist as shown by the dashed line 2, and as this tape is rolled up, the support of the dry film resist and the blank are bonded. The exposed photopolymerizable composition layer was easily peeled off, and a good image could be obtained on the substrate 1.

実施例2 第1図に示すように基板1の一角に、実施例1と同様の
処理をした5mmX20mのクラフト粘着テープS2を
貼着し、実施例1と同様にして基板1上に良好な画像を
得た。
Example 2 As shown in FIG. 1, a 5 mm x 20 m kraft adhesive tape S2 treated in the same manner as in Example 1 was attached to one corner of the substrate 1, and a good image was formed on the substrate 1 in the same manner as in Example 1. I got it.

実施例3 第1図に示すように基板1の一角に、実施例1と同様の
処理をした10mmX10+Nrlのクラフト粘着テー
プS3を貼着し、実施例1と同様にして基板1上に良好
な画像を得た。
Example 3 As shown in FIG. 1, a 10mm x 10+Nrl craft adhesive tape S3 treated in the same manner as in Example 1 was attached to one corner of the substrate 1, and a good image was formed on the substrate 1 in the same manner as in Example 1. I got it.

実施例4 第1図に示すように基板1の一角に、実施例1と同様の
処理をした10mmX10++aのクラフト粘着テープ
S4を貼着し、実施例1と同様にして基板1上に良好な
画像を得た。
Example 4 As shown in FIG. 1, a 10 mm x 10++a craft adhesive tape S4 treated in the same manner as in Example 1 was attached to one corner of the substrate 1, and a good image was formed on the substrate 1 in the same manner as in Example 1. I got it.

比較例 実施例で用いたと同様の画像形成用基板に剥離現像タイ
プドライフィルムレジスト(前出)を貼り付けて露光し
たのち実施例と同様に剥離用のクラフト粘着テープを圧
着し、前記テープを巻き上げていくと上記ドライフィル
ムレジストの未露光の光重合性組成物層が基板上に残る
場合(10回中7回)かあった。
Comparative Example A peelable development type dry film resist (described above) was attached to an image forming substrate similar to that used in the example, and exposed to light.A kraft adhesive tape for peeling was then crimped in the same manner as in the example, and the tape was rolled up. In some cases (7 out of 10 times), the unexposed photopolymerizable composition layer of the dry film resist remained on the substrate.

【図面の簡単な説明】[Brief explanation of drawings]

第1図および第3図はこの発明に係る剥離現像方法にお
ける背面処理した粘着テープの貼着の方法の説明図であ
る。第2図は、前記貼着方法とは異なる比較のための説
明図である。 1・・基板、Sl−〜S9・・・粘着テープ特許出願人
 日東電気工業株式会社 \ 第1 z \第2図
FIGS. 1 and 3 are explanatory diagrams of a method for attaching a back-treated adhesive tape in the peeling and developing method according to the present invention. FIG. 2 is an explanatory diagram for comparison with the pasting method. 1...Substrate, Sl-~S9...Adhesive tape Patent applicant Nitto Electric Industry Co., Ltd.\No.1 z\Fig.2

Claims (1)

【特許請求の範囲】[Claims] (1)画像形成用基板の表面に、光重合性組成物層が透
明支持体上に被着された画像形成材料を貼着して露光し
た後、上記支持体および上記光重合性組成物層の未露光
部分を上記基板から剥離する剥離現像方法において、上
記画像形成材料を上記基板に貼着する前にあらかじめ上
記基板の少なくとも2辺とこれらの交点を含む一角に、
背面が上記光重合性組成物層に対し離型性を有する粘着
テープを貼り付けることを特徴とする剥離現像方法。
(1) After attaching an image forming material in which a photopolymerizable composition layer is coated on a transparent support to the surface of an image forming substrate and exposing it to light, the support and the photopolymerizable composition layer are attached to the surface of the image forming substrate. In the peeling development method of peeling off the unexposed portion of the substrate from the substrate, before adhering the image forming material to the substrate, a corner including at least two sides of the substrate and the intersection thereof,
A peeling development method characterized in that an adhesive tape whose back surface has releasability to the photopolymerizable composition layer is attached.
JP1944883A 1983-02-07 1983-02-07 Stripping development method Pending JPS59143151A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1944883A JPS59143151A (en) 1983-02-07 1983-02-07 Stripping development method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1944883A JPS59143151A (en) 1983-02-07 1983-02-07 Stripping development method

Publications (1)

Publication Number Publication Date
JPS59143151A true JPS59143151A (en) 1984-08-16

Family

ID=11999587

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1944883A Pending JPS59143151A (en) 1983-02-07 1983-02-07 Stripping development method

Country Status (1)

Country Link
JP (1) JPS59143151A (en)

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