JPH04170520A - Manufacture of liquid crystal display panel and liquid crystal display substrate - Google Patents
Manufacture of liquid crystal display panel and liquid crystal display substrateInfo
- Publication number
- JPH04170520A JPH04170520A JP2297978A JP29797890A JPH04170520A JP H04170520 A JPH04170520 A JP H04170520A JP 2297978 A JP2297978 A JP 2297978A JP 29797890 A JP29797890 A JP 29797890A JP H04170520 A JPH04170520 A JP H04170520A
- Authority
- JP
- Japan
- Prior art keywords
- liquid crystal
- thin film
- crystal display
- substrate
- driving
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004973 liquid crystal related substance Substances 0.000 title claims abstract description 114
- 239000000758 substrate Substances 0.000 title claims abstract description 69
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 18
- 229920005989 resin Polymers 0.000 claims abstract description 26
- 239000011347 resin Substances 0.000 claims abstract description 26
- 239000000463 material Substances 0.000 claims abstract description 11
- 239000010409 thin film Substances 0.000 claims description 53
- 239000011888 foil Substances 0.000 claims description 20
- 238000000034 method Methods 0.000 claims description 20
- 239000012779 reinforcing material Substances 0.000 claims description 9
- 239000010408 film Substances 0.000 claims description 8
- 229910021421 monocrystalline silicon Inorganic materials 0.000 claims description 7
- 238000005530 etching Methods 0.000 claims description 3
- 230000002787 reinforcement Effects 0.000 claims description 3
- 239000004840 adhesive resin Substances 0.000 claims 3
- 229920006223 adhesive resin Polymers 0.000 claims 3
- 230000003014 reinforcing effect Effects 0.000 claims 2
- 239000012212 insulator Substances 0.000 abstract description 8
- 239000012528 membrane Substances 0.000 abstract description 3
- 229910052710 silicon Inorganic materials 0.000 description 8
- 239000010703 silicon Substances 0.000 description 8
- 235000012431 wafers Nutrition 0.000 description 8
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 7
- 238000010586 diagram Methods 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 3
- 230000001070 adhesive effect Effects 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 3
- 229920005591 polysilicon Polymers 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 229910052814 silicon oxide Inorganic materials 0.000 description 3
- 229910021417 amorphous silicon Inorganic materials 0.000 description 2
- 238000011282 treatment Methods 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 239000010407 anodic oxide Substances 0.000 description 1
- 230000003796 beauty Effects 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 238000005553 drilling Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000003292 glue Substances 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 150000003376 silicon Chemical class 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 239000002352 surface water Substances 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
Abstract
Description
【発明の詳細な説明】
産業上の利用分野
本発明は液晶表示パネルに関するもので特にそれに用い
る液晶表示用基板とその製造方法に関する。DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates to a liquid crystal display panel, and more particularly to a liquid crystal display substrate used therein and a method for manufacturing the same.
従来の技術
最近、液晶表示技術が大きく進展し、画像の美しさでは
従来の陰極線管に匹敵するようになってきた。その上に
、薄い、軽いなどの特徴とあいまって、期待される表示
装置の座を占めるようになってきた。Conventional Technology Recently, liquid crystal display technology has made great progress, and the beauty of images has come to rival that of conventional cathode ray tubes. This, combined with its thinness and lightness, has made it a promising display device.
従来の液晶表示装置のパネルは２枚の透明電極を備えた
ガラヌ基板を液晶を挟んで対向させ、張り合わせたもの
である。透明電極をストライプ状に形成し、対向電極同
志クロスするようにしたものを単純マトリクスパネルと
いい、薄膜トランジスタを絵素毎に形成したものをＴ
Ｆ Ｔ （ＴｈｉｎｅＦｉｌｍ Ｔｒａｎｓｉｓｔｏｒ
）パネルという。単純マドリクヌパネルは構造が簡単
であシ、また、ドライノく−の数が少なく安価である。The panel of a conventional liquid crystal display device is made by laminating two Galanus substrates with transparent electrodes facing each other with a liquid crystal sandwiched therebetween. A simple matrix panel is one in which transparent electrodes are formed in stripes and the opposite electrodes cross each other, and a T is one in which a thin film transistor is formed for each pixel.
F T (ThineFilm Transistor
) Panel. The simple Madricne panel has a simple structure, and also has a small number of dry holes, making it inexpensive.
しかし、画質においては遠（’ＴＰＴパネルには及ばな
い。Ｔ Ｐ Ｔ 、クネルは画質はよいが、薄膜装置を
用いて、絵素毎にトランジスタを付けねばならず、歩留
まりが悪く、大変高価なものになってし１つている。However, the image quality is far from that of TPT panels. TPT and quenelle have good image quality, but they use a thin film device and require a transistor for each pixel, resulting in poor yields and very high costs. There is one thing that has become a thing.
発明が解決しようとする課題
上記に説明したように、従来ある液晶）（ネルはその構
造並びに製造方法から、価格において制約がある。Problems to be Solved by the Invention As explained above, conventional liquid crystals (flannel) have price limitations due to their structure and manufacturing method.
本発明は低価格化を可能にすると共に、従来のパネル構
造並びに製造方法では不可能であった大画面（例えば６
０インチ）の製造を不可能とするものである。The present invention not only enables cost reduction, but also a large screen (for example, 6
0 inch) is impossible.
課題を解決するための手段
上記問題を解決するために本発明においては、液晶表示
用箔状回路を樹脂層を介在させて透明支持体に張りつけ
た液晶表示用基板を液晶ノくネルの一方の基板の構成要
素とするようにしている。Means for Solving the Problems In order to solve the above problems, in the present invention, a liquid crystal display substrate in which a liquid crystal display foil circuit is attached to a transparent support with a resin layer interposed is attached to one side of a liquid crystal channel. It is designed to be a component of the board.
作 用 −
本発明を用いれば、パネルの歩留まりが上がシ、容易に
大画面化が可能である。且つ、画質も良好のものが得ら
れる。Function - By using the present invention, the yield of panels can be increased and the screen can be easily made larger. In addition, good image quality can be obtained.
実施例
以下、本発明の液晶表示パネルに用いる液晶表示基板の
構造について、実施例に沿って、図面を参照しながら説
明する。EXAMPLES Hereinafter, the structure of a liquid crystal display substrate used in a liquid crystal display panel of the present invention will be described in accordance with examples and with reference to the drawings.
第１図は本発明の液晶表示パネルに用いる液晶表示基板
の一例の断面図を示す。一般に良く知られているＴＮ液
晶を用いた液晶表示パネルはこの基板と対向電極とを間
隙をあけて向かい合わせ、間に液晶を注入し、外側に偏
光板を配置して構成する。FIG. 1 shows a cross-sectional view of an example of a liquid crystal display substrate used in the liquid crystal display panel of the present invention. A generally well-known liquid crystal display panel using TN liquid crystal is constructed by placing this substrate and a counter electrode facing each other with a gap, injecting liquid crystal between them, and arranging a polarizing plate on the outside.
液晶と触れる基板と対向電極の表面には液晶分子配向層
を設は配向処理を行うのが通常である。Usually, a liquid crystal molecule alignment layer is provided on the surfaces of the substrate and counter electrode that come into contact with the liquid crystal, and an alignment process is performed.
本発明において、重要であるのは第１図のような構成の
ものが液晶表示パネルの一方の基板の構成要素となって
いることである。この基板の上に種々の処理をしたり、
あるいは別の構成物を付加していっても良い。以下にお
いては、基本構成についてのみ記述する。１０１は透明
絶縁体薄膜１０８上に形成した液晶駆動用薄膜回路から
なる液晶駆動用箔状回路である。図においては薄膜回路
を簡単に省略して描いている。１０４はゲート電極、１
０５は半導体薄膜、１０６はソースあるいはドレインで
あり、簿膜トランジスタを構成している。In the present invention, what is important is that the structure shown in FIG. 1 is a component of one substrate of the liquid crystal display panel. Perform various treatments on this substrate,
Alternatively, other components may be added. In the following, only the basic configuration will be described. Reference numeral 101 denotes a foil circuit for driving a liquid crystal, which is a thin film circuit for driving a liquid crystal formed on a transparent insulating thin film 108. In the figure, the thin film circuit is simply omitted. 104 is a gate electrode, 1
05 is a semiconductor thin film, 106 is a source or drain, and constitutes a film transistor.
１０７は透明電極である。埃実には、種々の付加的な膜
を含むものである。これらは本発明の要点において重要
でないので省略する。液晶駆動用薄膜回路はアモロファ
スシリコン薄膜を用いたものとポリシリコン薄膜を用い
たものが現在使われている。薄膜素子がアクチブでない
ものでは、チタンの陽極酸化膜を利用した非直線素子も
ある。107 is a transparent electrode. Dust seeds contain various additional membranes. Since these are not important to the gist of the present invention, they will be omitted. Thin film circuits for driving liquid crystals are currently in use using amorphous silicon thin films or polysilicon thin films. Among non-active thin film elements, there are also non-linear elements that utilize titanium anodic oxide films.
１０３は透明支持体であり、１０２は透明支持体と液晶
駆動用箔状回路とを張り付ける樹脂層である。103 is a transparent support, and 102 is a resin layer that adheres the transparent support and the liquid crystal driving foil circuit.
第１図のような構成を取ることにより多くの利点が生ず
る。第１の利点は後述するように、複数枚の液晶駆動用
箔状回路を一枚の透明支持体上に平面的に配列接続し、
継ぎ目のない画像が得られることである。第２の利点は
液晶駆動用箔状回路を形成する際に、その基板が透明で
なくともよいことであり、特製の良いトランジスタを得
ることができる高温プロセスが使えることである（後述
するように、液晶駆動用箔状回路作成プロセスにおいて
、後に取り除かれる液晶駆動用箔状回路を形成する基板
に透明性が要求されず、耐熱性のある安価な基板が使え
る）。特にポリシリコンの液晶駆動用薄膜回路の製造に
有効である。第３の利点は透明支持体に軽い樹脂が利用
できることであり、大型になったときに有利になる。A number of advantages arise from the configuration shown in FIG. The first advantage, as will be described later, is that a plurality of foil circuits for driving liquid crystals are arranged and connected in a plane on a single transparent support.
A seamless image can be obtained. The second advantage is that when forming a foil circuit for driving a liquid crystal, the substrate does not need to be transparent, and a high-temperature process can be used to obtain a specially made good transistor (as described later). (In the process of creating a foil circuit for driving a liquid crystal, the substrate that forms the foil circuit for driving a liquid crystal, which is later removed, does not require transparency, and an inexpensive, heat-resistant substrate can be used.) It is particularly effective for manufacturing thin film circuits for driving polysilicon liquid crystals. The third advantage is that a light resin can be used for the transparent support, which is advantageous when the size is increased.
第２図は第１図の液晶表示用基板の一つの製造方法を説
明する工程図である。第２図（ａ）は腐食性基板２０２
上の透明絶縁体薄膜１０８の上に作成した薄膜トランジ
スタ２０１を含む液晶駆動用箔状回路１０１を表してい
る。腐食性基板２０２は例えばシリコンウェハーがある
。透明絶縁体薄膜はシリコンウェハー上に形成した酸化
シリコン膜がある。FIG. 2 is a process diagram illustrating one method of manufacturing the liquid crystal display substrate of FIG. 1. FIG. 2(a) shows a corrosive substrate 202.
It shows a foil circuit 101 for driving a liquid crystal including a thin film transistor 201 formed on the transparent insulating thin film 108 above. The corrosive substrate 202 is, for example, a silicon wafer. The transparent insulator thin film is a silicon oxide film formed on a silicon wafer.
このようなものは市販されている。薄膜トランジスタを
含む液晶駆動用薄膜回路はアモロファスシリコン薄膜あ
るいはポリシリコン薄膜を用いて作成可能である。Such products are commercially available. A liquid crystal driving thin film circuit including a thin film transistor can be created using an amorphous silicon thin film or a polysilicon thin film.
第２図（ｂ）は作成した腐食性基板付き液晶駆動用箔状
回路の上に硝子あるいはプラスチック等の透明支持体２
０３を樹脂層２０４で張り付けだところを示している。Figure 2(b) shows a transparent support 2 made of glass or plastic on top of the prepared foil circuit for driving a liquid crystal with a corrosive substrate.
03 is shown attached with a resin layer 204.
第２図（Ｃ）は腐食性基板２０２を腐食して取υ除いた
結果で、液晶表示用基板２０５を示している。FIG. 2(C) shows the result of corroding and removing the corrosive substrate 202, and shows the liquid crystal display substrate 205.
腐食性基板２０２がシリコンで透明絶縁体薄膜１０８が
酸化シリコンの場合は、これをストッパーとして化学エ
ツチングで容易に実現できる。半導体プロセスに馴染み
のある技術者には周知のことである。腐食性基板を金属
にすることも容易に考えられる。If the corrosive substrate 202 is silicon and the transparent insulator thin film 108 is silicon oxide, this can be easily realized by chemical etching using this as a stopper. This is well known to engineers familiar with semiconductor processes. It is also easily possible to use metal as the corrosive substrate.
第３図第４図は別の一例を示す。液晶表示用基板２０５
と対向電極の間に液晶を挟んで駆動する場合、透明絶縁
体薄膜１０Ｂが厚いと高い駆動電圧を必要とする。この
ような場合は、第３図の様に絵素の部分だけ掘シ込み３
０１を作ることが可能である。あるいは、第４図のよう
に透明絶縁体薄膜にコンタクト窓４０１を明けて、透明
電極４０２を形成することも可能である。この場合第１
図にある透明電極１０７は要らない。このようなことは
、本発明から逸脱するものではない。第４図のものの作
成は、第２図の工程の第２図（Ｃ）の後、透明絶縁体薄
膜にコンタクト窓を明け、透明電極を形成すれば良い。3 and 4 show another example. Liquid crystal display substrate 205
When driving the liquid crystal with the liquid crystal sandwiched between the electrode and the counter electrode, if the transparent insulator thin film 10B is thick, a high driving voltage is required. In such a case, as shown in Figure 3, only the pixel part should be dug 3.
It is possible to make 01. Alternatively, as shown in FIG. 4, it is also possible to form a contact window 401 in a transparent insulating thin film to form a transparent electrode 402. In this case the first
The transparent electrode 107 shown in the figure is not required. Such matters do not depart from the invention. The structure shown in FIG. 4 can be produced by forming a contact window in the transparent insulating thin film and forming a transparent electrode after the process shown in FIG. 2 (C) in FIG.
使用する液晶によっては液晶表示用基板２０５上透明絶
縁体薄膜１０８上に配向膜を設け、配向処理を行うが、
これも本発明の範囲外ではない。Depending on the liquid crystal used, an alignment film may be provided on the transparent insulator thin film 108 on the liquid crystal display substrate 205 to perform alignment treatment.
This is also not outside the scope of the invention.
第６図は本発明の液晶表示パネルに用いる液晶表示用基
板の別の一例の断面図を示す。樹脂層がカラーフィルタ
を含むように構成したものである。FIG. 6 shows a sectional view of another example of the liquid crystal display substrate used in the liquid crystal display panel of the present invention. The resin layer is configured to include a color filter.
カラーフイＡ＃’ノ各色ＲＧＢ５０２，５０３，５０４
とプラック５０１を樹脂層１０２に埋め込んである。透
明支持体１０３とカラーフィルタ層との間に接着のため
の樹脂層があっても構わない。Color phi A#' each color RGB502, 503, 504
and plaques 501 are embedded in the resin layer 102. There may be a resin layer for adhesion between the transparent support 103 and the color filter layer.
第６図は別の液晶表示用基板の構成を示すものである。FIG. 6 shows the structure of another liquid crystal display substrate.
この構成においては、−枚ではなく、複数枚の液晶駆動
用箔状回路を平面的に配列し、−枚の透明支持体で保持
している。そのために、−枚の液晶駆動用箔状回路の大
きさに拘らず、サイズの大きい液晶表示用基板ができる
。接合部があっても接合部の厚みが薄いために視覚的に
見えない。図において、液晶駆動用箔状回路は接合部６
０１で途切れている。薄膜トランジスタ２０１は省略し
てえかいである。一つの液晶駆動用箔状回路と隣の液晶
駆動用箔状回路とは結線６０３（ゲート電極あるいはソ
ーヌ電嘩）により、コンタクト窓６０２を通して接続し
ている。後述するように、接続は透明絶縁体１０８の薄
膜トランジスタのある面で行うこともできる。In this configuration, a plurality of liquid crystal driving foil circuits, rather than one sheet, are arranged in a plane and held by two transparent supports. Therefore, a large-sized liquid crystal display substrate can be produced regardless of the size of the two liquid crystal driving foil circuits. Even if there is a joint, it is not visually visible because the joint is thin. In the figure, the foil circuit for driving the liquid crystal is connected to the joint 6.
It is interrupted at 01. The thin film transistor 201 is omitted. One liquid crystal driving foil circuit and the adjacent liquid crystal driving foil circuit are connected through a contact window 602 by a connection 603 (gate electrode or Saone electric wire). Connections can also be made on some side of the thin film transistor of the transparent insulator 108, as described below.
複数の液晶駆動用箔状回路を用いた第６図の液晶表示用
基板の製造方法は、液晶駆動用箔状回路を形成した腐食
性基板を複数枚用意し、−枚の透明支持体上に並べ接着
すればよく、工程は第２図と同じである。腐食性基板を
取り除いた後、コンタクト窓をあけ、配線すれば良い。The manufacturing method of the liquid crystal display substrate shown in FIG. 6 using a plurality of foil-like circuits for driving a liquid crystal is to prepare a plurality of corrosive substrates on which foil-like circuits for driving a liquid crystal are formed, and place them on - sheets of a transparent support. All they have to do is to line them up and glue them together, and the process is the same as that shown in Figure 2. After removing the corrosive board, open the contact window and connect the wiring.
第７図は本発明の液晶表示パネルに使う液晶表示用基板
の別の例の断面図を示す。ここでは、第１図のものとは
液晶駆動用箔状回路が上下逆さまになっている。透明絶
縁体薄膜１０Ｂ側を透明支持体１０３に樹脂層１０２に
よって接着している。FIG. 7 shows a sectional view of another example of the liquid crystal display substrate used in the liquid crystal display panel of the present invention. Here, the foil circuit for driving the liquid crystal is upside down compared to the one in FIG. The transparent insulator thin film 10B side is bonded to the transparent support 103 with a resin layer 102.
第８図は第７図の構成のγ在高表示用基板の作成方法を
説明する工程図をしめす。第８図（ａ）は第２図（ａ）
と同じ工程で腐食性基板２０２上に、透明絶縁体薄膜１
０８とその上の液晶駆動用簿膜回路からなる液晶駆動用
箔状回路１０１を設ける。２０１は薄膜トランジスタで
ある。第８図（ｂ）の工程において、この液晶駆動用箔
状回路の上に除去可能な樹脂（例えば、ワックス等の熱
可塑性の樹脂あるいは溶剤に可溶性の樹脂等）８Ｑ２を
介在させて仮の補強材８０１をつける。次に、第８図（
Ｃ）にあるように電食性基板２０２を腐食して取り除く
。FIG. 8 shows a process diagram illustrating a method for producing the γ level display substrate having the configuration shown in FIG. 7. Figure 8(a) is similar to Figure 2(a)
In the same process as above, a transparent insulating thin film 1 is formed on a corrosive substrate 202.
08 and a foil-like circuit 101 for driving a liquid crystal is provided thereon. 201 is a thin film transistor. In the process shown in FIG. 8(b), a removable resin (e.g., thermoplastic resin such as wax or solvent-soluble resin) 8Q2 is interposed on top of this liquid crystal driving foil circuit to provide temporary reinforcement. Attach material 801. Next, see Figure 8 (
The electrolytically corrodable substrate 202 is corroded and removed as shown in C).
ここまでの工程は、除去可能な樹脂と仮の補強材を除い
て、第２図の工程と同じである。腐食性基板を取り除い
た後、第８図（ｄ）のように、透明支持体８０３を樹脂
層８０４にて接着する。その後、第８図（ｅ）のように
、仮の補強材８０１を除去可能な樹脂とともに取り除き
、液晶表示用基板を完成する。The steps up to this point are the same as those shown in FIG. 2, except for the removable resin and temporary reinforcing material. After removing the corrosive substrate, a transparent support 803 is bonded with a resin layer 804 as shown in FIG. 8(d). Thereafter, as shown in FIG. 8(e), the temporary reinforcing material 801 is removed together with the removable resin to complete the liquid crystal display substrate.
第９図は本発明の液晶表示パネルに用いる液晶表示用基
板の別の一例の断面図を示す。箔状の単結晶シリコンに
窓をあけた液晶駆動用箔状回路９０１を透明支持体９０
２に樹脂層９０３を介して張ｖ付けた液晶表示用基板で
ある。９０７は単結晶シリコンであり９０５がトランジ
スタである。FIG. 9 shows a sectional view of another example of the liquid crystal display substrate used in the liquid crystal display panel of the present invention. A foil-like circuit 901 for driving a liquid crystal, which has a window in a foil-like single crystal silicon, is mounted on a transparent support 90.
This is a liquid crystal display substrate in which a resin layer 903 is attached to the substrate 2 with a resin layer 903 interposed therebetween. 907 is single crystal silicon, and 905 is a transistor.
９０４は窒化シリコンあるいは酸化シリコンなどの透明
絶縁体薄膜である。９０６は透明電極である。904 is a transparent insulating thin film such as silicon nitride or silicon oxide. 906 is a transparent electrode.
第１０図は第９図の構成の液晶表示用基板の作成方法を
説明する工程図をしめす。第１０図（、）はトランジス
タを含む液晶駆動回路を形成したシリコンウェファ−で
ある。シリコンウェファ−９０７の表面に回路９０５が
あシ、その上に酸化膜あるいは窒化膜９０４があシ、こ
れにコンタクト窓を明けて、その上に形成した透明電Ｆ
Ｍ’ａｏｅと回路９０６を繋いでいる。回路９０５は大
きく省略して描いである。このシリコンウェファに仮の
補強材１ｏｏ１を除去可能な接着剤１ｏｏ２（例えばワ
ックス）で第１０図Φ）のように取りつける。シリコン
ウェファ−は通常４００〜７００μあり、これに液晶表
示パネルの絵素に対応する穴（〜３０μ口）をあけるこ
とは難しい。特殊なプラズマエツチング（ＥＣＲ）によ
りアヌベクト比の大きいエンチングが可能になっている
が、今のニーズには届かない。将来は可能になるかもし
れない。FIG. 10 shows a process diagram illustrating a method for producing a liquid crystal display substrate having the structure shown in FIG. 9. FIG. 10(,) shows a silicon wafer on which a liquid crystal drive circuit including transistors is formed. A circuit 905 is formed on the surface of a silicon wafer 907, an oxide film or a nitride film 904 is formed on the surface of the silicon wafer 907, a contact window is formed in this, and a transparent electrode F is formed on the surface of the circuit 905.
Connects M'aoe and circuit 906. The circuit 905 is largely omitted in the drawing. A temporary reinforcing material 1oo1 is attached to this silicon wafer with a removable adhesive 1oo2 (for example, wax) as shown in FIG. 10 Φ). Silicon wafers usually have a thickness of 400 to 700 microns, and it is difficult to make holes (~30 microns) corresponding to the picture elements of a liquid crystal display panel. Although special plasma etching (ECR) enables etching with a large anubect ratio, it does not meet current needs. It may become possible in the future.
厚さ５０μまで機械研磨する。このような技術はずいぶ
ん進歩していて、ディスクＩＪ −トＦ Ｅ Ｔの製造
に多く利用されている。その液フォトリソにより第１０
図（Ｃ）のように透明な窓１００３をあける。つぎに、
透明支持体９０２を樹脂層９０３を接着剤として第１０
図（ｄ）のように張９付ける。次に、仮の補強材を取り
除けば第１０図（８）のような液晶表示用基板ができあ
がる。接着剤１ｏ○２がワックスの場合は加熱すれば、
溶融して簡単に取れる。Machine polished to a thickness of 50μ. Such technology has advanced considerably and is widely used in the manufacture of disk IJ-FETs. The 10th photolithography process
Open a transparent window 1003 as shown in Figure (C). next,
The transparent support 902 is attached to the resin layer 903 as an adhesive.
Attach tension 9 as shown in figure (d). Next, by removing the temporary reinforcing material, a liquid crystal display substrate as shown in FIG. 10 (8) is completed. If the adhesive 1o○2 is wax, heat it.
Melts and can be easily removed.
発明の効果
以上の説明かち明らかなように、本発明を用いれば、駆
動回路を透明支持体上に歩留まりの良い小さいサイズの
駆動回路のアレイを転写するようにしているために、歩
留まやよく液晶表示用基板を製造できるばかりでなく、
また、超大型液晶表水用基板の製造も可能である。Effects of the Invention As is clear from the above description, by using the present invention, an array of small-sized drive circuits with a high yield is transferred onto a transparent support. Not only can we manufacture LCD display substrates, but
Furthermore, it is also possible to manufacture ultra-large liquid crystal surface water substrates.
【図面の簡単な説明】
第１図は本発明の一実施例における液晶表示パネルに用
いる液晶表示用基板の断面図、第２図は第１図の液晶表
示用基板の一つの製造方法を説明する工程図、第３図〜
第７図は本発明の他の実施例における液晶表示パネルに
用いる液晶表示用基板の断面図、第８図は第７図の構成
の液晶表示用基板の製造方法を説明する工程図、第９図
は本発明のτ在島表示パネルに用いる液晶表示用基板の
別の一例の断面図、第１０図は第７図の構成の液晶表示
用基板の製造方法を説明する工程図である。
１０１．９０１・・・・・・液晶駆動用箔状回路、１０
２゜２０４．８０４．９０３・・−・・樹脂層、１０３
，２０３゜８０３．９０２・・・・・透明支持体、１０
４・・・・ゲート電極、１０５・・・・・半導体薄膜、
１０８・・・ソースあるいはドレイン、１０了、９ｏ６
・・・・・・透明電極、１０８．９０４・・・・・透明
絶縁体薄膜、２０１・・・・・・薄膜トランジスタ、２
０２・・・・・腐食性基板、２０５・・・・・・液晶表
示用基板、３０１・・・・・堀込み、４０１．６０２・
・・ ・コンタクト空、５０１ ・ ブラック、５０２
・ ・Ｒ（赤）、５０３ ・・・・Ｇ（緑）、５０４・
・Ｂ（青）、６０１ ・・・接合部、６０３・・・
結線、８０１，１０Ｑ１ 仮の補強材、８０２゜１０
０２ ・・・除去可能な樹脂、９０５ ・トランジ
スタ、９Ｑ７・・・・単結晶ンリコンウエファー、１０
０３・・・・・・窓。[Brief Description of the Drawings] Fig. 1 is a cross-sectional view of a liquid crystal display substrate used in a liquid crystal display panel according to an embodiment of the present invention, and Fig. 2 explains one method for manufacturing the liquid crystal display substrate of Fig. 1. Process diagram, Figure 3~
FIG. 7 is a cross-sectional view of a liquid crystal display substrate used in a liquid crystal display panel according to another embodiment of the present invention, FIG. The figure is a sectional view of another example of the liquid crystal display substrate used in the τ island display panel of the present invention, and FIG. 10 is a process diagram illustrating a method for manufacturing the liquid crystal display substrate having the structure shown in FIG. 7. 101.901・・・Foil-shaped circuit for driving liquid crystal, 10
2゜204.804.903...Resin layer, 103
,203°803.902...Transparent support, 10
4...Gate electrode, 105...Semiconductor thin film,
108...source or drain, 10 ends, 9o6
...Transparent electrode, 108.904 ...Transparent insulator thin film, 201 ...Thin film transistor, 2
02...Corrosive substrate, 205...Liquid crystal display substrate, 301...Drilling, 401.602.
・Contact empty, 501 ・Black, 502
・・R (red), 503 ・・・・G (green), 504・
・B (blue), 601...Joint part, 603...
Connection, 801,10Q1 Temporary reinforcement, 802°10
02... Removable resin, 905 - Transistor, 9Q7... Single crystal silicon wafer, 10
03...Window.
Claims (10)
持体に張りつけた液晶表示用基板を液晶パネルの一方の
基板の構成要素とすることを特徴とする液晶表示パネル
。(1) A liquid crystal display panel characterized in that one substrate of the liquid crystal panel includes a liquid crystal display substrate in which a liquid crystal driving foil circuit is attached to a transparent support with a resin layer interposed therebetween.
介在させて透明支持体に平面的に配列張りつけた液晶表
示用基板を液晶パネルの一方の基板の構成要素とするこ
とを特徴とする液晶表示パネル。(2) A liquid crystal display substrate in which at least a plurality of liquid crystal drive foil circuits are arranged and pasted on a transparent support in a plane with a resin layer interposed therebetween is used as a component of one substrate of the liquid crystal panel. LCD display panel.
請求項１又は２記載の液晶表示パネル。(3) The liquid crystal display panel according to claim 1 or 2, wherein the resin layer includes a color filter.
形成した薄膜トランジスタを含む液晶駆動用薄膜回路か
らなり、液晶表示用基板の構成が少なくとも透明支持体
、樹脂層、透明絶縁体薄膜、薄膜トランジスタを含む液
晶駆動用薄膜回路の順に積層されていることを特徴とす
る請求項１、２または３記載の液晶表示パネル。(4) The foil circuit for driving a liquid crystal consists of a thin film circuit for driving a liquid crystal including a transparent insulating thin film and a thin film transistor formed thereon, and the liquid crystal display substrate consists of at least a transparent support, a resin layer, and a transparent insulating thin film. , a liquid crystal driving thin film circuit including a thin film transistor are laminated in this order.
形成した薄膜トランジスタを含む液晶駆動用薄膜回路か
らなり、液晶表示用基板の構成が少なくとも透明支持体
、樹脂層、薄膜トランジスタを含む液晶駆動用薄膜回路
、透明絶縁体薄膜の順に積層されていることを特徴とす
る請求項１、２または３記載の液晶表示パネル。(5) The foil circuit for driving a liquid crystal consists of a thin film circuit for driving a liquid crystal including a transparent insulating thin film and a thin film transistor formed thereon, and the structure of the substrate for liquid crystal display is a liquid crystal display including at least a transparent support, a resin layer, and a thin film transistor. 4. The liquid crystal display panel according to claim 1, wherein the driving thin film circuit and the transparent insulating thin film are laminated in this order.
する単結晶シリコンからなっていて、液晶表示用基板の
構成が透明支持体、樹脂層、箔状単結晶シリコンの順に
積層されていることを特徴とする請求項１、２または３
記載の液晶表示パネル。(6) The foil-like circuit for liquid crystal display is made of foil-like single-crystal silicon having a partially transparent window, and the structure of the liquid-crystal display substrate is laminated in the order of transparent support, resin layer, and foil-like single crystal silicon. Claim 1, 2 or 3 characterized in that
The liquid crystal display panel described.
ランジスタを含む液晶駆動用薄膜回路を設け、この上に
透明支持体を接着樹脂で張りつけて補強した後、腐食基
材をエッチングにて除去して作ることを特徴とする液晶
表示基板の製造方法。(7) A thin film circuit for driving a liquid crystal including a thin film transistor is provided on a transparent insulating thin film provided on a corrosive base material, and a transparent support is pasted on top of this with adhesive resin to reinforce it, and then the corrosive base material is etched. A method for producing a liquid crystal display substrate, characterized in that the substrate is produced by removing the liquid crystal display substrate.
ランジスタを含む液晶駆動用薄膜回路を設け、この上に
透明支持体を接着樹脂で張りつけて補強した後、腐食性
基材をエッチングにて除去し、然る後、絶縁体膜にコン
タクト窓をあけ透明電極を形成したことを特徴とする液
晶表示基板の製造方法。(8) A thin film circuit for driving a liquid crystal including a thin film transistor is provided on a transparent insulating thin film provided on a corrosive base material, a transparent support is pasted on top of this with an adhesive resin for reinforcement, and then the corrosive base material is etched. 1. A method for manufacturing a liquid crystal display substrate, comprising: removing the insulating film by a process, and then forming a contact window in the insulating film to form a transparent electrode.
ランジスタを含む液晶駆動用薄膜回路を設け、この上に
仮の補強材を接着樹脂で張りつけて補強した後、腐食性
基材をエッチングにて除去し、その跡に透明支持体を張
り付け、仮の補強材を除去して作ることを特徴とする液
晶表示基板の製造方法。(9) A thin film circuit for driving a liquid crystal including a thin film transistor is provided on a transparent insulating thin film provided on a corrosive base material, and after reinforcing it by pasting a temporary reinforcing material on top of this with adhesive resin, the corrosive base material is removed. A method for manufacturing a liquid crystal display substrate, which comprises removing the temporary reinforcing material by etching, attaching a transparent support to the remaining part, and removing a temporary reinforcing material.
の表面に仮の補強材を付けて補強し、単結晶シリコンを
裏側から研削して薄くし、部分的にエッチングにより窓
を明けて後、透明基板を張り付け、仮の補強材を除去し
て作ることを特徴とする液晶表示基板の製造方法。(10) After attaching a temporary reinforcing material to the surface of the single-crystal silicon substrate on which the drive circuit is formed and reinforcing it, thinning the single-crystal silicon by grinding it from the back side, and partially opening a window by etching, A method of manufacturing a liquid crystal display substrate, which is characterized by pasting a transparent substrate and removing a temporary reinforcing material.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP29797890A JP2929704B2 (en) | 1990-11-01 | 1990-11-01 | Method of manufacturing liquid crystal display substrate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP29797890A JP2929704B2 (en) | 1990-11-01 | 1990-11-01 | Method of manufacturing liquid crystal display substrate |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH04170520A true JPH04170520A (en) | 1992-06-18 |
| JP2929704B2 JP2929704B2 (en) | 1999-08-03 |
Family
ID=17853558
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP29797890A Expired - Fee Related JP2929704B2 (en) | 1990-11-01 | 1990-11-01 | Method of manufacturing liquid crystal display substrate |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2929704B2 (en) |
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| JP2929704B2 (en) | 1999-08-03 |
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