JPH0416560B2 - - Google Patents
Info
- Publication number
- JPH0416560B2 JPH0416560B2 JP29135789A JP29135789A JPH0416560B2 JP H0416560 B2 JPH0416560 B2 JP H0416560B2 JP 29135789 A JP29135789 A JP 29135789A JP 29135789 A JP29135789 A JP 29135789A JP H0416560 B2 JPH0416560 B2 JP H0416560B2
- Authority
- JP
- Japan
- Prior art keywords
- plating
- tank
- cleaning
- stage
- demister
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000007747 plating Methods 0.000 claims description 78
- 238000004140 cleaning Methods 0.000 claims description 65
- 239000007788 liquid Substances 0.000 claims description 26
- 239000000126 substance Substances 0.000 claims description 16
- 238000005406 washing Methods 0.000 claims description 8
- 238000007654 immersion Methods 0.000 claims description 2
- 239000000047 product Substances 0.000 description 10
- 239000003595 mist Substances 0.000 description 6
- 238000000034 method Methods 0.000 description 5
- 239000000463 material Substances 0.000 description 4
- 238000001704 evaporation Methods 0.000 description 3
- 230000008020 evaporation Effects 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- 239000012141 concentrate Substances 0.000 description 2
- 238000002242 deionisation method Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 230000004313 glare Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000003456 ion exchange resin Substances 0.000 description 1
- 229920003303 ion-exchange polymer Polymers 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 238000002791 soaking Methods 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
Landscapes
- Electroplating Methods And Accessories (AREA)
- Cleaning By Liquid Or Steam (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP29135789A JPH03153900A (ja) | 1989-11-10 | 1989-11-10 | めっき浴管理装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP29135789A JPH03153900A (ja) | 1989-11-10 | 1989-11-10 | めっき浴管理装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH03153900A JPH03153900A (ja) | 1991-07-01 |
| JPH0416560B2 true JPH0416560B2 (enrdf_load_stackoverflow) | 1992-03-24 |
Family
ID=17767878
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP29135789A Granted JPH03153900A (ja) | 1989-11-10 | 1989-11-10 | めっき浴管理装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH03153900A (enrdf_load_stackoverflow) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012097314A (ja) * | 2010-11-01 | 2012-05-24 | Kida Seiko Kk | 無排水による表面処理装置 |
-
1989
- 1989-11-10 JP JP29135789A patent/JPH03153900A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012097314A (ja) * | 2010-11-01 | 2012-05-24 | Kida Seiko Kk | 無排水による表面処理装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH03153900A (ja) | 1991-07-01 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
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| R250 | Receipt of annual fees |
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| R250 | Receipt of annual fees |
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| FPAY | Renewal fee payment (prs date is renewal date of database) |
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| FPAY | Renewal fee payment (prs date is renewal date of database) |
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| FPAY | Renewal fee payment (prs date is renewal date of database) |
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|
| EXPY | Cancellation because of completion of term | ||
| FPAY | Renewal fee payment (prs date is renewal date of database) |
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