JPH04165022A - Formation of insulating film for oriented electromagnetic steel plate excellent in iron core machinablity and anti-dusting performance - Google Patents
Formation of insulating film for oriented electromagnetic steel plate excellent in iron core machinablity and anti-dusting performanceInfo
- Publication number
- JPH04165022A JPH04165022A JP2290037A JP29003790A JPH04165022A JP H04165022 A JPH04165022 A JP H04165022A JP 2290037 A JP2290037 A JP 2290037A JP 29003790 A JP29003790 A JP 29003790A JP H04165022 A JPH04165022 A JP H04165022A
- Authority
- JP
- Japan
- Prior art keywords
- insulating film
- weight
- steel plate
- parts
- coating agent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229910000831 Steel Inorganic materials 0.000 title claims abstract description 28
- 239000010959 steel Substances 0.000 title claims abstract description 28
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical group [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 title abstract description 21
- 238000010410 dusting Methods 0.000 title abstract 2
- 230000015572 biosynthetic process Effects 0.000 title description 3
- 238000000034 method Methods 0.000 claims abstract description 24
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 18
- 239000007888 film coating Substances 0.000 claims abstract description 18
- 238000009501 film coating Methods 0.000 claims abstract description 18
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 15
- 239000002245 particle Substances 0.000 claims abstract description 14
- 239000008119 colloidal silica Substances 0.000 claims abstract description 11
- 229910019142 PO4 Inorganic materials 0.000 claims abstract description 10
- 235000021317 phosphate Nutrition 0.000 claims abstract description 10
- 229910052791 calcium Inorganic materials 0.000 claims abstract description 9
- 239000007787 solid Substances 0.000 claims abstract description 9
- 229910052725 zinc Inorganic materials 0.000 claims abstract description 9
- 229910052742 iron Inorganic materials 0.000 claims abstract description 8
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 6
- ZCDOYSPFYFSLEW-UHFFFAOYSA-N chromate(2-) Chemical compound [O-][Cr]([O-])(=O)=O ZCDOYSPFYFSLEW-UHFFFAOYSA-N 0.000 claims abstract description 6
- 150000003013 phosphoric acid derivatives Chemical class 0.000 claims abstract description 6
- SOCTUWSJJQCPFX-UHFFFAOYSA-N dichromate(2-) Chemical compound [O-][Cr](=O)(=O)O[Cr]([O-])(=O)=O SOCTUWSJJQCPFX-UHFFFAOYSA-N 0.000 claims abstract description 5
- 229910052788 barium Inorganic materials 0.000 claims abstract description 4
- -1 borides Chemical class 0.000 claims abstract description 4
- 150000001642 boronic acid derivatives Chemical class 0.000 claims abstract description 4
- 150000004649 carbonic acid derivatives Chemical class 0.000 claims abstract description 4
- 150000001805 chlorine compounds Chemical class 0.000 claims abstract description 4
- 229910052804 chromium Inorganic materials 0.000 claims abstract description 4
- 229910052802 copper Inorganic materials 0.000 claims abstract description 4
- 150000002823 nitrates Chemical class 0.000 claims abstract description 4
- 150000004767 nitrides Chemical class 0.000 claims abstract description 4
- 150000004760 silicates Chemical class 0.000 claims abstract description 4
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 4
- 229910052712 strontium Inorganic materials 0.000 claims abstract description 4
- 229910052720 vanadium Inorganic materials 0.000 claims abstract description 4
- 229910052779 Neodymium Inorganic materials 0.000 claims abstract description 3
- 229910052793 cadmium Inorganic materials 0.000 claims abstract description 3
- 150000004679 hydroxides Chemical class 0.000 claims abstract description 3
- 229910052750 molybdenum Inorganic materials 0.000 claims abstract description 3
- 150000003568 thioethers Chemical class 0.000 claims abstract description 3
- 229910052719 titanium Inorganic materials 0.000 claims abstract description 3
- 229910052797 bismuth Inorganic materials 0.000 claims abstract 2
- 150000001247 metal acetylides Chemical class 0.000 claims abstract 2
- 229910052759 nickel Inorganic materials 0.000 claims abstract 2
- 229910052718 tin Inorganic materials 0.000 claims abstract 2
- 229910052721 tungsten Inorganic materials 0.000 claims abstract 2
- 238000000137 annealing Methods 0.000 claims description 31
- 229910001224 Grain-oriented electrical steel Inorganic materials 0.000 claims description 12
- 239000000428 dust Substances 0.000 claims description 10
- 238000009413 insulation Methods 0.000 claims description 9
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 claims description 8
- 229910000976 Electrical steel Inorganic materials 0.000 claims description 6
- 239000011248 coating agent Substances 0.000 abstract description 20
- 238000000576 coating method Methods 0.000 abstract description 15
- 239000000203 mixture Substances 0.000 abstract description 6
- 229910052748 manganese Inorganic materials 0.000 abstract description 3
- 229910052681 coesite Inorganic materials 0.000 abstract description 2
- 229910052906 cristobalite Inorganic materials 0.000 abstract description 2
- 239000000377 silicon dioxide Substances 0.000 abstract description 2
- 235000012239 silicon dioxide Nutrition 0.000 abstract description 2
- 229910052682 stishovite Inorganic materials 0.000 abstract description 2
- 229910052905 tridymite Inorganic materials 0.000 abstract description 2
- 239000000463 material Substances 0.000 abstract 2
- 150000008064 anhydrides Chemical class 0.000 abstract 1
- 230000001050 lubricating effect Effects 0.000 abstract 1
- 239000011162 core material Substances 0.000 description 18
- 230000000694 effects Effects 0.000 description 7
- 239000012298 atmosphere Substances 0.000 description 5
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 4
- 239000010452 phosphate Substances 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 239000012535 impurity Substances 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000005096 rolling process Methods 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 2
- 238000005097 cold rolling Methods 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 238000005261 decarburization Methods 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 2
- 230000005381 magnetic domain Effects 0.000 description 2
- 238000005554 pickling Methods 0.000 description 2
- 238000010186 staining Methods 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- 238000004804 winding Methods 0.000 description 2
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 238000000748 compression moulding Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 238000005098 hot rolling Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- 238000005461 lubrication Methods 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000010008 shearing Methods 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Landscapes
- Other Surface Treatments For Metallic Materials (AREA)
- Soft Magnetic Materials (AREA)
- Chemical Treatment Of Metals (AREA)
- Manufacturing Of Steel Electrode Plates (AREA)
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明は鉄心加工性および耐粉塵化性が優れた方向性電
磁鋼板の絶縁皮膜形成方法に関する。DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a method for forming an insulating film on a grain-oriented electrical steel sheet that has excellent core workability and dust resistance.
(従来の技術)
方向性電磁銅板は、Stを例えば2〜4%含有する珪素
鋼スラブを熱間圧延し、焼鈍した後、1回或いは中間焼
鈍を挟む2回以上の冷間圧延を施して最終板厚とし、次
いで脱炭焼鈍し、MgOを主成分とする焼鈍分離剤を塗
布し、仕上焼鈍を施してゴス方位をもつ2次再結晶粒を
発達させ、さらにS、 N等の不純物を除去するととも
にグラス皮膜を形成−し、次いで絶縁皮膜用コーテイン
グ液を塗布し、焼付処理して絶縁皮膜を形成し製品とさ
れる。(Prior art) A oriented electromagnetic copper plate is produced by hot rolling a silicon steel slab containing, for example, 2 to 4% St, annealing it, and then cold rolling it once or twice or more with intermediate annealing in between. The plate is made to the final thickness, then decarburized and annealed, coated with an annealing separator mainly composed of MgO, final annealed to develop secondary recrystallized grains with Goss orientation, and further impurities such as S and N are removed. While removing it, a glass film is formed, and then a coating liquid for an insulating film is applied, and a baking treatment is performed to form an insulating film to produce a product.
また、鉄損をより低くさせることを目的として、仕上焼
鈍後、或いは前に方向性電磁鋼板の表面に微細な線状歪
を間隔をおいて付与し磁区を細分化することがなされて
いる(例えば特開昭53−137016号公報、特開昭
56−51522号公報)。In addition, for the purpose of lowering iron loss, fine linear strain is applied at intervals to the surface of grain-oriented electrical steel sheets after or before final annealing to subdivide the magnetic domains ( For example, JP-A-53-137016, JP-A-56-51522).
前記線状歪が絶縁皮膜形成後になされた場合は、皮膜が
損傷されることがあるので、防錆の目的で再度絶縁皮膜
処理がなされる。If the linear strain is applied after the insulation film is formed, the film may be damaged, so the insulation film treatment is performed again for the purpose of rust prevention.
ところで、方向性電磁鋼板は主としてトランス、電気機
器の鉄心材料として用いられるが、鉄心製造の際には、
所定幅にスリットされた方向性電磁鋼板のフープを連続
的に巻き解きながら剪断機で所定長さおよび形状に切断
した後、鉄心加工機で順次巻き重ね、または積層して、
巻鉄心や積鉄心とされる。巻鉄心の場合には圧縮成型、
歪取焼鈍を経てレーシングと呼ばれる巻線作業を行って
トランスとされる。By the way, grain-oriented electrical steel sheets are mainly used as core materials for transformers and electrical equipment, but when manufacturing cores,
A hoop of grain-oriented electrical steel sheet slit to a predetermined width is continuously unwound and cut into a predetermined length and shape using a shearing machine, and then sequentially rolled or laminated using a core processing machine.
It is considered to be a wound core or a stacked core. In the case of wound cores, compression molding,
After strain relief annealing, a winding process called lacing is performed to create a transformer.
積鉄心の場合は、手作業により鉄心を組み立て、巻線作
業を行ってトランスとされるが、通常は歪取焼鈍は行わ
ない。In the case of stacked iron cores, the cores are assembled manually and wound to form a transformer, but strain relief annealing is usually not performed.
鉄心の製造においては、例えば巻鉄心の場合、皮膜の潤
滑性がよくて巻加工、成型作業が円滑に行え、かつ成型
後の鋼板端面やラップ部に凹凸を生ぜず、形状が優れて
いること、また積鉄心の場合、鋼板表面に形成された絶
縁皮膜が搬送ロール等との負荷荷重下での接触や剪断時
等に粉塵化しないことおよび皮膜のすべり性が適当にあ
り、鉄心組立作業が円滑に行われることが要求される。In the manufacture of iron cores, for example, in the case of wound cores, the film must have good lubricity so that winding and forming operations can be performed smoothly, and the shape is excellent without causing unevenness on the steel plate end face or lap part after forming. In addition, in the case of stacked cores, the insulating film formed on the surface of the steel plate does not turn into dust when it comes into contact with conveyor rolls, etc. or when sheared, etc., and the film has appropriate slipperiness, making it easy to assemble the core. It is required that the process be carried out smoothly.
さらに、巻鉄心の場合は歪取焼鈍時に鋼板の表面皮膜相
互間で焼付がなく、レーシング作業がスムーズに行える
ことが、鉄心加工能率の向上或いは焼付による歪の誘起
や皮膜性能の劣化防止の観点から重要である。これらの
問題に対しては、方向性電磁鋼板の絶縁皮膜の性状が大
きく影響するから、これらの特性の優れた絶縁皮膜を開
発することが強く望まれている。Furthermore, in the case of wound cores, there is no seizure between the surface films of the steel plates during strain relief annealing, and racing work can be performed smoothly, which is important from the viewpoint of improving core processing efficiency and preventing distortion caused by seizure and deterioration of film performance. It is important because These problems are greatly influenced by the properties of the insulating film of grain-oriented electrical steel sheets, so it is strongly desired to develop an insulating film with excellent properties.
トランスの鉄心加工性を向上させるための手段として、
絶縁皮膜形成用のコーティング剤の改良が検討されてい
る。例えば特開昭61−4773号公報には、コーティ
ング剤として第1燐酸塩に粒子径8μm以下の超微粒子
コロイド状シリカ。As a means to improve the workability of transformer cores,
Improvements in coating agents for forming insulating films are being considered. For example, JP-A No. 61-4773 discloses ultrafine colloidal silica having a particle size of 8 μm or less as a primary phosphate as a coating agent.
クロム酸、クロム酸塩の1種または2種以上からなる混
合液を、仕上焼鈍後の鋼板に塗布し焼付処理することに
より、絶縁皮膜のすべり性を改善する技術が開示されて
いる。A technique has been disclosed for improving the slipperiness of an insulating film by applying a mixture of one or more of chromic acid and chromate to a steel plate after finish annealing and baking it.
これらの絶縁皮膜の改善によって、方向性電磁銅板の鉄
損、磁気歪、絶縁特性とともに皮膜潤滑性が改善されて
きており、それなりの効果が得られている。These improvements in insulating films have improved the iron loss, magnetostriction, and insulation properties of the grain-oriented electromagnetic copper plates, as well as the film lubricity, and have produced certain effects.
しかし、線状歪を付与し低鉄損化され、絶縁皮膜を再度
形成された方向性電磁鋼板では、線状歪の確保のため、
絶縁皮膜の焼付温度を充分に高めることができず低温で
焼付することが必要である。However, in grain-oriented electrical steel sheets that have been subjected to linear strain to reduce core loss and have an insulating film re-formed, in order to ensure linear strain,
It is not possible to raise the baking temperature of the insulating film sufficiently, so it is necessary to bake at a low temperature.
そのため皮膜強度不足となり、絶縁皮膜に疵が付きやす
く、皮膜の粉塵化が散見されることがある。As a result, the film strength is insufficient, the insulation film is prone to scratches, and the film may occasionally become dusty.
また該方向性電磁鋼板は磁気特性が高度化されているが
、その特性を製作トランスにおいて十分に発揮させるた
めの要件の一つとして該鋼板絶縁皮膜の鉄心加工性を一
層向上させることが重要である。Furthermore, although the magnetic properties of grain-oriented electrical steel sheets have been improved, it is important to further improve the core workability of the steel sheet insulation coating, as one of the requirements for making full use of these characteristics in manufactured transformers. be.
(発明が解決しようとする!ia)
本発明は線状歪を付与して鉄損を低下させた方向性電磁
鋼板において、前記線状歪の付与前または後、或いは前
後両方で方向性電磁鋼板に絶縁皮膜を形成するにあたり
、すべり性がよく鉄心加工性にすぐれ、かつ粉塵化しな
い絶縁皮膜を形成せしめる方法を擾供することを目的と
する。(Solution to be Solved by the Invention!ia) The present invention provides a grain-oriented electrical steel sheet that has been subjected to linear strain to reduce core loss. An object of the present invention is to provide a method for forming an insulating film that has good slip properties, excellent iron core workability, and does not turn into dust.
(課題を解決するための手段)
本発明の要旨とするところは、珪素鋼スラブを熱間圧延
し必要に応じて焼鈍し、1回或いは中間焼鈍を挟み2回
以上の冷間圧延を行って最終板厚とし、脱炭焼鈍し、焼
鈍分離剤を塗布した後仕上焼鈍し、該仕上焼鈍後の鋼板
に絶縁皮膜コーティング剤を塗布し焼付処理を行い、鋼
板表面に微細な線状歪を間隔をおいて付与し、その後、
再度絶縁皮膜コーティング剤を塗布し焼付は絶縁皮膜を
形成する方法において、
粒径50nm以下のコロイド状シリカ100重量部(S
ingとして)に対し、AL Mg、 Ca+ Znの
燐酸塩の1種または2種以上を130〜300重量部と
、無水クロム酸、クロム酸塩1重クロム酸塩の1種また
は2種以上を10〜100重量部と、Fe+ Ca、
Ba、 Zn、 AL Nt、 Sn、
Cu+ Cr、 Cd+ Nd+Mn+ Mo
、 si、 Ti、 k、 ei、 Sr、 Vの酸化
物、変化物、窒化物、硫化物、硼化物、水酸化物、珪酸
塩、炭酸塩、硼酸塩、硝酸塩または塩化物であって、そ
の粒子径が5〜2000 n mの非コロイド状の固形
物の1種または2種以上を0.5〜25重量部とを添加
してなる絶縁皮膜コーティング剤を、前記線状歪の付与
前または後、或いは前後両方に鋼板に塗布し焼付は絶縁
皮膜を形成することを特徴とする鉄心加工性および耐粉
塵化性が優れた方向性電磁鋼板の絶縁皮膜形成方法にあ
る。(Means for Solving the Problems) The gist of the present invention is to hot roll a silicon steel slab, annealing it if necessary, and cold rolling it once or twice or more with intermediate annealing in between. The steel plate is adjusted to the final thickness, decarburized and annealed, coated with an annealing separator, and then subjected to finish annealing. After the final annealing, an insulating film coating agent is applied to the steel plate and a baking treatment is performed to create fine linear strain on the steel plate surface at intervals. and then,
In the method of forming an insulating film by applying the insulating film coating agent again and baking it, 100 parts by weight of colloidal silica (S
ing), 130 to 300 parts by weight of one or more phosphates of AL Mg, Ca + Zn, and 10 parts by weight of one or more of chromic anhydride, chromate 1 dichromate. ~100 parts by weight, Fe+Ca,
Ba, Zn, AL Nt, Sn,
Cu+ Cr, Cd+ Nd+Mn+ Mo
, si, Ti, k, ei, Sr, V oxides, variations, nitrides, sulfides, borides, hydroxides, silicates, carbonates, borates, nitrates or chlorides, An insulating film coating agent prepared by adding 0.5 to 25 parts by weight of one or more non-colloidal solids having a particle size of 5 to 2000 nm is applied before or after applying the linear strain. A method for forming an insulating film on a grain-oriented electrical steel sheet with excellent core workability and dust resistance, characterized in that the insulating film is formed by applying the insulating film to the steel plate afterward or on both the front and the back, and baking to form an insulating film.
以下、本発明の詳細な説明する。The present invention will be explained in detail below.
本発明者らは、鋼板表面に線状歪を間隔を置いて付与し
、また線状歪付与前後に絶縁皮膜コーティング剤を塗布
し焼付は絶縁皮膜を形成する際、前記コーティング剤中
に粒子径が5〜2000nmの非コロイド状の固形物を
添加すると、それが均一に分散或いは小粒子は凝集体を
形成して、これらが形成絶縁皮膜に丸みを呈する小さな
凸をつくり、二重皮膜形成と相まってすべり性が格段に
優れた絶縁皮膜となり、また疵がつき難く粉塵が生じな
い皮膜が得られる。The present inventors applied linear strain to the surface of a steel sheet at intervals, applied an insulating film coating agent before and after applying the linear strain, and baked to form an insulating film. When non-colloidal solids with a diameter of 5 to 2000 nm are added, they are uniformly dispersed or small particles form aggregates, which create small rounded convexities on the formed insulating film, resulting in the formation of a double film. Combined, this results in an insulating film with extremely excellent slip properties, and a film that is hard to scratch and does not generate dust.
本発明を実験データに基づき詳細に説明する。The present invention will be explained in detail based on experimental data.
公知の方法で仕上焼鈍まで施した方向性電磁鋼板のスト
リップコイルからサンプルを切り出し、歪取焼鈍を83
0℃×5時間で行いコイルセットを除去した後、2%B
!504で80°CX8秒の軽酸洗を施したものをサン
プルとした。このサンプルに第1表に示すように、粒径
10nmのコロイド状シリカ100重量部に対し、Mの
燐酸塩を234重量部を配合した絶縁皮膜コーティング
剤に、粒子径が20〜1200 n mの非コロイド状
のSiO2の粉末を2重量部製加配合し、これを水と混
え攪拌し、コーテイング液として鋼板に塗布、焼付後に
4.0g/Cとなるように塗布し、N:雰囲気下で86
0℃×30秒間の焼付処理を行った。その後、鋼板表面
へ圧延直交方向にlO閣間隔をおいてレーザー照射によ
り微細な線状歪を付与した。その後、再度絶縁皮膜コー
テイング液を塗布し400″Cで焼付けた。A sample was cut out from a strip coil of grain-oriented electrical steel sheet that had been subjected to finish annealing using a known method, and then subjected to strain relief annealing for 83 hours.
After removing the coil set at 0°C for 5 hours, 2% B
! The sample was lightly pickled with 504 at 80°C for 8 seconds. As shown in Table 1, this sample was coated with an insulating film coating agent containing 234 parts by weight of M phosphate to 100 parts by weight of colloidal silica with a particle size of 10 nm. 2 parts by weight of non-colloidal SiO2 powder was added and blended, mixed with water, stirred, and applied to a steel plate as a coating liquid. After baking, it was applied to a concentration of 4.0 g/C under an N atmosphere. So 86
A baking treatment was performed at 0° C. for 30 seconds. Thereafter, fine linear strain was applied to the surface of the steel plate by laser irradiation at 10 mm intervals in the direction perpendicular to the rolling direction. After that, the insulating film coating liquid was applied again and baked at 400''C.
得られた製品板から試料を切り出し、第1図に示す方法
(A法)で絶縁皮膜のすべり摩擦係数(FF値)を測定
した。その測定方法は挾み板1−1.1−2間に試料2
を置き、重鐘3にて荷重Nを加え、試料2を引き出す力
Aをバネ計り4で測定し、すべり摩擦係数μを、μ(F
F) =A/Nより求めた。A sample was cut out from the obtained product board, and the sliding friction coefficient (FF value) of the insulating film was measured by the method shown in FIG. 1 (Method A). The measurement method is to hold the sample 2 between the sandwiching plates 1-1 and 1-2.
, apply a load N with the heavy bell 3, measure the force A to pull out the sample 2 with the spring scale 4, and calculate the sliding friction coefficient μ as μ(F
F) = A/N.
また、絶縁皮膜上を一定加重を加えた鋼球を繰り返しす
べらせ、その際に鋼球が絶縁皮膜から受ける抵抗値を連
続的に測定し、あわせて絶縁皮膜の疵発生有無を調査し
た(潤滑性、B法)。In addition, we repeatedly slid a steel ball under a certain load on the insulation coating, and continuously measured the resistance that the steel ball received from the insulation coating.We also investigated the occurrence of flaws in the insulation coating (lubrication gender, B method).
さらに、別に切り出した33X4C1の試料を積層し、
これを90kg/cm”の締め付は圧力で結束してNt
雰囲気で860℃×3時間の歪取焼鈍を施し、第2図(
ロ)に示す方法によって鋼板の剥離荷重を測定しスティ
ッキング性を調査した。結果を第1表に示す。Furthermore, separately cut 33X4C1 samples were stacked,
Tighten this to 90kg/cm" by binding it with pressure.
Strain relief annealing was performed at 860°C for 3 hours in an atmosphere as shown in Figure 2 (
The peeling load of the steel plate was measured and the sticking property was investigated using the method shown in b). The results are shown in Table 1.
第1表に示すように、粒子径が20〜1200nmの非
コロイド状のSiO□を2重量部製加配合した絶縁皮膜
コーティング剤を塗布し焼付けたものは、FF値が低く
て潤滑性が優れ、疵発生が皆無で耐粉塵化性が高く、歪
取焼鈍時の耐ステイツキング性も良好である。As shown in Table 1, those coated with an insulating film coating agent containing 2 parts by weight of non-colloidal SiO□ with a particle size of 20 to 1200 nm and baked have a low FF value and excellent lubricity. , there is no occurrence of defects, the dust resistance is high, and the staking resistance during strain relief annealing is also good.
次に、本発明の絶縁皮膜の形成方法について述べる。Next, a method for forming an insulating film according to the present invention will be described.
絶縁皮膜形成用コーティング剤の組成は、50nm以下
のコロイド状シリカ100重量部(Si(hとして)に
対し、AIr Mg、 Ca、 Znの燐酸塩の1種ま
たは2種以上を130〜300重量部と、無水クロム酸
、クロム酸塩1重クロム酸塩の1種または2種以上を1
0〜100重量部配合している。The composition of the coating agent for forming an insulating film is 100 parts by weight of colloidal silica of 50 nm or less (Si (as h)) and 130 to 300 parts by weight of one or more phosphates of AIr, Mg, Ca, and Zn. and one or more of chromic anhydride, chromate, and dichromate.
It is blended in an amount of 0 to 100 parts by weight.
前記コロイド状シリカは鉄損および磁歪を低下させ、ま
た皮膜のすべり性をよくするためには50nm以下の微
細粒とする必要がある。The colloidal silica needs to have fine particles of 50 nm or less in order to reduce iron loss and magnetostriction, and to improve the slipperiness of the film.
A7. Mg、 Ca、 Znの燐酸塩は皮膜のベタツ
キを防ぎ、またすべり性を良好とする作用があり、さら
に本発明が対象とするような絶縁皮膜を再度形成させる
場合には皮膜粉塵化を防ぐ作用があり、この効果を奏す
るためにはコロイド状シリカ100重量部に対して、1
30重量部以上必要である。A7. Phosphates of Mg, Ca, and Zn have the effect of preventing stickiness of the film and improving slipperiness, and furthermore, when forming the insulating film again as the subject of the present invention, they have the effect of preventing the film from turning into dust. In order to achieve this effect, 1 part by weight of colloidal silica must be added.
30 parts by weight or more is required.
一方、その量が多くなると皮膜が軟質化し、皮膜に疵が
生じやすくなるので300重量部以下とする。また、A
Ir ng、 Ca、 Znの燐酸塩は選択的に配合さ
れるものであり、このなかの1種または2種以上が配合
される。On the other hand, if the amount is too large, the coating becomes soft and scratches are likely to occur on the coating, so the amount should be 300 parts by weight or less. Also, A
The phosphates of Ir ng, Ca, and Zn are selectively blended, and one or more of them are blended.
無水クロム酸、クロム酸塩、重クロム酸塩の1種または
2種以上を皮膜形成の安定化のために配合するが、この
量が10重量部未満では皮膜にベタツキを生じるので、
10重量部以上とする必要がある。一方、この量が多く
なるとフリーのクロム酸が過剰となり、再コーテイング
し低温で皮膜形成する際にもベタツクので100重量部
以下とする。One or more of chromic anhydride, chromate, and dichromate are blended to stabilize film formation, but if this amount is less than 10 parts by weight, the film will become sticky.
It needs to be 10 parts by weight or more. On the other hand, if this amount is too large, free chromic acid becomes excessive and the coating becomes sticky even when recoating and forming a film at a low temperature, so the amount should be 100 parts by weight or less.
Pe+ Ca、 Ba、 Zn+ AIr Nil S
n、 Cu+ Cr、 cd、 Nd+Mn、 ?’l
OI Sll Tll ’li+ Bt、Sr、 Vの
酸化物、炭化物、窒化物、硫化物、硼化物、水酸化物、
珪酸塩、炭酸塩、硼酸塩、硝酸塩または塩化物の非コロ
イド状の固形物が配合添加される。該固形物は皮膜表面
が微細な凸球状を分散して形成しすべり性を高め、また
皮膜粉塵化を防止させるために5n−以上の粒子径とす
る。一方、この粒子径が大きくなると皮膜の占積率が低
下するので2000 n m以下の粒子とする。粒子径
が5〜1100n程度では固形物同士が凝集し皮膜表面
に前記凸球状を形成する。Pe+ Ca, Ba, Zn+ AIr Nil S
n, Cu+Cr, cd, Nd+Mn, ? 'l
OI Sll Tll 'li+ Bt, Sr, V oxide, carbide, nitride, sulfide, boride, hydroxide,
Non-colloidal solids of silicates, carbonates, borates, nitrates or chlorides are incorporated. The solid substance has a particle size of 5n- or more in order to form fine convex spheres dispersed on the surface of the coating to improve slipperiness and to prevent the coating from turning into dust. On the other hand, as the particle size increases, the space factor of the film decreases, so the particle size is set to 2000 nm or less. When the particle size is about 5 to 1100 nm, the solids aggregate to form the convex spherical shape on the surface of the film.
また、該非コロイド状の固形物の配合はその量が少ない
とすべり性の向上効果が得られず、このようなことがな
いようにしてすべり性を高めるにはコロイド状シリカ1
00重量部に対して、0.5重量部以上配合添加する必
要がある。一方、その量が多くなると皮膜の占積率が低
下するので上限は25重量部とする。In addition, if the amount of the non-colloidal solid is small, the effect of improving slipperiness cannot be obtained, and in order to avoid this and improve slipperiness, colloidal silica
It is necessary to add 0.5 parts by weight or more to 00 parts by weight. On the other hand, if the amount increases, the space factor of the film decreases, so the upper limit is set at 25 parts by weight.
以上の組成からなる絶縁皮膜コーティング剤は水溶液状
とされ、鋼板に塗布、焼付は処理されて絶縁皮膜を形成
するが、鋼板に磁区を細分化し鉄損を低下させる線状歪
を形成する前または後のいずれか一方での絶縁皮膜生成
に用いられる。また線状歪付与の前後ともに本発明に従
った絶縁皮膜コーティング剤を適用しても同様な効果が
得られる。The insulating film coating agent having the above composition is in the form of an aqueous solution, and is applied to the steel plate and baked to form an insulating film, but before it is applied to the steel plate to form linear strain that subdivides the magnetic domains and reduces iron loss. It is used to form an insulating film on either side later. Further, similar effects can be obtained by applying the insulating film coating agent according to the present invention both before and after applying linear strain.
次に、実施例について述べる。Next, examples will be described.
(実施例1)
重量%でC: 0.083%、Si:3.23%、Mn
:0.068%、 S : 0.024%、 sol、
Al : 0.029%、残部が鉄および不可避的不
純物からなる珪素鋼スラブを公知の方法で熱延し、焼鈍
後冷延し、最終板厚0.220閣とした0次いで、脱炭
焼鈍し、焼鈍分離剤塗布の後、1200℃×20時間の
仕上焼鈍を行い、グラス皮膜を形成した。次いで余剰の
焼鈍分離剤を水洗により除去し、軽酸洗の後、第2表に
示すようにコロイド状シリカの粒子径と燐酸塩を調整し
た絶縁皮膜剤を焼付後の重量で4.5 g /s”にな
るように塗布し、850℃×30秒間N、雰囲気中で焼
付処理を行った。その後、レーザー照射により鋼板の圧
延軸直角方向に10■間隔で線状歪を与えた。その後、
公知の方法による第2表の階11に示す組成の絶縁皮膜
コーティング剤を焼付後の総重量で4.5g/m”にな
るように塗布し、次いで400℃×30秒間N!雰囲気
中で焼付処理を行った。(Example 1) C: 0.083%, Si: 3.23%, Mn in weight%
: 0.068%, S: 0.024%, sol,
A silicon steel slab consisting of Al: 0.029%, the balance being iron and unavoidable impurities was hot rolled by a known method, annealed and then cold rolled to a final thickness of 0.220%, followed by decarburization annealing. After applying an annealing separator, final annealing was performed at 1200° C. for 20 hours to form a glass film. Next, excess annealing separation agent was removed by water washing, and after light pickling, an insulating coating agent with adjusted particle size and phosphate of colloidal silica as shown in Table 2 was added to a weight of 4.5 g after baking. /s" and baked at 850°C for 30 seconds in a N atmosphere. Thereafter, linear strain was applied to the steel plate at intervals of 10 cm in the direction perpendicular to the rolling axis by laser irradiation. After that, ,
An insulating film coating agent having the composition shown in floor 11 of Table 2 was applied by a known method to a total weight of 4.5 g/m'' after baking, and then baked at 400°C for 30 seconds in a N! atmosphere. processed.
得られた鋼板からサンプルを切出し、FF値、潤滑性、
疵発生有無、耐ステイツキング性について調査した。結
果を第2表に示す。Samples were cut out from the obtained steel plate, and the FF value, lubricity,
The presence or absence of flaws and staining resistance were investigated. The results are shown in Table 2.
第2表
〔*:本発明、**:(A法)〕
(実施例2)
重量%でC: 0.083%、Si:3.23%、Mn
:0.068%、 S : 0.024%、 sol、
Al: 0.029%、残部が鉄および不可避的不純
物からなる珪素鋼スラブを公知の方法で熱延し、焼鈍後
冷延し、最終板厚0.220閣とした0次いで、脱炭焼
鈍し、焼鈍分離剤塗布の後、1200°CX20時間の
仕上焼鈍を行い、グラス皮膜を形成した0次いで余剰の
焼鈍分離剤を水洗により除去し、軽酸洗の後、公知の方
法による第3表の麹10に示す組成の絶縁皮膜コーティ
ング剤を焼付後の重量で4.0 g /ys”になるよ
うに塗布し、850℃×30秒間N!雰囲気中で焼付処
理を行った。その後、レーザー照射により鋼板の圧延軸
直角方向に10輪間隔で線状歪を与え、さらに第3表に
示すようにコロイド状シリカの粒子径と燐酸塩を調整し
た絶縁皮膜コーティング剤を焼付後の総重量で4.5g
/s”になるように塗布し、次いで400℃×30秒間
N2雰囲気中で焼付処理を行った。Table 2 [*: Present invention, **: (Method A)] (Example 2) C: 0.083%, Si: 3.23%, Mn in weight%
: 0.068%, S: 0.024%, sol,
A silicon steel slab consisting of Al: 0.029%, the balance being iron and unavoidable impurities was hot rolled by a known method, annealed and then cold rolled to a final thickness of 0.220%, followed by decarburization annealing. After applying the annealing separator, final annealing was performed at 1200° C. for 20 hours to form a glass film.Then, the excess annealing separator was removed by water washing, and after light pickling, the annealing method shown in Table 3 was performed using a known method. An insulating film coating agent having the composition shown in Koji 10 was applied so that the weight after baking was 4.0 g/ys", and baking treatment was performed at 850°C for 30 seconds in a N! atmosphere. Thereafter, laser irradiation was performed. Linear strain is applied to the steel plate at intervals of 10 wheels in the direction perpendicular to the rolling axis, and an insulating film coating agent with the particle size of colloidal silica and phosphate adjusted as shown in Table 3 is applied to the steel plate by a total weight of 4 .5g
/s'', and then baked at 400° C. for 30 seconds in an N2 atmosphere.
得られた鋼板からサンプルを切出し、FF値、潤滑性、
疵発生有無、耐ステイツキング性について調査した。結
果を第3表に示す。Samples were cut out from the obtained steel plate, and the FF value, lubricity,
The presence or absence of flaws and staining resistance were investigated. The results are shown in Table 3.
第3表
(*−本発明、**:(A法)〕
(発明の効果)
本発明によれば、鋼板のすべり性および耐熱性が良好で
、皮膜表面に疵が生じにくく耐粉塵化性に優れる、変圧
器製造における鉄心の加工性が優れる絶縁皮膜を有する
方向性電磁鋼板が得られる。Table 3 (*-Invention, **: (Method A)) (Effects of the invention) According to the invention, the steel plate has good slip properties and heat resistance, and the coating surface is less prone to scratches and has dust resistance. It is possible to obtain a grain-oriented electrical steel sheet having an insulating coating that is excellent in processability of iron cores in transformer manufacturing.
第1図は絶縁皮膜のすべり摩擦係数を測定する手段(A
法)を示す図、第2図(a)、ら)は電磁鋼板を鉄心へ
加工後、歪取焼鈍するときのスティッキング性を調査す
る方法を示す図で、(a)は歪取焼鈍時におけるスティ
ッキング性調査に際し、歪取焼純でのサンプルの積層状
態を示す図、(ハ)は歪取焼鈍終了後、層間の焼付状態
を測定するときの態様を示す図である。
第1図
(b)Figure 1 shows a means for measuring the sliding friction coefficient of an insulating film (A
Figures 2(a) and 2(a) are diagrams showing a method for investigating the sticking property during strain relief annealing after processing an electrical steel sheet into an iron core. A diagram showing the laminated state of a strain-relieving annealed sample during the sticking property investigation, and (c) a diagram showing an aspect when measuring the interlayer seizure state after the strain-relieving annealing is completed. Figure 1(b)
Claims (1)
或いは中間焼鈍を挟み2回以上の冷間圧延を行って最終
板厚とし、脱炭焼鈍し、焼鈍分離剤を塗布した後仕上焼
鈍し、該仕上焼鈍後の鋼板に絶縁皮膜コーティング剤を
塗布し焼付処理を行い、鋼板表面に微細な線状歪を間隔
をおいて付与し、その後、再度絶縁皮膜コーティング剤
を塗布し焼付け絶縁皮膜を形成する方法において、 粒径50nm以下のコロイド状シリカ100重量部(S
iO_2として)に対し、Al,Mg,Ca,Znの燐
酸塩の1種または2種以上を130〜300重量部と、
無水クロム酸,クロム酸塩,重クロム酸塩の1種または
2種以上を10〜100重量部と、Fe,Ca,Ba,
Zn,Al,Ni,Sn,Cu,Cr,Cd,Nd,M
n,Mo,Si,Ti,W,Bi,Sr,Vの酸化物、
炭化物、窒化物、硫化物、硼化物、水酸化物、珪酸塩、
炭酸塩、硼酸塩、硝酸塩または塩化物であって、その粒
子径が5〜2000nmの非コロイド状の固形物の1種
または2種以上を0.5〜25重量部とを添加してなる
絶縁皮膜コーティング剤を、前記線状歪の付与前または
後、或いは前後両方に鋼板に塗布し焼付け絶縁皮膜を形
成することを特徴とする鉄心加工性および耐粉塵化性が
優れた方向性電磁鋼板の絶縁皮膜形成方法。[Claims] A silicon steel slab is hot-rolled, annealed if necessary, cold-rolled once or twice or more with intermediate annealing in between to achieve the final thickness, decarburized annealed, and annealed and separated. After applying the agent, finish annealing is performed, and after the final annealing, an insulating film coating agent is applied to the steel plate and baking treatment is performed to impart fine linear strain to the steel plate surface at intervals, and then the insulating film coating is applied again. In the method of forming an insulating film by applying a baking agent, 100 parts by weight of colloidal silica (S
iO_2), 130 to 300 parts by weight of one or more phosphates of Al, Mg, Ca, and Zn;
10 to 100 parts by weight of one or more of chromic anhydride, chromate, dichromate, and Fe, Ca, Ba,
Zn, Al, Ni, Sn, Cu, Cr, Cd, Nd, M
oxides of n, Mo, Si, Ti, W, Bi, Sr, V,
carbides, nitrides, sulfides, borides, hydroxides, silicates,
Insulation made by adding 0.5 to 25 parts by weight of one or more types of non-colloidal solids such as carbonates, borates, nitrates, or chlorides with a particle size of 5 to 2000 nm. A grain-oriented electrical steel sheet with excellent core workability and dust resistance, characterized in that a film coating agent is applied to the steel sheet before or after applying the linear strain, or both before and after the linear strain is applied to form an insulating film by baking. Insulating film forming method.
Priority Applications (1)
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JP2290037A JP2654862B2 (en) | 1990-10-27 | 1990-10-27 | Method for forming insulation film on grain-oriented electrical steel sheet with excellent core workability and dust resistance |
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JPH04165022A true JPH04165022A (en) | 1992-06-10 |
JP2654862B2 JP2654862B2 (en) | 1997-09-17 |
Family
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JPS5225296A (en) * | 1975-08-22 | 1977-02-25 | Kawasaki Steel Corp | Forming method of highly heatproof insulating film on grain oriented s ilicon steel plate |
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