JP2000169972A - Chromium-free surface treating agent for grain oriented silicon steel sheet, and manufacture of grain oriented silicon steel sheet using same - Google Patents

Chromium-free surface treating agent for grain oriented silicon steel sheet, and manufacture of grain oriented silicon steel sheet using same

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Publication number
JP2000169972A
JP2000169972A JP10346091A JP34609198A JP2000169972A JP 2000169972 A JP2000169972 A JP 2000169972A JP 10346091 A JP10346091 A JP 10346091A JP 34609198 A JP34609198 A JP 34609198A JP 2000169972 A JP2000169972 A JP 2000169972A
Authority
JP
Japan
Prior art keywords
steel sheet
annealing
grain
oriented electrical
weight
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP10346091A
Other languages
Japanese (ja)
Inventor
Hiroyasu Fujii
浩康 藤井
Shingo Okada
慎吾 岡田
Kimihiko Sugiyama
公彦 杉山
Osamu Tanaka
收 田中
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Steel Corp
Nippon Steel Plant Designing Corp
Original Assignee
Nittetsu Plant Designing Corp
Nippon Steel Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nittetsu Plant Designing Corp, Nippon Steel Corp filed Critical Nittetsu Plant Designing Corp
Priority to JP10346091A priority Critical patent/JP2000169972A/en
Publication of JP2000169972A publication Critical patent/JP2000169972A/en
Withdrawn legal-status Critical Current

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Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C22/00Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C22/73Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals characterised by the process
    • C23C22/74Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals characterised by the process for obtaining burned-in conversion coatings
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C22/00Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C22/05Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions
    • C23C22/06Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6
    • C23C22/07Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6 containing phosphates
    • C23C22/08Orthophosphates
    • C23C22/20Orthophosphates containing aluminium cations
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C22/00Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C22/05Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions
    • C23C22/06Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6
    • C23C22/07Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6 containing phosphates
    • C23C22/08Orthophosphates
    • C23C22/22Orthophosphates containing alkaline earth metal cations

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  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Treatment Of Metals (AREA)
  • Manufacturing Of Steel Electrode Plates (AREA)

Abstract

PROBLEM TO BE SOLVED: To solve environmental problems and to improve magnetic properties by providing a composition of insulation coating agent which contains one or >=2 oxide colloidal substances in specific weight percentages based on primary phosphates of Al, Mg, and Ca and colloidal silica in respectively specified weight percentages expressed in terms of solids and is free from chromium compounds. SOLUTION: One or more oxide colloidal substances are contained in an amount of 0.3-15 pts.wt. based on 100 pts.wt. primary phosphates of Al, Mg, and Ca and 35-100 pts.wt. colloidal silica. It is preferable that, in this surface treating agent for silicon steel sheet, one or >=2 kinds among the compounds composed of any of Mg, Ca, Ba, Sr, Zr, Fe, Mn, Co, Ni, Cu, Zn, Al, Si, and B are used as the oxide colloidal substances and also the oxide colloidal substances of 0.1-5 μm particle size are used and chromium compounds are not contained. By adding the oxide colloidal substances, the corrosion resistance of film after baking and the seizure resistance at stress relief annealing can be improved.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は方向性電磁鋼板用の
絶縁皮膜形成技術に関わり、特に、クロムを含有しない
処理液を提供すると共にそれを用いて耐蝕性、耐焼鈍
性、被膜張力、絶縁性、密着性及び鉄心加工性等の優れ
た方向性電磁鋼板の絶縁皮膜形成方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a technique for forming an insulating film for grain-oriented electrical steel sheets, and more particularly to a processing solution containing no chromium and using the same to use it for corrosion resistance, annealing resistance, film tension, insulation. The present invention relates to a method for forming an insulating film on a grain-oriented electrical steel sheet having excellent properties, adhesion, core workability, and the like.

【0002】[0002]

【従来の技術】方向性電磁鋼板は、Siを例えば2〜4
%含有する珪素鋼スラブを熱延し、焼鈍した後、1回或
いは中間焼鈍を挟む2回以上の冷延を施して最終板厚と
し、次いで脱炭焼鈍した後MgOを主成分とする焼鈍分
離剤を塗布し、仕上げ焼鈍を行ってゴス方位を持つ二次
再結晶を発達させ、さらにS、N等の不純物を除去する
と共にグラス被膜を形成し、次いで絶縁皮膜剤を塗布
し、焼き付けとヒートフラットニング処理を施して最終
製品とされる。このようにして得られる方向性電磁鋼板
は主として電気機器、トランス等の鉄心材料として使用
され、磁束密度が高く、鉄損が優れるものが要求され
る。
2. Description of the Related Art Grain-oriented electrical steel sheets are made of, for example, Si
% Silicon steel slab is hot-rolled and annealed, and then cold-rolled once or twice or more with intermediate annealing to a final thickness, then decarburized and then annealed mainly with MgO Applying an agent, finish annealing to develop secondary recrystallization with Goss orientation, further removing impurities such as S and N, forming a glass film, then applying an insulating film agent, baking and heating The product is flattened and finished. The grain-oriented electrical steel sheet obtained in this way is mainly used as an iron core material for electrical equipment, transformers and the like, and is required to have a high magnetic flux density and an excellent iron loss.

【0003】方向性電磁鋼板がトランス鉄心として用い
られる際には方向性電磁鋼板コイルはスリットされて所
定の幅にされた後、所定長さに切断され積み重ねられて
積み鉄心とされ、或いは巻き加工されて巻き鉄心とされ
る。巻き鉄心の場合にはさらに圧縮成型、歪み取り焼鈍
を経てレーシングと呼ばれる巻き線作業を行ってトラン
スとされる。
When a grain-oriented magnetic steel sheet is used as a transformer core, the grain-oriented magnetic steel sheet coil is slit into a predetermined width, and then cut into a predetermined length and stacked to form a piled iron core or wound. It is made into a wound iron core. In the case of a wound iron core, it is further transformed into a transformer by performing winding work called racing through compression molding and strain relief annealing.

【0004】このトランス製造工程においては切断、巻
き加工、成形作業が容易に行えることが重要である。特
に巻きコア製造においては、切断や巻き成型時に絶縁皮
膜の密着性が優れて発粉等の作業環境を損なわないこと
や、巻き加工性、耐焼鈍性が優れて被膜性能、磁気特性
及び作業性を損なわないことが重要である。方向性電磁
鋼板の表面皮膜は、通常、最終仕上げ焼鈍中に形成され
た通常グラス皮膜と呼ばれるフォルステライト皮膜とそ
の上に処理される絶縁皮膜とからなる。この絶縁皮膜の
形成技術としては、特公昭53−28375号公報に本
発明者らによってコロイダルシリカと燐酸塩及びクロム
化合物からなる張力皮膜の発明が、開示され、工業化さ
れた。また特開昭61−41778号公報に、第一燐酸
塩に粒子径8nm以下の微粒子コロイダルシリカとクロ
ム化合物からなる、張力付与性及びスベリ性の優れた処
理剤が開示された。
In the transformer manufacturing process, it is important that cutting, winding, and forming operations can be easily performed. Especially in the production of wound cores, the insulation film has excellent adhesion during cutting and winding molding and does not impair the working environment such as dusting, and also has excellent winding workability and annealing resistance, and has excellent coating performance, magnetic properties and workability. It is important not to impair. The surface film of a grain-oriented electrical steel sheet usually consists of a forsterite film usually called a glass film formed during the final annealing and an insulating film to be treated thereon. As a technique for forming the insulating film, the inventors of the present invention have disclosed in Patent Publication No. 53-28375 the invention of a tension film comprising colloidal silica, a phosphate and a chromium compound, and have been industrialized. Japanese Unexamined Patent Publication (Kokai) No. 61-41778 discloses a treating agent having excellent tension imparting property and sliding property, comprising a first phosphate comprising fine colloidal silica having a particle diameter of 8 nm or less and a chromium compound.

【0005】また特開平3−39484号公報では、A
l,Mg,Ca,Znの第一燐酸塩とクロム化合物に対
し粒径20nm以下のコロイダルシリカと粒径80〜2
000nmのコロイダルシリカを混合することにより、
絶縁皮膜表面に均一な突起効果を得て、巻き鉄心加工工
程における巻き加工性(滑り性)、耐焼鈍性、皮膜張力
の向上を実現する技術が示されている。
In Japanese Patent Application Laid-Open No. 3-39484, A
Colloidal silica having a particle size of 20 nm or less and a particle size of 80 to 2 with respect to the primary phosphate and the chromium compound of l, Mg, Ca, Zn.
By mixing 000 nm colloidal silica,
There is disclosed a technique for obtaining a uniform projection effect on the surface of an insulating film to improve winding workability (slipperiness), annealing resistance, and film tension in a winding core processing step.

【0006】更に、耐熱性、滑り性向上技術として、特
開平4−165082号公報には、粒径50nm以下の
コロイダルシリカをSiO2として100重量部に対
し、Al,Mg,Ca,Znの燐酸塩の1種または2種
以上130〜250重量部と、無水クロム酸、クロム酸
塩、重クロム酸塩の1種または2種以上を10〜40重
量部と、Fe,Co,Ba,Zn,Al,Ni,Sn,
Cu,Cr,Cd,Nb,Mn,Mo,Si,Ti,
W,Bi,Srの酸化物、炭化物、窒化物、硫化物、珪
酸塩、炭酸塩、ほう酸塩、硫酸塩、硝酸塩または塩化物
でかつその粒子径が0.5〜2000nmの非コロイド
状固形分の1種または2種以上を0.5〜25重量部と
を配合する処理剤を用いて絶縁皮膜を形成する方法が提
案されている。
Further, as a technique for improving heat resistance and slipperiness, Japanese Patent Application Laid-Open No. 4-165082 discloses a phosphate of Al, Mg, Ca, Zn per 100 parts by weight of colloidal silica having a particle size of 50 nm or less as SiO2. 130 to 250 parts by weight of one or more of the following, 10 to 40 parts by weight of one or more of chromic anhydride, chromate, and dichromate, and Fe, Co, Ba, Zn, Al , Ni, Sn,
Cu, Cr, Cd, Nb, Mn, Mo, Si, Ti,
Non-colloidal solids of oxides, carbides, nitrides, sulfides, silicates, carbonates, borates, sulfates, nitrates or chlorides of W, Bi, Sr and having a particle size of 0.5 to 2000 nm There has been proposed a method of forming an insulating film by using a treating agent containing 0.5 to 25 parts by weight of one or more of the above.

【0007】これらの技術により張力効果と鉄心加工性
向上効果が得られ、磁気特性や磁歪特性が優れる方向性
電磁鋼板が得られるようになった。
[0007] By these techniques, a tensile effect and an improvement in workability of the iron core can be obtained, and a grain-oriented electrical steel sheet having excellent magnetic properties and magnetostrictive properties has been obtained.

【0008】[0008]

【発明が解決しようとする課題】これらの絶縁皮膜は、
燐酸塩による被膜焼き付け処理後における吸湿性や歪み
取り焼鈍時の被膜焼き付き性を抑制すること等を考慮し
て、何れもクロム化合物が添加配合されてきた。しか
し、処理液に無水クロム酸、クロム酸塩或いは重クロム
酸塩を用い6価クロムを含有する場合、塗布作業時の作
業環境や廃液処理作業の問題がある。更に、焼き付け処
理後の被膜においてはCrは3価クロムに還元されてお
り有害性は少ないもの、鉄心加工工程において発粉が生
じる場合には作業環境を汚染する恐れもある。
SUMMARY OF THE INVENTION These insulating films are:
A chromium compound has been added and blended in consideration of, for example, the hygroscopicity after the film baking treatment with phosphate and the film seizure during strain relief annealing. However, in the case where the treatment liquid contains hexavalent chromium using chromic anhydride, chromate or dichromate, there is a problem of a working environment at the time of coating operation and a waste liquid treatment operation. Further, Cr is reduced to trivalent chromium in the coating after baking, and is less harmful. However, if dusting occurs in the iron core processing step, there is a possibility that the working environment may be contaminated.

【0009】この対策としてクロム化合物を含有しない
絶縁皮膜剤の研究もなされてきた。特公昭57−963
1号公報にはコロイド状シリカをSiO2 で20重量
部、燐酸Al10〜120重量部、ほう酸2〜10重量
部とMg,Al,Fe,Co,Ni,Znの硫酸塩のう
ちから選ばれる何れか1種または2種合計で4〜40重
量部とを含有する処理液を300℃以上で焼き付け処理
する絶縁皮膜形成法が提案されている。また特開平7−
180064号公報には、M2+1−xM3+x(OH)2
+x−nyAn−y・mH2 Oの一般式で表される平均
粒子径1μm以下の固溶型複合水酸化物組成である処理
剤が開示されている。
[0009] As a countermeasure, studies have been made on an insulating film agent containing no chromium compound. Japanese Patent Publication No. 57-963
No. 1 discloses that colloidal silica is selected from 20 parts by weight of SiO 2 , 10 to 120 parts by weight of Al phosphate, 2 to 10 parts by weight of boric acid, and sulfates of Mg, Al, Fe, Co, Ni and Zn. There has been proposed an insulating film forming method in which a treatment liquid containing 4 to 40 parts by weight of one or two kinds in total is baked at 300 ° C. or more. Also, Japanese Patent Application Laid-Open
No. 180064 discloses M 2+ 1-xM 3+ x (OH) 2
Disclosed is a treating agent having a solid solution composite hydroxide composition having an average particle diameter of 1 μm or less represented by a general formula of + x-nyAn-y · mH 2 O.

【0010】これらは何れも被膜張力効果を発揮できる
技術であり、それなりに効果を発揮している。しかしな
がら、従来のクロム含有絶縁皮膜剤に比較すると総合的
には十分に被膜性能が改善されているものとは言い難
く、更なる改善が望まれていた。本発明は、クロム化合
物を含有しない絶縁皮膜剤組成を有することで環境問題
を解決すると共に、磁気特性、磁歪特性を改善すること
ができ、従来の燐酸塩−コロイダルシリカ系被膜におけ
るクロム化合物を含有しない場合の耐吸湿性、耐焼鈍性
不良問題を解決する被膜性能の優れた方向性電磁鋼板用
絶縁皮膜剤とそれを用いた方向性電磁鋼板の製造方法を
提供する。
[0010] These are all technologies capable of exhibiting the effect of film tension, and exhibit their effects as such. However, compared with the conventional chromium-containing insulating film agent, it cannot be said that the film performance is generally sufficiently improved, and further improvement has been desired. The present invention solves environmental problems by having an insulating coating agent composition not containing a chromium compound, and can improve magnetic properties and magnetostriction properties, and contains a chromium compound in a conventional phosphate-colloidal silica-based coating. Provided are an insulating coating agent for a grain-oriented electrical steel sheet having excellent coating performance that solves the problems of poor moisture absorption resistance and annealing resistance when not performed, and a method for manufacturing a grain-oriented electrical steel sheet using the same.

【0011】[0011]

【課題を解決するための手段】本発明はクロム化合物を
含有しない絶縁皮膜剤組成と絶縁皮膜処理方法として以
下の構成を要旨とする。 (1)固形分換算でAl,Mg,Caの第一燐酸塩10
0重量部とコロイダルシリカ35〜100重量部に対
し、酸化物コロイド状物質の1種または2種以上を0.
3〜15重量部含有することを特徴とするクロム化合物
を含まない方向性電磁鋼板用表面処理剤。 (2)酸化物コロイド状物質として、Mg,Ca,B
a,Sr,Zr,Fe,Mn,Co,Ni,Cu,Z
n,Al,Si,Bのいずれかの元素から成る化合物の
1種または2種以上を用いることを特徴とする(1)記
載のクロム化合物を含まない方向性電磁鋼板用表面処理
剤。 (3)粒子径が0.1〜5μmの酸化物コロイド状物質
を用いることを特徴とする(1)〜(2)のいずれかの
項に記載のクロム化合物を含まない方向性電磁鋼板用表
面処理剤。 (4)珪素鋼スラブを熱延し、焼鈍後1回、または中間
焼鈍を挟む2回以上の冷延して最終板厚とし、脱炭焼鈍
し、焼鈍分離剤を塗布した後最終仕上げ焼鈍し、次いで
絶縁皮膜剤を塗布し焼き付け処理とヒートフラットニン
グを施す方向性電磁鋼板の製造方法において、絶縁皮膜
剤として(1)〜(3)のいずれかの項に記載の表面処
理剤を塗布し、次いで350℃以上の温度で焼き付け処
理を行うことを特徴とする方向性電磁鋼板の製造方法。
SUMMARY OF THE INVENTION The present invention has the following constitution as an insulating coating agent composition containing no chromium compound and an insulating coating treatment method. (1) Primary phosphate of Al, Mg, Ca in terms of solid content 10
With respect to 0 parts by weight and 35 to 100 parts by weight of colloidal silica, one or more kinds of oxide colloidal substances are added in an amount of 0.1 to 0.2 parts by weight.
A surface treatment agent for grain-oriented electrical steel sheets containing no chromium compound, comprising 3 to 15 parts by weight. (2) Mg, Ca, B as an oxide colloidal substance
a, Sr, Zr, Fe, Mn, Co, Ni, Cu, Z
The surface treating agent for grain-oriented electrical steel sheets containing no chromium compound according to (1), wherein one or more of compounds comprising any one of n, Al, Si and B are used. (3) A surface for a grain-oriented electrical steel sheet containing no chromium compound according to any one of (1) and (2), wherein an oxide colloidal substance having a particle size of 0.1 to 5 μm is used. Processing agent. (4) The silicon steel slab is hot-rolled, cold-rolled once after annealing, or twice or more with intermediate annealing in between to obtain the final thickness, decarburized annealing, coated with an annealing separator, and then subjected to final finishing annealing. Then, in a method for producing a grain-oriented electrical steel sheet which is applied with an insulating film agent and subjected to baking treatment and heat flattening, the surface treating agent according to any one of (1) to (3) is applied as the insulating film agent. And baking at 350 ° C. or higher.

【0012】[0012]

【発明の実施の形態】本発明者等は燐酸塩、コロイダル
シリカ及びクロム化合物を主成分とする従来の張力付与
型絶縁皮膜における無クロム組成化に取り組んだ。即
ち、従来組成で無クロム化を行った燐酸塩とコロイダル
シリカのみの組成の場合の欠点であった被膜焼き付け処
理後の吸湿性(ベタツキや錆発生)と歪み取り焼鈍にお
ける焼き付き性を改善するための被膜組成の開発に取り
組んだ。その結果、燐酸塩とコロイダルシリカを主成分
とする張力付与型被膜成分において、コロイド状酸化物
の1種または2種以上を添加することにより、従来の無
クロム化における問題を解決し、耐蝕性、耐焼鈍性、密
着性、滑り性、絶縁性等が優れ、磁気特性と磁歪特性が
優れる絶縁皮膜剤とその処理方法の完成に成功した。以
下、詳細に説明する。
BEST MODE FOR CARRYING OUT THE INVENTION The present inventors have worked on a chromium-free composition in a conventional tension-imparting insulating film mainly containing a phosphate, colloidal silica and a chromium compound. That is, in order to improve the hygroscopicity (stickiness and rust generation) after the film baking treatment and the seizure in the strain relief annealing, which were disadvantages in the case of the composition of only the phosphate and colloidal silica which had been made chromium-free in the conventional composition. We worked on the development of the coating composition. As a result, by adding one or more colloidal oxides to the tension-imparting coating component mainly composed of phosphate and colloidal silica, the conventional problem of chromium-free can be solved and corrosion resistance can be improved. An insulating coating agent having excellent annealing resistance, adhesiveness, slipperiness, insulating properties, etc., and excellent magnetic properties and magnetostriction properties, and a processing method thereof have been successfully completed. The details will be described below.

【0013】本発明による表面処理剤の適用に当たって
は、出発材としては最終仕上げ焼鈍された方向性電磁鋼
板を用い、連続処理焼き付けラインにおいて余剰焼鈍分
離剤を除去し、軽酸洗の後本発明液を鋼板表面に塗布し
焼き付け処理が行われる。本発明においては、まず、そ
の被膜組成に特徴がある。即ち、固形分重量でAl,M
g,Caの第一燐酸塩100重量部とコロイダルシリカ
35〜100重量部からなるベース液に対しコロイド状
酸化物の1種または2種以上が0.3〜15重量部添加
される。この重要な役割を有する酸化物コロイド状物質
としては、Mg,Ca,Ba,Sr,Zr,Fe,M
n,Co,Ni,Cu,Zn,Al,Si,Bのいずれ
かの元素から成る1種または2種以上が添加される。
In applying the surface treating agent according to the present invention, a finish-annealed grain-oriented electrical steel sheet is used as a starting material, an excess annealing separating agent is removed in a continuous treatment baking line, and after light pickling, the present invention is applied. The liquid is applied to the surface of the steel sheet and a baking process is performed. The present invention is first characterized by its coating composition. That is, in terms of solid content, Al, M
One or more colloidal oxides are added in an amount of 0.3 to 15 parts by weight to a base solution composed of 100 parts by weight of a primary phosphate of g and Ca and 35 to 100 parts by weight of colloidal silica. Oxide colloidal materials having this important role include Mg, Ca, Ba, Sr, Zr, Fe, M
One or two or more of any of n, Co, Ni, Cu, Zn, Al, Si and B are added.

【0014】本発明で焼き付け処理後の吸湿性や歪み取
り焼鈍時の鋼板の焼き付き性が阻止できる理由は明確で
はないが次のように推定される。溶液中に均一分散して
いる酸化物コロイド状物質の微粒子が、被膜焼き付け時
や歪み取り焼鈍時に第一燐酸塩より発生するフリー燐酸
と反応して、より安定な燐酸化合物を生成する。即ち、
従来のクロム化合物を配合した場合にはCrがフリー燐
酸と反応してCrPO 4 のような非常に安定な化合物を
生成する作用が有るように、酸化物を構成する金属元素
が焼き付けや歪み取り焼鈍時の高温域で燐酸分と反応し
て安定化し、フリー燐酸分の存在を最小限にする。その
結果、燐酸塩の分解や燐酸分による融着性を抑制して、
耐吸湿性や耐焼鈍性を向上すると考えられる。この場
合、通常の酸化物粉体ではこの様な反応は生じ難いのに
対し、コロイド状物質では極めて顕著な反応性を示し、
フリー燐酸の安定化に寄与する。
According to the present invention, moisture absorption and distortion removal after the baking treatment are performed.
The reason why the seizure of steel sheet during annealing can be prevented is clear.
Is not estimated, but is estimated as follows. Disperse evenly in the solution
Fine particles of the oxide colloidal material are
Phosphoric acid generated from primary phosphate during annealing and strain relief annealing
To produce a more stable phosphate compound. That is,
When conventional chromium compounds are blended, Cr becomes free phosphorus.
CrPO by reacting with acid FourA very stable compound like
Metal elements that make up the oxide so that it has an action to generate
Reacts with phosphoric acid at high temperatures during baking and strain relief annealing.
And minimize the presence of free phosphoric acid. That
As a result, suppressing the decomposition of phosphate and the fusibility due to phosphoric acid content,
It is considered to improve moisture absorption resistance and annealing resistance. This place
In general, such reactions are unlikely to occur with ordinary oxide powder.
On the other hand, colloidal materials show extremely significant reactivity,
It contributes to stabilization of free phosphoric acid.

【0015】また酸化物コロイド状物質により形成され
る絶縁皮膜表面の微細な突起によって接触面積をコント
ロールすることで、焼き付き性の改善効果をももたらす
ものと考えられる。次に、本発明の限定理由について述
べる。本発明の絶縁皮膜においては、まず、Al,M
g,Caの第一燐酸塩とコロイダルシリカのベース液の
割合が重要である。固形分重量で第一燐酸塩100重量
部に対しコロイダルシリカは35〜100重量部でなけ
ればならない。35重量部未満では被膜表面が白濁して
透明感と光沢のある被膜が得られず、被膜による張力効
果が失われ、良好な磁性と磁歪の改善効果が得られな
い。一方、100重量部超になると耐吸湿性や耐焼鈍性
は向上するものの、被膜の張力効果が失われるため好ま
しくない。
It is considered that by controlling the contact area by fine projections on the surface of the insulating film formed by the colloidal oxide material, an effect of improving the image sticking property can be obtained. Next, the reasons for limitation of the present invention will be described. In the insulating film of the present invention, first, Al, M
The ratio of the primary phosphate of g and Ca to the base liquid of colloidal silica is important. Colloidal silica should be 35 to 100 parts by weight based on 100 parts by weight of the first phosphate in terms of solid content. If the amount is less than 35 parts by weight, the surface of the film becomes cloudy and a transparent and glossy film cannot be obtained, the tension effect by the film is lost, and good magnetism and magnetostriction improvement effects cannot be obtained. On the other hand, if it exceeds 100 parts by weight, the moisture absorption resistance and the annealing resistance are improved, but the tension effect of the coating film is lost, which is not preferable.

【0016】本発明のもっとも特徴となる添加剤である
酸化物コロイド状物質としては、Mg,Ca,Ba,S
r,Zr,Fe,Mn,Co,Ni,Cu,Zn,A
l,Si,Bのいずれかの元素から成る1種または2種
以上が添加される。これらの酸化物コロイド状物質の添
加量は第一燐酸塩100重量部とコロイダルシリカ35
〜100重量部のベース液に対し、0.3〜15重量部
が配合される。0.3重量部未満では被膜中のフリーの
PO4 と金属元素との反応によるPの安定化や粒子の表
面形状効果による燒鈍時の焼き付き抑制効果が得られ
ず、耐吸湿性や耐焼鈍性向上効果が十分に得られなくな
るため制限される。一方、15重量部超では、過剰のコ
ロイド粒子による皮膜張力の低下や外観の劣化、さらに
粒子が大きい場合は過大な表面凹凸が生じて占積率が低
下するため制限される。添加量が0.3〜15重量部の
範囲であれば外観、耐蝕性、耐焼鈍性が優れ、絶縁性、
密着性及び鉄心加工性の優れた絶縁皮膜が得られる。
The colloidal oxide material which is the most characteristic additive of the present invention includes Mg, Ca, Ba, S
r, Zr, Fe, Mn, Co, Ni, Cu, Zn, A
One or two or more of the elements 1, 1, and B are added. The addition amount of these oxide colloidal substances is 100 parts by weight of primary phosphate and colloidal silica 35.
0.3 to 15 parts by weight is blended with respect to 100 parts by weight of the base liquid. If the amount is less than 0.3 part by weight, the stabilization of P due to the reaction between free PO 4 in the coating and the metal element and the effect of suppressing seizure during annealing due to the effect of the surface shape of the particles cannot be obtained, and the moisture absorption resistance and the annealing resistance are not obtained. This is limited because the effect of improving the property cannot be sufficiently obtained. On the other hand, if the amount exceeds 15 parts by weight, the film tension is reduced and the appearance is deteriorated due to excessive colloidal particles. If the added amount is in the range of 0.3 to 15 parts by weight, the appearance, corrosion resistance, and annealing resistance are excellent,
An insulating film with excellent adhesion and core workability can be obtained.

【0017】また、コロイド状物質の粒子径としては
0.1〜5.0μmが望ましい。粒子径は細かい方がフ
リー燐酸との反応性は良好となるが、同時に凝集性も増
加して分散性の優れるコロイドが得られなくなるため制
限される。粒子径が0.1μm以上なら良好なコロイド
となるが、好ましくは0.5μm以上である。一方、粒
子径が5μm以上ではフリー燐酸との反応性が低くな
り、また表面の凹凸が大きすぎて占積率の低下をもたら
すため制限される。
The particle diameter of the colloidal substance is preferably 0.1 to 5.0 μm. The smaller the particle size, the better the reactivity with free phosphoric acid, but at the same time, the cohesiveness is increased, so that a colloid having excellent dispersibility cannot be obtained. If the particle diameter is 0.1 μm or more, a good colloid is obtained, but it is preferably 0.5 μm or more. On the other hand, when the particle diameter is 5 μm or more, the reactivity with free phosphoric acid is reduced, and the surface unevenness is too large to cause a decrease in the space factor, which is limited.

【0018】なお添加量及び粒子径は製品の板厚や使用
目的によって適宜調整される。特に板厚が薄い材料の場
合は、絶縁皮膜の厚みや表面粗さの占積率への影響が相
対的に大きいので、添加量及び粒子径は小さい方が望ま
しい。また、コロイド状酸化物の添加に際しては、凝集
化を抑えるためにベース液を攪拌しながらコロイド状酸
化物を徐々に添加するか、予めミキサー、コロイドミ
ル、超音波攪拌装置等で十分に分散させた後、徐々に添
加配合することで、ベース液に均一に分散させるのが好
ましい。特に粒子径1μm以上の粒子を用いる場合は、
通常のコロイドと比べ溶液中での安定性が低下するた
め、添加後においても溶液の保存や塗布作業に際して攪
拌もしくは分散化を十分に行い、凝集性や沈降性を抑え
ながら使用する必要がある。
The addition amount and the particle size are appropriately adjusted depending on the thickness of the product and the purpose of use. In particular, in the case of a material having a small thickness, the effect of the thickness and the surface roughness of the insulating film on the space factor is relatively large. In addition, when adding the colloidal oxide, gradually add the colloidal oxide while stirring the base solution in order to suppress agglomeration, or sufficiently disperse it in advance using a mixer, colloid mill, ultrasonic stirring device or the like. After that, it is preferable to uniformly disperse in the base liquid by gradually adding and blending. In particular, when using particles having a particle size of 1 μm or more,
Since the stability in a solution is lower than that of a normal colloid, it is necessary to sufficiently stir or disperse the solution even after the addition when storing or applying the solution, and to use the solution while suppressing coagulation and sedimentation.

【0019】上記のように調整された処理剤は、連続ラ
インでコーテイングロール等を用いて塗布量を制御しな
がら塗布される。塗布量は適用される鋼板厚みや製品の
使用目的により決められる。本発明の被膜剤の場合には
2〜7g/m2 であれば被膜性能、外観は勿論のこと磁
気特性、磁歪特性の優れた方向性電磁鋼板が得られる。
The treatment agent adjusted as described above is applied in a continuous line while controlling the application amount using a coating roll or the like. The amount of application is determined by the thickness of the steel sheet to be applied and the purpose of use of the product. In the case of the coating agent of the present invention, if it is 2 to 7 g / m 2 , a grain-oriented electrical steel sheet excellent in magnetic properties and magnetostriction properties as well as coating properties and appearance can be obtained.

【0020】処理剤を塗布された鋼板は、引き続き35
0℃以上で焼き付け処理が行われる。焼き付け温度が3
50℃未満では、第一燐酸塩、コロイダルシリカ及び有
機酸塩間の反応が十分に行われず、吸湿性が残る。製品
にレーザー等の磁区細分化処理を行い磁気特性の改善効
果を得る場合には350〜450℃の温度域が好まし
い。しかし、通常の方向性電磁鋼板のように焼き付け処
理時に熱膨張差を利用して十分な張力効果と耐蝕性、耐
焼鈍性を得るためには、750℃〜900℃での焼き付
け処理が必要である。
The steel sheet coated with the treating agent continues to be 35
The baking process is performed at 0 ° C. or higher. Baking temperature is 3
If the temperature is lower than 50 ° C., the reaction between the first phosphate, colloidal silica and the organic acid salt is not sufficiently performed, and the hygroscopicity remains. In the case where a magnetic domain refinement treatment such as a laser is performed on a product to obtain an effect of improving magnetic properties, a temperature range of 350 to 450 ° C. is preferable. However, in order to obtain a sufficient tensile effect, corrosion resistance, and annealing resistance by utilizing a difference in thermal expansion during a baking process as in a normal grain-oriented electrical steel sheet, a baking process at 750 ° C. to 900 ° C. is necessary. is there.

【0021】なお本発明剤の適用に際しては、仕上げ焼
鈍でグラス被膜を形成した材料の他、焼鈍分離剤にグラ
ス被膜形成阻止剤を用いてグラス形成を阻止したり、酸
洗によりグラス被膜を除去した、いわゆるグラスレス材
に適用してもよい。
In applying the agent of the present invention, in addition to the material having a glass film formed by finish annealing, glass formation is prevented by using a glass film formation inhibitor as an annealing separating agent, or the glass film is removed by pickling. It may be applied to so-called glassless materials.

【0022】[0022]

【実施例】〈実施例1〉最終仕上げ焼鈍を行った鋼板表
面にグラス被膜を有する板厚0.23mmの高磁束密度
方向性電磁鋼板コイルからサンプルを切り出し、水洗後
850℃×4Hrの歪み取り焼鈍を行い、その後2%−
2 SO4 水溶液中で85℃で15秒間の軽酸洗を行っ
た。このサンプルに、表1に示すように酸化物コロイド
状物質の種類と量を変更した溶液を添加した処理剤を、
乾燥、焼き付け後の重量で5g/m2 になるよう、コー
テイングロールを用いて塗布した後、850℃×30秒
間の焼き付け処理を行った。この後、この製品板からサ
ンプルを切り出し被膜特性の調査を行った。結果を表2
に示す。
<Example 1> A sample was cut out from a high magnetic flux density directional magnetic steel sheet coil having a thickness of 0.23 mm having a glass coating on the surface of a steel sheet subjected to final finish annealing, washed with water, and then strained at 850 ° C x 4 hr. Anneal, then 2%-
Light acid washing was performed at 85 ° C. for 15 seconds in an H 2 SO 4 aqueous solution. A treating agent obtained by adding a solution in which the type and amount of the oxide colloidal substance were changed as shown in Table 1 was added to this sample,
After applying using a coating roll so that the weight after drying and baking would be 5 g / m 2 , baking treatment was performed at 850 ° C. for 30 seconds. Thereafter, a sample was cut out from the product plate and the film properties were investigated. Table 2 shows the results
Shown in

【0023】[0023]

【表1】 [Table 1]

【0024】[0024]

【表2】 この試験の結果、本発明の酸化物コロイド状物質を添加
した場合には、耐蝕性と耐燒鈍性の優れた改善効果が得
られ、Cr化合物を添加した比較例2に比し遜色ない結
果であった。また、潤滑性はCr化合物を添加したもの
やコロイド状物質を添加しない比較例よりも優れる結果
となった。また、皮膜張力、磁気特性においても本発明
のものはいずれもCr化合物添加の従来技術によるもの
と同等以上の結果が得られた。 〈実施例2〉実施例1と同様に最終仕上げ焼鈍を行った
板厚0.23mmの高磁束密度方向性電磁鋼板コイルか
らサンプルを切り出し、水洗後850℃×4Hrの歪み
取り焼鈍を行い、その後2%−H2 SO4 水溶液中で7
5℃で15秒間の軽酸洗を行った。このサンプルに、表
3に示すように酸化物コロイド状物質の種類、粒子径及
び添加量を変更した処理剤を、乾燥、焼き付け後の重量
で4.5g/m2 になるよう、コーテイングロールを用
いて塗布した後、850℃×30秒間の焼き付け処理を
行った。この後、この製品板からサンプルを切り出し被
膜特性の調査を行った。結果を表4に示す。
[Table 2] As a result of this test, when the oxide colloidal substance of the present invention was added, an excellent improvement effect of corrosion resistance and annealing resistance was obtained, and the result was comparable to Comparative Example 2 in which a Cr compound was added. Met. In addition, the lubricating property was superior to those to which the Cr compound was added and the comparative examples to which no colloidal substance was added. Further, in the film tension and the magnetic characteristics of the present invention, the same results as those obtained by the prior art with the addition of the Cr compound were obtained. <Example 2> A sample was cut out from a high magnetic flux density oriented magnetic steel sheet coil having a thickness of 0.23 mm which had been subjected to final finish annealing in the same manner as in Example 1, washed with water, and then subjected to a strain relief annealing at 850 ° C x 4 hr, and thereafter 7 in 2% -H 2 SO 4 aqueous solution
Light pickling was performed at 5 ° C. for 15 seconds. To this sample, a coating roll was prepared by changing the type, particle size and amount of the colloidal oxide as shown in Table 3 so that the weight after drying and baking was 4.5 g / m 2. After the application, a baking treatment was performed at 850 ° C. for 30 seconds. Thereafter, a sample was cut out from the product plate and the film properties were investigated. Table 4 shows the results.

【0025】[0025]

【表3】 [Table 3]

【0026】[0026]

【表4】 この試験の結果、実施例1と同様に本発明の酸化物コロ
イド状物質を添加した場合には何れも耐蝕性、耐燒鈍性
が優れ、磁気特性も良好で、Cr化合物を添加した比較
例3と遜色のない結果であった。一方、比較例1のコロ
イド物質が多すぎる例では耐燒鈍性は優れるものの占積
率、磁気特性の面で極めて劣る結果となった。また酸化
物コロイドを添加しない比較例2では、耐蝕性、耐燒鈍
性が本発明に比しかなり劣る結果であった。
[Table 4] As a result of this test, when the oxide colloidal substance of the present invention was added in the same manner as in Example 1, the corrosion resistance and the annealing resistance were all excellent, and the magnetic properties were good. The result was comparable to 3. On the other hand, in the case of Comparative Example 1 in which the amount of the colloidal substance was too large, although the annealing resistance was excellent, the space factor and the magnetic properties were extremely poor. In Comparative Example 2 in which no oxide colloid was added, the corrosion resistance and the annealing resistance were considerably inferior to those of the present invention.

【0027】[0027]

【発明の効果】本発明によれば、燐酸塩−コロイダルシ
リカをベースとし、クロム化合物を含有しない方向性電
磁鋼板の張力被膜において、酸化物コロイド状物質を添
加することにより、焼きつけ後被膜の耐蝕性が向上し、
歪み取り焼鈍時における耐焼き付き性の顕著な改善効果
が得られる。
According to the present invention, in a tensile coating of a grain-oriented electrical steel sheet based on phosphate-colloidal silica and containing no chromium compound, by adding an oxide colloidal substance, the corrosion resistance of the coating after baking is improved. Performance is improved,
A remarkable improvement in seizure resistance during strain relief annealing can be obtained.

【図面の簡単な説明】[Brief description of the drawings]

【図1】歪み取り焼鈍における皮膜の焼き付き性を評価
する方法であり、(a)は圧着状態を、(b)は剥離力
を測定する方法を示す図である。
BRIEF DESCRIPTION OF DRAWINGS FIG. 1 is a method for evaluating the seizure property of a film in strain relief annealing, in which (a) shows a pressure-bonded state and (b) shows a method for measuring a peeling force.

【図2】皮膜潤滑性を評価する装置の概要を示す図であ
る。
FIG. 2 is a diagram showing an outline of an apparatus for evaluating film lubricity.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 岡田 慎吾 福岡県北九州市戸畑区飛幡町1−1 新日 本製鐵株式会社八幡製鐵所内 (72)発明者 杉山 公彦 福岡県北九州市戸畑区飛幡町1−1 新日 本製鐵株式会社八幡製鐵所内 (72)発明者 田中 收 福岡県北九州市戸畑区大字中原46番地の59 日鐵プラント設計株式会社内 Fターム(参考) 4K026 AA03 AA22 BA03 BB04 BB05 BB10 CA16 CA18 CA23 CA24 CA41 DA15 EA07 EA17 EB11 4K033 AA02 HA03 JA01 JA04 LA01 TA01 TA03 UA04  ──────────────────────────────────────────────────続 き Continuing on the front page (72) Shingo Okada, Inventor 1-1, Tobata-cho, Tobata-ku, Kitakyushu, Fukuoka Prefecture Inside Nippon Steel Corporation Yawata Works (72) Inventor, Kimihiko Sugiyama Tobata-ku, Kitakyushu-shi, Fukuoka 1-1 Nippon Steel Corporation Yawata Works (72) Inventor Haru Tanaka F-term 4K026 AA03 AA22 BA03 at 59 Nippon Plant Design Co., Ltd., 46 Ohara Nakahara, Tobata-ku, Kitakyushu-shi, Fukuoka BB04 BB05 BB10 CA16 CA18 CA23 CA24 CA41 DA15 EA07 EA17 EB11 4K033 AA02 HA03 JA01 JA04 LA01 TA01 TA03 UA04

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 固形分換算でAl,Mg,Caの第一燐
酸塩100重量部とコロイダルシリカ35〜100重量
部に対し、酸化物コロイド状物質の1種または2種以上
を0.3〜15重量部含有することを特徴とするクロム
化合物を含まない方向性電磁鋼板用表面処理剤。
1. One or two or more oxide colloidal substances are added in an amount of 0.3 to 100 parts by weight of a primary phosphate of Al, Mg and Ca and 35 to 100 parts by weight of colloidal silica in terms of solid content. A surface treatment agent for grain-oriented electrical steel sheets containing no chromium compound, comprising 15 parts by weight.
【請求項2】 酸化物コロイド状物質として、Mg,C
a,Ba,Sr,Zr,Fe,Mn,Co,Ni,C
u,Zn,Al,Si,Bのいずれかの元素から成る化
合物の1種または2種以上を用いることを特徴とする請
求項1記載のクロム化合物を含まない方向性電磁鋼板用
表面処理剤。
2. Mg, C as an oxide colloidal substance
a, Ba, Sr, Zr, Fe, Mn, Co, Ni, C
2. The surface treating agent for grain-oriented electrical steel sheets containing no chromium compound according to claim 1, wherein one or more of compounds comprising any one of u, Zn, Al, Si and B are used.
【請求項3】 粒子径が0.1〜5μmの酸化物コロイ
ド状物質を用いることを特徴とする請求項1もしくは2
記載のクロム化合物を含まない方向性電磁鋼板用表面処
理剤。
3. An oxide colloidal substance having a particle diameter of 0.1 to 5 μm is used.
A surface treating agent for grain-oriented electrical steel sheets which does not contain the chromium compound described in the above.
【請求項4】 珪素鋼スラブを熱延し、焼鈍後1回、ま
たは中間焼鈍を挟む2回以上の冷延して最終板厚とし、
脱炭焼鈍し、焼鈍分離剤を塗布した後最終仕上げ焼鈍
し、次いで絶縁皮膜剤を塗布し焼き付け処理とヒートフ
ラットニングを施す方向性電磁鋼板の製造方法におい
て、絶縁皮膜剤として請求項1ないし3のいずれかの項
に記載の表面処理剤を塗布し、次いで350℃以上の温
度で焼き付け処理を行うことを特徴とする方向性電磁鋼
板の製造方法。
4. A silicon steel slab is hot-rolled and cold-rolled once after annealing or two or more times with intermediate annealing to a final thickness,
4. The method for producing a grain-oriented electrical steel sheet according to claim 1, wherein said decarburizing annealing is performed, said annealing separating agent is applied, said final finishing annealing is performed, and then said insulating film is applied, and baking treatment and heat flattening are performed. A method for producing a grain-oriented electrical steel sheet, comprising applying the surface treatment agent according to any one of the above, and then performing a baking treatment at a temperature of 350 ° C. or more.
JP10346091A 1998-12-04 1998-12-04 Chromium-free surface treating agent for grain oriented silicon steel sheet, and manufacture of grain oriented silicon steel sheet using same Withdrawn JP2000169972A (en)

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