JP2953978B2 - Thick grain-oriented electrical steel sheet having no glass coating with excellent insulating coating properties and method for producing the same - Google Patents

Thick grain-oriented electrical steel sheet having no glass coating with excellent insulating coating properties and method for producing the same

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Publication number
JP2953978B2
JP2953978B2 JP3103895A JP3103895A JP2953978B2 JP 2953978 B2 JP2953978 B2 JP 2953978B2 JP 3103895 A JP3103895 A JP 3103895A JP 3103895 A JP3103895 A JP 3103895A JP 2953978 B2 JP2953978 B2 JP 2953978B2
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JP
Japan
Prior art keywords
steel sheet
coating
annealing
weight
oriented electrical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP3103895A
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Japanese (ja)
Other versions
JPH08225900A (en
Inventor
康成 吉冨
収 田中
希瑞 石橋
公彦 杉山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NITSUTETSU PURANTO SETSUKEI KK
Nippon Steel Corp
Original Assignee
NITSUTETSU PURANTO SETSUKEI KK
Nippon Steel Corp
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    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P10/00Technologies related to metal processing
    • Y02P10/20Recycling

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  • Chemical Treatment Of Metals (AREA)
  • Manufacturing Of Steel Electrode Plates (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明はグラス被膜(フォルステ
ライト、スピネル被膜)を有しない(グラスレス)厚手
方向性電磁鋼板に関わり、切断性、打ち抜き性との加工
性が優れると共に、特に密着性の優れるグラス被膜を有
しない厚手方向性電磁鋼板とその製造方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a (grassless) thick grain-oriented electrical steel sheet having no glass coating (forsterite or spinel coating). The present invention relates to a thick grain-oriented electrical steel sheet having no glass coating and a method for producing the same.

【0002】[0002]

【従来の技術】方向性電磁鋼板は一般に軟磁性材料とし
て、主としてトランスその他の電気機器の鉄心材料とし
て使用されるもので、磁気特性として励磁特性と鉄損特
性の良好なものが要求される。良好な磁気特性を得るた
めには、磁化容易軸である〈001〉を圧延方向に高度
に揃えることが重要である。また、板厚、結晶粒度、固
有抵抗、被膜特性も磁気特性に大きい影響を与えるため
重要である。
2. Description of the Related Art Grain-oriented electrical steel sheets are generally used as soft magnetic materials, mainly as core materials for transformers and other electric equipment, and are required to have good magnetic characteristics such as excitation characteristics and iron loss characteristics. In order to obtain good magnetic properties, it is important that <001>, which is the axis of easy magnetization, be highly aligned in the rolling direction. Further, the plate thickness, crystal grain size, specific resistance, and film properties are also important because they have a great influence on the magnetic properties.

【0003】結晶の方向性については、AlNをインヒ
ビターとして利用した高圧下最終冷延率を特徴とする方
法により、大幅に向上し、現在では磁束密度が理論値に
近いものまで製造できるようになっている。一方、方向
性電磁鋼板の需要家における使用時に磁気特性と共に重
要なのは被膜特性と加工性である。通常、方向性電磁鋼
板は最終仕上げ焼鈍時に形成するグラス被膜と絶縁被膜
によって表面処理がなされている。グラス被膜は焼鈍分
離剤のMgOと脱炭焼鈍時に形成する酸化物のSiO2
との反応物フォルステライト(Mg2 SiO4 )を主成
分とし、インヒビターとして用いられるAlNの分解に
より生じるAl2 3 とSiO2 ,MgO等によるスピ
ネル系化合物よりなる被膜である。
[0003] The directionality of the crystal has been greatly improved by the method characterized by the final cold rolling reduction under high pressure using AlN as an inhibitor. At present, it is possible to produce a magnetic flux density close to the theoretical value. ing. On the other hand, when the grain-oriented electrical steel sheet is used by a consumer, the film properties and workability are important together with the magnetic properties. Normally, the grain-oriented electrical steel sheet is surface-treated by a glass coating and an insulating coating formed at the time of final finish annealing. The glass film is made of MgO as an annealing separator and SiO 2 as an oxide formed during decarburizing annealing.
And a spinel-based compound of Al 2 O 3 , SiO 2 , MgO or the like, which is mainly composed of forsterite (Mg 2 SiO 4 ) and is formed by decomposition of AlN used as an inhibitor.

【0004】このグラス被膜は、硬質で耐摩耗性が強
く、トランス鉄心加工時におけるスリット、切断、打ち
抜き等の際の工具類の耐摩耗性に著しい影響を及ぼす。
例えば、グラス被膜を有する方向性電磁鋼板の打ち抜き
加工を行う場合には、金型の摩耗が生じ、数千回程度の
打ち抜きによって打ち抜いたシートの返りが使用時に問
題を生じる程大きくなる。このため、金型の再研磨或い
は新品との取り替え等が必要になり、需要家における鉄
心加工時の作業効率低下やコストアップをもたらすこと
になる。同様にして、スリット性、切断性等についても
グラス被膜による悪影響が問題である。
[0004] This glass coating is hard and has high wear resistance, and has a significant effect on the wear resistance of tools at the time of slitting, cutting, punching, etc. in the processing of a transformer core.
For example, when performing a punching process on a grain-oriented electrical steel sheet having a glass coating, a die is worn, and the return of a sheet punched out by punching several thousand times becomes large enough to cause a problem in use. For this reason, it is necessary to re-polish the mold or replace it with a new one, which leads to a reduction in work efficiency and an increase in cost at the time of iron core processing at the customer. Similarly, the adverse effect of the glass coating is also a problem on the slitting property, the cutting property and the like.

【0005】このグラス被膜は、方向性電磁鋼板の磁気
特性についてはその被膜張力によって鉄損の改善が得ら
れ、磁束密度が高い素材の場合にはこの効果が著しく、
被膜のない場合に比較し、20%程度の鉄損改善効果が
得られる。しかし、その形成状態、特に被膜厚みの増加
や内部酸化層の存在によって磁束密度の低下や磁区細分
化に際しての鉄損改善効果に悪影響を及ぼす。しかし、
一方では、グラス被膜は形成過程で微細且つ緻密に発達
するその構造から絶縁被膜全体としての鋼板面への密着
性に対し重要な役割を持つ。
[0005] With respect to the magnetic properties of the grain-oriented electrical steel sheet, iron loss is improved by the film tension of the glass coating, and this effect is remarkable in the case of a material having a high magnetic flux density.
An iron loss improving effect of about 20% can be obtained as compared with a case without a coating. However, the state of formation, particularly the increase in the thickness of the coating and the presence of the internal oxide layer, have a negative effect on the reduction of the magnetic flux density and the effect of improving iron loss at the time of magnetic domain refining. But,
On the other hand, the glass coating plays an important role in the adhesion of the insulating coating to the steel sheet surface as a whole due to its structure that develops finely and densely in the forming process.

【0006】前記グラス被膜を有さない方向性電磁鋼板
においては、グラス被膜によるアンカー効果がないた
め、絶縁被膜の密着性が不利になる。特に板厚の厚い材
料においては絶縁被膜の密着性が十分に得られず、スリ
ット、切断、打ち抜き時の額縁剥離のみでなはく、曲げ
加工や歪取り焼鈍による剥離が生じたり、極端な場合に
は、製造ラインにおいて絶縁被膜処理焼き付け時に鋼板
面から脱落する場合がある。このため、グラス被膜を有
さない方向性電磁鋼板の製造における絶縁被膜の密着性
向上技術の開発は重要である。
In the grain-oriented electrical steel sheet having no glass coating, the adhesion of the insulating coating is disadvantageous because there is no anchor effect by the glass coating. In particular, in the case of a thick material, the adhesion of the insulating film cannot be sufficiently obtained, and not only the frame peeling at the time of slitting, cutting, and punching, but also peeling due to bending or strain relief annealing or in extreme cases In some cases, the steel sheet may fall off from the steel plate surface during baking of the insulating film in the production line. Therefore, it is important to develop a technique for improving the adhesion of an insulating film in the production of a grain-oriented electrical steel sheet having no glass film.

【0007】グラス被膜を有しない方向性電磁鋼板の製
造方法としては、特開昭64−62417号公報には、
脱炭焼鈍を800〜850℃の温度で雰囲気のP H2 O
/PH2 を0.25〜0.55として行い、マグネシア
100重量部に対してアルカリ金属又はアルカリ土類金
属の塩化物の1種又は2種以上を2〜40重量部配合し
てなる焼鈍分離剤を塗布し、仕上げ焼鈍することを特徴
とする金属光沢を有する方向性電磁鋼板の製造方法が述
べらている。これにより、焼鈍分離剤中の塩化物が酸化
物中のSiO2 の分解を行い、グラス被膜の形成に至ら
せないもので、飛躍的な打ち抜き性の向上が得られてい
る。
As a method for producing a grain-oriented electrical steel sheet having no glass coating, JP-A-64-62417 discloses a method.
Decarburization annealing at a temperature of 800 to 850 ° C. in an atmosphere of PH 2 O
/ PH 2 is set to 0.25 to 0.55, and annealing separation is performed by mixing 2 to 40 parts by weight of one or more alkali metal or alkaline earth metal chlorides with respect to 100 parts by weight of magnesia. A method for producing a grain-oriented electrical steel sheet having a metallic luster characterized by applying an agent and performing finish annealing is described. As a result, chloride in the annealing separating agent decomposes SiO 2 in the oxide and does not lead to the formation of a glass film, so that a remarkable improvement in punching property is obtained.

【0008】さらに、近年では、磁気特性の優れた厚い
板厚のグラス被膜の少ない一方向性電磁鋼板を得る方法
を開示したものとして、特開平6−173019号公報
がある。これはスラブを1280℃未満の低温で加熱し
た後、熱延、熱延板焼鈍を施すことなく引き続き圧下率
60〜79%の冷延を行い、次いで脱炭焼鈍し、焼鈍分
離剤を塗布し、仕上げ焼鈍し、絶縁被膜剤を塗布する
0.4〜1.0mm厚の厚手一方向性電磁鋼板の製造方法
において、熱延終了温度を800〜1100℃とし、熱
延の最終3パスの累積圧下率を40%以上とし、冷延の
パス間の鋼板の温度を250℃以下とし、脱炭焼鈍後最
終仕上げ焼鈍開始までの一次再結晶粒の平均粒径を18
〜30μmとし、熱延後から最終仕上げ焼鈍の開始まで
の間に窒化処理をし、焼鈍分離剤としてMgO100重
量部に対しLi,K,Na,Ba,Ca,Mg,Zn,
Fe,Zr,Sr,Sn,Alの塩化物、硝酸塩、硫化
物、硫酸塩の中から選ばれる1種又は2種以上を2〜3
0重量部添加した焼鈍分離剤を塗布することにより、磁
気特性の優れた厚い板厚のグラス被膜を少ない一方向性
電磁鋼板の製造方法を提供するものである。
Further, in recent years, Japanese Patent Application Laid-Open No. 6-173019 discloses a method for obtaining a unidirectional magnetic steel sheet having excellent magnetic properties and a large thickness and a small glass coating. In this method, the slab is heated at a low temperature of less than 1280 ° C., and then continuously subjected to cold rolling at a rolling reduction of 60 to 79% without performing hot rolling and hot-rolled sheet annealing, and then decarburizing annealing and applying an annealing separating agent. In a method for producing a thick unidirectional electromagnetic steel sheet having a thickness of 0.4 to 1.0 mm, which is subjected to finish annealing and applying an insulating coating agent, the hot rolling end temperature is set to 800 to 1100 ° C. and the final three passes of hot rolling are accumulated. The rolling reduction is set to 40% or more, the temperature of the steel sheet between the cold rolling passes is set to 250 ° C. or less, and the average particle size of the primary recrystallized grains from the decarburizing annealing to the start of the final finish annealing is 18
3030 μm, a nitriding treatment was performed after hot rolling and before the start of final annealing, and Li, K, Na, Ba, Ca, Mg, Zn,
One or two or more selected from chlorides, nitrates, sulfides, and sulfates of Fe, Zr, Sr, Sn and Al
An object of the present invention is to provide a method for producing a grain-oriented electrical steel sheet having excellent magnetic properties and a small glass coating with a small thickness by applying 0 parts by weight of an annealing separator.

【0009】これらの先行技術は何れもグラス被膜を有
さない板厚の厚いグラス被膜を有しないか、グラス被膜
の少ないいわゆるグラスレス方向性電磁鋼板に関するも
のであり、グラスレス化により打ち抜き性、切断性等の
加工性の顕著な改善が得られている。しかし、これらの
従来技術における絶縁被膜の処理においては、その表面
状態によっては十分な加工性や絶縁被膜の密着性が得ら
れず、製品の総合的な被膜性能を考慮すると未だ十分な
技術であるとはいえない。
All of these prior arts relate to a so-called glassless grain-oriented electrical steel sheet which does not have a glass coating and does not have a thick glass coating or has little glass coating. A remarkable improvement in workability such as cutability has been obtained. However, in the treatment of the insulating film in these conventional techniques, sufficient workability and adhesion of the insulating film cannot be obtained depending on the surface condition, and it is still a sufficient technique in consideration of the overall film performance of the product. Not really.

【0010】[0010]

【発明が解決しようとする課題】本発明の目的は、厚い
板厚のグラスレス方向性電磁鋼板の製造において、鋼板
表面のグラス被膜の形成を、従来のグラスレス材の製造
技術に比較して、より確実に阻止して、加工性、密着性
の優れた製品とその製造方法を提供することにある。
SUMMARY OF THE INVENTION It is an object of the present invention to provide a method for manufacturing a glassless grain-oriented electrical steel sheet having a large thickness by forming a glass film on the surface of the steel sheet in comparison with a conventional glassless material manufacturing technique. Another object of the present invention is to provide a product which is more reliably prevented and which has excellent workability and adhesion and a method for producing the same.

【0011】[0011]

【課題を解決するための手段】本発明の製品を得るため
には、出発材に鋼成分として重量比でC;0.021〜
0.075%、Si;2.5〜4.5%、酸可溶Al;
0.010〜0.040%、N;0.0030〜0.0
130%、S≦0.0140%、Mn;0.05〜0.
45%を含有し、残部Fe及び不可避の不純物からなる
電磁鋼スラブを用い、このスラブを1280℃未満の温
度に加熱後、熱延し、1回又は中間焼鈍を挟む2回以上
の冷延を行い、最終板厚とした後、次いで脱炭焼鈍し、
窒化処理をし、焼鈍分離剤を塗布した後、高温仕上げ焼
鈍し、ヒートフラットニングと絶縁被膜の塗布焼き付け
を行うことからなる製造方法による。
In order to obtain the product of the present invention, C is used as a steel component as a starting material in a weight ratio of C;
0.075%, Si; 2.5-4.5%, acid-soluble Al;
0.010-0.040%, N: 0.0030-0.0
130%, S ≦ 0.0140%, Mn: 0.05-0.
Using an electromagnetic steel slab containing 45%, the balance being Fe and unavoidable impurities, this slab is heated to a temperature of less than 1280 ° C., hot-rolled, and subjected to one or two or more cold-rolling steps with intermediate annealing. After the final plate thickness, then decarburizing annealing,
After performing a nitriding treatment and applying an annealing separating agent, a high-temperature finish annealing is performed, and a manufacturing method including heat flattening and application and baking of an insulating film is performed.

【0012】即ち、本発明では、スラブ加熱段階ではイ
ンヒビター元素、例えばAl,N,Mn,S等の鋼中へ
の溶解を行わず、脱炭焼鈍後、材料を強還元雰囲気中で
窒化処理を行うことにより、(Al,Si)Nを主成分
とするインヒビターを形成させ、焼鈍分離剤としてハロ
ゲン化合物をMgO100重量部当たりハロゲン元素の
トータル量として2,000〜200,000ppm の範
囲で配合したスラリーを塗布し、最終仕上げ焼鈍として
昇温時800〜1100℃における平均昇温率12℃/
Hr以下で仕上げ焼鈍後、仕上げ焼鈍過程でグラスレス化
と良好な二次再結晶を発達させた後、その張力を一定以
下に保って絶縁被膜剤を焼き付け処理することを基本工
程とする。
That is, in the present invention, the slab heating step does not dissolve the inhibitor element, for example, Al, N, Mn, S, etc. in the steel, and after the decarburizing annealing, the material is subjected to a nitriding treatment in a strong reducing atmosphere. By doing so, an inhibitor containing (Al, Si) N as a main component was formed, and a slurry containing a halogen compound as an annealing separator in a range of 2,000 to 200,000 ppm as a total amount of halogen elements per 100 parts by weight of MgO. Is applied as final finish annealing, and the average temperature rise rate at 800 to 1100 ° C is 12 ° C /
After the final annealing at Hr or less, the basic step is to bake the insulating coating agent while maintaining the tension at a certain level or less after developing glass-less and good secondary recrystallization in the final annealing process.

【0013】このような成分と工程による本発明のグラ
スレスで板厚の厚い密着性の優れる方向性電磁鋼板の製
造においては、焼鈍分離剤塗布、仕上げ焼鈍及び絶縁被
膜塗布の過程での表面処理方法に特徴がある。最終冷延
された素材は先ず、連続ラインにおいて脱炭焼鈍され
る。この脱炭焼鈍により鋼中のCの除去と一次再結晶が
行われ、同時に鋼板表面にSiO2 を主成分とする酸化
膜の形成が行われる。この脱炭焼鈍は800〜875℃
でN2 +H2 雰囲気中でP H2 O /P H2 を制御して行
われる。
[0013] In the production of the glassless, thick, grain-oriented electrical steel sheet of the present invention having excellent adhesion by such components and processes, the surface treatment in the process of applying an annealing separator, finishing annealing and applying an insulating film. The method is unique. The final cold rolled material is first decarburized and annealed in a continuous line. By this decarburization annealing, C in the steel is removed and primary recrystallization is performed, and at the same time, an oxide film mainly composed of SiO 2 is formed on the surface of the steel sheet. This decarburization annealing is 800-875 ° C
In is performed by controlling the P H 2 O / P H 2 in N 2 + H 2 atmosphere.

【0014】次いで、脱炭焼鈍の後半、脱炭焼鈍終了後
或いは別ラインにおいて窒化処理が行われる。この際の
窒化量は150〜300ppm として行われる。この後、
焼鈍分離剤を塗布し、乾燥してコイルに巻き取られる。
この際、本発明の第一の特徴である焼鈍分離剤として
は、MgOに対し、H,Li,Na,K,Mg,Ca,
Sr,Ba,Ti,Zr,V,Ta,Cr,Mo,W,
Mn,Fe,Co,Ni,Cu,Zn,Ag,Cd,A
l,Sn,Pb,Sb,Bi,Bの中から選ばれるハロ
ゲン化合物の1種又は2種以上がハロゲン元素量のトー
タルとして2,000〜200,000ppm の範囲で添
加して用いられる。
Next, a nitriding treatment is performed in the latter half of the decarburizing annealing, after the end of the decarburizing annealing, or in another line. At this time, the nitriding amount is set at 150 to 300 ppm. After this,
An annealed separating agent is applied, dried and wound on a coil.
At this time, as an annealing separating agent which is the first feature of the present invention, H, Li, Na, K, Mg, Ca,
Sr, Ba, Ti, Zr, V, Ta, Cr, Mo, W,
Mn, Fe, Co, Ni, Cu, Zn, Ag, Cd, A
One or more halogen compounds selected from the group consisting of 1, Sn, Pb, Sb, Bi, and B are added and used in a total amount of 2,000 to 200,000 ppm of halogen elements.

【0015】引き続き行われる本発明の第二の特徴であ
る最終仕上げ焼鈍は、本発明の工程においてはグラスレ
ス化をより確実に得るために重要である。即ち、本発明
のように脱炭焼鈍後に窒化処理を行い、(Al,Si)
Nを主体とするインヒビターを形成し、焼鈍分離剤と仕
上げ焼鈍条件によってグラスレスで且つ良好な二次再結
晶を有する鋼板を得ようとする場合には、焼鈍時の雰囲
気と昇温時の加熱速度が重要である。本発明において
は、この対策として、最終仕上げ焼鈍として昇温時80
0〜1100℃における平均昇温率12℃/Hr以下で仕
上げ焼鈍が行われる。
The final finish annealing which is the second feature of the present invention, which is performed subsequently, is important in the process of the present invention in order to more reliably obtain glasslessness. That is, nitriding treatment is performed after decarburizing annealing as in the present invention, and (Al, Si)
In the case of forming an inhibitor mainly composed of N and obtaining a steel sheet having glassless and good secondary recrystallization by using an annealing separator and finish annealing conditions, the atmosphere at the time of annealing and the heating at elevated temperature Speed is important. In the present invention, as a countermeasure against this, the final finish annealing is performed at a temperature rise of 80%.
Finish annealing is performed at an average temperature rise rate of 12 ° C./Hr or less at 0 to 1100 ° C.

【0016】本発明のようにインヒビターとしてMnS
を殆ど使用せず、(Al,Si)Nを形成し、後にAl
Nへと変化が行われるプロセスにおいては、二次再結晶
開始温度が通常の方向性電磁鋼板より高く、1100℃
前後である。このため、二次再結晶開始領域まで、グラ
スレス化反応や酸化抑制を行いながらインヒビターを安
定に保つ必要がある。これは、昇温過程の条件が雰囲気
ガスからの窒素の吸収やグラスレス過程における脱窒に
よるインヒビターの分解に界面状態が多大な影響をもた
らすからである。このため、本発明のように特別な仕上
げ焼鈍サイクルを用いないと均一なグラスレス状態と良
好な二次再結晶の鋼板が得られない。仕上げ焼鈍条件と
しては、グラス被膜の均一な分解を行わせる時期の80
0〜1100℃の条件としてN2 +H2 雰囲気で平均加
熱速度を12℃/Hr以下として徐々に昇温するか一定の
温度で均熱保持を行う。
As in the present invention, MnS is used as an inhibitor.
Is formed almost without using (Al, Si) N, and Al is formed later.
In the process of changing to N, the secondary recrystallization initiation temperature is higher than that of a normal grain-oriented electrical steel sheet, and is 1100 ° C.
Before and after. Therefore, it is necessary to keep the inhibitor stable up to the secondary recrystallization start region while performing the glassless reaction and the oxidation suppression. This is because the conditions of the temperature raising process greatly affect the absorption of nitrogen from the atmospheric gas and the decomposition of the inhibitor due to the denitrification in the glassless process. For this reason, unless a special finish annealing cycle is used as in the present invention, a steel plate having a uniform glassless state and good secondary recrystallization cannot be obtained. The final annealing conditions are as follows: the time required for uniform decomposition of the glass coating.
As a condition of 0 to 1100 ° C., in an N 2 + H 2 atmosphere, the average heating rate is set to 12 ° C./Hr or less, and the temperature is gradually raised or a uniform temperature is maintained.

【0017】このように処理されたグラスレス方向性電
磁鋼板は、連続ラインにおいて絶縁被膜処理及び形状矯
正と歪取りを兼ねてヒートフラットニング処理が行われ
る。この際の本発明の第三の特徴である絶縁被膜処理
は、良好な密着性を得るために重要である。本発明材の
ような板厚の厚いグラスレス方向性電磁鋼板において
は、従来の絶縁被膜の処理方法では、絶縁被膜の密着性
や加工性を良好に確保することが困難である。
The thus treated glassless grain-oriented electrical steel sheet is subjected to an insulating coating treatment and a heat flattening treatment for both shape correction and distortion removal in a continuous line. At this time, the insulating film treatment, which is the third feature of the present invention, is important for obtaining good adhesion. In a thick glassless grain-oriented electrical steel sheet such as the material of the present invention, it is difficult to ensure good adhesion and workability of the insulating film by the conventional method of treating an insulating film.

【0018】即ち、絶縁被膜の成分や焼き付け条件を適
正に制御しなければ、前記密着性や加工性が極めて劣
り、焼き付け処理の冷却過程で絶縁被膜が鋼板面から脱
落や発泡が生じる。また、造膜が実現したとしても、打
ち抜き、切断、曲げ等の鉄心加工工程で通常額縁剥離と
呼ばれる加工部付近の剥離や加工衝撃による被膜剥離の
伝播が生じる。
That is, unless the components of the insulating film and the baking conditions are properly controlled, the adhesion and workability are extremely poor, and the insulating film falls off or foams from the steel sheet surface during the cooling process of the baking process. Further, even if the film formation is realized, in the core processing steps such as punching, cutting, bending and the like, peeling near the processed portion, which is usually called frame peeling, and propagation of film peeling due to processing impact occur.

【0019】この対策として、本発明者等は、グラスレ
ス方向性電磁鋼板用の絶縁被膜として、被膜成分による
被膜張力制御と焼き付け条件に着目して検討した。その
結果、被膜張力が0.4kg/mm2 以下の絶縁被膜を焼き
付け時の加熱条件を制御して処理すれば前記問題点が解
決できることを見いだした。
As a countermeasure, the present inventors have studied an insulating film for a glassless grain-oriented electrical steel sheet, paying attention to the film tension control by the film component and the baking conditions. As a result, it has been found that the above-mentioned problems can be solved by controlling the heating conditions at the time of baking for an insulating film having a film tension of 0.4 kg / mm 2 or less.

【0020】即ち、従来のグラス被膜を有する方向性電
磁鋼板の絶縁被膜処理は、鉄損、磁歪特性を改善するた
めにコロイダルシリカと燐酸塩の比率を適正に制御し、
張力付与型の絶縁被膜の処理が行われてきた。これに代
えて、本発明では、新規な組成の低張力被膜剤を用いる
か、リン酸塩−コロイダルシリカ系被膜の場合には、張
力効果の少ない領域の成分系で絶縁被膜を一定の加熱条
件と付着量の下で処理するものである。
That is, in the conventional insulation coating treatment of a grain-oriented electrical steel sheet having a glass coating, the ratio of colloidal silica to phosphate is appropriately controlled in order to improve iron loss and magnetostriction characteristics.
Tension imparting insulating coatings have been treated. Instead, in the present invention, a low-tension coating agent having a novel composition is used, or in the case of a phosphate-colloidal silica-based coating, the insulating coating is heated under a constant heating condition with a component system in a region having a small tension effect. And the amount of adhesion.

【0021】この絶縁被膜成分としては、 (a)燐酸100重量部とAl2 3 ,MgO,Zn
O,CaOの1種又は2種以上15〜35重量部及びク
ロム酸、ほう酸、珪酸化合物の1種又は2種以上0.5
〜10重量部 (b)Al,Mg,Zn,Caの第一燐酸塩100重量
部に対し、コロイダルシリカ80〜200重量部とクロ
ム化合物を4〜22重量部 が用いられ、連続ラインにおいて800〜900℃で焼
き付け処理される。この際の塗布条件としては、絶縁被
膜の乾燥・焼き付け後の塗布量で2〜6g/m2 であ
り、その被膜張力は0.4kg/mm2 以下になるように処
理される。
The components of the insulating coating are: (a) 100 parts by weight of phosphoric acid and Al 2 O 3 , MgO, Zn
15 to 35 parts by weight of one or more of O, CaO and one or more of chromic acid, boric acid, and silicate compound
(B) 80 to 200 parts by weight of colloidal silica and 4 to 22 parts by weight of a chromium compound are used for 100 parts by weight of the first phosphate of Al, Mg, Zn, and Ca, and 800 to 200 parts by weight in a continuous line. It is baked at 900 ° C. The application conditions at this time are 2 to 6 g / m 2 in terms of the application amount after drying and baking of the insulating film, and the coating is processed so that the film tension is 0.4 kg / mm 2 or less.

【0022】次に、本発明における構成要件の限定理由
について述べる。先ず、本発明のグラスレス方向性電磁
鋼板としては、鋼板表面のフォルステライト、スピネル
等の物質の合計量がMgO,SiO2 ,Al2 3 とし
て0.45g/m2 以下である。これは、これら酸化物
物質は鉄心加工工程における切断、打ち抜き等の加工性
の劣化をもたらすためで、特に、回転機用の鉄心の打ち
抜き加工では問題が大きい。0.45g/m2 超では、
これらの良好な加工性が得られないため制限される。ま
た、本発明の製品においては、絶縁被膜により生じる面
張力が0.4kg/mm2 以下である。これは、本発明のよ
うに極めて良好なグラスレス素材を得る場合には、従来
の方向性電磁鋼板のようにグラス被膜の根によるアンカ
ー効果が全くない。このため、絶縁被膜の密着性が悪
く、被膜張力が大きいほど密着性が劣るためである。絶
縁被膜による張力が0.4kg/mm2 超では絶縁被膜の鋼
板面への密着性が低下し、極端な場合、絶縁被膜塗布工
程の冷却時に鋼板面から脱落する。
Next, the reasons for limiting the constituent elements in the present invention will be described. First, in the glassless grain-oriented electrical steel sheet of the present invention, the total amount of substances such as forsterite and spinel on the steel sheet surface is 0.45 g / m 2 or less as MgO, SiO 2 , and Al 2 O 3 . This is because these oxide substances cause deterioration of workability such as cutting and punching in the iron core processing step, and particularly, there is a large problem in the punching of the iron core for a rotating machine. If it exceeds 0.45 g / m 2 ,
These are limited because good processability cannot be obtained. Further, in the product of the present invention, the surface tension generated by the insulating coating is 0.4 kg / mm 2 or less. This is because when a very good glassless material is obtained as in the present invention, there is no anchor effect due to the root of the glass coating unlike the conventional grain-oriented electrical steel sheet. For this reason, the adhesion of the insulating film is poor, and the higher the film tension, the lower the adhesion. If the tension due to the insulating coating exceeds 0.4 kg / mm 2 , the adhesion of the insulating coating to the steel sheet surface is reduced, and in extreme cases, the insulating coating falls off the steel sheet surface during cooling in the insulating coating application step.

【0023】また、鋼板厚みは0.35mm以上である。
本発明材ではグラスレス且つ低張力の絶縁被膜による製
品を提供するのが特徴である。方向性電磁鋼板において
は、被膜張力による鉄損改善効果を利用して低鉄損材を
得ることが近年の重要な技術の一つである。このため、
本発明のように低張力被膜を適用する場合には、板厚が
厚い場合に適用が制限される。板厚0.35mm超では、
張力による鉄損改善効果が殆どないため、問題が生じな
い。
[0023] The thickness of the steel plate is 0.35 mm or more.
The material of the present invention is characterized by providing a product with a glassless and low-tensile insulating coating. In grain-oriented electrical steel sheets, it is one of the important techniques in recent years to obtain a low iron loss material by utilizing the iron loss improvement effect by the film tension. For this reason,
When a low-tensile coating is applied as in the present invention, the application is limited when the plate thickness is large. If the plate thickness exceeds 0.35mm,
Since there is almost no effect of improving iron loss by tension, no problem occurs.

【0024】次に、本発明の製造方法の限定理由につい
て述べる。先ず、出発材として使用する素材スラブの成
分組成の限定理由は次の通りである。Cはその含有量が
0.021%未満では二次再結晶が不安定になり、二次
再結晶した場合にも製品の磁束密度がB8 で1.80Te
sla 程度と低いものになる。一方、0.075%超にな
ると脱炭に長時間を要するため、生産性を阻害する。S
iはその含有量によって固有抵抗が変化する。2.5%
未満では良好な鉄損特性が得られない。一方、4.5%
超と多くなると冷延時に割れや破断が多発し、安定した
冷延作業を困難にする。本発明の出発材の成分系におけ
る特徴の一つは、Sを0.0140%以下とすることに
ある。
Next, the reasons for limiting the manufacturing method of the present invention will be described. First, the reasons for limiting the component composition of the material slab used as the starting material are as follows. C content thereof becomes unstable secondary recrystallization is less than 0.021%, 1.80Te flux density of the product even when the secondary recrystallization at B 8
It will be as low as sla. On the other hand, if the content exceeds 0.075%, a long time is required for decarburization, which impairs productivity. S
The specific resistance of i changes depending on its content. 2.5%
If it is less than 30, good iron loss characteristics cannot be obtained. On the other hand, 4.5%
If the content is too large, cracks and breaks occur frequently during cold rolling, making stable cold rolling work difficult. One of the characteristics of the component system of the starting material of the present invention is that S is set to 0.0140% or less.

【0025】従来の公知技術、例えば特公昭47−25
220号公報に開示されている技術においては、SはM
nSとして二次再結晶を生起させるのに必要な析出物を
形成する元素で、前記公知技術においてSが最も効果を
発現する含有範囲があり、それは熱延に先だって行われ
るスラブ加熱段階でMnSを固溶できる量として規定さ
れていた。しかし、近年の研究において、二次再結晶に
必要な析出物として(Al,Si)Nを用いる方向性電
磁鋼板の製造プロセスにおいては、素材中のSi量の多
いスラブを低温でスラブ加熱して熱延する場合には、S
は二次再結晶不良を助長することが見いだされた。素材
中のSi量が4.5%以下の場合、Sは0.014%以
下、好ましくは0.0070%以下であれば二次再結晶
不良の発生は全く生じない。
Conventionally known techniques, for example, JP-B-47-25
In the technology disclosed in Japanese Patent Publication No. 220, S is M
nS is an element that forms a precipitate necessary for causing secondary recrystallization to occur, and there is a content range in which S is most effective in the above-mentioned known technology, and MnS is contained in a slab heating step performed prior to hot rolling. It was defined as an amount capable of forming a solid solution. However, in a recent study, in a production process of a grain-oriented electrical steel sheet using (Al, Si) N as a precipitate necessary for secondary recrystallization, a slab containing a large amount of Si in a material is heated at a low temperature to perform slab heating. When hot rolling, S
Was found to promote poor secondary recrystallization. When the amount of Si in the material is 4.5% or less, if S is 0.014% or less, preferably 0.0070% or less, occurrence of secondary recrystallization failure does not occur at all.

【0026】本発明では、二次再結晶に必要な析出物と
して(Al,Si)Nを用いる。従って必要最低限のA
lNを確保するためには酸可溶Alは0.010%以
上、Nは0.0030%以上必要である。しかしなが
ら、酸可溶Alが0.040%を超えると熱延中のAl
Nが不適切になり二次再結晶が不安定となるため0.0
10〜0.040%に制限される。一方、Nの含有量は
0.0130%を超えるとブリスターと呼ばれる鋼板表
面の割れが生じ、また、一次再結晶の粒径調整ができな
いために0.0030〜0.0130%に限定する。M
nは0.050%未満では二次再結晶が不安定になる。
しかし、多くなるとB8 値は高くなるが、一定以上の添
加はコスト面で不利になる。このため、0.05〜0.
45%に制限される。
In the present invention, (Al, Si) N is used as a precipitate required for secondary recrystallization. Therefore, the minimum A
To secure 1N, acid-soluble Al must be 0.010% or more and N must be 0.0030% or more. However, if the acid-soluble Al exceeds 0.040%, the Al
N becomes inappropriate and secondary recrystallization becomes unstable.
Limited to 10-0.040%. On the other hand, if the N content exceeds 0.0130%, cracks on the surface of the steel sheet called blisters occur, and the grain size of primary recrystallization cannot be adjusted, so that the content is limited to 0.0030 to 0.0130%. M
If n is less than 0.050%, secondary recrystallization becomes unstable.
However, although the higher B 8 value becomes large, certain level of addition becomes disadvantageous in cost. For this reason, 0.05-0.
Limited to 45%.

【0027】次に、焼鈍分離剤としてはMgOに対し、
ハロゲン化合物の1種又は2種以上をそのハロゲン元素
量のトータルで2,000〜200,000ppm の範囲
で添加される。この際のハロゲン化合物質としては、好
ましくは、H,Li,Na,K,Mg,Ca,Sr,B
a,Ti,Zr,V,Ta,Cr,Mo,W,Mn,F
e,Co,Ni,Cu,Zn,Ag,Cd,Al,S
n,Pb,Sb,Bi,Bの中から選ばれる1種又は2
種以上が添加される。
Next, as an annealing separator, MgO is used.
One or more halogen compounds are added in a total amount of 2,000 to 200,000 ppm of the halogen element. As the halogen compound at this time, preferably, H, Li, Na, K, Mg, Ca, Sr, B
a, Ti, Zr, V, Ta, Cr, Mo, W, Mn, F
e, Co, Ni, Cu, Zn, Ag, Cd, Al, S
one or two selected from n, Pb, Sb, Bi, and B
Seeds or more are added.

【0028】これらのハロゲン化合物は仕上げ焼鈍昇温
過程におけるグラス被膜の形成制御と分解のために重要
な役割を有する。特に、グラス被膜の分解反応において
は、ハロゲン化合物は仕上げ焼鈍昇温中にグラス被膜層
中のFeや被膜成分のエッチングを行い、被膜層中のS
iO2 やスピネル等を地鉄表面層から遊離させ、焼鈍分
離剤中への被膜成分の吸収反応を起こさせる。
These halogen compounds play an important role in controlling the formation and decomposition of the glass film during the temperature rise in the finish annealing. In particular, in the decomposition reaction of the glass film, the halogen compound etches Fe and film components in the glass film layer during the temperature rise in the final annealing, and removes the sulfur in the film layer.
It releases iO 2 , spinel, etc. from the surface layer of the base iron, causing an absorption reaction of the coating components into the annealing separator.

【0029】ハロゲン化合物のハロゲン元素のトータル
量が2,000ppm 未満では、均一にグラス被膜を有さ
ない製品が得られ難く、表面にフォルステライトやスピ
ネル物質の残留量が多くなるため制限される。一方、ハ
ロゲン元素量のトータルが200,000ppm 超では、
添加物の成分元素が鋼中に拡散してインヒビターに悪影
響を与えたり、余剰のハロゲン元素による粒界や表面の
過剰なエッチングが生じて表面状態を悪くしたり、後の
純化の際に悪影響を与えるため好ましくない。
If the total amount of halogen elements of the halogen compound is less than 2,000 ppm, it is difficult to obtain a product having no glass coating uniformly, and the amount of residual forsterite or spinel substance on the surface is increased, which is limited. On the other hand, if the total amount of halogen elements exceeds 200,000 ppm,
The constituent elements of the additive diffuse into the steel and have an adverse effect on the inhibitor.Excessive halogen elements cause excessive etching of the grain boundaries and the surface, resulting in poor surface conditions and adverse effects during subsequent purification. It is not preferable because it gives.

【0030】これらの添加剤により、先ず、仕上げ焼鈍
の昇温段階の800℃前後でMgOの表面を低融点化
し、早期に鋼板表層部にMgO−SiO2 系被膜を形成
する。これにより雰囲気ガスからの鋼中への追加酸化が
抑制される。その後、昇温時後段の1000℃以降にお
いては、被膜層のFe部分がハロゲン化合物によりエッ
チングを受け、グラス被膜層の分解が行われる。この
後、さらに高温での被膜分解反応が進行すると、グラス
被膜のない表面は、高温でサーマルエッチングを受け
て、滑らかな鋼板表面が得られる。
These additives first lower the melting point of the surface of MgO at around 800 ° C. in the temperature rising stage of the finish annealing, and form an MgO—SiO 2 -based coating on the surface layer of the steel sheet at an early stage. This suppresses additional oxidation from the atmospheric gas into the steel. Thereafter, after 1000 ° C., which is the latter stage at the time of temperature rise, the Fe portion of the coating layer is etched by the halogen compound, and the glass coating layer is decomposed. Thereafter, when the film decomposition reaction proceeds at a higher temperature, the surface without the glass film is subjected to thermal etching at a high temperature, and a smooth steel plate surface is obtained.

【0031】次に本発明における最終仕上げ焼鈍は昇温
時800〜1100℃における平均昇温率を12℃/Hr
以下で行う。本発明の工程では、焼鈍分離剤のエッチン
グ効果が仕上げ焼鈍における徐加熱により効果的に反応
が進行するのが特徴である。これを超える急速な加熱で
は昇温過程のグラス被膜の分解反応が均一に生じ難く、
均一なグラスレス化が得られなくなる。また、昇温時鋼
板における脱インヒビター速度と粒成長等が生じる際の
適切なインヒビター量のバランスが崩れて良好な二次再
結晶が得られなくなるため制限される。
Next, in the final finish annealing in the present invention, the average rate of temperature rise at 800 to 1100 ° C. is 12 ° C./Hr
Performed below. In the process of the present invention, the etching effect of the annealing separating agent is characterized in that the reaction proceeds effectively by slow heating in the finish annealing. With rapid heating exceeding this, it is difficult for the decomposition reaction of the glass coating during the heating process to occur uniformly,
Uniform glasslessness cannot be obtained. In addition, there is a limitation because the balance between the inhibitor inhibitory rate and the appropriate amount of the inhibitor at the time of grain growth or the like in the steel sheet at the time of temperature rise is broken, and good secondary recrystallization cannot be obtained.

【0032】800〜1100℃における徐加熱を行う
に際し、最も好ましいのはこの範囲の一定温度で均熱保
持するのが十分にグラスレス反応を起こさせるのに望ま
しい。この際の雰囲気ガスとしては、特に限定するもの
ではないが、好ましくはN2+H2 雰囲気でN2 を25
%以上含有の雰囲気で行うのが、本発明材を出発材とす
る工程においてはインヒビターを安定に保つのに有利で
ある。
When performing gradual heating at 800 to 1100 ° C., it is most preferable to maintain a uniform temperature at a constant temperature in this range in order to sufficiently cause a glassless reaction. The atmosphere gas at this time is not particularly limited, but is preferably an N 2 + H 2 atmosphere containing 25% of N 2 .
% Or more is advantageous for keeping the inhibitor stable in the process using the material of the present invention as a starting material.

【0033】本発明における絶縁被膜の処理条件として
は、その被膜張力が0.4kg/mm2となるように絶縁被
膜剤の成分と処理条件を調整して行われる。本発明者等
はグラスレスの方向性電磁鋼板の絶縁被膜の密着性につ
いて検討した結果、その被膜張力が絶縁被膜の密着力に
多大な作用を及ぼすことを見いだした。張力が0.4kg
/mm2 以上では、その張力の増加と共に絶縁被膜の鋼板
との密着力が低下する。
In the present invention, the processing conditions of the insulating film are adjusted by adjusting the components of the insulating film agent and the processing conditions so that the film tension becomes 0.4 kg / mm 2 . The present inventors have studied the adhesiveness of the insulating coating of the glassless grain-oriented electrical steel sheet and found that the coating tension has a great effect on the adhesiveness of the insulating coating. 0.4kg tension
If it is / mm 2 or more, the adhesion between the insulating film and the steel sheet decreases as the tension increases.

【0034】これは、従来の方向性電磁鋼板のようにグ
ラス被膜による地鉄とのアンカー効果による密着性向上
がないためである。張力が0.4kg/mm2 以上になる
と、グラス被膜がないために、絶縁被膜の張力により焼
き付け時やコイル搬送時等のハンドリングにおいて被膜
と地鉄界面に亀裂を生じ、被膜が脱落したり、後の鉄心
加工工程での切断、打ち抜き等の衝撃で被膜剥離が生じ
る。特に、本発明材のように板厚の厚い材料において
は、絶縁被膜界面がスムースな場合、曲げ、衝撃等によ
る被膜剥離がより生じやすいため、被膜張力等による界
面状態の制御は重要である。
This is because there is no improvement in the adhesion due to the anchor effect with the ground iron by the glass coating unlike the conventional grain-oriented electrical steel sheet. When the tension is 0.4 kg / mm 2 or more, there is no glass coating, so the tension of the insulating coating causes cracks at the interface between the coating and the ground iron during handling such as baking or coil transport, and the coating may fall off. The coating peels off due to the impact of cutting, punching, or the like in a later core processing step. In particular, in the case of a thick material such as the material of the present invention, when the interface of the insulating film is smooth, film peeling due to bending, impact, or the like is more likely to occur. Therefore, control of the interface state by film tension or the like is important.

【0035】この際の絶縁被膜剤としては、好ましく
は、絶縁被膜処理剤が (a)燐酸100重量部とAl2 3 ,MgO,Zn
O,CaOの1種又は2種以上15〜35重量部及びク
ロム酸、ほう酸、珪酸化合物の1種又は2種以上0.5
〜10重量部 (b)Al,Mg,Zn,Caの第一燐酸塩100重量
部に対し、コロイダルシリカ80〜200重量部とクロ
ム化合物を4〜22重量部 からなる処理液を乾燥し、焼き付け後の重量で2〜6g
/m2 の範囲で塗布することが張力制御のため重要であ
る。
Preferably, the insulating coating agent is (a) 100 parts by weight of phosphoric acid and Al 2 O 3 , MgO, Zn.
15 to 35 parts by weight of one or more of O, CaO and one or more of chromic acid, boric acid, and silicate compound
(B) A treatment solution consisting of 80 to 200 parts by weight of colloidal silica and 4 to 22 parts by weight of a chromium compound with respect to 100 parts by weight of a primary phosphate of Al, Mg, Zn, and Ca is dried and baked. 2-6g by weight after
/ M 2 is important for tension control.

【0036】(a)における被膜組成においては燐酸と
Al2 3 ,MgO,ZnO,CaO等の酸化物の比率
は重要である。この比率は被膜のガラス化とフリー燐酸
の制御のために重要である。Al2 3 ,MgO,Zn
O,CaO等のトータルが15重量部未満ではフリー燐
酸の増加により焼き付け後の被膜のベタツキが生じやす
い。一方、35重量部超では酸化物が過剰となって、被
膜のガラス化が不十分となって表面のザラツキが生じた
り、発粉によって占積率を悪くしたり、被膜の密着性を
損なうため制限される。
In the coating composition in (a), the ratio of phosphoric acid to oxides such as Al 2 O 3 , MgO, ZnO, CaO is important. This ratio is important for vitrification of the coating and control of free phosphoric acid. Al 2 O 3 , MgO, Zn
If the total amount of O, CaO, etc. is less than 15 parts by weight, the coating after baking tends to become sticky due to an increase in free phosphoric acid. On the other hand, if it exceeds 35 parts by weight, the oxides become excessive, and the vitrification of the coating becomes insufficient, causing roughness on the surface, deteriorating the space factor by powdering, or impairing the adhesion of the coating. Limited.

【0037】クロム酸化合物と珪酸化合物は主成分の燐
酸や酸化物と反応し、フリー燐酸によるベタツキを防止
したり、被膜のガラス化を向上し、光沢のある被膜を形
成する働きがある。0.5重量部未満ではこれらの効果
が得られない。10重量部超になるとクロム化合物や珪
酸塩が過剰になって、それ自体によるベタツキを引き起
こしたり、被膜外観を損ねるため制限される。
The chromic acid compound and the silicate compound react with phosphoric acid or oxide as a main component to prevent stickiness due to free phosphoric acid, improve the vitrification of the film, and form a glossy film. If the amount is less than 0.5 part by weight, these effects cannot be obtained. If the amount exceeds 10 parts by weight, the chromium compound or silicate becomes excessive, causing stickiness by itself or impairing the appearance of the coating, which is limited.

【0038】(b)における組成の場合は、Al,M
g,Zn,Caの第一燐酸塩とコロイダルシリカとクロ
ム化合物の比率は被膜張力と被膜外観及び耐食性の制御
のため重要である。Al,Mg,Zn,Caの第一燐酸
塩100重量部に対し、コロイダルシリカ80重量部未
満では被膜張力が大きくなり、本発明のように低張力の
被膜が得られず、良好な密着性が達成できない。200
重量部超の場合には、低張力と被膜外観向上は十分に達
成されるが、バインダー不足によって被膜に亀裂を生
じ、耐食性を劣化するため制限される。
In the case of the composition in (b), Al, M
The ratio of primary phosphate of g, Zn, Ca, colloidal silica, and chromium compound is important for controlling film tension, film appearance and corrosion resistance. If the primary phosphate of Al, Mg, Zn, Ca is less than 80 parts by weight of colloidal silica, the coating tension becomes large, and a low-tension coating as in the present invention cannot be obtained, and good adhesion is obtained. I can't achieve it. 200
If the amount is more than 10 parts by weight, low tension and improvement in appearance of the coating can be sufficiently achieved, but cracks are generated in the coating due to insufficient binder, and corrosion resistance is deteriorated, so that it is limited.

【0039】次に、絶縁被膜の処理での被膜剤の塗布量
は良好な製品外観と加工性を得るのに重要である。付着
量2g/m2 未満では、絶縁被膜剤によるシール性が不
足して焼き付け時の雰囲気条件によって鋼板表面の酸化
が生じ、色調のムラを生じたり、酸化物発生による加工
性を害する。一方、6g/m2 超では絶縁被膜の厚み増
による占積率の劣化を生じたり、密着性の劣化を低下さ
せるため、制限される。
Next, the coating amount of the coating agent in the treatment of the insulating coating is important for obtaining a good product appearance and workability. If the adhesion amount is less than 2 g / m 2 , the sealing properties of the insulating coating agent will be insufficient, and oxidation of the steel sheet surface will occur depending on the atmospheric conditions at the time of baking, resulting in uneven color tone and impairing the workability due to the generation of oxides. On the other hand, if the thickness exceeds 6 g / m 2 , the space factor is deteriorated due to an increase in the thickness of the insulating film, and the deterioration of the adhesion is reduced.

【0040】[0040]

【実施例】【Example】

(実施例1)重量比でC;0.054%、Si;3.2
5%、Mn;0.10%、酸可溶Al;0.030%、
S;0.0070%、残部をFeと不可避の不純物から
なるスラブを1250℃の温度に加熱し、3.0mm厚に
熱延し、1130℃で焼鈍後酸洗して冷延し、最終板厚
0.5mm厚の冷延板とした。次いでN2 25%+H2
5%、露点65℃の雰囲気中で850℃×250秒の脱
炭焼鈍を行った後、750℃×60秒間、N2 25%+
2 75%+NH3 ドライ雰囲気で鋼中N量が200pp
m になるよう窒化処理を行って出発材とした。
(Example 1) C: 0.054% by weight, Si: 3.2 by weight ratio
5%, Mn: 0.10%, acid-soluble Al: 0.030%,
S: A slab comprising 0.0070%, the balance being Fe and unavoidable impurities, heated to a temperature of 1250 ° C., hot-rolled to a thickness of 3.0 mm, annealed at 1130 ° C., pickled and cold-rolled, The cold rolled sheet was 0.5 mm thick. Then N 2 25% + H 2 7
After decarburizing annealing at 850 ° C. × 250 seconds in an atmosphere having a dew point of 65 ° C. and 5%, N 2 25% +
H 2 75% + NH 3 in the steel N amount in a dry atmosphere 200pp
m was obtained as a starting material by performing a nitriding treatment.

【0041】この鋼板に表1に示すようにMgOにハロ
ゲン化合物を添加した焼鈍分離剤を塗布後、仕上げ焼鈍
条件として、昇温条件を図1の(1)に示すような雰囲
気とヒートサイクルで熱処理を行った。
As shown in Table 1, the steel sheet was coated with an annealing separator prepared by adding a halogen compound to MgO, and then, as a finish annealing condition, the temperature was raised under an atmosphere and heat cycle as shown in FIG. Heat treatment was performed.

【0042】次いで、この鋼板を1%H2 SO4 ,85
℃×15秒のライトピックリングを行った後、表2に示
す組成の絶縁被膜剤溶液を乾燥後の重量で3.0g/m
2 になるように焼き付け処理を行った。この試験におけ
る鋼板の表面状況、絶縁被膜処理後の鋼板の切断性、切
断後のエッジ部の状況、被膜密着性の結果を表3に示
す。
Next, the steel sheet was made 1% H 2 SO 4 , 85
After performing the topical ring at 15 ° C. × 15 seconds, the insulating coating agent solution having the composition shown in Table 2 was dried to have a weight of 3.0 g / m 2.
A baking process was performed so as to obtain 2 . Table 3 shows the surface condition of the steel sheet, the cutability of the steel sheet after the insulating film treatment, the state of the edge portion after the cutting, and the result of the film adhesion in this test.

【0043】[0043]

【表1】 [Table 1]

【0044】[0044]

【表2】 [Table 2]

【0045】[0045]

【表3】 [Table 3]

【0046】この試験の結果、本発明の焼鈍分離剤を適
用し、絶縁被膜剤として本発明の燐酸−酸化物系の組成
剤を使用した低張力絶縁被膜を焼き付け処理した場合に
は、何れも切断性、密着性等の加工性が極めて良好で、
密着性の優れた製品が得られた。一方、比較材の本発明
の焼鈍分離剤と絶縁被膜を適用しない場合には何れも、
切断性、密着性が悪く、特に絶縁被膜として高張力タイ
プの被膜剤を焼き付け処理した場合には密着性が極めて
劣る結果となった。図2は試料切断試験法で、1:試
料、2:切断刃、3:プレスを示す。
As a result of this test, when the annealing separator of the present invention was applied and a low-strength insulating film using the phosphoric acid-oxide type composition of the present invention as the insulating film agent was baked, any of them was baked. Extremely good workability such as cutability and adhesion,
A product with excellent adhesion was obtained. On the other hand, in the case where the annealing separator of the present invention and the insulating film of the comparative material are not applied, in any case,
The cutting properties and adhesion were poor, and especially when a high-tension type coating agent was baked as an insulating film, the adhesion was extremely poor. FIG. 2 shows a sample cutting test method, in which 1: sample, 2: cutting blade, 3: press.

【0047】(実施例2)実施例1と同一素材を出発材
として同様に処理した0.5mm厚の冷延板を同様にして
脱炭焼鈍と窒化焼鈍を行い、出発材とした。次いで、表
4に示す組成のハロゲン化合物を添加した焼鈍分離剤を
塗布し、最終焼鈍として図1に示すように昇温時の加熱
条件を変更して焼鈍した。次いで絶縁被膜剤として、7
5%H3 PO4 100ml+MgO 15g+ZnO
7g+CrO3 3gからなる処理剤を乾燥後の重量で
4.5g/m2 になるように塗布し、850℃×30秒
間の焼き付け処理を行った。この結果における絶縁被膜
特性と密着性の結果を表5に示す。
Example 2 The same material as in Example 1 was used as a starting material, and a cold-rolled sheet having a thickness of 0.5 mm, which was similarly treated, was similarly decarburized and nitrided to obtain a starting material. Next, an annealing separating agent to which a halogen compound having a composition shown in Table 4 was added was applied, and the final annealing was performed by changing the heating conditions at the time of raising the temperature as shown in FIG. Then, as an insulating coating agent, 7
5% H 3 PO 4 100 ml + MgO 15 g + ZnO
7 g + a CrO 3 3 g composed of the treatment agent was applied so as to 4.5 g / m 2 in weight after drying, it was baked for 850 ° C. × 30 seconds. Table 5 shows the results of the insulating film characteristics and the adhesion properties.

【0048】[0048]

【表4】 [Table 4]

【0049】[0049]

【表5】 [Table 5]

【0050】この試験結果、本発明の焼鈍分離剤と仕上
げ焼鈍によるものは何れも良好なグラスレス化が得ら
れ、特に1000℃で均熱保持した仕上げ焼鈍図1
(2)によるものは均一で完全なグラスレス状況であっ
た。その結果、切断性、打ち抜き性、等の加工性が何れ
も極めて優れた結果であった。一方、仕上げ焼鈍の昇温
速度の速い図1(3)の場合には僅かなグラス被膜層と
見られる酸化物の残留が認められ、切断性、打ち抜き性
等の加工性がかなり劣る結果となった。
As a result of the test, both the annealing separator of the present invention and the finish annealing resulted in good glasslessness, and in particular, the finish annealing maintained at 1000 ° C.
The result of (2) was a uniform and completely glassless condition. As a result, the workability such as the cutting property and the punching property was extremely excellent. On the other hand, in the case of FIG. 1 (3) in which the rate of temperature rise in the finish annealing is high, oxide residue which is seen as a slight glass coating layer is observed, resulting in considerably inferior workability such as cutability and punchability. Was.

【0051】[0051]

【発明の効果】本発明によれば、板厚の厚い方向性電磁
鋼板の製造において、グラス被膜を有さず、絶縁被膜の
密着性が優れ、特に、鉄心加工工程での打ち抜き性、切
断性等の加工性が極めて優れる方向性電磁鋼板を得るこ
とができる。
According to the present invention, in the production of a grain-oriented electrical steel sheet having a large thickness, it does not have a glass coating and has excellent adhesion of an insulating coating. It is possible to obtain a grain-oriented electrical steel sheet having extremely excellent workability such as

【図面の簡単な説明】[Brief description of the drawings]

【図1】実施例1,2における仕上げ焼鈍条件を示す図
表である。(1)と(2)は本発明の昇温条件によるも
のであり、(3)は比較例の仕上げ焼鈍条件である。
FIG. 1 is a table showing finish annealing conditions in Examples 1 and 2. (1) and (2) are based on the temperature raising condition of the present invention, and (3) is the finish annealing condition of the comparative example.

【図2】切断試験法を示す説明図である。30mm×20
0mmのサンプルを20枚積層し、切断刃に荷重を加えて
切断し、その時の切断荷重を記録した。
FIG. 2 is an explanatory diagram showing a cutting test method. 30mm × 20
Twenty samples of 0 mm were laminated and cut by applying a load to the cutting blade, and the cutting load at that time was recorded.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 石橋 希瑞 北九州市戸畑区飛幡町1番1号 新日本 製鐵株式会社 八幡製鐵所内 (72)発明者 杉山 公彦 北九州市戸畑区飛幡町1番1号 新日本 製鐵株式会社 八幡製鐵所内 (56)参考文献 特開 平5−263135(JP,A) 特開 平6−17137(JP,A) 特開 平5−311353(JP,A) 特開 平5−320770(JP,A) (58)調査した分野(Int.Cl.6,DB名) C22C 38/00 303 C21D 9/46 501 C23C 22/00 ──────────────────────────────────────────────────続 き Continuing on the front page (72) Inventor Kizu Ishibashi 1-1, Tobata-cho, Tobata-ku, Kitakyushu Nippon Steel Corporation Inside Yawata Works (72) Inventor, Kimihiko Sugiyama 1st, Tobita-cho, Tobata-ku, Kitakyushu No. 1 Nippon Steel Corporation Yawata Works (56) References JP-A-5-263135 (JP, A) JP-A-6-17137 (JP, A) JP-A-5-311353 (JP, A) JP-A-5-320770 (JP, A) (58) Fields investigated (Int. Cl. 6 , DB name) C22C 38/00 303 C21D 9/46 501 C23C 22/00

Claims (4)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 重量比でSi;2.5〜4.5%を含
み、鋼板表面のフォルステライト及びスピネル物の合計
量がMgO,SiO2 ,Al2 3 として0.45g/
2 以下であり、さらに絶縁被膜により鋼板表面にもた
らされる被膜張力が0.4kg/mm2 以下で、板厚0.3
5mm以上であることを特徴とする絶縁被膜特性の優れる
グラス被膜を有しない厚手方向性電磁鋼板。
1. A steel sheet containing 2.5 to 4.5% of Si by weight, and the total amount of forsterite and spinel on the surface of the steel sheet is 0.45 g / MgO, SiO 2 , Al 2 O 3.
m 2 or less, and the film tension brought to the steel sheet surface by the insulating film is 0.4 kg / mm 2 or less, and the sheet thickness is 0.3
A thick grain-oriented electrical steel sheet having no glass coating and having an excellent insulating coating characteristic characterized by being 5 mm or more.
【請求項2】 重量比で C ;0.021〜0.075%、 Si;2.5〜4.5%、 酸可溶Al;0.010〜0.040%、 N ;0.0030〜0.0130%、 S ≦0.0140%、 Mn;0.05〜0.45%、 残部がFeと不可避の不純物からなる珪素鋼スラブを熱
延し、1回或いは中間焼鈍を挟む2回以上の冷間圧延を
行って最終板厚0.35mm以上とした鋼板を脱炭焼鈍
し、窒化焼鈍し、焼鈍分離剤を塗布し、仕上げ焼鈍し、
絶縁被膜剤を塗布し、焼き付けとヒートフラットニング
することからなるグラス被膜を有さない方向性電磁鋼板
の製造方法において、焼鈍分離剤としてMgOに対し、
ハロゲン化合物の1種又は2種以上をそのハロゲン元素
量のトータルで2,000〜200,000ppm の範囲
で配合したスラリーを塗布し、最終仕上げ焼鈍として、
昇温時800〜1100℃における平均昇温率12℃/
Hr以下で仕上げ焼鈍後、その被膜張力が0.4kg/mm2
以下となるように絶縁被膜剤を焼き付け処理することを
特徴とする絶縁被膜特性の優れるグラス被膜を有しない
厚手方向性電磁鋼板の製造方法。
2. C: 0.021 to 0.075% by weight, Si: 2.5 to 4.5%, acid-soluble Al: 0.010 to 0.040%, N: 0.0030 to 0.2% by weight. 0.0130%, S ≦ 0.0140%, Mn: 0.05 to 0.45%, The remainder is hot-rolled with a silicon steel slab consisting of Fe and unavoidable impurities, and once or twice or more with intermediate annealing The steel sheet having a final sheet thickness of 0.35 mm or more is subjected to decarburizing annealing, nitriding annealing, applying an annealing separator, and finish annealing.
In a method of manufacturing a grain-oriented electrical steel sheet having no glass coating by applying an insulating coating agent and baking and heat flattening, MgO as an annealing separator,
A slurry in which one or more halogen compounds are blended in a total amount of 2,000 to 200,000 ppm of the halogen element amount is applied, and the final finish annealing is performed.
Average temperature rise rate at 800-1100 ° C during temperature rise 12 ° C /
After finish annealing at Hr or less, the coating tension is 0.4 kg / mm 2
A method for producing a thick grain-oriented electrical steel sheet having no glass coating having excellent insulating coating properties, comprising baking an insulating coating agent as follows .
【請求項3】 焼鈍分離剤に添加するハロゲン化合物
が、H,Li,Na,K,Mg,Ca,Sr,Ba,T
i,Zr,V,Ta,Cr,Mo,W,Mn,Fe,C
o,Ni,Cu,Zn,Ag,Cd,Al,Sn,P
b,Sb,Bi,Bの中から選ばれる1種又は2種以上
であることを特徴とする請求項1又は2記載の絶縁被膜
特性の優れるグラス被膜を有しない厚手方向性電磁鋼板
の製造方法。
3. The method according to claim 1, wherein the halogen compound added to the annealing separator is H, Li, Na, K, Mg, Ca, Sr, Ba, T
i, Zr, V, Ta, Cr, Mo, W, Mn, Fe, C
o, Ni, Cu, Zn, Ag, Cd, Al, Sn, P
3. The method for producing a thick grain-oriented electrical steel sheet having no glass coating having excellent insulating coating properties according to claim 1 or 2, wherein at least one selected from b, Sb, Bi, and B is selected. .
【請求項4】 絶縁被膜処理剤を (a)燐酸100重量部とAl2 3 ,MgO,Zn
O,CaOの1種又は2種以上15〜35重量部及びク
ロム酸、ほう酸、珪酸化合物の1種又は2種以上0.5
〜10重量部 (b)Al,Mg,Zn,Caの第一燐酸塩100重量
部に対し、コロイダルシリカ80〜200重量部とクロ
ム化合物を4〜22重量部 からなる処理液とし乾燥、焼き付け後の重量で2〜6g
/m2 の範囲で塗布することを特徴とする請求項2又は
3記載の絶縁被膜特性の優れるグラス被膜を有しない厚
手方向性電磁鋼板の製造方法。
4. An insulating film treating agent comprising: (a) 100 parts by weight of phosphoric acid, Al 2 O 3 , MgO, Zn
15 to 35 parts by weight of one or more of O, CaO and one or more of chromic acid, boric acid, and silicate compound
(B) 100 to 100 parts by weight of primary phosphate of Al, Mg, Zn, and Ca, a processing solution consisting of 80 to 200 parts by weight of colloidal silica and 4 to 22 parts by weight of a chromium compound is dried and baked. 2-6g in weight
The method for producing a thick grain-oriented electrical steel sheet having no glass coating having excellent insulating coating properties according to claim 2 or 3, wherein the coating is applied in the range of / m 2 .
JP3103895A 1995-02-20 1995-02-20 Thick grain-oriented electrical steel sheet having no glass coating with excellent insulating coating properties and method for producing the same Expired - Lifetime JP2953978B2 (en)

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JP2953978B2 true JP2953978B2 (en) 1999-09-27

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Publication number Priority date Publication date Assignee Title
JP2002057019A (en) * 2000-05-30 2002-02-22 Nippon Steel Corp Unidirectionally grain-oriented magnetic steel sheet for low-noise transformer
JP4224957B2 (en) * 2001-07-24 2009-02-18 Jfeスチール株式会社 Method for producing grain-oriented electrical steel sheet having no undercoat
JP4569070B2 (en) * 2003-03-13 2010-10-27 Jfeスチール株式会社 Finish annealing method for grain-oriented electrical steel sheets
JP5633178B2 (en) * 2010-04-27 2014-12-03 Jfeスチール株式会社 Annealing separator for grain-oriented electrical steel sheet
JP6074129B2 (en) * 2010-09-07 2017-02-01 新日鐵住金株式会社 Electrical steel sheet with insulation film
KR102177038B1 (en) 2014-11-14 2020-11-10 주식회사 포스코 Insulation coating composite for oriented electrical steel steet, oriented electrical steel steet formed insulation coating film on using the same insulation coating composite, and method of manufacturing the same oriented electrical steel steet
KR101696627B1 (en) * 2014-11-26 2017-01-16 주식회사 포스코 Annealing separating agent composition for base coating free electrical steel sheet, and method for manufacturing base coating free electrical steel sheet using the same
EP4063534A4 (en) * 2019-11-21 2022-12-28 Nippon Steel Corporation Non-oriented electromagnetic steel sheet and method for producing same

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