JPH0415831U - - Google Patents
Info
- Publication number
- JPH0415831U JPH0415831U JP5782790U JP5782790U JPH0415831U JP H0415831 U JPH0415831 U JP H0415831U JP 5782790 U JP5782790 U JP 5782790U JP 5782790 U JP5782790 U JP 5782790U JP H0415831 U JPH0415831 U JP H0415831U
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- vapor deposition
- deposition material
- chamber
- planetar
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000463 material Substances 0.000 claims description 3
- 238000007740 vapor deposition Methods 0.000 claims description 3
- 238000001704 evaporation Methods 0.000 claims description 2
- 238000007738 vacuum evaporation Methods 0.000 claims 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 235000015067 sauces Nutrition 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
- Electrodes Of Semiconductors (AREA)
- Junction Field-Effect Transistors (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5782790U JPH0415831U ( ) | 1990-05-30 | 1990-05-30 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5782790U JPH0415831U ( ) | 1990-05-30 | 1990-05-30 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0415831U true JPH0415831U ( ) | 1992-02-07 |
Family
ID=31582889
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5782790U Pending JPH0415831U ( ) | 1990-05-30 | 1990-05-30 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0415831U ( ) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07202349A (ja) * | 1993-12-14 | 1995-08-04 | Korea Electron Telecommun | Mbe材結晶成長の分子線回折を利用した量子細線レーザーダイオードの製造方法 |
KR100934073B1 (ko) * | 2002-07-04 | 2009-12-24 | 독키 가부시키가이샤 | 증착장치 및 박막제작방법 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6215566B2 ( ) * | 1976-10-19 | 1987-04-08 | Kao Corp |
-
1990
- 1990-05-30 JP JP5782790U patent/JPH0415831U/ja active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6215566B2 ( ) * | 1976-10-19 | 1987-04-08 | Kao Corp |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07202349A (ja) * | 1993-12-14 | 1995-08-04 | Korea Electron Telecommun | Mbe材結晶成長の分子線回折を利用した量子細線レーザーダイオードの製造方法 |
KR100934073B1 (ko) * | 2002-07-04 | 2009-12-24 | 독키 가부시키가이샤 | 증착장치 및 박막제작방법 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPH0415831U ( ) | ||
JPH0448259U ( ) | ||
JPH0363569U ( ) | ||
JPS61177439U ( ) | ||
JPS6297166U ( ) | ||
JPH0287065U ( ) | ||
JPS6237080U ( ) | ||
JPS6329928U ( ) | ||
Dobierzewska-Mozrzymas | Influence of the Substrate Temperature and Evaporation Rate on the Crystallographic Orientation of Aluminum Layers | |
JPS6411962A (en) | Formation of thin film of racemic compound | |
JPH0429654U ( ) | ||
JPH0399762U ( ) | ||
JPS62141061U ( ) | ||
JPS63127974U ( ) | ||
JPS6311557U ( ) | ||
JPH0242062U ( ) | ||
JPH0290664U ( ) | ||
JPS632764U ( ) | ||
JPH0251259U ( ) | ||
JPS61176257U ( ) | ||
JPS57207331A (en) | Manufacture of semiconductor device | |
JPS57131364A (en) | Forming device for vapor deposited metallic film of tubes, globes or the like | |
JPS6350122U ( ) | ||
JPS6260253U ( ) | ||
JPS6043480A (ja) | 真空蒸着用蒸発源ルツボ |