JPH04141241A - Cleaning apparatus for instrument used in ultramicroanalysis - Google Patents
Cleaning apparatus for instrument used in ultramicroanalysisInfo
- Publication number
- JPH04141241A JPH04141241A JP26428090A JP26428090A JPH04141241A JP H04141241 A JPH04141241 A JP H04141241A JP 26428090 A JP26428090 A JP 26428090A JP 26428090 A JP26428090 A JP 26428090A JP H04141241 A JPH04141241 A JP H04141241A
- Authority
- JP
- Japan
- Prior art keywords
- instrument
- teflon
- chemical agent
- container
- cleaning
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004140 cleaning Methods 0.000 title claims abstract description 34
- 239000002253 acid Substances 0.000 claims abstract description 11
- 239000011347 resin Substances 0.000 claims abstract description 3
- 229920005989 resin Polymers 0.000 claims abstract description 3
- 239000000126 substance Substances 0.000 claims description 36
- 238000010438 heat treatment Methods 0.000 claims description 8
- 238000012929 ultra trace analysis Methods 0.000 claims description 6
- 239000004809 Teflon Substances 0.000 abstract description 52
- 229920006362 Teflon® Polymers 0.000 abstract description 52
- 239000012535 impurity Substances 0.000 abstract description 4
- 238000011109 contamination Methods 0.000 abstract description 3
- 239000013043 chemical agent Substances 0.000 abstract 10
- 239000003814 drug Substances 0.000 description 13
- 229940079593 drug Drugs 0.000 description 6
- 239000007789 gas Substances 0.000 description 6
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 4
- 238000000034 method Methods 0.000 description 3
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 229910017604 nitric acid Inorganic materials 0.000 description 2
- 238000012805 post-processing Methods 0.000 description 2
- 238000009835 boiling Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000003517 fume Substances 0.000 description 1
- 239000000825 pharmaceutical preparation Substances 0.000 description 1
- 229940127557 pharmaceutical product Drugs 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 229910021642 ultra pure water Inorganic materials 0.000 description 1
- 239000012498 ultrapure water Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Automatic Analysis And Handling Materials Therefor (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Devices For Use In Laboratory Experiments (AREA)
Abstract
Description
【発明の詳細な説明】
〈産業上の利用分野〉
本発明は例えば超微量分析の試料調整時に使用されるテ
フロン容器、分析時に使用されるテフロン製容器及び治
具等を硝酸、フッ酸等の薬品を用いて洗浄する超微量分
析に使用される器具の洗浄装置に関する（以下、これを
洗浄装置とする）。Detailed Description of the Invention <Industrial Application Field> The present invention is applicable to, for example, Teflon containers used in sample preparation for ultra-trace analysis, Teflon containers and jigs used in analysis, etc. This invention relates to a cleaning device for instruments used in ultra-trace analysis that uses chemicals to clean them (hereinafter referred to as the cleaning device).
〈従来の技術〉
この種の洗浄装置の従来例として以下に述べるような装
置がある。<Prior Art> As a conventional example of this type of cleaning device, there is a device as described below.
即ち、適当な大きさの容器に予め超高純度の薬品を入れ
ておき、この薬品中に洗浄すべき器具を入れる。そして
適当な時間だけ薬品を加熱してボイルさせると、器具に
付着した汚れが洗浄されるようになっている。That is, an ultra-high purity chemical is placed in a container of an appropriate size in advance, and the instruments to be cleaned are placed in this chemical. By heating the chemicals for an appropriate amount of time and boiling them, the dirt adhering to the equipment will be cleaned.
〈発明が解決しようとする課題〉
しかしながら、上記従来例による場合には以下に述べる
ような数々の欠点が指摘されている。<Problems to be Solved by the Invention> However, in the case of the above conventional example, a number of drawbacks as described below have been pointed out.
まず、洗浄の方式上、大量の薬品を必要とする他、非常
に高純度のものを使用しなければならないので、薬品に
ついてのコストが非常に高い。First, the cleaning method requires a large amount of chemicals and also requires the use of extremely high-purity chemicals, so the cost of chemicals is extremely high.
また、高純度の薬品を使用したとしても、非常に低いレ
ベルの分析を行う関係上、薬品に含まれる不純物により
逆汚染される。しかも大量の薬品を使用するので後処理
にも注意が必要で、この作業が非常に煩わしいという欠
点がある。Furthermore, even if highly purified chemicals are used, they are subject to back contamination due to the very low level of analysis performed by impurities contained in the chemicals. Moreover, since a large amount of chemicals are used, care must be taken in post-processing, which has the disadvantage that this work is extremely troublesome.
更に、薬品としては硝酸、フッ酸等の使用するのでその
取扱には厳重に注意をする必要があることは勿論である
が、作業員が薬品の入った容器の中に器具を出し入れす
る際、非常に危険な状態にさらされ、安全上、非常に大
きな問題がある。Furthermore, since chemicals such as nitric acid and hydrofluoric acid are used, it goes without saying that strict care must be taken when handling them. They are exposed to extremely dangerous conditions and pose a huge safety issue.
本発明は上記事情に鑑みて創案されたものであり、その
目的とするところは、上記欠点を一挙に解消することが
できる洗浄装置を提供することにある。The present invention was devised in view of the above circumstances, and its purpose is to provide a cleaning device that can eliminate the above drawbacks all at once.
〈課題を解決するための手段〉
本発明にかかる洗浄装置は、洗浄すべき耐酸性樹脂から
なる器具を収納する密閉容器と、密閉容器の内部でも前
記器具とは接触しない位置に設けてある酸系の薬品を貯
める薬品容器と、前記薬品を加熱し前記器具を洗浄する
ための洗浄ガスを生成する加熱手段とを具備している。<Means for Solving the Problems> The cleaning device according to the present invention includes a sealed container that houses an instrument made of acid-resistant resin to be cleaned, and an acid container that is provided inside the sealed container at a position that does not come into contact with the instrument. The apparatus includes a chemical container for storing a system chemical, and a heating means for heating the chemical and generating a cleaning gas for cleaning the instrument.
〈作用〉
薬品容器に酸系の薬品を入れ、密閉容器に洗浄前の器具
を入れる。そしてこの状態で加熱手段により薬品を加熱
させてこれを気化させる。すると、このとき発生した洗
浄ガスは薬品容器から出て、密閉容器の中を充満するが
、この外には洩れない。<Operation> Place acid-based chemicals in a chemical container and place unwashed instruments in an airtight container. In this state, the heating means heats the chemical to vaporize it. Then, the cleaning gas generated at this time comes out of the chemical container and fills the airtight container, but does not leak outside.
また、器具は洗浄ガスの雰囲気中に置かれているので、
この洗浄ガスにより器具の全体にさらされ、器具に付着
した汚れが溶解し洗浄される。Also, since the equipment is placed in an atmosphere of cleaning gas,
The entire instrument is exposed to this cleaning gas, and dirt adhering to the instrument is dissolved and cleaned.
〈実施例〉
以下、本発明にかかる洗浄装置の一実施例を図面を参照
して説明する。<Example> Hereinafter, one example of the cleaning device according to the present invention will be described with reference to the drawings.
第１図は洗浄装置の縦断面図、第２図は洗浄後の様子を
示す第１図に対応する図、第３図はテフロン製カゴ４の
底面図である。FIG. 1 is a longitudinal sectional view of the cleaning device, FIG. 2 is a view corresponding to FIG. 1 showing the state after cleaning, and FIG. 3 is a bottom view of the Teflon basket 4.
第１図中１はテフロン製密閉容器である。このテフロン
製密閉容器１は有底の円筒体であって、この開口面にテ
フロン製密閉容器蓋２を被せると、この内部が密閉され
るような構造となっている。1 in FIG. 1 is a Teflon sealed container. This Teflon airtight container 1 is a cylindrical body with a bottom, and has a structure such that when a Teflon airtight container lid 2 is placed over the opening surface, the inside of the Teflon airtight container 1 is sealed.
また、テフロン製密閉容器ｌの底部には加熱ヒータ６が
備えられており、テフロン製密閉容器蓋２には、内部の
薬品蒸気（後述する）を抜くための栓３が設けられてい
る。Further, a heater 6 is provided at the bottom of the Teflon sealed container 1, and a plug 3 is provided on the Teflon sealed container lid 2 for releasing chemical vapor (described later) inside.
二のような構造のテフロン製密閉容器１の内部には、図
示のようにテフロン製薬品容器５、テフロン製カゴ４を
収納できるようになっている。Inside the Teflon airtight container 1 having the structure shown in FIG. 2, a Teflon pharmaceutical container 5 and a Teflon basket 4 can be housed as shown.
テフロン製薬品容器５はテフロン製密閉容器１よりやや
小さいめの有底の円筒体であり、この内部に薬品７（硝
酸、フッ酸もしくはこれらの混酸）を貯めるような構成
となっている。The Teflon drug container 5 is a cylindrical body with a bottom that is slightly smaller than the Teflon airtight container 1, and is configured to store a chemical 7 (nitric acid, hydrofluoric acid, or a mixed acid thereof) inside.
なお、テフロン製薬品容器５をテフロン製密閉容器１の
内部にセットした状態では、テフロン製薬品容器５の外
底面とテフロン製密閉容器１の内定面とが接触するよう
になっており、これで加熱ヒータ６からの熱が効率よく
薬品７に伝達されるようになっている。Note that when the Teflon pharmaceutical container 5 is set inside the Teflon sealed container 1, the outer bottom surface of the Teflon pharmaceutical container 5 and the internal surface of the Teflon sealed container 1 are in contact with each other. Heat from the heater 6 is efficiently transferred to the medicine 7.
一方、テフロン製カゴ４はテフロン製薬品容器５よりや
や小さいめの有底の円筒体であり、洗浄すべき器具８を
収納するような構成となっている。On the other hand, the Teflon basket 4 is a cylindrical body with a bottom that is slightly smaller than the Teflon pharmaceutical product container 5, and is configured to house instruments 8 to be cleaned.
しかもこの底面には薬品蒸気が通るための穴４１（第３
図参照）が複数設けられている。Moreover, this bottom has a hole 41 (third hole) for the chemical vapor to pass through.
(see figure) are provided.
但し、テフロン製カゴ４をテフロン製薬品容器５の内部
にセットした状態で、テフロン製薬品容器５に入れられ
た薬品７の上面がテフロン製カゴ４の底面に接触しない
ようにするべく、テフロン製カゴ４の高さ及び薬品７の
量を設定する。However, in order to prevent the top surface of the medicine 7 placed in the Teflon pharmaceutical container 5 from coming into contact with the bottom surface of the Teflon basket 4 when the Teflon basket 4 is set inside the Teflon pharmaceutical container 5, The height of the basket 4 and the amount of medicine 7 are set.
以上のような構造の洗浄装置により器具８を洗浄するま
での過程にフいて説明する。The process up to cleaning the instrument 8 using the cleaning device having the above structure will be explained.
まず、テフロン製密閉容器１からテフロン製密閉容器蓋
２を外して、テフロン製カゴ４、テフロン製薬品容器５
を取り出す。そして、テフロン製薬品容器５に適宜な量
の薬品７を入れ、これをテフロン製密閉容器１に戻す。First, remove the Teflon airtight container lid 2 from the Teflon airtight container 1, and then remove the Teflon airtight container 4 and the Teflon pharmaceutical container 5.
Take out. Then, an appropriate amount of medicine 7 is put into the Teflon pharmaceutical container 5, and this is returned to the Teflon sealed container 1.
次いで、テフロン製カゴ４を戻す。この状態で、テフロ
ン製カゴ４の内底面に器具８を置く。このとき、器具８
が容器であるならば、口を下になるように伏せて置く。Next, the Teflon basket 4 is returned. In this state, the instrument 8 is placed on the inner bottom surface of the Teflon basket 4. At this time, the device 8
If it is a container, place it face down with the mouth facing down.
そして、テフロン製密閉容器１にテフロン製密閉容器蓋
２をセットする。Then, the Teflon sealed container lid 2 is set on the Teflon sealed container 1.
その後、加熱ヒータ６を所定期間通電して薬品７を気化
させる。すると、気化した薬品蒸気（洗浄ガスに相当す
る）は開口４２を通じて器具８の全体にあたり、これで
器具８に付着した汚れが溶解し洗浄される。加熱終了後
は栓３をドラフト内で抜き、テフロン製密閉容器１の内
の薬品蒸気を完全に外に出す。そして、ドラフト外でテ
フロン製密閉容器ｌからテフロン製密閉容器蓋２を外し
、器具８はそのままにした状態でテフロン製カゴ４を一
旦外に取り出す。次いでテフロン製薬品容器５を取り出
し、外に取り出したテフロン製カゴ４を元に戻す。第２
図はこの状態を示している。その後、超純水をテフロン
製密閉容器工の内部に注ぎ込んでオーバーフローさせ、
器具８等を水洗浄する。そしてテフロン製カゴ４から器
具８を外に取り出すと、これで一連の洗浄作業が終了す
る。Thereafter, the heater 6 is energized for a predetermined period of time to vaporize the chemical 7. Then, the vaporized chemical vapor (corresponding to cleaning gas) hits the entire instrument 8 through the opening 42, thereby dissolving the dirt adhering to the instrument 8 and cleaning it. After heating, the stopper 3 is removed in the fume hood to completely release the chemical vapor inside the Teflon sealed container 1. Then, the Teflon sealed container lid 2 is removed from the Teflon sealed container l outside the draft, and the Teflon basket 4 is temporarily taken out with the instrument 8 left as it is. Next, the Teflon pharmaceutical container 5 is taken out, and the Teflon basket 4 taken out is returned to its original position. Second
The figure shows this situation. After that, ultrapure water is poured into the Teflon sealed container and allowed to overflow.
Wash equipment 8 etc. with water. When the instrument 8 is taken out from the Teflon basket 4, the series of cleaning operations is completed.
従って、本実施例の洗浄装置による場合には、薬品７を
気化させて、気化させた薬品蒸気を器具８にさらして、
これを洗浄するようになっているので、低純度の薬品７
を使用しても器具８が逆汚染されるということがなく、
必要とする薬品７も少量でよい。これに伴って、薬品７
に要するコストを大幅に下げることができる。Therefore, in the case of the cleaning device of this embodiment, the chemical 7 is vaporized and the vaporized chemical vapor is exposed to the instrument 8.
Since this is designed to be cleaned, low-purity chemicals 7
Even if the instrument 8 is used, the instrument 8 will not be contaminated,
Only a small amount of the chemical 7 is required. Along with this, drug 7
The cost required can be significantly reduced.
また、テフロン製カゴ４を用いてテフロン製密閉容器１
から器具８の出し入れするようになっているので、器具
８の出し入れが非常に楽である。In addition, using a Teflon basket 4, a Teflon airtight container 1
Since the instrument 8 is put in and taken out from the opening, it is very easy to put in and take out the instrument 8.
更に、テフロン製薬品容器５内の薬品７には触れること
がないので、非常に安全である。Furthermore, the medicine 7 inside the Teflon drug container 5 is not touched, so it is very safe.
従って、従来と比較すると、装置としての性能を大幅に
上げることができ、高精度な超微量分析を行う上でも非
常に大きな意義がある。Therefore, compared to the conventional method, the performance of the device can be significantly improved, and it is also of great significance in performing highly accurate ultra-trace analysis.
なお、本発明にかかる洗浄装置は上記実施例に限定され
ず、密閉容器と薬品容器の位置関係については、薬品容
器が器具の接触しない構造であれは如何なるものでもよ
い。また、加熱手段についても赤外線加熱方式によるも
のでも構わない。Note that the cleaning device according to the present invention is not limited to the above-mentioned embodiments, and any positional relationship between the closed container and the drug container may be used as long as the drug container does not come into contact with the device. Further, the heating means may also be an infrared heating method.
〈発明の効果〉
以上、本発明にかかる洗浄装置による場合には、酸系の
薬品を気化させ、気化させた洗浄ガスを器具にさらして
これを洗浄するようになっているので、薬品について高
純度のものを大量に使用する必要がなく、これに伴って
薬品についてのコストを低く抑えることができる。しか
も薬品の含まれる不純物により器具が逆汚染されるとい
うおそれもない。<Effects of the Invention> As described above, in the case of the cleaning device according to the present invention, acid-based chemicals are vaporized and the vaporized cleaning gas is exposed to the equipment to clean it, so that it is possible to clean the equipment with high concentrations of chemicals. There is no need to use large amounts of highly purified drugs, and the cost of chemicals can be kept low accordingly. Moreover, there is no fear that the instruments will be contaminated by impurities contained in the chemicals.
また、使用する薬品の量は少しで良いので、従来に比べ
ると、後処理が非常に楽である。Additionally, since only a small amount of chemicals are needed, post-processing is much easier than in the past.
更に、密閉容器から器具を出し入れする際、密閉容器内
の薬品には触れることがないので、非常に安全である。Furthermore, when taking the equipment in and out of the sealed container, the medicine inside the sealed container is not touched, so it is very safe.
従って、装置としての性能を大きく高めることができ、
高精度な超微量分析を行う上でも非常に大きな意義があ
る。Therefore, the performance of the device can be greatly improved.
It is also of great significance in performing highly accurate ultra-trace analysis.
第１図乃至第３図は本発明にかかる洗浄装置の一実施例
を説明するための図であって、第１図は洗浄装置の縦断
面図、第２図は洗浄後の様子を示す第１図に対応する図
、第３図はテフロン製カゴの底面図である。
テフロン製密閉容器
テフロン製密閉容器蓋
テフロン製カゴ
テフロン製薬品容器
加熱ヒータ
・薬品
・器具1 to 3 are diagrams for explaining one embodiment of the cleaning device according to the present invention, in which FIG. 1 is a longitudinal sectional view of the cleaning device, and FIG. 2 is a diagram showing the state after cleaning. FIG. 3, which corresponds to FIG. 1, is a bottom view of the Teflon basket. Teflon airtight container Teflon airtight container lid Teflon basket Teflon pharmaceutical container heater, medicine, equipment
Claims (2)
閉容器と、密閉容器の内部でも前記器具とは接触しない
位置に設けてある酸系の薬品を貯める薬品容器と、前記
薬品を加熱し前記器具を洗浄するための洗浄ガスを生成
する加熱手段とを具備していることを特徴とする超微量
分析に使用される器具の洗浄装置。(1) An airtight container that stores an instrument made of acid-resistant resin to be cleaned, a chemical container that stores an acid-based chemical located inside the airtight container at a position where it does not come into contact with the equipment, and a container that stores an acid-based chemical that is heated. 1. A cleaning device for instruments used in ultratrace analysis, comprising heating means for generating a cleaning gas for cleaning the instruments.
を設けたことを特徴とする請求項１記載の超微量分析に
使用される器具の洗浄装置。(2) The apparatus for cleaning instruments used in ultratrace analysis according to claim 1, further comprising a basket for taking instruments in and out of the closed container.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP26428090A JPH04141241A (en) | 1990-10-01 | 1990-10-01 | Cleaning apparatus for instrument used in ultramicroanalysis |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP26428090A JPH04141241A (en) | 1990-10-01 | 1990-10-01 | Cleaning apparatus for instrument used in ultramicroanalysis |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH04141241A true JPH04141241A (en) | 1992-05-14 |
Family
ID=17400976
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP26428090A Pending JPH04141241A (en) | 1990-10-01 | 1990-10-01 | Cleaning apparatus for instrument used in ultramicroanalysis |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH04141241A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002200463A (en) * | 2000-12-28 | 2002-07-16 | Toshiba Ceramics Co Ltd | Method for cleaning fluororesin-made instrument |
| US20100276394A1 (en) * | 2003-08-06 | 2010-11-04 | Micron Technology, Inc. | MICROFEATURE WORKPIECE PROCESSING SYSTEM FOR, e.g., SEMICONDUCTOR WAFER ANALYSIS |
| CN103191881A (en) * | 2013-03-28 | 2013-07-10 | 凌强 | Improved workpiece cleaning device |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6335789A (en) * | 1986-07-30 | 1988-02-16 | Daido Steel Co Ltd | Washing device |
| JPS6346155U (en) * | 1986-09-16 | 1988-03-29 | ||
| JPH02152233A (en) * | 1988-12-02 | 1990-06-12 | Mitsubishi Electric Corp | Cleaning apparatus |
-
1990
- 1990-10-01 JP JP26428090A patent/JPH04141241A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6335789A (en) * | 1986-07-30 | 1988-02-16 | Daido Steel Co Ltd | Washing device |
| JPS6346155U (en) * | 1986-09-16 | 1988-03-29 | ||
| JPH02152233A (en) * | 1988-12-02 | 1990-06-12 | Mitsubishi Electric Corp | Cleaning apparatus |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002200463A (en) * | 2000-12-28 | 2002-07-16 | Toshiba Ceramics Co Ltd | Method for cleaning fluororesin-made instrument |
| US20100276394A1 (en) * | 2003-08-06 | 2010-11-04 | Micron Technology, Inc. | MICROFEATURE WORKPIECE PROCESSING SYSTEM FOR, e.g., SEMICONDUCTOR WAFER ANALYSIS |
| US8765000B2 (en) * | 2003-08-06 | 2014-07-01 | Micron Technology, Inc. | Microfeature workpiece processing system for, e.g., semiconductor wafer analysis |
| CN103191881A (en) * | 2013-03-28 | 2013-07-10 | 凌强 | Improved workpiece cleaning device |
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