JPH04137749A - Semiconductor integrated circuit - Google Patents

Semiconductor integrated circuit

Info

Publication number
JPH04137749A
JPH04137749A JP26104490A JP26104490A JPH04137749A JP H04137749 A JPH04137749 A JP H04137749A JP 26104490 A JP26104490 A JP 26104490A JP 26104490 A JP26104490 A JP 26104490A JP H04137749 A JPH04137749 A JP H04137749A
Authority
JP
Japan
Prior art keywords
wiring
area
section
peripheral cell
functional block
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP26104490A
Other languages
Japanese (ja)
Inventor
Hiroyuki Nakao
中尾 浩之
Shinji Suda
須田 眞二
Toshihiko Hori
俊彦 堀
Tsugumi Matsuishi
松石 継巳
Kyoko Tanabe
田部 恭子
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP26104490A priority Critical patent/JPH04137749A/en
Publication of JPH04137749A publication Critical patent/JPH04137749A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To realize high integration by arranging a part of wiring, congested in wiring areas, in a peripheral cell area. CONSTITUTION:A wiring 6 connecting between an R/L(random logic) section 1 and the part lower than the upper side of an MUC section 2 and a wiring 6 connecting between the MCU section 2 and the part upper than the lower side of the R/L(random logic) section 1 are congested in a wiring area 4 where the R/L section 1, the MCU section 2 and peripheral cell area 3 are located closely each other. Peripheral cells 5 are dislocated to an empty area 3 located closely to the congested wiring 6 and a part of the wiring 6 in the congested wiring area 4 is arranged in an empty area provided in the peripheral cell area 3 by dislocating the peripheral cells 5. According to the constitution, wiring density is increased in the wiring area and overall chip size is reduced resulting in high integration.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 この発明は、半導体集積回路に関するものである。[Detailed description of the invention] [Industrial application field] The present invention relates to a semiconductor integrated circuit.

〔従来の技術〕[Conventional technology]

第2図は従来の半導体集積回路のレイアウト図である。 FIG. 2 is a layout diagram of a conventional semiconductor integrated circuit.

第2図において、(1)はR/L (ランダムロジック
)部、(2)はMCU部、(3)は周辺セル領域、(4
)は配線領域、(5)は周辺セル、(6)は配線である
。ここで、R/L (ランダムロジック)部(1)と周
辺セル(5)及びMCU部(2)と周辺セル(5)をそ
れぞれ接続し、R/L (ランダムロジック部(1)と
MCU部(2)は周辺セル(5)を介して接続されてい
る。
In Figure 2, (1) is the R/L (random logic) section, (2) is the MCU section, (3) is the peripheral cell area, and (4) is the MCU section.
) is a wiring area, (5) is a peripheral cell, and (6) is a wiring. Here, the R/L (random logic) section (1) and the peripheral cell (5) and the MCU section (2) and the peripheral cell (5) are connected, respectively, and the R/L (random logic section (1) and the MCU section (2) are connected via peripheral cells (5).

図示の様にR/L (ランダムロジック)部(1)とM
CU部(2)は直接に接続されず、必ず、周辺セル(5
)を介して接続しであるために、R/L (ランダムロ
ジック)部(1)からMCU部(2)側の周辺セル(5
)に接続される配線(6)とMCU部(2)から、R/
L (ランダムロジック部(1)側の周辺セル(5)に
接続される配線(6)か集まるR/L (ランダムロジ
ック)部(1)とMCU部(2)と周辺セル領域(3)
とが近接する配線領域(4)は配線(6)が密集する。
As shown, R/L (random logic) part (1) and M
The CU unit (2) is not directly connected and must be connected to the peripheral cell (5).
), the peripheral cells (5) from the R/L (random logic) unit (1) to the MCU unit (2)
) from the wiring (6) connected to the MCU section (2), the R/
L (Random logic) part (1), MCU part (2), and peripheral cell area (3) where the wiring (6) connected to the peripheral cell (5) on the random logic part (1) side gathers
In the wiring area (4) where the wirings (6) are close to each other, the wirings (6) are densely arranged.

次に動作について説明する。R/Lランタムロジック)
部(1)とMCU部(2)はそれぞれ周辺セル(5)に
接続し、R/L (ランダム・ロジック)部(1)とM
CU部(2)を接続する配線は、周辺セル(5)を介し
て配線しであるのでR/L(ランダム・ロジック)部(
1)MCU部(2)9周辺セル領域(3)が近接する部
分の配線領域(4)に配線が密集する。
Next, the operation will be explained. R/L random logic)
The R/L (random logic) section (1) and the MCU section (2) are connected to the peripheral cell (5), respectively.
The wiring connecting the CU section (2) is routed through the peripheral cell (5), so the R/L (random logic) section (
1) Wiring is densely arranged in the wiring region (4) of the MCU section (2) 9 in the vicinity of the peripheral cell region (3).

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

従来の半導体集積回路は以上のように構成されているの
で、配線領域(4)の幅が、R/L (う9、ダム・ロ
ジック)部(1)、MCU部(2)。
Since the conventional semiconductor integrated circuit is configured as described above, the width of the wiring area (4) is the same as that of the R/L (dumb logic) part (1) and the MCU part (2).

周辺セル領域(3)が近接する配線領域(4)の幅によ
って決定してしまい、R/L (ランダム・ロジック)
部(1)、MCU部(2)1周辺セル領域(3)が近接
する配線領域(4)以外の配線領域内に、配線かレイア
ウトされていない空き領域か生じる問題点があった。
The peripheral cell area (3) is determined by the width of the adjacent wiring area (4), resulting in R/L (random logic)
There is a problem in that there is a vacant area where no wiring or layout is laid out in the wiring area other than the wiring area (4) to which the peripheral cell area (3) of the MCU unit (2) and the peripheral cell area (3) is adjacent.

この発明は上記のような問題点を解消するためになされ
たもので、R/L (ランタム・ロジック)部(1)、
MCU部(2)1周辺セル領域(3)が近接する領域以
外の配線領域内に生じる空き領域をなくすことができる
とともに、配線領域の配線密度を大きくすることがてき
、チップ全体のサイズを小さくし、半導体集積回路の高
集積化を目的とする。
This invention was made to solve the above problems, and includes an R/L (random logic) section (1),
It is possible to eliminate the empty area that occurs in the wiring area other than the area adjacent to the MCU section (2) 1 and the peripheral cell area (3), and it is also possible to increase the wiring density in the wiring area, reducing the overall size of the chip. The aim is to increase the degree of integration of semiconductor integrated circuits.

〔課題を解決するための手段〕[Means to solve the problem]

この発明における半導体集積回路は、R/L(ランダム
・ロジック)部(1)、MCU部(2)9周辺セル領域
(3)が近接する配線領域(4)の密集した配線(6)
の一部分を、周辺セル(5)の配置を移動させて作フた
周辺セル領域(3)内の空き領域に配置することで、R
/L(ランダムロジック)部(1)、MCU部(2)9
周辺セル領域(3)か近接する配線領域(4)以外の配
線領域(4)内に生じていた空き領域をなくすことがで
きる。
The semiconductor integrated circuit according to the present invention has dense wiring (6) in a wiring area (4) adjacent to an R/L (random logic) part (1), an MCU part (2), and a peripheral cell region (3).
R
/L (random logic) section (1), MCU section (2) 9
It is possible to eliminate empty areas that have occurred in the wiring area (4) other than the peripheral cell area (3) or the adjacent wiring area (4).

〔作用〕[Effect]

この発明による半導体集積回路は、配線領域(4)内に
生じていた空き領域をなくすことかてき、配線領域(4
)の配線密度を向上することができる。
The semiconductor integrated circuit according to the present invention eliminates the vacant area that has occurred in the wiring area (4).
) can improve the wiring density.

〔発明の実施例〕[Embodiments of the invention]

以下、この発明の一実施例を図について説明する。第1
図はこの発明の一実施例による半導体集積回路のレイア
ウト図である。図において、(1)〜(6)は従来のも
のと同様のため説明を省略する。第1図においては、R
/L(ランダムロジック)部(1)とMCU部(2)を
配置し、これらのまわりに周辺セル(5)を配置した周
辺セル領域(3)が設けられている。周辺セル(5)は
R/L (ランダムロジック)部(1)とMCU部(2
)に対して、配線(6)によフて接続されている。また
、配線(6)が配置されているR/L (ランダムロジ
ック)部(1)MCU部(2)2周辺セル領域(3)の
間に、配線領域(4)か設けられている。
An embodiment of the present invention will be described below with reference to the drawings. 1st
The figure is a layout diagram of a semiconductor integrated circuit according to an embodiment of the present invention. In the figure, (1) to (6) are the same as the conventional one, so explanations are omitted. In Figure 1, R
A peripheral cell region (3) is provided in which a /L (random logic) section (1) and an MCU section (2) are arranged, and peripheral cells (5) are arranged around them. The peripheral cell (5) has an R/L (random logic) section (1) and an MCU section (2).
) is connected by a wiring (6). Furthermore, a wiring region (4) is provided between the R/L (random logic) section (1), the MCU section (2), and the peripheral cell region (3) where the wiring (6) is arranged.

配線(6)は、R/L (ランタムロジック)部(1)
と周辺セル(5)の接続及びMCU部(2)と周辺セル
(5)の接続に用いており、R/L(ランタムロジック
)部(1)とMCU部(2)は直接には接続さねておら
ず、周辺セル(5)を介して配線(6)を用いて接続さ
れている。
Wiring (6) is R/L (random logic) section (1)
It is used to connect the peripheral cell (5) and the MCU section (2) to the peripheral cell (5), and the R/L (random logic) section (1) and MCU section (2) are not directly connected. They are not overlapped and are connected using wiring (6) via peripheral cells (5).

次に動作について説明する。R/L、(ランタムロジッ
ク)部(1)からMCU部(2)の上辺(R/L(ラン
ダムロジック)部側の辺)より下側に接続する。配線(
6)及びMCU部(2)からR/L(ランダムロジック
)部(1)の下辺(MCU部(2)側の辺)より上側に
接続する配線(6)はR/L (ランダムロジック)部
(1)、MCU部(2)9周辺セル領域(3)が近接す
る配線領域(4)内において、密集している。この密集
している配線(6)に近接する周辺セル領域(3)内の
周辺セル(5)を周辺セル領域(3)内の空き領域のと
ころに移動させて配置し、上記密集した配線領域(4)
内の配線(6)の一部分を上記周辺セル(5)を移動さ
せることにより新しくできた周辺セル領域(3)内の空
き領域に配置している。
Next, the operation will be explained. The R/L (random logic) section (1) is connected to the lower side of the upper side (the side on the R/L (random logic) section side) of the MCU section (2). wiring(
6) and the wiring (6) connecting from the MCU section (2) to the upper side of the R/L (random logic) section (1) (the side on the MCU section (2) side) is the R/L (random logic) section. (1) The peripheral cell region (3) of the MCU section (2) 9 is densely packed in the adjacent wiring region (4). The peripheral cells (5) in the peripheral cell area (3) that are close to this dense wiring (6) are moved and placed in the empty area in the peripheral cell area (3), and the dense wiring area is (4)
A part of the wiring (6) inside is arranged in a vacant area in the peripheral cell area (3) newly created by moving the peripheral cell (5).

〔発明の効果〕〔Effect of the invention〕

以上のように、この発明によれば、配線領域(4)内の
密集した配線(6)の一部分を周辺セル領域(3)に配
置することにより、配線領域(4)内に存在していた空
き領域(配線(6)が配置されない配線領域)をなくす
ことができる。
As described above, according to the present invention, by arranging a part of the densely packed wiring (6) in the wiring area (4) in the peripheral cell area (3), Vacant areas (wiring areas where wiring (6) is not placed) can be eliminated.

従って、配線領域(6)の配線密度は大きくなる。更に
周辺セル領域(3)内の周辺セル(5)は移動しただけ
であるので、周辺セル領域(3)の面積の変動はなく配
線領域(4)内の空き領域がなくなった面積だけ、チッ
プ全体の面積も小さくなり、高集積なレイアウトが可能
となる効果がある。
Therefore, the wiring density in the wiring area (6) increases. Furthermore, since the peripheral cell (5) in the peripheral cell area (3) has only moved, the area of the peripheral cell area (3) does not change, and the area of the wiring area (4) that is no longer available is the same as that of the chip. The overall area is also reduced, which has the effect of enabling a highly integrated layout.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は、この発明の一実施例による半導体集積回路の
レイアウト図、第2図は従来の半導体集積回路のレイア
ウト図である。図において、(1)はR/L (ランタ
ムロジック)部、(2)はMC0部、(3)は周辺セル
領域、(4)は配線領域、(5)は周辺セル、(6)は
配線である。 なお、図中、同一符号は同一、又は相当部分を示す。
FIG. 1 is a layout diagram of a semiconductor integrated circuit according to an embodiment of the present invention, and FIG. 2 is a layout diagram of a conventional semiconductor integrated circuit. In the figure, (1) is the R/L (random logic) section, (2) is the MC0 section, (3) is the peripheral cell area, (4) is the wiring area, (5) is the peripheral cell, and (6) is the peripheral cell area. It's the wiring. In addition, in the figures, the same reference numerals indicate the same or equivalent parts.

Claims (1)

【特許請求の範囲】[Claims]  第1の機能ブロックと第2の機能ブロックから成り、
上記第1の機能ブロックと上記第2の機能ブロックを囲
む複数の周辺セルを配置する周辺セル配置領域を設け、
上記周辺セル配置領域と上記第1の機能ブロックと上記
第2の機能ブロックとの間に、配線領域を設け、上記第
1の機能ブロックの上辺と上記第2の機能ブロックの下
辺を上記配線領域を挟んで隣接して配置し、上記第1の
機能ブロックから上記第2の機能ブロックの下辺より上
部に接続した配線又は上記第2の機能ブロックから上記
第1の機能ブロックの上辺より下部に接続した配線の一
部分を上記周辺セル配置領域内の上記周辺セルの間に配
置したことを特徴とする半導体集積回路。
Consists of a first functional block and a second functional block,
providing a peripheral cell placement area in which a plurality of peripheral cells surrounding the first functional block and the second functional block are placed;
A wiring area is provided between the peripheral cell placement area, the first functional block, and the second functional block, and the upper side of the first functional block and the lower side of the second functional block are connected to the wiring area. wires arranged adjacent to each other with the two functional blocks in between, and connected from the first functional block to the upper side of the lower side of the second functional block, or from the second functional block to the lower side of the upper side of the first functional block. A semiconductor integrated circuit characterized in that a portion of the wiring is arranged between the peripheral cells in the peripheral cell arrangement region.
JP26104490A 1990-09-28 1990-09-28 Semiconductor integrated circuit Pending JPH04137749A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP26104490A JPH04137749A (en) 1990-09-28 1990-09-28 Semiconductor integrated circuit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP26104490A JPH04137749A (en) 1990-09-28 1990-09-28 Semiconductor integrated circuit

Publications (1)

Publication Number Publication Date
JPH04137749A true JPH04137749A (en) 1992-05-12

Family

ID=17356278

Family Applications (1)

Application Number Title Priority Date Filing Date
JP26104490A Pending JPH04137749A (en) 1990-09-28 1990-09-28 Semiconductor integrated circuit

Country Status (1)

Country Link
JP (1) JPH04137749A (en)

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