JPH04129263A - Trimming of semiconductor element - Google Patents
Trimming of semiconductor elementInfo
- Publication number
- JPH04129263A JPH04129263A JP2251095A JP25109590A JPH04129263A JP H04129263 A JPH04129263 A JP H04129263A JP 2251095 A JP2251095 A JP 2251095A JP 25109590 A JP25109590 A JP 25109590A JP H04129263 A JPH04129263 A JP H04129263A
- Authority
- JP
- Japan
- Prior art keywords
- thick film
- resistor
- trimming
- laser
- voltage value
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000009966 trimming Methods 0.000 title claims abstract description 26
- 239000004065 semiconductor Substances 0.000 title 1
- 238000000034 method Methods 0.000 claims abstract description 10
- 239000000758 substrate Substances 0.000 claims description 8
- 230000000694 effects Effects 0.000 description 3
- 238000012544 monitoring process Methods 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
Landscapes
- Laser Beam Processing (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、ハイブリッドICのレーザートリミング方法
に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a method for laser trimming a hybrid IC.
第2図は、従来のハイブリッドICのレーザートリミン
グ方法を示す平面図である0図において、1はハイブリ
ッドICの厚膜基板、2は前記厚膜基板1上にボンディ
ングされたICチップ、3は前記厚膜基板1上に形成さ
れたトリミング用の厚膜抵抗である。FIG. 2 is a plan view showing a conventional laser trimming method for a hybrid IC. In FIG. This is a thick film resistor for trimming formed on a thick film substrate 1.
次に動作について説明する。始めにハイブリッドICを
動作状態としておき、調整箇所の電圧値をモニターしつ
つ、前記厚膜抵抗3をレーザーにより少しだけ焼き切る
。これにより、厚膜抵抗3の抵抗値が増大し、調整箇所
の電圧値が変化する。Next, the operation will be explained. First, the hybrid IC is brought into operation, and while monitoring the voltage value at the adjustment point, the thick film resistor 3 is slightly burned out with a laser. As a result, the resistance value of the thick film resistor 3 increases, and the voltage value at the adjustment location changes.
次にレーザーの熱により、前記厚膜基板1上の前記IC
チップ2が熱せられ特性に変動が起こるのを防ぐため厚
膜基板1の熱が下がり、ICチップ2の特性の安定する
のを待って再び前記厚膜抵抗3を焼き切る1以上の動作
を繰り返し行い、調整箇所の電圧値が目標値になるとト
リミング終了とする。Next, the IC on the thick film substrate 1 is heated by the laser.
In order to prevent the chip 2 from being heated and changing its characteristics, one or more operations are repeated to burn out the thick film resistor 3 again after the heat of the thick film substrate 1 has decreased and the characteristics of the IC chip 2 have stabilized. , trimming is completed when the voltage value at the adjustment point reaches the target value.
従来のレーザートリミング方法では、上記の様に少しト
リミングを行ってから、ハイブリッドICの温度が下が
るのを待って再び少しトリミングを行うという方法をと
るため、非常に時間がかかっていた。In the conventional laser trimming method, a small amount of trimming is performed as described above, and then a small amount of trimming is performed again after waiting for the temperature of the hybrid IC to decrease, which takes a very long time.
この発明は、上記のような問題点を解消するためになさ
れたもので、ハイブリッドICの温度が安定ブるまでの
待ち時間を減少させることを目的とする。This invention was made to solve the above-mentioned problems, and aims to reduce the waiting time until the temperature of a hybrid IC becomes stable.
この発明に係るハイブリッドICのレーザートリミング
方法は、同一のトリミング抵抗を2つに分けて厚膜基板
の両端に配置し、交互にレーザートリミングを行うよう
にしたものである。In the hybrid IC laser trimming method according to the present invention, the same trimming resistor is divided into two parts and arranged at both ends of a thick film substrate, and laser trimming is performed alternately.
上記のように構成されたハイブリッドICのレーザート
リミング方法においては、片方の抵抗をトリミングした
後、放熱させている間にもう片方の抵抗を切ることがで
き、従って従来の方法に比べて待ち時間が少なくなり、
短い時間でレーザートリミングが行える。In the laser trimming method for a hybrid IC configured as described above, after trimming one resistor, the other resistor can be cut while dissipating heat, so the waiting time is shorter than in the conventional method. becomes less,
Laser trimming can be done in a short time.
以下、この発明の一実施例を図について説明する。第1
図は本発明におけるハイブリッドICのレーザートリミ
ング方法を示す平面図であり、3a。An embodiment of the present invention will be described below with reference to the drawings. 1st
3a is a plan view showing the laser trimming method for a hybrid IC according to the present invention.
3bは厚膜基板1上の両端部に形成された2個分割のト
リミング用の厚膜抵抗である。Reference numeral 3b denotes a thick film resistor for trimming divided into two pieces formed at both ends of the thick film substrate 1.
尚、従来例と同一部分については同一符号で表し説明を
省略する。Incidentally, the same parts as in the conventional example are denoted by the same reference numerals, and the explanation thereof will be omitted.
次に動作について説明する。始めにハイブリッドICを
動作状態としておき、調整箇所の電圧値をモニターしつ
つ、一方の厚膜抵抗3aをレーザーにより少しだけ焼き
切る。これにより、厚膜抵抗3aの抵抗値が増大し、調
Mm所の電圧値が変化する。このときレーザーの熱によ
り、厚膜基板1が熱せられるが、厚膜抵抗3a付近の放
熱を行っている間に、今度は他方の厚膜抵抗3bをレー
ザーにより少しだけ焼き切る。これより、厚膜抵抗3b
の抵抗値が増大し、調整箇所の電圧値がさらに変化する
。また、厚膜抵抗3b付近の放熱を行っている間に、次
は厚膜抵抗3aをレーザーにより少しだけ焼き切る。上
記の動作を交互に繰り返し行うことにより、調整箇所の
電圧値が目標値になるとトリミング終了とする。Next, the operation will be explained. First, the hybrid IC is put into operation, and while monitoring the voltage value at the adjustment point, one thick film resistor 3a is slightly burnt out with a laser. As a result, the resistance value of the thick film resistor 3a increases, and the voltage value at the adjustment point Mm changes. At this time, the thick film substrate 1 is heated by the heat of the laser, and while the heat in the vicinity of the thick film resistor 3a is being radiated, the other thick film resistor 3b is then slightly burned off by the laser. From this, thick film resistor 3b
The resistance value increases, and the voltage value at the adjustment point changes further. Further, while heat is being dissipated near the thick film resistor 3b, next, the thick film resistor 3a is slightly burnt out by a laser. By repeating the above operations alternately, trimming is completed when the voltage value at the adjustment location reaches the target value.
以上のようにこの発明によれば、トリミング抵抗を2つ
に分け、交互にトリミングするようにしなので、レーザ
ーにより厚膜抵抗を焼き切る間に余分な待ち時間を挿入
しなくても良く、トリミング時間を短縮することができ
る効果がある。As described above, according to the present invention, the trimming resistor is divided into two parts and the trimming is performed alternately, so there is no need to insert an extra waiting time while the thick film resistor is burned out by the laser, and the trimming resistor can be trimmed in half. It has the effect of being able to shorten the time.
第1図はこの発明の一実施例によるハイブリッドICの
レーザートリミング方法を示す平面図、第2図は従来の
ハイブリッドのレーザートリミング方法を示す平面図で
ある。
図中、1は厚膜基板、2はIC53a、3bは厚膜抵抗
である。
なお、図中同一符号は同−又は相当部分を示す。FIG. 1 is a plan view showing a hybrid IC laser trimming method according to an embodiment of the present invention, and FIG. 2 is a plan view showing a conventional hybrid IC laser trimming method. In the figure, 1 is a thick film substrate, 2 is an IC 53a, and 3b is a thick film resistor. Note that the same reference numerals in the figures indicate the same or equivalent parts.
Claims (1)
いて、トリミングを行う厚膜抵抗を2つにわけて厚膜基
板上に焼き付け、この2つの抵抗を交互にカットするこ
とを特徴とする半導体素子のトリミング方法。A method for laser trimming a hybrid IC, which comprises dividing a thick film resistor to be trimmed into two parts and baking them onto a thick film substrate, and cutting the two resistors alternately.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2251095A JPH04129263A (en) | 1990-09-19 | 1990-09-19 | Trimming of semiconductor element |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2251095A JPH04129263A (en) | 1990-09-19 | 1990-09-19 | Trimming of semiconductor element |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH04129263A true JPH04129263A (en) | 1992-04-30 |
Family
ID=17217573
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2251095A Pending JPH04129263A (en) | 1990-09-19 | 1990-09-19 | Trimming of semiconductor element |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH04129263A (en) |
-
1990
- 1990-09-19 JP JP2251095A patent/JPH04129263A/en active Pending
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