JPH04124817A - Horizontal furnace - Google Patents
Horizontal furnaceInfo
- Publication number
- JPH04124817A JPH04124817A JP24589090A JP24589090A JPH04124817A JP H04124817 A JPH04124817 A JP H04124817A JP 24589090 A JP24589090 A JP 24589090A JP 24589090 A JP24589090 A JP 24589090A JP H04124817 A JPH04124817 A JP H04124817A
- Authority
- JP
- Japan
- Prior art keywords
- reaction tube
- roller
- heat treatment
- treatment furnace
- horizontal heat
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010438 heat treatment Methods 0.000 claims abstract description 26
- 239000004065 semiconductor Substances 0.000 abstract description 5
- 238000010586 diagram Methods 0.000 description 3
- 239000000428 dust Substances 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 1
- 239000005338 frosted glass Substances 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
Abstract
Description
【発明の詳細な説明】
〔概 要〕
被処理物を高温で熱処理する横型熱処理炉の反応管の変
形を防止する改良に関し、
反応管が高温処理時に熱により変形した場合に、反応管
の温度を低下させずに反応管を回転することが可能な横
型熱処理炉の提供を目的とし、反応管をヒータにより加
熱し、前記反応管内の被処理物を熱処理する横型熱処理
炉であって、前記反応管を回転させる手段を具備するよ
う構成する。[Detailed Description of the Invention] [Summary] Regarding an improvement to prevent deformation of a reaction tube of a horizontal heat treatment furnace for heat treating a workpiece at high temperature, if the reaction tube is deformed due to heat during high temperature treatment, the temperature of the reaction tube will be reduced. The purpose of this horizontal heat treatment furnace is to provide a horizontal heat treatment furnace in which a reaction tube can be rotated without reducing the reaction temperature, the reaction tube is heated by a heater, and the material to be treated in the reaction tube is heat treated. The tube is configured to include means for rotating the tube.
本発明は、被処理物を高温で熱処理する横型熱処理炉の
反応管の変形を防止する改良に関するものである。The present invention relates to an improvement for preventing deformation of a reaction tube of a horizontal heat treatment furnace for heat treating objects to be treated at high temperatures.
近年の半導体装置の製造工程においては、高温で被処理
物を処理する工程があり、この工程に用いる熱処理炉に
おいて反応管の変形が生じると、反応管内に被処理物を
保持する治具を出し入れする際に、この治具と反応管の
内壁とが接触して塵埃が発生している。In the manufacturing process of recent semiconductor devices, there is a process in which objects to be processed are treated at high temperatures, and if the reaction tube deforms in the heat treatment furnace used for this process, the jig that holds the object to be processed must be moved in and out of the reaction tube. During this process, this jig comes into contact with the inner wall of the reaction tube, generating dust.
以上のような状況から、反応管が高温処理時に熱により
変形するのを防止することが可能な横型熱処理炉が要望
されている。Under the above circumstances, there is a need for a horizontal heat treatment furnace that can prevent reaction tubes from being deformed by heat during high-temperature treatment.
従来の横型熱処理炉について第2図により詳細に説明す
る。A conventional horizontal heat treatment furnace will be explained in detail with reference to FIG.
第2図は従来の横型熱処理炉の概略構造を示す側断面図
である。FIG. 2 is a side sectional view showing the schematic structure of a conventional horizontal heat treatment furnace.
図に示すように被処理物6、例えば半導体つ工−ハの保
持治具7を収容する反応管11はヒータ13により加熱
されており、ブロック14で支持されている。As shown in the figure, a reaction tube 11 containing a holding jig 7 for a workpiece 6, such as a semiconductor tool, is heated by a heater 13 and supported by a block 14.
この反応管11には接合部11aが一端に設けられてお
り、反応管ll内に供給するガスは、この接合部11a
に密着する接合部12aを備えるガス供給管12を介し
て供給されている。This reaction tube 11 is provided with a joint 11a at one end, and the gas supplied into the reaction tube 11 is supplied to this joint 11a.
The gas is supplied through a gas supply pipe 12 having a joint 12a that is in close contact with the gas.
このような横型熱処理炉を用いて半導体装置の製造工程
における被処理物6の高温処理を行っているが、真円の
反応管11を長時間高温にさらすと反応管11が上下方
向が偏平な形状に変形している。Such a horizontal heat treatment furnace is used to perform high-temperature treatment of the workpiece 6 in the semiconductor device manufacturing process, but if the perfectly round reaction tube 11 is exposed to high temperature for a long time, the reaction tube 11 will become flat in the vertical direction. It is deformed in shape.
以上説明した従来の横型熱処理炉においては、被処理物
を高温にて処理する場合に、高温の加熱により反応管が
変形し、反応管内に被処理物を保持する治具を出し入れ
する際に、この治具と反応管の内壁とが接触して塵埃が
発生するという問題点があり、反応管の変形を復元する
ためには反応管の温度を低下させて反応管を回転しなけ
ればならないという問題点があった。In the conventional horizontal heat treatment furnace described above, when processing the workpiece at high temperature, the reaction tube is deformed due to high temperature heating, and when the jig that holds the workpiece is moved in and out of the reaction tube, There is a problem in that this jig comes into contact with the inner wall of the reaction tube, generating dust, and in order to restore the deformation of the reaction tube, the temperature of the reaction tube must be lowered and the reaction tube must be rotated. There was a problem.
本発明は以上のような状況から、反応管が高温処理時に
熱により変形した場合に、反応管の温度を低下させずに
反応管を回転することが可能な横型熱処理炉の提供を目
的としたものである。In view of the above-mentioned circumstances, the present invention aims to provide a horizontal heat treatment furnace that can rotate a reaction tube without reducing the temperature of the reaction tube when the reaction tube is deformed by heat during high-temperature treatment. It is something.
本発明の横型熱処理炉は、反応管をヒータにより加熱し
、この反応管内の被処理物を熱処理する横型熱処理炉で
あって、この反応管を回転させる手段を具備するよう構
成する。The horizontal heat treatment furnace of the present invention is a horizontal heat treatment furnace that heats a reaction tube with a heater and heat-treats the object to be treated within the reaction tube, and is configured to include means for rotating the reaction tube.
即ち本発明においては、横型熱処理炉の反応管を回転す
る手段を具備するから、反応管の高温による熱変形を、
反応管の温度を低下させないで反応管を回転することに
より復元することが可能となる。That is, in the present invention, since a means for rotating the reaction tube of the horizontal heat treatment furnace is provided, thermal deformation of the reaction tube due to high temperature can be prevented.
It becomes possible to restore the temperature by rotating the reaction tube without lowering the temperature of the reaction tube.
以下第1図により本発明による一実施例の横型熱処理炉
について詳細に説明する。DESCRIPTION OF THE PREFERRED EMBODIMENTS A horizontal heat treatment furnace according to an embodiment of the present invention will be described in detail below with reference to FIG.
第1図は本発明による一実施例の横型熱処理炉を示す図
である。FIG. 1 is a diagram showing an embodiment of a horizontal heat treatment furnace according to the present invention.
図に示すように被処理物6、例えば半導体ウェーハの保
持治具7を収容する反応管1はヒータ3により加熱され
ており、ブロック4に内蔵されているローラ5で支持さ
れている。As shown in the figure, a reaction tube 1 containing a holding jig 7 for an object 6 to be processed, such as a semiconductor wafer, is heated by a heater 3 and supported by rollers 5 built into a block 4.
この反応管lには接合部1aが一端に設けられており、
反応管1内に供給するガスは、この接合部1aに密着す
る接合部2aを備えるガス供給管2を介して供給されて
いる。This reaction tube l is provided with a joint part 1a at one end,
Gas is supplied into the reaction tube 1 through a gas supply pipe 2 having a joint 2a that is in close contact with this joint 1a.
本発明のローラ5により支持される反応管1は、このロ
ーラ5との接触部の肉厚が他の部分より厚くなっており
、第1図(b)のA−A断面図に示すようにローラ5で
保持される反応管1の周囲及びローラ5の表面には滑り
止め手段、例えば擦りガラス化するか或いは筋目ローレ
ットが形成されている。The reaction tube 1 supported by the roller 5 of the present invention has a wall thickness thicker at the contact part with the roller 5 than other parts, as shown in the AA cross-sectional view of FIG. 1(b). The periphery of the reaction tube 1 held by the rollers 5 and the surface of the rollers 5 are provided with anti-slip means, such as frosted glass or grooved knurling.
二〇ローラ5の一個が図示しない駆動装置により回転さ
れるようになっており、反応管1の重量がローラ5に加
わるので、ローラ5の回転により反応管lを回転させる
ことができる。20 One of the rollers 5 is rotated by a drive device (not shown), and since the weight of the reaction tube 1 is applied to the roller 5, the reaction tube 1 can be rotated by the rotation of the roller 5.
反応管1内の被処理物6を高温で加熱すると、この熱に
より反応管1を形成する材料、例えば石英が軟化し、真
円の反応管1が偏平になり、その中に収容している被処
理物6の保持治具7と反応管1の内壁とが擦れて塵埃が
発生する障害が生じているが、本発明においては保持治
具7を取り出して次の保持治具7を挿入する間に、ヒー
タ3の電源を切断して反応管1の温度を低下させること
なく、反応管1を支持しているローラ5を図示しない駆
動装置により回転し、ローラ5の表面に形成されている
滑り止め手段により反応管1を90゜回転させて反応管
1の偏平を矯正することが可能となる。When the object to be processed 6 in the reaction tube 1 is heated to a high temperature, the material forming the reaction tube 1, for example, quartz, is softened by this heat, and the perfectly circular reaction tube 1 becomes flat, and the object housed therein becomes flat. A problem occurs in which the holding jig 7 for the object to be processed 6 and the inner wall of the reaction tube 1 rub against each other and dust is generated, but in the present invention, the holding jig 7 is taken out and the next holding jig 7 is inserted. In the meantime, the roller 5 supporting the reaction tube 1 is rotated by a drive device (not shown) without turning off the power to the heater 3 and reducing the temperature of the reaction tube 1, and the roller 5 formed on the surface of the roller 5 is rotated by a drive device (not shown). The anti-slip means makes it possible to correct the flatness of the reaction tube 1 by rotating the reaction tube 1 by 90 degrees.
〔発明の効果〕
以上の説明から明らかなように本発明によれば、極めて
簡単な構造の改良により反応管の温度を低下させずに反
応管を回転させることが可能となるので、常に反応管が
変形していない状態で用いることが可能となる利点があ
り、著しい信軌性向上の効果が期待できる横型熱処理炉
の提供が可能となる。[Effects of the Invention] As is clear from the above explanation, according to the present invention, it is possible to rotate the reaction tube without lowering the temperature of the reaction tube by improving the extremely simple structure. It has the advantage that it can be used in an undeformed state, and it becomes possible to provide a horizontal heat treatment furnace that can be expected to significantly improve reliability.
第1図は本発明による一実施例の横型熱処理炉を示す図
、
第2図は従来の横型熱処理炉の概略構造を示す側断面図
、
である。
図において、
■は反応管、
1aは接合部、
2はガス供給管、
2aは接合部、
3はヒータ、
4はブロック、
5はローラ、
6は被処理物、
7は保持治具、
を示す。
ta+
側断面図
bl
A断面図
本発明による一実施例の横型熱処理炉を示す図下
図
従来の横型熱処理炉の概略構造を示す側断面口筒
図FIG. 1 is a diagram showing a horizontal heat treatment furnace according to an embodiment of the present invention, and FIG. 2 is a side sectional view showing a schematic structure of a conventional horizontal heat treatment furnace. In the figure, ■ is the reaction tube, 1a is the joint, 2 is the gas supply pipe, 2a is the joint, 3 is the heater, 4 is the block, 5 is the roller, 6 is the object to be processed, and 7 is the holding jig. . ta+ Side sectional view bl A sectional view Diagram showing a horizontal heat treatment furnace according to an embodiment of the present invention Bottom figure Side sectional view showing the schematic structure of a conventional horizontal heat treatment furnace
Claims (1)
(1)内の被処理物(6)を熱処理する横型熱処理炉で
あって、 前記反応管(1)を回転させる手段を具備することを特
徴とする横型熱処理炉。[Scope of Claims] A horizontal heat treatment furnace for heating a reaction tube (1) with a heater (3) and heat-treating a workpiece (6) in the reaction tube (1), the reaction tube (1) A horizontal heat treatment furnace characterized by comprising means for rotating the furnace.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP24589090A JPH04124817A (en) | 1990-09-14 | 1990-09-14 | Horizontal furnace |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP24589090A JPH04124817A (en) | 1990-09-14 | 1990-09-14 | Horizontal furnace |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH04124817A true JPH04124817A (en) | 1992-04-24 |
Family
ID=17140337
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP24589090A Pending JPH04124817A (en) | 1990-09-14 | 1990-09-14 | Horizontal furnace |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH04124817A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010186904A (en) * | 2009-02-13 | 2010-08-26 | Kokusai Electric Semiconductor Service Inc | Wafer processing apparatus |
-
1990
- 1990-09-14 JP JP24589090A patent/JPH04124817A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010186904A (en) * | 2009-02-13 | 2010-08-26 | Kokusai Electric Semiconductor Service Inc | Wafer processing apparatus |
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