JPH04123051A - Processing method for photosensitive material for photographing - Google Patents

Abstract

PURPOSE:To prevent the generation of unequal processing by confining the forming density of perforations to within 4 pieces per image plane. CONSTITUTION:This photosensitive material F for photographing is formed with the perforations at the forming density within 4 pieces per image plane at one or both ends. Then, the forming density of the perforations is smaller. The generation of the unequal processing arising from the passage of a processing liquid in the perforations decreases at the time of the passage in a narrow-path processing path 6a. The forming density of the perforations is small even when a blade 15 capable of shielding this processing path is installed in the narrow-width processing path 6A and, therefore, the increase in the resistance for transporting the photosensitive material for photographing is prevented.

Description

DETAILED DESCRIPTION OF THE INVENTION <Industrial Application Field> The present invention relates to a method for processing photographic light-sensitive materials such as negative films.

<Prior art> Photographic materials that have already been photographed are subjected to processing such as development, bleaching, bleach-fixing, fixing, washing, and stabilization.
A technology for processing using a processing tank having a narrow processing path has been disclosed for the purpose of reducing the amount of processing liquid replenishment and waste liquid, improving processing efficiency, and downsizing the processing equipment (Japanese Patent Application Laid-Open No. 1983-1993). -89052, No. 63-131138, No. 63-216050, No. 64-26855, Japanese Patent Application Laid-open No. 0F-130548, etc.).

By the way, negative film, which is a typical example of photosensitive material for photography, has barforations along both sides of the film for transporting and positioning the film within the camera. When processing inside, the processing liquid flows through the perforations.

In this case, in a processing tank having a narrow processing path as described above, there is almost no flow of the processing liquid within the narrow processing path, but the processing liquid flows due to the passage of the negative film and flows through the perforations. do. The flow of the processing liquid through the perforations in this manner causes the flow of the processing liquid to become irregular, resulting in a drawback that processing unevenness occurs in images near the sides of the perforations.

This processing unevenness is, for example, development unevenness when processing with a developer, desilvering unevenness when processing with a bleach, fixer, or bleach-fix solution, and residual color when processing with washing water or stabilizer. This is due to unevenness and unevenness due to residual active ingredient.

Such processing unevenness tends to occur more noticeably as the ratio of the total length of the narrow processing paths to the total length of the processing paths in the processing tank increases.

In addition, by installing a partitioning member such as a pair of blades that shields the narrow processing path in the processing tank,
A technique has been disclosed in which a liquid composition gradient (concentration gradient) of the processing liquid is formed over the entire length of the processing path to improve processing efficiency and photographic properties (Japanese Patent Application Laid-Open No. 02-130548, Japanese Patent Application No. 02-155667). issue).

In this case, the negative film passes between the pair of blades while being in contact with the blade surface, but as mentioned above, the negative film has perforations, which increases the sliding resistance with the blade and improves conveyance. It has the disadvantage that it decreases.

In particular, negative films are mainly made of plate-shaped leading members (leagues).
The negative film is transported by being towed by the blade, but as the sliding resistance with the blade increases, the tension applied to the negative film increases (becomes
The edge shape of the perforation is deformed in a curved manner, resulting in an increase in sliding resistance with the blade.

<Problems to be Solved by the Invention> An object of the present invention is to provide a method for processing photographic materials that can prevent uneven processing of photographic materials and further improve transportability. It is in.

<Means for Solving the Problems> Such objects are achieved by the present invention described in (1) and (2) below.

(1) Processing a photosensitive material for photography using a processing tank that has a narrow processing path in the processing tank, the total length of which accounts for 20% or more of the total length of the processing path in the processing tank. Processing of the photosensitive material for photography, characterized in that the photosensitive material for photography has perforations formed at one or both side edges, and the density of formation of the perforations is 4 or less per screen. Method.

(2) The method for processing a photosensitive material for photographing according to (1) above, wherein a blade capable of shielding the narrow processing path is installed in the narrow processing path.

<Function> In the present invention, the photographic photosensitive material to be processed has perforations formed on one or both edges thereof at a density of 4 perforation or less per screen, so that it cannot be used as a conventional 135 size negative film. The formation density of the perforations is lower than that of the conventional method, and therefore, the occurrence of processing unevenness caused by the processing liquid flowing through the perforations when passing through the narrow processing path is reduced.

Further, even when a blade capable of shielding the narrow processing path is installed, the formation density of perforations is small, so that an increase in the transport resistance of the photographic photosensitive material is prevented.

<Structure of the Invention> Hereinafter, the method for processing a photosensitive material for photographing according to the present invention will be described in detail with reference to preferred embodiments shown in the accompanying drawings.

FIG. 1 is a sectional front view showing an example of the configuration of a photosensitive material processing apparatus for carrying out the present invention.

As shown in the figure, the photosensitive material processing apparatus IA includes a housing 3A, an outer tank wall material 40A installed inside the housing 3A, and an inner tank wall material 50A installed inside the housing 3A. It has a tank 2A.

The housing 3A has a box shape and serves as a constant temperature bath. That is, the housing 3A is filled with hot water 30A, and the processing liquid Q is heated to, for example, about 30 to 38° C. via the outer tank wall material 40A. The temperature of this hot water 30A is usually about 30 to 50°C, and is set to be equal to or slightly higher than the temperature of the target treatment liquid.

Note that hot water is circulated in order to keep the temperature of the hot water 30A in the housing 3A constant.

That is, a water supply port 31A and a drain port 32A for hot water 30A are formed at the bottom of the housing 3A, and hot water heated by a heater (not shown) is supplied from the water supply port 31A into the housing 3A, and the supply amount is adjusted. Almost the same amount of hot water is discharged from the drain port 32A.

The housing 3A may be made of a material with heat insulation properties, such as hard vinyl chloride or polysulfone, or may be made of
Alternatively, it is preferable to bond a heat insulating material such as asbestos, felt, aluminum foil, glass wool, etc. to the inner and/or outer walls of the housing 3A.

An outer tank wall material 40A is fixedly or removably attached to the upper part of the housing 3A.

This outer tank wall material 40A has a U-shape in which the bottom part is curved in an arc shape, and the lowermost end thereof is connected to the housing 3A.
It is spaced a considerable distance from the bottom of the This allows hot water to flow between the left and right sides of the outer tank wall material 40A in FIG.

It is also possible to provide a partition between the lowermost end of the outer tank wall material 40A and the bottom of the housing 3A to create a temperature difference between the hot water on the left and right sides of the outer tank wall material 40A in FIG. For example, if the processing tank 2A is a developing tank, the left side (
The hot water for the first half of development) is lower than the hot water for the right side (the second half of development).
．． By setting the temperature to a high temperature of about 5 to 2°C, it is possible to improve the development characteristics, and in particular, to slightly improve the sensitivity.

The outer tank wall material 40A is preferably made of a material that has excellent thermal conductivity and has chemical resistance to the processing liquid Q, such as stainless steel, copper or copper alloy, Hastelloy, titanium, etc. metals can be mentioned.

In the inner center part of the outer tank wall material 40A, there is an inner tank wall material 50A.
is preferably removably inserted. As a result, a treatment path 60A having a slit-like cross section, that is, narrow and long, is formed between the inner surface of the outer tank wall material 40A and the outer surface of the inner tank wall material 50A.

In the configuration example shown in FIG. 1, almost 100% of the processing path in the processing tank 2A is a narrow processing path 60A.

The slit width (W) of this processing path 60A can be defined in relation to the thickness of a photosensitive material for photographing (hereinafter referred to as film F), which will be described later, and is usually 2 times the thickness of film F.
It is preferable to set it to about 30 times.

For example, when the film F is a negative film with a width of 35 mm and a thickness of 0.2 mm, W is preferably about 0.5 to 4.0 mm. Although it is preferable to keep W constant over the entire area of the processing path 60A, W can also be gradually increased or decreased toward the downstream side in the transport direction of the film F in order to adjust the processing speed or the like.

In addition, the lower end of the inner tank wall material 50A is formed with an arcuate groove 55A corresponding to the outer circumferential surface of a feed roller, which will be described later.

Further, on the upper part of the inner tank wall material 50A, the inner tank wall material 50A
A handle 57A used for attaching and detaching is attached. For example, during maintenance such as cleaning of the processing tank 2A, the inner tank wall material 50A is removed by holding the handle 57A.

In addition, considering the heat retention of the processing liquid Q, the inner tank wall material 50A may be made of a material having heat insulating properties such as vinyl chloride, polysulfone, polyethylene, foamed polyethylene, or foamed polyurethane, or may be made of asbestos, felt, etc. It is preferable to bond a heat insulating material such as glass wool, aluminum foil, etc.

Inside the bottom of the outer tank wall material 40A, a feed roller 9A for conveying the film F is installed so as to extend in the front-rear direction in FIG. The film F that has descended through the processing path 60A is wound around the outer peripheral surface of the feed roller 9A, reversed, and ascended. In addition, in the lower part of the feed roller 9A, a processing path 60A is formed between the outer peripheral surface of the feed roller 9A and the arcuate wall surface of the bottom of the outer tank wall material 40A.

Further, crossover rollers 10A and IIA are installed on the film inlet side and the film outlet side above the processing tank 2A, respectively. The crossover roller IOA is for introducing the film F from the previous process into the processing path 60A, and the crossover roller IIA is for introducing the film F from the previous process into the processing path 60A.
This is for sending the film F that has come out from the stage to the next process.

In addition, the feed roller 9A, the crossover roller IOA
and 11A may be either a freely rotating roller or a driven rotating roller.

To transport the film F in the photosensitive material processing apparatus IA, the leading end of the film F is connected to a leader film (not shown) or the trailing end of another film to be processed in advance, and the film F is pulled by these films and moves through the processing path 60A. It is preferable to configure it so that it can be transported. Alternatively, the film F itself may be conveyed while being held between a pair of rollers (not shown).

The processing path 60A is filled with the processing liquid Q up to the liquid level L, and when the film F is processed, fresh processing liquid (hereinafter referred to as replenisher) is supplied. The replenisher is preferably supplied from the entrance side of the film F of the processing path 60A in the case of a developer, bleach, bleach/fixer, or fixer, although it depends on the type of processing solution. That is, the liquid supply lower A that discharges the replenisher is installed on the film F inlet side at the upper part of the processing path 60A, and on the other hand, the liquid drain port 8A that discharges the processing liquid Q by overflow is installed on the film F exit side of the processing path 60.
The replenisher supplied from the liquid supply lower A flows in the same direction as the transport direction of the film F (parallel flow) in the U-shaped processing path 60A, and the replenishment amount is Almost the same amount of degraded processing liquid is discharged from the drain port 8A.

In this way, by making the processing liquid (particularly the developing liquid) flow in parallel, there is an advantage that the sensitivity of the film F is improved.

Note that the amount of replenisher supplied varies depending on conditions such as the type and size of the film F to be developed, the volume of the processing path 60A, and the composition of the processing solution. The amount is preferably about 2 to 30 mg per 1 m.

Now, in the photosensitive material processing apparatus IA, the U-shaped processing path 60A is shielded along the longitudinal direction,
A plurality of pairs of blades 15 are installed to divide into a plurality of sections.

Thereby, the processing path 60A has a plurality of small spaces 61A to 6
It is divided into 9A.

The pair of blades 15 are attached to the outer tank wall material 40A and the inner tank wall material 50A so that their tips are in close contact with each other when the film F is not passing through. and,
The structure is such that the leading end portion is pushed open by the entry of the film F (the leader 25 when the film F is towed and conveyed by the leader 25).

FIG. 8a shows an enlarged view of the blade 15 in FIG.

As shown in FIG. 8a, the blade 15 is connected to the outer tank wall material 4.
0A and the inner tank wall material 50A (in the case of the photosensitive material processing apparatus IB described later, the block body 4g) is attached to the base part, and the tip part (thin part) whose thickness gradually decreases toward the tip.
It is composed of , and is used in combination of two sheets. Further, the blade 15 may have substantially the same thickness from the base to the tip, as shown in FIG. 8b.

At this time, the average inclination angle of the blade 15 with respect to the surface of the film F is generally preferably about 10 to 70 degrees, particularly preferably about 20 to 45 degrees.

Further, the length from the base to the tip of the blade 15 may be equal to or longer than the effective slit width (w) of the processing path 60A, but it is generally preferable to set it to 10 to 50 mm, which is 2 to 20 times this length. Particularly preferably 3 to 10 times 15 to 25
It is better to set it as mm.

The length of the overlapping portion of the tips of the blades 15 when the film F does not pass between the pair of blades 15 set opposite to each other is approximately 1 to 10 mm, particularly 2 to 5 m.
It is best to set it to about m.

The thickness of the tip of the blade 15 may be 1/100 or more of the length of the blade 15 or 5 mm or more (in particular, 1 to 1.5 mm).

The contact surface pressure between the blades 15 is 0.001 to O, l
kg/cm”, especially 0.005 to 0.02
It is preferable to set it to approximately kg/c+n''.

With the above conditions, it is possible to ensure close contact between the tips of the blades 15 when the film F does not pass through, and to effectively block the flow of the processing liquid Q.

Furthermore, the flow of the processing liquid Q when the film F passes through can be made very small.

The material of the blade 15 may be any material that does not adversely affect the processing liquid (e.g., natural rubber, chloroprene rubber, etc.).
Various rubbers such as nitrile rubber, butyl rubber, fluorine rubber, isoprene rubber, butadiene rubber, styrene butadiene rubber, ethylene propylene rubber, neorene rubber, neorene butadiene rubber, silicone rubber, soft polyvinyl chloride, polyethylene, polypropylene, ionomer resin, fluorine Examples include elastic materials such as resins, silicone resins, and soft resins such as polyamide, and elastomers such as Lavalon, Thermolan, Elastolan, Hytrel, and Sunbrain can also be used.

Normally, the adhesion force between the blades 15 is given by the elastic force of the blades, but if a magnetic material is mixed into the tip of the blade 15 (for example, a rubber magnet), the tip can be bonded together by magnetic force. Provides adhesion through suction,
Or it is possible to increase it.

Furthermore, even if the film F slides on the blade 15, there will hardly be any adverse effects such as scratches on the emulsion surface, but if this cannot be ignored, or if the sliding resistance is to be reduced, This can be achieved by performing a surface treatment such as smoothing the side surface or coating the inner surface with a lubricant such as silicone or Teflon.

Further, the blades 15 are not limited to those forming a pair, and the blades 15 are not limited to those forming a pair.
As shown in the figure, the base of the - piece of the blade is attached to the tank wall material 40A.
Alternatively, it may be fixed to either one of the blades 50A, and the tip of the blade 15 may be in close contact with the other wall material.

Alternatively, as shown in FIG. 8d, the tank wall material on the side opposite to the side to which the blade is fixed may protrude into the processing path 60A, and the tip of the blade 15 may be in close contact with this protrusion 45. In this configuration, the sliding resistance of the film F is reduced compared to the configuration shown in FIG. 8c.

In the configurations shown in FIGS. 8c and 8d, it is preferable to transport the film F so that the emulsion layer of the film F comes into contact with the blade 15.

By providing such a blade 15, the following actions and effects occur.

When processing the film F, as described above, approximately the same amount of processing liquid Q as the supply amount of the replenisher flows through the small space 61A within the processing path 60A.
69A, but the flow in the opposite direction is blocked.

Therefore, a liquid composition gradient is reliably formed and maintained in the processing liquid Q in the long processing path 60A.

That is, the processing liquid in the small space 61A where the liquid supply lower A is located is the freshest, and the degree of deterioration increases sequentially in the subsequent small spaces 62A to 68A.
The processing solution in A is the most degraded one.

Further, the blade 15 comes into contact with the surface of the film F, producing an effect of wiping off the adhering liquid (hereinafter referred to as a squeeze effect).

In this way, in the processing path 60A, the formation of a liquid composition gradient and the squeezing effect of the blade 15 improve the processing efficiency of the film F, and in particular, the sensitivity becomes high.

Furthermore, since the processing efficiency is improved, the amount of replenishment liquid to be refilled is reduced.

After the processing of the film F is completed, the supply of the replenisher is stopped, so the flow of the processing iMQ between adjacent small spaces is blocked by the blade.

As a result, the processing liquid Q in each of the small spaces 61A to 69A is
A state with a liquid composition gradient similar to that described above is reached, and this state remains for a long period of time (for example, 10 minutes to 50 hours) after the completion of the treatment.
continue.

Therefore, when processing the film F next time, the processing path 60
Since a liquid composition gradient has already been formed in the processing liquid Q in A, even if processing is performed immediately, the film F will have poor photographic properties and
It is particularly sensitive.

Although it is preferable to use the blade 15 to shield the processing path 60A since it has a high shielding effect, the present invention is not limited thereto, and shielding means having other configurations may be used.

Further, in the present invention, it is not necessary to provide any shielding means such as the blade 15.

FIG. 2 shows a photosensitive material processing apparatus for carrying out the present invention;
In particular, FIG. 3 is a cross-sectional side view showing an example of the configuration of an apparatus for performing desilvering processing, and FIG.
This figure is a perspective view showing the structure around the passage in the photosensitive material processing apparatus of FIG. 2. The photosensitive material processing apparatus 1B shown in these figures is an apparatus that can perform bleaching, bleach-fixing, and fixing in one processing tank.

As shown in FIG. 2, the photosensitive material processing apparatus IB has a vertically long processing tank 2 having a predetermined volume. This processing tank 2
A rack 3 is removably loaded inside. This rack 3 has a pair of side plates 31 and 32, and several block-shaped members (hereinafter referred to as block bodies) 4a to 4o are fixedly installed between these side plates.

These block bodies 4a to 40 provide five processing chambers 6A, 6B, 6, which are spaces for processing the film F.
C16D and 6E are formed.

In addition, the processing chambers 6A and 6B, 6B and 60.
Passages 71, 72, 73 and 74, which are narrow processing paths connecting both processing chambers, are formed between 6C and 6D and between 6D and 6E. Similar passages 75 and 76 are formed for loading and unloading the film F, respectively.

The block bodies 4a and 4b are vertically long members installed on both sides of a partition member 17, which will be described later.

Block bodies 4c and 4d are block bodies 4, respectively.
a and the upper part of 4b, and a leader 25 to the sprocket 8, which will be described later.
This is a member for regulating the position of the leader 25 so as to maintain the engagement.

Block bodies 4g and 4 each include block body 4.
This is a member that is removably fitted into a recess 42 formed in a, and passages 71 and 72 are formed inside the recess 42, respectively.

Further, the block bodies 4h and 4° C. are also members that are removably fitted into the recesses 42 formed in the block body 4b, and have passages 74 and 73 formed therein, respectively.

In addition, these block bodies 4g, 4k, 4h and 4ρ
A sealing member 11 made of the same material as the blade 15 described later is fixed to a portion that contacts the inner wall of the processing tank 2 .

In the block body 4e, the reader 25 is connected to the passage 7 from the processing chamber 6A.
This member serves as a guide to guide the reader 25 to the entrance of the passage 71 when the reader 25 moves into the passage 71 .

The block body 4f is a member that serves as a guide to guide the reader 25 exiting the passage 74 between a guide 9 and a nozzle 54, which will be described later, in the processing chamber 6E.

Block bodies 41 and 4j are members for regulating the position of leader 25 so as to maintain engagement of leader 25 with sprocket 8, respectively.

The block bodies 4m, 4n, and 40 form a processing chamber 6C with the lower ends of the block bodies 4c and 4d, and also serve as a guide to regulate the U-shaped transport path of the leader 25 within the processing chamber 6C. It is a member. Among these, the block body 40 has a curved surface 44 that allows the leader 25 to be reversed. This curved surface 44 also plays the role of regulating the position of the leader 25 so as to maintain engagement of the leader 25 with the sprocket 8.

These block bodies 48 to 4o are made of, for example, plastics such as polyethylene, polypropylene, polyvinyl chloride, polycarbonate, polyphenylene oxide (PPO), ABS resin, phenol resin, polyester resin, polyurethane resin, ceramics such as alumina, stainless steel, titanium, etc. It is made of hard materials such as various metals. In particular, polypropylene, PPO, A
It is preferably made of plastic such as BS resin.

In the illustrated example, each of the block bodies 48 to 4o is a solid member, but may be configured as a hollow member (manufactured by blow molding, for example).

Each of the processing chambers 6A to 6E is filled with a predetermined processing liquid to be described later (not shown).

In the illustrated configuration, the volume per processing chamber is 20
The capacity may be approximately 3,000 m1 (it is also possible to have a small capacity of approximately 20 to 500 m1).

The convergence (effective slit width W) of the passages 71 to 76 is
The thickness is preferably about 5 to 50 times that of No. 5.

With such a width, the leader 25 and the film F can be transported without any trouble.

The present invention is directed to a device in which the total length of the narrow passages 71 to 76 accounts for 20% or more, particularly 40% or more, of the total length of the processing path in the processing tank 2. The reason is that if it is less than 20%, the proportion of time spent processing within the narrow passages 71 to 76 is small, and even when processing conventional films,
This is because processing unevenness, which is a problem to be solved by the present invention, does not occur.

A pair of blades 15 are installed in each of the passages 71 to 74, as shown.

This blade 15 is similar to the one described above, and is arranged so that the leading ends of the blades are in close contact with each other when the leader 25 and the film F do not pass through.
It is attached to 4.

In this case, the blade 15 as a separate member may be attached to each block body 4g, 4k, 4h and 4ρ, but the blade 15 and 4h and 4ρ may be attached to each block body 4g, 4 by, for example, two-color molding or insert molding. It can also be formed integrally.

Also, regarding the sealing member 11, the block body 4g
, 4k, 4h, and 4ji and the sealing member 11, for example, 2
It may be formed integrally by color molding or insert molding.

In addition, in the illustrated example, the blade 15 is connected to each of the passages 71 to 7.
One pair is installed in each aisle, but two pairs are installed for each aisle.
More than one pair of blades 15 may be installed. In this case, the shielding effect and squeezing effect of the passages 71 to 74 becomes thicker, and the amount of replenishment can be further reduced.

Also, in the photosensitive material processing apparatus IB, as described above,
Shielding means may be provided in place of the blade 15, or all such shielding means may be omitted.

Such a photosensitive material processing apparatus IB is provided with a conveying means for conveying the film F so as to sequentially pass through each of the processing chambers 6A to 6E.

As shown in FIGS. 2 and 4, sprockets 8 are installed in each of the processing chambers 6A to 6E.

Each of these sprockets 8 is supported by a side plate 31, 32 at its rotating shaft 81, and is located approximately at the center of each processing chamber in the film width direction.

Incidentally, the sprockets 8 installed in the processing chambers 6A, 6B, 6D and 6E are housed in the notch grooves 43 formed in the block bodies 4a and 4b, and a part of the sprockets 8 are installed in the processing chamber 6A.
, 6B, 6D and 6E.

As shown in FIG. 3, the drive mechanism for the sprocket 8 includes a bevel gear 83 fixed at a predetermined location on a main shaft 82 extending vertically in the figure, and a bevel gear fixed at one end of the rotating shaft 81 of the sprocket 8. 84 mesh with each other, and the main shaft 82 is rotated in a predetermined direction by the operation of a drive source (not shown) such as a motor, so that the sprocket 8 is rotated.

The constituent material of the sprocket 8 is preferably one having durability and chemical resistance to processing liquids, such as hard polyvinyl chloride, polypropylene, polyethylene, A
BS resin, ppo, nylon, polyacetal (POM
), phenolic resin, polyphenylene sulfide (PP
S), various resins such as polyether sulfone (PES), polyether ether ketone (PEEK), and Teflon,
Ceramics such as alumina, metals having corrosion resistance such as stainless steel, titanium, and Hastelloy, or a combination thereof can be used.

As shown in FIG. 5, rollers 85 that freely rotate with respect to the rotating shaft 81 are installed at both ends of the sprocket 8 of the rotating shaft 81. As shown in FIG.

This roller 85 is for guiding the film connected to the leader 25, and has a so-called chain shape with a constriction at the center in the width direction of the film.

Further, rollers 10 similar to the roller 85 described above, which freely rotate in contact with the back surface of the film F, are installed near the block bodies 4m and 4n, respectively.

By providing such rollers 85 and 10,
The transportability of the film F is improved.

Note that the rollers 85 and 10 are installed as necessary, and installation of all or part of them may be omitted.

Sprockets 8 in processing chambers 6A, 6B, 6D and 6E
A guide 9 that guides the reader 25 and regulates the conveyance path of the film F is installed between the passages 71 to 74.

This guide 9 is a plate-shaped member made of the same material as the block body, and openings 91 passing through the guide are formed substantially uniformly.

This enables the processing liquid to flow and promotes circulation of the liquid within the processing chamber, thereby improving processing efficiency.

Note that the guide 9 may be provided partially along the transport route, or may not be provided, as long as it does not impede the transportability of the leader 25.

Further, above the passage 75, a guide 9/2 for introducing the leader 25 into the passage 75 is installed, and above the passage 76, a guide 93 for sending the leader 25 that has passed through the passage 76 out of the processing tank 2 is installed. is set up. These guides 92
and 93 are formed with curved surfaces 94 and 95 so that the processing tank 2 can be smoothly crossed over with an adjacent processing tank or the like.

The guides 9, 92 and 93, the aforementioned sprocket 8 and its drive system, and the rollers 85 and 10 constitute a means for transporting the film F.

The leader 25 is made of, for example, polyethylene, polypropylene,
It is a plate-shaped member made of polyester, polyvinyl chloride, polyacetal, etc. Since this leader 25 is conveyed along the curved portion (curved surface 94, 44, 95) in the processing tank 2, it is preferable that it has some degree of flexibility.

As shown in FIG. 4, rectangular locking holes 26 are formed near the widthwise center of the leader 25 at regular intervals along the longitudinal direction of the leader 25. As shown in FIG. This locking hole 26 is for inserting the teeth of the sprocket 8.

Two films F are connected in parallel to the rear end of the leader 25. To connect the rear end of the leader 25 to the film F, for example, use adhesive tape (splice tape).
This is done by pasting at 27. In this case, in order to prevent the film F from falling off, the adhesive tape 27 is preferably attached to both sides of the film F.

Further, inclined notches 28 are formed at both ends of the tip of the leader 25 to facilitate passage of the leader 25.

Note that the number of films F connected to the rear end of the leader 25 is not particularly limited, and one film F may be connected and transported.

Such a leader 25 needs to have its locking hole 26 locked with one of the sprockets 8 while passing through the processing tank 2 . Therefore, the total length of the leader 25 is made longer than the maximum value of the installation interval between adjacent sprockets 8 along the conveyance path.

In this way, in the photosensitive material processing apparatus IB, the film F is not directly transported, but the leader 25 is placed in front, and the film F is pulled and transported by the leader 25, so that jamming of the film F is less likely to occur. This prevents sensory defects such as scratches, transfer marks, and stains on the film emulsion surface due to contact with rollers.

In such a photosensitive material processing apparatus IB, processing liquid supply means as described below is installed.

This processing liquid supply means supplies two or more types of processing liquids having different functions to different processing chambers for processing.

The block body 4a above the processing chamber 6A has a passage 75 at its end.
A liquid supply path 12 communicating with is formed.

Further, a liquid supply path 13 whose one end communicates with 76 is also formed in the block body 4b above the processing chamber 6E.

These liquid supply paths 12 and 13 connect the rack 3 to the processing tank 2.
When loaded in the tank, they are connected to two liquid supply pipes (not shown) penetrating the side wall 21 of the processing tank 2, respectively.

Further, one end of a drain pipe 14 that penetrates the side wall 21 of the processing tank 2 is installed in a processing chamber other than the processing chamber 6A through which the film F passes first and the processing chamber 6E through which it passes last, that is, the processing chamber 6C. .

The other end of this drain pipe 14 is installed at a height position that sets the liquid level in the processing tank 2 .

A bleaching solution (replenisher) R1 is supplied from the liquid supply path 12, and a fixing solution (replenisher) R2 is supplied from the liquid supply path 13.

During processing, the bleaching liquid R1 supplied from the liquid supply path 12 passes through the processing chamber 6A, the passage 71, the processing chamber 6B, and the passage 72 in sequence and flows into the processing chamber 6C. On the other hand, the fixer R2 supplied from the liquid supply path 13 is transferred to the processing chamber 6E and the path 7 during processing.
4. It passes through the processing chamber 6D and the passage 73 in order and flows into the processing chamber 6C.

The bleaching solution R1 and the fixing solution i? that thus flowed into the processing chamber 6C? ! R2 is mixed and stirred in the processing chamber 6C to become a bleach-fix solution R3, and the exhausted bleach-fix solution R3 is discharged to the outside from the drain pipe 14 by overflow.

In this case, during processing, the bleaching solution R1 flows in the same direction (parallel flow) as the transport direction of the film F, and the fixing solution R1 flows in the same direction as the transport direction of the film F (parallel flow).
2 is a flow in the direction opposite to the transport direction of the film F (counter flow).

Further, in the photosensitive material processing apparatus IB, a processing liquid circulation means 5 as described below is installed.

As shown in FIG. 7, each of the processing chambers 6A to 6E includes a pipe 5 whose both ends penetrate the side wall 21 of the processing tank 2 and communicate with the processing chamber.
A to 5E are connected.

Further, in the middle of the pipes 5A to 5E, pumps 51A to 51E for liquid feeding and heaters 5 for heating the processing liquid are provided, respectively.
2A to 52E are installed.

As shown in FIGS. 2 and 3, a suction pipe 53 is connected to one end of each of the conduits 5A to 5E, and a nozzle 54 is connected to the other end.

For example, in the processing chamber 6A, the suction pipe 53
1 and protrudes into the processing chamber 6A, and its base end is connected to one end of the pipe line 5A when the rack 3 is loaded into the processing tank 2. ing.

On the other hand, the nozzle 54 is fixed to the rack 3 so as to penetrate through the side plate 31 and protrude into the processing chamber 6A.
5 is extended to the vicinity of the other side plate 32, and its base end 56 is connected to the other end of the conduit 5A when the rack 3 is loaded into the processing tank 2. And nozzle 54
A plurality of spout ports 57 that spout processing liquid are formed at positions facing the transport path of the film F.

Note that such a configuration is applicable to the processing chambers 6B, 6D, and 6E.
The same applies to the processing chamber 6C, except that the nozzle 54 is embedded in the block body 40.

Such pipe lines 5A to 5E and the corresponding pump 51
A to 51E, a suction pipe 53 and a nozzle 54 installed in the processing tank 2 constitute a processing liquid circulation means (circulation system) 5 that circulates the processing liquid to each of the processing chambers 68 to 6E.

In addition, various connectors, valves, etc. (not shown) may be installed in the middle of the pipes 5A to 5E.

In this processing liquid circulation means 5, when the pumps 51A to 51E and the heaters 52A to 52E are operated, the suction pipes 51A to 51E are activated.
The processing liquid sucked from 51E passes through the pipes 5A to 5E through one end of the pipes 5A to 5E, and then passes through the heaters 52A to 52E.
It is heated to a temperature as shown in Table 1 below, further reaches the other end of the pipes 5A to 5E, flows into the nozzle 54 from the base end 56 of the nozzle 54, and enters the respective processing chambers 6A to 5E from the spout 57. It is ejected into 6E. When the film F passes, the processing liquid jet from the jet port 57 is ejected toward the emulsion surface of the film F.

By providing such a processing liquid circulation means 5, the processing liquid in each of the processing chambers 6A to 6E is circulated and stirred, and the composition and temperature of the processing liquid are made uniform, so that good processing without uneven processing can be achieved. becomes possible. In particular, the processing solution is applied to the film F.
Since it is ejected towards the emulsion surface, stirring efficiency is improved.
Photographic properties can be improved.

The circulation rate of the processing liquid (flow rate in the pipe line) is not particularly limited, but is approximately 0.1 to 5 j/min per processing chamber, particularly 0.0 to 5.0 j/min.
It is preferable to set it as about 5-21/min. In this case, the circulation amount in each of the processing chambers 6A to 6E may be the same or different.

Note that the processing liquid circulation means 5 may be provided only in some of the processing chambers 6A to 6E (or no processing liquid circulation means may be provided at all).

The temperature of the processing liquid in each processing chamber 6A to 6E is 30 to 45°C.
It is better to set it as a degree.

As a means for keeping the temperature of the liquid in each of the processing chambers 6A to 6E constant, for example, as shown in FIG.
This temperature sensor 16 detects the temperature of the processing liquid at any time or in a timely manner, and based on this detected value, the heater 52A is controlled by a control means (not shown) such as a microcomputer.
It is possible to control ON/OFF or heat generation amount of ~52E.

A plate-shaped partition member 17 is installed in the rack 3 and is perpendicular to the side plates 31 and 32. As shown in FIG. 6, this partition member 17 partitions a first area 18 indicated by diagonal lines on the left side of the figure and a second area 19 indicated by crossed diagonal lines on the right side of the figure, and prevents the flow of the processing liquid in both areas. It is for blocking.

The first region 18 is a processing chamber 6 through which the film F first passes.
This area includes A, and in the illustrated example, also includes process 6B, which is passed through second.

The second region 19 is the processing chamber 6 through which the film F passes last.
E, and in the illustrated example, it also includes the process 6D that is passed through second to last.

Both ends 171 and 172 of the partition member 17 are tapered (second
It is preferable that the width gradually decreases toward the bottom in the figure), and that the corresponding walls 21 and 22 of the processing tank 2 are also tapered at the same angle. As a result, when the rack 3 is inserted into the processing tank 2, the ends 171 and 172 of the partition member 17 engage with the inner surfaces of the side walls 21 and 22 of the processing tank 2, respectively, and the first region 18 and the second region 19 and partition. At this time, the engaging portion comes into close contact with the rack 3 due to its own weight, substantially blocking the flow of the processing liquid.

Note that it is preferable to install a seal member (not shown) similar to the seal member 11 at this engaging portion, for example, the end portions 171 and 172, since this further improves the blocking performance of the processing liquid.

Regarding this seal member, the partition member 17 is also
The seal member and the seal member can be integrally formed by two-color molding or insert molding.

The taper angles of the ends 171, 172 of the partition member 17 and the side walls 21, 22 of the processing tank 2 are not particularly limited, but are preferably about 1 to 10 degrees with respect to the vertical direction.

Note that the constituent material of the partition member 17 is also the same as that of the block body 48.
~4o can be used, and partition member 1
7, each of the block bodies 4a to 4o, the side plates 31, 32, etc. may be joined to separate members or may be integrally formed.

Further, at predetermined positions in the height direction of the rack 3 on the outside of the side plates 31 and 32, flat plates 20 are installed which are perpendicular to the side plates 31 and 32 and the partition member 17, respectively.

The main shaft 82 passes through this flat plate 20 and is supported.

The installation position of the flat plate 20 is preferably at or near a certain height of the passages 71 to 74.

The flat plate 20 prevents the processing liquid from flowing in the vertical direction between the side plate 31 and the side wall 21 and between the side plate 32 and the side wall 22. Thereby, it is possible to prevent the processing liquids in each of the processing chambers 6A to 6E from mixing through the outside of the side plates 31 and 32.

Next, the usage and operation of the photosensitive material processing apparatus IB will be explained.

When starting the processing of the film F, the bleaching solution R2 and the fixing solution R2 are supplied from the supply channels 12 and 13, respectively, and a processing solution of a predetermined composition is supplied to each of the processing chambers 6A to 6E and each of the channels 71 to 74. It is filled.

At this time, as described above, since the blade 15 is configured to block the flow of the processing liquid when the leader 25 and the film F do not pass, when supplying the processing liquid,
For example, it is preferable to convey the empty leader 25 to which the film F is not connected to smoothly supply the film. Further, each of the processing chambers 6A to 6E may be provided with a liquid supply port (not shown) and filled with the processing liquid.

Next, the pumps 51A to 51E and the heaters 52A to 52E of each processing liquid circulation means 5 are operated to make each processing chamber 6A to 6E
Controls the temperature, circulates, and stirs the processing liquid inside. That is, pumps 51A to 51E and heaters 52A to 52E
When activated, the processing liquid sucked through the suction pipes 51A to 51E passes through one end of the pipes 5A to 5E, passes through the pipes 5A to 5E, is heated to a predetermined temperature by the heaters 52A to 52E, and then passes through the pipes 5A to 5E. The nozzle 54 reaches the other end of the channels 5A to 5E.
The liquid flows into the nozzle 54 from the base end 56 of and is ejected from the ejection port 57 into each of the processing chambers 6A to 6E.

Incidentally, such circulation of the processing liquid and temperature control are continued at least while the film F is being processed, and preferably continue even when the film F is not being processed.

In this state, when the film F-coupling machine 25 approaches the processing tank 2, replenishment of the processing liquid from the liquid supply paths 12 and 13 is started.

The reason why replenishment of the processing liquid is started almost simultaneously with the start of the processing of the film F as described above is because the blade 15 has a great effect of blocking the processing liquid. This is because the liquid substantially flows.

During the treatment period, this replenishment continues and the drain pipe 14
Approximately the same amount of processing solution as the total replenishment amount (bleach-fix solution R,)
is discharged.

On the other hand, when the conveying means is operated and the leader 25 is carried into the passage 75 along the curved surface 94 of the guide 92 with each sprocket 8 rotated, the locking hole 26 of the leader 25
The teeth of the sprocket 8 engage, moving the leader 25 into the processing chamber 6.
Then, as shown by the arrow in Fig. 2,
Processing chamber 6A, passage 71. Processing chamber 6B, passage 72, processing chamber 6C1 passage 73, processing chamber 6D, passage 74, and processing chamber 6
E, and then, after passing through the passage 76, are carried out along the curved surface 95 of the guide 93 to the outside of the processing tank 2.

The film F is then pulled by the leader 25 and conveyed along the same route.

In this way, while the film F is transported through each of the processing chambers 6A to 6E, the film F comes into contact with the processing liquid and undergoes desilvering processing. In this case, when the film F passes through the nozzle 54, the processing liquid jet ejected from the ejection port 57 collides with the emulsion surface of the film F, so that processing is accelerated.

In addition, in the processing chamber 6C, the leader 25 is conveyed along the curved surface 44 of the block body 40 (see the dashed line in FIG. 2), but the film F following it is conveyed due to the tension of the film F itself. By being pressed by the processing liquid jet from the nozzle 54, the edge portion of the film F passes through while contacting the roller 85 (see the two-dot chain line in FIG. 2).

When the processing is completed and the rear end of the film F is carried out of the processing tank 2, replenishment of the processing liquid is stopped at the same time.

In such processing, the liquid composition gradient in each processing chamber 6A to 6E is maintained well due to the shielding effect of the blade 15, and the squeezing effect of the blade 15 also prevents the liquid from flowing from the previous processing chamber to the subsequent processing chamber. Since the amount brought in is also extremely small, processing efficiency is significantly improved, and the amount of replenishment of bleaching solution R1 and fixing solution R2 can be significantly reduced.

The amount of replenishment may be approximately the amount of circulation determined by the gap created when the leader 25 and the film F pass through the blade 15.

Such replenishment amount mainly depends on the width, thickness, conveyance speed, etc. of the film F. In the case of 135 color negative film, the replenishment amounts of bleaching solution R3 and fixing solution R3 are approximately 3 to 7 ml and 15 to 20 ml per 1 m of film, respectively.
It is about mj.

This replenishment amount is about 50 to 80% of the conventional replenishment amount, and even with such a small replenishment amount, no desilvering failure occurs.

In this way, since the replenishment amount is reduced, each processing chamber 6
The amount of processing liquid circulated within A to 6E can be reduced, and the uniformity of liquid composition and temperature within each processing chamber 6A to 6E can be sufficiently maintained without complicated and strict temperature control. , good processing can be performed.

In addition, as a result of being able to improve processing efficiency, the volume of each processing chamber 6A to 6E can be reduced, and the pumps 51A to 51EJ and heaters 52A to 52E can be made smaller and have lower output. Contributes to downsizing of photosensitive material processing equipment.

Further, when the leader 25 and the film F are not passing through (non-processing), the blade 15 blocks the flow of processing liquid between adjacent processing chambers, so mixing of processing liquids hardly occurs. As a result, even if processing is interrupted for a long period of time and then restarted, efficient processing can be performed immediately.

The above-mentioned control of replenishment timing and replenishment amount, adjustment of circulation amount, temperature control of the processing liquid, etc. may be performed using known control methods and means.

In the above description, it is assumed that the processing liquid is replenished at the same time as the film F is processed, but the processing liquid may be replenished when the film F is not processed.

In such a case, a bypass may be provided to connect adjacent processing chambers, so that an amount of liquid corresponding to the amount of replenishment in the preceding processing chamber flows into the subsequent processing chamber.

In addition to the above, the photosensitive material processing apparatus 1B can be applied to various other processes such as development, bleaching, fixing, bleach-fixing alone, washing, stabilization, adjustment, and reversal. By appropriately selecting the supply/drainage pipes, etc., the flow of the processing liquid can be changed and used.

In general, in processing solutions containing compounds that react with silver halide, etc. in film F, such as developing solutions, bleach solutions, bleach-fix solutions, and fixing solutions, the flow of the processing solution is different from the washing water described above. It is preferable to flow in the same direction as the transport direction (parallel flow) in order to improve processing efficiency. In addition, regarding the processing liquid that has a fixing function, as well as washing with water,
Counter flow may also be used since it has the effect of washing out unnecessary substances in the emulsion layer of Film F.

Specific examples of the treatment liquid used in the present invention include the following.

Color developers generally consist of an alkaline aqueous solution containing a color developing agent.

The color developing agent is a primary aromatic amine developer, such as phenylene diamines (e.g. 4-amino-N, N-diethylaniline, 3-methyl-4-amino-N, N-diethylaniline, 4-amino-N-ethyl- N-β-hydroxyethylaniline, 3-methyl-4-amino-N-ethyl-N-β-hydroxyethylaniline.

3-methyl-4-amino-N-ethyl-N-β-methanesulfonamidoethylaniline, 4-amino-3-methyl-N-ethyl-N-β-methoxyethylaniline, etc.)
can be used.

The color developing solution may also contain a pH buffer, a development inhibitor, an antifoggant, and the like.

In addition, water softeners, preservatives, organic solvents, development accelerators, dye-forming couplers, competitive couplers, fogging agents, auxiliary developers, viscosity-imparting agents, polycarboxylic acid chelating agents, and antioxidants are added as necessary. , an alkaline agent, a solubilizing agent, a surfactant, an antifoaming agent, etc.

As the black and white developer, developing agents such as dihydroxybenzenes (e.g. hydroquinone), 3-pyrazolidones (e.g. 1-phenyl-3-pyrazolidone), and aminophenols (e.g. N-methyl-p-aminophenol) may be used alone or in combination. Can be used in combination.

As a fixing solution, compounds (fixing agents) that have a fixing effect on silver halide include ammonium thiosulfate, sodium thiosulfate (hypo), ammonium halide,
Examples include those containing thiourea, thioether, etc.

Examples of the bleaching solution include those containing iron salts of polycarboxylic acids, red blood salts, bromate compounds, cobalt hexamine, and the like as bleaching agents. Of these, potassium ferricyanide, sodium iron(I) ethylenediaminetetraacetate, and ammonium iron(I) ethylenediaminetetraacetate are particularly useful.

Furthermore, a bleaching/fixing solution containing both the bleaching agent and the fixing agent described above may be used.

In addition to the fixing agent, the fixing solution (bleach/fixing solution) can usually contain fixing aids such as preservatives such as sodium sulfite, acid agents, buffers, and hardening agents.

In addition, the bleaching solution (bleaching/fixing solution) has US Patent No. 3.0
No. 42,520, No. 3.241966, Special Publication No. 1973
In addition to the bleaching accelerators described in Japanese Patent Publication No. 8506-8506 and Japanese Patent Publication No. 45-8636, and the thiol compounds described in Japanese Patent Application Laid-open No. 65732-1983, various additives can also be added.

As the washing water, water (distilled water, ion-exchanged water, etc.) or this water can contain additives as necessary.

These additives include, for example, chelating agents such as inorganic phosphoric acid, aminopolycarboxylic acid, and organic phosphoric acid, fungicides that prevent the growth of various bacteria and algae, fungicides, magnesium salts,
Examples include hardening agents such as aluminum salts, surfactants for preventing drying load and unevenness, and the like. Or L, E
.

West Water Quality Cr1te
ria″Photo, Sci, andEng,, vo
1, 9 No., 6 P344-359 (1965), etc. can also be used.

As the stabilizing liquid, a processing liquid that stabilizes the dye image is used. For example, a solution having a buffering capacity of pH 3 to 6, a solution containing an aldehyde (for example, formalin), etc. can be used. Optical brighteners, chelating agents, bactericidal agents, fungicides, hardeners, surfactants, and the like can be used in the stabilizing liquid as necessary.

For details on these processing solutions, please refer to "Fundamentals of Photographic Engineering" edited by the Photographic Society of Japan, published by Corona Publishing (1978), p. 299.
You can refer to the descriptions in "Chapter 4 Development Process", etc.

The photosensitive material processing apparatuses IA and IB described above include, for example, a large automatic developing machine, a small automatic developing machine (mini lab), a photo print making coin machine, a portable color negative developing machine, a color negative/color paper integrated developing machine, etc. It can be applied to material processing equipment.

Now, the film F, which is the subject of the present invention, is preferably a long strip-shaped film. This film F has perforations (holes) formed at one or both side edges, and the density of perforations per screen is 4 or less, preferably 2 or less, and more preferably 1 or 0 per screen. .5 pieces.

Hereinafter, an example of the structure of this film F will be explained based on FIGS. 9 to 14.

As shown in FIGS. 9 to 14, the film F is used for shooting (
It is composed of a screen (image portion) Fl formed by exposure (light exposure) and a frame portion F2 formed around this screen F1. Note that in each figure, the screen F1 is shaded.

Here, the frame portion 2 is preferably unexposed. The reason for this is that if the frame portion 2 is pre-exposed, such as with 110 film or Instamatic, the area to be developed becomes large, leading to an increase in the amount of processing solution replenishment, and the narrow processing path mentioned above. This is because it goes against the purpose of processing in the processing tank.

In addition, perforations F3 are formed in frame portions F2 at both end portions of the film F for feeding the film F within the camera and positioning the film F at the exposure section.

This perforation F3 is preferably constituted by a rectangular through hole.

Hereinafter, an example of the formation pattern of this perforation F3 will be explained.

In the example shown in FIG. 9, the screen F1 is a full-size screen, and one side edge of the film F has one screen per screen Fl.
Perforations F3 are formed at a ratio of .

This perforation F3 is used to align the exposure section in the camera.
3 are preferably formed at equal intervals.

In addition, as shown in the figure (the perforation F3 is formed at a position between the adjacent screens F1), the processing liquid flows through the perforation F3 during processing, and the processing liquid flows in the width direction of the film F. There is an advantage that even if a so-called tailing phenomenon occurs, it does not affect the screen F1.

In the example shown in FIG.
Two perforations F3 are formed per screen.

In the example shown in FIG.
Two perforations F3 are formed per screen.

In this case, each perforation F3 is formed at a position between adjacent screens F1 as described above, and the film F3 is formed at a position between adjacent screens F1.
It is targeted at both ends of .

In the example shown in FIG.
Two perforations F3 are formed per screen.

In this case, the perforation F3 is formed at one side end between adjacent screens F1, and at the other side end near the center of the screen F1 in the longitudinal direction of the film.

FIGS. 13 and 14 show an example in which the screen Fl is half size.

In the example shown in FIG.
Two perforations F3 are formed per screen (half size).

In addition, perforation F with the same pattern as shown in Figure 13
When full-size photography is performed using film F having 3 perforations, each frame (full size) has 4 perforations.

In the example shown in FIG. 14, perforations F3 are formed at one end of the film F at a rate of 0.5 per one screen (half size).

When half-size photography is carried out using film F having the same pattern of perforations F3 as shown in FIG. 9, the configuration shown in FIG. 14 is obtained.

Note that the formation pattern of perforation F3 is the ninth
It is limited to those shown in Figures to Figure 14, and may be any combination of those shown in each figure, or any other bark.

In this way, by controlling the formation density of perforations to 4 or less per screen, the following various effects can be obtained.

(2) In processing the film F, when the film F passes through the aforementioned narrow processing path 60A or the passages 71 to 76, the processing liquid flows and flows through the perforations.

At this time, the flow of the processing liquid becomes irregular, and processing unevenness may occur in the image near the sides of the perforations, but since the number of perforations is small, such processing unevenness is prevented from occurring.

(2) Since the number of perforations is small, there is less possibility of tearing, that is, a phenomenon in which the film F is cut at the perforations when tension is applied to the film F. Furthermore, the elongation of the film F also decreases.

Because of this, the durability of the film F is improved.

(2) When the film F is transferred between adjacent processing tanks, for example, from a developing tank to a bleaching tank, the developer attached to the film F is brought into the bleaching tank.

In this case, the developer exists not only on the surface of the film F but also in the form of a film within the perforations, which is brought into the bleaching tank, but since the number of perforations is small, the amount brought in is small. As a result, stable and good processing continues, and the amount of replenishment liquid to be refilled is also reduced.

■ Because the film transport mechanism is simple, the film
Since the tongue portion is not required, the area of the tongue portion can be made smaller than before. As a result, the amount of developer consumed is reduced, and the amount of replenisher refilled is reduced.

■ On the film F, especially in the frame part F2, for example, the upper part of the photograph (presence or absence of strobe, color temperature, LV value, photographing distance, etc.)
Lens focal length, subject contrast, shooting date and time, shooting location, etc.), film information (film type,
film manufacturing date, printing conditions, etc.), laboratory information (laboratory name, development date, printing conditions for simultaneous printing, etc.)
An information recording section may be provided to record information such as.

In this case, when the number of perforations is small, the range of selection of the installation position and installation pattern of the information recording section is widened, and the area of the information recording section can also be increased.

Here, the information recording section may be of any format such as optical recording or magnetic recording, and examples include a magnetic track, a bar code, an exposed section utilizing the photosensitivity of the film itself, etc. .

Furthermore, in the case of color film, information can be recorded in three different color sensitivities.

In addition, such information recording is possible using IC memory (ROM, RA) in the cartridge that stores the film F.
M) and storing the information therein may be adopted alone or in combination with the above.

■ When transporting the film in the processing tank, in particular, as mentioned above, the blades 15 are installed in the processing path 60A and the paths 71 to 74.
When the blade 15 is provided, there is sliding resistance between the film F and the blade 15, so that the transport resistance of the film F increases.

The sliding resistance between the film F and the blade 15 occurs particularly at the perforations, so if the number of perforations is small, this sliding resistance is reduced and the transportability of the film F is improved. In addition, as mentioned above, the film F
is transported by being towed by a league 25, etc., but as the transport resistance increases, the tension applied to the film F increases, making it more likely to tear.Furthermore, due to the increase in tension, the edge shape of the perforation may become curved. This deforms and further increases the sliding resistance with the blade.The present invention can suppress the occurrence of such a phenomenon and improve the transportability of the film F.

(2) As mentioned in (2) above, when the number of perforations is small, the transport resistance of the film F is reduced and the number of times the perforations come into contact with the blade 15 is reduced, so that the life of the blade 15 is extended.

■ Depending on the location and spacing of the perforations, it is possible to easily and accurately transport and position the film within the camera or on the film carrier.

In the present invention, the type of film to be processed is not particularly limited, and may be either color or black and white. Examples include color negative film, color reversal film, color positive film, black and white negative film, micro film, and movie film.

Further, the size of the film F is not particularly limited, but a size of 135 is usually preferable.

Although the present invention has been described above with reference to configuration examples, the present invention has the following features:
Needless to say, it is not limited to these.

<Example> Hereinafter, specific examples of the present invention will be described.

Urinary eyes E hill [Photosensitive material processing equipment] (1) As a comparison equipment, an automatic developing machine (without a blade) manufactured by Fuji Photo Film Co., Ltd. model FNCP-40B having a normal box-shaped processing tank was used.

■ Narrow width of multiple processing chambers (slit width W = 2.0mm)
An automatic developing machine having processing tanks having the configuration shown in FIGS. 2 to 7 and connected by passages was used. The total length of the passages with respect to the total path length in the treatment tank was set to the values shown in Table 1.

In addition, one pair of silicone rubber blades having the configuration shown in FIG. 8a were installed in each of the passages 71 to 74.

(2) The procedure was the same as (2) above, except that the total length of the passages relative to the total path length in the treatment tank was changed.

(2) An automatic developing machine having a processing tank configured as shown in FIG. 1 in which the processing space is constituted by a processing path with a narrow width (slit @ W = 2.0 mm) was used.

In addition, eight polypropylene blades having the configuration shown in FIG. 8b were installed in the processing path along the longitudinal direction of the processing path.

[Treatment liquid] The following treatment liquids I to (■) were put into the treatment tanks of each of the apparatuses (1) to (2) above, and the treatment was carried out.

■...Developer prescription/Fuji Photo Film Co., Ltd. color negative processing agent CN-1
6N.

B...Bleach solution and fixing solution (For device ■, bleach-fix solution) Bleach solution formula/manufactured by Fuji Photo Film Co., Ltd. Color negative processing agent CN-16N 2 Fixer formulation/manufactured by Fuji Photo Film Co., Ltd. Color negative processing agent CN-16N.

■・・・Washing water and stabilizing liquid Rinsing water prescription/tap water Stabilizer formulation/manufactured by Fuji Photo Film Co., Ltd. Color negative processing agent CN-16N.

[Film] Fuji Color Super HG manufactured by Fuji Photo Film Co., Ltd. was used as a color negative film (135 mm width), and the perforation formation pattern was as follows.

A...Number of perforations per one screen of the conventional product: 16 B...Number of perforations per one screen of the pattern shown in Fig. 9: One perforation C...Number of perforations per one screen of the pattern shown in Fig. 11 24 full-size images were taken on each of these films A, B, and C, and these films were sequentially processed using the combinations of automatic processors and processing solutions shown in Table 1 below.
The occurrence of uneven processing was investigated.

The results are shown in Table 1 below.

The evaluation method for processing unevenness is as follows.

Development processing...development unevenness The position corresponding to the perforation Visually check the tailing and unevenness of the placement.

bleaching Fixing treatment...uneven desilvering Analyze the remaining silver amount using fluorescent X-ray analysis, Evaluate based on the degree of variation. Ba If the roughness is large, uneven desilvering will occur. This means that the

Washing (stability) treatment...Residual color unevenness (residual active ingredient unevenness) Visually judge the occurrence of unevenness after storing the processed film in an environment of 60°C and 70% RH.The occurrence of unevenness can be determined using the above evaluation method. Display in the following four stages.

0: No unevenness at all ○: Almost no unevenness △: Some unevenness ×: Significant unevenness Book: Examples of the present invention As shown in Table 1 above, In the examples of the present invention in which the processing apparatus (1), (2), or (2) is combined with the film B or C, the occurrence of processing unevenness is prevented for any processing liquid.

Next, each of the above films A, B and C in the processing tank.
The transportability of the blade and the durability (life) of the blade were investigated.

The results are shown in Table 2 below.

The evaluation method for film transportability and blade durability is as follows.

[Film Transportability] Each film was passed through a processing tank for a length of 4000 m, and the tension applied to the film was continuously measured during that time, and the maximum value was evaluated.

The symbols in Table 2 are as follows.

0...Maximum tension less than 0.7kgf○...Maximum tension 0.7kgf or more and less than 1.5kgf△
...Maximum tension 1.5 kgf or more but less than 2.2 kgf
...Maximum tension: 2.2 kgf or more [Blade durability] The shielding ability (sealing performance) of the blade was evaluated after each film was passed through a treatment tank over a length of 4000 m. In addition,
The shielding ability of this blade was evaluated by the amount of liquid leaked per unit length of the blade under pressurized treatment liquid.

The symbols in Table 2 are as follows.

0...Liquid leakage amount 2ml Not wet○...Liquid leakage amount 2ml or more and less than 4ml△...Liquid leakage amount 4mj or more and less than 8IIIjX...Liquid leakage amount 81 or more As shown in Table 2 above, In the example of the present invention in which processing device (1) or (2) is combined with film B or C, both film transportability and blade durability are excellent.

<Effects of the Invention> As described above, according to the method for processing a photosensitive material for photographing according to the present invention, it is possible to prevent the occurrence of processing unevenness in a photosensitive material for photographing.

In addition, especially when a blade is installed in the processing path, it improves the conveyance of photographic photosensitive materials, especially long photographic photosensitive materials, prevents elongation of the photographic photosensitive material and jamming accidents, and blades. It also improves the durability of.

[Brief explanation of drawings]

FIG. 1 is a cross-sectional side view showing an example of the configuration of a photosensitive material processing apparatus used in the present invention. FIG. 2 is a cross-sectional side view showing another example of the structure of the photosensitive material processing apparatus used in the present invention. FIG. 3 is a sectional view taken along the line -m in FIG. 2. 4 is a partially cutaway perspective view showing the structure near the passage in FIG. 2. FIG. 5 is a cross-sectional front view showing the structure of the lower end of the photosensitive material processing apparatus shown in FIG. 2. FIG. FIG. 6 shows the first part of the photosensitive material processing apparatus shown in FIG.
FIG. 3 is a schematic diagram showing a region and a second region. FIG. 7 is a circuit configuration diagram schematically showing an example of the configuration of processing liquid circulation means in the photosensitive material processing apparatus shown in FIG. 2. FIGS. 8a, 8b, 8c, and 8d are cross-sectional side views showing enlarged configuration examples of the blade, respectively. FIG. 9, FIG. 10, FIG. 11, FIG. 12, FIG. 13, and FIG. 14 are plan views showing the shape of the film applied to the present invention, respectively. Explanation of return LA, IB...Photosensitive material processing equipment 2.2A...Processing tank 3A...Housing 30A...Hot water 31A...Water supply port 32A...Drain port 40A...Outside tank Wall material 50A... Inner tank wall material 55A... Groove 57A... Handle 60A... Processing channels 61A to 69A... Small space 7A... Liquid supply port 8A... Liquid drain port 9A. ...Feed rollers 10A, 11A...Crossover rollers 21.22.
...Side wall 3...Rack 31.32...Side plates 4a to 4o...Block body 42...Recess 43...Notch groove 44...Curved surface 45...Protrusion 5... Processing liquid circulation means 5A to 5E... Pipe lines 51A to 51E... Pumps 52A to 52E... Heater 53... Suction pipe 54... Nozzle 55... Tip 56... Base end 57. ... Spout ports 6A to 6E... Processing chambers 71 to 76... Passage 8... Sprocket 81... Rotating shaft 82... Main shaft 83.84... Bevel gear 85... Roller 9...・Guide 91...Opening 92.93...Guide 94.95...Curved surface 10...Roller 11...Seal member 12.13...Liquid supply path 14...Drainage pipe 15 ... Blade 16 ... Temperature sensor 17 ... Partition member 171, 172 ... End portion 18 ... First region 19 ... Second region 20 ... Flat plate 25 ... League 26 ... ... Locking hole 27 ... Adhesive tape 28 ... Notch F ... Film Fl ... Screen F2 ... Frame part F3 ... Perforation Q ... Processing liquid R3 ... Bleaching liquid R2...Fixer R1...Bleach-fixer Applicant: Fuji Photo Film Co., Ltd. Agent: Patent attorney Kakan Ishii, Patent attorney
Increase 1) Tatsuya FIG, 4 F C) F I G, 6 FIG, 7 A b v bhi FIG, 8b F I G, 8c FIG, 8d FIG, 9 F F I G, 1O FIG, 11 "FIG, 12

Claims (2)

[Claims] (1) Processing a photosensitive material for photography using a processing tank that has a narrow processing path in the processing tank, the total length of which accounts for 20% or more of the total length of the processing path in the processing tank. Processing of the photosensitive material for photography, characterized in that the photosensitive material for photography has perforations formed at one or both side edges, and the density of formation of the perforations is 4 or less per screen. Method. (2) The method for processing a photosensitive material for photographing according to claim 1, wherein a blade capable of shielding the narrow processing path is installed in the narrow processing path.