JPH02199452A - Processing method for photosensitive material - Google Patents

Abstract

PURPOSE:To enhance the photographic characteristics, such as sensitivity and gradation, of the photosensitive material and to suppress the generation of tailing by injecting a developing soln. packed into a processing path having a slit shape to the emulsion surface of the photosensitive material while circulating the soln. under prescribed conditions. CONSTITUTION:A developing tank is formed by inserting a rack 14 into a housing 12 and a pair of side plates 16 of the rack 14 are connected by a block body 20. The processing path of the photosensitive material S is formed to the slit-shaped section by the block bodies 20, 50, an inverting roller 24 and transporting rollers 28, 30, 32, 48. The developing soln. 10 is so circulated via pipes as to be jetted to the processing path 46 from nozzle holes 201 formed to the feed side block 20 of the photosensitive material S; in addition, the soln. 10 is so circulated that nearly the whole volume thereof is exchanged within one minute. The blocks 20, 50 are produced by blow molding of polyethylene, etc.

Description

DETAILED DESCRIPTION OF THE INVENTION <Industrial Application Field> The present invention relates to a method for processing a photosensitive material by wet processing a silver halide photosensitive material.

<Prior art> In MU, in wet processing, a silver halide photosensitive material (hereinafter referred to as photosensitive material) after exposure is processed according to the steps of development, (bleaching) fixing, and washing with water. .

When processing such photosensitive materials, it is desired to reduce the amount of processing liquid such as developer and the amount of replenishment from the viewpoint of resource saving and environmental protection.

For example, Japanese Patent Application Laid-Open No. 131138/1983 was published as a method for preventing developer fatigue over time and reducing the amount of replenishment from this point of view.
In the publication, the surface area of the liquid level part is set to 5 cm2. Volume in Vcm
3 and the opening degree Kcm-' is K = S/V, the processing path configured so that the liquid level satisfies jogK≦-1,8xlO-5V-1,5 is substantially slit-shaped. A developer tank is disclosed.

In the developing tank described above, since the processing path is slit-shaped, the liquid in the processing path tends to mix (<, non-uniformity of the liquid composition occurs in the length direction of the processing path, and once it becomes non-uniform, , there is a problem that this tends to expand and the variation in photographic properties increases.

In order to deal with such problems and to improve the temperature rise of the developer, the present inventors previously developed a photosensitive material processing apparatus that wet-processes a photosensitive material after exposure. A photosensitive material processing apparatus characterized in that a space having a slit-like cross section is filled with a processing liquid to form a processing path for the photosensitive material, and the processing liquid is circulated and heated. (Patent Application No. 63-278625).

Further, in the photographic developing apparatus disclosed in Japanese Utility Model Application Publication No. 63-148944, a stirring blade is installed at a predetermined position to stir the developing solution and prevent the fatigue solution from stagnation.

<Problems to be Solved by the Invention> However, simply circulating the developer or installing stirring blades as described above does not provide sufficient stirring, and as a result, sensitivity, gradation, etc. There is a problem that the photographic quality is not sufficient. Another problem is that tail tailing becomes noticeable.

SUMMARY OF THE INVENTION An object of the present invention is to provide a method for processing a photosensitive material that has good photographic properties such as sensitivity and gradation and suppresses the occurrence of tailing.

Means for Solving the Problems> In order to achieve the above object, the present invention has the following configuration.

A method for processing a photosensitive material in which a silver halide photosensitive material after exposure is wet-processed, wherein when the photosensitive material is processed with a processing solution having a developing function, the developing method is applied to a processing path formed by a space having a slit shape in cross section. Processing of a photosensitive material characterized by filling a processing liquid with a developing function and spraying the processing liquid with a developing function onto the emulsion surface of the photosensitive material while circulating it so that almost the entire amount is replaced within one minute. Method.

Effects> According to the present invention, after exposure, a silver halide photosensitive material (hereinafter referred to as photosensitive material) is subjected to processing such as development, (bleaching) fixing, and washing with water according to the processing steps.

In this case, a developing solution, which is a processing solution having a developing function, is filled into a processing path formed by a space with a slit-like cross section, and during processing, the developing solution is circulated so that almost the entire amount is replaced within one minute. The photosensitive material is simultaneously sprayed onto the emulsion surface of the photosensitive material.

By doing so, photographic properties such as sensitivity and gradation are improved, and the occurrence of tailing is suppressed.

<Specific configuration> Hereinafter, a specific configuration of the present invention will be explained in detail.

FIG. 1 shows one embodiment of a developing tank having a processing path formed by a slit-shaped space in cross section, as a processing tank having a developing function used to carry out the method for processing photosensitive materials of the present invention. ing.

By using a developer tank having such a structure, the amount of the developer can be reduced, and the contact surface between the air and the developer can be reduced, so that deterioration of the developer can be prevented.

The developing tank shown in FIG. 1 has a structure in which a rack 14 is inserted into a housing 12 whose upper end is open.

The rack 14 is provided with a pair of side plates, and these pair of side plates are connected by a block body 20.
In FIG. 1, only one side plate 16 of the pair of side plates is shown.

Above the block body 20, there are carry-in rollers 52, 56 for carrying silver halide photosensitive material (hereinafter referred to as photosensitive material) S into the developer 10, and carry-out rollers 54, 58 for carrying out the photosensitive material S after development. is set up. Conveyance rollers 48 for conveying the photosensitive material S are installed below the carry-in rollers 52, 56 and the carry-out rollers 54, 58. Further, a reversing roller 24 is installed near the concave portion formed by shifting the block body 20 to reverse the photosensitive material S from the loading direction to the unloading direction. Above the reversing roller 24 is a conveying roller 28.30.3 that conveys the photosensitive material S.
2 is installed.

The block body 50 is installed in the vertical direction near the middle of the space of the block body 20, with carry-in rollers 52, 56 and carry-out rollers 54, 58 installed on both sides.

In this block rest 50, a conveyance roller 32 and a conveyance roller 48 are installed.

Then, the above block body 20.50, reversing roller 24
A processing path 46 having a slit-like cross section is formed by the conveying rollers 28.30° and 32.48°.

The cross section of the slit-shaped processing path 46 through which the photosensitive material S passes has a gap of about 0.5 to 30 mm, preferably 0.8 to 30 mm.
It may be about 8 mm.

By providing such a gap, the photosensitive material S can be transported without any hindrance, and the occurrence of scratches due to transport can also be prevented.

In the above, the block body 20.50 may be solid or hollow, but as shown in the figure, it is preferable that it has a hollow structure and is produced by blow molding.

Blow molding is a method in which thermoplastic resin is preformed into a tube shape by extrusion or injection to form a parison, which is then placed in a mold, air is blown into the inside, and the parison is cooled and solidified. For details, please refer to books such as "Plastic Processing Technology Handbook (New Edition)" published by Nikkan Kogyo Shimbun, etc. In the present invention, the above-mentioned block body 20.50 All you have to do is create it.

In this case, the thickness of the resin is approximately 0.5 to 10 mm.

Examples of thermoplastic resins that can be used include polyethylene, polypropylene, polyphenylene oxide, polyethylene terephthalate, polyvinyl chloride, polycarbonate, polyamide, phenoxy resin, polysulfone, polystyrene, acrylic resin, polyacetal, unsaturated polyester, ABS resin, etc. However, in the present invention, polyethylene, polyphenylene oxide,
Phenoxy resins are preferred.

In this way, by applying blow molding, the weight can be reduced, and benefits such as cost reduction and improved workability can be obtained.

In the present invention, pumps 40 and 45 are installed in the developer tank. This pump 40 pumps the developer 1 taken out from near the transport roller 28 on the loading side of the photosensitive material S.
0 is circulated through a pipe so as to be jetted into the processing path 46 from a nozzle hole 201 formed on the processing path 46 side of the block body 20.

During this circulation, in addition to the developer 10 from the processing path 46, a replenisher may be injected, for example, from the direction R in the figure.

On the other hand, the pump 45 jets the developer 10 taken out from the vicinity of the transport roller 30 onto the processing path 46 from a nozzle hole 202 formed on the processing path 46 side of the block body 20 on the unloading side of the photosensitive material S. The water is circulated through pipes.

In the above, the circulation rate may be such that the entire amount of developer filled in the processing path is exchanged within 1 minute, preferably within 0.5 minutes, approximately 0.5 to 60J/min, Preferably it is about 2 to 8 j/min.

With such a circulation amount, the composition of the developer becomes uniform, the occurrence of tailing is suppressed, and photographic properties are improved, such as increased sensitivity and gradation.

In such a case, the nozzle holes 201 and 202 are installed in the block body 20 facing the emulsion surface of the photosensitive material S.

As shown in the figure, the nozzle holes 201 and 202 are preferably provided throughout the processing path, but depending on the case, they may be provided in the first half of the processing path, for example, in a portion of about 1/4 to 172.

The nozzle holes 201 and 202 are arranged so that the developer 10 flows in parallel with the direction in which the photosensitive material S is transported.
It is preferable that the apertures be provided so as to be inclined in the direction in which the photosensitive material S is transported.

In this case, the nozzle hole may be spot-like as shown in FIG. 3a, or slit-like as shown in FIGS. 3b and 3c.

Further, as shown in FIG. 3d, the area of the central part of the photosensitive material S is small, and the area of the side of the photosensitive material S is large, so that uniform spraying can be achieved. .

The size of the nozzle hole is approximately 0.2 to 2 mm in diameter as shown in Figure 3a, for example, approximately 0.8 mm x 20 mm as shown in Figures 3b and 3c, and as shown in Figure 3d. It is preferable that the nozzle length is about 2 to 20 mm, and the depth of the nozzle hole is 5 mm or more.

With such a depth, stirring becomes good.

The injection pressure may be about 2 to 80 kg/cm2.

Further, the linear velocity of the liquid is approximately 0.5 to 20 ml/min.

At this time, in order to improve the directivity of the nozzle part, for example, the nozzle diameter on the inlet side of the injection port may be made large and the nozzle diameter on the outlet side may be made small, or a spiral groove may be provided in the nozzle diameter. is preferred.

In addition, in the present invention, in the developer tank, if necessary,
An overflow hole (not shown) for maintaining the liquid level of the developer 10, a replenishment tank (not shown), and the like are installed.

Therefore, in the above configuration, the photosensitive material S is carried into the developer 10 by the carry-in rollers 52 and 56, and is conveyed in the developer 10 by the conveyance roller 48, the block body 50, the conveyance roller 32, and the conveyance roller 28.

In this case, the photosensitive material S near the carry-in rollers 52 and 56
The photosensitive material S is carried in with the emulsion surface facing downward (toward the carrying roller 52 side), and during the above-mentioned conveyance process, the developer is circulated by the pump 40 and jetted from the nozzle hole 201 onto the emulsion surface of the photosensitive material S.

By jetting the emulsion surface in this way,
The processing liquid becomes uniform, and the processing chemicals in the processing liquid penetrate into the sensitive material film more quickly, which has the effect of promoting the exchange of tired chemicals in the sensitive material film with new chemicals, resulting in improved sensitivity, Photographic properties such as gradation are improved, and the occurrence of tailing is also suppressed.

Furthermore, during circulation, a replenisher may be introduced, which is preferable and allows the above-mentioned effects to be further improved.

The photosensitive material S transported as described above and reversed from the transport direction to the transport direction by the reversing roller 24 is transported through the developer lO by the transport rollers 30, 32, 48 and the block body 20, and is then transported by the transport rollers 54, 58. retrieved by

In this case as well, in the above conveyance process,
The developer is circulated by the pump 45, and the developer is circulated through the nozzle hole 202.
A jet is sprayed onto the emulsion surface of the photosensitive material S.

In the illustrated example, the pumps P are installed at two locations, but the embodiment is not limited to this, and various embodiments are possible.

Further, the developer tank is connected to the transport roller 28 in the block body 20.
Alternatively, the structure may be such that it can be opened and closed as a thin-walled hinge near the conveyance roller 30.

In the present invention, the developing tank having a processing path formed by a slit-shaped space in cross section is not limited to that shown in FIG. 1, but may be one as shown in FIG. 2. It may be.

The developer tank shown in FIG. 2 has a structure in which a lid 68 from which a comb-shaped upper lid 66 is suspended is disposed in an upper opening of a housing 64. As shown in FIG. A handle 70 is provided at the center of the top surface of the lid 68.

The upper lid 66 has a plurality of upper lid members 72 made of resin such as vinyl chloride having a rectangular cross section arranged almost vertically, and photosensitive material feed reels 76 to 80 are arranged at the joints of the upper and lower ends of these upper lid members 72 .

Inside the housing 64, a tank wall material 74 that is combined with the upper lid material 72 to form a processing channel 75 is arranged. Therefore, the upper lid material 72 and the tank wall material 74 form a slit-like processing path 75 that continues in a corrugated manner, and photosensitive material feed reels 76 to 80 are arranged at the upper and lower bent portions of the processing path 75, respectively. become. The processing path 75 is then filled with the developer 10.

In the present invention, the cross section of the slit-shaped processing path 75 through which the photosensitive material S passes has a gap of 0. The length may be 2 to 50 mm, preferably 04 to 10 mm.

With such a gap, there is little space for the developer to escape between the photosensitive material and the processing path or reel, so that the developer can be transported without any damage and without any problems.

Further, the length of the processing path 75 between the photosensitive material feed reels, for example between the photosensitive material feed reel 76 and the photosensitive material feed reel 77, is 5 cm or more, preferably 10 cm or more. Good.

A photosensitive material carrying-in reel 84 for carrying the photosensitive material S to the artificial part of the processing path 75 and a photosensitive material carrying-out reel 86 for carrying the photosensitive material S out from the exit part of the processing path 75 are installed in the developing tank.

By providing such a processing path with a slit-like cross section, the amount of developer can be reduced.

In the above, the upper lid material 72 and the tank wall material 74 can be manufactured by blow molding.

However, when blow molding is used, a certain amount of strength reinforcement is required.

By applying blow molding, weight reduction is realized, and benefits are obtained in terms of cost reduction and mass productivity.

Further, a pump 85 is installed in the illustrated developer tank. The pump 85 pumps the developer 10 taken out from near the photosensitive material feed reel 80 through a nozzle hole 741 formed in the tank wall material 74 extending from below the photosensitive material carry-in reel 84 to near the photosensitive material feed reel 76 and the photosensitive material feed reel. The nozzle holes 742 formed in the tank wall material 74 extending from the vicinity of the photosensitive material feed reel 77 to the vicinity of the lower side of the photosensitive material feed reel 77 are used to circulate the photosensitive material via a vibrator so as to jet the photosensitive material into the processing path 75, respectively.

The circulation amount, nozzle, etc. may be the same as described above, and the same effects can be obtained.

Note that in the illustrated developing tank, the nozzle hole is located in the first half of the processing path, 1/1
The structure is such that it is provided in about 3 parts.

Photosensitive material carrying-in reel 84 and photosensitive material carrying-out reel 86
Below the overflow hole 80. which maintains the liquid level.
82 are installed respectively.

In the above, it is preferable that the developing tank is a closed system with a small opening degree, so that deterioration of the developing function of the developer can be prevented.

In this case, the opening degree Kcm-' is 5c
m2. When the volume is Vcm'' and =S/V, the following relationship is satisfied: 1ogK≦-1,8XIO-5V-A.

Here, A is 1, more preferably 1.5, particularly preferably 2.0, and even more preferably, in addition to this condition, V
<5×10'.

Therefore, in the above configuration, the photosensitive material S is carried into the processing path 75 via the photosensitive material carrying reel 84, is processed while being carried through the developer 10 by the plurality of photosensitive material feeding reels 76 to 80, and is then carried out. Reel 86 is removed by pump 85.

In this case, the developer is circulated by the pump 85 in the processing path from below the photosensitive material feed reel 84 to the vicinity of the photosensitive material feed reel 76 and from the vicinity of the photosensitive material feed reel 76 to the vicinity of the photosensitive material feed reel 77. Jets are ejected from nozzle holes 741 and 742 onto the emulsion surface of the photosensitive material S, respectively.

By jetting in this manner, the same effects as described above can be obtained.

In the present invention, the processing solution having a developing function may be either a black and white developer or a color developer, and may be selected as appropriate depending on the photosensitive material to be processed.
, - may be a bath image (bleach) fixer.

The processing method for the photosensitive material of the present invention is as follows: black and white development, constant color development, water washing, drying, color development, bleach fixing, water washing, drying, color development, bleaching, constant color development, water washing, dry color development, bleaching, bleach fixing, water washing, drying, black and white. Examples include development, washing with water, reversal treatment (fogging exposure or fogging bath treatment), color development, bleaching, constant dyeing, washing with water, drying, black and white development, washing with water, color development, bleach-fixing, washing with water and drying.

In addition, various steps such as a prehardening bath, a neutralization bath, and an image stabilization bath may be combined as necessary.

Furthermore, instead of the water washing treatment, a simple treatment method may be used, such as performing only a so-called "stabilization treatment" without providing a substantial water washing step.

It may also be a bath image (bleach) fixing process.

In the present invention, if the processing tank having the configuration shown in FIG. 1 or 2 for carrying out the method of the present invention is applied only to the processing tank having a developing function, there are no particular restrictions on the configuration of other processing tanks. However, a treatment tank with the same configuration can be applied to treatment tanks such as a (bleach) fixer tank and a washing tank.

Further, conventional processing tanks such as a (bleach) fixing tank and a washing tank may be used, and various embodiments are possible under the above-mentioned limitations.

In this case, there is a fourth
A treatment tank configured as shown in the figure can be used,
It is preferable to use such a treatment tank.

The processing tank shown in FIG. 4 is configured to fill a housing 94 with a processing liquid 10'O depending on the purpose of processing.

Above the housing 94, the photosensitive material S is processed a1.
A carry-in roller 91 for carrying the processing liquid 100 into the processing liquid 100 and a carry-out roller 92 for carrying the processing liquid 100 out are installed.

Further, a reversing roller 93 for reversing the photosensitive material S from the loading direction to the unloading direction is installed in the lower part of the housing 94.

Furthermore, a pump 95 is installed in the processing tank.

This pump 95 takes out the processing liquid 100 from the processing tank and jets it onto the surface of the photosensitive material S from a nozzle installed in the center of the processing tank.

In this case, the depth of the nozzle hole 97 is preferably 5 mm or more, and by doing so, the stirring power is improved and the efficiency of fixing and washing is improved.

Other configurations of the nozzle, such as the nozzle diameter, may be the same as described above.

Further, even when the processing tank as described above is applied to a developing tank, the stirring power is improved and the development efficiency is improved compared to a tank using a conventional stirring method.

In the present invention, the black and white developer used in the development process includes dihydroxybenzenes (e.g. hydroquinone), 3-pyrazolidones (e.g. l-phenyl-3-pyrazolidone).
, aminophenols (for example, N-methyl-p-aminophenol), and other known developing agents can be used alone or in combination.

Color developers generally consist of an alkaline aqueous solution containing a color developing agent.

The color developing agent is a known primary aromatic amine developer, such as phenylenediamines (e.g. 4-amino-N, N-diedylaniline, 3-methyl-4-amino-NN-diedylaniline, 4-amino-N-ethyl-N). -β-hydroxyethylaniline, 3-methyl-4-amino N-ethyl-N-β-hydroxyethylaniline, 3-methyl-4-amino-N-ethyl N-β-methanesulfonamidoethylaniline, 4-amino -3-methyl-N-edyl N-β-methoxyedylaniline, etc.) can be used.

The color developing solution may also contain a pH buffer, a development inhibitor, an antifoggant, and the like.

In addition, water softeners, preservatives, organic solvents, development accelerators, dye-forming couplers, competitive couplers, fogging agents, auxiliary developers, viscosity-imparting agents, polycarboxylic acid chelating agents, and antioxidants are added as necessary. , an alkaline agent, a solubilizing agent, a surfactant, an antifoaming agent, etc.

The processing temperature of the color (color development) or black and white developer in the present invention is preferably 30"C to 50C, more preferably 33C to 42C. Furthermore, the development process in the present invention is as described above. It may be a replenishment method that replenishes the developer, or a non-replenishment method.

The fixing solution or bleach-fixing solution used in the present invention contains a fixing agent.

Fixing agents include ammonium thiosulfate, sodium thiosulfate (hypo), ammonium halides, thiourea,
Examples include thioether.

In the case of a bleach-fixing solution, it contains a bleaching agent in addition to these fixing agents, and specific examples thereof include iron salts of polycarboxylic acids, red blood salts, bromate compounds, cobalt hexamine, and the like. Of these, potassium ferricyanide, sodium iron(II+) ethylenediaminetetraacetate, and ammonium iron(m) ethylenediaminetetraacetate are particularly useful.

In addition to the fixing agent, the fixing solution or bleach-fixing solution can usually contain fixing aids such as preservatives such as sodium sulfite, acid agents, buffers, and hardening agents.

In addition, for bleaching or bleach-fixing solutions, U.S. Patent No. 3,04
No. 2,520, No. 3.241966, Special Publication No. 1973-
In addition to the bleach accelerators described in Japanese Patent Publication No. 8506 and Japanese Patent Publication No. 45-8636, and the thiol compounds described in Japanese Patent Application Laid-Open No. 53-65732, various additives can also be added.

The rinsing water used in the rinsing step can contain known additives, if necessary.

For example, chelating agents such as inorganic phosphoric acid, aminopolycarboxylic acid, and organic phosphoric acid, disinfectants that prevent the growth of various bacteria and algae, fungicides, hardening agents such as magnesium salts and aluminum salts, drying load, and unevenness. A surfactant or the like can be used to prevent this. Or L, E,
West.

“Water Quality Cr1teria”P
Hot, Sci, and Eng-.

vol, 9 No. 6 P344-359 (1965)
Compounds described in et al. can also be used.

As the stabilizing liquid used in the stabilizing step, a processing liquid that stabilizes the dye image is used. For example, a solution having a buffering capacity of pH 3 to 6, a solution containing an aldehyde (for example, formalin), etc. can be used. Optical brighteners, chelating agents, bactericidal agents, fungicides, hardeners, surfactants, and the like can be used in the stabilizing liquid as necessary.

The light-sensitive material in the present invention may be any of various color and black and white light-sensitive materials. For example, color negative film, color reversal film, color photographic paper, color positive film, color reversal photographic paper, photosensitive material for plate making,
X-ray photographic material 1. black and white negative film, black and white photographic paper,
Examples include microphotosensitive materials.

<Example> Hereinafter, the present invention will be specifically explained with reference to Examples.

Example 1 A developer tank having the same configuration as that shown in FIG. 1 except that the replenisher was supplied or configured was installed in the developing section of a color negative film processing machine for Champion 23 manufactured by Fuji Photo Film Co., Ltd. did.

The processing solution is processing agent CN-16 manufactured by Fuji Photo Film Co., Ltd.
The photosensitive material used was Fuji Photo Film Co., Ltd.'s Super HR100 film, and the photosensitive material was processed after sensitometric exposure or after printing a 20 mm x 20 mm square rectangular image on a negative.

The block body 20.50 of the developer tank described above is made of polyethylene by blow molding.

Further, the gap in the slit cross section of the processing path was approximately 0.8 mm.

The amount of developer is 2I2. The developer was circulated by a pump at a rate of 3 ρ/min (indicated by the exchange rate in the table) and jetted from the nozzle hole. In this case, the depth of the nozzle hole is 7 mm, and the size of the nozzle hole is 0.8 mm.
20 mm (see Figure 3b), and the injection pressure was 7 kg/
cm2, and the liquid linear velocity was 2 to 20 ml/min.

This is called processing method A.

In processing method A, change the pump capacity and use 1
Processing method B involves circulation at a rate of 0°C/min.

However, the depth of the nozzle hole is 5mm, and the nozzle diameter is 0.4mm.
~5mm, and the injection pressure was 3~12 kg/
cm", and the liquid linear velocity was 2 to 20 m/min.

This is called processing method B.

Also, change the pump capacity in the same way and pump the developer at 12/min.
Processing methods C and D circulated at a rate of 0.3ρ/min.
shall be.

However, in processing methods C and D, the nozzles used were as follows.

Treatment method Nozzle hole depth Nozzle hole size
Injection pressure Liquid linear velocity C0, 5mm 5nvn
X20nvn 1.3kg/m20.5m/min (see Figure 3b) D 1mm Diameter 10nvn
0.4 kg/m21 m/min Further, in processing method A, the same processing was carried out except that a pump and nozzle were not installed in the developing tank. This is called processing method E.

The photographic properties of images processed by these processing methods A to H were investigated. In addition, cyclodensity measurements were performed on rectangular images to examine tail tails.

The results are shown in Table 1.

The tail tail was determined by microdensitometry of the density of a rectangular image using green light. More specifically, in FIG. 5, ρ+, I22, and I23 are tails.

Example 2 In the developing tank in processing method A of Example 1, replenisher CN manufactured by Fuji Photo Film Co., Ltd. was added from the point R in Figure 1.
The same operation was performed (processing method F) except that running was carried out while supplementing -16Q NQIR, and after two rounds, the photographic properties and tailing were examined in the same manner as in Example 1. Furthermore, processing unevenness was also investigated.

Processing unevenness is measured by measuring the density in the length direction of a portion uniformly exposed to gray light, and is expressed as the average density and its standard deviation under green light.

The results are shown in Table 2.

In addition, the same operation was performed in processing method E of Example 1 except that the replenisher was refilled near the reversing roller 24 and the conveyance roller 28 through a pipe (referred to as processing method G), and after two rounds, the same procedure as above was performed. Table 2 also shows the results of the investigation regarding the following items.

Example 3 The same operation as in Example 1.2 was performed except that the developing tank shown in FIG. 2 was used, and results equivalent to those described above were obtained.

<Effects of the Invention> According to the present invention, photographic properties such as sensitivity and gradation are good, and the occurrence of tailing can also be suppressed.

[Brief explanation of the drawing]

FIG. 1 and FIG. 2 are a cutaway sectional view and a cutaway end view, respectively, schematically showing an embodiment of a processing tank having a developing function that is applied to carry out the method of processing a photosensitive material of the present invention. Figures 3a to 3d are front views for explaining the shape of the nozzle, respectively. FIG. 4 is a cutaway sectional view schematically showing an embodiment of the processing tank used in the present invention. FIG. 5 is a microdensitometry diagram for explaining tail tailing. Explanation of symbols 20.50...Block body 40.45.85...Pump 46.75...Processing path 201.202.741.742...Nozzle hole procedure amendment form (voluntary) 1. Indication: Heisei 1 Single-Time Patent Application No. 020091 2, Name of the invention: Processing method for photosensitive materials 3, Person making the amendment Relationship to the case Patent applicant name: Fuji Photo Film Co., Ltd. 4, Agent address: 113-6, Amendment: Contents (1) “Phenoxy resin,
” to be deleted. (2) Delete "unsaturated polyester" from lines 12 and 13 on page 9. (3) Correct "phenoxy resin" on page 9, line 15 to "polypropylene." (4) Page 12, line 17 [2-80kg/cm
Correct J to rO, 02~0, 8kg/cm2j. (5) r 7 kg/cm2 on page 28, line 14
Correct J to r 0 , 07 kg/cm2J. (6) “3 to 12 kg/cmJ” on page 29, line 1 of the same
Correct it to ro, 03 to 0.12 kg/cm2J.

Claims (1)

[Claims] (1) A method for processing a photosensitive material, which wet-processes a silver halide photosensitive material after exposure, in which a processing path is formed by a space having a slit shape in cross section when processing the photosensitive material with a processing solution having a developing function. The photosensitive material is filled with a processing liquid having a developing function, and the processing liquid having a developing function is sprayed onto the emulsion surface of the photosensitive material while being circulated so that almost the entire amount of the processing liquid is replaced within one minute. How materials are processed.