JPH0483251A - Photosensitive material processing device - Google Patents

Abstract

PURPOSE:To lessen the generation of unequal processing and the fluctuation in photographic characteristics by connecting a nozzle provided in the vicinity of a photosensitive material feed port and a processing liquid suction port provided in the vicinity of the bottom in a processing space via a circulating means and directing the injection direction of the nozzle toward the direction where the photosensitive material is transported. CONSTITUTION:The processing liquid is injected from the nozzle 19 provided in the vicinity of the feed port 12 in the processing space 11 toward the photosensitive surface of the photosensitive material S and is sucked from the suction port 21 provided in the vicinity of the bottom. This liquid is sent to the nozzle 19 via the circulating means P. Since the injection direction of the processing liquid from the nozzle 19 is directed toward the direction where the photosensitive material S is transported, the tailing and unequal processing generated at the end edge in the opposite direction of the photosensitive part with respect to the direction where the photosensitive material is transport are prevented. In addition, the unequal photosensitive is lessened. Since the processing liquid is injected to the photosensitive surface, the material eluted from the photosensitive surface into the processing liquid is wiped away and the photosensitive surface is processed by the uniform processing liquid at all times. The processed photosensitive material having the good photographic characteristics is obtd. with stability in this way.

Description

DETAILED DESCRIPTION OF THE INVENTION <Industrial Application Field> The present invention relates to a photosensitive material processing apparatus for developing, for example, a film-like photosensitive material in a narrow processing space.

<Prior Art> Conventionally, a technique (hereinafter referred to as slit development) of developing a photosensitive material using a slit-type processing tank having a narrow processing space in the thickness direction of the photosensitive material is known (Japanese Patent Application Laid-open No. (Sho 63.-131138).

In this slit development, the area of the open part of the processing space, that is, the part that comes into contact with the atmosphere, is small, so there is no risk of evaporation or deterioration of the processing solution.
(Also, since the volume of the processing space is small, when processing with the replenishment method, the exchange rate of new replenisher is high. Even when processing small quantities, the effects of evaporation and oxidative deterioration of the solution are small. Also, when not using the replenishment method, only a small amount of processing liquid is required.

Therefore, in both the replenishment method and filling method,
It has the advantage that a small amount of running fluid is required.

On the other hand, when such slit development is applied to an automatic film processor, there are the following problems.

In other words, since the amount of processing liquid filled in the processing space is small,
The concentration of the substance eluted from the photosensitive material increases rapidly, and the processing space is narrow, making it difficult to mix the processing solutions.

Therefore, non-uniformity of the liquid composition tends to occur along the transport direction of the photosensitive material, and once non-uniformity occurs, the non-uniformity of the liquid composition increases in the processing liquid along the transport direction of the photosensitive material. There is a tendency to

For this reason, there was a drawback that processing unevenness and variation in photographic properties became large.

Furthermore, when the photosensitive material is transported within the processing space, the processing liquid flows relative to the photosensitive material. In the photosensitive area, eluted substances are generated during processing, and due to the above-mentioned relative liquid flow, the side edge of the photosensitive area in the direction opposite to the direction in which the photosensitive material is conveyed is affected by the eluted substances. In particular, in the case of a developer, development inhibiting components such as halogen ions and development inhibitors are eluted as eluted substances, so there is a drawback that so-called tailing occurs in areas adjacent to photosensitive areas. Furthermore, the development inhibiting component eluted in this manner causes sensitivity unevenness on the photosensitive surface.

In particular, near the entrance where the photosensitive material is first immersed in the processing solution, there is a large amount of soluble substances from the photosensitive material (and because this is the area where unprocessed photosensitive material is continuously fed, There was a problem in that the aforementioned non-uniformity of the processing liquid was significantly increased, and unevenness in tail sensitivity also occurred significantly.

<Problems to be Solved by the Invention> The present invention maintains the advantages of the conventional slit development technology described above, while ensuring a uniform processing liquid state within the slit-shaped processing space, and eliminating processing unevenness and variations in photographic properties. It is an object of the present invention to provide a processing apparatus that can reduce the occurrence of turbidity, prevent the occurrence of tailing and sensitivity unevenness, and obtain a photographic material processed to have good photographic properties.

〈Means for solving problems〉 The above object is achieved by the following invention.

That is, the present invention provides a photosensitive material processing apparatus having a processing tank for filling a processing liquid into a narrow processing space for storing and transporting a photosensitive material to process the photosensitive material, and in which the processing space contains the photosensitive material. A nozzle for spraying a processing liquid toward the photosensitive surface is provided at least near the photosensitive material inlet, a processing liquid suction port is provided near the bottom of the processing space, and the nozzle and the suction port are connected to each other through a circulation means. and connect,
The photosensitive material processing apparatus is characterized in that the ejection direction of the nozzle is directed toward the photosensitive material conveyance direction with respect to the photosensitive material.

<Function> The photosensitive material is fed into the processing space of the processing tank from the inlet and immersed in the processing liquid within the narrow processing space. The photosensitive material is transported within the processing space while being immersed in the processing solution.

A processing liquid is sprayed toward the photosensitive surface of the photosensitive material from a nozzle provided in the vicinity of the entrance in the processing space.

The processing liquid is sucked in from a suction port provided near the bottom of the processing space and sent to the nozzle via a circulation means.

Therefore, within the processing space, the processing liquid circulates from the carry-in port side toward the bottom.

Since the processing liquid is ejected from the nozzle in the direction in which the photosensitive material is transported, tailing and processing unevenness occurring at the edge of the photosensitive portion on the opposite side to the direction in which the photosensitive material is transported is prevented. In addition, sensitivity unevenness is also reduced.

Further, since the processing liquid is sprayed onto the photosensitive surface, substances eluted into the processing liquid from the photosensitive surface are wiped away, and the photosensitive surface is always processed with a uniform processing liquid.

As a result, it becomes possible to stably obtain a processed light-sensitive material having good photographic properties.

<Specific configuration> An embodiment of the present invention will be explained in detail below.

FIG. 1 is a side cross-sectional view of a processing apparatus l which is a first embodiment of the present invention. The processing tank 3 constituting the processing apparatus 1 is composed of an outer member 5 and an inner member 7. A recess 9 whose bottom portion is curved in an arc shape is formed inside the outer member 5 . Further, the lower end of the inner material 7 is formed in an arc shape in a side view, and by inserting the inner material 7 into the recess 9, the photosensitive material S is processed between the outer material 5 and the inner material 7. A narrow processing space 11 is formed for this purpose.

In the processing apparatus 1 of this embodiment, the processing space 11 is configured to have a vertical U-shape in side section and a slit-shape in cross section.

Note that the internal member 7 may be solid or hollow, and a hollow structure is preferable because the heat retention of the processing liquid 13 is improved.

As shown in the figure, the longitudinal end of the processing space 11 opens on the upper surface of the processing tank 3, and one opening serves as a loading port 12 into which the photosensitive material S is inserted, and the inserted photosensitive material S enters the processing space. 1, and is sent out from the other outlet 14.

That is, the processing space 11 becomes a conveyance path for the photosensitive material S.

The distance in the thickness direction (slit interval) of the processing space 11 having the slit-like cross section is preferably about 4 to 100 times, particularly about 8 to 40 times, the thickness of the photosensitive material S to be processed.

By providing such a gap, the photosensitive material S can be transported without any hindrance, and the occurrence of scratches due to transport can also be prevented.

Although the conveying means for the photosensitive material S is omitted in the drawing, various conveying methods such as a conveying method using a leader tape and a conveying method using a conveying roller can be used. In the case of the first embodiment, the photosensitive material S is transported with its photosensitive surface facing toward the outer material 5 side.

The processing space 11 is filled with a processing liquid 13 . The type of processing liquid 13 varies depending on the use of the processing device 1, and includes, for example, a developing solution, a bleaching solution, a fixing solution, a bleaching/fixing solution,
Examples include washing water and stabilizing liquid.

In the processing space 11, a liquid supply port 15 and a liquid drain port 17 are provided near the upper opening, respectively.
5 is arranged on the loading port 12 side. A fresh processing liquid 13 is supplied into the processing space 11 from the liquid supply port 15, and is used for processing the photosensitive material S within the processing space 11. The processing liquid 13 in the processing space 11 is discharged from the drain port 17 by overflow.

On the other hand, as shown in FIGS. 1 and 2, a plurality of holes are formed in the wall portion 18 defining the recess 9 of the outer member 5 so as to be inclined upward from the recess 9 side, and the processing liquid 13 It constitutes a nozzle 19 that injects.

On the other hand, the bottom curved part of the processing space 11 curved in a U-shape,
That is, an inlet 21 for the processing liquid 13 is opened at the bottom of the recess 9 .

The suction port 21 communicates with a heater H built in the outer member 5, and the heater H is further connected to a pump P.

The pump p includes a liquid distribution path 2 provided in the external member 5.
3 is connected to the processing space 11 by the nozzle 19.
It has a structure in which the liquid distribution path 23 and the liquid distribution path 23 communicate with each other.

The liquid distribution path 23 is disposed outside the wall portion 18 of the processing space 11 in the side view shown in FIG. 1, and both are connected to the pump P at the bottom.

In the processing apparatus I of this embodiment, the nozzle 19 and the suction port 21 are connected to the heater H, the pump P and the liquid distribution path 23 described above.
are connected by circulation means constituted by. Furthermore, heater H has a built-in sensor.
The temperature of the circulating processing liquid 13 is detected at any time, and the processing liquid 13 is
The heater H is controlled to maintain the temperature at the optimum temperature.

Further, as an auxiliary to the heater H, various planar heating elements H3 may be provided on the front and rear sides of the pump P, or the heater H may be replaced with only the planar heating element Ht. The mounting position of the other planar heating element is internal member 7.
It may be attached to the outer wall side of the wall (the specific structure in this case is disclosed in Utility Model Application No. 2-29516).

Examples of such planar heating elements include panel heaters with built-in heaters, oil circulation panel heaters, planar heating elements containing various conductive fillers, and heater elements covered with insulating materials, among others. Particularly preferred are those containing a conductive filler and those in which the heater element is coated with an insulating material (such as an organic material, ceramics, or a mixture thereof). Examples of conductive fillers include organic conductive fillers such as carbon-based materials such as carbon black, graphite, and carbon fibers, metal powders such as iron, aluminum, titanium, and nickel, or titanium dioxide, iron oxide, and oxide. Examples include inorganic conductive fillers such as metal oxide powders such as zinc and magnesium oxide.

Other specific configurations are disclosed in Patent Application (2) Drying Apparatus filed on June 26, 1990 by Ganto Hatake.

As described above, the processing space 11 and the liquid distribution path 23 are communicated with each other through the hole bored in the wall 18 of the external member 5, but the nozzle angle α in this embodiment is On the side of the opening 12, it is inclined in the conveying direction of the photosensitive material S, and the angle α on the acute side of the angle formed with the surface of the photosensitive material S is
is preferably 20 to 70 degrees, preferably 35 to 55 degrees.

Therefore, the processing liquid 13 injected from the nozzle 19 has a parallel flow on the photosensitive material S loading port 12 side, and a counter flow on the loading ratio port 14 side.

By the nozzle 19, suction port 21, and circulation means described above, the processing liquid 13 in the processing space 11 is circulated around the suction port 21 on the carry-in port 12 side and the carry-out port 14 side, respectively.

In the device of the first embodiment, as shown in FIG.
Nozzles 19 are provided over the entire area from the vicinity of the carry-in port 12 and the carry-out port 14 at the top to the vicinity of the bottom.

The arrangement position of the nozzle 19 is not limited to the case of this embodiment, and may be provided only in the vicinity of the entrance 12. Loading entrance 12
Specifically, the vicinity of is from just below the surface of the processing liquid where the photosensitive material S is first immersed in the processing liquid 13 to near the transport direction side where the eluted substance first starts to elute from the photosensitive material S being transported. It may be provided only at the elution position of the eluted substance or just below the surface of the processing liquid.

Normally, 1/100 of the total length of the processing space 11 from the loading port 12
It is sufficient to set the position to about 1/20. The nozzles 19 have a circular shape as shown in FIG. 2, and are arranged in a staggered manner. Here, the diameter of the nozzle 19 is preferably about 0.5 to 3 mm, and the depth of the nozzle 19 (hole) is preferably 3 mm or more. The injection pressure of the nozzle 19 is 01 to 10 k
g/cm, and the linear velocity at the nozzle 19 of the treatment 'tM13 is 0.1 to 10 m/sec.

At this time, in order to improve the directivity of the nozzle part, for example, the nozzle diameter on the inlet side of the nozzle should be made large and the nozzle diameter on the outlet side small, or a spiral groove should be provided in the nozzle diameter. is preferred.

On the other hand, FIG. 3 is a perspective view of the wall surface of the recess 9 showing a second embodiment in which the cross-sectional shape of the nozzle 19 is slit-like.

In the case of this example, the shape of the nozzle opening is 0.1~
The size is approximately 2 x 35 to 180 mm.

In the case of the first and second embodiments, the nozzle 19
Since it is provided over almost the entire area of 8, processing space 1
The pressure applied to each nozzle port from No. 1 changes primarily in the vertical direction.

That is, due to the water pressure of the processing liquid 13 in the processing space 11, the pressure applied to the nozzle 19 at the upper position becomes low, and the pressure applied to the nozzle 19 at the bottom becomes high. Because the processing liquid 13 is supplied, it is located at the upper part (carrying inlet 12 and
The linear velocity of the jet flow from the nozzle 19 (located in the vicinity of No. 4) is the highest, and becomes slower toward the bottom of the processing space 11.

As a result, the processing liquid 1 is ejected from the nozzle 19 in the vicinity of the inlet 12 where the amount of soluble substances from the photosensitive material S is the largest.
The agitation and/or circulation action of 3 is best exhibited, and processing unevenness and variations in photographic properties are effectively prevented.

Furthermore, since the spraying direction of the processing liquid 13 is tilted toward the conveyance direction of the photosensitive material S, the processing liquid 13 is sprayed from the side opposite to the conveyance direction where tailing occurs on the photosensitive surface. In addition to dramatically increasing the effectiveness of preventing tail tail,
Sensitivity variations are also reduced.

Furthermore, the nozzle 1 near the carry-in port 12 and the carry-out port 14
9 is placed below the surface of the processing liquid and is oriented in the direction of gravity (downward), so that even if the linear jetting velocity in the processing 7 and 13 is high, the droplets of the processing liquid sprayed onto the photosensitive material S will not Problems such as splashing to the outside of the processing tank 3 or spilling of the processing liquid 13 outside the processing tank 3 due to jet flow gushing out from below the surface of the processing liquid can be avoided.

On the other hand, since the nozzle 19 is inclined toward the suction port 21, there is little turbulence in the circulation flow (and the circulation efficiency is good).

Note that since the processing liquid 13 is directly sprayed onto the photosensitive surface, the eluted substances eluted into the processing liquid 13 are immediately wiped away, making it easier for the processing liquid 13 to permeate into the emulsion layer. processing is facilitated. Therefore, the processing time can be shortened, and/or the concentration of the processing agent in the processing liquid 13 can be diluted, and the amount of replenishment can be reduced. Furthermore, it is possible to expand the processing capacity and reduce the running cost of the processing liquid 13.

Particularly in the case of the first embodiment, since the nozzles 19 are arranged over the entire area of the wall portion 18, it is possible to bring out the above-mentioned effects even more markedly.

The dilution level of the processing liquid 13 is 1. For example, in the case of a developer, 5 to 25% of water can be added to the normal processing liquid. Alternatively, the replenishment amount can be reduced by 5-25%.

In the case of the second embodiment, in addition to the above-mentioned effects, since the nozzle 25 has a long slit shape in the width direction of the photosensitive material S, the processing liquid 13 is constantly sprayed uniformly in the width direction of the photosensitive surface. Stable photographic properties can be obtained.

FIG. 4 is a side sectional view of the third embodiment.

The processing tank 31 is composed of an outer member 33 and an inner member 35, as in the first embodiment. The inner member 3 is inserted into the O-shaped recess 37 formed in the longitudinal direction of the outer member 33.
5 is inserted, and a processing space 38 having a slit-like cross section similar to that of the first and second embodiments is formed between the outer member 33 and the inner member 35. In the third embodiment, the photosensitive material S is conveyed within the processing space 38 with the photosensitive surface facing toward the internal material 35 side.

A nozzle 39 is provided on the outer surface of the internal member 35 .

A suction port 41 is provided at the lower end of the internal member 35, and the suction port 41 is connected to a heater H built in the internal member 35, and the heater H is further communicated with a pump P. . The heater H has a built-in sensor H as in the first embodiment described above. Further, the heater may be provided as a planar heater on the front and rear sides of the pump P as in the first embodiment.

On the other hand, inside the internal member 35, a liquid distribution path 47 communicating with the pump P is provided in the vertical direction, and a nozzle hole of the nozzle 39 communicates with the liquid distribution path 47. The processing liquid 13 is distributed from the pump P to the nozzle 39 via the nozzle 39 .

As explained above, the circulation means consisting of the heater H, the pump P, and the liquid distribution path 47 is provided within the internal member 35.

Note that the shape of the nozzle opening is similar to the shape of the first or second embodiment described above.

In the third embodiment having the above configuration, in addition to the effects of the first and second embodiments, since the circulation means is unitized within the inner member 35, the size of the outer member 33 is reduced. , the device can be made more compact. Further, by removing the internal member 35, there is an advantage that the circulation means can be easily repaired or repaired.

As a method for manufacturing the internal member 35, as shown in a side view as shown in FIG. One possible method is to form a sheet and bond them together.

In this case, it is sufficient to manufacture both the left and right components of the same standard, and the manufacturing cost is also low. In addition, since only one liquid distribution path is required, the processing liquid 1 circulating in the processing tank 31 is
3 is also required, and the running cost of the processing liquid 13 is further reduced, and the metabolism of the exhausted processing liquid and the replenishing processing liquid is improved, improving processing efficiency.

In addition, in the same structure as the embodiment described above, it is also possible to arrange the nozzle 19 only on the loading port 12 side of the photosensitive material S. In this case, the jet flow generated by the nozzle causes the replenisher to be supplied to the replenisher
5 to the drain port 17, which has the advantage of promoting the metabolism of the processing liquid.

As explained above, each effect of the device of the present invention is as follows:
This effect is most noticeable when the photosensitive material S is used for development processing, where it is most affected by substances eluted in the processing solution.

In the present invention, when a developer is used as a processing solution having a developing function, it may be either a black and white developer or a color developer, which may be selected as appropriate depending on the photosensitive material to be processed. It may also be a bath developer (bleach) fixer.

The method of processing a light-sensitive material using the present invention is as follows: black and white development (constant) - drying color development - bleaching (constant) - washing with water → drying color development - bleaching (constant) - washing with water - drying color development - bleach - bleach-fixing - washing - dry black and white Examples include development, washing with water, reversal treatment (fogging exposure or fogging bath treatment), color development, constant bleaching, washing with water, drying, black and white development, washing with water, color development, bleach-fixing, washing with water, and drying.

In addition, various steps such as a pre-hardening bath, a neutralization tower, and an image stabilizing bath may be combined as necessary.

Furthermore, it can also be used in a processing device for simple processing, such as performing only a so-called "stabilization treatment" without providing a substantial water washing step instead of a water washing treatment.

Alternatively, -bath development (bleaching) fixing treatment may be used.

In the present invention, the present invention is not limited to the case where a developing process is performed, but a plurality of processing apparatuses as shown in the figure are installed in parallel, a crossover means is provided between each processing apparatus, and the various processes described above are continuously performed by the apparatus of the present invention. It is also possible to have a configuration in which this is done.

The type of photosensitive material processed by the processing apparatus of the present invention is not particularly limited, and examples include color negative film, color reversal film, color photographic paper, color positive film, color paper, color reversal paper, photosensitive material for plate making,
Various photosensitive materials include line photographic photosensitive materials, black and white negative films, black and white photographic paper, and microphotosensitive materials.

The processing tank of the present invention can be used by being incorporated into various photosensitive material processing devices, such as wet copying machines, automatic developing machines, printer processors, video printer processors, coin machines for making photo prints, and color paper processing machines for plate inspection. be able to.

When the present invention is used for black and white development processing, the black and white developer used includes dihydroxybenzenes (e.g. hydroquinone), 3-pyrazolidones (e.g. 1-phenyl-3-virazolidone), aminophenols (e.g. N- Known developing agents such as (methyl-p-aminophenol) can be used alone or in combination.

On the other hand, the color developer used when the present invention is used for color development processing is generally composed of an alkaline aqueous solution containing a color developing agent.

The color developing agent is a known primary aromatic amine developer, such as phenylene diamines (e.g. 4-amino-N, N-diethylaniline, 3-methyl-4-amino-N, N-diethylaniline, 4-amino-N- Ethyl-N-β-hydroxyethylaniline, 3-methyl-4-amino-N
-ethyl-N-β-hydroxyethylaniline, 3-methyl-4-amino-N-ethyl-N-β-methanesulfonamidoethylaniline, 4-amino-3-methyl-N
-ethyl-N-β-methoxyethylaniline, etc.) can be used.

The color developing solution may also contain a pH buffer, a development inhibitor, an antifoggant, and the like.

In addition, water softeners, preservatives, organic solvents, development accelerators, dye-forming couplers, competitive couplers, fogging agents, auxiliary developers, viscosity-imparting agents, polycarboxylic acid chelating agents, and antioxidants are added as necessary. , an alkaline agent, a solubilizing agent, a surfactant, an antifoaming agent, etc.

The processing temperature of the color (color development) or black and white developer in the present invention is preferably 30°C to 50°C, more preferably 33°C to 42°C.

Further, the development process in the present invention may be performed by a replenishment method in which the developer is replenished as described above, or a non-replenishment method.

The fixing solution or bleach-fixing solution used in the present invention contains a fixing agent.

Fixing agents include ammonium thiosulfate, sodium thiosulfate (hypo), ammonium halides, thiourea,
Examples include thioether.

In the case of a bleach-fixing solution, it contains a bleaching agent in addition to these fixing agents, and specific examples thereof include iron salts of iron polycarboxylic acids, red blood salts, bromate compounds, cobalt hexazine, etc. . Among these, potassium ferricyanide,
Sodium iron(III) ethylenediaminetetraacetate and ammonium iron(III) ethylenediaminetetraacetate are particularly useful.

In addition to the fixing agent, the fixing solution or bleach-fixing solution can usually contain fixing aids such as preservatives such as sodium sulfite, acid agents, buffers, and hardening agents.

In addition, for bleaching or bleach-fixing solutions, U.S. Patent No. 3,04
No. 2,520, No. 3.241゜966, Special Publication No. 1973
In addition to the bleaching accelerators described in Japanese Patent Publication No. 8506-8506 and Japanese Patent Publication No. 45-8636, and the thiol compounds described in Japanese Patent Application Laid-open No. 65732-1983, various additives can also be added.

The rinsing water used in the rinsing step can contain known additives, if necessary.

For example, chelating agents such as inorganic phosphoric acid, aminopolycarboxylic acid, and organic phosphoric acid, disinfectants that prevent the growth of various bacteria and algae, fungicides, hardening agents such as magnesium salts and aluminum salts, drying load, and unevenness. A surfactant or the like can be used to prevent this.

Or L, E, West, -Water Qu
arityCriteria″Photo, Sci,
and Eng,, vol, 9 No, 6P344~
359 (1965) and the like can also be used. As the stabilizing liquid used in the stabilizing step, a processing liquid that stabilizes the dye image is used. For example, pH3
A solution having a buffering capacity of ~6, a solution containing an aldehyde (for example, formalin), etc. can be used. Optical brighteners, chelating agents, bactericidal agents, fungicides, hardeners, surfactants, and the like can be used in the stabilizing liquid as necessary.

The light-sensitive material in the present invention may be any of various color and black and white light-sensitive materials. For example, color negative film, color reversal film, color photographic paper, color positive film, color reversal photographic paper, photosensitive material for plate making,
Examples include X-ray photosensitive materials, black and white negative films, black and white photographic paper, and microphotosensitive materials.

Although the present invention has been described above with reference to configuration examples, the present invention has the following features:
Needless to say, the invention is not limited to these.

<Example> Hereinafter, the present invention will be specifically explained with reference to Examples.

The processing apparatus 1 shown in FIG. 1 was installed in the development processing section of a color negative film processing machine for Champion 23 manufactured by Fuji Photo Film ■.

The photosensitive material to be processed is disclosed in Patent Publication No. 708 of 1988.
The material shown in Example 5 described in Publication No. 57 was used.

The processing solution was a color developer with the composition shown in Table 1 mixed with water for 20 minutes.
% diluted solution was used.

Table 1 Diethylenetriaminepentaacetic acid 1-hydroxyethylidene-1゜1-diphosphonic acid Sodium sulfite Potassium carbonate Potassium bromide Potassium iodide Hydroxyamine 4-(N-ethyl-N-6-hydroxyethylamino)-2-methylaniline sulfate water Add 1.0 1.1 2.0 2.2 4.0 30.0 1.4 1.3mg 2.4 4.5 4.4 32.0 0.7 2.6 5.0 1 liter 1 liter The width of the slit cross section of the processing space 11 in the thickness direction is 2.5
mm, and the longitudinal depth was 900 mm.

The amount of the developer (processing solution) was 1.5ρ, the developer was circulated by a pump at a rate of 8β/min, and jetted from the nozzle 19. In this case, the depth of the nozzle 19 is
8mm, nozzle hole size is 0. , 9aa + diameter (see Fig. 2), the injection pressure was 1.3 kg/cm'', and the linear velocity of the nozzle 19 was 05 to 2 m/sec. The intervals between the nozzles 19 arranged in a staggered manner were , 12m vertically and horizontally
It was set as m. Further, the angle α between the nozzle jet direction and the photosensitive material S was set to 40 degrees.

Further, the conveyance speed of the photosensitive material was 0.62 m/min. Other processing steps are shown in Table 2.

Table 2 Knee 1 Kuruno Ran Kurushi Masa Mu±” Carved i-Color development
3 minutes 15 seconds 38℃ 81245mj floating
White 1 minute 00 seconds 38℃ 4 Q
20mN bleach fixing 3 minutes 15 seconds 38℃
8C30 stable stability 40 seconds 3
Table 3 shows the results obtained under the above conditions per 35 m/m width and 1 m length of photosensitive material at 5°C and 41,220 m1.

The comparative example was carried out in a structure without a nozzle under the same conditions as the above-mentioned example of the present invention.

The photosensitive material was processed after sensitometric exposure, half exposure, and printing of a 1010×10 square wave image.

The presence or absence of processing unevenness was determined by visually observing development unevenness in the 5-half exposed area.

The tail tail was determined visually by making a color print of the border between the white and black areas of the square wave image area.

Explanation of symbols 1... Processing device 3... Processing tank 5... External material 7... Internal material 9... Concavity 11... Processing space 12... Carrying in port 13... Processing liquid 14...Export port 15...Liquid supply port 17...Drain port 18...Wall portion 19...Nozzle 21...Suction port 23...Liquid distribution path 25...Nozzle 31 . . . Processing tank 33 . is good,
It is possible to obtain a processed photosensitive material in which the occurrence of sensitivity unevenness and tailing is suppressed.

[Brief explanation of drawings]

FIG. 1 is a side sectional view of a processing apparatus according to a first embodiment of the present invention. FIG. 2 is a partial perspective view of the inner wall of the recess of the outer member showing the shape and arrangement of the nozzle holes in the first embodiment. FIG. 3 is a partial perspective view of the inner wall of the recess of the outer member in the second embodiment. FIG. 4 is a side sectional view showing the device of the third embodiment. 37... Concavity 38... Processing space 39... Nozzle 41... Suction port 47... Liquid distribution path H... Heater Hl... Planar heating element P... Pump patent application Representative of Fuji Photo Film Co., Ltd. Patent Attorney Ishii Seikan Patent Attorney
Increase 1) Tatsuya G IG IG

Claims (1)

[Claims] (1) In a photosensitive material processing apparatus having a processing tank that processes the photosensitive material by filling a narrow processing space for storing and transporting a photosensitive material with a processing liquid, the processing space has a liquid that is directed toward the photosensitive surface of the photosensitive material. a nozzle for injecting a processing liquid is provided at least near a photosensitive material loading port, a processing liquid suction port is provided near the bottom of the processing space, and the nozzle and the suction port are connected via a circulation means,
A photosensitive material processing apparatus characterized in that the jetting direction of the nozzle is directed toward the photosensitive material conveyance direction with respect to the photosensitive material.