JPH04110851A - Mask washing device and washing method - Google Patents
Mask washing device and washing methodInfo
- Publication number
- JPH04110851A JPH04110851A JP2230198A JP23019890A JPH04110851A JP H04110851 A JPH04110851 A JP H04110851A JP 2230198 A JP2230198 A JP 2230198A JP 23019890 A JP23019890 A JP 23019890A JP H04110851 A JPH04110851 A JP H04110851A
- Authority
- JP
- Japan
- Prior art keywords
- cleaning
- oxygen
- mask
- ultraviolet rays
- mercury lamp
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 title claims description 13
- 238000005406 washing Methods 0.000 title abstract 7
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 39
- 239000001301 oxygen Substances 0.000 claims abstract description 39
- 239000007788 liquid Substances 0.000 claims abstract description 33
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 30
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 claims abstract description 20
- -1 oxygen ions Chemical class 0.000 claims abstract description 8
- 238000004140 cleaning Methods 0.000 claims description 113
- 229910052753 mercury Inorganic materials 0.000 claims description 19
- 230000001678 irradiating effect Effects 0.000 claims description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 6
- 238000002347 injection Methods 0.000 claims 1
- 239000007924 injection Substances 0.000 claims 1
- 239000000758 substrate Substances 0.000 abstract description 13
- 230000005611 electricity Effects 0.000 abstract description 10
- 230000003068 static effect Effects 0.000 abstract description 10
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 abstract description 7
- 230000006378 damage Effects 0.000 abstract description 7
- 230000001954 sterilising effect Effects 0.000 abstract description 2
- 238000004659 sterilization and disinfection Methods 0.000 abstract 1
- 241000894006 Bacteria Species 0.000 description 9
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 3
- 150000002500 ions Chemical class 0.000 description 3
- 239000010453 quartz Substances 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 230000007423 decrease Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 150000002730 mercury Chemical class 0.000 description 1
- 239000000615 nonconductor Substances 0.000 description 1
- 150000002926 oxygen Chemical class 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000002791 soaking Methods 0.000 description 1
Abstract
Description
【発明の詳細な説明】
〔概 要〕
マスク洗浄装置及び洗浄方法の改良に関し、洗浄糟の側
壁に設けた水銀ランプからでる紫外線により洗浄液中の
細菌を殺菌し、洗浄液中に酸素を噴出して紫外線を照射
することにより、酸素イオンを生成して静電気を除去し
、静電破壊を防止することが可能となるマスク洗浄装置
及び洗浄方法の提供を目的とし、
〔１ａ下部に洗浄液を供給する給水口を備え、上部から
オーバーフローする前記洗浄液を排水する排水口を備え
た洗浄糟からなるマスク洗浄装置において、前記洗浄糟
の側壁の外部に水銀ランプを具備し、前記洗浄糟の下部
に酸素噴出孔を備えた酸素供給管を具備するよう構成し
、
〔２〕請求項１記載のマスク洗浄装置の前記洗浄槽内の
洗浄液中にマスクを浸積し、前記水銀ランプから放射さ
れる紫外線を前記洗浄液に照射することにより前記洗浄
液を殺菌し、前記洗浄液中に前記酸素噴出孔から噴出さ
れる酸素に、前記水銀ランプから放射される紫外線を照
射することにより、前記酸素をオゾン化し、酸素イオン
を生成するよう構成する。[Detailed Description of the Invention] [Summary] Regarding the improvement of a mask cleaning device and cleaning method, bacteria in the cleaning solution are sterilized by ultraviolet rays emitted from a mercury lamp installed on the side wall of the cleaning pot, and oxygen is spouted into the cleaning solution. The purpose is to provide a mask cleaning device and a cleaning method that can generate oxygen ions and remove static electricity by irradiating ultraviolet rays and prevent static electricity damage. A mask cleaning device comprising a cleaning basin equipped with a drain port for draining the cleaning liquid overflowing from the upper part, wherein a mercury lamp is provided on the outside of the side wall of the cleaning basin, and an oxygen jet hole is provided at the bottom of the cleaning basin. [2] A mask is immersed in a cleaning solution in the cleaning tank of the mask cleaning device according to claim 1, and ultraviolet rays emitted from the mercury lamp are directed to the cleaning solution. The cleaning liquid is sterilized by irradiating the cleaning liquid with ultraviolet rays emitted from the mercury lamp, and the oxygen emitted from the oxygen nozzle into the cleaning liquid is irradiated with ultraviolet rays emitted from the mercury lamp to ozone the oxygen and generate oxygen ions. Configure it to do so.
本発明は、マスク洗浄装置及び洗浄方法の改良に関する
ものである。The present invention relates to improvements in a mask cleaning device and cleaning method.
近年の半導体装置の微細化・高密度化に伴い、マスクの
透過部の表面に塵埃、汚れ、洗浄液の残渣等が付着する
と、パターンがくずれる障害が発生している。With the miniaturization and high density of semiconductor devices in recent years, if dust, dirt, cleaning solution residue, etc. adhere to the surface of the transparent part of the mask, problems such as pattern collapse occur.
以上のような状況から、マスクのパターンがくずれる障
害の発生を防止するように、清浄な洗浄液によりマスク
を洗浄することが可能なマスク洗浄装置及び洗浄方法が
要望されている。Under the above circumstances, there is a need for a mask cleaning apparatus and a cleaning method that can clean a mask with a clean cleaning liquid so as to prevent the occurrence of problems such as deterioration of the mask pattern.
従来のマスク洗浄装置及び洗浄方法を第２図により詳細
に説明する。A conventional mask cleaning apparatus and cleaning method will be explained in detail with reference to FIG.
従来のマスク洗浄装置は第２図に示すように、石英から
なる洗浄槽１１の下部に洗浄液を供給する給水口１１ａ
を備え、洗浄槽１１の上部からオーバーフローした洗浄
液を排出する排水口１１ｂを備えており、洗浄槽１１の
下部から上部に流れる洗浄液によってマスク４を洗浄し
ている。As shown in FIG. 2, a conventional mask cleaning device has a water supply port 11a that supplies cleaning liquid to the lower part of a cleaning tank 11 made of quartz.
The cleaning tank 11 is equipped with a drain port 11b for discharging overflowing cleaning liquid from the upper part of the cleaning tank 11, and the mask 4 is cleaned by the cleaning liquid flowing from the lower part of the cleaning tank 11 to the upper part.
この洗浄槽１１に供給される洗浄液はポリラシャ−の近
傍において細菌を殺菌しているが、それから洗浄槽１１
までの配管内で再び細菌によって汚染されることがある
と、洗浄槽１１内の洗浄液がよどむ部分においてまた細
菌が発生している。The cleaning liquid supplied to this cleaning tank 11 sterilizes bacteria in the vicinity of the polyurethane, but then the cleaning liquid supplied to the cleaning tank 11
If the piping up to the cleaning tank 11 is contaminated again with bacteria, bacteria will be generated again in the portion of the cleaning tank 11 where the cleaning liquid stagnates.
一方、洗浄液中のイオンを除去し過ぎて電気伝導度が低
下し過ぎると、マスクの透明基板が電気的に絶縁物であ
る石英からなるため、静電気が透明基板に蓄積されて静
電破壊が生し、クローム膜からなる遮光膜が透明基板か
ら剥離してパターンのくずれが発生している。On the other hand, if too many ions are removed from the cleaning solution and the electrical conductivity drops too much, the transparent substrate of the mask is made of quartz, which is an electrical insulator, and static electricity will accumulate on the transparent substrate, causing electrostatic damage. However, the light-shielding film made of chrome peels off from the transparent substrate, causing pattern distortion.
以上説明した従来のマスク洗浄装置及び洗浄方法におい
ては、洗浄槽内の洗浄液がよどむ部分において細菌が発
生するという問題点があり、洗浄液中のイオンを除去し
過ぎて電気伝導度が低下し過ぎると、静電気が透明基板
に蓄積されて静電破壊が生じ、遮光膜が透明基板から剥
離してパターンのくずれが発生するという問題点があっ
た。The conventional mask cleaning device and cleaning method described above have the problem that bacteria are generated in the parts of the cleaning tank where the cleaning solution stagnates, and if too many ions are removed from the cleaning solution and the electrical conductivity decreases too much. However, there have been problems in that static electricity accumulates on the transparent substrate, causing electrostatic damage, and the light-shielding film peels off from the transparent substrate, causing pattern distortion.
本発明は以上のような状況から、洗浄槽の側壁に設けた
水銀ランプからでる紫外線により洗浄液中の細菌を殺菌
し、洗浄液中に酸素を噴出して紫外線を照射することに
より、酸素イオンを生成して静電気を除去し、静電破壊
を防止することが可能となるマスク洗浄装置及び洗浄方
法の提供を目的としたものである。In view of the above-mentioned circumstances, the present invention sterilizes bacteria in the cleaning liquid using ultraviolet rays emitted from a mercury lamp installed on the side wall of the cleaning tank, and generates oxygen ions by jetting oxygen into the cleaning liquid and irradiating it with ultraviolet rays. The object of the present invention is to provide a mask cleaning device and a cleaning method that can remove static electricity and prevent electrostatic damage.
本発明のマスク洗浄装置は、
下部に洗浄液を供給する給水口を備え、上部からオーバ
ーフローするこの洗浄液を排水する排水口を備えた洗浄
槽からなるマスク洗浄装置において、この洗浄槽の側壁
の外部に水銀ランプを具備し、この洗浄槽の下部に酸素
噴出孔を備えた酸素供給管を具備するよう構成し、
本発明のマスク洗浄方法は、
上記のマスク洗浄装置のこの洗浄槽内の洗浄液中にマス
クを浸積し、この水銀ランプから放射される紫外線を洗
浄液に照射することによりこの洗浄液を殺菌し、この洗
浄液中にこの酸素噴出孔から噴出される酸素に、この水
銀ランプから放射される紫外線を照射することにより、
この酸素をオゾン化し、酸素イオンを生成するよう構成
する。The mask cleaning device of the present invention includes a cleaning tank equipped with a water supply port for supplying cleaning liquid at the bottom and a drain port for draining the cleaning liquid overflowing from the top. The mask cleaning method of the present invention is equipped with a mercury lamp and an oxygen supply pipe with an oxygen jet hole at the bottom of the cleaning tank. The cleaning liquid is sterilized by soaking the mask and irradiating the cleaning liquid with ultraviolet rays emitted from the mercury lamp. By irradiating
The structure is configured to ozone this oxygen and generate oxygen ions.
即ち本発明のマスク洗浄装置においては、マスク洗浄装
置の洗浄槽の下部に洗浄液を供給する給水口を設け、上
部からオーバーフローするこの洗浄液を排水する排水口
を上部に設け、この洗浄槽の側壁の外部に水銀ランプを
設け、この洗浄槽の下部に酸素噴出孔を設けている。That is, in the mask cleaning device of the present invention, a water supply port for supplying cleaning liquid is provided at the bottom of the cleaning tank of the mask cleaning device, a drain port is provided at the top for draining the cleaning solution that overflows from the top, and the side wall of the cleaning tank is A mercury lamp is installed outside, and an oxygen outlet is installed at the bottom of this cleaning tank.
本発明のマスク洗浄方法は、上記のマスク洗浄装置の洗
浄槽内の洗浄液中にマスクを滑稽し、この水銀ランプか
ら放射される紫外線により、この洗浄液中の細菌を殺菌
し、この洗浄液中に酸素噴出孔から酸素を噴出してこの
酸素を水銀ランプから放射される紫外線によりこの酸素
をオゾン化した後に、このオゾンを酸素と酸素イオンに
分解して洗浄液の電気伝導度を向上させてマスクの透明
基板に蓄積される静電気を除去するので、クロームから
なる遮光膜の静電破壊による透明基板からの剥離を防止
することが可能となる。The mask cleaning method of the present invention involves placing a mask in a cleaning solution in the cleaning tank of the above-mentioned mask cleaning device, sterilizing bacteria in the cleaning solution using ultraviolet rays emitted from the mercury lamp, and adding oxygen to the cleaning solution. Oxygen is ejected from the nozzle, and the oxygen is ozonized by ultraviolet light emitted from a mercury lamp. This ozone is then decomposed into oxygen and oxygen ions, improving the electrical conductivity of the cleaning solution and making the mask transparent. Since static electricity accumulated on the substrate is removed, it is possible to prevent the light-shielding film made of chrome from peeling off from the transparent substrate due to electrostatic damage.
以下第１図により本発明の一実施例のマスク洗浄装置及
び洗浄方法について詳細に説明する。DESCRIPTION OF THE PREFERRED EMBODIMENTS A mask cleaning apparatus and cleaning method according to an embodiment of the present invention will be explained in detail below with reference to FIG.
本発明の一実施例のマスク洗浄装置は第１図に示すよう
に、石英からなる洗浄槽１の下部に洗浄液を供給する給
水口１ａを備え、洗浄槽１の上部からオーバーフローし
た洗浄液を排出する排水口１ｂを備えており、洗浄槽１
の下部から上部に流れる洗浄液によってマスク４を洗浄
している。As shown in FIG. 1, a mask cleaning device according to an embodiment of the present invention is equipped with a water supply port 1a for supplying cleaning liquid to the lower part of a cleaning tank 1 made of quartz, and drains overflowing cleaning liquid from the upper part of the cleaning tank 1. Equipped with drain port 1b, cleaning tank 1
The mask 4 is cleaned by the cleaning liquid flowing from the bottom to the top.
本発明の一実施例のマスク洗浄装置の洗浄槽１の側壁に
は水銀ランプ２が設けられており、この水銀ランプ２か
ら放射される波長が２５３．７ａｍの紫外線を洗浄槽１
内の洗浄液に照射しているので、洗浄液内の細菌を殺菌
することが可能となる。A mercury lamp 2 is provided on the side wall of the cleaning tank 1 of the mask cleaning apparatus according to an embodiment of the present invention.
Since the cleaning liquid inside is irradiated, it is possible to sterilize bacteria in the cleaning liquid.
また、この水銀ランプ２から放射される波長が１８４．
９ｒ＋ａ＋の紫外線を洗浄槽１内の洗浄液に照射し、洗
浄液内の下部に設けた酸素噴出孔３ａから噴出された酸
素をオゾンに変え、波長が２５３．７ｒ＋ｍの紫外線を
洗浄液に照射してこのオゾンを酸素と酸素イオンに分解
して洗浄液の電気伝導度を向上させてマスク４の透明基
板４ａの静電気を除去するので、クロームからなる遮光
膜４ｂの静電破壊による透明基板４ａからの剥離を防止
することが可能となる。Also, the wavelength emitted from this mercury lamp 2 is 184.
The cleaning liquid in the cleaning tank 1 is irradiated with ultraviolet rays of 9r+a+, and the oxygen ejected from the oxygen jet hole 3a provided at the bottom of the cleaning liquid is converted into ozone. is decomposed into oxygen and oxygen ions to improve the electrical conductivity of the cleaning solution and remove static electricity from the transparent substrate 4a of the mask 4, thereby preventing the light shielding film 4b made of chrome from peeling off from the transparent substrate 4a due to electrostatic damage. It becomes possible to do so.
以上の説明から明らかなように本発明によれば、洗浄槽
の側壁に水銀ランプを設けることにより、洗浄液中の細
菌を殺菌することが可能となり、酸素噴出孔から供給し
た酸素をオゾン化し、酸素イオンを生成してマスクの透
明基板の静電気を除去することが可能となる等の利点が
あり、著しい品質向上の効果が期待できるマスク洗浄装
置及び洗浄方法の提供が可能となる。As is clear from the above description, according to the present invention, by providing a mercury lamp on the side wall of the cleaning tank, it is possible to sterilize bacteria in the cleaning solution, and the oxygen supplied from the oxygen nozzle is ozonized. There are advantages such as generation of ions to remove static electricity from the transparent substrate of the mask, and it is possible to provide a mask cleaning apparatus and a cleaning method that can be expected to significantly improve quality.
第１図は本発明による一実施例のマスク洗浄装置を示す
側断面図、
第２図は従来のマスク洗浄装置を示す側断面図、である
。
図において、
ｌは洗浄槽、 １ａは給水口、
１ｂは排水口、 ２は水銀ランプ、３は酸素供給
管、 ３ａは酸素噴出孔、４はマスク、 ４ａ
は透明基板、４ｂは遮光膜、
を示す。
本発明による一実施例のマスク洗浄装置を示す側断面図
第１図FIG. 1 is a side sectional view showing a mask cleaning device according to an embodiment of the present invention, and FIG. 2 is a side sectional view showing a conventional mask cleaning device. In the figure, 1 is a cleaning tank, 1a is a water supply port, 1b is a drain port, 2 is a mercury lamp, 3 is an oxygen supply pipe, 3a is an oxygen outlet, 4 is a mask, 4a
4b is a transparent substrate, and 4b is a light-shielding film. FIG. 1 is a side sectional view showing a mask cleaning device according to an embodiment of the present invention.
Claims (1)
上部からオーバーフローする前記洗浄液を排水する排水
口（１ｂ）を備えた洗浄糟（１）からなるマスク洗浄装
置において、 前記洗浄糟（１）の側壁の外部に水銀ランプ（２）を具
備し、前記洗浄糟（１）の下部に酸素噴出孔（３ａ）を
備えた酸素供給管（３）を具備することを特徴とするマ
スク洗浄装置。 〔２〕請求項１記載のマスク洗浄装置の前記洗浄糟（１
）内の洗浄液中にマスク（４）を浸積し、前記水銀ラン
プ（２）から放射される紫外線を前記洗浄液に照射する
ことにより前記洗浄液を殺菌し、前記洗浄液中に前記酸
素噴出孔（３ａ）から噴出される酸素に、前記水銀ラン
プ（２）から放射される紫外線を照射することにより、
前記酸素をオゾン化し、酸素イオンを生成することを特
徴とするマスク洗浄方法。[Claims] [1] A water supply port (1a) for supplying cleaning liquid at the lower part,
A mask cleaning device comprising a cleaning basin (1) equipped with a drain port (1b) for draining the cleaning liquid overflowing from the upper part, a mercury lamp (2) is provided on the outside of a side wall of the cleaning basin (1), A mask cleaning device comprising an oxygen supply pipe (3) having an oxygen jet hole (3a) at the bottom of the cleaning pot (1). [2] The cleaning residue (1) of the mask cleaning device according to claim 1.
), the cleaning liquid is sterilized by irradiating the cleaning liquid with ultraviolet rays emitted from the mercury lamp (2), and the oxygen injection holes (3a) are immersed in the cleaning liquid. ) by irradiating the oxygen emitted from the mercury lamp (2) with ultraviolet rays emitted from the mercury lamp (2),
A mask cleaning method characterized in that the oxygen is ozonized to generate oxygen ions.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2230198A JPH04110851A (en) | 1990-08-30 | 1990-08-30 | Mask washing device and washing method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2230198A JPH04110851A (en) | 1990-08-30 | 1990-08-30 | Mask washing device and washing method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH04110851A true JPH04110851A (en) | 1992-04-13 |
Family
ID=16904121
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2230198A Pending JPH04110851A (en) | 1990-08-30 | 1990-08-30 | Mask washing device and washing method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH04110851A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012212081A (en) * | 2011-03-31 | 2012-11-01 | Hoya Corp | Method for manufacturing glass substrate for mask blank, method for manufacturing mask blank, method for manufacturing transfer mask, and method for manufacturing semiconductor device |
| US8783440B2 (en) | 2011-12-28 | 2014-07-22 | Ricoh Company, Limited | Sheet member position correcting device and image forming apparatus |
| CN109461683A (en) * | 2018-11-01 | 2019-03-12 | 京东方科技集团股份有限公司 | A kind of cleaning device and its control method, cleaning equipment |
-
1990
- 1990-08-30 JP JP2230198A patent/JPH04110851A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012212081A (en) * | 2011-03-31 | 2012-11-01 | Hoya Corp | Method for manufacturing glass substrate for mask blank, method for manufacturing mask blank, method for manufacturing transfer mask, and method for manufacturing semiconductor device |
| US8783440B2 (en) | 2011-12-28 | 2014-07-22 | Ricoh Company, Limited | Sheet member position correcting device and image forming apparatus |
| CN109461683A (en) * | 2018-11-01 | 2019-03-12 | 京东方科技集团股份有限公司 | A kind of cleaning device and its control method, cleaning equipment |
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