JPH04109713A - Semiconductor integrated circuit device - Google Patents
Semiconductor integrated circuit deviceInfo
- Publication number
- JPH04109713A JPH04109713A JP2227735A JP22773590A JPH04109713A JP H04109713 A JPH04109713 A JP H04109713A JP 2227735 A JP2227735 A JP 2227735A JP 22773590 A JP22773590 A JP 22773590A JP H04109713 A JPH04109713 A JP H04109713A
- Authority
- JP
- Japan
- Prior art keywords
- level
- channel
- input signal
- circuit
- level shift
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 title claims description 12
- 230000010354 integration Effects 0.000 abstract description 5
- 238000009413 insulation Methods 0.000 abstract 2
- 238000010586 diagram Methods 0.000 description 5
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 4
- 229920005591 polysilicon Polymers 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 238000009792 diffusion process Methods 0.000 description 2
- 239000010410 layer Substances 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、半導体集積回路装置に関し、特にCMOS構
成のレベルシフト回路を有する半導体集積回路装置に関
する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a semiconductor integrated circuit device, and particularly to a semiconductor integrated circuit device having a level shift circuit having a CMOS configuration.
第2図(a)は従来例の回路図、第2図(b)は従来例
に使用されているMOS)ランジスタに示す半導体チッ
プの断面図である。FIG. 2(a) is a circuit diagram of a conventional example, and FIG. 2(b) is a sectional view of a semiconductor chip shown in a MOS transistor used in the conventional example.
レベルシフト回路101は入力信号の論理振幅(0〜V
cc (5V ) )を増幅(G〜Vt1D(12V)
)して内部回路に伝達するものであるが、Nチャネルト
ランジスタN2.N3.PチャネルトランジスタP2.
P3はそれぞれ内部回路を構成するトランジスタと同じ
しきい電圧を有している。The level shift circuit 101 controls the logical amplitude (0 to V) of the input signal.
cc (5V) ) amplify (G ~ Vt1D (12V)
) and transmit it to the internal circuit, but the N-channel transistor N2. N3. P-channel transistor P2.
P3 each has the same threshold voltage as the transistors forming the internal circuit.
上述した従来のレベルシフト回路は、2個の電源を必要
とするばかりではなく、6個のトランジスタで回路が構
成されるため、集積度が悪いという欠点があった。The above-mentioned conventional level shift circuit not only requires two power supplies but also has the drawback of poor integration because the circuit is configured with six transistors.
また、内部回路のトランジスタとしきい電圧が同じトラ
ンジスタで構成されたCMOSインバータをレベルシフ
ト回路として使用しようとしても、入力信号の論理振幅
が内部回路のそれにより小さいので、入力信号が“H”
レベルになってもPチャネルトランジスタが必ずしもオ
フにならないため、レベルシフト機能が不完全となり、
又定常電流が流れてしtうという欠点がある。Furthermore, even if you try to use a CMOS inverter composed of transistors with the same threshold voltage as the transistors in the internal circuit as a level shift circuit, the logic amplitude of the input signal is smaller than that of the internal circuit, so the input signal will be "H".
Since the P-channel transistor does not necessarily turn off even when the level shifts, the level shift function becomes incomplete.
Another drawback is that a steady current flows.
本発明は、論理振幅を増幅するレベルシフト回路を有す
る半導体集積回路装置において、前記レベルシフト回路
は、入力信号の正(又は負)論理における°″H′”レ
ベルと電源電位との電位差の絶対値よりしきい電圧の絶
対値が大きいP(又はN)チャネルトランジスタを有す
るCMOSインバータであるというものである。The present invention provides a semiconductor integrated circuit device having a level shift circuit for amplifying logic amplitude, in which the level shift circuit has an absolute value of the potential difference between the °"H'" level and the power supply potential in the positive (or negative) logic of the input signal. It is a CMOS inverter having a P (or N) channel transistor whose absolute value of the threshold voltage is larger than the absolute value of the threshold voltage.
第1図(a>は本発明の一実施例の回路図、第1図(b
)は一実施例のレベルシフト回路を示す半導体チップの
断面図である。Figure 1 (a> is a circuit diagram of an embodiment of the present invention, Figure 1 (b)
) is a cross-sectional view of a semiconductor chip showing a level shift circuit of one embodiment.
1はPチャネルトランジスタのゲートポリシリコン膜、
2はNチャネルトランジスタのゲートポリシリコン膜で
あり、ゲートポリシリコン膜直下の絶縁膜は通常Pチャ
ネルトランジスタとNチャネルトランジスタで同時に形
成され、第2図のようになるが、本実施例ではレベルシ
フト回路のPチャネルトランジスタレ1に対し、第1図
(a)のように絶縁11W3上に絶縁膜4aを積層し、
しきい電圧の絶対値をレベルシフト回路の入力信号のH
“レベルと電源電位VDDとの電位差の絶対値より大き
くする。1 is a gate polysilicon film of a P-channel transistor,
2 is the gate polysilicon film of the N-channel transistor, and the insulating film directly under the gate polysilicon film is normally formed simultaneously for the P-channel transistor and the N-channel transistor, as shown in Fig. 2, but in this example, the level shift For the P-channel transistor array 1 of the circuit, an insulating film 4a is laminated on the insulating film 11W3 as shown in FIG. 1(a),
The absolute value of the threshold voltage is set to the H level of the input signal of the level shift circuit.
“Make it larger than the absolute value of the potential difference between the level and the power supply potential VDD.
入力信号INの振幅がVss”OvからVCC5v、半
導体集積回路装置100aの電源電圧VDDが12vで
あり、Pチャネルトランジスタレ1のしきい電圧の絶対
値か8v、NチャネルトランジスタN1のしきい電圧の
絶対値か通常のIVであるとき、INか°“L ”レベ
ルOvなら、Plのゲートとバックゲート間電圧V。2
は12vで8vより大きいからPlはオン、Nlのゲー
トとバックゲート間電圧はV。NはOvでlvより小さ
いからN1はオフし、出力信号○aは電源電圧VDDを
出力する。次に、INが゛Hパレベルの5vなら、■G
PはVDDとVCCの電位差7Vで8Vより小さいから
PlはオフIVGNは5vで1vより大きいからオンし
、OaはOvを出力する。The amplitude of the input signal IN is from Vss''Ov to VCC5v, the power supply voltage VDD of the semiconductor integrated circuit device 100a is 12v, the absolute value of the threshold voltage of P channel transistor 1 is 8v, and the absolute value of the threshold voltage of N channel transistor N1 is 5v. When the absolute value is normal IV, if IN is "L" level Ov, the voltage between the gate and back gate of Pl is V.2
Since 12V is greater than 8V, Pl is on, and the voltage between the gate and back gate of Nl is V. Since N is Ov, which is smaller than lv, N1 is turned off, and the output signal ○a outputs the power supply voltage VDD. Next, if IN is 5v at the level of ゛H, then ■G
P is turned off because the potential difference between VDD and VCC is 7V, which is smaller than 8V, and IVGN is turned on because it is 5V, which is larger than 1V, and Oa outputs Ov.
上述したように、0から5v間で変化する入力信号に対
し、出力信号がOから12v間で変化するレベルシフト
回路が実現し、入力信号がOVならPチャネルトランジ
スタレ1がオン、NチャネルトランジスタN1がオフと
し、入力信号が5■ならPチャネルトランジスタレ1が
オフ、Nチャネルトランジスタがオンとなるため、定常
電流が流れない構成になっている。As mentioned above, a level shift circuit is realized in which the output signal changes between 0 and 12V in response to an input signal that changes between 0 and 5V, and when the input signal is OV, P channel transistor 1 is turned on, and N channel transistor If N1 is off and the input signal is 5.times., the P-channel transistor 1 is off and the N-channel transistor is on, so that no steady current flows.
1電源方式で構成が簡単なため、半導体集積回路装置の
集積度を改善することができる。Since the configuration is simple with a single power supply system, the degree of integration of the semiconductor integrated circuit device can be improved.
以上、正電源、正論理の場合について説明したが、負電
源、負論理の場合は、第3図(a)(b)に示すように
、NチャネルトランジスタN4のしきい電圧の絶対値を
大きくすればよい。The above has explained the case of positive power supply and positive logic, but in the case of negative power supply and negative logic, the absolute value of the threshold voltage of N-channel transistor N4 can be increased as shown in Fig. 3 (a) and (b). do it.
また、MOS)ランジスタのしきい電圧の絶対値を大き
くするには、チャネルドーピングによってもよいことは
いうまでもない。Furthermore, it goes without saying that channel doping may be used to increase the absolute value of the threshold voltage of a MOS transistor.
以上説明したように、本発明の半導体集積回路装置は、
レベルシフト回路をしきい電圧の絶対値が内部回路を構
成するトランジスタのそれより大きなP(またはN〉チ
ャネルトランジスタを含むCMOSインバータとするこ
とにより、素子数が削減されるため集積度を上げると共
に、単電源による動作を可能とする効果がある。As explained above, the semiconductor integrated circuit device of the present invention includes
By making the level shift circuit a CMOS inverter including a P (or N> channel transistor whose absolute value of the threshold voltage is larger than that of the transistors constituting the internal circuit), the number of elements can be reduced and the degree of integration can be increased. This has the effect of enabling operation with a single power supply.
さらに、単電源による回路構成が実現することで、2電
源による回路構成のようにNウェル分離やNウェル間の
ラッチアップ対策を行う必要がなくなるのでその点でも
集積度が上ると共に設計が容易になるという効果もある
。Furthermore, by realizing a circuit configuration with a single power supply, there is no need to perform N-well isolation or latch-up measures between N-wells unlike in a circuit configuration with two power supplies, which also increases the degree of integration and simplifies the design. It also has the effect of becoming.
第1図(a)および(b)はそれぞれ本発明の一実施例
を示す回路図および断面図、第2図(a)および(b)
はそれぞれ従来例を示す回路図および断面図、第3図(
a)および(b)はそれぞれ本発明の他の実施例を示す
回路図および断面図である。
1.2・・・ゲートポリシリコン膜、3.4a。
4b・・・絶縁膜、5・・・P4型拡散層、6・・・N
ウェル、7・・・N+型抵拡散層8・・・P型Si基板
、91.。
フィールド酸化膜、10・・・層間絶縁膜、11・・・
アルミニウム電極、100,100a、100b=−半
導体集積回路装置、101.101a 101b−・
・レベルシフト回路、102,102a、102b・・
・内部回路、IN・入力信号(又はその端子)、P1〜
P4・・Pチャネルトランジスタ、VDD・・・正電源
端子、 VDD・・・負電源端子。FIGS. 1(a) and (b) are a circuit diagram and a cross-sectional view showing an embodiment of the present invention, and FIGS. 2(a) and (b) are
are a circuit diagram and a sectional view showing a conventional example, respectively, and Fig. 3 (
a) and (b) are a circuit diagram and a sectional view, respectively, showing other embodiments of the present invention. 1.2...Gate polysilicon film, 3.4a. 4b...Insulating film, 5...P4 type diffusion layer, 6...N
Well, 7...N+ type resistive diffusion layer 8...P type Si substrate, 91. . Field oxide film, 10... Interlayer insulating film, 11...
Aluminum electrode, 100, 100a, 100b=-semiconductor integrated circuit device, 101.101a 101b-・
・Level shift circuit, 102, 102a, 102b...
・Internal circuit, IN・Input signal (or its terminal), P1~
P4...P channel transistor, VDD...positive power supply terminal, VDD...negative power supply terminal.
Claims (1)
積回路装置において、前記レベルシフト回路は、入力信
号の正(又は負)論理における“H”レベルと電源電位
との電位差の絶対値よりしきい電圧の絶対値が大きいP
(又はN)チャネルトランジスタを有するCMOSイン
バータであることを特徴とする半導体集積回路装置。In a semiconductor integrated circuit device having a level shift circuit for amplifying logic amplitude, the level shift circuit has a threshold voltage that is greater than the absolute value of the potential difference between the "H" level in the positive (or negative) logic of the input signal and the power supply potential. P with large absolute value
A semiconductor integrated circuit device characterized in that it is a CMOS inverter having (or N) channel transistors.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2227735A JPH04109713A (en) | 1990-08-29 | 1990-08-29 | Semiconductor integrated circuit device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2227735A JPH04109713A (en) | 1990-08-29 | 1990-08-29 | Semiconductor integrated circuit device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH04109713A true JPH04109713A (en) | 1992-04-10 |
Family
ID=16865544
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2227735A Pending JPH04109713A (en) | 1990-08-29 | 1990-08-29 | Semiconductor integrated circuit device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH04109713A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0951072A1 (en) * | 1996-04-08 | 1999-10-20 | Hitachi, Ltd. | Semiconductor integrated circuit device |
-
1990
- 1990-08-29 JP JP2227735A patent/JPH04109713A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0951072A1 (en) * | 1996-04-08 | 1999-10-20 | Hitachi, Ltd. | Semiconductor integrated circuit device |
EP0951072B1 (en) * | 1996-04-08 | 2009-12-09 | Hitachi, Ltd. | Semiconductor integrated circuit device |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US4847522A (en) | CMOS amplifier/driver stage with output disable feature | |
JPH02292914A (en) | Non-load type output driving circuit and method for supplying output signal | |
JPH11205122A (en) | High voltage final output stage | |
JPH07240678A (en) | Semiconductor integrated circuit | |
US5773872A (en) | Semiconductor device having an integrated differential circuit with an improved common-mode rejection ratio (CMRR) | |
JP2002026720A (en) | Low power consumption circuit | |
JPH04109713A (en) | Semiconductor integrated circuit device | |
US5930191A (en) | Semiconductor memory device having a plurality of power voltages | |
JP3175758B2 (en) | Semiconductor device | |
TW472395B (en) | Semiconductor integrated circuit | |
JPH0257345B2 (en) | ||
JPS63176015A (en) | Integrated circuit | |
JPH06152376A (en) | Semiconductor integrated circuit device | |
JPH098638A (en) | Cmos input/output buffer circuit | |
JP2755890B2 (en) | Transmission type logic circuit | |
JP2671808B2 (en) | Interface circuit | |
JP2979716B2 (en) | CMOS integrated circuit | |
JPH11176950A (en) | Semiconductor integrated circuit device | |
JP2001274675A (en) | Semiconductor integrated circuit | |
JP2002299467A (en) | Output circuit | |
JPS63132527A (en) | Cmos logic circuit | |
JPH03149873A (en) | Semiconductor integrated circuit device | |
JP3144825B2 (en) | Output buffer circuit | |
JPH1064265A (en) | Output circuit of semiconductor device | |
JPH06283672A (en) | Semiconductor integrated circuit |