JPH039925B2 - - Google Patents

Info

Publication number
JPH039925B2
JPH039925B2 JP1096883A JP1096883A JPH039925B2 JP H039925 B2 JPH039925 B2 JP H039925B2 JP 1096883 A JP1096883 A JP 1096883A JP 1096883 A JP1096883 A JP 1096883A JP H039925 B2 JPH039925 B2 JP H039925B2
Authority
JP
Japan
Prior art keywords
weight
formula
refractive index
resin
meth
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP1096883A
Other languages
English (en)
Japanese (ja)
Other versions
JPS59136310A (ja
Inventor
Masahiko Iwano
Koji Arakawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kuraray Co Ltd
Original Assignee
Kuraray Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kuraray Co Ltd filed Critical Kuraray Co Ltd
Priority to JP1096883A priority Critical patent/JPS59136310A/ja
Publication of JPS59136310A publication Critical patent/JPS59136310A/ja
Publication of JPH039925B2 publication Critical patent/JPH039925B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • G03F7/70433—Layout for increasing efficiency or for compensating imaging errors, e.g. layout of exposure fields for reducing focus errors; Use of mask features for increasing efficiency or for compensating imaging errors
    • G03F7/70441—Optical proximity correction [OPC]

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP1096883A 1983-01-26 1983-01-26 レンズ用樹脂 Granted JPS59136310A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1096883A JPS59136310A (ja) 1983-01-26 1983-01-26 レンズ用樹脂

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1096883A JPS59136310A (ja) 1983-01-26 1983-01-26 レンズ用樹脂

Publications (2)

Publication Number Publication Date
JPS59136310A JPS59136310A (ja) 1984-08-04
JPH039925B2 true JPH039925B2 (en, 2012) 1991-02-12

Family

ID=11764962

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1096883A Granted JPS59136310A (ja) 1983-01-26 1983-01-26 レンズ用樹脂

Country Status (1)

Country Link
JP (1) JPS59136310A (en, 2012)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5132384A (en) * 1989-11-22 1992-07-21 Nippon Shokubai Co., Ltd. Optical material of low specific gravity and excellent impact resistance, optical molding product using the optical material and manufacturing method thereof
US5290892A (en) * 1990-11-07 1994-03-01 Nestle S.A. Flexible intraocular lenses made from high refractive index polymers
JP3045422B2 (ja) * 1991-12-18 2000-05-29 株式会社日本触媒 吸水性樹脂の製造方法
US6833391B1 (en) * 2003-05-27 2004-12-21 General Electric Company Curable (meth)acrylate compositions
US7045558B2 (en) 2003-08-29 2006-05-16 General Electric Company Method of making a high refractive index optical management coating and the coating
US7271283B2 (en) 2003-08-29 2007-09-18 General Electric Company High refractive index, UV-curable monomers and coating compositions prepared therefrom

Also Published As

Publication number Publication date
JPS59136310A (ja) 1984-08-04

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