JPH0395631U - - Google Patents
Info
- Publication number
- JPH0395631U JPH0395631U JP319490U JP319490U JPH0395631U JP H0395631 U JPH0395631 U JP H0395631U JP 319490 U JP319490 U JP 319490U JP 319490 U JP319490 U JP 319490U JP H0395631 U JPH0395631 U JP H0395631U
- Authority
- JP
- Japan
- Prior art keywords
- piping connecting
- reactor
- exhaust
- shut
- corrected
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 claims 1
- 239000000376 reactant Substances 0.000 claims 1
- 239000004065 semiconductor Substances 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 2
- 238000009530 blood pressure measurement Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 239000012495 reaction gas Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
Description
第１図は本考案の実施例を示す構成概要図。第
２図は従来例を示す構成概要図である。
１……ガス流量コントローラー、２……反応ガ
ス供給バルブ、３……石英チヤンバー、４……反
応装置、５……上部電極、６……下部電極、７，
１４……圧力測定ゲージ、８……メインバルブ、
９……圧力コントローラー、１０……排気ポンプ
、１１……制御系、１２，１５……切換えバルブ
、１３……真空容器。
FIG. 1 is a schematic configuration diagram showing an embodiment of the present invention. FIG. 2 is a schematic configuration diagram showing a conventional example. DESCRIPTION OF SYMBOLS 1... Gas flow controller, 2... Reaction gas supply valve, 3... Quartz chamber, 4... Reactor, 5... Upper electrode, 6... Lower electrode, 7,
14...Pressure measurement gauge, 8...Main valve,
9...Pressure controller, 10...Exhaust pump, 11...Control system, 12, 15...Switching valve, 13...Vacuum container.
Claims (1)
において、供給口に接続する配管の途中及び排気
口に接続する配管の途中に、固有の開閉バルブに
よつて遮断可能な一定容積の真空容器を接続し、
前記、一定容積の真空容器によりガス流量コント
ローラーの流量の補正を行うことを特徴とする半
導体製造装置。 In a reactor having a reactant gas supply system and an exhaust system, a vacuum vessel of a certain volume that can be shut off by a specific opening/closing valve is installed in the middle of the piping connecting to the supply port and in the middle of the piping connecting to the exhaust port. connection,
A semiconductor manufacturing apparatus characterized in that the flow rate of the gas flow controller is corrected using the vacuum container having a constant volume.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP319490U JPH0395631U (en) | 1990-01-18 | 1990-01-18 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP319490U JPH0395631U (en) | 1990-01-18 | 1990-01-18 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0395631U true JPH0395631U (en) | 1991-09-30 |
Family
ID=31507029
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP319490U Pending JPH0395631U (en) | 1990-01-18 | 1990-01-18 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0395631U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20110124324A (en) * | 2009-02-26 | 2011-11-16 | 코닌클리케 필립스 일렉트로닉스 엔.브이. | Exercise system and a method for communication |
-
1990
- 1990-01-18 JP JP319490U patent/JPH0395631U/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20110124324A (en) * | 2009-02-26 | 2011-11-16 | 코닌클리케 필립스 일렉트로닉스 엔.브이. | Exercise system and a method for communication |