JPH0392255A - Polishing sheet and manufacture thereof - Google Patents

Polishing sheet and manufacture thereof

Info

Publication number
JPH0392255A
JPH0392255A JP22829789A JP22829789A JPH0392255A JP H0392255 A JPH0392255 A JP H0392255A JP 22829789 A JP22829789 A JP 22829789A JP 22829789 A JP22829789 A JP 22829789A JP H0392255 A JPH0392255 A JP H0392255A
Authority
JP
Japan
Prior art keywords
abrasive
particles
polishing
layer
sheet
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP22829789A
Other languages
Japanese (ja)
Other versions
JP2846358B2 (en
Inventor
Mototane Yamamoto
山本 元種
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NIPPON MICRO KOOTEINGU KK
Nihon Micro Coating Co Ltd
Original Assignee
NIPPON MICRO KOOTEINGU KK
Nihon Micro Coating Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NIPPON MICRO KOOTEINGU KK, Nihon Micro Coating Co Ltd filed Critical NIPPON MICRO KOOTEINGU KK
Priority to JP22829789A priority Critical patent/JP2846358B2/en
Publication of JPH0392255A publication Critical patent/JPH0392255A/en
Application granted granted Critical
Publication of JP2846358B2 publication Critical patent/JP2846358B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Landscapes

  • Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)
  • Polishing Bodies And Polishing Tools (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)

Abstract

PURPOSE:To increase polishing pressure by forming a polishing layer, which is constituted by mixing abrasive particles and filler particles in a binder adhesive, at least on one side of a base. CONSTITUTION:At least on one side of a base 4, polishing particles 1 and at least one kind of filler particles 7 are mixed. And further thereto, a binder adhesive 2 is mixed, and they are evenly applied to form a desired polishing layer 3.

Description

【発明の詳細な説明】[Detailed description of the invention] 【産業上の利用分野】[Industrial application field]

本発明は、機械、装置、部品、その他一般の物体の表面
の精密仕上げ研磨に有用で、しかも研磨性能のよい研磨
シートおよびその製造方法に関する.
The present invention relates to an abrasive sheet that is useful for precision finishing polishing of the surfaces of machines, devices, parts, and other general objects, and has good abrasive performance, and a method for manufacturing the same.

【従来の技術】[Conventional technology]

従来の研磨シートは、第6図に示すように、プラスチッ
クシートなどの基板4上にバインダー接着剤2を塗布し
、研磨材粒子1を1層または2m付着させたものであっ
た(例えば、米国特許第2,755,807号および第
3,868,325号を参照).他の従来の研磨シート
は、第7図に示すように、硬さの異なる2種類の研磨材
粒子を混合し、しかも、軟かい研磨材粒子1aの粒径を
大きくし、硬い研磨材粒子1bの粒径を小さくして形戒
したもので、このシートは被研磨物質6の表面に付着し
た異物を取り除くことができ、がつ被研磨物質6の表面
上の突起を研磨することができるものであった(米国特
許第4,138,229号を参照〉.また、研磨テープ
を製造する方法として、研磨材粒子を少量で効率よく基
板に付着させるため、静電気を利用して、バインダーの
塗ってある基板に研磨材粒子を、縦方向にそろえて一層
だけ接着する方法もあった( ELECTROSTAT
ICS  ^.D.Moore著,  Doubled
ay&Cos+pany.  Inc.,  New 
 York)  *
Conventional abrasive sheets, as shown in FIG. See Patent Nos. 2,755,807 and 3,868,325). Other conventional abrasive sheets, as shown in FIG. 7, are made by mixing two types of abrasive particles with different hardnesses, in which the particle size of the soft abrasive particles 1a is increased, and the particle size of the hard abrasive particles 1b is increased. This sheet has a reduced particle size and can remove foreign matter attached to the surface of the material 6 to be polished, and can polish protrusions on the surface of the material 6 to be polished. (See U.S. Pat. No. 4,138,229).Also, as a method for manufacturing abrasive tape, static electricity is used to coat the binder in order to efficiently attach a small amount of abrasive particles to the substrate. There was also a method of bonding a single layer of abrasive particles to a substrate with vertical alignment (ELECTROSTAT
ICS ^. D. by Moore, Double
ay&Cos+pany. Inc. , New
York) *

【発明が解決しようとする課題】[Problem to be solved by the invention]

しかし、第6図のように、研磨材粒子の層を薄く、1層
(または2層〉に形戒する研磨シートの製造方法は、研
磨材粒子の粒径のバラツキ5のため、平面精度が悪いと
いう課題があった.また、第7図のような粒径の大きく
異なる2種類の研磨材粒子を混合する研磨シ一トI遣方
法では、粒径の大きい粒子の間隙を通って、粒径の小さ
い粒子が下方に集まる、いわゆる偏析現象が起こる.そ
のため、この方法は、2種類の粒径の異なる研磨材粒子
を均一に分散塗布することが困難という課題があった. また、このように製造された従来の研磨シートは、第6
図および第7図にもみられるように、粒径の大きい粒子
1aのみが大きな圧力で被研磨物質6に接し、粒径の小
さい粒子1bは被研磨物質6の表面に接しなかった.そ
して、この研磨材粒子は一般に硬く、被研磨物質もまた
固いものであることから、研磨時に研磨圧力を上げると
、研磨材粒子は、被研磨物質よりもバインダー接着剤や
プラスチック基板により没入するため、その研磨性能を
上げらことができなかった.このように従来の研磨シー
トの研磨性能は低く、また被研磨物質表面の仕上がり精
度もよくなかった.そこで、本発明は、かかる課題を解
消するためになされたもので、製造方法が比較的簡単で
、平面精度がよく、研磨性能もよい研磨シートおよびそ
の製造方法を提供することを目的とする.
However, as shown in Figure 6, the manufacturing method of an abrasive sheet in which the layer of abrasive particles is thin and formed into one layer (or two layers) has poor flatness accuracy due to variations in the particle size of the abrasive particles5. In addition, in the polishing sheet I method of mixing two types of abrasive particles with greatly different particle sizes as shown in Figure 7, the particles pass through the gaps between the large particle particles. A so-called segregation phenomenon occurs in which particles with small diameters gather downward.Therefore, this method has the problem that it is difficult to uniformly disperse and coat two types of abrasive particles with different particle sizes. The conventional polishing sheet manufactured in
As can be seen in the figure and FIG. 7, only the particles 1a with a large particle size came into contact with the material to be polished 6 under a large pressure, and the particles 1b with a small particle size did not come into contact with the surface of the material to be polished 6. Since these abrasive particles are generally hard and the material to be polished is also hard, if the polishing pressure is increased during polishing, the abrasive particles will immerse into the binder adhesive or plastic substrate more than the material to be polished. However, it was not possible to improve the polishing performance. As described above, the polishing performance of conventional polishing sheets was low, and the finishing accuracy of the surface of the material to be polished was also poor. SUMMARY OF THE INVENTION The present invention has been made to solve these problems, and it is an object of the present invention to provide a polishing sheet that is relatively simple to manufacture, has good planar accuracy, and has good polishing performance, and a method for manufacturing the same.

【問題点を解決するための手段】[Means to solve the problem]

本発明の研磨シートは、基板の少なくとも片面に,パイ
グー接着剤内に研磨材粒子および少なくとも一種類の充
填材粒子が混合して成る研磨層を有するものである.こ
こで、iiJf磨層の厚みは、その研磨層の平面精度を
上げ、かつその表面にある研磨材粒子を複数の粒子によ
り下から支え、全投影接触面積を増加させることができ
るように少なくとも研磨材粒子の平均粒径の3倍以上と
することが望ましい. また、研磨層を構成する研磨材粒子の重量比をχ,充填
材粒子の重量比を1−χとするとき、χ=o.oi〜0
.9までとし、両者の平均粒径をほぼ同じとすることが
望ましい. 本発明の研磨シートを製造する方法は、上記研磨シート
を製造するための方法で、基板の少な゛くとも片面に、
研磨材粒子と少なくとも一種類の充填材粒子を混合し、
これにさらに、バインダー接着剤を混合して均一に塗布
することを特徴とする研磨シートの製造方法である.こ
こで、研磨層の平面精度を良くするために、研磨材粒子
、充填材粒子、バインダー接着剤を混合したスラリーを
、ローラーまたはブレードを使用して基板シート上に均
一に塗布することが望ましい.
The abrasive sheet of the present invention has, on at least one side of a substrate, an abrasive layer comprising a Pai Goo adhesive mixed with abrasive particles and at least one type of filler particles. Here, the thickness of the iiJf polishing layer is set so that the plane accuracy of the polishing layer can be increased, and the polishing particles on the surface can be supported from below by a plurality of particles, and the total projected contact area can be increased. It is desirable that the diameter be at least three times the average particle diameter of the material particles. Further, when the weight ratio of the abrasive particles constituting the polishing layer is χ, and the weight ratio of the filler particles is 1-χ, χ=o. oi~0
.. It is desirable that the average particle size of the two be approximately the same. The method for manufacturing an abrasive sheet of the present invention is the method for manufacturing the abrasive sheet described above, in which at least one side of a substrate is
mixing abrasive particles and at least one type of filler particles;
This method of manufacturing an abrasive sheet is further characterized by mixing a binder adhesive and uniformly applying the mixture. In order to improve the flatness of the polishing layer, it is desirable to uniformly apply a slurry containing abrasive particles, filler particles, and binder adhesive onto the substrate sheet using a roller or blade.

【実施例】【Example】

図面を参照して、本発明の好適実施例について説明する
.第1図は本発明の研磨シートの断面を示す.この研磨
シートにおいて、基板4上に研磨材粒子の層で4層とな
った厚い研磨層3が形成されている.この点、1乃至2
層に形成した従来の研磨シーl・の研磨層とは対照的で
ある.ここで、研mM3にはバインダー接着剤3を介し
て、研磨材粒子1および充填材粒子7が混合されている
.なお、実施例では、研磨材粒子の層で41となった研
磨層の例を示したが、この層は少なくとも3層以上で、
実用的には4〜5層以上が望ましい.このように研磨層
を厚く形成したのは、以下に述べる、主として二つの理
由がある. 先づ第一に、研磨材粒子が単層の場合は、第6図のよう
に粒子の粒径のバラツキが、そのまま平面精度を悪化さ
せる.また、研磨材粒子が2層の場合は、第3a図およ
び第3b図に示すように、粒子が斜方配列層を作る場合
(第3a図)と、正方配列層を作る場合(第3b図)と
があることから、研磨層表面に段差10が生じ、平面精
度を整えることが困難となる.したがって、研磨層の厚
さを、少なくとも研磨材粒子層で3層以上、理想的には
4層以上の厚さに整えることが、平面精度よく研磨シー
トを製造する条件となる. 第二に、研磨力増強のために研磨層(研磨材粒子層〉を
厚くする必要があるからである.その理由を第4図およ
び第5図を参照して説明する.第4図は研磨機楕を示す
もので、上部は被研磨物質6であり、下部は研磨シート
である.研磨材粒子lは被6Jf麿物質6およびバイン
ダー接着剤2より十分硬く、また、被研磨物質6は、バ
インダー接着剤2よりは比較的固いのが一般的である.
第4図に示してあるように、研磨材粒子1が被研磨物質
6に接している部分の投影接触面積A.(第4図の斜線
の部分)は、被研磨物質6の面に研磨材粒子1を通じて
かかる垂直な力Fl  (研磨圧力)に比例し、被研磨
物質の表面降伏圧P+sに反比例するから、 と表せる.ここに、表面降伏圧Paは、被研磨物質6の
面に垂直な力F1がかかり、その力F,lがP請を越え
ると被研磨物質6の降伏が起こり、研磨材粒子が被研磨
物質6中に食い込むとともに投影接触面$1A.が増加
していき、圧力がPI1になったとき平衡するものと考
えられている.このPaは物質による定数である. 一方、研磨材粒子1とバインダー接着剤2との間でも、
同様な考え方ができる.すなわち、バインダー接着剤2
に接している研磨材粒子1の投影接触面WIAb  (
第4図の斜線の部分)は、バインダー接着剤2の表面に
研磨材粒子lを通じてかかる垂直な力Fwに比例し、バ
インダー接着剤の表面降伏圧P1に反比例するから、 と表せる.研磨材粒子1を通じて、被研磨物質6および
バインダー接着剤2にかかる力F.は同じであるから、
(1)および(2〉式からF.を消去すると、次の(3
)式が得られる. A. Pa = Ab Pa    (3)ほとんどの
場合、被研磨物質は固く、その表面降伏圧Pmはバイン
ダー接着剤の表面降伏圧P1の102〜105倍と考え
られる. したがって、(3)式より、被研磨物質への研磨材粒子
の投影接触面積A.はバインダー接着剤の投影接触面W
IAbの101〜10−2倍以下でなければならない.
第4図は説明のためAwをA.に比べて比較的大きく描
いてあるが、実際はA.は非常に小さい. 使用すると、研磨材粒子がバインダー接着剤中へ没入す
ることになり、研磨層が破壊されることになる.したが
って、研磨シートが破壊されことので研磨シーl・を使
用するためには、(Pm’/Pa)が、物質が決まれば
定まる定数であるから、Abを十分大きくしなければな
らない. Ab、すなわち力Fエを支える粒子の投影接触面積を大
きくすることができれば、Amが大きくなるような研磨
圧力を作用させても、研磨層が破壊されることはない.
そして、Abの増加に伴い、研磨圧力を上げることがで
きれは、研磨材粒子は被研磨物質により深く侵入し、研
磨性能の向上につながる. ところで、研磨材粒子層を数層重ね研磨層を厚く形成す
ると、第5図に示すように被研磨物質6に接した表面の
第1層の1つの研磨材粒子1は、その下の第2層にある
複数の研磨材粒子1゜によって支えられ、さらに第2層
にあるその複数の研磨材粒子l゛は第3Mにある多数の
研磨材粒子11に、そして、さらに研磨材粒子1゜′゜
に支えられる(これを石垣効果と呼ぶことにする).シ
たがって、第l層の1つの研磨材粒子を支える第2層の
複数の粒子の全投影接触面積A1(この面積A h’は
、第l層の1つの研磨材粒子を支える第2層の複数の研
磨材粒子のそれぞれの投影接触面積を合計したもの〉は
、第1層の場合の粒子の投影接触面積A.の数倍になる
.さらに第3屑、第4層というように層を重ねて研磨層
を厚くすると、各層の全投影接触面積Ab”、Ab”’
 ・・・は従来の研磨シートの場合の投影接触面積より
飛躍的に増加する.このように、少なくとも研磨材粒子
屑が3層以上になるように研磨層を厚く形成すること、
石垣効果が現れ、その結果研磨圧カを支える投影接触面
積を著しく増加させることができ、これに伴って研磨圧
力を上げることができ、研磨性能の向上を図ることがで
きることが分がった. なお、第1層を表面精度よく製作しても、実際には被研
磨材物質に接触する第1層の研磨材粒子は、第l層に並
んだ全粒子の内の100乃至iooo分の一以下である
ことが実験的に判明している.したがって、複数の研磨
粒子層を形成しても、第2層以下の研磨材粒子が複数の
第1層の研磨材粒子を重複して支えることはまずなく、
第5図のように第1層にある個々の研磨粒子についてピ
ラミッドのような石垣構造を考えても差し支えない.他
方、従来の研磨シート製造においては、研磨に直接関与
する粒子は表面に存在する研磨材粒子のみとの考えから
、コストを下げるために、研磨材粒子層は、静電気によ
ってバインダーを塗布した基板に研磨材粒子を付着させ
るなどの工夫を行い(^.D.Moore) 、できる
だけ単層にしていた.しかし、厚く形成した研磨層の表
面上にある第1層の研磨材粒子を支える第2.第3,・
・・層の石垣粒子は研磨材粒子程の硬さを必要とせず、
バインダー接着剤よりは硬く、研磨材粒子と同じ程度の
粒径を持つものであれば、安価な結晶やガラスの微粒子
または、天然鉱物の微粒子のうち少なくとも一種類を石
垣用充填材として使用してもよく、したがって、研磨層
を厚く形成しても研磨シートの製造コストは高くならな
い. 以上の理由から、本発明の研磨シートを、研磨材粒子層
が少なくとも3層以上となるように形成したのである. このような研磨層は、研磨層の平面精度も、研磨性能も
よくなり、したがって従来の研磨シートによる研磨時間
を2〜4割減少させ、また製造コストも高くならない. なお、研磨材、充填材、バインダー接着剤の具体的な物
質は、以下で行う製造方法において説明する. シートの ゛ まず、研磨シートに接着させる研磨材粒子を、温度10
0〜150℃で1時間以上加熱して、粒子表面の水分を
除く.同様に充填材粒子も、温度1oo〜150℃で1
時間以上加熱して、粒子表面の水分を除く. 研磨材粒子としては、直径が0.1uz〜40p&の酸
化アルミニウム、酸化クロム、シリコンカーバイド、酸
化鉄などを用いる.また、充填材粒子は、直径が0.1
〜40νlで、カオリン、天然硫化バリウム、弁柄、ア
ガルマトライトなどの天然鉱物やガラスの微粒子の他に
、二酸化ケイ素、酸化ジルコニウム、酸化鉄、酸化チタ
ン、炭酸カルシウムなどの単体結晶のうち少なくとも一
種類の充填材粒子を用いる. 研磨材粒子と充填材粒子との混合比は、UR磨材粒子の
重量比をχ,充填材粒子の重量比を1−χで表すと、χ
= 0.01がらχ=o,9までとし、両者の平均粒径
がほぼ等しいとき、両者は容易に均一に混合する. 均一に混合した研磨材粒子と充填材粒子をバインダー接
着剤と混合する.バインダー接着剤としては、ポリエス
テル樹脂接着剤が好適であるが、これに限定されるもの
ではない.一例をあげると、研磨材粒子として、平均粒
径3μlの酸化クロム0.10と、充填材粒子平均粒径
3IIJの弁柄0.9 kgを均一に混合し、さらにこ
れと飽和ポリエステル樹脂1kgを混合する.この混合
物にインシアネート系硬化剤7.5gとトルエン、キシ
レン、酢酸エチル、メチルエチルケトンの混合溶媒を加
えて撹拌し、粘度500〜100 cpのスラリーとす
る.このスラリーを厚さ16IIl〜150piのポリ
エステル基板シート上に均一に塗布する. 塗布するスリラーの厚さは従来の研磨シートが出来るだ
け薄く塗ることを目的としたのに対し、本発明では、石
垣効果ために少なくとも研磨材、充填材の平均粒径の3
倍以上、例えば平均3IJlの粒径の粒子の場合は10
1mから15pmの厚さに塗るのが望ましい. 塗布にあたっては、研磨層の表面精度をよくするため、
第3a図又は第3b図に示すように、ローラー8又はブ
レード9を使用する.このように均一にスラリーを塗布
したシートは温度40℃〜90℃に保たれた第一乾燥器
に入り、さらに、温度100℃〜110℃に保たれた第
二乾燥器に入り、スラリー中の溶媒が蒸発させられる.
その後温度40℃〜180℃で5時間〜l2時間のキュ
リアリング過程を経て、第l図に示す平面精度がよく、
研磨性能の優れた研磨シートの製造は完成する.惣−1 本発明にかかる研磨シートは、研磨層が厚く形成される
ため、研磨層の平面精度が良くなる.そして、その研磨
シートには、石垣効果が現れ、そのため研磨圧力を高め
ることができ、したがって高い研磨性能を得ることがで
きる. さらに、研磨シートの研磨層を構成する充填材粒子は天
然鉱物やガラスの微粒子等のような廉価な材料を使用で
きるので、研磨層の厚みを厚くしても、研磨シートのコ
ストは高くならない.また、本発明の研磨シートの製造
方法を実施することにより、平面精度のよい研磨層を形
成することができ、そしてまた研磨層に石垣効果が現れ
た上記研磨性能の優れた研磨シートを作ることができる
Preferred embodiments of the present invention will be described with reference to the drawings. Figure 1 shows a cross section of the polishing sheet of the present invention. In this polishing sheet, a thick polishing layer 3 consisting of four layers of abrasive particles is formed on a substrate 4. On this point, 1 to 2
This is in contrast to the conventional polishing layer formed on the polishing layer. Here, abrasive particles 1 and filler particles 7 are mixed in the abrasive mm3 via a binder adhesive 3. In addition, in the example, an example of an abrasive layer with a layer of abrasive particles of 41 was shown, but this layer has at least three layers,
Practically speaking, 4 to 5 layers or more is desirable. There are two main reasons why the polishing layer was formed so thick as described below. First of all, when the abrasive particles are a single layer, the variation in the particle size of the particles as shown in Figure 6 directly deteriorates the flatness accuracy. In addition, when the abrasive particles have two layers, as shown in Figures 3a and 3b, there is a case where the particles form an orthographically arranged layer (Fig. 3a), and a case where the particles form a squarely arranged layer (Fig. 3b). ), a step 10 occurs on the surface of the polishing layer, making it difficult to improve the plane accuracy. Therefore, adjusting the thickness of the abrasive layer to at least three or more abrasive particle layers, ideally four or more layers is a condition for producing an abrasive sheet with good planar accuracy. Secondly, it is necessary to thicken the polishing layer (abrasive particle layer) in order to increase the polishing force. The reason for this will be explained with reference to Figures 4 and 5. Figure 4 shows the polishing layer. The upper part is the material 6 to be polished, and the lower part is the polishing sheet.The abrasive particles 1 are sufficiently harder than the material 6 to be polished and the binder adhesive 2, and the material 6 to be polished is It is generally relatively harder than binder adhesive 2.
As shown in FIG. 4, the projected contact area A. (The shaded area in FIG. 4) is proportional to the vertical force Fl (polishing pressure) applied to the surface of the material 6 to be polished through the abrasive particles 1, and inversely proportional to the surface yield pressure P+s of the material to be polished, so that It can be expressed. Here, the surface yield pressure Pa is a force F1 perpendicular to the surface of the material to be polished 6, and when that force F,l exceeds P, the material to be polished 6 yields, and the abrasive particles are absorbed into the material to be polished. 6 and the projected contact surface $1A. It is thought that the pressure increases and equilibrium is reached when the pressure reaches PI1. This Pa is a constant depending on the material. On the other hand, between the abrasive particles 1 and the binder adhesive 2,
You can think of a similar idea. That is, binder adhesive 2
Projected contact surface WIAb of abrasive particle 1 in contact with WIAb (
4) is proportional to the vertical force Fw applied to the surface of the binder adhesive 2 through the abrasive particles l, and is inversely proportional to the surface yield pressure P1 of the binder adhesive, so it can be expressed as follows. Force F. applied to the material to be polished 6 and the binder adhesive 2 through the abrasive particles 1. are the same, so
By eliminating F. from equations (1) and (2), we get the following (3
) formula is obtained. A. Pa = Ab Pa (3) In most cases, the material to be polished is hard, and its surface yield pressure Pm is considered to be 102 to 105 times the surface yield pressure P1 of the binder adhesive. Therefore, from equation (3), the projected contact area of the abrasive particles to the material to be polished is A. is the projected contact surface W of the binder adhesive
It must be less than 101 to 10-2 times that of IAb.
FIG. 4 shows Aw and A. Although it is drawn relatively large compared to A. is very small. When used, the abrasive particles will immerse into the binder adhesive, destroying the abrasive layer. Therefore, in order to use the polishing seal 1 without destroying the polishing sheet, Ab must be made sufficiently large since (Pm'/Pa) is a constant that is determined once the material is determined. If Ab, that is, the projected contact area of the particles that support the force F, can be increased, the polishing layer will not be destroyed even if a polishing pressure that increases Am is applied.
If the polishing pressure can be increased as Ab increases, the abrasive particles will penetrate deeper into the material to be polished, leading to improvement in polishing performance. By the way, when several layers of abrasive particles are stacked to form a thick abrasive layer, as shown in FIG. Supported by a plurality of abrasive particles 1° in the layer, which in turn are supported by a plurality of abrasive particles l' in the second layer, a plurality of abrasive particles 11 in the third M, and further abrasive particles 1' (we will call this the Ishigaki effect). Therefore, the total projected contact area A1 of the particles of the second layer supporting one abrasive particle of the first layer (this area A The total projected contact area of each of the plurality of abrasive particles in A. is several times the projected contact area A. of the particles in the case of the first layer. When the polishing layer is thickened by stacking the polishing layers, the total projected contact area of each layer Ab'', Ab'''
...is dramatically increased compared to the projected contact area of conventional polishing sheets. In this way, the abrasive layer is formed thickly so that at least three or more layers of abrasive particle waste are formed;
It was found that a stone wall effect appeared, and as a result, the projected contact area supporting the polishing pressure could be significantly increased, and the polishing pressure could be increased accordingly, thereby improving polishing performance. Note that even if the first layer is manufactured with good surface precision, the number of abrasive particles in the first layer that actually come into contact with the substance to be polished is only 1/100 to iooo of all the particles lined up in the first layer. It has been experimentally determined that the following is true. Therefore, even if a plurality of abrasive particle layers are formed, the abrasive particles in the second layer and below rarely support the abrasive particles in the first layer redundantly.
As shown in Figure 5, it is safe to consider a pyramid-like stone wall structure for each abrasive particle in the first layer. On the other hand, in conventional abrasive sheet manufacturing, the only particles directly involved in polishing are the abrasive particles present on the surface, so in order to reduce costs, the abrasive particle layer is attached to a substrate coated with a binder using static electricity. We tried to make it as single layer as possible by attaching abrasive particles (^. D. Moore). However, the second layer supports the abrasive particles of the first layer on the surface of the thick abrasive layer. Third,・
...The stone wall particles in the layer do not need to be as hard as the abrasive particles,
As long as it is harder than the binder adhesive and has the same particle size as the abrasive particles, at least one type of inexpensive crystal or glass particles or natural mineral particles can be used as a filler for stone walls. Therefore, even if the polishing layer is formed thickly, the manufacturing cost of the polishing sheet does not increase. For the above reasons, the abrasive sheet of the present invention was formed to have at least three abrasive particle layers. Such a polishing layer improves the plane accuracy and polishing performance of the polishing layer, and therefore reduces the polishing time using conventional polishing sheets by 20 to 40%, and does not increase manufacturing costs. The specific substances of the abrasive, filler, and binder adhesive will be explained in the manufacturing method below.゛First, the abrasive particles to be adhered to the abrasive sheet are heated to a temperature of 10
Heat at 0 to 150°C for 1 hour or more to remove moisture on the particle surface. Similarly, filler particles are
Heat for more than an hour to remove moisture on the surface of the particles. As the abrasive particles, aluminum oxide, chromium oxide, silicon carbide, iron oxide, etc. with a diameter of 0.1 uz to 40p are used. In addition, the filler particles have a diameter of 0.1
~40νl, in addition to fine particles of natural minerals and glass such as kaolin, natural barium sulfide, Bengara, and agalmatolite, at least one of simple crystals such as silicon dioxide, zirconium oxide, iron oxide, titanium oxide, and calcium carbonate. Use different types of filler particles. The mixing ratio of the abrasive particles and the filler particles is expressed as follows:
= 0.01 to χ = o,9, and when the average particle diameters of both are approximately equal, the two can be easily mixed uniformly. Mix uniformly mixed abrasive particles and filler particles with binder adhesive. The binder adhesive is preferably a polyester resin adhesive, but is not limited thereto. For example, as abrasive particles, 0.10 chromium oxide with an average particle size of 3 μl and 0.9 kg of filler particles with an average particle size of 3 IIJ are uniformly mixed, and this and 1 kg of saturated polyester resin are mixed uniformly. Mix. To this mixture, add 7.5 g of incyanate curing agent and a mixed solvent of toluene, xylene, ethyl acetate, and methyl ethyl ketone and stir to form a slurry with a viscosity of 500 to 100 cp. This slurry is uniformly applied onto a polyester substrate sheet having a thickness of 16 II to 150 pi. While conventional abrasive sheets were designed to be applied as thinly as possible, in the present invention, the thickness of the thriller applied was at least 3 times the average particle size of the abrasive and filler to achieve a stone wall effect.
For example, in the case of particles with an average particle size of 3 IJl, 10
It is recommended to apply it to a thickness of 1m to 15pm. When applying, in order to improve the surface precision of the polishing layer,
A roller 8 or a blade 9 is used as shown in Figure 3a or Figure 3b. The sheet uniformly coated with slurry in this way enters the first dryer kept at a temperature of 40°C to 90°C, and then enters the second dryer kept at a temperature of 100°C to 110°C, where the slurry is removed. The solvent is evaporated.
After that, through a curing process at a temperature of 40℃ to 180℃ for 5 hours to 12 hours, the flat surface accuracy shown in Figure 1 was obtained.
The production of a polishing sheet with excellent polishing performance is completed. So-1 In the polishing sheet according to the present invention, since the polishing layer is formed thickly, the planar accuracy of the polishing layer is improved. The polishing sheet exhibits a stone wall effect, which makes it possible to increase the polishing pressure and thus obtain high polishing performance. Furthermore, the filler particles constituting the polishing layer of the polishing sheet can be made of inexpensive materials such as natural minerals or fine glass particles, so even if the thickness of the polishing layer is increased, the cost of the polishing sheet will not increase. Further, by carrying out the method for producing an abrasive sheet of the present invention, it is possible to form an abrasive layer with good planar accuracy, and also to produce an abrasive sheet with excellent abrasive performance as described above in which a stone wall effect appears in the abrasive layer. Can be done.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の研磨シートの部分断面図を示す. 第2a図は本発明の研磨シートを製造する方法において
ローラにより研磨層を平坦化する工程を示し、第2b図
は本発明の研磨シートを製造する方法においてブレード
により研磨層を平坦化する工程を示す. 第3a図は研磨材粒子が斜方配列層を作った場合の研磨
シートの略示断面図を示し、第3b図は研磨材粒子が正
方配列層を作った場合の研磨シートの略示断面図を示す
. 第4図は研磨シートが被研磨物質と接触したときの斜視
図である. 第5図は石垣効果が現れた本発明の研磨シートの斜視図
である. 第6図は従来の研磨シートが被研磨物質と接触した略示
断面図を示す. 第7図は大きさの異なる2種類の研磨材粒子を有する研
磨シートが被研磨物質と接触した略示断面図を示す.
Figure 1 shows a partial sectional view of the polishing sheet of the present invention. Figure 2a shows the step of flattening the polishing layer with a roller in the method of manufacturing the polishing sheet of the present invention, and Figure 2b shows the step of flattening the polishing layer with a blade in the method of manufacturing the polishing sheet of the present invention. show. Fig. 3a shows a schematic cross-sectional view of the abrasive sheet when the abrasive particles form a diagonally arranged layer, and Fig. 3b shows a schematic cross-sectional view of the abrasive sheet when the abrasive particles form a tetragonally arranged layer. is shown. Figure 4 is a perspective view of the polishing sheet in contact with the material to be polished. FIG. 5 is a perspective view of the abrasive sheet of the present invention in which the stone wall effect appears. Figure 6 shows a schematic cross-sectional view of a conventional polishing sheet in contact with a material to be polished. FIG. 7 shows a schematic cross-sectional view of a polishing sheet having two types of abrasive particles of different sizes in contact with a material to be polished.

【主要符号の説明】[Explanation of main symbols]

1・・・研磨材粒子    2・・・バインダー接着剤
3・・・研磨層      4・・・基板シート7・・
・充填材
1... Abrasive particles 2... Binder adhesive 3... Abrasive layer 4... Substrate sheet 7...
・Filling material

Claims (1)

【特許請求の範囲】 1、基板の少なくとも片面に、バイダー接着剤内に研磨
材粒子および充填材粒子が混合して成る研磨層を有する
研磨シート。 2、請求項1記載の研磨シートであって、 前記研磨層の厚みが少なくとも研磨材粒子 の平均粒径の3倍以上となる研磨シート。 3、請求項1記載の研磨シートであって、 前記研磨材粒子の重量比をχ、前記充填材 粒子の重量比を1−χとすると、χ=0.01〜0.9
までとし、両者の平均粒径がほぼ同じとする研磨シート
。 4、基板の少なくとも片面に、研磨材粒子と少なくとも
一種類の充填材粒子を混合し、これにさらに、バインダ
ー接着剤を混合して均一に塗布することを特徴とする研
磨シートの製造方法。 5、請求項4記載の製造方法であって、 研磨層の厚みが少なくとも研磨材粒子の平 均粒径の3倍以上となるように塗布する方法。 6、請求項4記載の製造方法であって、 前記研磨材粒子の重量比をχ、前記充填材 粒子の重量比を1−χとすると、χ=0.01〜0.9
までとし、両者の平均粒径がほぼ同じとする方法。
[Claims] 1. An abrasive sheet having, on at least one side of a substrate, an abrasive layer comprising a mixture of abrasive particles and filler particles in a binder adhesive. 2. The polishing sheet according to claim 1, wherein the thickness of the polishing layer is at least three times or more the average particle diameter of the abrasive particles. 3. The abrasive sheet according to claim 1, wherein χ=0.01 to 0.9, where the weight ratio of the abrasive particles is χ and the weight ratio of the filler particles is 1-χ.
Polishing sheets with approximately the same average particle size. 4. A method for producing an abrasive sheet, which comprises mixing abrasive particles and at least one type of filler particles on at least one side of a substrate, and further mixing and uniformly applying a binder adhesive thereto. 5. The manufacturing method according to claim 4, wherein the abrasive layer is coated so that the thickness thereof is at least three times the average particle diameter of the abrasive particles. 6. The manufacturing method according to claim 4, wherein χ=0.01 to 0.9, where the weight ratio of the abrasive particles is χ and the weight ratio of the filler particles is 1-χ.
A method in which the average particle size of both is approximately the same.
JP22829789A 1989-09-05 1989-09-05 Polishing sheet and method for producing the same Expired - Fee Related JP2846358B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22829789A JP2846358B2 (en) 1989-09-05 1989-09-05 Polishing sheet and method for producing the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22829789A JP2846358B2 (en) 1989-09-05 1989-09-05 Polishing sheet and method for producing the same

Publications (2)

Publication Number Publication Date
JPH0392255A true JPH0392255A (en) 1991-04-17
JP2846358B2 JP2846358B2 (en) 1999-01-13

Family

ID=16874258

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22829789A Expired - Fee Related JP2846358B2 (en) 1989-09-05 1989-09-05 Polishing sheet and method for producing the same

Country Status (1)

Country Link
JP (1) JP2846358B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003001568A (en) * 1995-12-08 2003-01-08 Saint-Gobain Abrasives Inc Improvement of abrasive disc

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6634929B1 (en) 1999-04-23 2003-10-21 3M Innovative Properties Company Method for grinding glass

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003001568A (en) * 1995-12-08 2003-01-08 Saint-Gobain Abrasives Inc Improvement of abrasive disc

Also Published As

Publication number Publication date
JP2846358B2 (en) 1999-01-13

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