JP2846358B2 - Polishing sheet and method for producing the same - Google Patents
Polishing sheet and method for producing the sameInfo
- Publication number
- JP2846358B2 JP2846358B2 JP22829789A JP22829789A JP2846358B2 JP 2846358 B2 JP2846358 B2 JP 2846358B2 JP 22829789 A JP22829789 A JP 22829789A JP 22829789 A JP22829789 A JP 22829789A JP 2846358 B2 JP2846358 B2 JP 2846358B2
- Authority
- JP
- Japan
- Prior art keywords
- polishing
- abrasive particles
- particles
- layer
- abrasive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Landscapes
- Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)
- Polishing Bodies And Polishing Tools (AREA)
- Manufacture Of Macromolecular Shaped Articles (AREA)
Description
本発明は、機械、装置、部品、その他一般の物体の表
面の精密仕上げ研磨に有用で、しかも研磨性能のよい研
磨シートおよびその製造方法に関する。The present invention relates to a polishing sheet which is useful for precision finish polishing of the surface of a machine, an apparatus, a part, or other general objects, and has good polishing performance, and a method for producing the same.
従来の研磨シートは、第６図に示すように、プラスチ
ックシートなどの基板４上にバインダー接着剤２を塗布
し、研磨材粒子１を１層または２層付着させたものであ
った（例えば、米国特許第2,755,607号および第3,868,3
25号を参照）。 他の従来の研磨シートは、第７図に示すように、硬さ
の異なる２種の研磨材粒子を混合し、しかも、軟かい研
磨材粒子1aの粒径を大きくし、硬い研磨材粒子1bの粒径
を小さくして形成したもので、このシートは被研磨物質
６の表面に付着した異物を取り除くことができ、かつ被
研磨物質６の表面上の突起を研磨することができるもの
であった（米国特許第4,138,229号を参照）。 また、研磨テープを製造する方法として、研磨材粒子
を少量で効率よく基板に付着させるため、静電気を利用
して、バインダーの塗ってある基板に研磨材粒子を、縦
方向にそろえて一層だけ接着する方法もあった（ELECTR
OSTATICS A.D.Moore著,Doubleday＆Company,Inc.,New Y
ork）。As shown in FIG. 6, a conventional polishing sheet is obtained by applying a binder adhesive 2 on a substrate 4 such as a plastic sheet and attaching one or two layers of abrasive particles 1 (for example, as shown in FIG. 6). U.S. Pat.Nos. 2,755,607 and 3,868,3
No. 25). As shown in FIG. 7, another conventional abrasive sheet is obtained by mixing two types of abrasive particles having different hardnesses, and further increasing the particle size of the soft abrasive particles 1a to form the hard abrasive particles 1b. This sheet can remove foreign substances adhering to the surface of the material 6 to be polished and can polish projections on the surface of the material 6 to be polished. (See U.S. Pat. No. 4,138,229). In addition, as a method of manufacturing a polishing tape, in order to efficiently attach a small amount of abrasive particles to a substrate, static electricity is used to align the abrasive particles on a substrate coated with a binder in a vertical direction and adhere only one layer. (ELECTR
OSTATICS ADMoore, Doubleday & Company, Inc., New Y
ork).
しかし、第６図のように、研磨材粒子の層を薄く、１
層（または２層）に形成する研磨シートの製造方法は、
研磨材粒子の粒径のバラツキ５のため、平面精度が悪い
という課題があった。また、第７図のような粒径の大き
く異なる２種類の研磨材粒子を混合する研磨シート製造
方法では、粒径の大きい粒子の間隙を通って、粒径の小
さい粒子が下方に集まる、いわゆる偏析現象が起こる。
そのため、この方法は、２種類の粒径の異なる研磨材粒
子を均一に分散塗布することが困難という課題があっ
た。 また、このように製造された従来の研磨シートは、第
６図および第７図にもみられるように、粒径の大きい粒
子1aのみが大きな圧力で被研磨物質６に接し、粒径の小
さい粒子1bは被研磨物質６の表面に接しなかった。そし
て、この研磨材粒子は一般に硬く、被研磨物質もまた固
いものであることから、研磨時に研磨圧力を上げると、
研磨材粒子は、被研磨物質よりもバインダー接着剤やプ
ラスチック基板により没入するため、その研磨性能を上
げることができなかった。このように従来の研磨シート
の研磨性能は低く、また被研磨物質表面の仕上がり精度
もよくなかった。 そこで、本発明は、かかる課題を解消するためになさ
れたもので、製造方法が比較的簡単で、平面精度がよ
く、研磨性能もよい研磨シートおよびその製造方法を提
供することを目的とする。However, as shown in FIG.
The method for producing a polishing sheet formed in a layer (or two layers)
Due to the variation 5 in the particle size of the abrasive particles, there was a problem that the planar accuracy was poor. Further, in the polishing sheet manufacturing method of mixing two types of abrasive particles having greatly different particle sizes as shown in FIG. 7, particles having a small particle size are gathered downward through a gap between the particles having a large particle size. A segregation phenomenon occurs.
Therefore, this method has a problem that it is difficult to uniformly disperse and apply two types of abrasive particles having different particle diameters. In addition, as shown in FIGS. 6 and 7, only the large-diameter particles 1a come into contact with the material 6 to be polished with a large pressure, and 1b did not contact the surface of the material 6 to be polished. And since the abrasive particles are generally hard and the material to be polished is also hard, when the polishing pressure is increased during polishing,
Since the abrasive particles are more immersed in the binder adhesive and the plastic substrate than the material to be polished, the polishing performance cannot be improved. As described above, the polishing performance of the conventional polishing sheet is low, and the finishing accuracy of the surface of the material to be polished is not good. The present invention has been made in order to solve such a problem, and an object of the present invention is to provide a polishing sheet having a relatively simple manufacturing method, good planar accuracy, and excellent polishing performance, and a method for manufacturing the same.
本発明の研磨シートは、基板の少なくとも片面に、バ
インダー接着剤内に研磨材粒子および少なくとも一種類
の充填材粒子が混合して成る研磨層を有するものであ
る。ここで、研磨層の厚みは、その研磨層の表面精度を
上げ、かつその表面にある研磨材粒子を複数の粒子によ
り下から支え、全投影接触面積を増加させることができ
るように少なくとも研磨材粒子の平均粒径の３倍以上と
することが望ましい。 また、研磨層を構成する研磨材粒子の重量比をx,充填
材粒子の重量比を１−ｘとするとき、ｘ＝0.01〜0.9ま
でとし、両者の平均粒径をほぼ同じとすることが望まし
い。 本発明の研磨シートを製造する方法は、上記研磨シー
トを製造するための方法で、基板の少なくとも片面に、
研磨材粒子と少なくとも一種類の充填材粒子を混合し、
これにさらに、バインダー接着剤を混合して均一に塗布
することを特徴とする研磨シートの製造方法である。こ
こで、研磨層の平面精度を良くするために、研磨材粒
子、充填材粒子、バインダー接着剤を混合したスラリー
を、ローラーまたはブレードを使用して基板シート上に
均一に塗布することが望ましい。The polishing sheet of the present invention has a polishing layer formed by mixing abrasive particles and at least one kind of filler particles in a binder adhesive on at least one surface of a substrate. Here, the thickness of the polishing layer is at least such that the surface accuracy of the polishing layer is increased, and the abrasive particles on the surface are supported by a plurality of particles from below, so that the total projected contact area can be increased. Desirably, the average particle diameter is three times or more. Further, when the weight ratio of the abrasive particles constituting the polishing layer is x, and the weight ratio of the filler particles is 1-x, x may be from 0.01 to 0.9, and the average particle size of both may be substantially the same. desirable. The method for producing the polishing sheet of the present invention is a method for producing the polishing sheet, on at least one surface of the substrate,
Mix abrasive particles and at least one filler particle,
A method for producing a polishing sheet, further comprising mixing a binder adhesive and applying the mixture uniformly. Here, in order to improve the planarity of the polishing layer, it is desirable to uniformly apply a slurry in which abrasive particles, filler particles, and a binder adhesive are mixed on a substrate sheet using a roller or a blade.
図面を参照して、本発明の好適実施例について説明す
る。第１図は本発明の研磨シートの断面を示す。この研
磨シートにおいて、基板４上に研磨材粒子の層で４層と
なった厚い研磨層３が形成されている。この点、１乃至
２層に形成した従来の研磨シートの研磨層とは対照的で
ある。ここで、研磨層３にはバインダー接着剤３を介し
て、研磨材粒子１および充填材粒子７が混合されてい
る。なお、実施例では、研磨材粒子の層で４層となった
研磨層の例を示したが、この層は少なくとも３層以上
で、実用的には４〜５層以上が望ましい。 このように研磨層を厚く形成したのは、以下に述べ
る、主として二つの理由がある。 先づ第一に、研磨材粒子が単層の場合は、第６図のよ
うに粒子の粒径のバラツキが、そのまま平面精度を悪化
させる。また、研磨材粒子が２層の場合は、第3a図およ
び第3b図に示すように、粒子が斜方配列層を作る場合
（第3a図）と、正方配列層を作る場合（第3b図）とがあ
ることから、研磨層表面に段差10が生じ、平面精度を整
えることが困難となる。したがって、研磨層の厚さを、
少なくとも研磨材粒子層で３層以上、理想的には４層以
上の厚さに整えることが、平面精度よく研磨シートを製
造する条件となる。 第二に、研磨力増強のために研磨層（研磨材粒子層）
を厚くする必要があるからである。その理由を第４図お
よび第５図を参照して説明する。 第４図は研磨機構を示すもので、上部は被研磨物質６
であり、下部は研磨シートである。研磨材粒子１は被研
磨物質６およびバインダー接着剤２より十分硬く、ま
た、被研磨物質６は、バインダー接着剤２より比較的硬
いのが一般的である。第４図に示してあるように、研磨
材粒子１が被研磨物質６に接している部分の投影接触面
積AW（第４図の斜線の部分）は、被研磨物質６の面に研
磨材粒子１を通じてかかる垂直な力FN（研磨圧力）に比
例し、被研磨物質の表面降伏圧Pmに反比例するから、 と表せる。ここに、表面降伏圧Pmは、被研磨物質６の面
に垂直な力FNがかかり、その力FNがPmを越えると被研磨
物質６の降伏が起こり、研磨材粒子が被研磨物質６中に
食い込むとともに投影接触面積AWが増加していき、圧力
がPmになったとき平衡するものと考えられている。この
Pmは物質による定数である。 一方、研磨材粒子１とバインダー接着剤２との間で
も、同様な考え方ができる。すなわち、バインダー接着
剤２に接している研磨材粒子１の投影接触面積Ab（第４
図の斜線の部分）は、バインダー接着剤２の表面に研磨
材粒子１を通じてかかる垂直な力FNに比例し、バインダ
ー接着剤の表面降伏圧Pm′に反比例するから、 と表せる。研磨材粒子１を通じて、被研磨物質６および
バインダー接着剤２にかかる力FNは同じであるから、
（１）および（２）式からFNを消去すると、次の（３）
式が得られる。 AWPm＝AbPm′ −（３） ほとんどの場合、被研磨物質は固く、その表面降伏圧
Pmはバインダー接着剤の表面降伏圧Pm′の102〜103倍と
考えられる。 したがって、（３）式より、被研磨物質への研磨材粒
子の投影接触面積AWはバインダー接着剤の投影接触面積
Abの10-2〜10-3倍以下でなければならない。第４図は説
明のためAWをAbに比べて比較的大きく描いてあるが、実
際はAWは非常に小さい。 もし、 なる条件で研磨シートを使用すると、研磨材粒子がバイ
ンダー接着剤中へ没入することになり、研磨層が破壊さ
れることになる。したがって、研磨シートが破壊される
ことのない条件、すなわち なる条件で研磨シートを使用するためには、（Pm′/P
m）が、物質が決まれば定まる定数であるから、Abを十
分大きくしなければならない。 Ab、すなわち力FNを支える粒子の投影接触面積を大き
くすることができれば、AWが大きくなるような研磨圧力
を作用させても、研磨層が破壊させることはない。そし
て、Abの増加に伴ない、研磨圧力を上げることができれ
は、研磨材粒子は被研磨物質により深く侵入し、研磨性
能の向上につながる。 ところで、研磨材粒子層を数層重ね研磨層を厚く形成
すると、第５図に示すように被研磨物質６に接した表面
の第１層の１つの研磨材粒子１は、その下の第２層にあ
る複数の研磨材粒子１′によって支えられ、さらに第２
層にあるその複数の研磨材粒子１′は第３層にある多数
の研磨材粒子１″に、そして、さらに研磨材粒子１に
支えられる（これを石垣効果と呼ぶことにする）。した
がって、第１層の１つの研磨材粒子を支える第２層の複
数の粒子の全投影接触面積Ab′（この面積Ab′は、第１
層の１つの研磨材粒子を支える第２層の複数の研磨材粒
子のそれぞれの投影接触面積を合計したもの）は、第１
層の場合の粒子の投影接触面積Abの数倍になる。さらに
第３層、第４層というように層を重ねて研磨層を厚くす
ると、各層の全投影接触面積Ab″、Ab…は、従来の研
磨シートの場合の投影接触面積より飛躍的に増加する。 このように、少なくとも研磨材粒子層が３層以上にな
るように研磨層を厚く形成すること、石垣効果が現れ、
その結果研磨圧力を支える投影接触面積を著しく増加さ
せることができ、これに伴って研磨圧力を上げることが
でき、研磨性能の向上を図ることができることが分かっ
た。 なお、第１層を表面精度よく製作しても、実際には被
研磨材物質に接触する第１層の研磨材粒子は、第１層に
並んだ全粒子の内の100乃至1000分の一以下であること
が実験的に判明している。したがって、複数の研磨粒子
層を形成しても、第２層以下の研磨材粒子が複数の第１
層の研磨材粒子を重複して支えることはまずなく、第５
図のように第１層にある個々の研磨粒子についてピラミ
ッドのような石垣構造を考えても差し支えない。 他方、従来の研磨シート製造においては、研磨に直接
関与する粒子は表面に存在する研磨材粒子のみとの考え
から、コストを下げるために、研磨材粒子層は、静電気
によってバインダーを塗布した基板に研磨材粒子を付着
させるなどの工夫を行い（A.D.Moore）、できるだけ単
層にしていた。しかし、厚く形成した研磨層の表面上に
ある第１層の研磨材粒子を支える第2,第3,…層の石垣粒
子は研磨材粒子程の硬さを必要とせず、バインダー接着
剤よりは硬く、研磨材粒子と同じ程度の粒径を持つもの
であれば、安価な結晶やガラスの微粒子または、天然鉱
物の微粒子のうち少なくとも一種類を石垣用充填材とし
て使用してもよく、したがって、研磨層を厚く形成して
も研磨シートの製造コストは高くならない。 以上の理由から、本発明の研磨シートを、研磨材粒子
層が少なくとも３層以上となるように形成したのであ
る。 このような研磨層は、研磨層の平面精度も、研磨性能
もよくなり、したがって従来の研磨シートによる研磨時
間を２〜４割減少させ、また製造コストも高くならな
い。 なお、研磨材、充填材、バインダー接着剤の具体的な
物質は、以下で行う製造方法において説明する。 研磨シートの製造方法 まず、研磨シートに接直させる研磨材粒子を、温度10
0〜150℃で１時間以上加熱して、粒子表面の水分を除
く。同様に充填材粒子も、温度100〜150℃で１時間以上
加熱して、粒子表面の水分を除く。 研磨材粒子としては、直径が0.1μｍ〜40μｍの酸化
アルミニウム、酸化クロム、シリコンカーバイド、酸化
鉄などを用いる。また、充填材粒子は、直径が0.1〜40
μｍで、カオリン、天然硫化バリウム、弁柄、アガルマ
トライトなどの天然鉱物やガラスの微粒子の他に、二酸
化ケイ素、酸化ジルコニウム、酸化鉄、酸化チタン、炭
酸カルシウムなどの単体結晶のうち少なくとも一種類の
充填材粒子を用いる。 研磨材粒子と充填材粒子との混合比は、研磨材粒子の
重量比をx,充填材粒子の重量比を１−ｘで表すと、ｘ＝
0.01からｘ＝0.9までとし、両者の平均粒径がほぼ等し
いとき、両者は容易に均一に混合する。 均一に混合した研磨材粒子と充填材粒子をバインダー
接着剤と混合する。バインダー接着剤としては、ポリエ
ステル樹脂接着剤が好適であるが、これに限定されるも
のではない。一例をあげると、研磨材粒子として、平均
粒径３μｍの酸化クロム0.1kgと、充填材粒子として、
平均粒径３μｍの弁柄0.9kgを均一に混合し、さらにこ
れと飽和ポリエステル樹脂1kgを混合する。この混合物
にイソシアネート系硬化剤7.5gとトルエン、キシレン、
酢酸エチル、メチルエチルケトンの混合溶媒を加えて撹
拌し、粘度500〜100cpのスラリーとする。 このスラリーを厚さ16μｍ〜150μｍのポリエステル
基板シート上に均一に塗布する。 塗布するスラリーの厚さは従来の研磨シートが出来る
だけ薄く塗ることを目的としたのに対し、本発明では、
石垣効果ために少なくとも研磨材、充填材の平均粒径の
３倍以上、例えば平均３μｍの粒径の粒子の場合は10μ
ｍから15μｍの厚さに塗るのが望ましい。 塗布にあたっては、研磨層の平面精度をよくするた
め、第2a図又は第2b図に示すように、ローラー８又はブ
レード９を使用する。このように均一にスラリーを塗布
したシートは温度40℃〜90℃に保たれた第一乾燥器に入
り、さらに、温度100℃〜110℃に保たれた第二乾燥器に
入り、スラリー中の溶媒が蒸発させられる。その後温度
40℃〜180℃で５時間〜12時間のキュリアリング過程を
経て、第１図に示す平面精度がよく、研磨性能の優れた
研磨シートの製造は完成する。 効 果 本発明にかかる研磨シートは、研磨層が厚く形成され
るため、研磨層の平面精度が良くなる。そして、その研
磨シートには、石垣効果が現れ、そのため研磨圧力を高
めることができ、したがって高い研磨性能を得ることが
できる。 さらに、研磨シートの研磨層を構成する充填材粒子は
天然鉱物やガラスの微粒子等のような廉価な材料を使用
できるので、研磨層の厚みを厚くしても、研磨シートの
コストは高くならない。 また、本発明の研磨シートの製造方法を実施すること
により、平面精度のより研磨層を形成することができ、
そしてまた研磨層に石垣効果が現れた上記研磨性能の優
れた研磨シートを作ることができる。Preferred embodiments of the present invention will be described with reference to the drawings. FIG. 1 shows a cross section of the polishing sheet of the present invention. In this polishing sheet, a thick polishing layer 3 composed of four layers of abrasive particles is formed on a substrate 4. This is in contrast to the conventional polishing sheet formed of one or two layers. Here, the abrasive particles 1 and the filler particles 7 are mixed in the polishing layer 3 via the binder adhesive 3. In the examples, the example of the polishing layer having four layers of the abrasive particles is shown, but this layer is at least three layers, and practically four to five layers is desirable. The reason why the polishing layer is formed thick in this manner is mainly for the following two reasons. First, when the abrasive particles have a single layer, the variation in the particle size of the particles directly deteriorates the planar accuracy as shown in FIG. Further, when the abrasive particles have two layers, as shown in FIGS. 3a and 3b, the particles form an obliquely arranged layer (FIG. 3a) and the particles form a square arranged layer (FIG. 3b). ), A step 10 is formed on the polishing layer surface, and it is difficult to adjust the planar accuracy. Therefore, the thickness of the polishing layer,
It is a condition for producing a polishing sheet with high planar accuracy that the thickness of the abrasive particle layer is adjusted to at least three layers, ideally at least four layers. Second, a polishing layer (abrasive particle layer) to enhance polishing power
Is necessary to be thicker. The reason will be described with reference to FIGS. 4 and 5. FIG. 4 shows a polishing mechanism.
And the lower part is a polishing sheet. The abrasive particles 1 are generally harder than the material to be polished 6 and the binder adhesive 2, and the material to be polished 6 is generally relatively harder than the binder adhesive 2. As shown in FIG. 4, the projected contact area A W (shaded portion in FIG. 4) of the portion where the abrasive particles 1 are in contact with the material 6 is the abrasive material Since it is proportional to the vertical force F N (polishing pressure) applied through the particle 1 and inversely proportional to the surface yield pressure Pm of the material to be polished, Can be expressed as Here, the surface breakdown pressure Pm, it takes a vertical force F N to the surface of the polishing material 6, the yield of the polished material 6 takes place with the force F N is more than Pm, the abrasive abrasive grains material 6 It is thought that the projected contact area A W increases as it penetrates into the interior, and equilibrates when the pressure reaches Pm. this
Pm is a constant depending on the substance. On the other hand, the same concept can be applied between the abrasive particles 1 and the binder adhesive 2. That is, the projected contact area Ab of the abrasive particles 1 in contact with the binder adhesive 2 (fourth)
Hatched portion in the figure) is proportional to the vertical force F N exerted through abrasive particles 1 on the surface of the binder adhesive 2, inversely proportional to the surface breakdown pressure Pm of binder adhesive ' Can be expressed as Through abrasive particles 1, because the force F N exerted on the polished material 6 and a binder adhesive 2 are the same,
(1) and the erasing F N (2), the following equation (3)
An expression is obtained. A W Pm = AbPm '-(3) In most cases, the material to be polished is hard and its surface breakdown pressure
Pm is considered to 10 2 to 10 3 times the surface breakdown pressure Pm of binder adhesive '. Therefore, from equation (3), the projected contact area A W of the abrasive particles on the material to be polished is the projected contact area of the binder adhesive.
Ab must be less than 10 -2 to 10 -3 times. Figure 4 is is drawn relatively large compared to A W to A b for explanation, but it is actually A W is very small. if, If the abrasive sheet is used under the following conditions, the abrasive particles will sink into the binder adhesive, and the abrasive layer will be destroyed. Therefore, the condition that the abrasive sheet is not destroyed, that is, In order to use the abrasive sheet under the following conditions, (Pm '/ P
Since m) is a constant determined once the substance is determined, Ab must be sufficiently large. Ab, that is, it is possible to increase the projected contact area of the particles for supporting a force F N, even by the action of polishing pressure as A W increases, the polishing layer will not be destroyed. If the polishing pressure can be increased with an increase in Ab, the abrasive particles penetrate deeper into the material to be polished, leading to an improvement in polishing performance. By the way, when several layers of abrasive particles are stacked to form a thick abrasive layer, one abrasive particle 1 of the first layer on the surface in contact with the material 6 to be polished as shown in FIG. Supported by a plurality of abrasive particles 1 'in the layer,
The plurality of abrasive particles 1 ′ in the layer are supported by a large number of abrasive particles 1 ″ in the third layer and further by the abrasive particles 1 (this will be referred to as the stone wall effect). The total projected contact area A b ′ of the particles of the second layer supporting one abrasive particle of the first layer (this area A b ′
The sum of the projected contact areas of each of the plurality of abrasive particles of the second layer supporting one of the abrasive particles of the layer)
It is several times the projected contact area A b of the particles in Layer. Further, when the polishing layers are made thicker by stacking the third layer, the fourth layer, etc., the total projected contact area Ab ″, Ab... Of each layer is dramatically increased from the projected contact area of the conventional polishing sheet. In this way, forming the polishing layer thickly so that at least the abrasive particle layer becomes three layers or more, the stone wall effect appears,
As a result, it was found that the projected contact area supporting the polishing pressure could be significantly increased, the polishing pressure could be increased accordingly, and the polishing performance could be improved. Even if the first layer is manufactured with high surface accuracy, the abrasive particles of the first layer that actually come into contact with the material to be polished are one hundred to one thousandth of all the particles arranged in the first layer. It has been experimentally found that: Therefore, even when a plurality of abrasive particle layers are formed, the abrasive particles of the second layer or less are formed by a plurality of first abrasive particles.
It is unlikely that the abrasive particles in the layer will be supported redundantly.
As shown in the figure, a stone wall structure such as a pyramid may be considered for each abrasive particle in the first layer. On the other hand, in the conventional polishing sheet production, since the particles directly involved in polishing are only the abrasive particles existing on the surface, in order to reduce the cost, the abrasive particle layer is formed on the substrate coated with the binder by static electricity. A device such as attaching abrasive particles was used (ADMoore) to make a single layer as much as possible. However, the stone walls of the second, third,... Layers that support the abrasive particles of the first layer on the surface of the thickly formed abrasive layer do not require the hardness of the abrasive particles, and are not as strong as the binder adhesive. Hard, if it has a particle size of the same degree as abrasive particles, at least one of inexpensive crystal or glass fine particles or natural mineral fine particles may be used as a filler for stone wall, Even if the polishing layer is formed thick, the production cost of the polishing sheet does not increase. For the above reasons, the abrasive sheet of the present invention was formed so that the abrasive particle layer had at least three layers. Such a polishing layer improves the planar accuracy and polishing performance of the polishing layer, so that the polishing time with the conventional polishing sheet is reduced by 20 to 40%, and the production cost is not increased. The specific materials of the abrasive, the filler, and the binder adhesive will be described in the following manufacturing method. First, the abrasive particles to be brought into direct contact with the polishing sheet are heated at a temperature of 10%.
Heat at 0 to 150 ° C for 1 hour or more to remove water on the particle surface. Similarly, the filler particles are also heated at a temperature of 100 to 150 ° C. for 1 hour or more to remove water on the particle surfaces. As the abrasive particles, aluminum oxide, chromium oxide, silicon carbide, iron oxide, or the like having a diameter of 0.1 μm to 40 μm is used. The filler particles have a diameter of 0.1 to 40.
μm, natural minerals such as kaolin, natural barium sulfide, red iron oxide, agarmatrite, and fine particles of glass, and at least one kind of single crystals such as silicon dioxide, zirconium oxide, iron oxide, titanium oxide, and calcium carbonate Is used. The mixing ratio between the abrasive particles and the filler particles is represented by x = x where the weight ratio of the abrasive particles is 1 and the weight ratio of the filler particles is 1−x.
From 0.01 to x = 0.9, and when the average particle diameters of both are approximately equal, both are easily and uniformly mixed. The uniformly mixed abrasive particles and filler particles are mixed with the binder adhesive. As the binder adhesive, a polyester resin adhesive is suitable, but is not limited thereto. As an example, as abrasive particles, 0.1 kg of chromium oxide having an average particle diameter of 3 μm, and as filler particles,
0.9 kg of a red stem having an average particle size of 3 μm is uniformly mixed, and further mixed with 1 kg of a saturated polyester resin. 7.5 g of isocyanate-based curing agent and toluene, xylene,
A mixed solvent of ethyl acetate and methyl ethyl ketone is added and stirred to obtain a slurry having a viscosity of 500 to 100 cp. This slurry is uniformly applied on a polyester substrate sheet having a thickness of 16 μm to 150 μm. While the thickness of the slurry to be applied was intended to apply the conventional polishing sheet as thinly as possible, in the present invention,
For the stone wall effect, at least three times the average particle size of the abrasive and filler, for example, 10 μm for particles having an average particle size of 3 μm
It is desirable to apply a thickness of from 15 m to 15 m. In application, a roller 8 or a blade 9 is used as shown in FIG. 2a or 2b in order to improve the planarity of the polishing layer. The sheet coated with the slurry in this manner enters the first dryer maintained at a temperature of 40 ° C to 90 ° C, and further enters the second dryer maintained at a temperature of 100 ° C to 110 ° C, and The solvent is evaporated. Then temperature
After a curing process at 40 ° C. to 180 ° C. for 5 hours to 12 hours, the production of a polishing sheet having good planar accuracy and excellent polishing performance shown in FIG. 1 is completed. Effect Since the polishing sheet according to the present invention has a thick polishing layer, the planarity of the polishing layer is improved. Then, the polishing sheet has a stone wall effect, so that the polishing pressure can be increased, and thus high polishing performance can be obtained. Furthermore, since the filler particles constituting the polishing layer of the polishing sheet can be made of inexpensive materials such as fine particles of natural minerals and glass, the cost of the polishing sheet does not increase even if the thickness of the polishing layer is increased. Further, by performing the method for producing a polishing sheet of the present invention, it is possible to form a polishing layer more planar accuracy,
In addition, it is possible to produce a polishing sheet excellent in the polishing performance, in which the stone wall effect appears in the polishing layer.
第１図は本発明の研磨シートの部分断面図を示す。 第2a図は本発明の研磨シートを製造する方法においてロ
ーラにより研磨層を平坦化する工程を示し、第2b図は本
発明の研磨シートを製造する方法においてブレードによ
り研磨層を平坦化する工程を示す。 第3a図は研磨材粒子が斜方配列層を作った場合の研磨シ
ートの略示断面図を示し、第3b図は研磨材粒子が正方配
列層を作った場合の研磨シートの略示断面図を示す。 第４図は研磨シートが被研磨物質と接触したときの斜視
図である。 第５図は石垣効果が現れた本発明の研磨シートの斜視図
である。 第６図は従来の研磨シートが被研磨物質と接触した略示
断面図を示す。 第７図は大きさの異なる２種類の研磨材粒子を有する研
磨シートが被研磨物質と接触した略示断面図を示す。FIG. 1 shows a partial cross-sectional view of the polishing sheet of the present invention. FIG. 2a shows a step of flattening the polishing layer by a roller in the method of manufacturing a polishing sheet of the present invention, and FIG. 2b shows a step of flattening the polishing layer by a blade in the method of manufacturing a polishing sheet of the present invention. Show. FIG. 3a is a schematic cross-sectional view of the polishing sheet when the abrasive particles form an oblique array layer, and FIG. 3b is a schematic cross-sectional view of the abrasive sheet when the abrasive particles form a square array layer. Is shown. FIG. 4 is a perspective view when the polishing sheet comes into contact with the material to be polished. FIG. 5 is a perspective view of the polishing sheet of the present invention in which the stone wall effect has appeared. FIG. 6 is a schematic cross-sectional view showing a conventional polishing sheet in contact with a material to be polished. FIG. 7 is a schematic cross-sectional view in which a polishing sheet having two types of abrasive particles having different sizes has come into contact with a substance to be polished.
１……研磨材粒子、２……バインダー接着剤 ３……研磨層、４……基板シート ７……充填材 1 ... Abrasive particles 2 ... Binder adhesive 3 ... Abrasive layer 4 ... Substrate sheet 7 ... Filler
───────────────────────────────────────────────────── フロントページの続き (58)調査した分野(Int.Cl.6，ＤＢ名) B24D 11/00 B24D 3/00──────────────────────────────────────────────────続 き Continued on the front page (58) Field surveyed (Int. Cl. 6 , DB name) B24D 11/00 B24D 3/00
Claims (2)
均粒径の充填材粒子と、バインダー接着剤とを均一に混
合したものを前記基板シートの少なくとも片面に均一に
塗布し乾燥させて形成した、前記研磨材粒子と前記充填
材粒子とを少なくとも３層に重ねた石垣構造の研磨層、 からなる研磨シートであって、 前記石垣構造により、前記研磨層の表面に位置する研磨
材粒子にかかる圧力が、その下層に位置する研磨材粒
子、充填材粒子又はこれら粒子によって分散して支えら
れる、ところの研磨シート。A substrate sheet and a mixture of abrasive particles, filler particles having an average particle size substantially equal to the average particle size of the abrasive particles, and a binder adhesive are uniformly mixed. A polishing sheet having a stone wall structure in which at least three layers of the abrasive particles and the filler particles are formed by applying a uniform coating on at least one side and drying, the polishing sheet comprising: A polishing sheet wherein the pressure applied to the abrasive particles located on the surface of the polishing layer is dispersed and supported by the abrasive particles, filler particles, or these particles located below.
ほぼ同一の平均粒径の充填材粒子と、バインダー接着剤
とを均一に混合したものを基板シートの少なくとも片面
に均一に塗布し乾燥させて、前記基板シートの少なくと
も片面に前記研磨材粒子と前記充填材粒子とを少なくと
も３層に重ねた石垣構造の研磨層を形成する工程から成
る研磨シートの製造方法であって、 前記石垣構造により、前記研磨層の表面に位置する研磨
材粒子にかかる圧力が、その下層に位置する研磨材粒
子、充填材粒子又はこれら粒子によって分散して支えら
れる、ところの研磨シートの製造方法。2. A method in which abrasive particles, filler particles having an average particle diameter substantially equal to the average particle diameter of the abrasive particles, and a binder adhesive are uniformly mixed on at least one surface of a substrate sheet. A method for producing a polishing sheet, comprising: applying and drying, forming a polishing layer having a stone wall structure in which at least one surface of the substrate sheet has at least three layers of the abrasive particles and the filler particles stacked thereon, Due to the stone wall structure, the pressure applied to the abrasive particles located on the surface of the polishing layer is supported by being dispersed by the abrasive particles, filler particles or these particles located thereunder. .
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22829789A JP2846358B2 (en) | 1989-09-05 | 1989-09-05 | Polishing sheet and method for producing the same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22829789A JP2846358B2 (en) | 1989-09-05 | 1989-09-05 | Polishing sheet and method for producing the same |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0392255A JPH0392255A (en) | 1991-04-17 |
| JP2846358B2 true JP2846358B2 (en) | 1999-01-13 |
Family
ID=16874258
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP22829789A Expired - Fee Related JP2846358B2 (en) | 1989-09-05 | 1989-09-05 | Polishing sheet and method for producing the same |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2846358B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6634929B1 (en) | 1999-04-23 | 2003-10-21 | 3M Innovative Properties Company | Method for grinding glass |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE69635133T2 (en) * | 1995-12-08 | 2006-07-06 | Norton Co., Worcester | CARRIER PLATE FOR GRINDING WHEELS |
-
1989
- 1989-09-05 JP JP22829789A patent/JP2846358B2/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6634929B1 (en) | 1999-04-23 | 2003-10-21 | 3M Innovative Properties Company | Method for grinding glass |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0392255A (en) | 1991-04-17 |
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