JPH0388329U - - Google Patents

Info

Publication number
JPH0388329U
JPH0388329U JP14981089U JP14981089U JPH0388329U JP H0388329 U JPH0388329 U JP H0388329U JP 14981089 U JP14981089 U JP 14981089U JP 14981089 U JP14981089 U JP 14981089U JP H0388329 U JPH0388329 U JP H0388329U
Authority
JP
Japan
Prior art keywords
nozzle
wafer
rinsing mechanism
resist film
edge rinsing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14981089U
Other languages
English (en)
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP14981089U priority Critical patent/JPH0388329U/ja
Publication of JPH0388329U publication Critical patent/JPH0388329U/ja
Pending legal-status Critical Current

Links

JP14981089U 1989-12-25 1989-12-25 Pending JPH0388329U (ro)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14981089U JPH0388329U (ro) 1989-12-25 1989-12-25

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14981089U JPH0388329U (ro) 1989-12-25 1989-12-25

Publications (1)

Publication Number Publication Date
JPH0388329U true JPH0388329U (ro) 1991-09-10

Family

ID=31696185

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14981089U Pending JPH0388329U (ro) 1989-12-25 1989-12-25

Country Status (1)

Country Link
JP (1) JPH0388329U (ro)

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