JPH0384392A - Production of far infrared ray radiator - Google Patents
Production of far infrared ray radiatorInfo
- Publication number
- JPH0384392A JPH0384392A JP22218789A JP22218789A JPH0384392A JP H0384392 A JPH0384392 A JP H0384392A JP 22218789 A JP22218789 A JP 22218789A JP 22218789 A JP22218789 A JP 22218789A JP H0384392 A JPH0384392 A JP H0384392A
- Authority
- JP
- Japan
- Prior art keywords
- alloy
- far
- aluminum oxide
- infrared
- far infrared
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 16
- 239000000956 alloy Substances 0.000 claims abstract description 46
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 46
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims abstract description 36
- 238000010438 heat treatment Methods 0.000 claims abstract description 23
- 239000012298 atmosphere Substances 0.000 claims abstract description 12
- 239000000203 mixture Substances 0.000 claims abstract description 12
- 230000001590 oxidative effect Effects 0.000 claims abstract description 10
- 229910052759 nickel Inorganic materials 0.000 claims abstract description 9
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 5
- 229910052804 chromium Inorganic materials 0.000 claims abstract description 5
- 238000000034 method Methods 0.000 claims description 18
- 239000003973 paint Substances 0.000 claims description 8
- 229910052688 Gadolinium Inorganic materials 0.000 claims description 2
- 229910052779 Neodymium Inorganic materials 0.000 claims description 2
- 229910052746 lanthanum Inorganic materials 0.000 claims description 2
- 238000000576 coating method Methods 0.000 abstract description 12
- 239000011248 coating agent Substances 0.000 abstract description 11
- 239000000126 substance Substances 0.000 abstract description 4
- 238000000151 deposition Methods 0.000 abstract 1
- 239000000463 material Substances 0.000 description 12
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 10
- 230000000052 comparative effect Effects 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 229910052735 hafnium Inorganic materials 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 238000007750 plasma spraying Methods 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 238000001556 precipitation Methods 0.000 description 2
- 229910052726 zirconium Inorganic materials 0.000 description 2
- 229910052684 Cerium Inorganic materials 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000005422 blasting Methods 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 238000002485 combustion reaction Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 239000011224 oxide ceramic Substances 0.000 description 1
- 229910052574 oxide ceramic Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 230000001376 precipitating effect Effects 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Resistance Heating (AREA)
- Furnace Details (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
この発明は、暖房機器などの加熱装置などに使用される
遠赤外線放射体の製造方法に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a method of manufacturing a far-infrared radiator used in a heating device such as a heating device.
遠赤外線は、人の体内や食品などに深く浸透する性質が
あり、暖房や食品加熱などに利用されている。遠赤外線
を放射するためには、セラミック等の遠赤外線放射体を
加熱する必要がある。このような遠赤外線放射体を製造
するための技術として、金属基板上に遠赤外線放射物質
を溶射する方法が特開昭４９−１１９２４４号公報に開
示されている。Far-infrared rays have the property of penetrating deeply into the human body and food, and are used for purposes such as space heating and food heating. In order to radiate far-infrared rays, it is necessary to heat a far-infrared radiator such as ceramic. As a technique for manufacturing such a far-infrared radiator, a method of thermally spraying a far-infrared ray emitting material onto a metal substrate is disclosed in Japanese Patent Laid-Open No. 119244/1983.
しかし、上述の方法により得られた遠赤外線放射体は、
加熱・冷却を繰り返しているうちに、遠赤外線放射物質
の膜が剥離してしまうという欠点を有していた。However, the far-infrared radiator obtained by the above method is
The drawback was that the film of the far-infrared emitting material peeled off during repeated heating and cooling.
そこで、この発明は、熱衝撃や機械的な振動等によって
も剥離を起こしにくい遠赤外線放射体を優れた生産性で
製造できる遠赤外線放射体の製造方法を提供することを
課題とする。SUMMARY OF THE INVENTION An object of the present invention is to provide a method for manufacturing a far-infrared radiator, which can produce a far-infrared radiator with excellent productivity that does not easily peel off even when subjected to thermal shock, mechanical vibration, or the like.
上記の課題を解決するために、請求項１記載の発明にか
かる遠赤外線放射体の製造方法は、組成が重量％で、Ｃ
ｒ：１５〜３０％、Ｎｉ：０〜１０％、Ａ１２７２〜６
％、残部が実質的にＦｅからなる合金を酸化雰囲気中で
５００℃以上、１３００℃以下の温度に加熱することに
より、前記合金の表面に酸化アルミニウムを析出させる
ようにしている。In order to solve the above problems, a method for producing a far-infrared radiator according to the invention according to claim 1 has a composition of % by weight, C
r: 15-30%, Ni: 0-10%, A1272-6
%, the balance being substantially Fe, is heated in an oxidizing atmosphere to a temperature of 500° C. or more and 1300° C. or less, so that aluminum oxide is precipitated on the surface of the alloy.
また、請求項２記載の発明にかかる遠赤外線放射体の製
造方法は、組成が重量％で、Ｃｒ：１５〜３０％、Ｎｉ
：ｏ”１０％、Ａｌ２ ： ２〜６％、Ｔｉ−Ｚｒ−Ｙ
−Ｈｆ−Ｃｅ−Ｌａ−Ｎｄ−Ｇｄのうちのいずれか１種
または２種以上： Ｏ，ＯＳ〜１．０％、残部が実質的
にＦｅからなる合金を酸化雰囲気中で５００℃以上、１
３００℃以下の温度に加熱することにより、前記合金の
表面に酸化アルミニウムを析出させるようにしている。Further, in the method for producing a far-infrared radiator according to the invention described in claim 2, the composition is in weight%, Cr: 15 to 30%, Ni
: o"10%, Al2: 2-6%, Ti-Zr-Y
Any one or more of -Hf-Ce-La-Nd-Gd: O, OS ~ 1.0%, the balance consisting essentially of Fe, in an oxidizing atmosphere at 500°C or higher, 1
By heating to a temperature of 300° C. or lower, aluminum oxide is precipitated on the surface of the alloy.
発明者らは、鋭意研究を重ねた結果、Ｆｅ−Ｃｒ−（Ｎ
ｉ）−Ａｌ１合金を酸化雰囲気で５００〜１３００℃に
加熱して、同合金表面に酸化アルミニウムを析出させる
ことにより、上記課題を解決できることを見出した。こ
の方法だと、遠赤外線放射物質である酸化アルミニウム
１は、合金内部より析出するために、密着強度が強く、
また、加熱のみによって遠赤外線放射物質の膜による一
部分または全面の被覆が可能なために、線材や複雑な形
状に対しても、細部まで容易に全面コーティングが可能
である。特に、請求項２の発明の場合には、第４図にみ
るように、酸化アルミニウム１の膜が単に母材である合
金２の上に平板状に形成されるのではなく、母材からの
析出過程で、第３図にみるように、合金２にいわば根３
・・・がはえたように形成される。それゆえ、合金２と
の密着性が極めて優れている。また、合金２に根が生え
たように形成された酸化アルミニウム１の厚みｔ （こ
の厚みｔは、第３図にみるように、いわゆる根の部分を
除いた最小の厚みである）についても熱処理温度および
／または熱処理時間を適宜調整することで、所望の量、
たとえば、１〜２Ｏｎあるいは１〜１０μにすることが
可能である。さらに、このような方法をイオンブレーテ
ィング法やスパッター法と比較すると、前述のとおり酸
化物は合金の内部より合金に根が生えたように析出して
いるために、密着性ははるかに優れている。As a result of intensive research, the inventors discovered Fe-Cr-(N
i) It has been found that the above problem can be solved by heating the -Al1 alloy to 500 to 1300°C in an oxidizing atmosphere to precipitate aluminum oxide on the surface of the alloy. With this method, aluminum oxide 1, which is a far-infrared emitting substance, precipitates from inside the alloy, so the adhesion strength is strong.
Furthermore, since it is possible to cover a part or the entire surface with a film of far-infrared emitting material only by heating, it is possible to easily coat the entire surface down to the smallest detail even on wire rods or complex shapes. In particular, in the case of the invention of claim 2, as shown in FIG. During the precipitation process, as shown in Figure 3, alloy 2 has a so-called root 3.
... is formed like a bulge. Therefore, the adhesion with Alloy 2 is extremely excellent. In addition, the thickness t of the aluminum oxide 1 formed as if it had roots in the alloy 2 (as shown in Figure 3, this thickness t is the minimum thickness excluding the so-called root part) was also heat treated. By adjusting the temperature and/or heat treatment time appropriately, the desired amount,
For example, it is possible to set it to 1-2 On or 1-10μ. Furthermore, when comparing this method with the ion blasting method and the sputtering method, the adhesion is much better because the oxide is precipitated from inside the alloy as if it were rooted in the alloy, as mentioned above. There is.
この発明で用いる合金は、下記の組成〔重量％〕を持つ
ものである。ただし、残部は実質的にＦｅである。The alloy used in this invention has the following composition (% by weight). However, the remainder is substantially Fe.
Ｃｒ：１５〜３０％、 Ｎｉ：０〜１０％、 Ａｌ ： ２〜６％。Cr: 15-30%, Ni: 0-10%, Al: 2-6%.
あるいは、Ｃｒ：１５〜３０％、
Ｎ ｉ ： ０〜１０％、
ＡＪ：２〜６％、
Ｔｉ−Ｚｒ−Ｙ−Ｈｆ−Ｃｅ−Ｌａ−Ｎｄ−Ｇｄのうち
のいずれか１種または２種以上：０．０５〜１．０％。Alternatively, any one or more of Cr: 15 to 30%, Ni: 0 to 10%, AJ: 2 to 6%, and Ti-Zr-Y-Hf-Ce-La-Nd-Gd. :0.05-1.0%.
残部が実質的にＦｅであるとは、残部がすべてＦｅであ
る場合のみを言うのではなく、たとえば、残部がＦｅ以
外に不可避的に存在している不純物も含んでいる場合も
意味している。The term "the remainder is essentially Fe" does not mean only when the remainder is entirely Fe, but also means, for example, when the remainder also contains unavoidably present impurities other than Fe. .
このような合金を所望の形状に底形する。この成形方法
は、特に限定はないが、たとえば、真空熔解して加工す
る方法などが使用される。前記合金形状も特に制限はな
く、たとえば、線材や複雑な形状などが挙げられる。Such an alloy is shaped into a desired shape. This molding method is not particularly limited, but for example, a method of vacuum melting and processing may be used. The shape of the alloy is not particularly limited, and examples thereof include a wire rod and a complicated shape.
底形された合金を酸化雰囲気中で加熱処理する、、酸化
雰囲気としては、酸素（Ｏｌ、○、だけではなく、他の
元素と化合物を形成している場合も含む〉を含む気体、
たとえば、大気が使用される。加熱温度は、５００℃以
上（好ましくは９００℃以上）、１３００℃以下の範囲
へする必要があり、たとえば、この範囲内で、目的とす
る酸化膜の厚み（たとえば、上記の厚み）に応じて設定
すレハヨい。５００℃未満だと、酸化アルミニウム被膜
の生成速度が極端に遅く、ｌ、Ｂｒｓ以上の被膜を得る
のに長時間要するという問題があり、１３００℃を越え
ると、母材が軟化・変形するだけでなく、生成被膜に亀
裂や剥離が生じやすいという問題がある。また、加熱時
間は特に制限はないが、０．５時間以上とするのが好ま
しく、この範囲内で、目的とする酸化膜の厚みに応じて
設定すればよい。０．５時間未満だと、全体に１μ璽以
上の酸化アルミニウム膜ができにくいおそれがある。The bottom-shaped alloy is heat-treated in an oxidizing atmosphere. The oxidizing atmosphere is a gas containing oxygen (not only Ol, ○, but also in cases where it forms compounds with other elements).
For example, atmosphere is used. The heating temperature needs to be in the range of 500°C or higher (preferably 900°C or higher) and 1300°C or lower; for example, within this range, depending on the desired thickness of the oxide film (for example, the above thickness). It's time to set it up. If the temperature is less than 500℃, the formation rate of the aluminum oxide film is extremely slow, and there is a problem that it takes a long time to obtain a coating of l,Brs or higher.If the temperature exceeds 1300℃, the base material will simply soften and deform. However, there is a problem that cracks and peeling tend to occur in the resulting film. The heating time is not particularly limited, but is preferably 0.5 hours or more, and may be set within this range depending on the desired thickness of the oxide film. If the time is less than 0.5 hours, it may be difficult to form an aluminum oxide film with a thickness of 1 μm or more over the entire surface.
前記加熱処理により合金表面に酸化アルミニウムが析出
する。好ましくは、酸化アルミニウムの被膜を形成する
。The heat treatment causes aluminum oxide to precipitate on the alloy surface. Preferably, a coating of aluminum oxide is formed.
さらに、遠赤外線放射物質膜を厚くしたい場合には、前
記合金表面に酸化アルミニウムを析出させた後に必要に
応じて、その表面上に遠赤外線塗料を塗布することがで
きる。このようにする場合、塗料の下地は、酸化アルミ
ニウムとなっているので、金属面に直接に塗布するより
も、強い密着強度を得ることができる。このように遠赤
外線放射塗膜を形成するのは、酸化アルミニウム膜だけ
では遠赤外線放射率が低すぎることがあるからである。Furthermore, if it is desired to thicken the far-infrared emitting material film, a far-infrared paint can be coated on the surface of the alloy, if necessary, after aluminum oxide has been deposited on the surface of the alloy. In this case, since the base of the paint is aluminum oxide, it is possible to obtain stronger adhesion strength than when directly applying the paint to the metal surface. The reason why a far-infrared emitting coating film is formed in this way is that the far-infrared emissivity of an aluminum oxide film alone may be too low.
なお、遠赤外線塗料としては特に限定はないが、たとえ
ば、従来より公知の炭素・グラファイト、酸化物セラミ
ック、炭化物セラミックなどを有機物（たとえば、有機
溶媒）、水、酸性あるいは塩基性の溶剤などに熔解また
は分散させて用いられる。塗布方法は特に限定はない。There are no particular limitations on the far-infrared paint, but for example, conventionally known carbon/graphite, oxide ceramics, carbide ceramics, etc. can be dissolved in an organic substance (for example, an organic solvent), water, or an acidic or basic solvent. Or used in dispersed form. The coating method is not particularly limited.
この発明の製造方法により得られた遠赤外線放射体は、
たとえば、その内部の金属に通電して加熱することによ
り遠赤外線を放射したり、あるいは、燃焼等による外部
からの熱によって加熱することにより遠赤外線を放射し
たりするようになっている。The far-infrared radiator obtained by the manufacturing method of this invention is
For example, far-infrared rays can be emitted by heating the metal inside the metal by energizing it, or far-infrared rays can be emitted by heating it with external heat such as combustion.
合金成分の中で、Ｃｒは表面に緻密で均一な酸化アルミ
ニウム被膜を形成させるために必要な元素であり、濃度
が低いとそのような効果が充分ではなく、また、あまり
濃度を高くしても効果が一定以上に良好とならず、素材
コストを高くするので、１５〜３０％が適当である。Ｎ
ｉは、素材の強度・耐食性を向上させるためのものであ
り、必ずしも用いなくてもよいが、用いる場合には濃度
が高すぎると、酸化アルミニウムが析出しないために、
０〜１０％が適当である。Ａ６は、酸化アルミニウムを
析出するために必須な元素であり、濃度が低すぎると、
酸化アルくニウムの析出が不充分となり、逆に濃度が高
すぎると、母材の加工性が低下するので、２６％が適当
である。Among the alloy components, Cr is an element necessary to form a dense and uniform aluminum oxide film on the surface.If the concentration is low, this effect will not be sufficient, and if the concentration is too high, Since the effect is not good beyond a certain level and the material cost increases, a range of 15 to 30% is appropriate. N
i is for improving the strength and corrosion resistance of the material, and does not necessarily need to be used, but if it is used, if the concentration is too high, aluminum oxide will not precipitate.
0 to 10% is appropriate. A6 is an essential element for precipitating aluminum oxide, and if the concentration is too low,
26% is appropriate because the precipitation of aluminum oxide will be insufficient and if the concentration is too high, the workability of the base material will deteriorate.
Ｔｉ、Ｚｒ、Ｙ％ Ｈｆ、Ｃｅ、Ｌａ、ＮｄおよびＧｄ
のうちのいずれか１種または２種以上は微量添加で、酸
化アルミニウム被膜の脆さが改善されるだけでなく、被
膜が母材に根が生えたように戒長し母材との密着性が大
幅に改善される効果がある。これらの元素は、あまり濃
度が高いと、母材の加工性を悪くしたり、また、素材コ
ストが高くなるために、０．０５〜１．０％が適当であ
る。Ti, Zr, Y% Hf, Ce, La, Nd and Gd
When one or more of these are added in small amounts, it not only improves the brittleness of the aluminum oxide film, but also improves the adhesion of the film to the base material by making it look like it has roots in the base material. This has the effect of significantly improving the If the concentration of these elements is too high, the workability of the base material will be impaired and the cost of the material will increase, so 0.05 to 1.0% is appropriate.
第１図は、この発明の遠赤外線放射体の製造方法の１実
施例である。第１図にみるように、上記特定の組成を持
つ合金２を線材に加工し、上記時定の温度範囲内に加熱
して合金表面に酸化アルミニウム１を析出させる。合金
が上記微量添加元素を含んでいると、合金２と酸化アル
ミニウム１との界面は、たとえば、第３図にみるように
なっている。得られた遠赤外線放射体１ｏに、たとえば
、交流電圧を印加して加熱し、遠赤外線を放射させるの
である。FIG. 1 shows an embodiment of the method for manufacturing a far-infrared radiator of the present invention. As shown in FIG. 1, the alloy 2 having the above-described specific composition is processed into a wire rod and heated within the above-determined temperature range to precipitate aluminum oxide 1 on the alloy surface. When the alloy contains the above trace additive elements, the interface between alloy 2 and aluminum oxide 1 is as shown in FIG. 3, for example. For example, an AC voltage is applied to the obtained far-infrared radiator 1o to heat it and cause it to emit far-infrared rays.
第２図は、この発明の遠赤外線放射体の製造方法の別の
１実施例である。第２図にみるように、上記のようにし
て合金２表面に酸化アルミニウム１を析出させた後、そ
の表面に遠赤外線塗料を塗布し、遠赤外線塗膜４を形成
する。これにより得られた遠赤外線放射体１２に、たと
えば、上記と同様に交流電圧を印加すると、より高い放
射率で遠赤外線を放射することができる。FIG. 2 shows another embodiment of the method for manufacturing a far-infrared radiator of the present invention. As shown in FIG. 2, after aluminum oxide 1 is deposited on the surface of alloy 2 as described above, far-infrared paint is applied to the surface to form far-infrared coating film 4. For example, when an alternating current voltage is applied to the far-infrared radiator 12 thus obtained in the same manner as described above, far-infrared rays can be emitted with a higher emissivity.
以下に、この発明の具体的な実施例および比較例を示す
が、この発明は下記実施例に限定されない。Specific examples and comparative examples of the present invention are shown below, but the present invention is not limited to the following examples.
実施例１−
合金組成がＣｒ１８％、Ｎｉ６％、Ａ ７！４．５％、
残部が実質的にＦｅからなる合金を溶解し、直径０．５
ｔｈ、長さ１０ｍの線材に加工した。これを大気中で
１２００“ｃ、４時間加熱することにより、表面に厚み
１０μｌの酸化アルミニウムを析出させて、遠赤外線放
射体を得た。Example 1 - Alloy composition: Cr 18%, Ni 6%, A 7!4.5%,
The alloy, the remainder of which consists essentially of Fe, is melted to form a diameter of 0.5
It was processed into a wire rod with a length of 10 m. By heating this in the air at 1200"C for 4 hours, aluminum oxide with a thickness of 10 μl was deposited on the surface, thereby obtaining a far-infrared radiator.
得られた遠赤外線放射体に、交流１００Ｖの電圧を印加
することで、出力３００Ｗの遠赤外線発生ヒータとして
用いることができた。By applying a voltage of AC 100V to the obtained far-infrared radiator, it was possible to use it as a far-infrared ray generating heater with an output of 300W.
実施例２−
合金組成がＣｒ１７％、Ｎｉ６％、Ａ ６４．５％、Ｔ
ｉ０．５％、Ｚ ｒ ０．２％、Ｙｏ、１％、Ｈｆ ０
．１％、残部が実質的にＦｅからなる合金を溶解し、直
径０．５鮪、長さ１０ｍの線材に加工した。これを大気
中で１２００℃、４時間加熱することにより、表面に厚
み１０μ厘の酸化アルミニウムを析出させて、遠赤外線
放射体を得た。Example 2 - Alloy composition: 17% Cr, 6% Ni, 64.5% A, T
i0.5%, Zr 0.2%, Yo, 1%, Hf 0
．． An alloy consisting of 1% iron and the remainder substantially Fe was melted and processed into a wire rod with a diameter of 0.5 m and a length of 10 m. By heating this in the atmosphere at 1200° C. for 4 hours, aluminum oxide with a thickness of 10 μm was deposited on the surface, thereby obtaining a far-infrared radiator.
得られた遠赤外線放射体に、交流１００Ｖの電圧を印加
することで、出力３００Ｗの遠赤外線発生し−タとして
用いることができた。By applying a voltage of AC 100 V to the obtained far-infrared radiator, it was possible to use it as a far-infrared ray generator with an output of 300 W.
この実施例２で用いた合金は、実施例１で用いた合金よ
りもＴｉ等の金属が添加されているために高価になって
いるが、強度・耐食性で向上が見られた。Although the alloy used in Example 2 is more expensive than the alloy used in Example 1 because of the addition of metals such as Ti, improvements were seen in strength and corrosion resistance.
一実施例３
実施例１と同様にして合金表面に厚み３μ貫の酸化アル
ミニウムを析出させたものに、市販のＳｉＯ□系遠赤外
線塗料をイソプロピルアルコールで希釈したものを塗布
し、大気中で１５０℃、３０分間保持して乾燥させるこ
とにより遠赤外線塗膜（厚み０．０２ｍｍ）を形成し、
遠赤外線放射体を得た。Example 3 A commercially available SiO ℃ for 30 minutes to form a far-infrared coating film (thickness 0.02 mm).
A far-infrared radiator was obtained.
この遠赤外線放射体に通電したところ、遠赤外線発生ヒ
ータとして使用できた。When this far-infrared radiator was energized, it could be used as a far-infrared ray-generating heater.
一実施例４一
実施例２と同様にして合金表面に厚み３μ璽の酸化アル
ミニウムを析出させたものに、市販のＳｉＯ２系遠赤外
線塗料をイソプロピルアルコールで希釈したものを塗布
し、大気中で１５０℃、３０分間保持して乾燥させるこ
とにより遠赤外線塗膜（厚み０．０２ｍ）を形成し、遠
赤外線放射体を得た。Example 4 Aluminum oxide with a thickness of 3 μm was deposited on the alloy surface in the same manner as in Example 2, and a commercially available SiO2-based far-infrared paint diluted with isopropyl alcohol was applied to the alloy surface for 150 µm in the air. C. and dried for 30 minutes to form a far-infrared coating film (thickness: 0.02 m) to obtain a far-infrared radiator.
この遠赤外線放射体に通電したところ、遠赤外線発生ヒ
ータとして使用できた。When this far-infrared radiator was energized, it could be used as a far-infrared ray-generating heater.
一比較例１一
実施例１で用いたのと同じ組成・形状の合金にプラズマ
溶射法で厚み５０Ｉ１ｍの酸化アルミニウム膜をコーテ
ィングして遠赤外線放射体を得た。Comparative Example 1 An alloy having the same composition and shape as used in Example 1 was coated with an aluminum oxide film having a thickness of 50I1m by plasma spraying to obtain a far-infrared radiator.
−比較例２
実施例２で用いたのと同じ組成・形状の合金にプラズマ
溶射法で厚み５０ｐｍの酸化アルミニウム膜をコーティ
ングして遠赤外線放射体を得た。- Comparative Example 2 An alloy having the same composition and shape as used in Example 2 was coated with an aluminum oxide film having a thickness of 50 pm by plasma spraying to obtain a far-infrared radiator.
実施例１〜４および比較例１．２の各遠赤外線放射体の
酸化アルミニウム膜の密着性（実施例３４の場合は、遠
赤外線塗膜の密着性）を調べた。すなわち、７００℃に
大気中で加熱後空冷するという操作を１０００回繰り返
した後、膜の剥離状況について、目視で判断し、○：剥
離・亀裂を認めず、△：亀裂が一部発生、×：亀裂・剥
離発生で評価した。また、前記熱サイクル後の被膜の遠
赤外全放射率を波長２〜２０．ｎについて調べた３
２
゜結果を第１表に示した。The adhesion of the aluminum oxide film of each far-infrared radiator of Examples 1 to 4 and Comparative Example 1.2 (in the case of Example 34, the adhesion of the far-infrared coating film) was investigated. That is, after repeating the operation of heating to 700°C in the air and cooling in the air 1000 times, the peeling status of the film was visually judged. ○: No peeling or cracking was observed, △: Some cracks occurred, × :Evaluated based on occurrence of cracks and peeling. Further, the total far-infrared emissivity of the coating after the thermal cycle was measured at wavelengths of 2 to 20. Table 1 shows the 32° results for n.
第 １
表
第１表にみるように、実施例のものは、比較例のものに
比べて、密着性が良かった。また、遠赤外線塗膜を形成
したものは、より遠赤外線放射率が高かった。Table 1 As shown in Table 1, the adhesiveness of the examples was better than that of the comparative examples. Furthermore, those with a far-infrared coating film had higher far-infrared emissivity.
請求項１および２の各発明にかかる遠赤外線放射体の製
造方法は、上述したような特定の組成を持つ合金を酸化
雰囲気中で５ｏｏ℃以上、１３００℃以下の温度に加熱
することにより、前記合金の表面に酸化アルミニウムを
析出させるようにし４
ているので、この方法によれば、効率が良い遠赤外線放
射体を優れた生産性で供給することが可能である。The method for manufacturing a far-infrared radiator according to each of the inventions of claims 1 and 2 includes heating an alloy having a specific composition as described above to a temperature of 500°C or more and 1300°C or less in an oxidizing atmosphere. Since aluminum oxide is precipitated on the surface of the alloy, this method makes it possible to supply highly efficient far-infrared radiators with excellent productivity.
請求項１および２の各発明にかかる遠赤外線放射体の製
造方法において、酸化アルくニウム膜の表面上に遠赤外
線塗料を塗布するようにすると、遠赤外放射率をより高
くすることができる。In the method for producing a far-infrared radiator according to each of the inventions of claims 1 and 2, by applying a far-infrared paint on the surface of the aluminum oxide film, the far-infrared emissivity can be further increased. .
【図面の簡単な説明】
第１図は、この発明の遠赤外線放射体の製造方法のｌ実
施例の模式的な工程図、第２図は、その別の１実施例の
模式的な工程図、第３図は、請求項２の発明の方法によ
り析出させた酸化アルミニウム被膜の状態を模式的に表
す拡大図、第４図は、従来の方法により形成させた酸化
アルミニウム被膜の状態を模式的に表す拡大図である。[BRIEF DESCRIPTION OF THE DRAWINGS] FIG. 1 is a schematic process diagram of one embodiment of the method for producing a far-infrared radiator of the present invention, and FIG. 2 is a schematic process diagram of another embodiment thereof. , FIG. 3 is an enlarged view schematically showing the state of the aluminum oxide film deposited by the method of the invention of claim 2, and FIG. 4 is a schematic diagram showing the state of the aluminum oxide film deposited by the conventional method. This is an enlarged view shown in FIG.
Claims (1)
１０％、Ａｌ：２〜６％、残部が実質的にＦｅからなる
合金を酸化雰囲気中で５００℃以上、１３００℃以下の
温度に加熱することにより、前記合金の表面に酸化アル
ミニウムを析出させる遠赤外線放射体の製造方法。 ２ 組成が重量％で、Ｃｒ：１５〜３０％、Ｎｉ：０〜
１０％、Ａｌ：２〜６％、Ｔｉ・Ｚｒ・Ｙ・Ｈｆ・Ｃｅ
・Ｌａ・Ｎｄ・Ｇｄのうちのいずれか１種または２種以
上：０．０５〜１．０％、残部が実質的にＦｅからなる
合金を酸化雰囲気中で５００℃以上、１３００℃以下の
温度に加熱することにより、前記合金の表面に酸化アル
ミニウムを析出させる遠赤外線放射体の製造方法。 ３ 請求項１または２記載の遠赤外線放射体の製造方法
において、酸化アルミニウムを析出させた合金の表面上
に遠赤外線塗料を塗布する遠赤外線放射体の製造方法。[Claims] 1 Composition in weight%, Cr: 15-30%, Ni: 0-30%
Aluminum oxide is precipitated on the surface of the alloy by heating an alloy consisting of 10% Al, 2 to 6% Al, and the balance substantially Fe to a temperature of 500°C or higher and 1300°C or lower in an oxidizing atmosphere. A method for manufacturing an infrared emitter. 2 Composition is in weight%, Cr: 15-30%, Ni: 0-30%
10%, Al: 2-6%, Ti・Zr・Y・Hf・Ce
・Any one or more of La, Nd, and Gd: 0.05 to 1.0%, the balance being an alloy consisting essentially of Fe in an oxidizing atmosphere at a temperature of 500°C or more and 1300°C or less A method for producing a far-infrared radiator, which comprises heating the alloy to precipitate aluminum oxide on the surface of the alloy. 3. The method for producing a far-infrared ray radiator according to claim 1 or 2, wherein a far-infrared ray paint is applied on the surface of the alloy on which aluminum oxide is precipitated.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22218789A JPH0384392A (en) | 1989-08-28 | 1989-08-28 | Production of far infrared ray radiator |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22218789A JPH0384392A (en) | 1989-08-28 | 1989-08-28 | Production of far infrared ray radiator |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0384392A true JPH0384392A (en) | 1991-04-09 |
Family
ID=16778522
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP22218789A Pending JPH0384392A (en) | 1989-08-28 | 1989-08-28 | Production of far infrared ray radiator |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0384392A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6127654A (en) * | 1997-08-01 | 2000-10-03 | Alkron Manufacturing Corporation | Method for manufacturing heating element |
-
1989
- 1989-08-28 JP JP22218789A patent/JPH0384392A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6127654A (en) * | 1997-08-01 | 2000-10-03 | Alkron Manufacturing Corporation | Method for manufacturing heating element |
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