JPH037899B2 - - Google Patents

Info

Publication number
JPH037899B2
JPH037899B2 JP59079307A JP7930784A JPH037899B2 JP H037899 B2 JPH037899 B2 JP H037899B2 JP 59079307 A JP59079307 A JP 59079307A JP 7930784 A JP7930784 A JP 7930784A JP H037899 B2 JPH037899 B2 JP H037899B2
Authority
JP
Japan
Prior art keywords
crater
measured values
sputter
summed
ion beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59079307A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6079253A (ja
Inventor
Fuon Kuriigerun Rorufu
Fuatsuekasu Peetaa
Fuotsutonaa Yohanesu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siemens AG
Original Assignee
Siemens AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens AG filed Critical Siemens AG
Publication of JPS6079253A publication Critical patent/JPS6079253A/ja
Publication of JPH037899B2 publication Critical patent/JPH037899B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/02—Details
    • H01J49/10—Ion sources; Ion guns
    • H01J49/14—Ion sources; Ion guns using particle bombardment, e.g. ionisation chambers
    • H01J49/142—Ion sources; Ion guns using particle bombardment, e.g. ionisation chambers using a solid target which is not previously vapourised
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/225—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/252—Tubes for spot-analysing by electron or ion beams; Microanalysers
    • H01J37/256—Tubes for spot-analysing by electron or ion beams; Microanalysers using scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/0004—Imaging particle spectrometry
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/0027—Methods for using particle spectrometers
    • H01J49/0036—Step by step routines describing the handling of the data generated during a measurement
JP59079307A 1983-09-30 1984-04-19 スパツタ・クレ−タからの測定デ−タの記憶方法および装置 Granted JPS6079253A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE3335625.4 1983-09-30
DE19833335625 DE3335625A1 (de) 1983-09-30 1983-09-30 Verfahren und vorrichtung zur speicherung der messdaten aus teilbereichen eines sputterkraters, der in einem sekundaerionen-massenspektrometer erzeugt und analysiert wird

Publications (2)

Publication Number Publication Date
JPS6079253A JPS6079253A (ja) 1985-05-07
JPH037899B2 true JPH037899B2 (fr) 1991-02-04

Family

ID=6210644

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59079307A Granted JPS6079253A (ja) 1983-09-30 1984-04-19 スパツタ・クレ−タからの測定デ−タの記憶方法および装置

Country Status (5)

Country Link
US (1) US4860225A (fr)
EP (1) EP0143146B1 (fr)
JP (1) JPS6079253A (fr)
AT (1) ATE61156T1 (fr)
DE (2) DE3335625A1 (fr)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3636506A1 (de) * 1986-10-27 1988-04-28 Atomika Tech Physik Gmbh Spiralabtastverfahren
ES2060620T3 (es) * 1987-06-04 1994-12-01 Ciba Geigy Ag Microparticulas de polimero estrella estables a la luz.
EP0350815B1 (fr) * 1988-07-14 1993-10-20 Siemens Aktiengesellschaft Procédé pour opérer un spectromètre de masse à ions secondaires

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54143290A (en) * 1978-04-28 1979-11-08 Toshiba Corp Soldered part inspecting device

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5034439B1 (fr) * 1969-05-16 1975-11-08
DE1952283C3 (de) * 1969-10-17 1974-01-03 Siemens Ag, 1000 Berlin U. 8000 Muenchen Einrichtung zur Bestimmung und Registrierung des Anteils und der Verteilung von digital anfallenden Meßwerten
JPS5221909B2 (fr) * 1972-03-17 1977-06-14
JPS532599B2 (fr) * 1972-10-30 1978-01-30
US3916191A (en) * 1974-03-01 1975-10-28 Minnesota Mining & Mfg Imaging apparatus and method for use with ion scattering spectrometer
US4147928A (en) * 1977-05-02 1979-04-03 Xerox Corporation Scanning array configuration
DE2731129C3 (de) * 1977-07-09 1982-08-12 Finnigan MAT GmbH, 2800 Bremen Verfahren zum Betrieb eines der Registrierung eines Licht-, Ionen- oder Elektronenspektrums dienenden Spektrometers
US4132898A (en) * 1977-11-01 1979-01-02 Fujitsu Limited Overlapping boundary electron exposure system method and apparatus
JPS55146931A (en) * 1979-05-04 1980-11-15 Hitachi Ltd Depicting method by electronic beam
DE3041219C2 (de) * 1980-11-03 1983-11-03 Bruker Analytische Meßtechnik GmbH, 7512 Rheinstetten Vorrichtung zur Speicherung von Meßdaten
JPS57179728A (en) * 1981-04-30 1982-11-05 Toa Medical Electronics Co Ltd Apparatus for analyzing particle
US4540884A (en) * 1982-12-29 1985-09-10 Finnigan Corporation Method of mass analyzing a sample by use of a quadrupole ion trap

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54143290A (en) * 1978-04-28 1979-11-08 Toshiba Corp Soldered part inspecting device

Also Published As

Publication number Publication date
EP0143146B1 (fr) 1991-02-27
ATE61156T1 (de) 1991-03-15
EP0143146A1 (fr) 1985-06-05
JPS6079253A (ja) 1985-05-07
DE3335625A1 (de) 1985-04-11
US4860225A (en) 1989-08-22
DE3484172D1 (de) 1991-04-04

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