JPH0377651B2 - - Google Patents
Info
- Publication number
- JPH0377651B2 JPH0377651B2 JP10984083A JP10984083A JPH0377651B2 JP H0377651 B2 JPH0377651 B2 JP H0377651B2 JP 10984083 A JP10984083 A JP 10984083A JP 10984083 A JP10984083 A JP 10984083A JP H0377651 B2 JPH0377651 B2 JP H0377651B2
- Authority
- JP
- Japan
- Prior art keywords
- aluminum foil
- cathode material
- conductive metal
- sec
- aluminum
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 229910052782 aluminium Inorganic materials 0.000 claims description 39
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 38
- 239000011888 foil Substances 0.000 claims description 34
- 239000010406 cathode material Substances 0.000 claims description 18
- 229910052751 metal Inorganic materials 0.000 claims description 17
- 239000002184 metal Substances 0.000 claims description 17
- 230000008020 evaporation Effects 0.000 claims description 10
- 238000001704 evaporation Methods 0.000 claims description 10
- 239000003990 capacitor Substances 0.000 claims description 8
- 238000000151 deposition Methods 0.000 claims description 6
- 238000004519 manufacturing process Methods 0.000 claims description 6
- 239000011261 inert gas Substances 0.000 claims description 5
- 238000007740 vapor deposition Methods 0.000 claims description 5
- 230000008021 deposition Effects 0.000 claims description 3
- 238000000034 method Methods 0.000 description 11
- 238000005530 etching Methods 0.000 description 9
- 230000001965 increasing effect Effects 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 229910052718 tin Inorganic materials 0.000 description 4
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000007733 ion plating Methods 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 239000002699 waste material Substances 0.000 description 2
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 229910052745 lead Inorganic materials 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- WYXIGTJNYDDFFH-UHFFFAOYSA-Q triazanium;borate Chemical compound [NH4+].[NH4+].[NH4+].[O-]B([O-])[O-] WYXIGTJNYDDFFH-UHFFFAOYSA-Q 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
- Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
- Electrolytic Production Of Metals (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10984083A JPS601826A (ja) | 1983-06-17 | 1983-06-17 | 電解コンデンサ用陰極材料 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10984083A JPS601826A (ja) | 1983-06-17 | 1983-06-17 | 電解コンデンサ用陰極材料 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS601826A JPS601826A (ja) | 1985-01-08 |
| JPH0377651B2 true JPH0377651B2 (enrdf_load_stackoverflow) | 1991-12-11 |
Family
ID=14520530
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10984083A Granted JPS601826A (ja) | 1983-06-17 | 1983-06-17 | 電解コンデンサ用陰極材料 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS601826A (enrdf_load_stackoverflow) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61180420A (ja) * | 1985-02-05 | 1986-08-13 | 昭和アルミニウム株式会社 | 電解コンデンサ用陰極材料 |
| WO2001020625A1 (en) | 1999-09-10 | 2001-03-22 | Matsushita Electric Industrial Co., Ltd. | Solid electrolytic capacitor and production method thereof, and conductive polymer polymerizing oxidizing agent solution |
-
1983
- 1983-06-17 JP JP10984083A patent/JPS601826A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS601826A (ja) | 1985-01-08 |
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