JPH0377569B2 - - Google Patents
Info
- Publication number
- JPH0377569B2 JPH0377569B2 JP30285286A JP30285286A JPH0377569B2 JP H0377569 B2 JPH0377569 B2 JP H0377569B2 JP 30285286 A JP30285286 A JP 30285286A JP 30285286 A JP30285286 A JP 30285286A JP H0377569 B2 JPH0377569 B2 JP H0377569B2
- Authority
- JP
- Japan
- Prior art keywords
- film
- main pole
- thin film
- etching
- ferrite
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000010408 film Substances 0.000 claims description 35
- 238000005530 etching Methods 0.000 claims description 19
- 239000010409 thin film Substances 0.000 claims description 19
- 239000000758 substrate Substances 0.000 claims description 11
- 238000004519 manufacturing process Methods 0.000 claims description 10
- 239000002253 acid Substances 0.000 claims description 6
- 238000000034 method Methods 0.000 claims description 6
- 239000000463 material Substances 0.000 claims description 3
- 230000002378 acidificating effect Effects 0.000 claims description 2
- 239000000126 substance Substances 0.000 claims description 2
- 229910020641 Co Zr Inorganic materials 0.000 claims 1
- 229910020520 Co—Zr Inorganic materials 0.000 claims 1
- 229910000859 α-Fe Inorganic materials 0.000 description 17
- 239000000919 ceramic Substances 0.000 description 12
- 239000002131 composite material Substances 0.000 description 10
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 5
- 229910004298 SiO 2 Inorganic materials 0.000 description 5
- 239000011521 glass Substances 0.000 description 5
- 239000000696 magnetic material Substances 0.000 description 4
- 229920002120 photoresistant polymer Polymers 0.000 description 4
- 238000004804 winding Methods 0.000 description 4
- 238000004544 sputter deposition Methods 0.000 description 3
- 239000012790 adhesive layer Substances 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000007733 ion plating Methods 0.000 description 2
- 238000005498 polishing Methods 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- -1 hydrochloric acid Chemical class 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 230000003014 reinforcing effect Effects 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/1278—Structure or manufacture of heads, e.g. inductive specially adapted for magnetisations perpendicular to the surface of the record carrier
Landscapes
- Magnetic Heads (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、垂直磁気記録用ヘツドの製造方法に
関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a method of manufacturing a perpendicular magnetic recording head.
垂直磁気記録用ヘツドとしての主磁極膜の特性
は、おもにガラス基板ならびに結晶化ガラス基板
上で測定されている。しかし実際にヘツドとして
使用する場合には、ヘツド構造に合わせた基板上
に主磁極膜を形成する必要がある。現在考えられ
ている基板としてはフエライトとセラミツクの複
合物があげられる。そのヘツドの構造ならびに作
成工程について詳しく説明する。
The characteristics of the main pole film used as a perpendicular magnetic recording head are mainly measured on glass substrates and crystallized glass substrates. However, when actually used as a head, it is necessary to form a main pole film on a substrate that matches the head structure. The substrate currently being considered is a composite of ferrite and ceramic. The structure and manufacturing process of the head will be explained in detail.
垂直記録方式によるヘツドの構造を第１図およ
び第２図に示す。主磁極膜１はCo−Zr−Nbの薄
膜よりなる。この主磁極膜１は、非磁性材である
セラミツク２と磁性材であるフエライト３上にス
パツタ、蒸着、イオンプレーテイング等で形成さ
れ、もう一方のセラミツク２′およびフエライト
３′に接着されて保持されている。ここでセラミ
ツク２，２′はスライダー部として媒体に接触す
るためにＲ研磨もしくは球面研磨が施こされてい
る。またフエライト３，３′には巻線溝部４，
４′が形成されている。これらの巻線溝部４，
４′にはさまれている部分７，７′が補助磁極とし
てはたらき、またその外側の部分８，８′がリタ
ーンパス部としてはたらくことになる。 The structure of a perpendicular recording head is shown in FIGS. 1 and 2. The main pole film 1 is made of a Co--Zr--Nb thin film. This main pole film 1 is formed by sputtering, vapor deposition, ion plating, etc. on ceramic 2, which is a non-magnetic material, and ferrite 3, which is a magnetic material, and is adhered and held by the other ceramic 2' and ferrite 3'. has been done. Here, the ceramics 2, 2' are R-polished or spherically polished in order to contact the medium as a slider portion. In addition, the ferrite 3, 3' has a winding groove 4,
4' is formed. These winding grooves 4,
The portions 7, 7' sandwiched between the magnetic poles 4' serve as auxiliary magnetic poles, and the outer portions 8, 8' serve as return path sections.
次にこのヘツドの作成工程について詳細に説明
する。第３図において、所望の大きさのセラミツ
ク２の片面（下面）を鏡面研磨する。一方、所望
の大きさのフエライト３には巻線溝部４の加工を
施こしかつ片面（上面）を鏡面研磨する。次に第
４図に示すように、セラミツク２とフエライト３
とを、ガラスあるいは結晶化ガラスもしくは樹脂
等の接着層９を介して接着する。次工程として、
第５図に示すように主磁極膜を形成する面１０の
鏡面研磨を行う。すなわち面１０は、セラミツク
２、フエライト３、接着層９の複合物（基板）１
４の面である。次に第６図に示すように、主磁極
膜１となるCo−Zr−Nbの薄膜をスパツタもしく
は蒸着イオンプレーテイング等で所望の薄膜に形
成する。さらに第７図を参照して、主磁極膜１が
所望の形状トラツク寸法になるように、フオトエ
ツチングを利用しマスクパタンを形成し主磁極膜
１を塩酸等の強酸でエツチングを行う。次に第８
図を参照して、主磁極膜が形成されていない複合
物（基板）１４′と主磁極膜がが形成された複合
物１４とを樹脂ましくはガラス等で接着する。 Next, the manufacturing process of this head will be explained in detail. In FIG. 3, one side (lower surface) of a ceramic 2 of a desired size is mirror polished. On the other hand, a winding groove 4 is formed on a ferrite 3 having a desired size, and one side (upper surface) is mirror polished. Next, as shown in Fig. 4, ceramic 2 and ferrite 3
are bonded together via an adhesive layer 9 made of glass, crystallized glass, resin, or the like. As the next step,
As shown in FIG. 5, the surface 10 on which the main pole film will be formed is mirror-polished. That is, the surface 10 is a composite (substrate) 1 of ceramic 2, ferrite 3, and adhesive layer 9.
This is the fourth aspect. Next, as shown in FIG. 6, a thin film of Co--Zr--Nb, which will become the main pole film 1, is formed into a desired thin film by sputtering, evaporation ion plating, or the like. Further, referring to FIG. 7, a mask pattern is formed using photoetching, and the main pole film 1 is etched with a strong acid such as hydrochloric acid so that the main pole film 1 has a desired shape and track size. Then the 8th
Referring to the figure, a composite (substrate) 14' on which no main pole film is formed and a composite 14 on which a main pole film is formed are bonded together with resin, glass, or the like.
次にセラミツク２，２′をＲ研磨もしくは球面
研磨を行い、第９図の破線１１に沿つて切断する
ことにより、ヘツドコアチツプとする。尚、Ｒ研
磨もしくは球面研磨は、コアチツプの段階でな
く、両側をスライダーではさみ込んでから、すな
わちヘツド形状にしてからも可能である。 Next, the ceramics 2, 2' are R-polished or spherically polished and cut along the broken line 11 in FIG. 9 to form a head core chip. Incidentally, R polishing or spherical polishing can also be performed not at the core chip stage but after sandwiching both sides with sliders, that is, after forming the head shape.
上記の工程を経て垂直ヘツドを作成する。その
場合、第７図に示した主磁極膜１のパターニング
はフエライト、セラミツク、接着層の複合物１４
に行なわれるということに起因して次の問題が発
生している。
A vertical head is created through the above steps. In that case, the patterning of the main pole film 1 shown in FIG.
The following problems arise due to the fact that
フエライトの腐食、すなわちフエライトの鏡
面部のエツチングが発生する。 Corrosion of the ferrite, that is, etching of the mirror surface of the ferrite occurs.
Co−Zr−Nb薄膜のエツチング速度がフエラ
イト上とセラミツク上とで違うため、フエライ
ト部分のエツチング速度に合わせたエツチング
を行うとセラミツク部分にCo−Zr−Nb薄膜の
エツチ残が発生し、またセラミツク部分のエツ
チング速度に合わせたエツチングを行うとフエ
ライト部分のCo−Zr−Nb薄膜がアンダーカツ
ト（サイドエツチング）され、主磁極膜１のパ
ターンが細くなつてしまうという問題点が発生
した。 Since the etching speed of the Co-Zr-Nb thin film is different between the ferrite and ceramic parts, if etching is performed to match the etching speed of the ferrite part, etching residue of the Co-Zr-Nb thin film will be generated on the ceramic part, and the ceramic part will be etched. When etching is performed in accordance with the etching speed of the parts, the Co--Zr--Nb thin film in the ferrite part is undercut (side etched), resulting in a problem that the pattern of the main pole film 1 becomes thinner.
このように、垂直磁気ヘツドでは主磁極膜
（Co−Zr−Nb薄膜）の特性が非常に重要になる。
とりわけ主磁極の形状やトラツク巾の寸法等がミ
クロンオーダーでの制御を必要とするのに対し、
フオトレジストのマスクパターンを上記ミクロン
オーダーで制御したとしても、次工程、すなわ
ち、主磁極膜（Co−Zr−Nb薄膜）のエツチング
において、複合物上の主磁極膜（Co−Zr−Nb薄
膜）のエツチング速度が部分的に違うことから、
パターンの細りあるいはエツチ残等が生じるた
め、所望の形状ならびに所望のパタン巾が得られ
ないという問題点がある。また補強磁極となるフ
エライト部分が塩酸等の強酸でエツチングされて
しまうため信頼性の上でも問題がある。 In this way, the characteristics of the main pole film (Co--Zr--Nb thin film) are very important in a perpendicular magnetic head.
In particular, the shape of the main pole and the dimensions of the track width require control on the micron order.
Even if the mask pattern of the photoresist is controlled to the above-mentioned micron order, in the next process, that is, etching the main pole film (Co-Zr-Nb thin film), the main pole film (Co-Zr-Nb thin film) on the composite material will be removed. Because the etching speed of
There is a problem that the desired shape and desired pattern width cannot be obtained because the pattern becomes thinner or etching remains. Furthermore, since the ferrite portion that becomes the reinforcing magnetic pole is etched by strong acids such as hydrochloric acid, there is also a problem in terms of reliability.
それ故に本発明の技術的課題は、主磁極膜を所
望の形状トラツク巾に形成できる磁気ヘツドの製
造方法を提供することにある。 Therefore, a technical object of the present invention is to provide a method for manufacturing a magnetic head in which the main pole film can be formed into a desired shape and track width.
本発明によれば、２以上の異なる材質からなる
基板とCo−Zr−Nbの薄膜よりなる主磁極膜とを
有する垂直磁気記録用ヘツドの製造方法におい
て、上記基板上に耐酸性にすぐれた非磁性薄膜を
形成し、その上にCo−Zr−Nbの薄膜を形成し、
酸性の薬品で所用に形状にエツチングして上記主
磁極膜を形成することを特徴とする垂直磁気ヘツ
ドの製造方法が得られる。
According to the present invention, in the method of manufacturing a perpendicular magnetic recording head having a substrate made of two or more different materials and a main pole film made of a thin film of Co-Zr-Nb, a Form a magnetic thin film, form a Co-Zr-Nb thin film on top of it,
There is obtained a method for manufacturing a perpendicular magnetic head, characterized in that the main pole film is formed by etching into a desired shape using an acidic chemical.
これによると、複合物基板でありながら、見か
け上単一基板上でエツチングが行なわれることに
なるため、エツチング速度に違いは見られなく、
またこの耐酸性にすぐれた非磁性層がエツチング
時に保護膜となり、補助磁極となるフエライトの
エツチングをおさえることになる。 According to this, even though it is a composite substrate, etching is apparently performed on a single substrate, so there is no difference in etching speed.
Furthermore, this non-magnetic layer with excellent acid resistance acts as a protective film during etching, and suppresses etching of the ferrite which becomes the auxiliary magnetic pole.
本発明による実施例を下記に示す。第５図に示
す複合物１４を得るまでの工程は従来と同様であ
る。さらにこの複合物１４の研磨した面１０に、
第１０図に示す如くSiO2等の耐酸性に優れた非
磁性材薄膜１３をスパツタで形成し、その上に第
１１図に示す如くCo−Zr−Nb薄膜よりなる主磁
極膜１を0.3μｍでスパツタを用い形成する。さら
に第１２図に示すようにフオトレジスト膜１２を
全面に塗布する。その次にフオトレジストで、第
１３図に示すように所望の形状（ここでは複合物
すべてにかかる棒状）、トラツク幅（ここでは０、
１mm）に形成する。その後、HCl：H2O2：H2O
＝１：１：８の割合いで調合したエツチング液中
に浸漬して、Co−Zr−Nbの薄膜をエツチングす
る。このとき非磁性材薄膜１３としてSiO2を用
いた場合にはSiO2の膜厚0.05μｍではややSiO2膜
がエツチングで損われ、保護膜の効果がなく0.1μ
ｍ以上で、効果的であり、第１４図に示すよう
に、フエライトの腐食なしに複合物全面にわたり
均一な形状ならびに均一なトラツク幅を得ること
ができた。なお、SiO2膜が0.3μｍを越えると、非
磁性膜厚が主磁極形成膜に比較して厚くなりすぎ
正確なトラツク形成はできるものの他の磁気特性
上望ましくない。よつて耐酸性膜は0.1〜0.3μｍ
が望ましい。
Examples according to the invention are shown below. The steps up to obtaining the composite 14 shown in FIG. 5 are the same as conventional ones. Furthermore, on the polished surface 10 of this composite 14,
As shown in FIG. 10, a thin film 13 of a non-magnetic material such as SiO 2 with excellent acid resistance is formed by sputtering, and then a main pole film 1 made of a thin Co-Zr-Nb film 13 with a thickness of 0.3 μm is formed thereon as shown in FIG. 11. Form using a sputter. Furthermore, as shown in FIG. 12, a photoresist film 12 is applied to the entire surface. Next, with photoresist, as shown in Fig. 13, the desired shape (here, a bar that covers the entire composite), track width (here, 0,
1mm). Then HCl: H2O2 : H2O
The Co--Zr--Nb thin film is etched by immersing it in an etching solution prepared at a ratio of 1:1:8. At this time, when SiO 2 is used as the non-magnetic material thin film 13, the SiO 2 film is slightly damaged by etching when the SiO 2 film thickness is 0.05 μm, and the protective film has no effect and the thickness is 0.1 μm.
m or more, it is effective, and as shown in FIG. 14, it was possible to obtain a uniform shape and uniform track width over the entire surface of the composite without corrosion of the ferrite. It should be noted that if the SiO 2 film exceeds 0.3 μm, the nonmagnetic film will be too thick compared to the main pole forming film, which is undesirable from the viewpoint of other magnetic properties, although accurate track formation is possible. Therefore, the acid-resistant film is 0.1 to 0.3 μm.
is desirable.
以上説明したように、本発明によれば主磁極膜
が所望の寸法にしかもフエライトをエツチングす
ることなく形成された垂直磁気ヘツドの製造方法
を提供できる。
As described above, according to the present invention, it is possible to provide a method for manufacturing a perpendicular magnetic head in which the main pole film is formed to a desired size without etching ferrite.
第１図は垂直磁気ヘツドコアの斜視図、第２図
は第１図のＡ部拡大平面図、第３図〜第９図まで
は従来の垂直磁気ヘツドの製造工程を示す各々斜
視図、第１０図〜第１４図は本発明による垂直磁
気ヘツドの製造工程の要部を示す各々斜視図であ
る。
１：主磁極膜、２，２′：セラミツク、３，
３′：フエライト、４，４′：巻線溝部、１２：フ
オトレジスト膜、１３：非磁性材薄膜。
FIG. 1 is a perspective view of a perpendicular magnetic head core, FIG. 2 is an enlarged plan view of section A in FIG. 1 to 14 are perspective views showing essential parts of the manufacturing process of the perpendicular magnetic head according to the present invention. 1: Main pole film, 2, 2': Ceramic, 3,
3': Ferrite, 4, 4': Winding groove, 12: Photoresist film, 13: Nonmagnetic material thin film.
Claims (1)
−Nbの薄膜よりなる主磁極膜とを有する垂直磁
気記録用ヘツドの製造方法において、上記基板上
に耐酸性にすぐれた非磁性薄膜を形成し、その上
にCo−Zr−Nbの薄膜を形成し、酸性の薬品で所
用の形状にエツチングして上記主磁極膜を形成す
ることを特徴とする垂直磁気ヘツドの製造方法。1 Substrate made of two or more different materials and Co-Zr
- A method for manufacturing a perpendicular magnetic recording head having a main pole film made of a thin Nb film, in which a nonmagnetic thin film with excellent acid resistance is formed on the substrate, and a Co-Zr-Nb thin film is formed on top of the non-magnetic thin film. A method for manufacturing a perpendicular magnetic head, characterized in that the main pole film is formed by etching it into a desired shape using an acidic chemical.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP30285286A JPS63157309A (en) | 1986-12-20 | 1986-12-20 | Production of perpendicular magnetic head |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP30285286A JPS63157309A (en) | 1986-12-20 | 1986-12-20 | Production of perpendicular magnetic head |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63157309A JPS63157309A (en) | 1988-06-30 |
| JPH0377569B2 true JPH0377569B2 (en) | 1991-12-11 |
Family
ID=17913872
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP30285286A Granted JPS63157309A (en) | 1986-12-20 | 1986-12-20 | Production of perpendicular magnetic head |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63157309A (en) |
-
1986
- 1986-12-20 JP JP30285286A patent/JPS63157309A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS63157309A (en) | 1988-06-30 |
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