JPH0376044B2 - - Google Patents
Info
- Publication number
- JPH0376044B2 JPH0376044B2 JP8476982A JP8476982A JPH0376044B2 JP H0376044 B2 JPH0376044 B2 JP H0376044B2 JP 8476982 A JP8476982 A JP 8476982A JP 8476982 A JP8476982 A JP 8476982A JP H0376044 B2 JPH0376044 B2 JP H0376044B2
- Authority
- JP
- Japan
- Prior art keywords
- surface acoustic
- acoustic wave
- mode coupling
- substrate
- coupling section
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000010897 surface acoustic wave method Methods 0.000 claims description 100
- 239000000758 substrate Substances 0.000 claims description 56
- 230000008878 coupling Effects 0.000 claims description 50
- 238000010168 coupling process Methods 0.000 claims description 50
- 238000005859 coupling reaction Methods 0.000 claims description 50
- 238000011156 evaluation Methods 0.000 claims description 17
- 239000000463 material Substances 0.000 claims description 15
- 229910013641 LiNbO 3 Inorganic materials 0.000 claims description 14
- 230000000644 propagated effect Effects 0.000 claims description 4
- 238000005259 measurement Methods 0.000 description 23
- 239000013078 crystal Substances 0.000 description 22
- 238000003780 insertion Methods 0.000 description 11
- 230000037431 insertion Effects 0.000 description 11
- 238000000034 method Methods 0.000 description 9
- 238000006243 chemical reaction Methods 0.000 description 7
- 229910052751 metal Inorganic materials 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- 238000007796 conventional method Methods 0.000 description 5
- 239000011521 glass Substances 0.000 description 5
- 230000001808 coupling effect Effects 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 4
- 238000000206 photolithography Methods 0.000 description 4
- 238000000691 measurement method Methods 0.000 description 3
- 238000002474 experimental method Methods 0.000 description 2
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical compound [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 description 2
- 230000001902 propagating effect Effects 0.000 description 2
- 238000001179 sorption measurement Methods 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000001066 destructive effect Effects 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- GQYHUHYESMUTHG-UHFFFAOYSA-N lithium niobate Chemical compound [Li+].[O-][Nb](=O)=O GQYHUHYESMUTHG-UHFFFAOYSA-N 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000007261 regionalization Effects 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/08—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of resonators or networks using surface acoustic waves
Landscapes
- Physics & Mathematics (AREA)
- Acoustics & Sound (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8476982A JPS58202616A (ja) | 1982-05-21 | 1982-05-21 | 弾性表面波基板の材質評価方法およびその装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8476982A JPS58202616A (ja) | 1982-05-21 | 1982-05-21 | 弾性表面波基板の材質評価方法およびその装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58202616A JPS58202616A (ja) | 1983-11-25 |
| JPH0376044B2 true JPH0376044B2 (enExample) | 1991-12-04 |
Family
ID=13839882
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8476982A Granted JPS58202616A (ja) | 1982-05-21 | 1982-05-21 | 弾性表面波基板の材質評価方法およびその装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58202616A (enExample) |
-
1982
- 1982-05-21 JP JP8476982A patent/JPS58202616A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS58202616A (ja) | 1983-11-25 |
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