JPH0373044B2 - - Google Patents

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Publication number
JPH0373044B2
JPH0373044B2 JP61235147A JP23514786A JPH0373044B2 JP H0373044 B2 JPH0373044 B2 JP H0373044B2 JP 61235147 A JP61235147 A JP 61235147A JP 23514786 A JP23514786 A JP 23514786A JP H0373044 B2 JPH0373044 B2 JP H0373044B2
Authority
JP
Japan
Prior art keywords
tic
substrate material
film magnetic
density
thin film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP61235147A
Other languages
Japanese (ja)
Other versions
JPS6390016A (en
Inventor
Hiroshi Hagya
Yukio Nagayama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokin Corp
Original Assignee
Tokin Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokin Corp filed Critical Tokin Corp
Priority to JP61235147A priority Critical patent/JPS6390016A/en
Publication of JPS6390016A publication Critical patent/JPS6390016A/en
Publication of JPH0373044B2 publication Critical patent/JPH0373044B2/ja
Granted legal-status Critical Current

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  • Magnetic Heads (AREA)
  • Hard Magnetic Materials (AREA)
  • Thin Magnetic Films (AREA)
  • Ceramic Products (AREA)
  • Compositions Of Oxide Ceramics (AREA)

Description

【発明の詳細な説明】[Detailed description of the invention]

〔産業上の利用分野〕 本発明は、コンピユータの周辺装置であるフロ
ツピーデイスク装置やハードデイスク装置に組み
込まれる磁気ヘツドの基板材料で、特に薄膜磁気
ヘツドの非磁性基板材料に関するものである。 〔従来の技術〕 一般にコンピユータ、VTR、又はオーデイオ
関係の磁気ヘツドは、磁性材料であるフエライト
と非磁性材料のセラミツクスをガラスボンデイン
グして構成されている。これに対し薄膜磁気ヘツ
ドの場合には、磁性あるいは非磁性セラミツクス
基板上へセンダスト、パーマロイなどの磁性薄膜
をメツキ、蒸着あるいはスパツタリングして成膜
し作製される。一般的には、薄膜型磁気ヘツドの
基板材料としては、Al2O3−TiCセラミツクスが
用いられているが、この理由として、他材料に比
較し耐摩耗性に優れている事、基板上に成膜され
る磁性膜とのぬれ性が良い事などがあげられる。
近年デジタル磁気記録用ヘツドは、高記録密度化
への技術推移に伴つてより小型化、狭ギヤツプ
化、高信頼性化が要求されてきている。このた
め、薄膜型磁気ヘツドの基板材料としては、高密
度で気孔が少ない事、耐摩耗特性に優れている
事、加工性に優れている事などが要求される。具
体的には、理論密度の99.95%以上の相対密度が
必要であり、耐摩耗性の点ではビツカース硬度で
2500以上の硬度が必要である。ところが一般に薄
膜磁気ヘツドの基板材料として用いられている
Al2O3−TiCセラミツクスはAl2O3とTiCとの間の
ぬれ性が良くない事から焼結性が悪く、残存する
気孔が多い。また加工性も極めて悪く小型化の要
求に対応できない。ところで、現在用いられてい
るAl2O3−TiCセラミツクスの製造方法としては
HIP(熱間静水圧プレス)法を利用したものがあ
げられるが、HIP処理によるち密化の効果を得る
ためには、その前処理として相対密度95%以上の
焼結体を得る事が必要となる。 しかし、Al2O3−TiCセラミツクスは焼結性が
悪いため、1850℃〜1900℃の高温での焼結を行わ
ないと相対密度95%以上のものは得られない。さ
らに、この様な高温にさらされるためAl2O3
TiC粒子の著しい粒成長が起こり機械強度が低下
し、故に加工性の低下も見られ、また高温処理の
ために作業性が悪く、省エネルギーの観点からも
問題があつた。 このため、Al2O3とTiCの主成分に対して副成
分を添加する試みがなされ、例えば、特開昭56−
140068、特開昭57−205372などに開示されてい
る。 本発明は上記のような問題を解決すべく研究し
た結果、焼結促進効果を示す添加物と粒成長抑制
効果を示す添加物とを同時に添加する事により良
好な基板を得る事を可能としたものである。 〔発明の目的〕 本発明は、上記の問題点に鑑みて、焼結性に優
れ、従つて高密度かつ気孔が少なく、耐摩耗性に
優れ、良好な加工特性を示す薄膜磁気ヘツド用基
板材料を提供するものである。 〔発明の概要〕 本発明者は種々の実験を行つた結果、TiC15〜
60wt%、残部Al2O3よりなる主成分100wt%に対
し、La2O3、CeO2、Sm2O3の一種又は二種以上
を1〜10wt%添加する事により、Al2O3とTiCと
の間のぬれ性が向上するため、焼結性が向上し残
存する気孔が少なく相対密度99.95%以上を示し、
かつ耐摩耗性に優れ、さらに粒成長抑制効果を示
す添加物であるCr2O3、TiO2、NiOを1〜5wt%
添加する事で小粒径組織とし加工性に優れた薄膜
磁気ヘツド用基板材料を容易に製造するものであ
る。 以下本発明を実施例に従つて詳細に説明する。 〔実施例〕 平均粒径0.1〜0.2μm、純度99%以上のAl2O3
TiC、La2O3、CeO2、Sm2O3、Cr2O3、TiO2
NiOの各粉末原料を表−1に示す組成比となるよ
うに秤量し、No.1〜No.16の各試料とした。なお
La2O3、CeO2、Sm2O3(添加葡B)の各秤量値お
よびCr2O3、TiO2、NiO(添加物C)の各秤量値
は、すべてAl2O3とTiCを合わせて100wt%とし
た主成分に対する割合である。また試料No.8〜16
は比較のためのものである。 各試料をそれぞれ上述のように秤量後エタノー
ルを溶媒とし、ボールミルにて20〜40時間混合
し、炉過、乾燥後有機系バインダーを添加し、30
mm×30mm×10mmのブロツク体に加圧成形した。さ
らにこれをArガス雰囲気中で1700℃の温度で2
時間の焼結を行つた後、Arガスを圧力媒体とし
て用い、圧力1000Kg/cm2、温度1600℃、保持時間
2時間の条件で熱間静水圧プレス(HIP)処理を
行つた。 以上の工程により得られた各試料よりそれぞれ
5mm×5mm×20mmの角柱を切り出した後、該角柱
の隣接する5mm×20mmの2面をそれぞれ鏡面に加
工し、陵部に生じた2×2μm以上のチツピング数
を1000倍の倍率を有する光学顕微鏡を用いてカウ
ントし、1cm当りのチツピング発生率に換算し、
加工性の評価項目とした。なおチツピングの大き
さをその長さ別に2〜10μm、11〜50μm、51μm
以上に分類した。また、各試料の破断面につい
て、走査型電子顕微鏡を用いて50〜100ケの粒子
の径を測定し、その平均値をもつて各試料の粒径
とした。さらに、機械強度の評価項目として、ビ
ツカース硬度Hv(荷重1Kg)及び抗折強度Fを測
定した。また、アルキメデス法により、各試料の
密度を測定し、理論密度に対する相対密度を計算
した。以上の結果を表−1に示す。
[Industrial Field of Application] The present invention relates to a substrate material for a magnetic head incorporated in a floppy disk device or a hard disk device that is a peripheral device of a computer, and particularly relates to a nonmagnetic substrate material for a thin film magnetic head. [Prior Art] Magnetic heads for computers, VTRs, or audio devices are generally constructed by glass-bonding ferrite, which is a magnetic material, and ceramic, which is a non-magnetic material. On the other hand, in the case of a thin film magnetic head, a magnetic thin film such as sendust or permalloy is formed on a magnetic or non-magnetic ceramic substrate by plating, vapor deposition or sputtering. Generally, Al 2 O 3 -TiC ceramics are used as the substrate material for thin-film magnetic heads.The reasons for this are that they have superior wear resistance compared to other materials, and that Examples include good wettability with the magnetic film being deposited.
In recent years, digital magnetic recording heads have been required to be smaller, have narrower gaps, and have higher reliability as technology advances toward higher recording densities. For this reason, substrate materials for thin-film magnetic heads are required to have high density, few pores, excellent wear resistance, and excellent workability. Specifically, a relative density of 99.95% or more of the theoretical density is required, and in terms of wear resistance, it is necessary to have a relative density of 99.95% or more of the theoretical density.
Hardness of 2500 or higher is required. However, it is generally used as a substrate material for thin-film magnetic heads.
Al 2 O 3 -TiC ceramics has poor sinterability due to poor wettability between Al 2 O 3 and TiC, and has many residual pores. Furthermore, the workability is extremely poor and it cannot meet the demand for miniaturization. By the way, the currently used manufacturing method for Al 2 O 3 −TiC ceramics is
One example uses the HIP (hot isostatic pressing) method, but in order to obtain the densification effect of HIP treatment, it is necessary to obtain a sintered body with a relative density of 95% or more as a pretreatment. Become. However, since Al 2 O 3 -TiC ceramics have poor sinterability, a relative density of 95% or higher cannot be obtained unless sintering is performed at a high temperature of 1850°C to 1900°C. Furthermore, due to exposure to such high temperatures, Al 2 O 3 ,
Significant grain growth of the TiC particles occurred, resulting in a decrease in mechanical strength, resulting in a decrease in workability.Workability was also poor due to high-temperature treatment, and there were also problems from the perspective of energy conservation. For this reason, attempts have been made to add subcomponents to the main components of Al 2 O 3 and TiC.
140068, Japanese Patent Application Laid-open No. 57-205372, etc. As a result of research to solve the above problems, the present invention has made it possible to obtain a good substrate by simultaneously adding an additive that promotes sintering and an additive that inhibits grain growth. It is something. [Object of the Invention] In view of the above-mentioned problems, the present invention provides a substrate material for a thin film magnetic head that has excellent sinterability, has high density, has few pores, has excellent wear resistance, and has good processing characteristics. It provides: [Summary of the Invention] As a result of various experiments, the present inventor found that TiC15~
By adding 1 to 10 wt% of one or more of La 2 O 3 , CeO 2 , and Sm 2 O 3 to 100 wt % of the main component consisting of 60 wt % and the remainder Al 2 O 3 , Al 2 O 3 and Because the wettability with TiC is improved, sinterability is improved, and there are few remaining pores and the relative density is 99.95% or more.
It also contains 1 to 5 wt% of Cr 2 O 3 , TiO 2 , and NiO, which are additives that have excellent wear resistance and exhibit grain growth suppressing effects.
By adding this, it is possible to easily produce a thin film magnetic head substrate material with a small grain size structure and excellent workability. The present invention will be described in detail below with reference to Examples. [Example] Al 2 O 3 with an average particle size of 0.1 to 0.2 μm and a purity of 99% or more,
TiC, La 2 O 3 , CeO 2 , Sm 2 O 3 , Cr 2 O 3 , TiO 2 ,
Each powder raw material of NiO was weighed so as to have the composition ratio shown in Table 1, and samples No. 1 to No. 16 were prepared. In addition
The weighed values of La 2 O 3 , CeO 2 , and Sm 2 O 3 (Additive B) and the weighed values of Cr 2 O 3 , TiO 2 , and NiO (Additive C) are based on Al 2 O 3 and TiC. This is the ratio to the main components, with a total of 100wt%. Also, sample No. 8 to 16
is for comparison. After weighing each sample as described above, using ethanol as a solvent, mixing in a ball mill for 20 to 40 hours, filtering and drying, adding an organic binder,
It was pressure molded into a block body measuring mm x 30 mm x 10 mm. Furthermore, this was heated at 1700℃ in an Ar gas atmosphere for 2 hours.
After sintering for a period of time, hot isostatic pressing (HIP) treatment was performed using Ar gas as a pressure medium at a pressure of 1000 Kg/cm 2 , a temperature of 1600° C., and a holding time of 2 hours. After cutting out a 5 mm x 5 mm x 20 mm square prism from each sample obtained through the above steps, the two adjacent 5 mm x 20 mm sides of the prism were processed into a mirror surface, and the ridges of 2 x 2 μm or more were formed. The number of chips was counted using an optical microscope with a magnification of 1000 times, and converted to the chipping incidence rate per 1 cm.
The evaluation item was workability. The size of the chipping is determined by its length: 2-10μm, 11-50μm, 51μm.
Classified above. Furthermore, on the fracture surface of each sample, the diameters of 50 to 100 particles were measured using a scanning electron microscope, and the average value was taken as the particle diameter of each sample. Furthermore, as evaluation items for mechanical strength, Bitkers hardness Hv (load: 1 kg) and bending strength F were measured. Furthermore, the density of each sample was measured using the Archimedes method, and the relative density with respect to the theoretical density was calculated. The above results are shown in Table-1.

【表】【table】

〔発明の効果〕〔Effect of the invention〕

以上の結果から明らかな様に、本発明によれ
ば、従来、製造の困難であつた耐摩耗性に優れ、
気孔が少なく、機械加工性も良好な薄膜磁気ヘツ
ド用高密度セラミツクス基板材料を容易に製造す
る事ができた。
As is clear from the above results, the present invention has excellent wear resistance, which has been difficult to manufacture in the past.
We were able to easily produce a high-density ceramic substrate material for thin-film magnetic heads that has few pores and good machinability.

Claims (1)

【特許請求の範囲】[Claims] 1 TiCを15〜60wt%含み、残部Al2O3より成る
主成分100重量部に対し、さらにLa2O3、CeO2
Sm2O3の一種又は二種以上を1〜10wt%、
Cr2O3、TiO2、NiOの一種又は二種以上を1〜
5wt%添加する事を特徴とする薄膜磁気ヘツド用
基板材料。
1 Contains 15 to 60 wt% of TiC, and the remainder is Al 2 O 3 for 100 parts by weight of the main component, and further contains La 2 O 3 , CeO 2 ,
1 to 10 wt% of one or more types of Sm 2 O 3 ,
One or more of Cr 2 O 3 , TiO 2 , NiO
Substrate material for thin film magnetic heads, characterized by the addition of 5wt%.
JP61235147A 1986-10-01 1986-10-01 Substrate material for thin film magnetic head Granted JPS6390016A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61235147A JPS6390016A (en) 1986-10-01 1986-10-01 Substrate material for thin film magnetic head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61235147A JPS6390016A (en) 1986-10-01 1986-10-01 Substrate material for thin film magnetic head

Publications (2)

Publication Number Publication Date
JPS6390016A JPS6390016A (en) 1988-04-20
JPH0373044B2 true JPH0373044B2 (en) 1991-11-20

Family

ID=16981748

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61235147A Granted JPS6390016A (en) 1986-10-01 1986-10-01 Substrate material for thin film magnetic head

Country Status (1)

Country Link
JP (1) JPS6390016A (en)

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53105513A (en) * 1977-02-25 1978-09-13 Ngk Spark Plug Co Method of manufacturing ceramic sintered articles
JPS57135772A (en) * 1981-01-09 1982-08-21 Nippon Tungsten Material for alumina magnetic head
JPS5926967A (en) * 1982-07-29 1984-02-13 松下電器産業株式会社 Manufacture of ceramic for thin film substrate
JPS60231308A (en) * 1984-05-01 1985-11-16 Sumitomo Special Metals Co Ltd Alumina magnetic head substrate material and manufacture thereof
JPS60260464A (en) * 1984-06-01 1985-12-23 ダイジヱツト工業株式会社 Ceramic sintered body and manufacture
JPS61158862A (en) * 1984-12-29 1986-07-18 ティーディーケイ株式会社 Magnetic head slider material
JPS632855A (en) * 1986-06-20 1988-01-07 ティーディーケイ株式会社 Ceramic material

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53105513A (en) * 1977-02-25 1978-09-13 Ngk Spark Plug Co Method of manufacturing ceramic sintered articles
JPS57135772A (en) * 1981-01-09 1982-08-21 Nippon Tungsten Material for alumina magnetic head
JPS5926967A (en) * 1982-07-29 1984-02-13 松下電器産業株式会社 Manufacture of ceramic for thin film substrate
JPS60231308A (en) * 1984-05-01 1985-11-16 Sumitomo Special Metals Co Ltd Alumina magnetic head substrate material and manufacture thereof
JPS60260464A (en) * 1984-06-01 1985-12-23 ダイジヱツト工業株式会社 Ceramic sintered body and manufacture
JPS61158862A (en) * 1984-12-29 1986-07-18 ティーディーケイ株式会社 Magnetic head slider material
JPS632855A (en) * 1986-06-20 1988-01-07 ティーディーケイ株式会社 Ceramic material

Also Published As

Publication number Publication date
JPS6390016A (en) 1988-04-20

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