JPH036679B2 - - Google Patents
Info
- Publication number
- JPH036679B2 JPH036679B2 JP11408686A JP11408686A JPH036679B2 JP H036679 B2 JPH036679 B2 JP H036679B2 JP 11408686 A JP11408686 A JP 11408686A JP 11408686 A JP11408686 A JP 11408686A JP H036679 B2 JPH036679 B2 JP H036679B2
- Authority
- JP
- Japan
- Prior art keywords
- glass
- substrate
- iron
- circuit board
- insulating layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000011521 glass Substances 0.000 claims description 65
- 239000000758 substrate Substances 0.000 claims description 50
- 229910000640 Fe alloy Inorganic materials 0.000 claims description 10
- 229910052782 aluminium Inorganic materials 0.000 claims description 9
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 9
- 230000001590 oxidative effect Effects 0.000 claims description 8
- 239000012299 nitrogen atmosphere Substances 0.000 claims description 7
- 239000012298 atmosphere Substances 0.000 claims description 5
- 238000004519 manufacturing process Methods 0.000 claims description 4
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 61
- 239000010410 layer Substances 0.000 description 39
- 229910052742 iron Inorganic materials 0.000 description 31
- 239000000853 adhesive Substances 0.000 description 13
- 230000001070 adhesive effect Effects 0.000 description 13
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 10
- 238000010304 firing Methods 0.000 description 10
- 238000010438 heat treatment Methods 0.000 description 9
- 239000000203 mixture Substances 0.000 description 8
- 239000010408 film Substances 0.000 description 7
- 230000035939 shock Effects 0.000 description 7
- 230000000052 comparative effect Effects 0.000 description 5
- 229910052757 nitrogen Inorganic materials 0.000 description 5
- 238000007796 conventional method Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 238000001035 drying Methods 0.000 description 3
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000010959 steel Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 229910000428 cobalt oxide Inorganic materials 0.000 description 1
- IVMYJDGYRUAWML-UHFFFAOYSA-N cobalt(ii) oxide Chemical compound [Co]=O IVMYJDGYRUAWML-UHFFFAOYSA-N 0.000 description 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 1
- 210000003298 dental enamel Anatomy 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 150000002505 iron Chemical class 0.000 description 1
- -1 iron enamel Chemical compound 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000002932 luster Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 238000002233 thin-film X-ray diffraction Methods 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
Landscapes
- Solid-Phase Diffusion Into Metallic Material Surfaces (AREA)
- Insulated Metal Substrates For Printed Circuits (AREA)
Description
【発明の詳細な説明】
発明の属する技術分野
本発明は集積回路や抵抗回路などのエレクトロ
ニクス回路を形成するための基板材料、特に鉄合
金基体の表面の一部又は全面にガラス絶縁層を付
着した回路基板に関する。[Detailed Description of the Invention] Technical field to which the invention pertains The present invention relates to a substrate material for forming electronic circuits such as integrated circuits and resistance circuits, particularly a substrate material having a glass insulating layer attached to a part or the entire surface of an iron alloy substrate. Regarding circuit boards.
従来の技術
集積回路用耐熱性絶縁基板としては、従来より
アルミナ等のセラミツク材料が最も一般的に用い
られているが、セラミツクは機械的強度が弱く、
加工性が悪い、大型基板を作ることができないな
どの欠点を有しており、用途に制約がある。Conventional technology Ceramic materials such as alumina have traditionally been most commonly used as heat-resistant insulating substrates for integrated circuits, but ceramics have low mechanical strength and
It has disadvantages such as poor processability and inability to make large substrates, which limits its applications.
そこで最近、強度、加工性が優れ、大型化の可
能な鉄基板が注目されている。この鉄を回路基板
として使用する場合、基本的には鉄と回路との間
は電気的に絶縁されている必要がある。絶縁化す
るには普通鉄基体表面全域、又は絶縁を要する部
位のみ部分的にガラス絶縁層を形成するが、直接
ガラスを被着しても接着強度が弱いため、鉄琺瑯
のようにニツケルやコバルトを予め鍍金したり、
コバルト酸化物のような特定の酸化物を形成した
後に釉をかけたり、特公昭56−36597号に開示さ
れているようにまず基体を熱処理して金属酸化物
被膜を形成し、その上にガラス層を形成する。更
に特願昭61−40722号及び40723号にはガラスと酸
化物層の一部のみを反応させるような接着構造を
とるものもある。 Therefore, recently, iron substrates, which have excellent strength, workability, and can be made large, have been attracting attention. When using this iron as a circuit board, it is basically necessary to electrically insulate the iron and the circuit. To insulate, a glass insulating layer is usually formed over the entire surface of the iron substrate, or only in areas that require insulation, but the adhesive strength is weak even if glass is applied directly, so nickel or cobalt, like iron enamel, is used. Pre-plated or
After forming a specific oxide such as cobalt oxide, glazing is applied, or as disclosed in Japanese Patent Publication No. 56-36597, the substrate is first heat treated to form a metal oxide film, and then glass is applied on top of it. form a layer. Further, Japanese Patent Application Nos. 61-40722 and 40723 have adhesive structures in which only a portion of the glass and oxide layer react.
発明が解決すべき問題点
しかしこれらの方法で形成されたガラス絶縁膜
は、鉄基体との接着強度がまだ充分ではなく、基
板を屈曲させたり強い衝撃を加えたりして一旦ガ
ラス膜に亀裂が入ると、基体とガラス層の剥離が
起こり易い。又基板上に厚膜回路を形成する際、
酸化性雰囲気もしくは非酸化性雰囲気中で数回か
ら多層回路では十回以上の焼成を受けるのが普通
であるが、従来の方法でガラス層を形成した場合
には、焼成回数が増すと強度劣化を起こし剥離し
易い。Problems to be Solved by the Invention However, the glass insulating film formed by these methods still does not have sufficient adhesive strength with the iron substrate, and the glass film may crack once the substrate is bent or a strong impact is applied. If the glass layer enters the substrate, separation between the substrate and the glass layer is likely to occur. Also, when forming a thick film circuit on a substrate,
It is common for glass layers to be fired several times in an oxidizing or non-oxidizing atmosphere, or more than 10 times for multilayer circuits, but when glass layers are formed using conventional methods, the strength deteriorates as the number of firings increases. It is easy to cause and peel off.
本発明の目的はガラス絶縁層と鉄基体との間の
密着性が優れ、繰返し焼成を行つても密着性が劣
化せず、激しい温度衝撃にも耐えるガラス被覆鉄
回路基板を提供することにある。 An object of the present invention is to provide a glass-coated iron circuit board that has excellent adhesion between a glass insulating layer and an iron base, does not deteriorate even after repeated firing, and can withstand severe temperature shock. .
問題点を解決するための手段
本発明は、アルミニウムを含有する鉄合金基体
を窒素雰囲気中500℃以上の温度で熱処理し、次
いで基体の表面の一部又は全面にガラス絶縁層を
形成することを特徴とする回路基板の製造方法で
ある。Means for Solving the Problems The present invention involves heat treating an iron alloy substrate containing aluminum at a temperature of 500°C or higher in a nitrogen atmosphere, and then forming a glass insulating layer on a part or the entire surface of the substrate. This is a characteristic method of manufacturing a circuit board.
又第二の発明は、アルミニウムを含有する鉄合
金基体を窒素雰囲気中500℃以上の温度で熱処理
した後、酸化性雰囲気中で熱処理し、次いで基体
の表面の一部又は全面にガラス絶縁層を形成する
ことを特徴とする回路基体の製造方法である。 The second invention is to heat-treat an aluminum-containing iron alloy substrate at a temperature of 500°C or higher in a nitrogen atmosphere, then heat-treat it in an oxidizing atmosphere, and then apply a glass insulating layer on a part or the entire surface of the substrate. This is a method of manufacturing a circuit board, characterized in that:
作 用
アルミニウムを含む鉄基体上にガラス絶縁層を
形成するに先立つて、予め基体を窒素中で熱処理
することにより、従来に比べてガラス層と鉄基体
とが極めて強固に接着した鉄回路基板が得られ
る。この絶縁層は、厚膜回路形成時の酸化性又は
非酸化性雰囲気中における繰返し焼成にも耐え、
更に激しい温度衝撃や機械的衝撃を受けても強度
が劣化することがない。Effect: Prior to forming a glass insulating layer on an iron substrate containing aluminum, the substrate is heat-treated in nitrogen, resulting in an iron circuit board with extremely strong adhesion between the glass layer and the iron substrate compared to conventional methods. can get. This insulating layer can withstand repeated firing in oxidizing or non-oxidizing atmospheres during thick film circuit formation.
Furthermore, the strength will not deteriorate even if subjected to severe temperature shock or mechanical shock.
窒素中での熱処理により接着強度が向上する理
由は明らかではないが、アルミニウムを含有する
鉄合金を窒素中で高温に加熱すると、基体表面に
窒化アルミニウムが生成することが薄膜X線回折
によつて確認され、これがガラス絶縁層と鉄基板
の接着になんらかの形で寄与しているものと考え
られる。熱処理温度は基体合金の種類にもよるが
およそ500℃以上であればよく、実用的には800〜
1000℃程度が好ましい。熱処理時間は温度によつ
て異なり、温度が高ければより短時間でよい。例
えば900℃の場合5〜30分程度保持するのが適当
である。また窒素中で熱処理を行つた後、空気中
などの酸化性雰囲気中で再度熱処理を行うと、更
に強度が向上する傾向があり、熱処理を繰返して
も強度の劣化は全く見られない。酸化性雰囲気中
での熱処理は約500℃以上の温度で行うのが望ま
しい。 It is not clear why heat treatment in nitrogen improves adhesive strength, but thin-film X-ray diffraction has shown that when an iron alloy containing aluminum is heated to high temperatures in nitrogen, aluminum nitride is formed on the substrate surface. It is thought that this contributes in some way to the adhesion between the glass insulating layer and the iron substrate. The heat treatment temperature depends on the type of base alloy, but it should be about 500℃ or higher, and practically 800℃ or higher.
A temperature of about 1000°C is preferable. The heat treatment time varies depending on the temperature, and the higher the temperature, the shorter the time required. For example, in the case of 900°C, it is appropriate to hold the temperature for about 5 to 30 minutes. In addition, if heat treatment is performed in nitrogen and then heat treatment is performed again in an oxidizing atmosphere such as air, the strength tends to further improve, and no deterioration in strength is observed even if the heat treatment is repeated. The heat treatment in an oxidizing atmosphere is preferably performed at a temperature of about 500°C or higher.
鉄基体に上記の熱処理を施した後ガラス絶縁層
を形成するが、形成方法は公知のいかなる手段に
よつてもよい。代表的にはガラス粉末を液状ビヒ
クルに分散させたペーストやスラリーを鉄基体の
表面にスクリーン印刷、浸漬、スプレー等の方法
により塗布し、乾燥した後、従来法に従つてガラ
スの融点以上の温度で焼成を行う。又、鉄基板の
上に直接ガラスのグリーンシートやガラス板を載
置し、焼成してもよい。ガラスの組成は本発明の
効果にはほとんど影響せず、特に限定はない。非
晶質ガラス、結晶性ガラス、それらの混合物、ガ
ラスとセラミツクフイラーの混合物などいずれも
使用可能である。 The glass insulating layer is formed after the iron substrate is subjected to the above heat treatment, and any known method may be used to form the glass insulating layer. Typically, a paste or slurry in which glass powder is dispersed in a liquid vehicle is applied to the surface of an iron substrate by screen printing, dipping, spraying, etc., dried, and then heated to a temperature above the melting point of glass according to conventional methods. Perform firing. Alternatively, a glass green sheet or glass plate may be placed directly on the iron substrate and fired. The composition of the glass has almost no effect on the effects of the present invention and is not particularly limited. Amorphous glass, crystalline glass, mixtures thereof, mixtures of glass and ceramic fillers, etc. can all be used.
アルミニウムを含有する基体としては、例えば
一般の耐熱鋼があげられる。 Examples of the substrate containing aluminum include general heat-resistant steel.
実施例
実施例 1
クロム15%、アルミニウム4%及びチタン0.2
%を含有する板状の鉄合金基体(50mm×50mm、厚
さ0.6mm)を酸素濃度10ppm以下の窒素雰囲気中
において900℃で10分間熱処理を行つた。Examples Example 1 15% chromium, 4% aluminum and 0.2 titanium
A plate-shaped iron alloy substrate (50 mm x 50 mm, thickness 0.6 mm) containing 1% was heat-treated at 900°C for 10 minutes in a nitrogen atmosphere with an oxygen concentration of 10 ppm or less.
この基体の片面全域に下記組成のガラス微粒子
を含むガラスペーストをスクリーン印刷し、150
℃で10分間乾燥した後、ピーク温度850℃10分間、
40分サイクルで焼成を行い、ガラス絶縁層を有す
る鉄回路基板を製造した。焼成後の絶縁層の厚み
は40μmである。 A glass paste containing glass particles of the following composition was screen printed on the entire surface of one side of this substrate, and
After drying at ℃ for 10 minutes, peak temperature 850℃ for 10 minutes,
Firing was performed in a 40-minute cycle to produce an iron circuit board with a glass insulating layer. The thickness of the insulating layer after firing is 40 μm.
[ガラス組成](重量%)
SiO2 40 Al2O3 20
B2O3 10 CaO 15
ZnO 10 TiO2 5
得られた基板について、ガラスと鉄基体との接
着強度を調べるため次のような試験を行つた。[Glass composition] (wt%) SiO 2 40 Al 2 O 3 20 B 2 O 3 10 CaO 15 ZnO 10 TiO 2 5 The following tests were conducted on the obtained substrate to examine the adhesive strength between the glass and the iron substrate. I went there.
剥離試験(初期強度);基板を中央で折曲げ
て、ガラス層を強制的に剥離させた。剥離部分
は灰色を呈しており、表面を電子顕微鏡により
観察したところガラス層が付着していることが
わかつた。即ち曲げによる引張り力に対しガラ
ス層は亀裂を生じて破壊されるが、鉄基体とガ
ラス層の接着強度がガラスの破壊強度より大き
いためガラス層が界面に残留したものである。 Peeling test (initial strength): The substrate was bent at the center and the glass layer was forcibly peeled off. The peeled part was gray in color, and when the surface was observed using an electron microscope, it was found that a glass layer was attached. That is, the glass layer cracks and is destroyed by the tensile force caused by bending, but the glass layer remains at the interface because the adhesive strength between the iron base and the glass layer is greater than the breaking strength of the glass.
繰返し焼成試験;上記の方法で製造されたガ
ラス絶縁層を有する鉄回路基板を、空気中、ピ
ーク温度850℃10分間、1サイクル40分間の条
件で10回繰返し焼成を行い、その後上記剥離試
験を行つたが、結果は同様であつた。 Repeated firing test: The iron circuit board with the glass insulating layer manufactured by the above method was repeatedly fired 10 times in air at a peak temperature of 850°C for 10 minutes and one cycle of 40 minutes, and then the peel test described above was performed. I did, but the results were the same.
熱衝撃試験;同じガラス絶縁層を有する鉄回
路基板を800℃の赤熱状態から冷水中に投入し、
その後上記剥離試験を行つたが、結果は同様で
あつた。 Thermal shock test: A steel circuit board with the same glass insulation layer was placed in cold water from a red-hot state of 800℃.
Thereafter, the above peel test was performed, but the results were the same.
実施例 2
ガラスの組成を下記のとおりとする以外は実施
例1と同様にして、ガラス絶縁層を有する鉄回路
基板を製造した。Example 2 An iron circuit board having a glass insulating layer was manufactured in the same manner as in Example 1 except that the composition of the glass was as follows.
[ガラス組成](重量%)
SiO2 52 Al2O3 8
B2O3 10 PbO 30
得られた基板について実施例1のと同様にし
て接着強度を調べたところ、剥離面にはガラス層
が付着しており、鉄基体とガラス層の接着強度は
極めて強いものであつた。[Glass composition] (wt%) SiO 2 52 Al 2 O 3 8 B 2 O 3 10 PbO 30 When the adhesive strength of the obtained substrate was examined in the same manner as in Example 1, it was found that there was a glass layer on the peeled surface. The adhesive strength between the iron substrate and the glass layer was extremely strong.
実施例 3
実施例1と同一の鉄基体を、窒素雰囲気中にお
いて900℃で10分間熱処理した後、空気中850℃で
10分間熱処理した。その基体の片面全域に実施例
1と同一のガラスペーストをスクリーン印刷し、
150℃で10分間乾燥した後、ピーク温度850℃10分
間、40分サイクルで焼成を行い、ガラス絶縁層を
有する鉄回路基板を製造した。Example 3 The same iron substrate as in Example 1 was heat treated at 900°C for 10 minutes in a nitrogen atmosphere and then heated at 850°C in air.
Heat treated for 10 minutes. The same glass paste as in Example 1 was screen printed on the entire surface of one side of the substrate,
After drying at 150°C for 10 minutes, baking was performed at a peak temperature of 850°C for 10 minutes in a 40-minute cycle to produce an iron circuit board with a glass insulating layer.
得られた基板について同様にして剥離試験を行
つた結果、剥離面にガラス層が付着しており、鉄
基体とガラス層の接着強度は極めて強いものであ
つた。 A peel test was conducted on the obtained substrate in the same manner, and the results showed that the glass layer was attached to the peeled surface, and the adhesive strength between the iron base and the glass layer was extremely strong.
実施例 4
窒素中での熱処理条件を600℃、4時間とする
以外は、実施例1と同様にして回路基板を製造し
た。Example 4 A circuit board was manufactured in the same manner as in Example 1, except that the heat treatment conditions in nitrogen were 600° C. for 4 hours.
剥離試験を行つた結果、剥離面にガラス層が付
着しており、鉄基体とガラス層の接着強度は極め
て強いものであつた。 As a result of a peel test, the glass layer was found to be attached to the peeled surface, and the adhesive strength between the iron substrate and the glass layer was extremely strong.
実施例 5
基体としてクロム12%、アルミニウム3.5%を
含む鉄合金を使用する他は実施例1と同様にし
て、ガラス絶縁層を有する鉄回路基板を製造し
た。Example 5 An iron circuit board having a glass insulating layer was manufactured in the same manner as in Example 1 except that an iron alloy containing 12% chromium and 3.5% aluminum was used as the base.
剥離試験を行つた結果、鉄基体とガラス層の接
着強度は極めて強いものであつた。 As a result of a peel test, the adhesive strength between the iron substrate and the glass layer was extremely strong.
比較例 1
実施例1と同一の鉄合金基体を、空気中におい
て900℃で10分間熱処理を行つて酸化被膜を形成
した。この基体の片面全域に実施例1と同一組成
のガラスペーストをスクリーン印刷し、150℃で
10分間乾燥した後、ピーク温度850℃10分間、40
分サイクルで焼成を行い、ガラス絶縁層を有する
鉄回路基板を製造した。Comparative Example 1 The same iron alloy substrate as in Example 1 was heat treated at 900° C. for 10 minutes in air to form an oxide film. A glass paste having the same composition as in Example 1 was screen printed on the entire surface of one side of this substrate, and then heated at 150°C.
After drying for 10 minutes, peak temperature 850℃ for 10 minutes, 40
Firing was performed in a minute cycle to produce an iron circuit board having a glass insulating layer.
得られた基板について実施例1のと同様にし
て剥離試験を行つたところ、ガラスは完全に剥離
し、剥離面は金属光沢を有していた。電子顕微鏡
による観察からガラスの残存は認められなかつ
た。これは鉄基体とガラス層の接着強度が極めて
弱いことを表わしている。又実施例1のと同様
にして熱衝撃試験を行つたところ、冷水に投入後
ガラス層が剥離した。 When the obtained substrate was subjected to a peel test in the same manner as in Example 1, the glass was completely peeled off and the peeled surface had a metallic luster. Observation using an electron microscope revealed that no glass remained. This indicates that the adhesive strength between the iron substrate and the glass layer is extremely weak. Further, when a thermal shock test was conducted in the same manner as in Example 1, the glass layer peeled off after being immersed in cold water.
比較例 2
実施例1と同一の鉄基体を、窒素雰囲気中にお
いて400℃で5時間熱処理した後、片面全域に実
施例1と同様にガラスペーストの印刷、焼成を行
い、回路基板を製造した。Comparative Example 2 The same iron substrate as in Example 1 was heat-treated at 400° C. for 5 hours in a nitrogen atmosphere, and then glass paste was printed and fired on the entire surface of one side in the same manner as in Example 1 to produce a circuit board.
剥離試験の結果は比較例1と同様であつた。 The results of the peel test were the same as in Comparative Example 1.
比較例 3
基体としてアルミニウムを含まないステンレス
鋼SUS304を用い、実施例1と同様の処理を行つ
て回路基板を製造した。Comparative Example 3 A circuit board was manufactured using aluminum-free stainless steel SUS304 as a substrate and performing the same treatment as in Example 1.
剥離試験の結果は比較例1と同様であつた。 The results of the peel test were the same as in Comparative Example 1.
発明の効果
実施例からも明らかなように、本発明の方法で
製造されたガラス被覆鉄基板は、従来と比べてガ
ラス被覆層と鉄合金基体との接着強度が極めて強
い。又繰返し焼成を行つても強度が劣化しないの
で、特に複数回の焼成を行う厚膜集積回路基板と
して優れたものである。又激しい機械的衝撃や温
度衝撃にも耐えるので使用条件の厳しい用途にも
適している。Effects of the Invention As is clear from the examples, the glass-coated iron substrate manufactured by the method of the present invention has extremely strong adhesive strength between the glass coating layer and the iron alloy substrate compared to the conventional method. Furthermore, since the strength does not deteriorate even after repeated firing, it is particularly excellent as a thick film integrated circuit board that is subjected to multiple firings. It also withstands severe mechanical shock and temperature shock, making it suitable for applications with severe usage conditions.
Claims (1)
囲気中500℃以上の温度で熱処理し、次いで基体
の表面の一部又は全面にガラス絶縁層を形成する
ことを特徴とする回路基板の製造方法。 2 アルミニウムを含有する鉄合金基体を窒素雰
囲気中500℃以上の温度で熱処理した後、酸化性
雰囲気中で熱処理し、次いで基体の表面の一部又
は全面にガラス絶縁層を形成することを特徴とす
る回路基板の製造方法。[Scope of Claims] 1. A circuit board characterized in that an iron alloy substrate containing aluminum is heat treated at a temperature of 500°C or higher in a nitrogen atmosphere, and then a glass insulating layer is formed on a part or the entire surface of the substrate. manufacturing method. 2 The iron alloy substrate containing aluminum is heat-treated at a temperature of 500°C or higher in a nitrogen atmosphere, then heat-treated in an oxidizing atmosphere, and then a glass insulating layer is formed on a part or the entire surface of the substrate. A method of manufacturing a circuit board.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11408686A JPS62269396A (en) | 1986-05-19 | 1986-05-19 | Manufacture of circuit board |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11408686A JPS62269396A (en) | 1986-05-19 | 1986-05-19 | Manufacture of circuit board |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS62269396A JPS62269396A (en) | 1987-11-21 |
JPH036679B2 true JPH036679B2 (en) | 1991-01-30 |
Family
ID=14628732
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11408686A Granted JPS62269396A (en) | 1986-05-19 | 1986-05-19 | Manufacture of circuit board |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS62269396A (en) |
-
1986
- 1986-05-19 JP JP11408686A patent/JPS62269396A/en active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS62269396A (en) | 1987-11-21 |
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