JPH0365545B2 - - Google Patents
Info
- Publication number
- JPH0365545B2 JPH0365545B2 JP57123865A JP12386582A JPH0365545B2 JP H0365545 B2 JPH0365545 B2 JP H0365545B2 JP 57123865 A JP57123865 A JP 57123865A JP 12386582 A JP12386582 A JP 12386582A JP H0365545 B2 JPH0365545 B2 JP H0365545B2
- Authority
- JP
- Japan
- Prior art keywords
- resist
- pattern
- electron beam
- etching
- sist
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H10P50/73—
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/094—Multilayer resist systems, e.g. planarising layers
Landscapes
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Priority Applications (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57123865A JPS5915243A (ja) | 1982-07-16 | 1982-07-16 | レジスト材料 |
| US06/501,201 US4551417A (en) | 1982-06-08 | 1983-06-06 | Method of forming patterns in manufacturing microelectronic devices |
| CA000429834A CA1207216A (en) | 1982-06-08 | 1983-06-07 | Method of forming patterns in manufacturing microelectronic devices |
| IE1339/83A IE54731B1 (en) | 1982-06-08 | 1983-06-07 | Microelectronic device manufacture |
| DE8383303324T DE3363914D1 (en) | 1982-06-08 | 1983-06-08 | Microelectronic device manufacture |
| EP83303324A EP0096596B2 (en) | 1982-06-08 | 1983-06-08 | Microelectronic device manufacture |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57123865A JPS5915243A (ja) | 1982-07-16 | 1982-07-16 | レジスト材料 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5915243A JPS5915243A (ja) | 1984-01-26 |
| JPH0365545B2 true JPH0365545B2 (cg-RX-API-DMAC10.html) | 1991-10-14 |
Family
ID=14871293
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57123865A Granted JPS5915243A (ja) | 1982-06-08 | 1982-07-16 | レジスト材料 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5915243A (cg-RX-API-DMAC10.html) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62277728A (ja) * | 1986-05-27 | 1987-12-02 | Nec Corp | パタ−ン形成方法 |
| JPS62278545A (ja) * | 1986-05-27 | 1987-12-03 | Nec Corp | パタ−ン形成方法 |
-
1982
- 1982-07-16 JP JP57123865A patent/JPS5915243A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5915243A (ja) | 1984-01-26 |