JPH036460U - - Google Patents
Info
- Publication number
- JPH036460U JPH036460U JP6741489U JP6741489U JPH036460U JP H036460 U JPH036460 U JP H036460U JP 6741489 U JP6741489 U JP 6741489U JP 6741489 U JP6741489 U JP 6741489U JP H036460 U JPH036460 U JP H036460U
- Authority
- JP
- Japan
- Prior art keywords
- crucible
- layers
- evaporation
- vacuum
- lid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000007738 vacuum evaporation Methods 0.000 claims description 3
- 238000009423 ventilation Methods 0.000 claims description 2
- 238000001704 evaporation Methods 0.000 claims 2
- 239000000463 material Substances 0.000 claims 2
- 230000008020 evaporation Effects 0.000 claims 1
- 238000000427 thin-film deposition Methods 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Description
第１図は実施例に係る真空蒸着用るつぼの要部
断面説明図、第２図は第１図におけるふたの上面
図、第３図は真空蒸着装置の概念図である。
１……るつぼ本体、２……ふた、２ｃ……通気
孔。
FIG. 1 is an explanatory cross-sectional view of a main part of a crucible for vacuum evaporation according to an embodiment, FIG. 2 is a top view of the lid in FIG. 1, and FIG. 3 is a conceptual diagram of a vacuum evaporation apparatus. 1... Crucible body, 2... Lid, 2c... Ventilation hole.
Claims (1)
着するふた２は上下方向に複数の層を有するもの
であり、前記複数の層にそれぞれ位置を変えて通
気孔２ｃを設け、るつぼから蒸発する材料蒸気が
前記通気口２ｃを順次通過することによつて、る
つぼ外に出る蒸着材料の蒸気圧を下げるようにし
たことを特徴とする真空蒸着用るつぼ。 In the vacuum thin film deposition apparatus, the lid 2 attached to the crucible body 1 has a plurality of layers in the vertical direction, and ventilation holes 2c are provided at different positions in each of the plurality of layers to prevent material vapor evaporating from the crucible. A crucible for vacuum evaporation, characterized in that the vapor pressure of the evaporation material exiting the crucible is lowered by sequentially passing through the vent hole 2c.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6741489U JPH036460U (en) | 1989-06-09 | 1989-06-09 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6741489U JPH036460U (en) | 1989-06-09 | 1989-06-09 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH036460U true JPH036460U (en) | 1991-01-22 |
Family
ID=31600965
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6741489U Pending JPH036460U (en) | 1989-06-09 | 1989-06-09 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH036460U (en) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60137896A (en) * | 1983-12-23 | 1985-07-22 | Hitachi Ltd | Crucible for molecular beam source |
-
1989
- 1989-06-09 JP JP6741489U patent/JPH036460U/ja active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60137896A (en) * | 1983-12-23 | 1985-07-22 | Hitachi Ltd | Crucible for molecular beam source |
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