JPH01125360U - - Google Patents
Info
- Publication number
- JPH01125360U JPH01125360U JP2167588U JP2167588U JPH01125360U JP H01125360 U JPH01125360 U JP H01125360U JP 2167588 U JP2167588 U JP 2167588U JP 2167588 U JP2167588 U JP 2167588U JP H01125360 U JPH01125360 U JP H01125360U
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- mesh
- substrate
- forming apparatus
- film forming
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 claims description 6
- 239000010409 thin film Substances 0.000 claims description 6
- 238000010030 laminating Methods 0.000 claims 1
- 239000000126 substance Substances 0.000 claims 1
- 239000004065 semiconductor Substances 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
Landscapes
- Physical Vapour Deposition (AREA)
Description
第１図ａは本考案の一実施例の薄膜形成装置の
模試図、第１図ｂはその装置で形成した半導体装
置の断面図、第２図ａは従来の薄膜形成装置の模
試図、第２図ｂはその装置で形成した半導体装置
の断面図、第３図ａは従来の他の薄膜形成装置の
模試図、第３図ｂはその装置で形成した半導体装
置の断面図である。
１……真空容器、２……基板、３……基板ホル
ダ、４……ターゲツト、７……メツシユ、８……
薄膜。
FIG. 1a is a schematic diagram of a thin film forming apparatus according to an embodiment of the present invention, FIG. 1b is a sectional view of a semiconductor device formed with the apparatus, FIG. FIG. 2b is a cross-sectional view of a semiconductor device formed using this apparatus, FIG. 3a is a mock diagram of another conventional thin film forming apparatus, and FIG. 3b is a cross-sectional view of a semiconductor device formed using this apparatus. 1...Vacuum container, 2...Substrate, 3...Substrate holder, 4...Target, 7...Mesh, 8...
Thin film.
Claims (1)
質を積層して薄膜を形成する装置において、 上記基板の表面側を覆うようにしたメツシユを
上記基板ホルダに取り付けて構成したことを特徴
とする薄膜形成装置。 (2) 上記メツシユが、選択部分的にそのメツシ
ユ密度が変えられて形成されたことを特徴とする
実用新案登録請求の範囲第１項記載の薄膜形成装
置。[Scope of Claim for Utility Model Registration] (1) In an apparatus for forming a thin film by laminating flying substances on the surface of a substrate mounted on a substrate holder, a mesh covering the surface side of the substrate is attached to the substrate holder. A thin film forming apparatus characterized by comprising: (2) The thin film forming apparatus according to claim 1, wherein the mesh is formed with the mesh density selectively changed.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2167588U JPH01125360U (en) | 1988-02-20 | 1988-02-20 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2167588U JPH01125360U (en) | 1988-02-20 | 1988-02-20 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH01125360U true JPH01125360U (en) | 1989-08-25 |
Family
ID=31239118
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2167588U Pending JPH01125360U (en) | 1988-02-20 | 1988-02-20 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01125360U (en) |
-
1988
- 1988-02-20 JP JP2167588U patent/JPH01125360U/ja active Pending