JPH0364058B2 - - Google Patents

Info

Publication number
JPH0364058B2
JPH0364058B2 JP58240754A JP24075483A JPH0364058B2 JP H0364058 B2 JPH0364058 B2 JP H0364058B2 JP 58240754 A JP58240754 A JP 58240754A JP 24075483 A JP24075483 A JP 24075483A JP H0364058 B2 JPH0364058 B2 JP H0364058B2
Authority
JP
Japan
Prior art keywords
plates
developer
plate
type
negative
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58240754A
Other languages
Japanese (ja)
Other versions
JPS60130741A (en
Inventor
Juzo Yokota
Hidekazu Takai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Foil Manufacturing Co Ltd
Original Assignee
Nippon Foil Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Foil Manufacturing Co Ltd filed Critical Nippon Foil Manufacturing Co Ltd
Priority to JP24075483A priority Critical patent/JPS60130741A/en
Publication of JPS60130741A publication Critical patent/JPS60130741A/en
Publication of JPH0364058B2 publication Critical patent/JPH0364058B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/30Imagewise removal using liquid means
    • G03F7/32Liquid compositions therefor, e.g. developers
    • G03F7/322Aqueous alkaline compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Description

【発明の詳細な説明】[Detailed description of the invention]

〔産業上の利用分野〕 本発明は、あらかじめアルミニウム支持体の表
面に感光性組成物を塗布して成る平版印刷版材
(オフセツトPS版)の現像剤に関するもので特に
ネガタイプPS版(感光性組成物がジアゾ化合物
を主体としている)及びポジタイプPS版(感光
性組成物がキノンジアジド化合物を主体としてい
る)を露光したあと両タイプPS版の非画像部を
除去するための現像剤に関するものである。 〔従来の技術〕 現在市販されているほとんどすべてのPS版は、
ネガタイプPS版においてはP−ジアゾフエニル
アミンのホルムアルデヒド縮合物に代表されるジ
アゾ化合物、又ポジタイプPS版においてキノン
ジアジド化合物と画像部強化の目的で配合された
カルボン酸を含有するアクリル系多元共重合体よ
り成る感光性組成物と表面親水性を付与したアル
ミニウム板とより構成されている。かゝるPS版
を用いて平版印刷用刷版をつくる過程において現
像剤の極めて大きな役割は、速やかに非画像部の
感光性樹脂層を溶解除去し、且つ現像によつて露
出したアルミ表面の親水性を低下させず、むしろ
それを助長し、一方活性光線により硬化した画像
部の樹脂層の親油性を損なわないことである。 〔発明が解決しようとする課題〕 しかしながら、上記現像剤として要求される役
割として非画像部の親水化を助長することは、逆
に画像部の親油性を低下させることもなりかねな
いし、現像速度を高めようとすれば画像部も相対
的に溶出され画像再現性に支障をきたすなど、
種々工夫を要し、現実に印刷時の版のよごれや刷
り出し時の着肉不良が現像剤に起因して発生する
ことも少なくない。 この様に版材に与える影響等を配慮してすでに
記述したネガタイプPS版とポジタイプPS版とで
は大別して異なる現像液が使用されている。しか
しながら、このように2種類の現像液を使い分け
することは現像作業を行なううえで繁雑であり作
業能率をあげるためには2台の現像機を必要とす
るなど不経済である。 本発明者は自社のオフセツトPS版用現像剤の
研究をおし進めるなかでネガタイプならびにポジ
タイプ両PS版に共用出来、然も現像スピードや
非画像部のアルミ表面の親水性維持能力等におい
て申し分のない新規な現像剤の発明に到達した。 〔課題を解決するための手段と作用〕 即ち本発明は、一般式R−O−CH2CH2OH
(式中Rはフエニル基又はベンジル基を示す。)で
表わされるエーテル化合物以下「特定エーテル化
合物」という、陰イオン界面活性剤及び週期律表
第1属Aに属するアルカリ金属の水酸化物、珪酸
塩及び四ホー酸塩の3成分からなるアルカリ性物
質を含むことを特徴とする感光性平版印刷版用現
像剤を提供するものである。 本発明における特定エーテル化合物は、より具
体的には、エチレングリコールモノフエニルエー
テル
[Industrial Application Field] The present invention relates to a developer for lithographic printing plate materials (offset PS plates) formed by coating the surface of an aluminum support with a photosensitive composition in advance, and particularly relates to a developer for negative type PS plates (offset PS plates). This relates to a developer for removing the non-image areas of both types of PS plates after exposure (the photosensitive composition is mainly composed of quinone diazide compounds) and positive type PS plates (the photosensitive composition is mainly composed of quinonediazide compounds). [Conventional technology] Almost all PS versions currently on the market are
For negative type PS plates, diazo compounds such as formaldehyde condensates of P-diazophenylamine, and for positive type PS plates, acrylic multi-component copolymers containing quinone diazide compounds and carboxylic acids for the purpose of strengthening image areas. It consists of a photosensitive composition consisting of a photosensitive composition and an aluminum plate whose surface has been imparted with hydrophilic properties. In the process of making lithographic printing plates using such PS plates, the extremely important role of the developer is to quickly dissolve and remove the photosensitive resin layer in the non-image area, and to remove the exposed aluminum surface by development. The purpose is not to reduce hydrophilicity, but rather to enhance it, while not impairing the lipophilicity of the resin layer in the image area cured by actinic rays. [Problems to be Solved by the Invention] However, promoting hydrophilization of non-image areas as a required role of the developer may conversely reduce the lipophilicity of image areas, and the development speed may be reduced. If you try to increase the image area, the image area will also be relatively eluted, causing problems with image reproducibility.
Various measures are required, and in reality, staining of the plate during printing and poor inkling at the start of printing are often caused by the developer. In this way, in consideration of the influence on the plate material, different developers are used for the negative type PS plate and the positive type PS plate, which have already been described. However, using two types of developing solutions differently in this way is complicated in the development work, and is uneconomical as it requires two developing machines to increase work efficiency. While conducting research on our company's offset PS plate developer, we discovered that it can be used for both negative type and positive type PS plates, and that it is perfect in terms of development speed and ability to maintain hydrophilicity of the aluminum surface in non-image areas. We have arrived at the invention of a new developer. [Means and effects for solving the problem] That is, the present invention solves the problem using the general formula R-O-CH 2 CH 2 OH
(In the formula, R represents a phenyl group or a benzyl group.) Anionic surfactants, hydroxides of alkali metals belonging to Group 1 A of the Periodic Table, silicic acids, hereinafter referred to as "specific ether compounds" The present invention provides a developer for a photosensitive lithographic printing plate, which is characterized by containing an alkaline substance consisting of three components: a salt and a tetrafolate. More specifically, the specific ether compound in the present invention is ethylene glycol monophenyl ether.

【式】とエチレン グリコールモノベンジルエーテル
[Formula] and ethylene glycol monobenzyl ether

【式】であり、 これ等は有機溶剤であつて、市販されている。 本発明に用いる陰イオン界面活性剤としては脂
肪酸塩{(R1COO)oMm}、アルキルベンゼンス
ルホン酸塩
[Formula] These are organic solvents and are commercially available. Examples of anionic surfactants used in the present invention include fatty acid salts {(R 1 COO) o Mm} and alkylbenzene sulfonates.

【式】アル キルスルホン酸塩{(R1−SO3oMm}、α−オレ
フインスルホン酸塩、{
[Formula] Alkyl sulfonate {(R 1 −SO 3 ) o Mm}, α-olefin sulfonate, {

【式】 Mm、【formula】 Mm,

【式】等の混合}、 ジアルキルスルホコハク酸塩
Mixture of [formula], etc.}, dialkyl sulfosuccinate

【式】 α−スルホン化脂肪酸塩【formula】 α-Sulfonated fatty acid salt

【式】 N−メチル−N−オレイルタウリン
[Formula] N-methyl-N-oleyl taurine

【式】 アルキル硫酸塩{R1OSO3oMm} ポリオキシエチレンアルキルフエニルエーテル硫
酸塩 アルキルリン酸塩
[Formula] Alkyl sulfate {R 1 OSO 3 ) o Mm} Polyoxyethylene alkyl phenyl ether sulfate Alkyl phosphate

【式】 ポリオキシエチレンアルキルエーテルリン酸塩
[Formula] Polyoxyethylene alkyl ether phosphate

【式】 ポリオキシエチレンアルキルフエニルエーテルリ
ン酸塩 ナフタレンスルホン酸塩ホルムアルデヒド縮合物 ナフタレンスルホン酸塩
[Formula] Polyoxyethylene alkyl phenyl ether phosphate Naphthalene sulfonate formaldehyde condensate naphthalene sulfonate

〔実施例〕〔Example〕

以下本発明を実施例により更に具体的に説明す
る。 実施例 1 日本製箔(株)製の市販のポジタイプPS版(アル
スターPS)とネガタイプPS版(アルスターNS)
に、それぞれ陽と陰の画像フイルムを重ねて
4KW超高圧水銀灯にて1mの距離から40秒間露
光し、つぎに示す組成の現像液にて室温(20℃)
下20秒間浸漬後水洗して未露光部を除去し平版印
刷版を得た。 エチレングリコールモノフエニルエーテル 10g アルキルナフタリンスルホン酸ソーダ 60g 水酸化ナトリウム 5g 水ガラス(3号、固形分50%) 5g 四ホー酸ソーダ 0.5g 水 919.5g この印刷版をハイデルKORD印刷機にかけて
上質紙にて印刷したところ、ネガタイプPS版な
らびにポジタイプPS版より得られたいずれの平
版印刷版も何ら支障なく5万部以上印刷すること
が出来た。 また、上記現像液を用いて前記露光後の各PS
版をオートプロセツサー600E(富士写真フイルム
株式会社製)の自動現像機にて20℃で60秒間現像
しその時の現像処理能力を調べたところ、ポジタ
イプ及びネガタイプいづれのPS版とも15m2
以上であつた。今までの現像液ではネガタイプ
PS版で10m2/ポジタイプPS版で3m2/が限
度であつたが、これらにくらべれば処理能力は極
めて高いものであつた。とりわけポジタイプPS
版に関しては約5倍の処理能力であり市販のポジ
タイプ現像液に類を見ない飛躍的な効果であつ
た。 実施例 2 次に示す市販のPS版を次に示す市販の現像液
及び本発明の現像液を用い、室温(20℃)で現像
速度を測定した。その結果は表−1、表−2に示
すとうりで現像速度に遜色なく、使用した市販の
PS版のすべてに適用出来る、すぐれた現像性を
示した。
The present invention will be explained in more detail below with reference to Examples. Example 1 Commercially available positive type PS plate (Ulstar PS) and negative type PS plate (Ulstar NS) manufactured by Nippon Seifuku Co., Ltd.
The positive and negative image films are layered on top of each other.
Exposure for 40 seconds from a distance of 1 m using a 4KW ultra-high pressure mercury lamp, and develop at room temperature (20℃) using a developer with the following composition.
After dipping for 20 seconds, the unexposed areas were removed by washing with water to obtain a lithographic printing plate. Ethylene glycol monophenyl ether 10g Sodium alkylnaphthalene sulfonate 60g Sodium hydroxide 5g Water glass (No. 3, solid content 50%) 5g Sodium tetraphorate 0.5g Water 919.5g This printing plate was printed on a Heidel KORD printing machine on high-quality paper. When printing was performed, more than 50,000 copies could be printed without any problems with both the lithographic printing plates obtained from the negative type PS plate and the positive type PS plate. In addition, each PS after the exposure using the above developer
The plate was developed at 20°C for 60 seconds using an automatic processing machine called Auto Processor 600E (manufactured by Fuji Photo Film Co., Ltd.), and the development processing capacity at that time was investigated .
That's all. Negative type with conventional developer
The limit was 10 m 2 for the PS version and 3 m 2 for the positive type PS version, but compared to these, the processing capacity was extremely high. Especially positive type PS
With regard to plates, the throughput was approximately five times greater, a dramatic effect unparalleled by commercially available positive type developers. Example 2 The development speed of the commercially available PS plate shown below was measured at room temperature (20°C) using the following commercially available developer and the developer of the present invention. As shown in Tables 1 and 2, the results showed that the development speed was comparable, and the commercially available
It showed excellent developability that can be applied to all PS plates.

【表】 尚、表中の現像速度は、底部寸法15×18cmのス
テンレス製バツトの中に現像液の100mlを入れ寸
法10×10cmのPS版(生版)を投入浸漬して10秒
毎に取り出し、水洗してプロテクトインキで版の
表面をぬぐい汚れが認められない時の浸漬時間で
示した。
[Table] The development speed in the table is as follows: Pour 100 ml of developer into a stainless steel vat with bottom dimensions of 15 x 18 cm, insert a PS plate (green plate) with dimensions of 10 x 10 cm, and immerse it every 10 seconds. The plate was taken out, washed with water, and the surface of the plate was wiped with protect ink, and the immersion time was measured when no stains were observed.

【表】【table】

【表】 実施例 3 実施例2において用いた現像速度測定用バツト
に本発明ならびに市販の各現像液100mlを注ぎそ
の後40℃にて18時間放置した。 次に各バツト内の残留物に、上記放置により減
少した量の水を加えて100mlとし、これらの現像
液を用いて実施例2と同様に現像速度を測定し
た。その結果は表−3、表−4に示す如くで本発
明の場合、ほとんど現像液放置による現像効果の
低下はみられなかつた。
[Table] Example 3 100 ml of each developer of the present invention and commercially available developers was poured into the vat for measuring development speed used in Example 2, and then left at 40°C for 18 hours. Next, to the residue in each vat, water was added in an amount reduced by the above-mentioned standing to make 100 ml, and the developing speed was measured in the same manner as in Example 2 using these developing solutions. The results are shown in Tables 3 and 4, and in the case of the present invention, there was almost no deterioration in the developing effect due to leaving the developer.

【表】【table】

【表】 実施例 4〜18 実施例1にて用いた日本製箔(株)製の市販のポジ
タイプPS版(アルスターPS)とネガタイプPS版
(アルスターNS)に、それぞれ陽画、陰画の画像
フイルムを重ねて4KW超高圧水銀灯にて1mの
距離から30秒間露光した後、次の表−5に示す現
像液にて平版印刷版を得た。
[Table] Examples 4 to 18 Positive and negative image films were applied to the commercially available positive type PS plate (Ulster PS) and negative type PS plate (Ulster NS) manufactured by Nippon Foil Co., Ltd. used in Example 1, respectively. After exposure for 30 seconds from a distance of 1 m using a 4KW ultra-high pressure mercury lamp, a lithographic printing plate was obtained using the developer shown in Table 5 below.

【表】【table】

〔発明の効果〕〔Effect of the invention〕

従来、各社のPS版に共通して適応できる現像
剤はなく、またネガタイプPS版とポジタイプPS
版に共通して適応できる現像剤もなかつたので、
オフセツト平版の印刷業者はPS版の使いわけに
応じて現像液の入れ替え作業を余儀なくされてい
たが、現像液の入れ替え作業は諸種の間違いの原
因となり易く、作業自体も煩雑である。ところ
が、本発明に係る現像剤は、各社のPS版に対し
ておしなべて良好な現像効果を発揮し、またネガ
タイプPS版とポジタイプPS版の両タイプのPS版
に対してもおしなべて良好な現像効果を発揮する
ので、叙上の問題点を解決することができる。 従つて、本発明は、顕著な効果を奏し、産業利
用性も高いものといえる。
Until now, there was no developer that could be commonly applied to PS plates from various companies, and there was
Since there was no developer that could be commonly applied to all plates,
Offset lithography printers have been forced to replace the developer depending on the use of the PS plate, but replacing the developer can easily cause various mistakes and the work itself is complicated. However, the developer according to the present invention exhibits good development effects on PS plates made by various companies, and also shows good development effects on both types of PS plates, negative type PS plates and positive type PS plates. The above problems can be solved because of this. Therefore, it can be said that the present invention has remarkable effects and has high industrial applicability.

Claims (1)

【特許請求の範囲】 1 一般式R−O−CH2CH2OH(式中Rはフエ
ニル基又はベンジル基を示す)で表されるエーテ
ル化合物と陰イオン界面活性剤と周期律表第1属
Aに属するアルカリ金属の水酸化物、珪酸塩及び
四ホー酸塩の3成分からなるアルカリ性物質とを
含むことを特徴とするネガタイプPS版並びにポ
ジタイプPS版共用型感光性平版印刷版用現像剤。 2 陰イオン界面活性剤がアルキルナフタレンス
ルホン酸塩である特許請求の範囲第1項記載のネ
ガタイプPS版並びにポジタイプPS版共用型感光
性平版印刷版用現像剤。
[Scope of Claims] 1. An ether compound represented by the general formula R-O-CH 2 CH 2 OH (wherein R represents a phenyl group or a benzyl group), an anionic surfactant, and a member of Group 1 of the Periodic Table. A developer for a photosensitive lithographic printing plate commonly used for negative-type PS plates and positive-type PS plates, characterized in that it contains an alkaline substance consisting of three components: an alkali metal hydroxide, a silicate, and a tetraphorate belonging to group A. 2. A developer for a photosensitive lithographic printing plate that can be used for negative-type PS plates and positive-type PS plates according to claim 1, wherein the anionic surfactant is an alkylnaphthalene sulfonate.
JP24075483A 1983-12-19 1983-12-19 Photosensitive lithographic plate developer Granted JPS60130741A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP24075483A JPS60130741A (en) 1983-12-19 1983-12-19 Photosensitive lithographic plate developer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP24075483A JPS60130741A (en) 1983-12-19 1983-12-19 Photosensitive lithographic plate developer

Publications (2)

Publication Number Publication Date
JPS60130741A JPS60130741A (en) 1985-07-12
JPH0364058B2 true JPH0364058B2 (en) 1991-10-03

Family

ID=17064210

Family Applications (1)

Application Number Title Priority Date Filing Date
JP24075483A Granted JPS60130741A (en) 1983-12-19 1983-12-19 Photosensitive lithographic plate developer

Country Status (1)

Country Link
JP (1) JPS60130741A (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62159148A (en) * 1986-01-07 1987-07-15 Konishiroku Photo Ind Co Ltd Developing solution composition for photosensitive lithographic plate and developing method
JPH07113768B2 (en) * 1986-01-20 1995-12-06 コニカ株式会社 Developer and developing method for photosensitive lithographic printing plate
JPH07113777B2 (en) * 1986-01-29 1995-12-06 コニカ株式会社 Developer and developing method for photosensitive lithographic printing plate
JPH02120745A (en) * 1988-10-29 1990-05-08 Somar Corp Aqueous developing solution for photosensitive resin

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4842802A (en) * 1971-10-04 1973-06-21
JPS50120627A (en) * 1974-02-26 1975-09-22
JPS5180228A (en) * 1975-01-10 1976-07-13 Fuji Photo Film Co Ltd GENZOEKISOSE IBUTSU
JPS5217901A (en) * 1975-07-31 1977-02-10 Mitsubishi Chem Ind Developer for lithographic press plate
JPS6097358A (en) * 1983-11-01 1985-05-31 Nippon Seihaku Kk Developer for photosensitive lithographic printing plate

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4842802A (en) * 1971-10-04 1973-06-21
JPS50120627A (en) * 1974-02-26 1975-09-22
JPS5180228A (en) * 1975-01-10 1976-07-13 Fuji Photo Film Co Ltd GENZOEKISOSE IBUTSU
JPS5217901A (en) * 1975-07-31 1977-02-10 Mitsubishi Chem Ind Developer for lithographic press plate
JPS6097358A (en) * 1983-11-01 1985-05-31 Nippon Seihaku Kk Developer for photosensitive lithographic printing plate

Also Published As

Publication number Publication date
JPS60130741A (en) 1985-07-12

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