JPH02120745A - Aqueous developing solution for photosensitive resin - Google Patents
Aqueous developing solution for photosensitive resinInfo
- Publication number
- JPH02120745A JPH02120745A JP27340988A JP27340988A JPH02120745A JP H02120745 A JPH02120745 A JP H02120745A JP 27340988 A JP27340988 A JP 27340988A JP 27340988 A JP27340988 A JP 27340988A JP H02120745 A JPH02120745 A JP H02120745A
- Authority
- JP
- Japan
- Prior art keywords
- development
- sulfonic acid
- developer
- photosensitive resin
- ratio
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011347 resin Substances 0.000 title claims abstract description 12
- 229920005989 resin Polymers 0.000 title claims abstract description 12
- PSZYNBSKGUBXEH-UHFFFAOYSA-N naphthalene-1-sulfonic acid Chemical compound C1=CC=C2C(S(=O)(=O)O)=CC=CC2=C1 PSZYNBSKGUBXEH-UHFFFAOYSA-N 0.000 claims abstract description 7
- 125000000542 sulfonic acid group Chemical group 0.000 claims abstract description 6
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims description 9
- -1 alkyl diphenyl ether Chemical compound 0.000 abstract description 8
- 239000004094 surface-active agent Substances 0.000 abstract description 7
- 239000001488 sodium phosphate Substances 0.000 abstract description 3
- 229910000162 sodium phosphate Inorganic materials 0.000 abstract description 3
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 abstract description 3
- USIUVYZYUHIAEV-UHFFFAOYSA-N diphenyl ether Natural products C=1C=CC=CC=1OC1=CC=CC=C1 USIUVYZYUHIAEV-UHFFFAOYSA-N 0.000 abstract description 2
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 abstract 1
- AOMUHOFOVNGZAN-UHFFFAOYSA-N N,N-bis(2-hydroxyethyl)dodecanamide Chemical compound CCCCCCCCCCCC(=O)N(CCO)CCO AOMUHOFOVNGZAN-UHFFFAOYSA-N 0.000 abstract 1
- 150000001408 amides Chemical class 0.000 abstract 1
- 239000007859 condensation product Substances 0.000 abstract 1
- 230000002950 deficient Effects 0.000 abstract 1
- 239000003002 pH adjusting agent Substances 0.000 abstract 1
- 239000002904 solvent Substances 0.000 abstract 1
- 239000011800 void material Substances 0.000 abstract 1
- 239000000126 substance Substances 0.000 description 9
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 6
- 230000000694 effects Effects 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- 235000013162 Cocos nucifera Nutrition 0.000 description 4
- 244000060011 Cocos nucifera Species 0.000 description 4
- 235000014113 dietary fatty acids Nutrition 0.000 description 4
- 239000000194 fatty acid Substances 0.000 description 4
- 229930195729 fatty acid Natural products 0.000 description 4
- 150000004665 fatty acids Chemical class 0.000 description 4
- 239000003960 organic solvent Substances 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 3
- 239000003513 alkali Substances 0.000 description 3
- 239000003945 anionic surfactant Substances 0.000 description 2
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- BNIILDVGGAEEIG-UHFFFAOYSA-L disodium hydrogen phosphate Chemical compound [Na+].[Na+].OP([O-])([O-])=O BNIILDVGGAEEIG-UHFFFAOYSA-L 0.000 description 2
- 229910000397 disodium phosphate Inorganic materials 0.000 description 2
- 235000019800 disodium phosphate Nutrition 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 235000011008 sodium phosphates Nutrition 0.000 description 2
- 230000008961 swelling Effects 0.000 description 2
- WBYWAXJHAXSJNI-VOTSOKGWSA-M .beta-Phenylacrylic acid Natural products [O-]C(=O)\C=C\C1=CC=CC=C1 WBYWAXJHAXSJNI-VOTSOKGWSA-M 0.000 description 1
- WBYWAXJHAXSJNI-SREVYHEPSA-N Cinnamic acid Chemical compound OC(=O)\C=C/C1=CC=CC=C1 WBYWAXJHAXSJNI-SREVYHEPSA-N 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- QPFYXYFORQJZEC-FOCLMDBBSA-N Phenazopyridine Chemical class NC1=NC(N)=CC=C1\N=N\C1=CC=CC=C1 QPFYXYFORQJZEC-FOCLMDBBSA-N 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 239000002280 amphoteric surfactant Substances 0.000 description 1
- 239000002518 antifoaming agent Substances 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 239000007853 buffer solution Substances 0.000 description 1
- 239000003093 cationic surfactant Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 229930016911 cinnamic acid Natural products 0.000 description 1
- 235000013985 cinnamic acid Nutrition 0.000 description 1
- 238000013329 compounding Methods 0.000 description 1
- 239000003431 cross linking reagent Substances 0.000 description 1
- 229960000878 docusate sodium Drugs 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 239000000706 filtrate Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- WBYWAXJHAXSJNI-UHFFFAOYSA-N methyl p-hydroxycinnamate Natural products OC(=O)C=CC1=CC=CC=C1 WBYWAXJHAXSJNI-UHFFFAOYSA-N 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 239000002736 nonionic surfactant Substances 0.000 description 1
- SBOJXQVPLKSXOG-UHFFFAOYSA-N o-amino-hydroxylamine Chemical compound NON SBOJXQVPLKSXOG-UHFFFAOYSA-N 0.000 description 1
- 238000007645 offset printing Methods 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- 150000003014 phosphoric acid esters Chemical class 0.000 description 1
- 238000011907 photodimerization Methods 0.000 description 1
- 239000003504 photosensitizing agent Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- APSBXTVYXVQYAB-UHFFFAOYSA-M sodium docusate Chemical compound [Na+].CCCCC(CC)COC(=O)CC(S([O-])(=O)=O)C(=O)OCC(CC)CCCC APSBXTVYXVQYAB-UHFFFAOYSA-M 0.000 description 1
- GGCZERPQGJTIQP-UHFFFAOYSA-N sodium;9,10-dioxoanthracene-2-sulfonic acid Chemical compound [Na+].C1=CC=C2C(=O)C3=CC(S(=O)(=O)O)=CC=C3C(=O)C2=C1 GGCZERPQGJTIQP-UHFFFAOYSA-N 0.000 description 1
- 150000003459 sulfonic acid esters Chemical class 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 1
Abstract
Description
【発明の詳細な説明】
（産業上の利用分野） □本発明は、特定
の物質を含む感光性樹脂用水系現像液に関する。本水系
現像液は、樹脂系（非狼塩系）感光剤に対し使用される
水系（非有機溶剤系）現像液である。
□ ・（従来技術と問題点）
“オフセット印刷に用いられるＰＳ板の製造や、プリン
ト配線基板を製造する工程では、ネガタイプの場合、板
に感光性樹脂含有感光液を塗布して露光し、その後、未
露光部分の不必要な感光層を現像除去して、画像を形成
させる。この際に用いられろ水系現像液には、従来、ア
ルカリ性物質、界面活性剤及び水等が含まれており、さ
らに、現像液の寿命を長くするためにｐＨ調整剤（バッ
ファー溶液）としてリン酸ナトリウム、リン酸水素ナト
リウム等が含まれていた。そして、従来の現像液では、
現像液に含まれている界面活性剤の量は、通常０．０１
〜０．１重量％（対現像液）、と少量であった。。DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to an aqueous developer for photosensitive resins containing a specific substance. This aqueous developer is an aqueous (non-organic solvent) developer used for resin-based (non-salt-based) photosensitizers.
□ ・(Conventional technology and problems)
“In the process of manufacturing PS boards used in offset printing and printed wiring boards, in the case of negative types, the board is coated with a photosensitive liquid containing a photosensitive resin and exposed, and then the unexposed areas are exposed to unnecessary light. The layer is developed and removed to form an image.The filtrate-based developer used at this time conventionally contains alkaline substances, surfactants, water, etc. Therefore, sodium phosphate, sodium hydrogen phosphate, etc. were included as pH adjusters (buffer solutions).
The amount of surfactant contained in the developer is usually 0.01
The amount was as small as ~0.1% by weight (based on the developer). .
このような従来のアルカリ現像液には、■最小点２０μ
前後の網点の現像が極端に悪いため、解像性が劣る、■
現像に長時間を要する等の欠点があった。Such a conventional alkaline developer has a minimum point of 20μ.
The development of the front and rear halftone dots is extremely poor, resulting in poor resolution.■
There were drawbacks such as a long time required for development.
（発明の目的及び構成）
本発明は、上記した従来技術にみる欠点を克服した新規
かつ改良された水系現像液を提供しようとするもめであ
る。(Object and Structure of the Invention) The present invention is an attempt to provide a new and improved aqueous developer that overcomes the drawbacks of the prior art described above.
本発明は下記のとおりのものである。The present invention is as follows.
（１） ジアルキロールアミド、スルホン酸基含有ア
ルキルジフェニルエーテル又は／及びナフタレンスルホ
ン酸縮合物を、現像液に対し０．３〜１．０重量％含む
感光性樹脂用水系現像液。(1) An aqueous developer for photosensitive resins containing 0.3 to 1.0% by weight of a dialkylolamide, a sulfonic acid group-containing alkyldiphenyl ether, or/and a naphthalene sulfonic acid condensate based on the developer.
本発明の水系現像液においては、含有される物質の種類
とその量の点が特に重要である。In the aqueous developer of the present invention, the types and amounts of substances contained are particularly important.
含有物質は、ジアルキロールアミド、スルホン酸基含有
アルキルジフェニルエーテル又は／及びナフタレンスル
ホン酸縮合物である。The contained substances are dialkylolamides, sulfonic acid group-containing alkyldiphenyl ethers, and/or naphthalenesulfonic acid condensates.
上記のジアルキロールアミドとしては、例えば、やし脂
肪酸ジメタツールアミド、やし脂肪酸ジェタノールアミ
ド（例えば東邦化学社製「トーホールＮ−２３０Ｊ ）
、やし脂肪酸ジブロバノールアミド、ラウリルジメタ
ツールアミド、ラウリルジェタノールアミド等が挙げら
れる。これらを１種又は２種以上使用することができる
。特に、ラウリルジェタノールアミド、やし脂肪酸ジェ
タノールアミドを使用することが好ましい。上記のスル
ホン酸基含有アルキルジフェニルエーテルやナフタレン
スルホン酸縮合物は、公知のものであって、これらに属
する具体例のそれぞれ１種又は２種以上を使用すること
ができる。Examples of the above-mentioned dialkylolamide include coconut fatty acid dimetatoolamide, coconut fatty acid jetanolamide (for example, Toho Kagaku Co., Ltd. "Tohol N-230J")
, coconut fatty acid dibrobanolamide, lauryl dimetatoolamide, lauryl jetanolamide, and the like. One or more types of these can be used. In particular, it is preferable to use lauryl getanolamide and coconut fatty acid getanolamide. The above-mentioned sulfonic acid group-containing alkyl diphenyl ethers and naphthalene sulfonic acid condensates are known, and one or more specific examples thereof can be used.
これら物質の液における含有量は、現像液に対し０．３
〜１．０重量％である。この含有量は、従来の水系現像
液における界面活性剤０．０１〜０．１重量％（前出）
に比し多量である。The content of these substances in the solution is 0.3 to the developer solution.
~1.0% by weight. This content is 0.01 to 0.1% by weight of surfactant in conventional aqueous developing solutions (as mentioned above).
It is a large amount compared to
本発明では、上記特定の範囲で特定物質を含有させるこ
とにより所期の効果が得られ、この範囲外では所期の効
果を得ることができない。すなわち、上記特定物質の含
有量が０．３重量％未溝の場合には、網点の最小点の部
分の現像抜けが不良となって、現像を完全に行うことが
できず、逆に、１．０重量％超の場合には、光硬化膜部
分に不都合な膨潤が生じて同じく現像が不良となって、
現像を完全に行うことができず、加えて、量を多くした
ことに見合ったメリットもない。In the present invention, the desired effect can be obtained by containing the specific substance within the above specified range, and the desired effect cannot be obtained outside this range. In other words, if the content of the specific substance is 0.3% by weight, there will be insufficient development at the minimum halftone dots, making it impossible to complete the development, and conversely, If it exceeds 1.0% by weight, undesirable swelling will occur in the photocured film portion, resulting in poor development.
Complete development cannot be carried out, and in addition, there is no merit commensurate with increasing the amount.
本発明においてジアルキロールアミド、スルホン酸含有
アルキルジフェニルエーテル又はナフタレンスルホン酸
縮合物を０．３〜１．０重量％添加する対象の実質的に
非有機溶剤系の現像液としては、例えば、水単独からな
るものや、水とアルカリからなるものや、水とアルカリ
と界面活性剤とからなるものなどが挙げられる。In the present invention, the substantially non-organic solvent-based developer to which 0.3 to 1.0% by weight of dialkylolamide, sulfonic acid-containing alkyldiphenyl ether or naphthalene sulfonic acid condensate is added is, for example, water alone. , water and alkali, and water, alkali, and surfactant.
本発明のアルカリ現像液には、本発明の目的に反さない
限り、適宜、適量、他の物質、例えば少量の有機溶剤、
具体的には２−ブトキシェタノール等や下記の公知の界
面活性剤を添加することができる。The alkaline developer of the present invention may contain other substances, such as a small amount of an organic solvent, in an appropriate amount, as long as it does not contradict the purpose of the present invention.
Specifically, 2-butoxyshetanol or the like and the following known surfactants can be added.
■アニオン界面活性剤として、カルボン酸型、硫酸エス
テル型、スルホン酸型、リン酸エステル型等が、■カチ
オン界面活性剤として、脂肪族アミ類、第４級アンモニ
ウム塩類、ピリジウム塩類等が、■両性界面活性剤とし
て、カルボン酸型、硫酸エステル型、スルホン酸型、リ
ン酸エステル型等が、■非イオン界面活性剤として、エ
ーテル型、エステル型、アミノエーテル型、エーテルエ
ステル型等が挙げられる。■Anionic surfactants include carboxylic acid type, sulfuric acid ester type, sulfonic acid ester type, phosphoric acid ester type, etc. ■Cationic surfactants include aliphatic amines, quaternary ammonium salts, pyridium salts, etc. Examples of amphoteric surfactants include carboxylic acid type, sulfate ester type, sulfonic acid type, phosphate ester type, etc. ■ Nonionic surfactants include ether type, ester type, aminoether type, ether ester type, etc. .
これらの中でもスルホン酸型アニオン界面活性剤、ジオ
クチルスルホサクシネート等は、優れた現像促進効果を
もたらし、特に好適とされる。Among these, sulfonic acid type anionic surfactants, dioctyl sulfosuccinate and the like are particularly preferred because they provide an excellent development accelerating effect.
これら界面活性剤の１種又は２種以上を併用してもよい
。One or more of these surfactants may be used in combination.
さらに、本発明の水系現像液には、本発明の目的に反さ
ない限り、適宜、適量、他の配合剤、例えば現像促進剤
や消泡剤等を添加してもよい。Furthermore, other compounding agents such as a development accelerator and an antifoaming agent may be added to the aqueous developer of the present invention in appropriate amounts as long as they do not contradict the purpose of the present invention.
本発明の水系現像液は、感光性樹脂用の用途に供される
ものである。ここに感光性樹脂としては、けい皮酸の光
二量化反応によって硬化する光架橋のものや、モノマー
又はオリゴマー等の架橋剤を含む光重合型のものなどが
挙げられる。The aqueous developer of the present invention is used for photosensitive resin applications. Examples of the photosensitive resin include photocrosslinked resins that are cured by a photodimerization reaction of cinnamic acid, and photopolymerizable resins containing a crosslinking agent such as a monomer or oligomer.
本発明の水系現像液の製造は、所定の物質を所定量均一
に混合することにより行われる。The aqueous developer of the present invention is produced by uniformly mixing predetermined amounts of predetermined substances.
本発明の水系現像液は、感光性樹脂をアルカリ（水溶液
）現像するのに使用されるものであって、もとより銀塩
系感光材や有機溶剤現像において使用されるものではな
い。The aqueous developer of the present invention is used for alkali (aqueous solution) development of photosensitive resins, and is not used for developing silver salt-based photosensitive materials or organic solvents.
本発明の水系現像液は、下記の効果を有する。 The aqueous developer of the present invention has the following effects.
■ 最小点２０μ前後の網点現像が良くなって、解像性
が良くなる。■ Improved halftone dot development around the minimum point of 20μ, resulting in improved resolution.
■ 現像により生じた網点のエツジの部分がシャープに
なる。■ Edges of halftone dots created by development become sharper.
■ 現像抜けが良くなることにより、膨潤がなく、光沢
のある画像が得られる。■ By improving the development throughput, a glossy image without swelling can be obtained.
■ 現像時間を短縮できる。■ Development time can be shortened.
実施例１
〔現像液の調製〕
リン酸ナトリウム（ＮａｚＰＯ４・１２１１ｚＯ）リン
酸水素ナトリウム（ＮａｌｌＰ０４・１１□０）２−ブ
トキシェタノール
ラウリルジェタノールアミド
水
０．３重量％
０．６重量％
１．５重量％
０．４重量％
９７．２重量％
〔現像液の使用〕
予めブラッシ研磨を施したアルミニウム板（縦４６７１
鳳、横４００龍、厚さ０．２龍）の片面に、ネガ型光重
合性感光液（商品名ＳＭＲ−ＡＮ、ソマール（株）製）
を、乾燥後の膜厚が６μｍとなるように塗布したのち、
温度６０℃のオーブン中で５分間加熱乾燥し、感光層を
形成させた。Example 1 [Preparation of developer] Sodium phosphate (NazPO4.1211zO) Sodium hydrogen phosphate (NallP04.11□0) 2-Butoxyshetanol Lauryl jetanolamide Water 0.3% by weight 0.6% by weight 1. 5% by weight 0.4% by weight 97.2% by weight [Usage of developer] Aluminum plate (vertical 4671
A negative photopolymerizable photosensitive liquid (trade name: SMR-AN, manufactured by Somar Co., Ltd.) was applied on one side of the paper.
was applied so that the film thickness after drying was 6 μm,
The film was dried by heating in an oven at a temperature of 60° C. for 5 minutes to form a photosensitive layer.
この感光層上に網点をパターンフィルム〔デュポン社製
ＤＯＴ ５ＩＺＥ Ｃ０ＮＰＡＲＡＴＯＲ（Ａ−
６４０９４）製〕を密着し、露光機（ジェットライト
オーク社製２ｋＷ）を用い、光源から１ｍの距離で３０
秒間露光した。A halftone dot pattern film [DOT 5IZE C0NPARATOR (A-
64094)] and exposed using an exposure machine (jet light).
30 at a distance of 1m from the light source.
Exposure for seconds.
露光された感光層について、上記の調製した現像液を用
い、現像液温度を２４℃に保持し、１．３分間浸漬現像
を行った。The exposed photosensitive layer was subjected to immersion development for 1.3 minutes using the developer prepared above and maintaining the developer temperature at 24°C.
現像後のパターンは、きわめてきれいな網点て、再現性
も良好で、最小点２０μｍの網点も確実に現像されてい
た。また、硬化部分は膨潤もなく、光沢のあるレジスト
層を形成していた。さらに、未露光部の感光層は完全に
除去され、その残渣は認められなかった。The pattern after development had extremely clear halftone dots and good reproducibility, and even halftone dots with a minimum point of 20 μm were reliably developed. Furthermore, the cured portion did not swell, forming a glossy resist layer. Furthermore, the photosensitive layer in the unexposed areas was completely removed, and no residue was observed.
実施例２〜８及び比較例１〜４
上記実施例１においてラウリルジェタノールアミド（Ｌ
ＤＡ）の量を下記第１表のように変化させた以外は、実
施例１と同様にして現像液を調製した。Examples 2 to 8 and Comparative Examples 1 to 4 In Example 1 above, lauryl jetanolamide (L
A developer was prepared in the same manner as in Example 1, except that the amount of DA) was changed as shown in Table 1 below.
得られた現像液を使用して実施例１と同様にして現像を
行ったところ、第１表に示す結果を得た。When the obtained developer was used for development in the same manner as in Example 1, the results shown in Table 1 were obtained.
実施例９
上記実施例１においてラウリルジェタノールアミドの代
りに、市販のスルホン酸基含有アルキルジフェニルエー
テル又は同ナフタレンスルホン酸縮合物を使用した以外
は、実施例１と同様にして現像液を調製した。Example 9 A developing solution was prepared in the same manner as in Example 1, except that a commercially available sulfonic acid group-containing alkyl diphenyl ether or a naphthalene sulfonic acid condensate was used instead of lauryl jetanolamide.
得られた現像液を使用して現像を行ったところ、実施例
１と同様の良好な結果が得られた。When the obtained developer was used for development, the same good results as in Example 1 were obtained.
Claims (1)
ルジフェニルエーテル又は／及びナフタレンスルホン酸
縮合物を、現像液に対し０．３〜１．０重量％含む感光
性樹脂用水系現像液。(1) An aqueous developer for photosensitive resins containing 0.3 to 1.0% by weight of a dialkylolamide, a sulfonic acid group-containing alkyldiphenyl ether, or/and a naphthalene sulfonic acid condensate based on the developer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP27340988A JPH02120745A (en) | 1988-10-29 | 1988-10-29 | Aqueous developing solution for photosensitive resin |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP27340988A JPH02120745A (en) | 1988-10-29 | 1988-10-29 | Aqueous developing solution for photosensitive resin |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH02120745A true JPH02120745A (en) | 1990-05-08 |
Family
ID=17527488
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP27340988A Pending JPH02120745A (en) | 1988-10-29 | 1988-10-29 | Aqueous developing solution for photosensitive resin |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02120745A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04204454A (en) * | 1990-11-30 | 1992-07-24 | Tokyo Ohka Kogyo Co Ltd | Developer composition for resist |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59198452A (en) * | 1983-04-25 | 1984-11-10 | Fuji Photo Film Co Ltd | Developing solution composition |
| JPS60130741A (en) * | 1983-12-19 | 1985-07-12 | Nippon Seihaku Kk | Photosensitive lithographic plate developer |
-
1988
- 1988-10-29 JP JP27340988A patent/JPH02120745A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59198452A (en) * | 1983-04-25 | 1984-11-10 | Fuji Photo Film Co Ltd | Developing solution composition |
| JPS60130741A (en) * | 1983-12-19 | 1985-07-12 | Nippon Seihaku Kk | Photosensitive lithographic plate developer |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04204454A (en) * | 1990-11-30 | 1992-07-24 | Tokyo Ohka Kogyo Co Ltd | Developer composition for resist |
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