JPH0359813A - Thin-film magnetic head - Google Patents
Thin-film magnetic headInfo
- Publication number
- JPH0359813A JPH0359813A JP19466589A JP19466589A JPH0359813A JP H0359813 A JPH0359813 A JP H0359813A JP 19466589 A JP19466589 A JP 19466589A JP 19466589 A JP19466589 A JP 19466589A JP H0359813 A JPH0359813 A JP H0359813A
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- magnetic
- magnetic head
- oxide
- medium
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000010409 thin film Substances 0.000 title claims abstract description 49
- 239000000919 ceramic Substances 0.000 claims abstract description 17
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 12
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims abstract description 11
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 claims abstract description 10
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 claims abstract description 9
- 229910001928 zirconium oxide Inorganic materials 0.000 claims abstract description 9
- KKCBUQHMOMHUOY-UHFFFAOYSA-N Na2O Inorganic materials [O-2].[Na+].[Na+] KKCBUQHMOMHUOY-UHFFFAOYSA-N 0.000 claims abstract description 7
- 239000012535 impurity Substances 0.000 claims abstract description 5
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 10
- 239000010408 film Substances 0.000 claims description 9
- 238000004544 sputter deposition Methods 0.000 claims description 8
- 230000001681 protective effect Effects 0.000 claims description 7
- 238000003486 chemical etching Methods 0.000 claims description 2
- WMVRXDZNYVJBAH-UHFFFAOYSA-N dioxoiron Chemical compound O=[Fe]=O WMVRXDZNYVJBAH-UHFFFAOYSA-N 0.000 claims description 2
- 238000001312 dry etching Methods 0.000 claims description 2
- 238000000034 method Methods 0.000 claims description 2
- 238000007747 plating Methods 0.000 claims description 2
- 229910001948 sodium oxide Inorganic materials 0.000 claims description 2
- 239000000126 substance Substances 0.000 claims description 2
- 238000007740 vapor deposition Methods 0.000 claims description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 abstract description 27
- 239000000463 material Substances 0.000 abstract description 19
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 abstract description 8
- -1 FeO3 Inorganic materials 0.000 abstract description 3
- 230000003068 static effect Effects 0.000 abstract description 2
- 229910052681 coesite Inorganic materials 0.000 abstract 1
- 229910052906 cristobalite Inorganic materials 0.000 abstract 1
- 239000000377 silicon dioxide Substances 0.000 abstract 1
- 235000012239 silicon dioxide Nutrition 0.000 abstract 1
- 229910052682 stishovite Inorganic materials 0.000 abstract 1
- 229910052905 tridymite Inorganic materials 0.000 abstract 1
- 239000000758 substrate Substances 0.000 description 19
- 229910001308 Zinc ferrite Inorganic materials 0.000 description 8
- 239000011521 glass Substances 0.000 description 8
- WGEATSXPYVGFCC-UHFFFAOYSA-N zinc ferrite Chemical compound O=[Zn].O=[Fe]O[Fe]=O WGEATSXPYVGFCC-UHFFFAOYSA-N 0.000 description 8
- 229910000702 sendust Inorganic materials 0.000 description 7
- 239000012790 adhesive layer Substances 0.000 description 5
- 238000005452 bending Methods 0.000 description 5
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 4
- 229910002113 barium titanate Inorganic materials 0.000 description 4
- JRPBQTZRNDNNOP-UHFFFAOYSA-N barium titanate Chemical compound [Ba+2].[Ba+2].[O-][Ti]([O-])([O-])[O-] JRPBQTZRNDNNOP-UHFFFAOYSA-N 0.000 description 4
- 229910000889 permalloy Inorganic materials 0.000 description 4
- 229910018605 Ni—Zn Inorganic materials 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000004804 winding Methods 0.000 description 3
- 229910000859 α-Fe Inorganic materials 0.000 description 3
- 238000005299 abrasion Methods 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- BRPQOXSCLDDYGP-UHFFFAOYSA-N calcium oxide Chemical compound [O-2].[Ca+2] BRPQOXSCLDDYGP-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 230000006378 damage Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 2
- 239000000395 magnesium oxide Substances 0.000 description 2
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 2
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 238000005498 polishing Methods 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910000599 Cr alloy Inorganic materials 0.000 description 1
- 239000000292 calcium oxide Substances 0.000 description 1
- ODINCKMPIJJUCX-UHFFFAOYSA-N calcium oxide Inorganic materials [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 description 1
- AOWKSNWVBZGMTJ-UHFFFAOYSA-N calcium titanate Chemical compound [Ca+2].[O-][Ti]([O-])=O AOWKSNWVBZGMTJ-UHFFFAOYSA-N 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 239000000788 chromium alloy Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 229910052593 corundum Inorganic materials 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 229910001845 yogo sapphire Inorganic materials 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Magnetic Heads (AREA)
Abstract
Description
【発明の詳細な説明】
イ０発明の目的
〔産業上の利用分野〕
本発明は、耐久性、耐摩耗性に優れ、高密度磁気記録に
適した薄膜磁気ヘッドに関するものである。DETAILED DESCRIPTION OF THE INVENTION Object of the Invention [Field of Industrial Application] The present invention relates to a thin film magnetic head that has excellent durability and wear resistance and is suitable for high-density magnetic recording.
従来の薄膜磁気ヘッドにおいて、耐久性、耐摩耗性を左
右する媒体摺動面は、第４図に示すようなＮｉ−Ｚｎフ
ェライト等から成る磁性基板１４、センダスト、又はパ
ーマロイ等から成る上部磁性コア１２ａ、酸化硅素（Ｓ
ｉＯ２）から成る非磁性空隙部１７、センダスト、パー
マロイ等から成る下部磁性コア１２ｂ、アルミナ（Ａ１
２Ｏ３）から成る保護膜１６、接着用ガラス１０、チタ
ン酸バリウム（ＢａＴｉ０２）等から成る非磁性基板１
５から形成されるか、第５図に示すような亜鉛フェライ
ト（ＺｎＦｅ、Ｏ：＋）等から成る非磁性基板１９ａ、
センダスト、パーマロイ等から成る上部磁性コア１２ａ
、酸化硅素（ＳｉＯ２）等から成る非磁性空隙部１７、
センダスト、パーマロイ等から成る下部磁性コア１２ｂ
、アルミナ（Ａ１２Ｏ３）の薄膜の保護膜１６、ガラス
接着層１０、亜鉛フェライト（ＺｎＦｅ２Ｏ４）等から
成る非磁性基板１９ｂから形成されており、媒体摺動面
には磁性コア以外に基板保護膜、非磁性空隙部等各種の
材料が組合せ形成されている。In a conventional thin-film magnetic head, the medium sliding surface, which determines durability and wear resistance, consists of a magnetic substrate 14 made of Ni-Zn ferrite, etc., as shown in FIG. 4, and an upper magnetic core made of sendust, permalloy, etc. 12a, silicon oxide (S
iO2), a lower magnetic core 12b made of sendust, permalloy, etc., alumina (A1
A protective film 16 made of 2O3), an adhesive glass 10, a nonmagnetic substrate 1 made of barium titanate (BaTi02), etc.
5 or a non-magnetic substrate 19a made of zinc ferrite (ZnFe, O:+) or the like as shown in FIG.
Upper magnetic core 12a made of sendust, permalloy, etc.
, a non-magnetic gap 17 made of silicon oxide (SiO2), etc.
Lower magnetic core 12b made of sendust, permalloy, etc.
, a thin protective film 16 of alumina (A12O3), a glass adhesive layer 10, and a nonmagnetic substrate 19b made of zinc ferrite (ZnFe2O4). Various materials such as magnetic voids are combined and formed.
上記のように媒体摺動面は、磁性コア以外に基板、保護
膜、非磁性空隙部等、各種の材料から形成されており、
摺動面はこのような構造であるため、磁気ヘッドの媒体
摺動面の最終仕上げ時の表面研磨において異なる材料の
間に段差を発生し、媒体と、磁気ヘッドの電磁変換部と
の間に間隙を生じ、高密度磁気記録再生時に出力の低下
を招いたり、段差部におて媒体を損傷するなどして、ヘ
ッドの耐久性を損なう結果になっている。さらに摺動面
において摺動面を形成する夫々の材質が異なるため、耐
久性において問題が発生していた。As mentioned above, the medium sliding surface is made of various materials in addition to the magnetic core, such as a substrate, a protective film, and a non-magnetic gap.
Because the sliding surface has such a structure, during surface polishing during final finishing of the medium sliding surface of the magnetic head, a step is generated between different materials, and a step is created between the medium and the electromagnetic transducer of the magnetic head. This results in the creation of gaps, resulting in a drop in output during high-density magnetic recording and reproduction, and damage to the medium at the stepped portions, which impairs the durability of the head. Furthermore, since the materials forming the sliding surfaces are different, problems have arisen in terms of durability.
また、媒体摺動面に現在使われている磁性もしくは非磁
性基板は、磁性基板としてはＮｉ−Ｚｎフェライト、非
磁性基板としては亜鉛フェライト（ＺｎＦｅ２Ｏ４）、
チタン酸バリウム（ＢａＴｉＯ：＋）であるが、硬度は
ビッカース硬度で約６００〜８００であり、コバルト・
クロム合金等のメタル薄膜媒体の硬い記録媒体において
は、耐久性並びに耐摩耗性に関して問題があり、本発明
は長時間の走行においても耐久性、耐摩耗性に優れた特
性を示す薄膜磁気ヘッドを提供するにある。In addition, the magnetic or non-magnetic substrates currently used for the media sliding surface are Ni-Zn ferrite for the magnetic substrate, zinc ferrite (ZnFe2O4) for the non-magnetic substrate,
Barium titanate (BaTiO:+) has a hardness of about 600 to 800 on the Vickers scale, and it has a hardness of about 600 to 800 on the Vickers scale.
Hard recording media such as metal thin film media such as chromium alloys have problems with durability and abrasion resistance, and the present invention provides a thin film magnetic head that exhibits excellent durability and abrasion resistance even when running for a long time. It is on offer.
口９発明の構成
〔課題を解決するための手段〕
本発明は薄膜磁気ヘッドにおいて媒体摺動面を硬度、靭
性に優れた特徴を持つ同一の材質により構成し、特に表
−１に示すように、従来のこの種の材料に比べて硬度、
靭性、抗折強度の大きいアルミナ・ジルコニア系セラミ
ックスを用いたことを特徴とする。9. Structure of the Invention [Means for Solving the Problems] The present invention comprises a thin film magnetic head in which the medium sliding surface is made of the same material that has excellent characteristics of hardness and toughness, and particularly as shown in Table 1. , hardness compared to conventional materials of this kind;
It is characterized by the use of alumina-zirconia ceramics that have high toughness and bending strength.
即ち本発明はスパッタリング、又はメッキ、又は蒸着等
の手段によって磁性薄膜と保護膜とを形成し、ケミカル
、又はドライエツチングの手法により各部のエツチング
を行って形成する薄膜磁気ヘッドにおいて、上部磁性コ
ア、下部磁性コアから成る磁性膜を除き磁気記録媒体と
摺動する面を、酸化ジルコニウム（ＺｒＯ２）５０〜８
０重量％、酸化アルミニウム（Ａｌ２Ｏ２）４５〜１５
重量％、酸化イツトリウム（Ｙ２Ｏ２）２〜１０重量％
、及びその他の不純物として、酸化珪素（ＳｉＯ２）、
二酸化鉄（Ｆｅ２Ｏ３）、酸化ナトリウム（Ｎａ２Ｏ）
を０．１重量％以下を含むセラミックスとすることを特
徴とする薄膜磁気ヘッドである。That is, the present invention provides a thin film magnetic head in which a magnetic thin film and a protective film are formed by means such as sputtering, plating, or vapor deposition, and each part is etched by a chemical or dry etching method. Except for the magnetic film comprising the lower magnetic core, the surface that slides on the magnetic recording medium is made of zirconium oxide (ZrO2) 50-8
0% by weight, aluminum oxide (Al2O2) 45-15
Weight%, yttrium oxide (Y2O2) 2-10% by weight
, and other impurities include silicon oxide (SiO2),
Iron dioxide (Fe2O3), sodium oxide (Na2O)
A thin film magnetic head characterized in that it is made of ceramic containing 0.1% by weight or less of.
表−１
〔作用〕
媒体摺動面を、電磁変換を行う磁性コアの部分を除き、
高い硬度と、高い靭性と、高い抗折強度を持つ同一材質
にするもので、摺動面が同一の材質であるため媒体摺動
面に段差を生ぜず、媒体摺動面のどの部分においても、
動摩耗係数、静摩擦係数が等しいため、媒体摺動面にお
ける耐摩耗特性が良好な薄膜磁気ヘッドを構成出来、耐
久性、耐摩耗性に優れ、高密度記録に適した薄膜磁気ヘ
ッドを提供するものである。Table 1 [Function] The media sliding surface, excluding the magnetic core part that performs electromagnetic conversion,
The material is made of the same material with high hardness, high toughness, and high bending strength.Since the sliding surface is made of the same material, there is no difference in level on the media sliding surface, and there is no difference in any part of the media sliding surface. ,
Since the coefficient of dynamic wear and the coefficient of static friction are equal, it is possible to construct a thin film magnetic head with good wear resistance on the sliding surface of the medium, providing a thin film magnetic head with excellent durability and wear resistance and suitable for high-density recording. It is.
本発明の薄膜磁気ヘッドにおいて、媒体摺動面に使用す
るアルミナ・ジルコニア系セラミックスは、酸化ジルコ
ニウム（ＺｒＯ２）が５０〜８０重量％、酸化アルミニ
ウム（Ａ１２Ｏ３）が４５〜１５重量％、酸化イツトリ
ウム（Ｙ２Ｏ２）が１０〜２重量％、その他の不純物と
して酸化珪素（ＳｉＯ２）、酸化鉄（Ｆｅ２Ｏ３）、酸
化ナトリウム（Ｎａ２Ｏ）を合計で０．１重量％以下を
含むセラミックスで、硬度がビッカース硬度１２Ｏ０〜
１５００を示す硬いしかも高い抗折強度の材料であり、
従来の薄膜磁気ヘッドの摺動面に用いていた材料に比べ
て硬度がほぼ２倍以上の材料である。In the thin film magnetic head of the present invention, the alumina-zirconia ceramic used for the medium sliding surface contains 50 to 80% by weight of zirconium oxide (ZrO2), 45 to 15% by weight of aluminum oxide (A12O3), and yttrium oxide (Y2O2). ) and 0.1% by weight or less of other impurities such as silicon oxide (SiO2), iron oxide (Fe2O3), and sodium oxide (Na2O), and has a Vickers hardness of 12O0 to
It is a material with a hard and high bending strength of 1500,
This material is approximately twice as hard as the material used for the sliding surfaces of conventional thin-film magnetic heads.
本究明の薄膜磁気ヘッドの摺動面に使用するアルミナ・
ジルコニア系セラミックスは、酸化アルミニウムの成分
比の値が高くなると硬度は高くなるが靭性或いは抗折強
度の値が低くなり、一方酸化アルミニウムの成分比の値
が低く酸化ジルコニウムの成分比の値が高くなると、靭
性、抗折力の値は高くなるが硬度は低くなる。又酸化イ
ツトリウムはアルミナ・ジルコニア系セラミックスの結
晶構造の変化に伴って生ずる亀裂や破壊を防止するため
に添加される安定剤で、酸化イツトリウムの他、酸化カ
ルシウム（Ｃａｂ）、酸化マグネシウム（ＭｇＯ）も酸
化イッＩ・リウムと同様な効果を持つ。従って本発明の
薄膜磁気ヘッドに用いるアルミナ・ジルコニア系セラミ
ックスは、硬度、靭性、抗折強度等の値から、酸化ジル
コニウムの値は５０〜８０重量％、酸化アルミニウム４
５〜１５重量％、酸化イツトリウム２〜１０重量％の組
成を持つ範囲のアルミナ・ジルコニア系セラミックスと
することにより寿命の長い薄膜磁気ヘッドとすることが
出来る。Alumina used for the sliding surface of the thin-film magnetic head developed in this study.
In zirconia ceramics, the higher the aluminum oxide component ratio, the higher the hardness, but the lower the toughness or bending strength.On the other hand, the lower the aluminum oxide component ratio, the higher the zirconium oxide component ratio. In this case, the values of toughness and transverse rupture strength become high, but the hardness becomes low. Yttrium oxide is a stabilizer added to prevent cracks and destruction that occur due to changes in the crystal structure of alumina-zirconia ceramics.In addition to yttrium oxide, calcium oxide (Cab) and magnesium oxide (MgO) are also used. It has the same effect as I/Liium oxide. Therefore, in the alumina-zirconia ceramics used in the thin film magnetic head of the present invention, the value of zirconium oxide is 50 to 80% by weight, aluminum oxide 4
By using alumina-zirconia ceramics having a composition of 5 to 15% by weight and 2 to 10% by weight of yttrium oxide, a thin film magnetic head with a long life can be obtained.
本開明の実施例について図面を参照しながら説明する。 Embodiments of the present invention will be described with reference to the drawings.
第１図に本発明による薄膜磁気ヘッドの媒体摺動面を示
す。本発明による薄膜磁気ヘッドの媒体摺動面１ａ、１
ｂ、３ａ、３ｂ、３ｃは電磁変換部の磁性薄膜部２ａ、
２ｂ以外は、すべて同一の材質である酸化ジルコニウム
５０〜８０重量％、酸化アルミニウム４５〜１５重量％
、酸化イツトリウム１０〜２重量％、その他不純物とし
てＳｉＯ２、Ｆｅ２Ｏ：＋、Ｎａ２Ｏを含むアルミナ・
ジルコニア系セラミックスから形成されている。第２図
に巻線を形成する薄膜コイル１１をスパイラル形で形成
した薄膜磁気ヘッドの断面図を示す。以下に本発明によ
る薄膜磁気ヘッドの製造工程の一例を第３図を用いて簡
単に説明する。FIG. 1 shows a medium sliding surface of a thin film magnetic head according to the present invention. Medium sliding surfaces 1a, 1 of thin film magnetic head according to the present invention
b, 3a, 3b, 3c are magnetic thin film portions 2a of the electromagnetic conversion section;
All materials except 2b are the same: 50-80% by weight of zirconium oxide, 45-15% by weight of aluminum oxide.
, 10 to 2% by weight of yttrium oxide, and alumina containing SiO2, Fe2O:+, Na2O as other impurities.
It is made of zirconia ceramics. FIG. 2 shows a sectional view of a thin film magnetic head in which a thin film coil 11 forming a winding is formed in a spiral shape. An example of the manufacturing process of the thin film magnetic head according to the present invention will be briefly explained below with reference to FIG.
イ）第３図（ａ）に於て、アルミナ・ジルコニア系非磁
性基板ｌａ上に上部磁性コア２ａであるセンダストをス
パッタにより、厚さ７μｍに形成する。b) In FIG. 3(a), Sendust, which is the upper magnetic core 2a, is formed to a thickness of 7 μm on the alumina-zirconia nonmagnetic substrate la by sputtering.
口）第３図（ｂ）に示すように、アルミナ・ジルコニア
系セラミックスの非磁性薄膜３ａにより非磁性空隙部を
空隙長だけスパッタで形成する。ここでは厚さを０．３
μｍとした。(b) As shown in FIG. 3(b), a non-magnetic gap is formed by sputtering using a non-magnetic thin film 3a of alumina-zirconia ceramic based on the gap length. Here, the thickness is 0.3
It was set as μm.
ハ）第３図（ｃ）に於て、巻線を形成する薄膜コイル１
１は銅（Ｃｕ）をスパッタとエツチングにより形成し、
又コイル形成時に生じた段差を平坦化するため、その上
にスパッタによりアルミナ・ジルコニア系非磁性薄膜３
ｂを形成する。c) In Fig. 3(c), the thin film coil 1 forming the winding
1 is formed by sputtering and etching copper (Cu),
In addition, in order to flatten the level difference that occurred during coil formation, alumina-zirconia based non-magnetic thin film 3 is deposited on top of it by sputtering.
form b.
二）第３図（ｄ）に於ては、センダストをスパッタし下
部磁性コア２ｂを７μｍ厚さに形成する。2) In FIG. 3(d), sendust is sputtered to form the lower magnetic core 2b to a thickness of 7 μm.
ホ）第３図（ｅ）に於ては、アルミナ・ジルコニア系非
磁性薄膜をスパッタ法を用いて３０〜４０μｍの厚さに
形成し平坦化を行う。e) In FIG. 3(e), an alumina-zirconia based non-magnetic thin film is formed to a thickness of 30 to 40 μm using a sputtering method and flattened.
へ）第３図（ｆ）に示すようにもう一方の非磁性基板１
ａ上にガラスを０．０１μｍスパッタで形成し、電磁変
換部を形成した基板と接着層１０によりガラス接着を行
う。to) the other non-magnetic substrate 1 as shown in Figure 3(f).
Glass is formed on a by sputtering to a thickness of 0.01 μm, and the glass is bonded to the substrate on which the electromagnetic transducer is formed using the adhesive layer 10.
ト）第３図（ｇ）は媒体摺動面を適当な空隙深さ（ここ
では７μｍとしている）に研磨し、薄膜磁気ヘッドに完
成した断面図を示す。g) FIG. 3(g) shows a cross-sectional view of a completed thin-film magnetic head obtained by polishing the medium sliding surface to an appropriate gap depth (here, 7 μm).
上記工程により、媒体摺動面にはアルミナ・ジルコニア
系セラミックス１ａ、１ｂ、３．センダスト薄膜を用い
た上部磁性コア２ａ、下部磁性コア２ｂと接着層が０．
０１μｍのガラス接着層により形成される。Through the above steps, the media sliding surface is made of alumina-zirconia ceramics 1a, 1b, 3. The upper magnetic core 2a, the lower magnetic core 2b, and the adhesive layer are made of Sendust thin film.
It is formed by a glass adhesive layer of 0.01 μm.
また本発明の実施例の非磁性基板、保護膜に使用したア
ルミナジルコニア系セラミックスの組成は、ジルコニア
Ｚｒ０２（７５，７ｗｔ％）、イツトリウムＹ２Ｏ：ｌ
（４，２ｗｔ％）、アルミナＡｌ２Ｏ３（２Ｏｗｔ％
）、酸化硅素５ｉ０２（０，０１ｗｔ％）、酸化鉄Ｆｅ
２Ｏ３（０，００５ｗｔ％）、酸化ナトリウムＮａ２Ｏ
（０，００７ｗｔ％）であり、ビッカーズ硬度Ｈｖ１５
００、靭性１４ＭＮ／ｎ＋””、まげ強度２４０ｋｇｆ
／ｍｍ２であり、表−１に示す従来の摺動材料であるチ
タン酸バリウム（ＢａＴｉＯ：＋）、Ｎｉ−Ｚｎフェラ
イト、亜鉛フェライト（ＺｎＦｅ２Ｏ３ ）に比較して
、高硬度、高靭性、高抗折強度の材料である。Furthermore, the composition of the alumina-zirconia ceramics used for the non-magnetic substrate and protective film in the examples of the present invention is zirconia Zr02 (75.7 wt%), yttrium Y2O:l
(4.2wt%), alumina Al2O3 (2Owt%)
), silicon oxide 5i02 (0.01wt%), iron oxide Fe
2O3 (0,005wt%), sodium oxide Na2O
(0,007wt%) and Vickers hardness Hv15
00, toughness 14MN/n+"", bend strength 240kgf
/mm2, and compared to the conventional sliding materials barium titanate (BaTiO:+), Ni-Zn ferrite, and zinc ferrite (ZnFe2O3) shown in Table 1, it has high hardness, high toughness, and high bending strength. It is a strong material.
又薄膜磁気ヘッドの非磁性基板にアルミナ・ジルコニア
系セラミックス、チタン酸カルシウム、亜鉛フェライト
、結晶化ガラスを用い、Ｃｏ−Ｃｒ Ｚ層膜磁気記録媒
体をスパッタした２インチ径フロッピィディスクを用い
、３６００ｒｐｍ、周速がほぼ７ｍ／秒で駆動した時の
耐久試験の結果を表−２に示す。In addition, alumina-zirconia ceramics, calcium titanate, zinc ferrite, and crystallized glass were used as the non-magnetic substrate of the thin-film magnetic head, and a 2-inch diameter floppy disk sputtered with a Co-Cr Z layer magnetic recording medium was used, and the head was operated at 3600 rpm. Table 2 shows the results of the durability test when driven at a circumferential speed of approximately 7 m/sec.
耐久試験の値は、出力がＯになる迄のフロッピィディス
クの回転した数を示す。The durability test value indicates the number of rotations of the floppy disk until the output reaches O.
以下余白
表−２
表−２の結果に示すように本発明によるアルミナ・ジル
コニア系セラミックスを、薄膜磁気ヘッドの基板として
用いることにより従来の５倍以上の寿命の長い薄膜磁気
ヘッドを提供出来るようになった。Margin Table 2 Below: As shown in Table 2, by using the alumina-zirconia ceramics of the present invention as a substrate for a thin film magnetic head, it is possible to provide a thin film magnetic head with a lifespan more than 5 times longer than conventional ones. became.
ハ０発明の効果
〔発明の効果〕
本発明の薄膜磁気ヘッドは、媒体摺動面の段差は１００
オングストローム以下におさえることが可能になり、メ
タルの薄膜磁気記録媒体（Ｃｏ−Ｃｒ）においても２Ｏ
００万バス以上の耐久性を確認した。Effects of the invention [Effects of the invention] The thin film magnetic head of the invention has a height difference of 100 on the medium sliding surface.
It is now possible to keep the 2O
Confirmed durability over 1,000,000 buses.
このように、薄膜磁気ヘッドの媒体摺動面を同一材料、
しかも高硬度、高靭性、高抗折強度の材料であるアルミ
ナ・ジルコニア系セラミックスを用いることにより、耐
久性に優れ、高記録密度に適した薄膜磁気ヘッドを提供
することが可能となった。In this way, the medium sliding surface of the thin film magnetic head is made of the same material.
Moreover, by using alumina-zirconia ceramics, which are materials with high hardness, high toughness, and high flexural strength, it has become possible to provide a thin-film magnetic head with excellent durability and suitable for high recording density.
第１図は本発明による薄膜磁気ヘッドの媒体摺動部の平
面図である。
第２図は本発明による薄膜磁気ヘッドの電磁変換部の断
面図である。
第３図は本発明による薄膜磁気ヘッドの製造工程の一例
を示す図で、第３図（ａ）は非磁性基板上に上部磁性コ
アをスパッタし形成した時の断面図、第３図（ｂ）は非
磁性空隙部を形成した断面図、第３図（Ｃ）は巻線の薄
膜コイルを形成し、その上に非磁性薄膜を形成した図、
第３図（ｄ）は下部磁性コアの形成を示す断面図、第３
図（ｅ）は非磁性薄膜により平坦化を行った断面図、第
３図（ｆ）は非磁性基板上に接着用ガラスを形成した断
面図、第３図（ｇ）は媒体摺動面を研磨した薄膜磁気ヘ
ッドの断面図。
第４図は従来の薄膜磁気ヘッドの媒体摺動部の平面図。
第５図は従来の薄膜ヘッドの媒体摺動部の平面図である
。
１、 ｌａ、 ｌｂ・・・アルミナ・ジルコニア系非磁
性基板、２ａ、 １２ａ・・・上部磁性コア、２ｂ、
１２ｂ・・・下部磁性コア、３、３ａ、 ３ｂ、 ３ｃ
・・・アルミナ・ジルコニア系非磁性薄膜、９ａ、 ９
ｂ・・・ｚｎＦｅ２Ｏ．の非磁性基板、１０・・・ガラ
ス接着層、１１・・・薄膜コイル、１４・・・磁性基板
、１５・・・非磁性基板、１６・・・保護膜、１７・・
・非磁性空隙、１９ａ、 １９ｂ・・・亜鉛フェライト
等から成る非磁性基板。FIG. 1 is a plan view of a medium sliding portion of a thin film magnetic head according to the present invention. FIG. 2 is a sectional view of the electromagnetic transducer of the thin film magnetic head according to the present invention. FIG. 3 is a diagram showing an example of the manufacturing process of a thin film magnetic head according to the present invention. FIG. ) is a cross-sectional view with a non-magnetic gap formed, FIG. 3(C) is a diagram with a thin-film coil of winding wire formed and a non-magnetic thin film formed thereon,
FIG. 3(d) is a cross-sectional view showing the formation of the lower magnetic core;
Figure 3(e) is a cross-sectional view of the surface flattened with a non-magnetic thin film, Figure 3(f) is a cross-sectional view of adhesive glass formed on a non-magnetic substrate, and Figure 3(g) is a cross-sectional view of the medium sliding surface. A cross-sectional view of a polished thin-film magnetic head. FIG. 4 is a plan view of the medium sliding part of a conventional thin film magnetic head. FIG. 5 is a plan view of a medium sliding portion of a conventional thin film head. 1, la, lb...Alumina-zirconia nonmagnetic substrate, 2a, 12a...upper magnetic core, 2b,
12b...lower magnetic core, 3, 3a, 3b, 3c
...Alumina-zirconia non-magnetic thin film, 9a, 9
b...znFe2O. 10... Glass adhesive layer, 11... Thin film coil, 14... Magnetic substrate, 15... Nonmagnetic substrate, 16... Protective film, 17...
・Nonmagnetic air gaps, 19a, 19b...Nonmagnetic substrate made of zinc ferrite or the like.
Claims (1)
よって磁性薄膜と保護膜を形成し、ケミカル、又はドラ
イエッチングの手法により各部のエッチングを行って形
成する薄膜磁気ヘッドにおいて、上部磁性コア、下部磁
性コアから成る磁性膜を除き磁気記録媒体と摺動する面
を、酸化ジルコニウム（ＺｒＯ＿２）５０〜８０重量％
、酸化アルミニウム（Ａｌ＿２Ｏ＿３）４５〜１５重量
％、酸化イットリウム（Ｙ＿２Ｏ＿３）２〜１０重量％
、及びその他の不純物として、酸化珪素（ＳｉＯ＿２）
、二酸化鉄（Ｆｅ＿２Ｏ＿３）、酸化ナトリウム（Ｎａ
＿２Ｏ）を０．１重量％以下を含むセラミックスとする
ことを特徴とする薄膜磁気ヘッド。1. In a thin film magnetic head in which a magnetic thin film and a protective film are formed by means such as sputtering, plating, or vapor deposition, and each part is etched by a chemical or dry etching method, an upper magnetic core and a lower magnetic core are formed. zirconium oxide (ZrO_2) 50 to 80% by weight, except for the magnetic film consisting of
, aluminum oxide (Al_2O_3) 45-15% by weight, yttrium oxide (Y_2O_3) 2-10% by weight
, and other impurities, silicon oxide (SiO_2)
, iron dioxide (Fe_2O_3), sodium oxide (Na
A thin film magnetic head characterized by being made of ceramic containing 0.1% by weight or less of _2O).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19466589A JPH0359813A (en) | 1989-07-27 | 1989-07-27 | Thin-film magnetic head |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19466589A JPH0359813A (en) | 1989-07-27 | 1989-07-27 | Thin-film magnetic head |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0359813A true JPH0359813A (en) | 1991-03-14 |
Family
ID=16328275
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP19466589A Pending JPH0359813A (en) | 1989-07-27 | 1989-07-27 | Thin-film magnetic head |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0359813A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6038101A (en) * | 1997-03-14 | 2000-03-14 | Kabushiki Kaisha Toshiba | Magnetic head and method of manufacturing magnetic head |
| JP2008041933A (en) * | 2006-08-07 | 2008-02-21 | Sumitomo Heavy Ind Ltd | Resin sealing apparatus |
-
1989
- 1989-07-27 JP JP19466589A patent/JPH0359813A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6038101A (en) * | 1997-03-14 | 2000-03-14 | Kabushiki Kaisha Toshiba | Magnetic head and method of manufacturing magnetic head |
| JP2008041933A (en) * | 2006-08-07 | 2008-02-21 | Sumitomo Heavy Ind Ltd | Resin sealing apparatus |
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