JPH0356133U - - Google Patents
Info
- Publication number
- JPH0356133U JPH0356133U JP10665390U JP10665390U JPH0356133U JP H0356133 U JPH0356133 U JP H0356133U JP 10665390 U JP10665390 U JP 10665390U JP 10665390 U JP10665390 U JP 10665390U JP H0356133 U JPH0356133 U JP H0356133U
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- processing apparatus
- substrate processing
- shaft
- electrode block
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 claims description 34
- 238000001816 cooling Methods 0.000 claims description 4
- 238000010438 heat treatment Methods 0.000 claims description 3
- 239000003507 refrigerant Substances 0.000 claims 4
- 238000013459 approach Methods 0.000 claims 2
- 239000010409 thin film Substances 0.000 claims 1
- 238000004544 sputter deposition Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 239000012528 membrane Substances 0.000 description 1
- 238000000992 sputter etching Methods 0.000 description 1
Landscapes
- Drying Of Semiconductors (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1990106653U JPH0510356Y2 (enrdf_load_stackoverflow) | 1990-10-11 | 1990-10-11 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1990106653U JPH0510356Y2 (enrdf_load_stackoverflow) | 1990-10-11 | 1990-10-11 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0356133U true JPH0356133U (enrdf_load_stackoverflow) | 1991-05-30 |
| JPH0510356Y2 JPH0510356Y2 (enrdf_load_stackoverflow) | 1993-03-15 |
Family
ID=31655381
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1990106653U Expired - Lifetime JPH0510356Y2 (enrdf_load_stackoverflow) | 1990-10-11 | 1990-10-11 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0510356Y2 (enrdf_load_stackoverflow) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58133376A (ja) * | 1982-01-26 | 1983-08-09 | マテリアルズ・リサ−チ・コ−ポレ−シヨン | 反応性膜析出方法及び装置 |
| JPS59148341A (ja) * | 1983-02-14 | 1984-08-25 | Mitsubishi Electric Corp | 絶縁膜形成方法 |
-
1990
- 1990-10-11 JP JP1990106653U patent/JPH0510356Y2/ja not_active Expired - Lifetime
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58133376A (ja) * | 1982-01-26 | 1983-08-09 | マテリアルズ・リサ−チ・コ−ポレ−シヨン | 反応性膜析出方法及び装置 |
| JPS59148341A (ja) * | 1983-02-14 | 1984-08-25 | Mitsubishi Electric Corp | 絶縁膜形成方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0510356Y2 (enrdf_load_stackoverflow) | 1993-03-15 |
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