JPH0353835U - - Google Patents

Info

Publication number
JPH0353835U
JPH0353835U JP11485589U JP11485589U JPH0353835U JP H0353835 U JPH0353835 U JP H0353835U JP 11485589 U JP11485589 U JP 11485589U JP 11485589 U JP11485589 U JP 11485589U JP H0353835 U JPH0353835 U JP H0353835U
Authority
JP
Japan
Prior art keywords
exhaust port
control device
pressure control
heat treatment
treatment apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11485589U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP11485589U priority Critical patent/JPH0353835U/ja
Publication of JPH0353835U publication Critical patent/JPH0353835U/ja
Pending legal-status Critical Current

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Landscapes

  • Waste-Gas Treatment And Other Accessory Devices For Furnaces (AREA)
  • Chemical Vapour Deposition (AREA)

Description

【図面の簡単な説明】[Brief explanation of drawings]

第1図は、この考案の一実施例の自動排気圧力
制御装置を採用した半導体熱処理装置の断面図で
ある。第2図は、この考案で使用する自動排気圧
力制御装置の一例の断面図である。第3図は、従
来の半導体熱処理装置の断面図である。 1……ヒータ、2……反応管、3……気体供給
部、4……排気口、5a〜5c……半導体基板、
6……自動排気圧力制御装置、61……排気管、
62……バタフライ弁、63……圧力計、64…
…モータ、65……コントローラ。
FIG. 1 is a sectional view of a semiconductor heat treatment apparatus employing an automatic exhaust pressure control device according to an embodiment of the present invention. FIG. 2 is a sectional view of an example of an automatic exhaust pressure control device used in this invention. FIG. 3 is a sectional view of a conventional semiconductor heat treatment apparatus. DESCRIPTION OF SYMBOLS 1... Heater, 2... Reaction tube, 3... Gas supply part, 4... Exhaust port, 5a-5c... Semiconductor substrate,
6... Automatic exhaust pressure control device, 61... Exhaust pipe,
62... Butterfly valve, 63... Pressure gauge, 64...
...Motor, 65...Controller.

Claims (1)

【実用新案登録請求の範囲】 ヒータ、反応管、気体供給部、排気口を有する
半導体熱処理装置において、 排気口に自動排気圧力制御装置を設けたことを
特徴とする半導体熱処理装置。
[Scope of Claim for Utility Model Registration] A semiconductor heat treatment apparatus having a heater, a reaction tube, a gas supply section, and an exhaust port, characterized in that the exhaust port is provided with an automatic exhaust pressure control device.
JP11485589U 1989-09-29 1989-09-29 Pending JPH0353835U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11485589U JPH0353835U (en) 1989-09-29 1989-09-29

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11485589U JPH0353835U (en) 1989-09-29 1989-09-29

Publications (1)

Publication Number Publication Date
JPH0353835U true JPH0353835U (en) 1991-05-24

Family

ID=31663203

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11485589U Pending JPH0353835U (en) 1989-09-29 1989-09-29

Country Status (1)

Country Link
JP (1) JPH0353835U (en)

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