JPS6444631U - - Google Patents

Info

Publication number
JPS6444631U
JPS6444631U JP13799487U JP13799487U JPS6444631U JP S6444631 U JPS6444631 U JP S6444631U JP 13799487 U JP13799487 U JP 13799487U JP 13799487 U JP13799487 U JP 13799487U JP S6444631 U JPS6444631 U JP S6444631U
Authority
JP
Japan
Prior art keywords
reaction
gas
pressure sensor
reaction chamber
flow path
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13799487U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP13799487U priority Critical patent/JPS6444631U/ja
Publication of JPS6444631U publication Critical patent/JPS6444631U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)

Description

【図面の簡単な説明】[Brief explanation of drawings]

第1図は一実施例を示す概略線図、第2図は従
来の反応装置を示す概略線図である。 2……反応室、4,6,12,16……ニード
ルバルブ、8……排気口、10……圧力センサ、
14……ガス流路。
FIG. 1 is a schematic diagram showing one embodiment, and FIG. 2 is a schematic diagram showing a conventional reaction apparatus. 2... Reaction chamber, 4, 6, 12, 16... Needle valve, 8... Exhaust port, 10... Pressure sensor,
14...Gas flow path.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 排気口と反応ガス供給口を備え、減圧状態の反
応ガス雰囲気下で対象物に反応を起させる反応装
置において、反応室に取りつけられる圧力センサ
側から反応室側へ圧力センサに悪影響を与えない
ガスを流すガス流路を設けたことを特徴とする反
応装置。
In a reaction device that is equipped with an exhaust port and a reaction gas supply port and causes a reaction in a target object under a reduced pressure reaction gas atmosphere, a gas that does not adversely affect the pressure sensor is passed from the pressure sensor side installed in the reaction chamber to the reaction chamber side. 1. A reaction device characterized by being provided with a gas flow path through which .
JP13799487U 1987-09-09 1987-09-09 Pending JPS6444631U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13799487U JPS6444631U (en) 1987-09-09 1987-09-09

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13799487U JPS6444631U (en) 1987-09-09 1987-09-09

Publications (1)

Publication Number Publication Date
JPS6444631U true JPS6444631U (en) 1989-03-16

Family

ID=31399927

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13799487U Pending JPS6444631U (en) 1987-09-09 1987-09-09

Country Status (1)

Country Link
JP (1) JPS6444631U (en)

Similar Documents

Publication Publication Date Title
JPS6444631U (en)
JPS6436560U (en)
JPS61118955U (en)
JPS6439816U (en)
JPS643029U (en)
JPS6284660U (en)
JPH01168859U (en)
JPH01145623U (en)
JPS63117865U (en)
JPS62126511U (en)
JPH0243447U (en)
JPS61145863U (en)
JPS63147536U (en)
JPS6173086U (en)
JPS63100647U (en)
JPH0274372U (en)
JPS63126703U (en)
JPS61144252U (en)
JPS63125166U (en)
JPS59121657U (en) developing device
JPS61181200U (en)
JPS62148404U (en)
JPS626470U (en)
JPS62150518U (en)
JPS6194670U (en)