JPH0352641B2 - - Google Patents
Info
- Publication number
- JPH0352641B2 JPH0352641B2 JP58133032A JP13303283A JPH0352641B2 JP H0352641 B2 JPH0352641 B2 JP H0352641B2 JP 58133032 A JP58133032 A JP 58133032A JP 13303283 A JP13303283 A JP 13303283A JP H0352641 B2 JPH0352641 B2 JP H0352641B2
- Authority
- JP
- Japan
- Prior art keywords
- magnetic
- film
- magnetic recording
- phase
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 40
- 230000005415 magnetization Effects 0.000 claims description 18
- 238000004544 sputter deposition Methods 0.000 claims description 15
- 229910000859 α-Fe Inorganic materials 0.000 claims description 15
- 229910052742 iron Inorganic materials 0.000 claims description 7
- 239000010408 film Substances 0.000 description 57
- 239000000758 substrate Substances 0.000 description 33
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 18
- 239000002245 particle Substances 0.000 description 18
- 238000010884 ion-beam technique Methods 0.000 description 14
- 238000000034 method Methods 0.000 description 14
- 239000013078 crystal Substances 0.000 description 12
- 230000007423 decrease Effects 0.000 description 11
- 150000002500 ions Chemical class 0.000 description 11
- 239000007789 gas Substances 0.000 description 10
- 229910052757 nitrogen Inorganic materials 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 6
- 230000001133 acceleration Effects 0.000 description 5
- 238000007737 ion beam deposition Methods 0.000 description 5
- 230000007797 corrosion Effects 0.000 description 4
- 238000005260 corrosion Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 229910001873 dinitrogen Inorganic materials 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 238000002441 X-ray diffraction Methods 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 238000000151 deposition Methods 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- 230000005684 electric field Effects 0.000 description 3
- 238000000605 extraction Methods 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 229910001337 iron nitride Inorganic materials 0.000 description 3
- 230000009471 action Effects 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 239000000498 cooling water Substances 0.000 description 2
- 239000011162 core material Substances 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- 238000009795 derivation Methods 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 230000007935 neutral effect Effects 0.000 description 2
- 229910000889 permalloy Inorganic materials 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 239000000284 extract Substances 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 239000012495 reaction gas Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000013077 target material Substances 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/1278—Structure or manufacture of heads, e.g. inductive specially adapted for magnetisations perpendicular to the surface of the record carrier
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/221—Ion beam deposition
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Magnetic Heads (AREA)
- Manufacturing & Machinery (AREA)
- Thin Magnetic Films (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13303283A JPS6025012A (ja) | 1983-07-20 | 1983-07-20 | 垂直磁気記録用磁気ヘッド |
| US06/630,514 US4690744A (en) | 1983-07-20 | 1984-07-13 | Method of ion beam generation and an apparatus based on such method |
| EP84304963A EP0132398B1 (fr) | 1983-07-20 | 1984-07-20 | Procédé et dispositif pour la production des faisceaux ioniques |
| DE8484304963T DE3480039D1 (en) | 1983-07-20 | 1984-07-20 | A method and apparatus for ion beam generation |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13303283A JPS6025012A (ja) | 1983-07-20 | 1983-07-20 | 垂直磁気記録用磁気ヘッド |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP23116490A Division JPH0648526B2 (ja) | 1990-08-31 | 1990-08-31 | 磁気ヘッドの製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6025012A JPS6025012A (ja) | 1985-02-07 |
| JPH0352641B2 true JPH0352641B2 (fr) | 1991-08-12 |
Family
ID=15095210
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13303283A Granted JPS6025012A (ja) | 1983-07-20 | 1983-07-20 | 垂直磁気記録用磁気ヘッド |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6025012A (fr) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4969962A (en) * | 1988-08-20 | 1990-11-13 | Victor Company Of Japan, Ltd. | Magnetic alloys for magnetic head |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS53102723A (en) * | 1977-02-21 | 1978-09-07 | Hitachi Ltd | Magnetic head |
| JPS5836908A (ja) * | 1981-08-24 | 1983-03-04 | Sumitomo Special Metals Co Ltd | 窒化物薄膜軟質磁性体の製造法 |
| JPS58180008A (ja) * | 1982-04-15 | 1983-10-21 | Sony Corp | 磁気記録媒体 |
-
1983
- 1983-07-20 JP JP13303283A patent/JPS6025012A/ja active Granted
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS53102723A (en) * | 1977-02-21 | 1978-09-07 | Hitachi Ltd | Magnetic head |
| JPS5836908A (ja) * | 1981-08-24 | 1983-03-04 | Sumitomo Special Metals Co Ltd | 窒化物薄膜軟質磁性体の製造法 |
| JPS58180008A (ja) * | 1982-04-15 | 1983-10-21 | Sony Corp | 磁気記録媒体 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6025012A (ja) | 1985-02-07 |
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