JPH0350847A - Holding tool for wafer handling - Google Patents
Holding tool for wafer handlingInfo
- Publication number
- JPH0350847A JPH0350847A JP1186629A JP18662989A JPH0350847A JP H0350847 A JPH0350847 A JP H0350847A JP 1186629 A JP1186629 A JP 1186629A JP 18662989 A JP18662989 A JP 18662989A JP H0350847 A JPH0350847 A JP H0350847A
- Authority
- JP
- Japan
- Prior art keywords
- wafer handling
- sulfide resin
- molding
- wafers
- holding tool
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229920005989 resin Polymers 0.000 claims abstract description 17
- 239000011347 resin Substances 0.000 claims abstract description 17
- 238000001746 injection moulding Methods 0.000 claims abstract description 9
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 claims abstract description 8
- 238000000465 moulding Methods 0.000 claims description 9
- 229920000412 polyarylene Polymers 0.000 claims description 6
- 238000004519 manufacturing process Methods 0.000 claims description 3
- ODPYDILFQYARBK-UHFFFAOYSA-N 7-thiabicyclo[4.1.0]hepta-1,3,5-triene Chemical compound C1=CC=C2SC2=C1 ODPYDILFQYARBK-UHFFFAOYSA-N 0.000 claims 1
- 235000012431 wafers Nutrition 0.000 abstract description 37
- 239000000463 material Substances 0.000 abstract description 15
- 239000004734 Polyphenylene sulfide Substances 0.000 abstract description 14
- 229920000069 polyphenylene sulfide Polymers 0.000 abstract description 14
- 238000012545 processing Methods 0.000 description 8
- 125000000732 arylene group Chemical group 0.000 description 7
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 6
- 239000007788 liquid Substances 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- 239000000945 filler Substances 0.000 description 5
- 239000004696 Poly ether ether ketone Substances 0.000 description 4
- 238000005520 cutting process Methods 0.000 description 4
- 229920002530 polyetherether ketone Polymers 0.000 description 4
- 229920000642 polymer Polymers 0.000 description 4
- XWUCFAJNVTZRLE-UHFFFAOYSA-N 7-thiabicyclo[2.2.1]hepta-1,3,5-triene Chemical group C1=C(S2)C=CC2=C1 XWUCFAJNVTZRLE-UHFFFAOYSA-N 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 150000007513 acids Chemical class 0.000 description 3
- 238000004140 cleaning Methods 0.000 description 3
- 238000004132 cross linking Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 238000003860 storage Methods 0.000 description 3
- -1 strong alkalis Substances 0.000 description 3
- 238000011282 treatment Methods 0.000 description 3
- DDFHBQSCUXNBSA-UHFFFAOYSA-N 5-(5-carboxythiophen-2-yl)thiophene-2-carboxylic acid Chemical compound S1C(C(=O)O)=CC=C1C1=CC=C(C(O)=O)S1 DDFHBQSCUXNBSA-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 229920001519 homopolymer Polymers 0.000 description 2
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 2
- 239000004810 polytetrafluoroethylene Substances 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 125000000101 thioether group Chemical group 0.000 description 2
- SOHCOYTZIXDCCO-UHFFFAOYSA-N 6-thiabicyclo[3.1.1]hepta-1(7),2,4-triene Chemical group C=1C2=CC=CC=1S2 SOHCOYTZIXDCCO-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 229920013633 Fortron Polymers 0.000 description 1
- 239000004738 Fortron® Substances 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 230000001588 bifunctional effect Effects 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000012993 chemical processing Methods 0.000 description 1
- 229920006026 co-polymeric resin Polymers 0.000 description 1
- 238000010835 comparative analysis Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 229920006351 engineering plastic Polymers 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 125000001033 ether group Chemical group 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 238000010128 melt processing Methods 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 238000012643 polycondensation polymerization Methods 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000000779 smoke Substances 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
Landscapes
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は半導体工業に用いられるウェハーの各種加工処
理、洗浄、運搬、貯蔵等の取り扱いに使用されるバスケ
ット、容器、その他の保持具に関するものである。[Detailed Description of the Invention] [Field of Industrial Application] The present invention relates to baskets, containers, and other holders used in various processing, cleaning, transportation, storage, and other handling of wafers used in the semiconductor industry. It is.
半導体工業において用いられるシリコンウェハーの如き
半導体ウェハーは一般に大変もろく、破損しやすい上に
その調製加工、その他の取り扱い上、極めて苛酷な条件
での処理を必要とするものである。例えば、その調製工
程に於いて、高温の極めて腐蝕性の強い処理液(洗浄液
)、例えば、強酸、強アルカリ、弗酸、弗化アンモン、
その他溶剤等で接触処理され、又高温乾煙、遠心脱液等
の処理が行われる。従って、これらの処理のためには一
般の板状物の取り扱いとは異なり、効率上、多数のウェ
ハーを整合して保持する様なバスケット状、その他の形
状を有する特定の保持具にセットして上記の如き取り扱
いを行う必要があり、かかる保持具は上記の如く高温で
特に腐蝕性液体に対して化学的に強い抵抗性を有し、又
熱的、機成的抵抗性をも有する材質であることを必要と
し、且つウェハーが木来脆弱で破損しやすく、かき傷や
摩耗を生じやすいものであるため、その保持具は多数の
ウェハーが接触することなく保持され、又保持具申に正
確にセットされ、振動による衝撃が生じないように収納
保持されている必要があり、又振動を避けるため、その
一部を締め付けるような手段も損傷の原因となり、好ま
しくない。このためにはウェハーを保持収容するバスケ
ット、容器等の保持具は正確な形状、寸法を有するもの
でなければならないことになる。Semiconductor wafers such as silicon wafers used in the semiconductor industry are generally very brittle and easily damaged, and require processing under extremely harsh conditions for processing and other handling. For example, in the preparation process, highly corrosive processing liquids (cleaning liquids) at high temperatures, such as strong acids, strong alkalis, hydrofluoric acid, ammonium fluoride,
Contact treatment with other solvents, etc., and treatments such as high-temperature dry smoke and centrifugal deliquification are also performed. Therefore, for these processes, unlike the handling of general plate-shaped objects, for efficiency, it is necessary to set a large number of wafers in a specific holder in a basket shape or other shape that aligns and holds them. It is necessary to carry out handling as described above, and such holders must be made of a material that has strong chemical resistance, especially against corrosive liquids at high temperatures, as well as thermal and mechanical resistance. Because the wafers are fragile, easily damaged, and prone to scratches and abrasion, the holder must be able to hold a large number of wafers without touching each other, and the holder must be able to hold the wafers accurately. It is necessary to store and hold the device in such a way that it is not subjected to shocks due to vibrations, and it is not preferable to tighten a portion of the device in order to avoid vibrations, as this may cause damage. To this end, holders such as baskets and containers for holding and accommodating wafers must have accurate shapes and dimensions.
ところで従来、この目的のために使用されているバスケ
ット等の保持具は、処理液等に対する化学的な安定性か
ら、弗素系の樹脂、例えばポリテトラフロロエチレン又
はその系統の共重合体樹脂の如き素材が使用されている
が、本来樹脂自体が高価である他、成形加工性、成形効
率が悪く、又成形収縮、加熱による形状の変化を生じや
すく、精確な形状のバスケット等の保持具を射出成形に
よって得ることは困難であり、寸法精度の不備からウェ
ハーを円滑にセットして、しかも振動によるがたつきを
生じない様にすることはむずかしく、一部の収納個所は
円滑に入らないことがあったり、又一部の収納個所はゆ
る過ぎて振動を避けがたい等の不備を生じる。このため
、成形後切削加工により寸法精度を上げ、形状精度を修
正することが必要となり、製作上極めて不経済となるの
みならず、高温処理時に成形時の歪等による変形を生じ
、取り出し困難等の問題を生じ好ましくない。又、材質
としてポリエーテルエーテルケトン(PEEK)の如き
更に高価な材料を使用する試みもなされているが、経済
性以外の面でも、これも上記と同様の問題があり、十分
満足し得るものとは言えない。Conventionally, holders such as baskets used for this purpose are made of fluorine-based resins, such as polytetrafluoroethylene or copolymer resins of its type, due to their chemical stability against processing liquids. However, the resin itself is expensive, has poor molding processability and molding efficiency, and is prone to mold shrinkage and shape changes due to heating, making it difficult to inject holders such as baskets with precise shapes. It is difficult to obtain this by molding, and due to the lack of dimensional accuracy, it is difficult to set the wafer smoothly and without rattling due to vibration, and some storage locations may not fit smoothly. In some cases, some storage locations are too loose, resulting in defects such as unavoidable vibration. For this reason, it is necessary to increase the dimensional accuracy and correct the shape accuracy by cutting after forming, which is not only extremely uneconomical in manufacturing, but also causes deformation due to distortion during forming during high temperature processing, making it difficult to take out. This is not desirable because it causes problems. Additionally, attempts have been made to use more expensive materials such as polyetheretherketone (PEEK), but these also have the same problems as mentioned above in terms of non-economic aspects, and are not fully satisfactory. I can't say that.
本発明者らは、かかる従来のウェハー取扱用保持具の欠
点を有さず、その要求性能、即ち苛酷な化学処理液、例
えば弗酸、硫酸等の強酸、強アルカリ、特殊な溶剤等に
対して化学的に安定であり、高度の寸法精度及び寸法安
定性を有するバスケット等の保持具を射出成形によって
そのまま効率よく得られる材料につき検討を重ねた結果
、ポリフェニレンサルファイド樹脂(PPS)に代表さ
れるポリアリーレンサルファイド樹脂(PAS)が上記
要求を悉く満足することを見出し、本発明に到達した。The present inventors do not have the drawbacks of the conventional wafer handling holders, and have achieved the required performance, that is, resistant to harsh chemical processing solutions, such as strong acids such as hydrofluoric acid and sulfuric acid, strong alkalis, and special solvents. As a result of repeated studies on materials that are chemically stable and that can be efficiently obtained as they are by injection molding into holders such as baskets that have a high degree of dimensional accuracy and stability, we have developed materials such as polyphenylene sulfide resin (PPS). We have discovered that polyarylene sulfide resin (PAS) satisfies all of the above requirements, and have arrived at the present invention.
即ち本発明は、ポリアリーレンサルファイド樹脂(PA
S)よりなるウェハー取扱用保持具を提供するものであ
る。That is, the present invention uses polyarylene sulfide resin (PA
The present invention provides a wafer handling holder consisting of S).
本発明に使用するPASとは主たる繰り返し単位+Ar
−3−)−(ただし、Arはアリーレン基)で構成され
たものである。The PAS used in the present invention is a main repeating unit +Ar
-3-)- (where Ar is an arylene group).
アリーレン基としては、例えば
(ただしXはアルキル基、好ましくは01〜C6のアル
キル基、又はフェニル基、口は1〜4の整数。)の如き
フェニレン基よりなるポリフェニレンサルファイド樹脂
(PPSと略称)が好ましいが、
f’+ p’ −ジフェニレンスルフォン基p、p
−ジフェニレンエーテル基
p、p
−ジフェニレンカルボニル基
なども使用できる。As the arylene group, for example, polyphenylene sulfide resin (abbreviated as PPS) consisting of a phenylene group such as Although preferred, f'+ p'-diphenylene sulfone group p, p-diphenylene ether group p, p-diphenylenecarbonyl group, etc. can also be used.
この場合、前記のアリーレン基から構成されるアリーレ
ンサルファイド基の中で、同一の繰り返し単位を用いた
ポリマー、即ちホモポリマーを用いることが好ましいが
、成形加工性という点から、異種の繰り返し単位を補助
的に少量含んだコポリマーが好ましい場合もある。In this case, it is preferable to use a polymer using the same repeating units, that is, a homopolymer, among the arylene sulfide groups composed of the above-mentioned arylene groups, but from the viewpoint of moldability, different types of repeating units are used as an aid. In some cases, copolymers containing small amounts of carbon are preferred.
ホモポリマーとしては、アリーレン基としてp−フ二二
しン基ヲ用いた、p−フェニレンサルファイド基を繰り
返し単位とする実質上線状のPPSが特に好ましく用い
られる。As the homopolymer, a substantially linear PPS having a p-phenylene sulfide group as a repeating unit and using a p-phinidine group as an arylene group is particularly preferably used.
又コポリマーとしては、前記のアリーレン基からなるア
リーレンサルファイド基の中で、相異なる2種以上の組
み合わせが使用できるが、中でもp−フェニレンサルフ
ァイド基とm−フェニレンサルファイド基を含む組み合
わせが特に好ましく用いられる。この中でpフェニレン
サルファイド基を50モル%以上、好ましくは70モル
%以上含むものが処理液に対する化学的安定性(耐蝕性
)、耐熱性、成形性、機械的特性等の物性上の点から適
当である。Further, as a copolymer, a combination of two or more different types of arylene sulfide groups consisting of the above-mentioned arylene groups can be used, but among them, a combination containing a p-phenylene sulfide group and a m-phenylene sulfide group is particularly preferably used. . Among these, those containing p-phenylene sulfide groups in an amount of 50 mol% or more, preferably 70 mol% or more, are preferred in terms of physical properties such as chemical stability (corrosion resistance) to treatment liquids, heat resistance, moldability, and mechanical properties. Appropriate.
本発明に使用するPAS、特にPPSは、酸化架橋又は
熱架橋によるキユアリングで得られるポリマーも使用で
きるが、好ましいのは2官能性モノマーから縮重合によ
って得られ、熱処理されていてもそれによる架橋度が。The PAS used in the present invention, especially PPS, can also be a polymer obtained by curing by oxidative crosslinking or thermal crosslinking, but it is preferable to obtain it by condensation polymerization from a bifunctional monomer, and even if it is heat-treated, the degree of crosslinking is but.
低く、実質的には線状の分子構造を有するポリマーであ
る。It is a polymer with a low, substantially linear molecular structure.
中でも温度310℃、剪断速度5/秒の条件下で測定し
た溶融粘度が1×10〜5X10’ボイズ、好ましくは
50〜5X10’ポイズ、特に好ましくは100〜5X
10’ポイズの範囲にある線状ポリマーが適当である。Among them, the melt viscosity measured under the conditions of a temperature of 310°C and a shear rate of 5/sec is 1 x 10 to 5 x 10' poise, preferably 50 to 5 x 10' poise, particularly preferably 100 to 5 x
Linear polymers in the 10' poise range are suitable.
10ポイズ未満では、流動性が良過ぎて溶融加工が困難
であり、仮に成形物が得られたとしても、機械的強度な
どが低くて好ましくない。又、5X105ボイズを越え
るものは流動性が悪く溶融加工が困難である。If it is less than 10 poise, the fluidity will be too good and melt processing will be difficult, and even if a molded product is obtained, the mechanical strength will be low, which is undesirable. Moreover, those having more than 5×105 voids have poor fluidity and are difficult to melt process.
一般にPAS、特にPPSはガラス、その他無機質の繊
維状、粉粒状或いは板状の充填剤を配合し、エンジニア
リングプラスチックとして広く用いられ、かかる充填剤
の配合は、機械的強度、形状の安定性には有用な効果を
有することが知られており、本願の材料としてもその目
的を阻害しない限り特にこれらの充填剤の配合を排除す
るものではないが、かかる充填剤は、一般に強酸、強ア
ルカリ、特に弗酸、弗化アンモン等の如き腐蝕性の極め
て強い薬液に接触される本発明のウェハー取扱用保持具
に於いては、これらの充填剤が浸蝕されるため不適当な
場合が多く、この見地からも無充填のPAS、特にPP
Sを材料として使用することが好ましい場合が多い。そ
して無充填のPASとしては、その機械的強度、伸度、
じん性等の点で実質上線状の分子構造を有するPAS、
特に線状のPPSを用いる方が有利である。Generally, PAS, especially PPS, is widely used as engineering plastics by blending glass or other inorganic fibrous, powder, or plate-like fillers. These fillers are known to have useful effects, and the use of these fillers as materials in the present application is not excluded as long as they do not impede the purpose; however, such fillers generally contain strong acids, strong alkalis, and especially The holder for handling wafers of the present invention, which comes into contact with highly corrosive chemicals such as hydrofluoric acid and ammonium fluoride, is often unsuitable because these fillers are corroded. Also unfilled PAS, especially PP
It is often preferred to use S as the material. As unfilled PAS, its mechanical strength, elongation,
PAS, which has a substantially linear molecular structure in terms of toughness, etc.
In particular, it is advantageous to use linear PPS.
尚、本発明におけるウェハー取扱用保持具の素材として
は、上記の如< PASを主体とし、その目的を阻害し
ない範囲で少量の他の樹脂を補助的に配合したものであ
ってもよい。The material for the holder for handling wafers in the present invention may be mainly composed of PAS as described above, with a small amount of other resins added thereto as long as the purpose is not impaired.
本発明のウェハー取扱用保持具の形状は特に限定される
ものではないが、複数(できるだけ多数)のウェハーを
接触することなく隔置させて、整合保持することのでき
るバスケラトル又は容器であることが好ましく、特に液
体処理、洗浄等の処理を目的とする場合には、ウェハー
を円滑に挿入したり取り出したりすることが可能なこと
以外に上部のみならず底部又は側面が開放したバスケッ
トタイプのものが好ましく、又ウェハーが振動すること
のないようリブ等を設けて正確にフィツトする様な構造
形態のものが好ましい。The shape of the wafer handling holder of the present invention is not particularly limited, but it may be a basket rattle or a container that can hold a plurality of (as many as possible) wafers apart and aligned without contacting them. Particularly when the purpose is liquid processing, cleaning, etc., a basket type is preferable, in which not only the wafer can be smoothly inserted and removed, but also the bottom or sides are open as well as the top. Preferably, the structure is such that ribs or the like are provided to prevent the wafer from vibrating and to ensure an accurate fit.
その−例を図−1、図−2に示したが、本発明のウェハ
ー取扱用保持具の形状はこれに限定されるものではない
。ここで、図−1(1)は本発明の一実施例によるウェ
ハー取扱用保持具の斜視図、同(2)は平面図、同(3
)は同(2)のI−I’ 線断面略示図であり、図−2
は本発明の別の実施例によるウェハー取扱用保持具の斜
視図である。Examples thereof are shown in FIGS. 1 and 2, but the shape of the wafer handling holder of the present invention is not limited to this. Here, FIG. 1 (1) is a perspective view of a wafer handling holder according to an embodiment of the present invention, FIG. 1 (2) is a plan view, and FIG.
) is a schematic cross-sectional view taken along the line I-I' of (2), and is shown in Figure 2.
1 is a perspective view of a wafer handling holder according to another embodiment of the present invention; FIG.
次に本発明のウェハー取扱用保持具の製作方法は上記の
材料を用いて一般の射出成形法によって効率よく容易に
成形することができ、その条件も一般のPAS、PPS
の射出成形の場合に準じて設定すればよい。即ち、例え
ば樹脂温度は290〜350℃、金型温度は90〜16
0℃とすることが適当である。Next, the manufacturing method of the wafer handling holder of the present invention can be efficiently and easily molded using the above-mentioned materials by a general injection molding method, and the conditions are also similar to those of general PAS and PPS.
Settings can be made in accordance with the case of injection molding. That is, for example, the resin temperature is 290 to 350°C, and the mold temperature is 90 to 16°C.
It is appropriate to set the temperature to 0°C.
ウェハー取扱用保持具の材料として本発明の特徴である
PAS、特にPPSを用いることにより、従来の素材に
比べて薄肉軽量化が可能であり、寸法精度も良好である
ため、般には特に成形後の切削加工を施す必要はないが
、特殊な高精度の寸法を要する場合には切削加工を行っ
てもよいことは当然である。By using PAS, especially PPS, which is a feature of the present invention, as the material for the wafer handling holder, it is possible to make it thinner and lighter than conventional materials, and the dimensional accuracy is also good, so it is generally particularly suitable for molding. Although it is not necessary to carry out the subsequent cutting process, it is of course possible to perform the cutting process if special high-precision dimensions are required.
以下に実施例をあげるが、本発明はこれに限定されるも
のではない。Examples are given below, but the present invention is not limited thereto.
実施例1、比較例1.2
ウェハー取扱用保持具材料としての適性を比較するため
、無充填線状ポリフェニレンサルファイド(PPS)
(ポリプラスチックス株式会社“フォートロン”)(
実施例−1)及び従来使用されているポリテトラフロロ
エチレン共重合体(PFA)(比較例−1)、ポリエー
テルエーテルケトン(PEEK)(比較例−2)を用い
、一定の試験用金型による試験片を作成し、最適成形条
件、成形サイクル、成形収縮率、耐薬品性、その他の必
要特性につき相対的な比較評価を行った。Example 1, Comparative Example 1.2 In order to compare the suitability as a holding material for wafer handling, unfilled linear polyphenylene sulfide (PPS) was used.
(Polyplastics Co., Ltd. “Fortron”) (
Using Example-1), conventionally used polytetrafluoroethylene copolymer (PFA) (Comparative Example-1), and polyetheretherketone (PEEK) (Comparative Example-2), a certain test mold was prepared. Test specimens were created using the following methods, and relative comparative evaluations were made regarding optimal molding conditions, molding cycles, mold shrinkage rates, chemical resistance, and other required properties.
結果を第1表に示す。The results are shown in Table 1.
第
表
上記の相対比較よりPPSは従来使用のPFASPEE
Kに比してウェハー取扱用保持具としての各種の要求性
能が優れていることがわかる。From the relative comparison in the table above, PPS is the conventionally used PFASPEE.
It can be seen that this material is superior to K in various required performances as a wafer handling holder.
実施例−2、比較例−3、比較例−4
前記実施例及び比較例に使用したと同じ材料を用いて図
−1に示す如きウェハー用バスケットをそれぞれの適性
条件にて射出成形にて成形し、所要の成形サイクルを測
定した。Example 2, Comparative Example 3, Comparative Example 4 Using the same materials as those used in the above Examples and Comparative Examples, wafer baskets as shown in Figure 1 were molded by injection molding under appropriate conditions. The required molding cycles were then measured.
更に200℃にて2時間加熱処理し、寸法精度を次の如
くして測定した。Further, it was heat-treated at 200°C for 2 hours, and the dimensional accuracy was measured as follows.
1、側板A部のそり変形(肉眼観察)
2、 リブ板8部の直線性(〃)
3、保持すべきウェハーをそれぞれのリブ間に挿入し、
ウェハーの挿入、取り出しの円滑さ、及びがたつきの程
度を調べた。1. Warp deformation of side plate A section (macroscopic observation) 2. Straightness of rib plate 8 section (〃) 3. Insert the wafer to be held between each rib,
The smoothness of wafer insertion and removal, and the degree of rattling were examined.
結果を第2表に示す。The results are shown in Table 2.
第
2
表
〔発明の効果〕
以上の説明及び実施例で明らかな如く、本発明のPAS
を使用したウェハー取扱用保持具は、従来使用されてい
るPFAXPEEKを素材とするものに比して、射出成
形において樹脂温度、金型温度とも異常な高温とする必
要がなく、しかも流動性が良く、特にゲートサイズを大
きくしなくとも成形可能であり、固化速度も速く、成形
サイクルを短くして効率的に製造できる。更に薄肉軽量
化も可能であり、寸法精度も優れ、加熱処理による変形
も少なく、特に切削加工を行わなくとも射出成形のまま
で充分な形状精度を得ることができる。又ウェハー処理
に用いられる各種の薬品に対しても化学的に安定であり
、ウェハー取扱用保持具として好適なものである。Table 2 [Effects of the Invention] As is clear from the above explanation and examples, the PAS of the present invention
Compared to conventionally used wafer handling holders made from PFAXPEEK, there is no need to set the resin temperature or mold temperature to abnormally high temperatures during injection molding, and it also has good fluidity. In particular, it can be molded without increasing the gate size, has a fast solidification rate, and can be manufactured efficiently by shortening the molding cycle. Furthermore, it is possible to make the material thinner and lighter, it has excellent dimensional accuracy, and there is little deformation due to heat treatment, and sufficient shape precision can be obtained by injection molding without any particular cutting process. It is also chemically stable against various chemicals used in wafer processing, making it suitable as a holder for handling wafers.
図−1(1)は本発明の一実施例によるウェハー取扱用
保持具の斜視図、同(2)は平面図、同(3)は同(2
)のI−I’ 線断面略示図であり、図−2は本発明の
別の実施例によるウェハー取扱用保持具の斜視図である
。
側板
側面リブ板
底部リブ板
保持具本体
リブ
ウェハー
空隙部Figure 1 (1) is a perspective view of a wafer handling holder according to an embodiment of the present invention, Figure 1 (2) is a plan view, and Figure 1 (3) is a perspective view of a wafer handling holder according to an embodiment of the present invention.
), and FIG. 2 is a perspective view of a wafer handling holder according to another embodiment of the present invention. Side plate side rib plate bottom rib plate holder main body rib wafer cavity
Claims (1)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1186629A JP2513848B2 (en) | 1989-07-19 | 1989-07-19 | Wafer handling holder |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1186629A JP2513848B2 (en) | 1989-07-19 | 1989-07-19 | Wafer handling holder |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH0350847A true JPH0350847A (en) | 1991-03-05 |
JP2513848B2 JP2513848B2 (en) | 1996-07-03 |
Family
ID=16191925
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1186629A Expired - Lifetime JP2513848B2 (en) | 1989-07-19 | 1989-07-19 | Wafer handling holder |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2513848B2 (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0734535A (en) * | 1993-07-22 | 1995-02-03 | Kurosawa Kensetsu Kk | Connection method for precast concrete post |
KR20090027035A (en) * | 2007-09-11 | 2009-03-16 | 세메스 주식회사 | Method of fabricating substrate loading device |
CN109174779A (en) * | 2018-07-16 | 2019-01-11 | 横店集团东磁股份有限公司 | A kind of cleaning method of the PERC technique ALD aluminium gaily decorated basket |
-
1989
- 1989-07-19 JP JP1186629A patent/JP2513848B2/en not_active Expired - Lifetime
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0734535A (en) * | 1993-07-22 | 1995-02-03 | Kurosawa Kensetsu Kk | Connection method for precast concrete post |
KR20090027035A (en) * | 2007-09-11 | 2009-03-16 | 세메스 주식회사 | Method of fabricating substrate loading device |
CN109174779A (en) * | 2018-07-16 | 2019-01-11 | 横店集团东磁股份有限公司 | A kind of cleaning method of the PERC technique ALD aluminium gaily decorated basket |
CN109174779B (en) * | 2018-07-16 | 2020-06-09 | 横店集团东磁股份有限公司 | Cleaning method for ALD aluminum product flower basket by PERC process |
Also Published As
Publication number | Publication date |
---|---|
JP2513848B2 (en) | 1996-07-03 |
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