JPH035052B2 - - Google Patents

Info

Publication number
JPH035052B2
JPH035052B2 JP23603885A JP23603885A JPH035052B2 JP H035052 B2 JPH035052 B2 JP H035052B2 JP 23603885 A JP23603885 A JP 23603885A JP 23603885 A JP23603885 A JP 23603885A JP H035052 B2 JPH035052 B2 JP H035052B2
Authority
JP
Japan
Prior art keywords
molecular beam
opening
crucible
source material
impurities
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP23603885A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6294920A (ja
Inventor
Sumio Sakai
Shunichi Murakami
Tetsuo Ishida
Hitoaki Hirama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Anelva Corp
Original Assignee
Anelva Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Anelva Corp filed Critical Anelva Corp
Priority to JP23603885A priority Critical patent/JPS6294920A/ja
Publication of JPS6294920A publication Critical patent/JPS6294920A/ja
Publication of JPH035052B2 publication Critical patent/JPH035052B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Crystals, And After-Treatments Of Crystals (AREA)
  • Physical Vapour Deposition (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
JP23603885A 1985-10-22 1985-10-22 分子線発生源 Granted JPS6294920A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP23603885A JPS6294920A (ja) 1985-10-22 1985-10-22 分子線発生源

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP23603885A JPS6294920A (ja) 1985-10-22 1985-10-22 分子線発生源

Publications (2)

Publication Number Publication Date
JPS6294920A JPS6294920A (ja) 1987-05-01
JPH035052B2 true JPH035052B2 (enrdf_load_stackoverflow) 1991-01-24

Family

ID=16994840

Family Applications (1)

Application Number Title Priority Date Filing Date
JP23603885A Granted JPS6294920A (ja) 1985-10-22 1985-10-22 分子線発生源

Country Status (1)

Country Link
JP (1) JPS6294920A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1762899A1 (en) 2005-09-12 2007-03-14 Ricoh Company, Ltd. Latent electrostatic image bearing member, and the method for producing the same, image forming method, image forming apparatus, and process cartridge

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1762899A1 (en) 2005-09-12 2007-03-14 Ricoh Company, Ltd. Latent electrostatic image bearing member, and the method for producing the same, image forming method, image forming apparatus, and process cartridge

Also Published As

Publication number Publication date
JPS6294920A (ja) 1987-05-01

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term